WO2003050620A1 - Materiau de formation d'image - Google Patents

Materiau de formation d'image Download PDF

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Publication number
WO2003050620A1
WO2003050620A1 PCT/JP2002/011582 JP0211582W WO03050620A1 WO 2003050620 A1 WO2003050620 A1 WO 2003050620A1 JP 0211582 W JP0211582 W JP 0211582W WO 03050620 A1 WO03050620 A1 WO 03050620A1
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WO
WIPO (PCT)
Prior art keywords
resin layer
photosensitive resin
general formula
thermoplastic resin
coating
Prior art date
Application number
PCT/JP2002/011582
Other languages
English (en)
Japanese (ja)
Inventor
Tamotsu Suzuki
Original Assignee
Fuji Photo Film Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001380283A external-priority patent/JP3800512B2/ja
Priority claimed from JP2001380291A external-priority patent/JP3800513B2/ja
Priority claimed from JP2001380058A external-priority patent/JP3806028B2/ja
Priority claimed from JP2001380147A external-priority patent/JP3767807B2/ja
Priority claimed from JP2001380059A external-priority patent/JP3767806B2/ja
Application filed by Fuji Photo Film Co., Ltd. filed Critical Fuji Photo Film Co., Ltd.
Priority to KR10-2003-7013507A priority Critical patent/KR20040073286A/ko
Publication of WO2003050620A1 publication Critical patent/WO2003050620A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Definitions

  • the present invention relates to an image forming material that can be advantageously used for image formation by transfer, such as the preparation of a color filter used in the production of a liquid-liquid one-part display.
  • An image forming material for transferring a photosensitive resin layer provided on a support to form a photosensitive resin layer on a substrate, which is an object to be transferred is described in, for example, Japanese Patent Publication No. Sho 56-40882. No. is known.
  • This image forming material is used in the production of printed wiring, intaglio letterpress printing plates, name plates, multicolor test printing samples, offset printing plates, screen printing stencils, and the like.
  • the image-forming material generally comprises a support, an intermediate layer (separation layer) or an intermediate layer and a thermoplastic resin layer and a photosensitive resin layer which are soluble in an intermediate layer, and forms an image on a transferred object.
  • an image is formed on the substrate by bringing the photosensitive resin layer surface of the image forming material into close contact with the substrate as the transfer object, exfoliating only the support, exposing through the intermediate layer, and further developing. be able to.
  • the above-mentioned intermediate layer plays a role of blocking oxygen and works favorably for exposure in the air, but its thickness is extremely thin, about 0.5 to 5 m, so that the resolution is particularly low. It does not hinder.
  • the alkali-soluble thermoplastic resin layer irregularities on the underlayer (that is, irregularities due to already formed images) can be absorbed.
  • color filters used for color liquid crystal displays generally include black, blue, and blue (red, green, and blue) pixels in the gaps between them for the purpose of improving display contrast. It has a basic structure in which a box (K) is formed.
  • the surface of these R, G, B, each pixel and K in the color filter in the evening requires high smoothness. That is, when an image is formed by transferring the photosensitive resin layer to the surface of the substrate for color filling using the above-described image forming material, if the photosensitive resin layer has poor smoothness (that is, unevenness in film thickness). If there is), color unevenness of the pixel occurs.
  • Such color unevenness When a color liquid crystal display is manufactured using a color filter that has the same color, the pixels obtained on the color liquid crystal display are also coated so as not to cause coating unevenness and cissing during coating in order to prevent color unevenness. Need to do.
  • thermoplastic resin layer from the viewpoint of affecting the applicability of the photosensitive resin layer, smoothness for further ensuring uniform exposure to the thermoplastic resin layer is indispensable. It is necessary to prevent uneven coating and cissing during coating.
  • Japanese Patent Publication No. 8-33630 proposes that when a photosensitive resin layer is formed by coating, a fluorine-based surfactant is added to the coating solution for use.
  • a fluorine-based surfactant it has 3 to 20 carbon atoms and contains 40% by mass or more of fluorine atoms, and hydrogen atoms bonded to at least three terminal carbon atoms are substituted by fluorine.
  • a polymer contained in the range of 40 to 70% by mass in the union is used.
  • fluorine-based surfactant used in many examples include poly (oxyalkylene) (meth) acrylate having an oxyalkylene of 1,2-hydroxyethylene, oxytriethylene, or oxytetramethylene.
  • the weight average molecular weight is mainly about 150,000.
  • fluorine-based surfactants used in the examples of JP-B-8-33630 can smooth the surface of the photosensitive resin layer, but still have poor adhesion to the substrate. Insufficient adhesion, especially when transferred to a glass substrate or a substrate provided with a semiconductor, is not sufficient.
  • An object of the present invention is to provide an image forming material which has no coating unevenness, has a smooth coating surface, has a uniform layer thickness, has no color unevenness, has no foaming, has excellent defoaming properties, and has excellent glass substrate adhesion. It is in.
  • thermoplastic resin layer a photosensitive resin layer provided in this order on a support, wherein the thermoplastic resin layer and the photosensitive resin
  • An image forming material characterized in that at least one of the layers contains a copolymer (1) containing a monomer represented by the general formula (a), the general formula (b) or the general formula (c).
  • R 01 to R 06 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, represents a single bond or a linking group containing at least one of an oxygen atom, a nitrogen atom and an iodine atom.
  • R 2 represents a single bond or a linking group containing at least one of a carbon atom, an oxygen atom, a nitrogen atom and an iodine atom
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms
  • n represents 1 to Integer of 10
  • m is an integer of 2 to 14
  • 1 is an integer of 0 to 10
  • p is an integer of:!
  • thermoplastic resin layer and the photosensitive resin Characterized in that at least one of the layers contains a copolymer (2) containing the monomers represented by the general formulas (a), (b), (c) and (d) Image forming materials.
  • General formula (a): H 2 C ? — COO (CH ⁇ F ⁇ — (Chy! CmFsm
  • R 07 to R. 8 are each independently a hydrogen atom or Represents an alkyl group having 1 to 5 carbon atoms, r represents an integer of 2 to 10, and q represents an integer of 1 to 30.
  • thermoplastic resin layer a photosensitive resin layer provided in this order on a support, wherein the thermoplastic resin layer and the photosensitive resin
  • An image forming material characterized in that at least one of the layers contains a copolymer (3) containing a monomer represented by the general formula (a), the general formula (c) or the general formula (e).
  • -General formula (a) H 2 C C-COO (CH 2 ) ? R R 1- (CH 2 ) l C m F 2m + 1
  • R 09 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and s represents 6 to Indicates an integer of 20.
  • thermoplastic resin layer a photosensitive resin layer in this order, wherein the thermoplastic resin layer and the photosensitive resin
  • An image forming material characterized in that at least one of the layers contains a copolymer (4) containing a monomer represented by the general formula (a), the general formula (c) or the general formula (f).
  • R 01 to R. 13 is each independently a hydrogen atom or a carbon atom having 1 to 5 carbon atoms. Represents an alkyl group, and R 2 is a single bond or at least one of a carbon atom, an oxygen atom, a nitrogen atom and And a linking group containing at least one.
  • An image forming material comprising at least a coating layer of an alkali-soluble thermoplastic resin layer and a photosensitive resin layer provided on a support in this order, wherein at least the thermoplastic resin layer and the photosensitive resin layer
  • An image forming material comprising a copolymer (5) containing a monomer represented by the general formula (a) or (d).
  • General formula (a): H 2 C ? — COO (CH 2 ) H ⁇ R factory (CH ⁇ CmF ⁇ "7
  • the image-forming material used in the present invention comprises an alkali-soluble thermoplastic resin layer (hereinafter, also simply referred to as a thermoplastic resin layer) and a photosensitive resin layer, which constitute a coating layer, and a photosensitive resin layer represented by the general formula (a):
  • a copolymer (4) containing a monomer represented by the formula (c) and the general formula (f), or a copolymer (5) containing a monomer represented by the general formula (a) and the general formula (d) It contains.
  • the copolymer (1) is also referred to as a surfactant (1) for the present invention.
  • Other copolymers (2) to (5) are also referred to as copolymers (2) to (5) for the present invention.
  • an image forming material containing the copolymer (1) is also referred to as an image forming material (1).
  • Image forming materials containing other copolymers (2) to (5) are also referred to as image forming materials (2) to (5).
  • the image forming materials (1) to (5) are collectively referred to as "the present invention” or "the image forming material of the present invention”.
  • the image forming material of the present invention is configured so that at least the photosensitive resin layer is transferred to the surface of any member.
  • the surface of the optional member is also called a base surface.
  • the image forming material of the present invention has a coating liquid performance of each of the thermoplastic resin layer and / or the photosensitive resin layer by including the surfactant for the present invention in the thermoplastic resin layer and / or the photosensitive resin layer. Improve.
  • the image-forming material (1) of the present invention is an image which has no coating unevenness, has a smooth coating surface, has a uniform layer thickness, has no color unevenness, has no foaming, has excellent defoaming properties, and has excellent glass substrate adhesion.
  • An imaging material can be provided.
  • the image-forming material (2) of the present invention can provide an image-forming material having the above functions and further excellent solubility in a developer.
  • the image forming material (3) of the present invention can provide an image forming material having no coating unevenness, a smooth coated surface, a uniform layer thickness, no color unevenness, and excellent glass substrate adhesion.
  • the image forming materials (4) and (5) of the present invention are images having no coating unevenness, a smooth coated surface, uniform layer thickness, no color unevenness, no cissing, no pinholes, and excellent glass substrate adhesion.
  • a forming material can be provided.
  • the image forming material of the present invention is particularly excellent in adhesiveness to a glass substrate or a substrate provided with a semiconductor as a base.
  • the photosensitive resin layer is used for image formation, and the image includes a colorless and transparent image.
  • a colorant is contained.
  • the other monomers represented by the general formulas (b) to (f) are similarly referred to as monomers (b) to (f).
  • the surfactant (1) for the present invention is a copolymer (1) containing a monomer (a), a monomer (b) and a monomer (c).
  • the surfactant (2) for the present invention is a copolymer (2) containing a monomer (a), a monomer (b), a monomer (c) and a monomer (d).
  • the surfactant (3) for the present invention is a copolymer (3) containing monomer (a), monomer (c) and monomer (e).
  • the surfactant (4) for the present invention is a copolymer (4) containing a monomer (a), a monomer (c) and a monomer (f).
  • the surfactant (5) for the present invention is a copolymer (5) containing a monomer (a) and a monomer (d).
  • the monomer (a) will be described.
  • C m F 2m + 1 may be linear or branched.
  • m represents an integer of 2 to 14, and is preferably an integer of 4 to 12.
  • the content of CraF 2m + 1 is preferably from 20 to 70% by mass, and particularly preferably from 40 to 60% by mass, based on the monomer (a).
  • R 0 i represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • linking group examples include one S0 2 NR 4 — (R 4 has the same meaning as R 01 ), one NH—, — 0—, —S— and the like.
  • n 1 to 20, preferably 2 to 10.
  • 1 represents 0 to 10, preferably 0 to 5.
  • R 02, RQ 3 and R. 4 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R. 2 is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R 0 3 and R 0 4 is preferably an alkyl group having 1 to 3 carbon atoms.
  • R 2 represents a single bond or a linking group containing at least one of a carbon atom, an oxygen atom, a nitrogen atom and an iodine atom, and is preferably a single bond.
  • linking group examples include: 1 (CH 2 ) q — (q is an integer of 1 to 10), —S0 2 NR 4 — (R 4 has the same meaning as R 01 ), 1 NH—, 1 0—, One S— and the like, or a combination thereof.
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a methyl group.
  • 1 represents an integer of 1 to 100, preferably 1 to 50.
  • R 0 5 and R. 6 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R 05 is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R. 6 is preferably an alkyl group having 1 to 3 carbon atoms.
  • R. 7 and R. 8 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. More preferably: R 07 is a methyl group and: R 08 is a hydrogen atom.
  • r is an integer of 2 to 10, preferably 2 to 3.
  • q is an integer from 1 to 30, preferably from 1 to 25.
  • the monomer (d) it is preferable that a mixture of copolymers having: 2 and r being 3 is also preferable, and the ratio of the former to the mixture is 1 to 20% by mass, particularly 1 to 1% by mass. 0% by mass is preferred. In this case, q is preferably 9 to 22 in both cases.
  • the monomer (e) will be described.
  • Rog represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • s represents an integer of 6 to 20, preferably an integer of 6 to 15.
  • the monomer (f) will be described.
  • Roio RC or R. 12 and R. 13 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • R 2 represents a single bond or a linking group containing at least one of a carbon atom, an oxygen atom, a nitrogen atom and an iodine atom, and is preferably a single bond.
  • linking group examples include one (CH 2 ) q — (q is an integer of 1 to 10), one S0 2 NR 4 — (where R 4 has the same meaning as R 01 ), one NH—, and one 0— , 1S—, etc., or a combination thereof.
  • the mass average molecular weight Mw of the surfactant for use in the present invention is preferably from 1,000 to 40,000, and more preferably from 5,000 to 20,000.
  • 100 parts by mass of the surfactant (1) for the present invention is 5 to 80 parts by mass of the monomer (a), 0.1 to 50 parts by mass of the monomer (b), 1 to 70 parts by mass of the monomer (c), and It is preferable that the other optional monomer comprises the remaining parts by mass.
  • the monomer (a) is 10 to 60 parts by mass
  • the monomer (b) is 0.5 to 10 parts by mass
  • the monomer (c) ) Preferably comprises 2 to 50 parts by mass
  • the other optional monomer comprises the remaining parts by mass.
  • 100 parts by mass of the surfactant (2) for the present invention are such that the monomer (a) is 5 to 80 parts by mass, the monomer (b) is 0.1 to 50 parts by mass, and the monomer (c) is:!
  • the monomer (d) comprises 1 to 70 parts by mass, and the other optional monomer comprises the remaining parts by mass.
  • the monomer (a) comprises 10 to 60 parts by mass, 0.5 to 100 parts by mass of monomer (b), 10 to 40 parts by mass of monomer (c), 10 to 40 parts by mass of monomer (d), and the remaining parts by mass of any other monomer This is preferred.
  • 100 parts by mass of the surfactant (3) for the present invention is such that the monomer (a) is 5 to 80 parts by mass, the monomer (c) is 1 to 70 parts by mass, the monomer (e) is 0.1 to 50 parts by mass, It is preferable that the other optional monomer comprises the remaining parts by mass. Further, the monomer (a) is 10 to 60 parts by mass, the monomer (c) is 1 to 60 parts by mass, and the monomer (e) is 1 part by mass. 50 parts by weight, and the other optional monomer preferably comprises the remaining parts by weight.
  • 100 parts by mass of the surfactant (4) for the present invention is such that the monomer (a) is 5 to 80 parts by mass, the monomer (c) is 1 to 70 parts by mass, the monomer (f) is 0.1 to 50 parts by mass, and It is preferable that the other optional monomer is composed of the remaining parts by mass. Further, the monomer (a) has 10 to 60 parts by mass, the monomer (c) has 2 to 50 parts by mass, and the monomer (f) has 0.1 part by mass. It is preferred that 5 to 10 parts by weight, and other optional monomers, comprise the remaining parts by weight.
  • 100 parts by mass of the surfactant (5) for the present invention contains 5 to 80 parts by mass of the monomer (a), It is preferred that the monomer (d) comprises 0.1 to 50 parts by mass and the other optional monomer comprises the remaining parts by mass. Further, the monomer (a) comprises 10 to 60 parts by mass, and the monomer (d) comprises It is preferred that 10 to 40 parts by mass, and other optional monomers, comprise the remaining parts by mass.
  • the copolymerizable monomer other than the monomers (a) and (d) the above-mentioned monomer (c) is preferable.
  • copolymerizable monomers other than the above-mentioned specific monomer include styrene, vinyltoluene, permethylstyrene, 2-methylstyrene, chlorostyrene, vinylbenzoic acid, and vinylbenzenesulfonic acid.
  • Styrene such as aminostyrene, derivatives thereof, substituted products, butane, butadiene, isoprene, etc., acrylonitrile, vinyl ethers, maleic acid and maleic ester, maleic anhydride, cinnamic acid, vinyl chloride, vinyl acetate, etc.
  • Examples include vinyl monomers.
  • the surfactant for the present invention is a copolymer of monomer (a), monomer (b), monomer (c), etc.
  • the monomer sequence is not particularly limited and may be random or regular. May be.
  • the monomer (a) contained in one molecule of the surfactant for use in the present invention may have the same structure as each other or may have a different structure within the above defined range.
  • surfactant (1) for the present invention two or more surfactants having different molecular structures and different monomer compositions can be used. The same applies to the surfactants (2) to (5) for the present invention.
  • the content of the surfactant for the present invention is preferably from 0.01 to 10% by mass, particularly preferably from 0.1 to 6% by mass, based on the total solid content of the thermoplastic resin layer or the photosensitive resin layer. It is more effective to use the surfactant for the present invention in both the thermoplastic resin layer and the photosensitive resin layer.
  • the configuration of the coating layer of the image forming material of the present invention is not particularly limited as long as it has at least the thermoplastic resin layer and the photosensitive resin layer. This will be described in detail.
  • the layer constitution of the image forming material of the present invention is not limited to the following specific examples.
  • thermoplastic resin layer 2 In the image forming material shown in FIG. 1, a thermoplastic resin layer 2, an oxygen barrier layer 3, and a photosensitive resin layer 4 are formed on a support 1 in this order.
  • the surfactant for use in the present invention is contained in at least one of the thermoplastic resin layer 2 and the photosensitive resin layer 4 that are soluble.
  • the support is made of a flexible substance which has an alkali-soluble thermoplastic resin layer and good releasability, is chemically and thermally stable, and is flexible.
  • a thin sheet of Teflon, polyethylene terephthalate (PET), polyethylene resin, polyethylene, polypropylene or the like, or a laminate thereof is preferable.
  • the support In order to ensure good releasability between the support and the thermoplastic resin layer, it is general that no surface treatment such as glow discharge is performed and no undercoat layer such as gelatin is provided. is there.
  • the thickness of the support is suitably from 5 to 300 zm, preferably from 20 to 150 m.
  • the alkali-soluble thermoplastic resin layer plays a role as a cushioning material so that it can absorb irregularities (including irregularities due to already formed images, etc.) on the underlayer surface. It is preferable to have a property that can be deformed in accordance with the conditions.
  • thermoplastic resin layer examples include a saponified product of ethylene and an acrylate copolymer, a saponified product of styrene and a (meth) acrylate copolymer, vinyl toluene and ( From saponified products such as (meth) acrylic acid ester copolymers, poly (meth) acrylic acid esters, and (meth) acrylic acid ester copolymers of (meth) butyl acrylate with vinyl acetate, etc. It is preferable to select at least one type, but it is also a “Plastic Performance Handbook” (edited by the Japan Plastics Industries Federation, All Japan Plastics Molding Federation, published by the Industrial Research Council, published on October 25, 1996).
  • organic polymers those which are soluble in an aqueous alkali solution can also be used.
  • thermoplastic resins those having a softening point of 80 ° C. or less are preferable.
  • (me) “2 Lylic acid” is a generic term for acrylic acid and methacrylic acid, and the same applies to derivatives thereof.
  • Tg 0 to 140 ° C
  • Tg 30 to 110 ° C
  • Specific examples of these resins include JP-B-54-34327, JP-B-55-38961, JP-B-58-12577, JP-B-54-25957, JP-A-61-134756, and JP-B-59.
  • JP-A-60-21 JP-A-54-92723, JP-A-54-99418, JP-A-54-137085, JP-A-57-20732, JP-A-58-93046, JP-A-58-93046 59-97135, JP-A-60-1 59743, OLS 3504254, JP-A-60-247638, JP-A-60-208748, JP-A-60-21
  • T g 30 to 170 ° C.
  • T g It can be selected and used in the range of 60 ⁇ 140 ° C.
  • Preferred specific examples can be selected from those described in the above-mentioned patent specifications.
  • Particularly preferred are the styrenes described in JP-B-55-38961 and JP-A-5-241340. / (Meth) acrylic acid copolymer.
  • plasticizers in order to adjust the adhesive strength between these organic polymer substances and the support, a variety of plasticizers, various polymers and supercooled substances, an adhesion improver or a surfactant, A release agent or the like can be added.
  • preferred plasticizers include propylene glycol, polyethylene glycol, octyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, and biphenyl diphenyl.
  • Phosphate polyethylene glycol mono (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol mono (meth) acrylate, polypropylene glycol di (meth) acrylate, epoxy resin and polyethylene glycol mono (meth) Addition reaction product with acrylate, addition reaction product with organic diisocyanate and polyethylene glycol mono (meth) acrylate, organic diisocyanate and polypropylene glycol Examples thereof include an addition reaction product of a colmono (meth) acrylate and a condensation reaction product of bisphenol A and polyethylene glycol mono (meth) acrylate.
  • the amount of the plasticizer in the thermoplastic resin layer that is soluble is generally 200% by mass or less, preferably 20 to 100% by mass, based on the thermoplastic resin. You.
  • the thickness of the alkali-soluble thermoplastic resin layer is preferably 6 m or more. If the thickness of the thermoplastic resin is less than 6 ⁇ m, it will be difficult to completely absorb irregularities on the base surface of 1 m or more.
  • the upper limit is generally about 100 / m or less, preferably about 50 / m or less, from the viewpoint of developability and production suitability.
  • the oxygen blocking layer is a layer having a function of blocking oxygen, whereby the polymerization of the photosensitive resin layer by exposure can proceed without being inhibited by the polymerization by oxygen even in the air.
  • the film thickness is small (about 0.05 to 5 m), the resolution (does not adversely affect this).
  • As a material for forming the oxygen barrier layer it is dispersed or dissolved in water or an aqueous alkaline solution to have low oxygen permeability. Any known ones may be used as long as they are the ones shown, for example, polyvinyl ether Z maleic anhydride polymer described in Japanese Patent Application Laid-Open No. 46-2111 / 56-40824.
  • Copolymers of formic acid, maleate resins, and combinations of two or more of these can be mentioned.
  • the polyvinyl alcohol preferably has a conversion of 80% or more.
  • the content of polyvinylpyrrolidone is generally 1 to 75% by mass per solid content of the oxygen barrier layer, and 1 to 60% by mass. %, Preferably from 10 to 50% by mass. If the content is less than 1% by mass, sufficient adhesion to the photosensitive resin layer cannot be obtained, and if it exceeds 75% by mass, the oxygen barrier ability is reduced.
  • the thickness of the oxygen barrier layer is very small, preferably about 0.1 to 5 ⁇ m, particularly preferably 0.5 to 2 ⁇ m. If it is less than about 0.1 m, the oxygen permeability is too high, and if it exceeds about 5 m, it takes too much time for development or removal of the oxygen barrier layer.
  • the photosensitive resin layer can be developed with an aqueous alkali solution or developed with an organic solvent.
  • an aqueous alkaline solution those which can be developed with an aqueous alkaline solution are preferable.
  • the photosensitive resin may be a negative type in which a portion that receives radiation such as light or an electron beam is cured, or a positive type in which a non-radiation receiving portion is cured.
  • a positive photosensitive resin includes a novolak resin.
  • the alkali-soluble novolak resin system described in JP-A-7-43889 can be used.
  • C The positive photosensitive resin layer described in JP-A-6-148888 can be used. That is, a photosensitive resin layer containing a mixture of the soluble resin described in the publication and 1,2-naphthoquinonediazidosulfonate as a photosensitive agent and a thermosetting agent described in the publication can be used. Further, the composition described in JP-A-5-262850 can be used.
  • the negative photosensitive resin examples include a photosensitive resin comprising a negative diazo resin and a binder, a photopolymerizable composition, a photosensitive resin composition comprising an azide compound and a binder, and a cinnamic acid type photosensitive resin composition. Is mentioned. Among them, particularly preferred is a photosensitive resin containing a photopolymerization initiator, a photopolymerizable monomer and a binder as basic components.
  • the photosensitive resin layer includes a polymerized polymer described in JP-A-11-133600. Compound B, "polymerization initiator C", “surfactant”, “adhesion aid", and other compositions can be used.
  • a negative-type photosensitive resin that can be developed with an aqueous alkaline solution is a main component, which is a polymer containing a carboxylic acid group-containing binder (such as the above-mentioned thermoplastic resin that is completely soluble) and is subjected to addition polymerization by light irradiation. It contains an ethylenically unsaturated double bond containing monomer and a photoinitiator.
  • a carboxylic acid group-containing binder such as the above-mentioned thermoplastic resin that is completely soluble
  • binder which is soluble in the solvent examples include a polymer having a carboxylic acid group in a side chain, for example, Japanese Patent Application Laid-Open No. 59-44615, Japanese Patent Publication No. 54-34332, Japanese Examined Patent Publication No. Sho 58-125257, Japanese Examined Patent Publication No. 54-25957, Japanese Patent Publication No. 59-53838, and Japanese Patent Publication No. 59-71 Methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer as described in Examples include coalescence.
  • a cellulose derivative having a carboxylic acid group in a side chain can also be mentioned.
  • those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group can also be preferably used.
  • copolymers of benzyl (meth) acrylate and (meth) acrylic acid and benzyl (meth) acrylate and (meth) acrylic acid described in U.S. Pat. No. 4,139,391.
  • a multi-component copolymer with the above monomer is described in U.S. Pat. No. 4,139,391.
  • the alkali-soluble binder used for the photosensitive resin layer has an acid value in the range of 30 to 400 mg KOH / g and a weight average molecular weight in the range of 100 to 300,000. It is used by selecting one.
  • an alkali-insoluble polymer can be added within a range that does not adversely affect the developability and the like. Examples of these polymers include alcohol-soluble nylon and epoxy resin.
  • the content of the alkali-soluble binder is usually from 10 to 95% by mass, and preferably from 20 to 90% by mass, based on the total solid content of the photosensitive resin composition. If the amount is less than 10% by mass, the adhesiveness of the light-sensitive resin layer is too high. If the amount exceeds 95% by mass, the formed layer is inferior in strength and light sensitivity.
  • the photopolymerization initiator include a vicinal polyketaldonyl compound disclosed in U.S. Pat.No. 2,366,660 and U.S. Pat.No. 2,448,828.
  • trihalomethyloxaziazol compounds described in the specification of US Pat. No. 1,297,76. Particularly preferred are trihalomethyl-l-s-triazine, trihalomethyloxadiazole, and triarylimidazo-l-dimer.
  • the content of the photopolymerization initiator with respect to the total solid content is 0.5 to
  • the content is generally 20% by mass, and preferably 1 to 15% by mass. If the amount is less than 0.5% by mass, the photosensitivity and the intensity of the image are low, and if the amount exceeds 20% by mass, no effect on the performance improvement is recognized.
  • Examples of the ethylenically unsaturated double bond-containing monomer which can undergo addition polymerization upon irradiation with light include compounds having a boiling point of 100 ° C. or more at normal pressure.
  • monofunctional (meth) acrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol (poly) Methacrylate) Triacrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neobenzyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, penite Erythritol tri (meth) acrylate, dipentyl erythritol hexyl (meth) acryl
  • urethane acrylates disclosed in JP-B-48-41708, JP-B-50-634, and JP-A-51-37193 Polyester acrylates and epoxy resins disclosed in JP-A-48-64183, JP-B-49-431, and JP-B-52-49090.
  • the content of the photosensitive resin composition relative to the total solid content is generally 5 to 50% by mass, and 10 to 40% by mass. % By mass is preferred. If the amount is less than 5% by mass, the photosensitivity and the strength of the image are reduced.
  • the photosensitive resin layer contains at least a pigment or a dye in order to form a colored image on the transfer object.
  • Pigments are generally classified into organic pigments and inorganic pigments.
  • the former has properties such as excellent transparency of the coating film, and the latter generally has excellent concealing properties. Just choose.
  • metal powder, metal oxide powder, fluorescent pigment, and the like may be used.
  • examples of preferably used pigments include azo pigments, phthalocyanine pigments, anthraquinone pigments, dioxazine pigments, quinacridone pigments, isoindolinone pigments, and nitro pigments.
  • the pigments used in the photosensitive resin layer are listed below by color according to hue, but are not limited thereto. These pigments and dyes are used alone or in combination.
  • Organic pigments such as C.I.I.Green Green 7, C.I.I.C.-Green 36, C.I.No.42053, C.I.No.42085s C.I.No.42095
  • Pigment Y e 11 ow (pigment yellow) 12 (C.I.No.
  • Pigment Y e 11 ow (pigment yellow) 13 (C.I.No. 2 1 100)
  • Piment Ye 11 ow (C.I.No. Example) Permanent Yel ow (Permanent Yellow) G (manufactured by Clariant Japan Co., Ltd.), Lionel Yel ow (Rionol Yellow)-1401—G (manufactured by Toyo Ink Manufacturing Co., Ltd.), Se ika Fast Ye 11 ow (Seika First Yellow) 2270 (manufactured by Dainichi Seika Kogyo Co., Ltd.), Symuler Fast Ye ll ow (Simula First Yellow) 4
  • Pigment Y e 11 ow (pigment yellow) 17 (C.I.No. 2 1105)
  • Pigment Ye l low 180 (C.I.No. 21290)
  • Pigment Ye l low 139 (C. ⁇ , ⁇ ⁇ . 56298)
  • Pigment Red 48 1 (C.I.No. 1 5865: 1)
  • Pigment Red 48 2 (C.I.No.1 5865: 2)
  • Cromopht a l Red (Kromofu Le Red) A2B (Chiba Specialty Chemicals Co., Ltd.)
  • Pigment B lue 15 (C.I.No. 74 160)
  • Pigment Blue 15 1 (C.I. No. 74160)
  • Hos terperm Blue Hosyuichi Palm Blue
  • A2R Celariant Japan Co., Ltd.
  • Fast ogen Blue Fert Gen Blue 5050 (Dainippon Inki Chemical Industry Co., Ltd.)
  • Pigment Blue 15 2 (I. No. 74160)
  • Hosperperm Blue Hosui Perm Palm Blue
  • AFL Cibolite Blue
  • BSP Chiba Specialty Chemicals Co., Ltd.
  • F ast 0 gen Blue Fast Gen Blue
  • GP Dainippon Inki Chemical Industry Co., Ltd. ⁇
  • Ho st erperm B 1 ue (manufactured by Clariant Japan Co., Ltd.) B2G (manufactured by Clariant Japan Co., Ltd.), Liono l B 1 ue (manufactured by Rio Norpur) F G7330 (manufactured by Toyo Ink Manufacturing Co., Ltd.), Cromophtal B lue (Chromophtalpur I) 4 GNP (Chipa Specialty Chemicals Co., Ltd.), Fastogen B 1 ue (Fast Genble I) FGF (Dainippon Ink Kagaku Kogyo Co., Ltd.)
  • Pigment B 1 u e (Vigment Blue) 15: 4 (C.I.No. 74160)
  • H osterperm B lue Hosui-Pan Blue
  • BFL Clariant Japan Co., Ltd.
  • Cyanine B lue Cyanimpul I
  • Irgalite Blue GLNF Chipa Specialty Chemicals Co., Ltd.
  • Fast ogen B 1 ue Fast Genpur I
  • FGS Dainippon Ink Kagaku Kogyo Co., Ltd.
  • Pigment Black 7 (Rikibon Black C.I.No. 77266)
  • pigments examples include "Pigment Handbook, edited by Japan Pigment Technology Association, Seibundo Shinkosha, 1989", “COLOUR I NDEX, THE SOCIETY OF DYES & C0L03 ⁇ 4IST, THIRD EDITION, 1987", and the like.
  • the product can be selected as appropriate by referring to.
  • the average particle size of the dye or pigment is usually 5 ⁇ m or less, preferably 1 ⁇ m or less. In the case of producing a color filter, it is preferable that the thickness is 0.5 m or less. It is preferable that the photosensitive resin composition further contains a thermal polymerization inhibitor in addition to the above components.
  • thermal polymerization inhibitors include, for example, hydroquinone, p-methoxyphenol, ⁇ -t-butylcatechol, 2,6-di-tert-butyl-p-cresol,?
  • Aromatic hydroxy compounds such as naphthol and pyrogallol, quinones such as benzoquinone and p-toluquinone, amines such as naphthylamine, pyridine, p-toluidine, phenothiazine, and aluminum of N-ditrosophenylhydroxylamine Salt or ammonium salt, chloranil, nitrobenzene, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenyl), 2-mercaptobe And Nsimidazole.
  • Aromatic hydroxy compounds such as naphthol and pyrogallol, quinones such as benzoquinone and p-toluquinone, amines such as naphthylamine, pyridine, p-toluidine, phenothiazine, and aluminum of N-ditrosophenylhydroxylamine Salt or ammonium salt, chlor
  • the photosensitive resin composition may further contain, if necessary, known additives such as a plasticizer, a surfactant other than the surfactant of the present invention, an adhesion promoter, a dispersant, a plasticizer, a sagging agent, and repelling. Agents, defoamers, flame retardants, brighteners, solvents and the like can be added.
  • the adhesion promoter include alkylphenol / formaldehyde novolak resin, polyvinylethylether, polyvinylisobutylether, polyvinylbutyral, polyisobutylene, styrene-butadiene copolymer rubber, butyl rubber, and vinyl chloride. Examples include vinyl acetate copolymers, chlorinated rubbers, acrylic resin-based pressure-sensitive adhesives, aromatic, aliphatic, or alicyclic petroleum resins, and silane coupling agents.
  • the layer thickness of the photosensitive resin layer formed from the photosensitive resin composition is 0.5 to 10111.
  • the range is preferable, and particularly the range of 1 to 5 m is preferable.
  • the photosensitive resin layer can be obtained, for example, by dispersing a mixture of a colorant and a resin and then mixing other materials.
  • the image forming material of the present invention includes, for example, applying an alkali-soluble coating solution for forming a thermoplastic resin layer on the support, drying the coating solution, forming a thermoplastic resin layer, and forming the thermoplastic resin layer on the thermoplastic resin layer.
  • the photosensitive resin layer can be obtained by applying a coating solution for forming a photosensitive resin layer which does not dissolve the thermoplastic resin layer, and then drying the coating to form a photosensitive resin layer.
  • An oxygen barrier layer may be provided between the thermoplastic resin layer and the photosensitive resin layer.
  • a thermoplastic resin layer is provided on a support, and a coating solution for forming an oxygen barrier layer using a solvent that does not dissolve the thermoplastic resin layer is applied thereon, and then dried to provide an oxygen barrier layer.
  • the photosensitive resin layer can be formed by applying a coating solution for forming a photosensitive resin layer using a solvent that does not dissolve the oxygen barrier layer, drying the coating solution, and providing a photosensitive resin layer.
  • a photosensitive resin layer is provided on a coating sheet to be described later, while a thermoplastic resin layer and an oxygen barrier layer are provided on a support so that the oxygen barrier layer and the photosensitive resin layer are in contact with each other.
  • a photosensitive resin layer and an oxygen-blocking layer may be provided on the cover sheet, while a thermoplastic resin layer may be provided on the support, and the same as described above. It can be manufactured by laminating so as to be in contact with the resin layer.
  • Each of the above-mentioned alkali-soluble thermoplastic resin layer, oxygen barrier layer and photosensitive resin layer may be provided with a coating solution for forming each layer (usually by dissolving the composition in an organic solvent) by a known method. It can. For example, apply the coating liquid for forming each layer using a coating machine such as a spinner, a wheeler, a roller, a roller, a roller, a roller, a knife coater, a wire bar coater, or an extender. It can be formed by drying.
  • a coating machine such as a spinner, a wheeler, a roller, a roller, a roller, a roller, a roller, a knife coater, a wire bar coater, or an extender. It can be formed by drying.
  • At least the photosensitive resin layer is spin-coated by a spinner, and it is more preferable that all coating layers are spin-coated.
  • Coating conditions layer thickness but is appropriately set according to the composition or the like, usually, dropwise 1 0 ⁇ 7 0 0 ml of the coating solution per 1 m 2 in the center, spin at 1 0 0 ⁇ 1 0 0 0 rpm There is a method of coating.
  • Solvents used for preparing the coating liquid for forming each layer include methylethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, ethyl lactate, methyl lactate, and propylprolac. Evening can be mentioned.
  • the cover sheet may be made of the same or similar material as the support, but can be easily separated from the photosensitive resin layer.
  • a material used for the covering sheet for example, silicone paper, polyolefin sheet, polytetrafluoroethylene sheet, or the like is preferable.
  • the thickness of the covering sheet is usually
  • a photosensitive resin layer of an image forming material is bonded to a permanent support such as a glass substrate, and the support is peeled off, an unpleasant electric shock is applied between the charged support (film) and the human body. There is a problem that dust adheres to the charged support.
  • the conductive layer is provided on the side opposite to the support (the side having no photosensitive resin layer), it is preferable to provide a hydrophobic polymer layer in order to improve scratch resistance.
  • the production of a multicolor image sheet of the same color using the image forming material of the present invention can be carried out, for example, as follows.
  • the red, green, and blue pixels are formed by transferring the red photosensitive resin layer to the substrate surface using an image forming material having a red photosensitive resin layer for red pixels, exposing the image to light, and developing the red. This is done by forming pixels of the same color, and forming each pixel in the same manner for green and blue.
  • any arrangement such as a mosaic type, a triangle type, and a four-pixel arrangement type may be used.
  • the upper surface of each pixel of the pixel sheet and a gap region between the pixels are transferred to the substrate surface using the image forming material having the black photosensitive resin layer. From) and develop to form a black matrix. The uncured part is cured by heating the image sheet. Do).
  • the image forming material of the present invention is attached to the substrate surface by removing the covering sheet on the photosensitive resin layer of the image forming material, then superimposing the image forming material on the substrate surface, and applying pressure and heating.
  • Will be A known laminator such as a laminator, a vacuum laminator, and an autocutter laminator that can increase productivity can be used for lamination.
  • the photosensitive resin layer is exposed through a predetermined mask, a thermoplastic resin layer and an oxygen blocking layer, and then the unexposed area is removed (development).
  • the light source used for the above exposure is selected according to the light sensitivity of the photosensitive resin layer.
  • known devices such as an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc lamp, and an argon laser can be used.
  • an optical filter having a light transmittance of 2% or less at a wavelength of 400 nm or more may be used in combination.
  • a dilute aqueous solution of an alkaline substance is used, and a solution in which a small amount of an organic solvent miscible with water may be used.
  • Suitable alkali substances include alkali metal hydroxides (eg, sodium hydroxide, potassium hydroxide), alkali metal carbonates (eg, sodium carbonate, lithium carbonate), alkali metal bicarbonates (eg, , Sodium bicarbonate, lithium bicarbonate), alkali metal silicates (eg, sodium silicate, potassium silicate) alkali metal metasilicates (eg, sodium metasilicate, potassium metasilicate), triethanol Examples include min, diethanolamine, monoethanolamine, morpholine, tetraalkylammonium hydroxides (eg, tetramethylammonium hydroxide) and trisodium phosphate.
  • the concentration of the alkaline substance is preferably from 0.01 to 30% by mass, and the pH is preferably from 8 to 14.
  • Suitable organic solvents that are miscible with water include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethyl ether.
  • Lenglycol mono n-butyl ether, benzyl alcohol, acetone, methyl Rutyl ketone, cyclohexanone, £ -prolactone, r-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, caprolactam, N-methylpyrrolidone Can be mentioned.
  • the concentration of the organic solvent miscible with water is generally 0.1 to 30% by mass.
  • a known surfactant can be added to the developer.
  • the developer can be used as a bath solution or as a spray solution.
  • a method such as rubbing with a rotating brush or a wet sponge in the developer, or a method that uses the spray pressure when the developer is sprayed. can do.
  • the temperature of the developer is preferably from about room temperature to 40.
  • a water washing step can be added after the development processing.
  • the alkali-soluble thermoplastic resin layer, oxygen barrier layer and photosensitive resin layer may be treated at the same time, but uneven development and deterioration of the layer due to the developer during development of the photosensitive resin layer may be prevented.
  • the photosensitive resin layer In order to reduce the amount, it is preferable to develop the photosensitive resin layer after dissolving and removing the thermoplastic resin layer and the oxygen barrier layer which are soluble in water.
  • select a developer that does not degrade the photosensitive resin layer which is used to remove the thermoplastic resin layer and oxygen barrier layer that are completely soluble.
  • the developer is selected in consideration of the dissolution rate difference between the thermoplastic resin layer and the oxygen barrier layer, which are soluble in the resin, and the photosensitive resin layer, or the liquid temperature, spray pressure, and rubbing are selected. It can be performed by appropriately combining development processing conditions such as pressure at that time. With this method, uneven development can be suppressed.
  • heat treatment is performed. That is, the support having the photosensitive resin layer photocured by the exposure is heated in an electric furnace or a drier, or the photosensitive resin layer is heated by irradiating an infrared lamp.
  • the heating temperature and time depend on the composition and thickness of the photosensitive resin layer, but generally, about 120 to 250 ° C and about 1 to obtain sufficient solvent resistance and alkali resistance. Preferably, heating is performed for 0 to 300 minutes.
  • the image-forming material of the present invention can be basically advantageously used for producing a multicolor image such as a color-filled image, etc.
  • an interlayer insulating film, a printed wiring board, an intaglio It can be used for letterpress printing plates, name plates, color pull-offs, offset printing plates, screen printing stencils, and the like.
  • a printed wiring board a known copper-clad laminate is usually used as the substrate.
  • FIG. 1 is a cross-sectional view illustrating an example of a layer configuration of an image forming material.
  • Example 1 Example 11-1 to Example 1-1-5
  • Comparative Example 1 Comparative Example 1 (Comparative Example 1-1-1-4)
  • thermoplastic resin layer (C11-C11-10) Preparation of coating liquid C11 for forming thermoplastic resin layer
  • thermoplastic resin layer having the following composition C111 was prepared.
  • composition of coating liquid for forming thermoplastic resin layer C1-11 Composition of coating liquid for forming thermoplastic resin layer C1-11:
  • thermoplastic resin layer (Use as a 20% by mass solution of methyl isobutyl ketone, and the number of solutes.) Preparation of coating liquid C 1 2 to 1 1 7 for forming thermoplastic resin layer
  • the kind and the amount of the surfactant for the present invention were changed as shown in Table 1-2.
  • thermoplastic resin layer In the preparation of the coating liquid C1-1 for forming the thermoplastic resin layer, it was prepared without using the surfactant for the present invention.
  • thermoplastic resin layer In preparing the coating solution C1-1 for forming the thermoplastic resin layer, instead of the surfactant for the present invention, Megafac F142-D (manufactured by Dainippon Ink and Chemicals, Inc.) was used in an amount of solid parts by mass. And prepared similarly.
  • Megafac F142-D manufactured by Dainippon Ink and Chemicals, Inc.
  • a coating solution for forming a red photosensitive resin layer having the following composition R11 was prepared.
  • the type and the amount of the surfactant for the present invention were changed as shown in Tables 13 to 13.
  • the coating solution was prepared without using the surfactant for the present invention.
  • the coating solution is applied on a support (PET) by spin coating at 2 Oml / m 2, and dried at 5 m / min for 60 seconds at 60 ° C. Measure the part without unevenness, the part with high concentration and the part with low concentration with a densitometer and compare.
  • the change in concentration is greater than 5%.
  • the thickness is measured when the dried film thickness is provided on the support so as to be a predetermined value, and the change width between the maximum value, the minimum value, and the average value is examined.
  • thermoplastic resin layer On a support of 50 m thick polyethylene terephthalate film, Table 1-4 The coating liquid for forming a thermoplastic resin layer described above was spin-coated and dried to provide an alkali-soluble thermoplastic resin layer having a dry film thickness of 20 ⁇ m. Next, a coating solution having the following composition P1 was spin-coated on the thermoplastic resin layer and dried, to provide an oxygen barrier layer having a dry film thickness of 1.6.
  • composition of coating solution for forming oxygen barrier layer P 1 Composition of coating solution for forming oxygen barrier layer P 1:
  • the coating liquid for forming the red photosensitive resin layer shown in Table 1-4 is spin-coated, and dried. A 2 / m red photosensitive resin layer was formed, and a polypropylene (12 m thick) covering sheet was pressed on the red photosensitive resin layer to produce an image forming material.
  • the red photosensitive resin layer was exposed through a photomask (negative image of a square pixel having a side of 20 to 60 m) using an ultra-high pressure mercury lamp. The exposure amount was 2 OmJ / cm 2 . Thereafter, the thermoplastic resin layer and the oxygen barrier layer were dissolved and removed in 30 seconds using a 1% aqueous solution of triethanolamine. At this time, the photosensitive resin layer was not substantially imaged. Next, the photosensitive resin layer was developed using a 1% aqueous solution of sodium carbonate to remove unexposed portions, thereby forming a red pixel (R) pattern. The glass substrate having the red pixels was heated at 220 ° C for 130 minutes to sufficiently cure the pixel portions, and a color filter consisting of only the red pixels was obtained.
  • a photomask negative image of a square pixel having a side of 20 to 60 m
  • the exposure amount was 2 OmJ / cm 2 .
  • the thermoplastic resin layer and the oxygen barrier layer were dissolved and removed in 30 seconds using
  • the practical level is C or higher.
  • thermoplastic resin layer having the following composition C2 is spin-coated on a 100-zm-thick polyethylene terephthalate film support, dried, and dried to a dry thickness of 20 zm.
  • a soluble thermoplastic resin layer was provided.
  • composition of coating liquid for forming thermoplastic resin layer C 2 Composition of coating liquid for forming thermoplastic resin layer C 2:
  • composition of coating solution for forming oxygen barrier layer P 2 Composition of coating solution for forming oxygen barrier layer P 2:
  • a coating solution for forming a red photosensitive resin layer composed of the following compositions R 1-11 and a composition G 1 respectively.
  • a green photosensitive resin layer forming coating solution, a blue photosensitive resin layer forming coating solution having a composition B1, and a black photosensitive resin layer forming coating solution having a composition K1 are spin-coated and dried.
  • a photosensitive resin layer of each color having a dry film thickness of 2 zm was formed, and a polypropylene (12 zm thick) covering sheet was pressed on the photosensitive resin layer to prepare an image forming material.
  • composition of coating solution for forming red photosensitive resin layer R 1-11 Composition of coating solution for forming red photosensitive resin layer R 1-11:
  • composition of coating solution for forming green photosensitive resin layer G 1 (Used as a 20% by mass solution of methyl isobutyl ketone and the number of solutes) Composition of coating solution for forming green photosensitive resin layer G 1:
  • composition R 1-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irgazine red BPT was replaced with 5.6 parts of copper phthalocyanine.
  • composition of coating solution for forming blue photosensitive resin layer B 1 Composition of coating solution for forming blue photosensitive resin layer B 1:
  • composition R 1-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irgazine red BPT was replaced with 5.2 parts of Sudan blue.
  • composition of coating solution for forming black photosensitive resin layer K 1 Composition of coating solution for forming black photosensitive resin layer K 1:
  • composition of the coating solution for forming a red photosensitive resin layer in 1-11, 5.4 parts of irginazine red BPT was replaced with 10.0 parts of carbon black.
  • the coating solutions for forming the photosensitive resin layers were prepared by the following methods.
  • dispersions of three kinds of pigments having respective hues were prepared by the following method. 360 g of each of the above pigments, 36 g of a dispersing agent (SOLSPACE 24000, manufactured by Zeneca), and 740 g of a binder resin solution (40% by mass of the above-mentioned benzyl methacrylate / methacrylic acid copolymer in methyl acetate solv acetate solution) were kneaded. (Moriyama Seisakusho s1-1) for 30 minutes to obtain a pigment composition.
  • a dispersing solvent methyl acetate soup acetate
  • a media mill (Dinomill KDL-PILOT, manufactured by Wheelie Eva-Ko-Hen).
  • erythritol tetraacrylate, Michler's ketone and the like was added to obtain the above composition.
  • a color filter was prepared by the following method.
  • the photosensitive resin layer was not substantially developed.
  • the photosensitive resin layer was developed using a 1% aqueous solution of sodium carbonate to remove unexposed portions (unnecessary portions), thereby forming a red pixel (R) pattern on a glass substrate.
  • the green image forming material was bonded, peeled, exposed, and developed in the same manner as above to form a green pixel pattern.
  • the same process was repeated with a blue image forming material and a black image forming material to form a color filter on a transparent glass substrate. In these steps, the adhesion between the glass substrate and the photosensitive resin layer was good.
  • the coating surface is smooth with no coating unevenness, the layer thickness is uniform, there is no color unevenness, there is no foaming, the defoaming property is excellent, and glass is used. It is possible to provide a coating solution having excellent substrate adhesion and an image forming material carrying the same.
  • Example 2 Example 2-1 to Example 2-15
  • Comparative Example 2 Comparative Example 2-1 to Comparative Example 2-4
  • composition was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S2-1 for the present invention in the composition C11 of the coating liquid for forming a thermoplastic resin layer.
  • the kind and amount of the surfactant for the present invention were changed as shown in Table 2-2.
  • thermoplastic resin layer In the preparation of the coating liquid C2-1 for forming the thermoplastic resin layer, it was prepared without using the surfactant for the present invention.
  • thermoplastic resin layer In preparing the coating liquid C 2-1 for forming the thermoplastic resin layer, instead of the surfactant for the present invention, Megafac; F 142-1) (manufactured by Dainippon Ink and Chemicals, Inc.) in solid content and the like was used. It was similarly prepared using parts by mass.
  • a red photosensitive resin layer forming coating solution was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S2-1 for the present invention in the composition R111.
  • coating solution R 2-8 for red photosensitive resin layer formation In the preparation of the red photosensitive resin layer forming coating solution R 211, it was prepared without using the surfactant for the present invention.
  • the performances of the coating liquid for forming a thermoplastic resin layer and the coating liquid for forming a red photosensitive resin layer prepared above were evaluated as follows, and the results are shown in Tables 2-2 and 2-3.
  • a coating liquid for forming a thermoplastic resin layer described in Table 2-4 is spin-coated on a support of a 50-m-thick polyethylene terephthalate film, dried, and alkali-soluble with a dry film thickness of 20 zm.
  • a suitable thermoplastic resin layer was provided.
  • the coating liquid having the composition P1 was spin-coated on the thermoplastic resin layer, and dried, to provide an oxygen barrier layer having a dry film thickness of 1.6 zm.
  • the coating liquid for forming the red photosensitive resin layer shown in Table 2-4 is spin-coated on the support having the thermoplastic resin layer and the oxygen barrier layer, and dried. A red photosensitive resin layer is formed, and a polypropylene is further formed on the red photosensitive resin layer.
  • An image forming material was prepared by pressing a cover sheet having a thickness of 12 ⁇ m.
  • thermoplastic resin layer comprising the composition C2 was spin-coated and dried, and the dried film thickness was 20 ⁇ m.
  • a coating solution for forming a thermoplastic resin layer comprising the composition C2 was spin-coated and dried, and the dried film thickness was 20 ⁇ m.
  • the dried film thickness was 20 ⁇ m.
  • a coating liquid having the above composition P2 was spin-coated on the thermoplastic resin layer and dried, thereby providing an oxygen barrier layer having a dry film thickness of 1.6 m.
  • the coating solution for forming the color photosensitive resin layer, the coating solution for forming the blue photosensitive resin layer having the composition B1, and the coating solution for forming the black photosensitive resin layer having the composition K1 are spin-coated, dried, and dried.
  • a photosensitive resin layer having a thickness of 2 m was formed for each color, and a cover sheet of polypropylene (12 m thick) was pressed on the photosensitive resin layer to produce an image forming material.
  • composition of coating solution for forming red photosensitive resin layer R 2-11 Composition of coating solution for forming red photosensitive resin layer R 2-11:
  • composition of coating solution for forming photosensitive resin layer G 1 is a composition of coating solution for forming photosensitive resin layer G 1:
  • composition R 2-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irazazine red BPT was replaced with 5.6 parts of copper phthalocyanine.
  • composition of coating solution for forming blue photosensitive resin layer B 1 Composition of coating solution for forming blue photosensitive resin layer B 1:
  • composition R 2-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irginazine red BPT was replaced with 5.2 parts of the stumbler.
  • composition of coating solution for black photosensitive resin ⁇ ⁇ layer K 1 Composition of coating solution for black photosensitive resin ⁇ ⁇ layer K 1:
  • composition R2-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irginazine red was replaced with 10.0 parts of carbon black.
  • Each of the coating solutions for forming a photosensitive resin layer was prepared in the same manner as in Example 1-15.
  • a color filter was prepared in the same manner as in Example 1-15. As a result, the adhesion between the glass substrate and the photosensitive resin layer was good.
  • Coating solutions R2-12, G2, B2 and K2 without the surfactant of the present invention were prepared from the compositions R2-11, G1, ⁇ 1 and ⁇ 1 of Examples 2-15. Then, a color filter was produced in the same manner as in Example 2-15. As a result, uneven coating occured. In addition, the performances of the coating solutions R2 12, G2, B2 and K2 were evaluated in the same manner as described above, and the results are shown in Tables 2-5. Table 2-5
  • Example 3 Example 3-1 to Example 3-15
  • Comparative Example 3 Comparative Example 3-1 to Comparative Example 3-4
  • thermoplastic resin layer Preparation of coating liquid C3 (C3-1-C3-10) for forming thermoplastic resin layer
  • thermoplastic resin layer It was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S3-1 for the present invention in the composition C11-1 of the coating solution for forming a thermoplastic resin layer. Preparation of coating liquid C3-2 to C3-7 for forming thermoplastic resin layer
  • the kind and the amount of the surfactant for use in the present invention were changed as shown in Table 3-2.
  • thermoplastic resin layer In the preparation of the coating liquid C31 for forming the thermoplastic resin layer, it was prepared without using the surfactant for the present invention.
  • a fluorine-based surfactant A was used similarly in place of the surfactant for the present invention.
  • thermoplastic resin layer instead of the surfactant for the present invention, Megafac F 142-D (manufactured by Dainippon Ink and Chemicals, Inc.) was used in an equivalent mass part by solid content. And prepared similarly.
  • a red photosensitive resin layer forming coating solution was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S31 for the present invention in the composition R111.
  • the performance of the coating liquid for forming a thermoplastic resin layer and the coating liquid for forming a red photosensitive resin layer prepared above was evaluated as follows, and the results are shown in Tables 3-2 and 3-3.
  • thermoplastic resin layer as described in Table 3-4 is spin-coated on a 50-zm-thick polyethylene terephthalate film support and dried, and the alkali-soluble alkali having a dry film thickness of 20 21 is dried.
  • a suitable thermoplastic resin layer was provided.
  • the coating liquid having the composition P1 was spin-coated on the thermoplastic resin layer, and dried, to provide an oxygen barrier layer having a dry film thickness of 1.6 ⁇ m.
  • the coating liquid for forming a red photosensitive resin layer described in Table 3-4 is spin-coated on the support having the thermoplastic resin layer and the oxygen barrier layer, and dried. After forming a conductive resin layer, a cover sheet of polypropylene (thickness: 12 m) was pressed on the red photosensitive resin layer to prepare an image forming material.
  • thermoplastic resin layer comprising the above-mentioned composition C3 is spin-coated on a 100 / m-thick polyethylene terephthalate film support, dried, and dried.
  • a soluble thermoplastic resin layer was provided.
  • the coating liquid having the composition P2 was spin-coated on the thermoplastic resin layer and dried to form an oxygen barrier layer having a dry film thickness of 1.6 zm.
  • a coating solution for forming a red photosensitive resin layer composed of the following composition R 3-11 and a green photosensitive resin composed of the composition G1 The coating liquid for forming a layer, the coating liquid for forming a blue photosensitive resin layer composed of composition B1, and the coating liquid for forming a black photosensitive resin layer composed of composition K1 are spin-coated, dried, and dried. An Aim photosensitive resin layer was formed, and a polypropylene (12 zm thick) covering sheet was pressed onto the photosensitive resin layer to produce an image forming material.
  • composition of coating solution for forming red photosensitive resin layer R 3-11: The composition was prepared in the same manner as in the composition R 1-11 of the coating solution for forming a red photosensitive resin layer, except that the surfactant S1-2 for the present invention was changed to the surfactant S2-2 for the present invention.
  • composition R 3-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irginazine red BPT was replaced with 5.6 parts of copper phthalocyanine.
  • composition of coating solution for forming blue photosensitive resin layer B 1 Composition of coating solution for forming blue photosensitive resin layer B 1:
  • composition R3-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irginazine red BPT was replaced with 5.2 parts of sudapure.
  • composition of coating solution for forming black photosensitive resin layer K 1 Composition of coating solution for forming black photosensitive resin layer K 1:
  • composition R3-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of the irginazine blade BPT was replaced with 10.0 parts of a carbon black.
  • Example 1-15 Using the above image forming material, a color filter was produced in the same manner as in Example 1-15, and as a result, the adhesion between the glass substrate and the photosensitive resin layer was good.
  • Coating solutions R3-12, G2, B2 and K2 without the surfactant of the present invention were prepared from the compositions R3-11, Gl, B1 and K1 of Examples 3-15.
  • a color filter was produced in the same manner as in Example 3-15.
  • coating unevenness occurred.
  • the performances of coating solutions R3-12, G2, B2 and K2 were evaluated in the same manner as described above, and the results are shown in Table 3-5. Table 3-5
  • Example 4 (Example 4-1 to Example 4-15), Comparative Example 2 (Comparative Example 4-1 to Comparative Example 4-1-4)
  • thermoplastic resin layer It was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S4-1 for the present invention in the composition C11 of the coating liquid for forming a thermoplastic resin layer. Preparation of coating liquid C42-C47 for forming thermoplastic resin layer
  • the type and amount of the surfactant for the present invention were changed as shown in Table 4-2.
  • thermoplastic resin layer In the preparation of the coating liquid C4-1 for forming the thermoplastic resin layer, it was prepared without using the surfactant for the present invention.
  • thermoplastic resin layer In the preparation of the coating liquid C4-1 for forming the thermoplastic resin layer, the same procedure was carried out except that a fluorine-based surfactant A was used instead of the surfactant for the present invention.
  • thermoplastic resin layer instead of the surfactant for the present invention, Megafac F 142-D (manufactured by Dainippon Ink and Chemicals, Inc.) was used in an equivalent mass part by solid content. And prepared similarly.
  • a red photosensitive resin layer forming coating solution was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S4-1 for the present invention in the composition R1-1.
  • the red photosensitive resin layer forming coating solution R411 was prepared without using the surfactant of the present invention.
  • red photosensitive resin layer forming coating solution R4-1 was prepared in the same manner as above except that the surfactant A was used instead of the surfactant for the present invention.
  • Coating solution for forming a red photosensitive resin layer In the preparation of 4-1, instead of the surfactant for the present invention, Megafac F 142-D (manufactured by Dainippon Ink and Chemicals, Inc.) was used in solid amount and the like. It was similarly prepared using parts by mass.
  • Megafac F 142-D manufactured by Dainippon Ink and Chemicals, Inc.
  • the performances of the coating liquid for forming a thermoplastic resin layer and the coating liquid for forming a red photosensitive resin layer prepared above were evaluated as follows, and the results are shown in Tables 4-2 and 413.
  • a fixed area was applied, and the presence or absence of cissing with a diameter of 2 mm or more was examined visually or with a loupe.
  • a coating liquid for forming a thermoplastic resin layer described in Table 4-4 is spin-coated on a 50-m-thick polyethylene terephthalate film support, dried, and dried to a dry film thickness of 20 m.
  • a soluble thermoplastic resin layer was provided.
  • the coating liquid having the composition P1 was spin-coated on the thermoplastic resin layer, and dried, to provide an oxygen barrier layer having a dry film thickness of 1.6 m.
  • the coating liquid for forming the red photosensitive resin layer described in Table 4-4 is spin-coated on the support having the thermoplastic resin layer and the oxygen barrier layer, and dried. A red resin layer is formed on the red photosensitive resin layer.
  • An image forming material was prepared by pressing a cover sheet having a thickness of 12 ⁇ m.
  • thermoplastic resin layer comprising the composition C4 was spin-coated, and dried, and the dried film having a thickness of 20 m was obtained.
  • a thermoplastic resin layer which was soluble was provided.
  • a coating liquid having the above composition P2 was spin-coated on the thermoplastic resin layer and dried, thereby providing an oxygen barrier layer having a dry film thickness of 1.6 m.
  • Coating solution for forming a photosensitive resin layer, a coating solution for forming a blue photosensitive resin layer composed of composition B1, And a coating solution for forming a black photosensitive resin layer having the composition K1 is spin-coated and dried to form a photosensitive resin layer having a dry film thickness of 2 ⁇ m for each color, and further on the photosensitive resin layer.
  • An image forming material was prepared by pressing a cover sheet of polypropylene (12 m thick).
  • composition of coating solution for forming red photosensitive resin layer R4-11 Composition of coating solution for forming red photosensitive resin layer R4-11:
  • composition of the coating solution for forming the color photosensitive resin layer G1 was prepared in the same manner as in the composition R 1-11 of the coating solution for forming a red photosensitive resin layer except that the surfactant S1-2 for the present invention was changed to the surfactant S4-2 for the present invention.
  • composition R4-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irgazine red BPT was replaced with 5.6 parts of copper phthalocyanine.
  • composition of coating solution for forming blue photosensitive resin layer B 1 Composition of coating solution for forming blue photosensitive resin layer B 1:
  • composition R4-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irgazine red BPT was replaced with 5.2 parts of Sudamble.
  • composition of coating solution for forming black photosensitive resin layer K 1 Composition of coating solution for forming black photosensitive resin layer K 1:
  • composition R4-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of Irgazine Red BPT was replaced with 10.0 parts of carbon black.
  • Example 1-15 Using the above image forming material, a color filter was produced in the same manner as in Example 1-15. As a result, the adhesion between the glass substrate and the photosensitive resin layer was good.
  • Example 4-15 Compositions R4-11, Gl, B1, and K1 with no surfactant added for the present invention; R4-12, G2, B2, and K2 were prepared. Then, in the same manner as in Examples 4 to 15, a color fill filter was prepared. As a result, coating unevenness occurred. Further, the performances of the coating solutions R4-12, G2, B2 and K2 were evaluated in the same manner as described above, and the results are shown in Table 415. Table 4-5
  • Example 5 (Example 5-1 to Example 5-15), Comparative Example 5 (Comparative Example 5-1 to Comparative Example 5-4)
  • composition was prepared in the same manner as in the composition C11 of the coating liquid for forming a thermoplastic resin layer, except that the surfactant S1-1 for the present invention was changed to the surfactant S5-1 for the present invention.
  • the type and amount of the surfactant for the present invention were changed as shown in Table 5-2.
  • thermoplastic resin layer In the preparation of the coating liquid C511 for forming a thermoplastic resin layer, it was prepared without using the surfactant for the present invention.
  • a fluorine-based surfactant A was used similarly in place of the surfactant for the present invention.
  • thermoplastic resin layer In preparing the coating liquid C511 for forming the thermoplastic resin layer, instead of the surfactant for the present invention, Megafac F142-D (manufactured by Dainippon Ink and Chemicals, Inc.) was used in solid content. It was similarly prepared using parts by mass.
  • Megafac F142-D manufactured by Dainippon Ink and Chemicals, Inc.
  • a red photosensitive resin layer forming coating solution was prepared in the same manner except that the surfactant S1-1 for the present invention was changed to the surfactant S511 for the present invention in the composition R1-1.
  • the type and the amount of the surfactant for the present invention were changed as shown in Table 5-3.
  • the red photosensitive resin layer forming coating solution R5-1 was prepared without using the surfactant of the present invention.
  • coating solution R5-9 for red photosensitive resin layer formation In the preparation of the red photosensitive resin layer forming coating solution R5-1, the same preparation was carried out except that the surfactant A was used instead of the surfactant for the present invention.
  • the performances of the coating liquid for forming a thermoplastic resin layer and the coating liquid for forming a red photosensitive resin layer prepared above were evaluated as follows, and the results are shown in Tables 5-2 and 5-3.
  • a coating liquid for forming a thermoplastic resin layer described in Table 5-4 is spin-coated on a support of a 50 m-thick polyethylene terephthalate film, dried, and dried to a dry thickness of 20 Aim.
  • a soluble thermoplastic resin layer was provided.
  • the coating liquid having the composition P1 was spin-coated on the thermoplastic resin layer, and dried, to provide an oxygen barrier layer having a dry film thickness of 1.6 m.
  • the coating liquid for forming a red photosensitive resin layer described in Table 5-4 is spin-coated on the support having the thermoplastic resin layer and the oxygen barrier layer, and dried. A photosensitive resin layer was formed, and a cover sheet of polypropylene (12 m thick) was pressed on the red photosensitive resin layer to produce an image forming material.
  • thermoplastic resin layer comprising the composition C5 is spin-coated on a 100 / m-thick polyethylene terephthalate film support, dried, and dried.
  • a soluble thermoplastic resin layer was provided.
  • a coating solution having the above composition P2 was spin-coated on the thermoplastic resin layer and dried to form an oxygen barrier layer having a dry film thickness of 1.61.
  • the coating liquid for forming, the coating liquid for forming the blue photosensitive resin layer composed of the composition B1, and the coating liquid for forming the black photosensitive resin layer composed of the composition K1 are spin-coated and dried, and the dried film thickness is 2 m.
  • a photosensitive resin layer of each color was formed, and a cover sheet of polypropylene (thickness: 12 m) was pressed on the photosensitive resin layer to produce an image forming material.
  • composition of coating solution for forming red photosensitive resin layer R 5-11 C Green prepared in the same manner as in the composition R 1-11 of the coating solution for forming a red photosensitive resin layer except that the surfactant S 1-2 for the present invention was changed to the surfactant S 5-2 for the present invention.
  • composition R5-11 of the coating solution for forming a red photosensitive resin layer 5.4 parts of irginazine red BPT was replaced with 5.6 parts of copper fluorinine.
  • composition of coating solution for forming blue photosensitive resin layer B 1 Composition of coating solution for forming blue photosensitive resin layer B 1:
  • composition R 5-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irgazine red BPT was replaced with 5.2 parts of the stumbler.
  • composition of coating solution for forming black photosensitive resin layer K 1 Composition of coating solution for forming black photosensitive resin layer K 1:
  • composition R5-11 of the coating solution for forming the red photosensitive resin layer 5.4 parts of the irgazine red BPT was replaced with 10.0 parts of a car pump rack.
  • a color filter was prepared in the same manner as in Example 115, and as a result, the adhesion between the glass substrate and the photosensitive resin layer was good.
  • compositions of Examples 5-15; coating solutions R5-12, G2, B2 and K2 were prepared without adding the surfactant for the present invention in 5-11, G1, B1 and K1. Then, a color filter was produced in the same manner as in Examples 5 to 15. As a result, coating unevenness occurred.
  • the performances of the coating solutions R5-12, G2, B2 and K2 were evaluated in the same manner as described above, and the results are shown in Table 5-5. Table 5-5
  • the surfactant (5) for the present invention there is no coating unevenness, the coating surface is smooth, the layer thickness is uniform, there is no color unevenness, there is no cissing, no pinhole, and the glass substrate adhesion is excellent. It is possible to provide a coating solution and an image forming material carrying the same. Industrial applicability
  • the present invention can provide at least a coating solution having a smooth coating surface without coating unevenness and having excellent adhesion to a glass substrate, and an image forming material carrying the coating solution, and further having a uniform layer thickness.

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Abstract

L'invention concerne un matériau de formation d'image comprenant sur un support, dans l'ordre suivant, au moins une couche de résine thermoplastique soluble dans l'alcali et une couche de résine photosensible. Ce matériau est caractérisé en ce qu'au moins la couche de résine thermoplastique ou la couche de résine photosensible contient un copolymère renfermant un monomère spécifique. La présente invention permet d'obtenir un matériau de formation d'image au moins sans irrégularité de revêtement, présentant une surface de revêtement lisse et une excellente capacité de liaison au substrat de verre, ou d'obtenir un matériau de formation d'image caractérisé par une épaisseur de couche uniforme, sans irrégularité de couleur et présentant une excellente propriété antimousse, sans rétraction ni trous d'épingle.
PCT/JP2002/011582 2001-12-13 2002-11-06 Materiau de formation d'image WO2003050620A1 (fr)

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WO2006035949A1 (fr) * 2004-09-27 2006-04-06 Fujifilm Corporation Préparation pour traitement de surface, film optique, film antireflet, plaque polarisante, et dispositif d'affichage incluant ces composants
JP2006117915A (ja) * 2004-09-27 2006-05-11 Fuji Photo Film Co Ltd 塗布組成物、光学フィルム、反射防止フィルム、偏光板およびそれらを用いたディスプレイ装置
WO2007111356A1 (fr) * 2006-03-28 2007-10-04 Fujifilm Corporation Composition de résine photosensible, matière de transfert photosensible, paroi de séparation et procédé de formation de celle-ci, dispositif optique et procédé de fabrication de celui-ci et affichage
US10875322B2 (en) 2017-03-15 2020-12-29 Universite de Bordeaux Device and method for the deposition of particles on a target
EP3837111A1 (fr) * 2018-08-17 2021-06-23 SABIC Global Technologies B.V. Composition de film ayant une propriété de barrière contre l'oxygène améliorée et une faible sensibilité à l'humidité

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TW200739267A (en) * 2005-11-21 2007-10-16 Fujifilm Corp Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device
TWI416174B (zh) * 2006-06-01 2013-11-21 Nippon Steel & Sumikin Chem Co 濾色片用光阻組成物及其製造方法以及使用該組成物之濾色片
JP4993351B2 (ja) * 2007-02-23 2012-08-08 富士フイルム株式会社 光学フィルムの製造方法及び光学フィルム
JP4544370B2 (ja) * 2008-10-28 2010-09-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜及びマイクロレンズ、並びにそれらの製造方法
MY196431A (en) * 2015-07-30 2023-04-10 Hitachi Chemical Co Ltd Photosensitive Element, Resin Composition For Forming Barrier Layer, Method For Forming Resist Pattern, And Method For Producing Printed Wiring Board

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JPH10142779A (ja) * 1996-11-05 1998-05-29 Fuji Photo Film Co Ltd 感光性樹脂組成物及び感光性多層シート
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Publication number Priority date Publication date Assignee Title
WO2006035949A1 (fr) * 2004-09-27 2006-04-06 Fujifilm Corporation Préparation pour traitement de surface, film optique, film antireflet, plaque polarisante, et dispositif d'affichage incluant ces composants
JP2006117915A (ja) * 2004-09-27 2006-05-11 Fuji Photo Film Co Ltd 塗布組成物、光学フィルム、反射防止フィルム、偏光板およびそれらを用いたディスプレイ装置
US7906207B2 (en) 2004-09-27 2011-03-15 Fujifilm Corporation Coating composition, optical film, anti-reflection film, polarizing plate, and display unit using them
WO2007111356A1 (fr) * 2006-03-28 2007-10-04 Fujifilm Corporation Composition de résine photosensible, matière de transfert photosensible, paroi de séparation et procédé de formation de celle-ci, dispositif optique et procédé de fabrication de celui-ci et affichage
JP5159608B2 (ja) * 2006-03-28 2013-03-06 富士フイルム株式会社 感光性樹脂組成物、感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
US10875322B2 (en) 2017-03-15 2020-12-29 Universite de Bordeaux Device and method for the deposition of particles on a target
EP3837111A1 (fr) * 2018-08-17 2021-06-23 SABIC Global Technologies B.V. Composition de film ayant une propriété de barrière contre l'oxygène améliorée et une faible sensibilité à l'humidité

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