TW200739267A - Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device - Google Patents

Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device

Info

Publication number
TW200739267A
TW200739267A TW095142914A TW95142914A TW200739267A TW 200739267 A TW200739267 A TW 200739267A TW 095142914 A TW095142914 A TW 095142914A TW 95142914 A TW95142914 A TW 95142914A TW 200739267 A TW200739267 A TW 200739267A
Authority
TW
Taiwan
Prior art keywords
production method
transfer material
bulkhead
display device
optical element
Prior art date
Application number
TW095142914A
Other languages
Chinese (zh)
Inventor
Takeshi Ando
Naotaka Wachi
Koichi Kawamura
Yuichi Wakata
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200739267A publication Critical patent/TW200739267A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides a photosensitive transfer material having a temporary support, a surface processing layer including a fluorinated compound that has a polymerizable group, and a photosensitive resin layer brought into contact with the surface processing layer in that order.
TW095142914A 2005-11-21 2006-11-21 Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device TW200739267A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005336349 2005-11-21
JP2006162702 2006-06-12

Publications (1)

Publication Number Publication Date
TW200739267A true TW200739267A (en) 2007-10-16

Family

ID=38048734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142914A TW200739267A (en) 2005-11-21 2006-11-21 Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device

Country Status (5)

Country Link
JP (1) JP4913750B2 (en)
KR (1) KR20080070809A (en)
CN (1) CN101313249B (en)
TW (1) TW200739267A (en)
WO (1) WO2007058355A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9122090B2 (en) 2013-10-24 2015-09-01 Chunghwa Picture Tubes, Ltd. Transparent display device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080078645A (en) 2005-12-15 2008-08-27 아사히 가라스 가부시키가이샤 Fluorine-containing polymer, negative photosensitive composition and partition wall
JPWO2008149776A1 (en) * 2007-05-30 2010-08-26 旭硝子株式会社 Method for manufacturing a substrate on which partition walls and pixels are formed
JP5068603B2 (en) * 2007-08-22 2012-11-07 富士フイルム株式会社 Photosensitive transfer material, partition wall and method for forming the same, color filter and method for manufacturing the same, and display device
JP5523677B2 (en) * 2007-09-26 2014-06-18 富士フイルム株式会社 Pigment dispersion composition, photocurable composition, and color filter
US8192802B2 (en) 2007-09-26 2012-06-05 Fujifilm Corporation Photocurable coating composition, and overprint and process for producing same
JP5249588B2 (en) 2008-01-11 2013-07-31 東京応化工業株式会社 Colored photosensitive resin composition
JP5720395B2 (en) * 2011-04-20 2015-05-20 大日本印刷株式会社 Composition for forming protective layer for color filter with touch panel
KR102047231B1 (en) * 2012-12-10 2019-11-21 엘지디스플레이 주식회사 Electrophoretic display device and method of fabricating thereof
JP2017167171A (en) * 2014-08-05 2017-09-21 旭硝子株式会社 Photosensitive resin solution, forming method of patterned film and microprocessing method of fluorine-containing resin film
WO2017038587A1 (en) * 2015-08-31 2017-03-09 富士フイルム株式会社 Curable composition, method for manufacturing cured film, color filter, light-shielding film, solid-state imaging element, and image display device
KR102567855B1 (en) * 2017-05-31 2023-08-16 니폰 제온 가부시키가이샤 Touch sensor substrate and method for manufacturing the same, touch sensor member and method for manufacturing the same, and display device
WO2021014759A1 (en) * 2019-07-22 2021-01-28 三菱ケミカル株式会社 Photosensitive colored resin composition, cured object, bank, and image display device

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
JPH0762761B2 (en) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 Image forming material
JP2847720B2 (en) * 1988-09-20 1999-01-20 東レ株式会社 Photoresist film
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
JP2001013682A (en) * 1999-06-30 2001-01-19 Hitachi Chem Co Ltd Photosensitive element and production of color filter using the same
JP2002025432A (en) * 2000-07-04 2002-01-25 Hitachi Chem Co Ltd Manufacturing method of dielectric layer and partition- forming resin composite element, and plasma display panel substrate using them
US6740470B2 (en) * 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
CN1278183C (en) * 2001-12-13 2006-10-04 富士胶片株式会社 Image forming material
JP2003345026A (en) * 2002-05-24 2003-12-03 Tokyo Ohka Kogyo Co Ltd Coating liquid composition for formation of antireflection film, photoresist laminate by using the same, and method for forming photoresist pattern
JP4310970B2 (en) * 2002-06-17 2009-08-12 凸版印刷株式会社 Manufacturing method of color filter
JP3851594B2 (en) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 Anti-reflection coating composition and pattern forming method
JP4129543B2 (en) * 2002-08-08 2008-08-06 三菱樹脂株式会社 Protective film for dry film resist
JP2005064143A (en) * 2003-08-08 2005-03-10 Seiko Epson Corp Method of forming resist pattern, method of forming wiring pattern, method of manufacturing semiconductor device, electrooptic device, and electronic equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9122090B2 (en) 2013-10-24 2015-09-01 Chunghwa Picture Tubes, Ltd. Transparent display device
TWI507775B (en) * 2013-10-24 2015-11-11 Chunghwa Picture Tubes Ltd Transparent display device

Also Published As

Publication number Publication date
JP4913750B2 (en) 2012-04-11
WO2007058355A1 (en) 2007-05-24
KR20080070809A (en) 2008-07-31
CN101313249B (en) 2012-07-11
JPWO2007058355A1 (en) 2009-05-07
CN101313249A (en) 2008-11-26

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