JP5068603B2 - Photosensitive transfer material, partition wall and method for forming the same, color filter and method for manufacturing the same, and display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent air (air bubble) from being caught during pressure bonding (lamination) and suppress the occurrence of a chipping defect after development. <P>SOLUTION: A photosensitive transfer material has at least a thermoplastic resin layer and a photosensitive resin layer on a temporary support in this order from the temporary support side. The photosensitive resin layer contains at least a coloring material, a binder polymer, a monomer, and a polymerization initiator, and satisfies Tg(b)&times;(Mw(b)/10,000)&ge;215 (formula (1)) [Tg(b): glass transition temperature [&deg;C] of the binder polymer, and Mw(b): weight average molecular weight of the binder polymer]. The content of the monomer in the photosensitive resin layer is &le;35% by mass of the total solid content of the photosensitive resin layer. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to a photosensitive transfer material, a partition and a method for forming the same, a color filter and a method for manufacturing the same, and a display device.

  In recent years, with the development of personal computers and large-screen liquid crystal televisions, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing.

  Such a color filter usually includes coloring patterns of three primary colors of red (R), green (G), and blue (B), and the electrodes corresponding to the respective pixels of R, G, and B are turned on, By turning it off, the liquid crystal operates as a shutter, and light passes through each pixel of R, G, and B, and color display is performed.

As a conventional method for producing a color filter, for example, a dyeing method, an electrodeposition method, a method in which a pigment is dispersed in a thermosetting resin, R, G, and B are printed three times, and then the resin is thermoset. It has been known.
For example, in the dyeing method, first, a water-soluble polymer material, which is a dyeing material, is formed on a glass substrate, patterned into a desired shape by a photolithography process, and then the obtained pattern is immersed in a dyeing bath. To get a colored pattern. By repeating this three times, R, G, and B colored pixels (color filters) can be formed.

  Another method other than the above is a pigment dispersion method. In the pigment dispersion method, a photosensitive resin layer in which a pigment is dispersed is first formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. Further, by repeating this process three times, R, G, and B colored pixels (color filters) can be formed.

  In this pigment dispersion method, in addition to a method of directly patterning a photosensitive resin layer formed on a desired permanent support by coating a preparation liquid for forming a photosensitive resin layer, a temporary support is previously prepared. There is a method of patterning a photosensitive resin layer formed on a permanent support by using a transfer material having a photosensitive resin layer formed thereon and pressing the transfer material to the permanent support.

  On the other hand, when producing a color filter by the method such as the pigment dispersion method, it is necessary to repeat the same process in accordance with the number of hues such as R, G, and B. Therefore, as one of methods for eliminating the reduction in yield due to cost and repetition of the same process, a method of forming colored pixels by spraying colored ink using an inkjet method has been proposed (for example, Patent References 1-2). When forming colored pixels using the ink jet method, a wall (for example, a so-called black matrix) is formed in advance to divide an area where pixels of each color are to be formed, and a concave area surrounded by the black matrix. Pixels can be formed by discharging colored ink.

In addition, a technique of using a photosensitive resin composition containing a polymer having a predetermined glass transition temperature and a weight average molecular weight in a method for producing a color filter by non-wet peeling development is disclosed (for example, Patent Document 3). reference). Here, an image is transferred and formed by forming a composite in which a photosensitive resin layer made of a photosensitive resin composition is formed, and peeling and developing after exposure.
JP 59-75205 A Japanese Patent Application Laid-Open No. 2004-339332 JP-A-10-115919

However, when a wall, a colored pixel, or the like is formed using a transfer material having a thermoplastic resin layer and a photosensitive resin layer, the photosensitive resin layer is a permanent material having relatively high planarity, for example, when forming a pattern for the first color. Despite being pressed and transferred onto the surface of the support, it is easy to entrain bubbles (air) between the photosensitive resin layer and the support when the transfer material is pressed and laminated to the desired support. Depending on the properties of the photosensitive resin layer, the entrained bubbles remain without being removed, and the development is facilitated by the influence of the entrained bubbles, and defects such as defects in the shape of the developed wall and colored pixels are not possible. Defects) may occur.
In particular, when a wall such as a so-called black matrix is to be formed, this chipping defect may cause color mixing when trying to form pixels by spraying ink by, for example, the ink jet method. This is a factor that deteriorates color characteristics and display performance.

  Further, in the case where an image is peeled and formed by a composite using the predetermined photosensitive resin composition, even if bubbles are formed between the photosensitive resin layer, they tend to disappear over time, and development processing is required. Because the system does not, bubbles do not affect the chipped defect. However, with regard to entrainment of bubbles during thermocompression bonding (laminate), the content of the monomer is large, and in the range of 40% by weight or more, which is preferable, it is rather easy to entrap bubbles at the time of compression bonding, and it is difficult to avoid mixing of bubbles. In systems that require development processing, it is difficult to prevent the occurrence of chip defects.

  The present invention has been made in view of the above, and is a photosensitive resin transfer material in which air (bubbles) is difficult to be involved during pressure bonding (laminating) and chipping defects after development are prevented, and chipping defects are prevented from occurring. Another object of the present invention is to provide a color filter, a manufacturing method thereof, and a display device that can prevent color mixing, prevent color mixing, have good color characteristics, and have excellent display characteristics, and a display device.

Specific means for achieving the above object are as follows.
<1> On the temporary support, it has at least a thermoplastic resin layer and a photosensitive resin layer in order from the temporary support side, and the photosensitive resin layer has at least a colorant, a glass transition temperature (Tg ( b)) includes a binder polymer, a monomer, and a polymerization initiator that are 108 ° C. or higher and 140 ° C. or lower, satisfies the following formula (1), and the content of the monomer in the photosensitive resin layer is the photosensitive resin: The photosensitive transfer material has a total solid content of 35% by mass or less and a ratio (M / B) of the monomer (M) to the binder polymer (B) of 0.7 to 1.0.
Tg (b) × (Mw (b) / 10000) ≧ 215 (1)
[Tg (b): glass transition temperature of binder polymer [° C.], Mw (b): weight average molecular weight of binder polymer]

<2> The photosensitive transfer material according to <1>, wherein the content of the binder polymer is 30% by mass or more of the total solid content of the photosensitive resin layer.
<3> The photosensitive transfer material according to <1> or <2>, wherein the color material is a pigment.
<4> The binder polymer is a copolymer obtained by copolymerizing benzyl methacrylate, and the copolymerization ratio of the benzyl methacrylate is 20 mol% or less. Ru photosensitive transfer material der according to any one.

< 5 > A partition having a step of pressure-bonding the photosensitive transfer material according to any one of <1> to < 4 > to the permanent support so that the photosensitive resin layer is in contact with the permanent support. It is the formation method.
< 6 > The method for forming a partition wall according to < 5 >, further comprising a step of exposing and developing at least the photosensitive resin layer after pressure bonding.
< 7 > A partition wall formed by the method for forming a partition wall according to < 5 > or < 6 >.

< 8 > A method for producing a color filter, comprising: forming a partition wall by the method for forming a partition wall according to < 5 > or < 6 >, and forming a colored region between the formed partition walls.
< 9 > The method for producing a color filter according to < 8 >, wherein the colored region is formed by a method of applying a colored liquid composition between the partition walls by an inkjet method.
< 10 > A color filter produced by the method for producing a color filter according to < 8 > or < 9 >.
< 11 > A display device including the color filter according to < 10 >.

According to the present invention, it is possible to provide a photosensitive resin transfer material in which air (bubbles) is hardly involved during pressure bonding (laminating) and generation of chipping defects after development is suppressed. Also,
According to the present invention, there are provided a partition wall in which generation of a chip defect is prevented, a method for forming the partition wall, a color filter in which color mixing is prevented, color characteristics are excellent, and display characteristics are excellent, a manufacturing method thereof, and a display device. Can do.

  Hereinafter, the photosensitive transfer material of the present invention, the partition using the same, the forming method thereof, the color filter, the manufacturing method thereof, and the display device will be described in detail.

<Photosensitive transfer material>
The photosensitive transfer material of the present invention has at least a thermoplastic resin layer, at least a colorant, and a glass transition temperature (Tg (b)) of 108 ° C. or more and 140 ° C. or less on a temporary support in order from the temporary support side. A photosensitive resin layer containing at least a binder polymer, a monomer, and a polymerization initiator. The photosensitive resin layer satisfies the following mathematical formula (1) and the monomer in the photosensitive resin layer: The content is 35% by mass or less, and the ratio (M / B) of the monomer (M) to the binder polymer (B) is 0.7 or more and 1.0 or less. Moreover, the photosensitive transfer material of this invention may have other layers, such as an intermediate | middle layer, between a thermoplastic resin layer and the photosensitive resin layer as needed.

  The photosensitive transfer material of the present invention is suitable for forming, for example, a colored region (for example, a colored pixel) constituting a color filter, a partition having a shielding function such as a black matrix, and the like. (Hereinafter, also referred to as “pixel”), it can be suitably used as a transfer material for forming a partition partitioning a region to which ink is applied on a permanent support.

In the photosensitive transfer material of the present invention, the photosensitive resin layer as a constituent layer satisfies the following mathematical formula (1). The melt viscosity at the time of thermocompression bonding (laminating) of the photosensitive resin layer is liable to influence the mixing of bubbles. In the present invention, the glass transition temperature (Tg (b)) and the weight average molecular weight (Mw (Mw ( b)) is selected so as to satisfy the following formula (1) so that the melt viscosity of the photosensitive resin layer during heating can be maintained. Thereby, bubbles (air) existing after thermocompression bonding (laminate) are greatly reduced, and the effect of suppressing the occurrence of chipping defects in the subsequent development processing can be improved.
Tg (b) × (Mw (b) / 10000) ≧ 215 (1)
[Tg (b): glass transition temperature of binder polymer [° C.], Mw (b): weight average molecular weight of binder polymer]
By satisfying the above formula (1), particularly when a partition having a light shielding function such as a black matrix is formed, the influence of chip defects when forming a colored region by ink-jetting the concave region between the partitions. It is effective to obtain a color filter having good color characteristics and excellent display characteristics.

When the left side [Tg (b) × (Mw (b) / 10000)] of the formula (1) is less than 215, the melt viscosity at the time of thermocompression bonding of the photosensitive resin layer becomes too low, and bubbles are formed at the time of lamination. As a result, it becomes difficult to entrain the entrained bubbles, or the entrained bubbles become difficult to escape, and as a result, the portion where the bubbles are mixed in in the subsequent development processing is lost.
The left side [Tg (b) × (Mw (b) / 10000)] of Equation (1) is 215 or more, and preferably 230 or more.

  In the present invention, the glass transition temperature of the binder polymer in the photosensitive resin layer (the temperature obtained from the following when two or more types are included) is in the range of 70 to 140 ° C. (preferably 80 to 110 ° C.). And / or when the weight average molecular weight of the binder polymer in the photosensitive resin layer (the molecular weight determined from the following when two or more types are included) is in the range of 10,000 to 50,000 (preferably 15,000 to 40,000), The case where the numerical formula (1) is satisfied is preferable.

Here, the glass transition temperature [Tg (b)] of the binder polymer is measured using differential scanning calorimetry (DSC; manufactured by Seiko Instruments Inc.).
The weight average molecular weight [Mw (b)] is measured by gel permeation chromatography (GPC). Specifically, HLC-8120GPC, SC-8020 (manufactured by Tosoh Corporation) was used, and TSKgel, SuperHM-H (manufactured by Tosoh Corporation, 6.0 mm ID × 15 cm) were used as columns. Tetrahydrofuran (THF) was used as the eluent. The conditions are as follows: the sample concentration is 0.5 mass%, the flow rate is 0.6 ml / min, the sample injection amount is 10 μl, the measurement temperature is 40 ° C., and the RI detector is used. The calibration curve is “polystyrene standard sample TSK standard” manufactured by Tosoh Corporation: “A-500”, “F-1”, “F-10”, “F-80”, “F-380”, “A-2500”. , “F-4”, “F-40”, “F-128”, and “F-700”.

When the photosensitive resin layer contains two or more binder polymers, the glass transition temperature [Tg (b)] and the weight average molecular weight [Mw (b)] can be calculated by the weight average of each binder polymer. For example, if the photosensitive resin layer is a ¹ % by mass of polymer A (Tg = a ² ° C., weight average molecular weight = a ³ ) and b ¹ % by mass of polymer B (Tg = b ² ° C., weight average molecular weight = b ³ ) When the two kinds of the above are contained, the glass transition temperature is Tg (b) = (a ² × (a ¹ / (a ¹ + b ¹ )) + (b ² × (b ¹ / (a ¹ + b ¹ )) The weight average molecular weight is determined by Mw (b) = (a ³ × (a ¹ / (a ¹ + b ¹ )) + (b ³ × (b ¹ / (a ¹ + b ¹ )), respectively.

  In the present invention, mixing of bubbles during thermocompression bonding is suppressed by satisfying the mathematical expression (1). Here, “thermocompression bonding” means that the temperature is about 80 to 120 ° C. and the crimping force is 0. .About 0.05 to 3.0 MPa.

  Hereinafter, each layer, such as a thermoplastic resin layer and a photosensitive resin layer, constituting the photosensitive transfer material of the present invention will be described in detail.

-Thermoplastic resin layer-
The photosensitive transfer material of the present invention has at least one thermoplastic resin layer.
The thermoplastic resin layer is preferably alkali-soluble from the viewpoint of enabling alkali development and preventing the transfer target from being contaminated by the thermoplastic resin layer protruding during transfer.
In addition, when transferring a photosensitive resin layer to be described later onto the transfer target, it has a function as a cushioning material that effectively prevents transfer defects caused by unevenness present on the transfer target, The layer is a deformable layer corresponding to the unevenness on the transferred material when the photosensitive transfer material is heated and adhered onto the transferred material.

  In the present invention, the thickness of the thermoplastic resin layer is preferably 2 to 50 μm from the viewpoint of transferability. When the layer thickness is within the above range, peeling from the temporary support during transfer can be carried out satisfactorily without damaging the peeled surface, and a fine pattern can be formed with exposure failure due to thickness variation. The layer thickness is more preferably 5 to 40 μm, particularly preferably 10 to 30 μm.

  The thermoplastic resin layer can be configured using at least a thermoplastic resin, and can be configured using other components as needed.

  The thermoplastic resin is not particularly limited and can be appropriately selected. For example, a saponified product of ethylene and an acrylic ester copolymer, a saponified product of styrene and a (meth) acrylic ester copolymer, vinyl toluene, Saponified products such as (meth) acrylic acid ester copolymers, saponified products such as poly (meth) acrylic acid esters, and (meth) acrylic acid ester copolymers of butyl (meth) acrylate and vinyl acetate, etc. It is preferable that it is at least one selected from more.

In addition to the above, organic polymers that are soluble in an alkaline aqueous solution according to the "Plastic Performance Handbook" (edited by the Japan Plastics Industry Federation, edited by the All Japan Plastics Molding Industry Association, published by the Industrial Research Council, published on October 25, 1968) Can also be used.
As the thermoplastic resin contained in the thermoplastic resin layer, those in which the substantial softening point of the thermoplastic resin layer is 80 ° C. or less are preferable.

These thermoplastic resins may be used individually by 1 type, and may use 2 or more types together. In view of sufficient cushioning properties and ease of removal after transfer, it is preferable to use a mixture of resins having two different characteristics (preferably polymer P ^H and polymer P ^L described later).
In the present invention, “(meth) acrylic acid” is a generic term for acrylic acid and methacrylic acid, and the same applies to derivatives thereof.

Among the thermoplastic resins contained in the thermoplastic resin layer, a resin having a weight average molecular weight in the range of 50,000 to 500,000 (Tg = 0 to 140 ° C.) is preferable, and a weight average molecular weight is more preferably 60,000. It is resin which is the range of -200,000 (Tg = 30-110 degreeC). Specific examples of these resins include JP-B-54-34327, JP-B-55-38961, JP-B-58-12777, JP-B-54-25957, JP-A-61-134756, JP-B-59-1444615. JP, 54-92723, JP 54-99418, JP 54-137085, JP 57-20732, JP 58-93046, JP 59-97135, JP 60-159743, JP 60-247638, JP 60-208748, JP 60-214354, JP 60-230135, JP 60-258539, JP JP 61-1669829, JP 61-213213, JP 63-147159, JP 63-213837, JP 63-266448, JP 64- No. 5551, JP-A-64-15550, JP-A-2-191955, JP-A-2-199403, JP-A-2-199404, JP-A-2-208602, JP-A-5-241340 Examples of the resin soluble in an alkaline aqueous solution.
Particularly preferred is a methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer described in JP-A-63-147159.

  Moreover, on the low molecular side among various thermoplastic resins, a resin having a weight average molecular weight of preferably 3,000 to 30,000 (Tg = 30 to 170 ° C.), more preferably a weight average molecular weight of 4,000. It is resin which is the range of -20,000 (Tg = 60-140 degreeC). Specific examples of these can be selected from those described in the above-mentioned publications. Particularly preferred are styrene / polyethylene compounds described in JP-B-55-38961 and JP-A-5-241340. It is a (meth) acrylic acid copolymer.

Furthermore, a resin having two characteristics that are different as described above, specifically, it is preferable to use a mixture of a high molecular weight polymer P ^H and a low molecular weight polymer P ^L. Here, the low molecular weight polymer is a polymer having a weight average molecular weight of 3,000 or more and less than 12,000, and the high molecular weight polymer is a polymer having a weight average molecular weight of 12,000 or more.
The preferred form in terms of the ease of removal after transfer with sufficient cushioning property, the weight-average molecular weight of ^{P L} and weight average molecular weight of less than 5000 or 10000 is used in combination with ^{P H} of less than 50,000 120000 As a preferred example, a mixture of methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer (P ^H ) and styrene / (meth) acrylic acid copolymer (P ^L ) is used. Is mentioned.

  In addition to the thermoplastic resin, the thermoplastic resin layer includes various polymers and supercooling within the range where the softening point does not substantially exceed 80 ° C. for the purpose of adjusting the adhesive force with the temporary support as an additional component. Substances, adhesion improvers, surfactants, release agents and the like can be added. Adjustment of Tg by these is also possible. In addition, an organic polymer compound having a softening point of 80 ° C. or higher can be made to have a substantial softening point of 80 ° C. or lower by adding various plasticizers compatible with the polymer substance to the organic polymer compound. It can also be lowered.

  Specific examples of preferred plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, biphenyl diphenyl phosphate, polyethylene glycol mono (meth) acrylate, Polyethylene glycol di (meth) acrylate, polypropylene glycol mono (meth) acrylate, polypropylene glycol di (meth) acrylate, addition reaction product of epoxy resin and polyethylene glycol mono (meth) acrylate, organic diisocyanate and polyethylene glycol mono (meth) Addition reaction product with acrylate, organic diisocyanate and polypropylene glycol mono (meth) acrylate Addition reaction products of rate, phthalic acid diesters, may be mentioned condensation products of bisphenol A and polyethylene glycol mono (meth) acrylate.

  The combination of the thermoplastic resin and the plasticizer is preferably 1) methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, bisphenol A and Combination of condensation reaction products of polyethylene glycol mono (meth) acrylate, 2) Condensation reaction of methacrylic acid / benzyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, bisphenol A and polyethylene glycol mono (meth) acrylate Combination of products, 3) Combination of methacrylic acid / 2-ethylhexyl acrylate / benzyl methacrylate / methyl methacrylate copolymer, styrene / (meth) acrylic acid copolymer, phthalic acid diesters, 4) Meta Acrylic acid / benzyl methacrylate copolymer, a styrene / (meth) acrylic acid copolymer, a combination of phthalic acid diesters, and the like.

  The amount of the plasticizer in the thermoplastic resin layer is generally 200% by mass or less with respect to the thermoplastic resin, and the range of 20 to 100% by mass in that the softening of the thermoplastic resin layer can be easily controlled. Is preferred.

As the surfactant, any surfactant that can be mixed with a thermoplastic resin can be used.
As preferable surfactants, paragraphs [0015] to [0024] of JP-A No. 2003-337424, paragraphs [0012] to [0017] of JP-A No. 2003-177522, paragraph of JP-A No. 2003-177523, are disclosed. [0012] to [0015], paragraphs [0010] to [0013] of JP 2003-177521 A, paragraphs [0010] to [0013] of JP 2003-177519 A, and JP 2003-177520 A. The surfactants described in paragraphs [0012] to [0015], paragraphs [0034] to [0035] of JP-A No. 11-133600, and JP-A No. 6-16684 are preferable.

  In order to further improve the adhesion to the temporary support, a fluorosurfactant and / or a silicone surfactant (a fluorosurfactant or a silicone surfactant, both fluorine atoms and silicon atoms are added). It is preferable to contain any one of these, or two or more of these, and a fluorine-type surfactant is the most preferable.

  Moreover, the following commercially available surfactant can also be used as it is. Examples of commercially available surfactants that can be used include F-top EF301 and EF303 (manufactured by Shin-Akita Kasei Co., Ltd.), Florard FC430 and 431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFuck F-780-F, F171, Fluorosurfactants such as F173, F176, F189, R08 (manufactured by Dainippon Ink and Chemicals), Surflon S-382, SC101, 102, 103, 104, 105, 106 (manufactured by Asahi Glass Co., Ltd.) Or a silicon-type surfactant can be mentioned. Polysiloxane polymers KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) and Troisol S-366 (manufactured by Troy Chemical Co., Ltd.) can also be used as the silicon surfactant.

The melt viscosity (η _Cu ) at 100 ° C. of the thermoplastic resin layer is preferably 200 Pa · s to 3000 Pa · s, more preferably 200 Pa · s to 2000 Pa · s, and most preferably 500 Pa · s to 2000 Pa · s. is there.
When η _Cu is within the above range, it is effective in preventing the occurrence of chipping defects in the partition formed by the laminate, and also prevents the thermoplastic resin layer from protruding during transfer and the contamination of the laminate heat roll. The transfer can be performed satisfactorily, and the followability to the unevenness on the substrate can be ensured, and the close contact with the permanent support can be made good.

As a means for adjusting the melt viscosity η _Cu of the thermoplastic resin layer to the above range, there is a method of adjusting the content of the low molecular weight polymer and the content of the plasticizer in the polymer constituting the thermoplastic resin layer. is there. When the thermoplastic resin layer is softened and softened, it can be adjusted by methods such as (1) increasing the amount of plasticizer added, (2) increasing the content of low molecular weight polymers and decreasing the proportion of high molecular weight components. .

The content ratio of the high molecular weight polymer ^{P H} and a low molecular weight polymer ^{P L} in the polymer constituting the thermoplastic resin layer ^(P H / ^{P L),} is preferably less than 10/90 or 70/30, 12/88 The ratio is more preferably less than 60/40, and most preferably 15/85 or more and less than 50/50. When the content ratio is within the above range, it is effective for preventing the occurrence of chipping defects in the partition formed by the laminate, and it is possible to ensure the peelability and cushioning properties.

  As the addition amount in the case of adding a plasticizer, it is preferably 28 to 43 mass%, more preferably 30 to 40 mass%, based on the solid content of the resin component and the plasticizer contained in the thermoplastic resin layer, 32-38 mass% is particularly preferable. When the content of the plasticizer is within the above range, it is effective in reducing the viscosity of the thermoplastic resin layer to such an extent that it can prevent the occurrence of chipping defects in the partition walls formed by lamination and cushioning. It is possible to prevent the thermoplastic resin layer from protruding during transfer and contamination of the heat roll of the laminate due to this.

-Photosensitive resin layer-
The photosensitive transfer material of the present invention comprises at least one photosensitive resin layer on the side of the thermoplastic resin layer provided on the temporary support that does not face the temporary support. The photosensitive resin layer is a layer constituting the resin structure when a resin structure such as a partition is formed. In addition to a colored region (for example, a colored pixel) constituting the color filter, a black matrix as described later is used. It can form using the composition for forming the partition which has the shielding function of.

  The photosensitive resin layer of the photosensitive transfer material of the present invention is preferably configured to have a light shielding function such as a black matrix when the partition walls are formed. The partition walls can be manufactured using the same material as a known black matrix for a color filter. Known black matrixes for color filters include, for example, paragraph numbers [0021] to [0074] of JP-A-2005-3861 and paragraph numbers [0012] to [0021] of JP-A-2004-240039. Black matrix, black matrix for inkjet described in paragraph numbers [0015] to [0020] of JP-A No. 2006-17980 and paragraph numbers [0009] to [0044] of JP-A No. 2006-10875.

The structure of the photosensitive resin layer will be described in detail.
The photosensitive resin layer includes a color material, a binder polymer, a monomer, and a polymerization initiator, and can be configured using a polymerization inhibitor, a surfactant, and the like as necessary.

(Coloring material)
As the color material, a known colorant (dye, pigment, etc.) having a hue according to the purpose, such as red, blue, green, and black, can be appropriately selected and used. Specifically, pigments and dyes described in JP-A-2005-17716 [0038] to [0054], pigments described in JP-A-2004-361447 [0068] to [0072], JP-A-2005 The colorants described in JP-A-17521 [0080] to [0088] can be preferably used.

  The photosensitive resin layer preferably has a light shielding function. In this case, a black color material is suitably used as the color material. Among these, a pigment is preferable in terms of heat resistance and light resistance, and a black pigment is preferable when providing a light shielding function.

Examples of black pigments include carbonaceous black (carbon black, graphite, etc.), metal compounds (titanium black, etc.) and the like. As an example of carbon black, Pigment Black 7 (carbon black CI No. 77266) is preferable. Examples of titanium black include TiO ₂ , TiO, TiN, and mixtures thereof. Among these black pigments, carbon black is preferable in terms of excellent light shielding properties.

As content of the coloring material (preferably pigment) in the photosensitive resin layer, 10-50 mass% is preferable with respect to the total solid of the photosensitive resin layer. When the amount of the color material is within the above range, the film strength can be sufficiently maintained while providing a light shielding function.
The colorant is preferably a pigment content of 10 to 50% by mass, and more preferably 20 to 40% by mass in terms of light shielding function and film strength.

There are photosensitive resin layers that can be developed with an alkaline aqueous solution and those that can be developed with an organic solvent. In view of safety and the cost of the developer, those capable of developing with an aqueous alkali solution are preferred. Further, the photosensitive resin layer is more preferably photosensitive and developable with an aqueous alkaline solution, and can be constituted using a photopolymerizable composition.
The photopolymerizable composition constituting the “photosensitive resin layer having photosensitivity and developable with an aqueous alkali solution” includes an alkali-soluble binder polymer having an acid group such as a carboxylic acid group as a main component, and many Preferred examples include those containing a polymerizable or crosslinkable compound such as a functional acrylic monomer, and a photopolymerization initiator. When exposed, an initiator such as a radical is generated from the photopolymerization initiator, and the polymerisable or crosslinkable. It has the property that the exposure region is cured by causing and proceeding polymerization and crosslinking reaction of the compound.

(monomer)
The monomer constituting the photosensitive resin layer in the present invention can be selected from compounds that polymerize or crosslink and cure under the action of active species from the polymerization initiator described later, and the polymerizable or crosslinkable compound. Is preferred.
A polyfunctional acrylic monomer is suitable as the polymerizable or crosslinkable compound. Examples of the polyfunctional acrylic monomer include ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, tetramethylene glycol di (meth) acrylate, and propylene glycol di (Meth) acrylates such as (meth) acrylate, trimethylolpropane tri (meth) acrylate, 1,4-hexanediol di (meth) acrylate, pentaerythritol tetra (meth) acrylate and dipentaerythritol hexa (meth) acrylate Preferably mentioned.

In this invention, content of the monomer in the photosensitive resin layer shall be 35 mass% or less with respect to the total solid (mass) of this photosensitive resin layer. When the amount of the monomer exceeds 35% by mass, the photosensitive resin layer becomes too soft at the time of thermocompression bonding (laminate), the effect of suppressing air mixing is reduced, and air mixed at the time of pressure bonding remains as bubbles. Thereby, chipping defects after development can be prevented as much as possible.
The monomer content is preferably as small as possible for the same reason as described above, but is preferably in the range of 20 to 40% by mass, and more preferably in the range of 25 to 35% by mass in consideration of curability.

(Binder polymer)
As the binder polymer constituting the photosensitive resin layer in the present invention, a water-soluble or alkali-soluble polymer is preferable from the viewpoint of patterning by exposure and development, and an alkali-soluble polymer having an acid group (such as a carboxylic acid group) is preferable. Binder polymers are preferred.
As the binder polymer having an acid group, for example, a copolymer of an unsaturated organic acid compound such as acrylic acid or methacrylic acid and an unsaturated organic acid ester compound such as methyl methacrylate, ethyl methacrylate or benzyl methacrylate is suitable. .

  Among the above-mentioned copolymers, it is possible to avoid mixing of bubbles at the time of thermocompression bonding. In particular, from the viewpoint of preventing color mixing of ink applied with an ink jet when a partition having a light shielding function such as a black matrix is formed, a binder polymer is used. It is preferable to have a structural unit derived from benzyl methacrylate as a polymerization component. Furthermore, the copolymerization ratio in one molecule when benzyl methacrylate is copolymerized is preferably in the range of 20 mol% or less, more preferably in the range of 10 mol% or less, and 0.5 to 15 mol for the same reason. % Range is particularly preferred.

Examples of the binder polymer suitable for constituting the photosensitive resin layer in the present invention include (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate copolymer. (Meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / ethyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / butyl (meth) acrylate copolymer, ( (Meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / siloxane (meth) acrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate / isobornyl (meth) acrylate copolymer, (meth) Acrylic acid / Benzylmeta Relate / methyl (meth) acrylate / styrene copolymer, and the like.
Among these, in order to avoid mixing bubbles during thermocompression bonding, (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / methyl (meth) acrylate copolymer, (meth) acrylic acid / Benzyl methacrylate / methyl (meth) acrylate / ethyl (meth) acrylate copolymer is preferred.

As glass transition temperature Tg (b) of a binder polymer, the range of 70-140 degreeC is preferable, More preferably, it is the range of 80-110 degreeC. When Tg (b) is 70 ° C. or higher, air (bubbles) can be prevented from entraining during thermocompression bonding (laminating), and when it is 140 ° C. or lower, air (bubbles) entraining during thermocompression bonding (laminating) can be suppressed. And sufficient development can be achieved. In the present invention, Tg (b) is set to 108 ° C. or higher and 140 ° C. or lower.
Moreover, as a weight average molecular weight Mw (b) of a binder polymer, the range of 10000-50000 is preferable, More preferably, it is the range of 15000-40000. When Mw (b) is 10,000 or more, air (bubbles) at the time of thermocompression bonding (lamination) can be suppressed, and when it is 50,000 or less, air (bubbles) at the time of thermocompression bonding (laminating) becomes sufficient. It can be developed well.

The content of the binder polymer in the photosensitive resin layer is preferably 30% by mass or more with respect to the total solid content of the photosensitive resin layer. When the amount of the binder polymer is within the above range, the melt viscosity of the photosensitive resin layer at the time of thermocompression bonding (lamination) can be maintained to such an extent that the layer does not become too soft. Mixing can be effectively suppressed.
As content of a binder polymer, 10-40 mass% is more preferable, and 20-35 mass% is still more preferable.

(Polymerization initiator)
As a polymerization initiator which comprises the photosensitive resin layer in this invention, it can select suitably from well-known polymerization initiators. Among these, a photopolymerization initiator is preferable, and for example, a halomethyl oxadiazole compound, a halomethyl-s-triazine compound, and the like can be preferably exemplified.

As content of the polymerization initiator in the photosensitive resin layer, 1-20 mass% is preferable with respect to the total solid of the photosensitive resin layer. When the amount of the polymerization initiator is within the above range, good curability can be obtained.
As for content of a polymerization initiator, 1-5 mass% is more preferable.

  In addition, the photopolymerizable composition which can be used for this invention is not limited above, It can select suitably from well-known things.

The melt viscosity (η _K ) at 100 ° C. of the photosensitive resin layer is preferably in a range satisfying the relationship of η _K / η _Cu > 2 [η _Cu : melt viscosity at 100 ° C. of the thermoplastic resin layer].
Among them, η _K is preferably 2000 Pa · s to 1000000 Pa · s, more preferably 4000 Pa · s to 50000 Pa · s, and most preferably 10000 Pa · s to 50000 Pa · s. When η _K is within the above range, the occurrence of chipping defects in the partition formed by lamination can be effectively suppressed, and adhesion to the permanent support can be ensured.

Means for adjusting the melt viscosity η _K of the photosensitive resin layer to the above range include (1) the glass transition temperature [Tg (b)] and weight of the binder polymer contained in the photosensitive resin layer as described above. In addition to adjusting the average molecular weight [Mw (b)], (2) adjusting the monomer / binder polymer ratio, (3) adjusting the pigment ratio in the solid content of the photosensitive resin layer, and the like. .
In particular, as a method for hardening the photosensitive resin layer, the ratio (M / B) of (1 ′) monomer (M) / binder polymer (B) is reduced (preferably 0.7 ≦ M / B ≦ 1.0). (2 ′) adding a pigment to the photosensitive resin layer to increase the pigment ratio in the solid content, (3) selecting a binder polymer having a high Tg (b) (preferably Tg ≧ 80), etc. It is done. In the present invention, M / B is set to 0.7 ≦ M / B ≦ 1.0.

  The layer thickness of the photosensitive resin layer is preferably 0.5 to 10 μm, and more preferably 1.0 to 5.0 μm. In the case of forming a partition having a light shielding function such as a black matrix, the above range is preferable in terms of preventing color mixture.

(Other)
The photosensitive transfer material of this invention may have an intermediate | middle layer and a protective film as needed other than said thermoplastic resin layer and photosensitive resin layer.
Details of the temporary support, the intermediate layer, the protective film, and the production method of the transfer material constituting the photosensitive resin transfer material are described in paragraphs [0023] to [0066] of JP-A-2005-3861. A thing can be applied as a suitable thing.

  The photosensitive transfer material is preferably constituted by a photosensitive resin transfer material described in JP-A-5-72724, that is, a film that is integrally formed. As an example of the structure of the integral film, a structure in which a temporary support / thermoplastic resin layer / intermediate layer / photosensitive resin layer / protective film are laminated in this order can be given.

<Partition and method for forming the same>
The partition wall of the present invention uses the photosensitive transfer material of the present invention, and presses the photosensitive transfer material onto the permanent support so that the photosensitive resin layer is in contact with the permanent support (hereinafter referred to as “transfer”). It may be referred to as a “process”).
The partition wall of the present invention preferably comprises a step of pressing the photosensitive transfer material of the present invention to the permanent support so that the photosensitive resin layer is in contact with the permanent support (transfer step), and at least the photosensitive after the pressure bonding. A step of exposing and developing the conductive resin layer (hereinafter also referred to as a “patterning step”).

  In the step of pressure-bonding to a permanent support (transfer step), at least a photosensitive resin layer that forms a partition wall is adhered to the permanent support under pressure (applied with a laminator or the like) to transfer and form. That is, the photosensitive transfer material is pressure-bonded to the permanent support so that the photosensitive resin layer is in contact with the permanent support, and the temporary support is peeled off if necessary, and then the photosensitive resin layer on the permanent support is formed in a desired pattern shape. The film can be suitably produced by exposing to light and further developing. Moreover, you may provide other processes, such as the process of post-exposure, the process of post-baking, as needed. The temporary support may be removed before exposure to a pattern after transfer, or may be removed after exposure to a pattern.

  As the transfer step, the method described in paragraph [0037] of JP-A-2006-23696 and the method of transferring using a laminator described in WO 2006-4225 are also suitable in the present invention. For the steps such as exposure, development, post-exposure and post-bake performed in a pattern, the methods described in paragraphs [0038] to [0051] of JP-A-2006-23696 can be applied.

In the patterning step, the photosensitive resin layer is exposed and developed.
The exposure can be performed using, for example, a proximity type exposure machine having an ultrahigh pressure mercury lamp (for example, manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.), and the exposure amount may be appropriately selected (for example, 300 mJ / cm ² ). Examples of the light source used for exposure include medium to ultra high pressure mercury lamps, xenon lamps, metal halide lamps, and the like.
In the exposure step, the removal surface after removal of the temporary support (for example, the surface of the thermoplastic resin layer in the case of the temporary support / thermoplastic resin layer / intermediate layer / photosensitive resin layer layer structure) and a desired photomask (E.g., quartz exposure mask) are placed facing each other, and the distance between the photomask surface and the photosensitive resin layer is set appropriately (e.g., 200 [mu] m) with the permanent support and the photomask standing vertically. Can be exposed.

After the exposure, a development process is performed, and the exposed photosensitive resin layer is developed using a predetermined developer. Subsequently, washing is performed as necessary to obtain a pattern image. Prior to development, pure water is preferably sprayed with a shower nozzle or the like to uniformly wet the surface of the photosensitive resin layer or the oxygen blocking layer.
As the developer used in the development process, a dilute aqueous solution of an alkaline substance is used, but a solution obtained by adding a small amount of an organic solvent miscible with water may be used.
The developer can be used as a bath solution or a spray solution.

Examples of the alkaline substance include alkali metal hydroxides (for example, sodium hydroxide, potassium hydroxide), alkali metal carbonates (for example, sodium carbonate, potassium carbonate), alkali metal bicarbonates (for example, sodium bicarbonate, Potassium bicarbonate), alkali metal silicates (for example, sodium silicate, potassium silicate), alkali metal metasilicates (for example, sodium metasilicate, potassium metasilicate), triethanolamine, diethanolamine, monoethanolamine, morpholine Tetraalkylammonium hydroxides (for example, tetramethylammonium hydroxide), trisodium phosphate, and the like. The dilute aqueous solution of the alkaline substance preferably has an alkaline substance concentration of 0.01 to 30% by mass, and preferably has a pH of 8 to 14.
Examples of the “water-miscible organic solvent” include, for example, methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-butyl ether. Benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like are preferable. . The concentration of the organic solvent miscible with water is preferably 0.1 to 30% by mass.
Furthermore, a known surfactant can be added, and the concentration of the surfactant is preferably 0.01 to 10% by mass.

Further, a post-exposure step and a post-bake step may be provided.
As the light source used for the post-exposure, any light source capable of irradiating light in a wavelength region capable of curing the photosensitive resin layer (for example, 365 nm, 405 nm) can be appropriately selected and used. Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned. The exposure may be an exposure to compensate for the exposure, is usually in the 50 to 5000 mJ / cm ^2, preferably not 200~4000mJ / cm ^2, more preferably a 500~2000mJ / cm ^2.
The temperature at the time of post-baking is 150-280 degreeC normally, Preferably it is 180-250 degreeC. The heating time can be appropriately selected depending on the baking temperature. For example, when the baking temperature is 240 ° C., 10 to 120 minutes is preferable, and 30 to 90 minutes is more preferable.

  Since the partition wall of the present invention is formed using the photosensitive transfer material of the present invention, the occurrence of defects on the wall (chip defects) is prevented, and the ink color mixture when ink is applied by the ink jet method Is effectively prevented, and a color filter with good color characteristics, and thus a display device with excellent display characteristics can be obtained. Further, since the transfer is performed using a photosensitive resin transfer material, it is preferable from the viewpoint of cost reduction.

  The partition wall may be any material as long as it is obtained by a transfer method using the photosensitive transfer material of the present invention. However, when producing a color filter, the partition wall has a light shielding function such as a black matrix. Is preferred.

  In addition, the partition walls may be subjected to ink repellent treatment in order to prevent color mixing of the applied inkjet ink. With respect to the ink repellent treatment, for example, (1) a method of kneading an ink repellent substance into the partition wall (for example, see JP-A-2005-36160), and (2) a method of newly providing an ink-repellent layer (for example, No. 5-241011), (3) a method of imparting ink repellency by plasma treatment (for example, see JP-A-2002-62420), and (4) a method of applying an ink-repellent material to the upper surface of the partition wall (see FIG. For example, see JP-A-10-123500). In particular, (3) a method of imparting ink repellency to the partition formed on the substrate by plasma treatment to make the partition repellent is preferable.

  The height of the partition walls is preferably 0.5 to 10 μm and more preferably 1.0 to 5.0 μm from the viewpoint of preventing color mixing.

The optical density of the partition walls is preferably 3 to 5 in that a partition wall having high light shielding properties (for example, a black matrix) can be formed.
The optical density of the partition walls was measured using a spectrophotometer UV-2100 (manufactured by Shimadzu Corporation), and the transmission optical density (OD ¹ ) of the substrate with the partition walls formed with the partition walls (for example, black matrix) was measured at a wavelength of 555 nm. while, the transmission optical density (OD ⁰⁾ of the base material used in each partition wall with substrates (e.g. glass substrate) was measured in the same manner, transparent minus OD ⁰ from OD ¹ concentration OD (= OD ¹ - OD ⁰ ) can be measured as the optical density.

<Color filter and manufacturing method thereof>
The method for producing a color filter of the present invention includes a step of forming the partition wall of the present invention and a step of forming a colored region between the formed partition walls (hereinafter sometimes referred to as a “colored region forming step”). Configured. The “step of forming a partition wall of the present invention” is a method of forming a partition wall by the above-described method of forming a partition wall of the present invention, and includes a transfer step, and preferably includes a transfer step and a patterning step. It is what is done.

  In the method for producing a color filter of the present invention, after forming the partition wall of the present invention as described above, between the partition walls sandwiched between the partition walls formed on the permanent support, specifically, for example, a matrix-shaped color filter In the case of forming the colored region, a colored liquid composition (hereinafter also referred to as ink) is applied to the concave region surrounded by the partition walls (preferably by an ink jet method) to form a colored region (colored region forming step). The colored region forms individual colored pixels such as red (R), green (G), and blue (B) when the color filter is formed.

  In addition to the colored region forming step, the method for producing a color filter of the present invention preferably further includes a curing step of curing the formed colored region of at least one color by irradiation with active energy rays, and coloring of a desired hue. A curing step of curing with heat after forming at least one or all of the regions;

-Colored area formation process-
In the colored region forming step, a colored region is formed between the formed partition walls. As described above, the colored region is preferably formed by a method of applying a colored liquid composition (ink) between the partition walls by an ink jet method. In this case, a plurality of two or more colors can be obtained by ejecting and injecting inkjet ink for forming colored pixels (for example, RGB three-color pixel pattern) into a concave portion surrounded by a partition formed on the substrate. A color filter can be produced so as to be composed of the colored pixels.

  The pattern shape of the color filter is not particularly limited, and may be a general stripe shape as a black matrix shape, a lattice shape, or a delta arrangement.

  As an inkjet method, a method in which charged inkjet ink is continuously ejected and controlled by an electric field, a method in which ink is intermittently ejected using a piezoelectric element, and an ink is heated and intermittently ejected using its foam. Various methods such as a method can be adopted. Specifically, a method of ejecting ink using an inkjet head is suitable.

As the ink jet head (hereinafter also simply referred to as a head), a known one can be applied, and a continuous type or a dot on demand type can be used.
Among the dot-on-demand types, the thermal type head preferably has a working valve as described in JP-A-9-323420 for ejection. In the piezo-type head, for example, heads described in European Patent A277,703, European Patent A278,590 and the like can be used. Among these, the piezo head is more preferable because the influence of heat on the ink-jet ink can be reduced and the choice of usable solvents is wide.

  The head preferably has a temperature control function so that the temperature of the ink can be controlled. It is preferable to set the injection temperature so that the viscosity at the time of ejection is 5 to 30 mPa · s, and to control the ink temperature so that the fluctuation range of the viscosity is within ± 5%. Moreover, as a drive frequency, it is preferable to operate | move at 1-500 kHz.

  The shape of the nozzle of the head is not necessarily circular, and there is no limitation on the shape such as an ellipse or a rectangle. The nozzle diameter is preferably in the range of 10 to 100 μm. Although the nozzle opening itself is not necessarily a perfect circle, in this case, the nozzle diameter is assumed to be a circle equivalent to the area of the opening.

  There is no restriction | limiting in particular as ejection conditions of an inkjet ink, You may carry out at room temperature. It is preferable from the viewpoint of injection stability that the inkjet ink is heated to 30 to 60 ° C., and the ink viscosity is lowered for injection. Organic ink-jet inks generally have a higher viscosity than water-based inks, and thus have a large viscosity fluctuation range due to temperature fluctuations. Viscosity fluctuations greatly affect the droplet size and droplet ejection speed as they are, and are liable to cause image quality deterioration. Therefore, it is important to keep the inkjet ink temperature as constant as possible.

  When the colored liquid composition (ink) is applied by an ink jet method, a permanent support having partition walls may be fixedly arranged, and the ink jet head may be translated in a one-dimensional direction, or conversely, the ink jet head may be fixedly arranged. The permanent support may be translated in the one-dimensional direction, or the inkjet head may be translated in the one-dimensional direction and the permanent support having the partition wall in the one-dimensional direction substantially orthogonal to this direction. Also good.

  The color filter in the present invention is preferably in the form of a group (pixel group) composed of at least three colors of colored regions (that is, colored pixels) by spraying at least three colors of ink including RGB.

The colored liquid composition (ink) in the present invention can contain at least a colorant, an organic solvent, and a monomer, and may contain other components as necessary.
The physical property value of the ink is preferably 10 to 100 mPa · s as the viscosity at 25 ° C., and preferably 10 to 50 mN / m as the surface tension at 25 ° C.

  The ink used in the present invention may be either oily or aqueous. Further, the colorant contained in the ink can be used for both dyes and pigments, and the use of pigments is preferred from the viewpoint of durability. In addition, a coloring ink of a coating method used for producing a known color filter (for example, a colored resin composition described in paragraphs [0034] to [0063] and [0076] to [0078] of JP-A-2005-3861) Product), paragraphs [0009] to [0026] of JP-A No. 10-195358, and JP-A Nos. 2004-339332 and 2002-372615 can be used. .

In consideration of the process after forming the colored region, the ink in the present invention may be added with a component that is cured by heating or is cured by energy rays such as ultraviolet rays.
Various thermosetting resins are widely used as components that are cured by heating, and examples of components that are cured by energy rays include those obtained by adding a photoinitiator to an acrylate derivative or a methacrylate derivative. Particularly considering heat resistance, those having a plurality of acryloyl groups and methacryloyl groups in the molecule are more preferable. These acrylate derivatives and methacrylate derivatives are preferably water-soluble, and even those that are sparingly soluble in water can be used after being emulsified.

In the present invention, after ink is applied between the partition walls (for example, ejection), the solvent contained in the droplets is removed to form an ink residue, and then the ink residue is heated (so-called baking treatment) to cure the ink residue. It can be made to form a colored layer. The heating here can be performed in one stage or in multiple stages.
The heating in one stage means heating at a predetermined temperature that completely cures the ink from the beginning after removing the solvent to make the ink remaining, and the heating in the multi-stage is a relatively low temperature at the beginning. In this case, the heating is started, and then the heating temperature is sequentially increased to finally heat at a predetermined temperature at which the ink is completely cured.

Examples of the heating method include, but are not limited to, heating with a hot plate, an electric furnace, a drier, etc., or a method of irradiating with infrared rays.
Before the heating, a step of curing the remaining ink with active energy rays may be provided.

  The heating temperature and heating time during heating depend on the composition of the ink-jet ink and the thickness of the colored region, but generally from about 120 ° C. to about 250 ° C. from the viewpoint of ensuring sufficient pixel strength, solvent resistance, alkali resistance, and the like. It is preferable to heat at about 10 minutes to about 120 minutes.

  In the present invention, the process from the colored region forming step to the heating step for heating is preferably performed within 24 hours, more preferably within 12 hours, and even more preferably within 6 hours. By starting heating within the above-mentioned time range without leaving it for a long time after forming the colored region, it is possible to prevent the aggregation of pigments in the ink and the precipitation of various binders. Pixel).

  As described above, after forming the color filters by forming the partition walls and the colored regions (colored pixels), an overcoat layer can be formed so as to cover the entire surfaces of the colored regions and the partition walls for the purpose of improving the durability. .

  The overcoat layer can protect the colored regions such as R, G, and B and the partition walls, and can flatten the surface of the color filter. However, it is preferable not to provide it from the point which the number of processes increases.

  An overcoat layer can be comprised using resin (OC agent). Examples of the resin (OC agent) include an acrylic resin composition, an epoxy resin composition, and a polyimide resin composition. Among them, the acrylic resin composition is desirable because it is excellent in transparency in the visible light region and the resin component of the colored liquid composition (ink) is usually mainly composed of an acrylic resin and has excellent adhesion. . Examples of the overcoat layer include those described in paragraphs [0018] to [0028] of JP-A No. 2003-287618, and commercially available overcoat agents such as Optomer SS6699G manufactured by JSR.

  The color filter of the present invention is produced by the above-described method for producing the color filter of the present invention, and includes, for example, a portable terminal such as a television, a personal computer, a liquid crystal projector, a game machine, and a mobile phone, a digital camera, and a car navigation system. It can be suitably applied to applications such as without particular limitation. In the color filter of the present invention, it is sufficient that the partition walls (for example, the partition walls functioning as a black matrix) are composed of the above-described photosensitive transfer material of the present invention, and red (R), green (G), blue (B ), White (W), purple (V), etc., can be formed and formed.

<Display device>
The display device of the present invention is not particularly limited as long as it includes the color filter of the present invention described above. The display device of the present invention includes display devices such as a liquid crystal display device, a plasma display display device, an EL display device, and a CRT display device.

  For the definition of display devices and explanation of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Device (written by Junaki Ibuki, Industrial Book Co., Ltd.) Issue year)).

The display device of the present invention is particularly preferably a liquid crystal display device. The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Investigative Research Institute, Inc., 1994)”. The liquid crystal display device is not particularly limited, and various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology” can be applied.
The display device of the present invention is particularly effective when constructed as a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the display device of the present invention can also be applied to a liquid crystal display device with a wide viewing angle, such as a lateral electric field drive method such as IPS, or a pixel division method such as MVA. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".

In addition to the color filter, the liquid crystal display device is configured using various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film. Regarding these materials, for example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, CMC Co., Ltd., published in 1994)”, “Current Status and Future Prospects of the 2003 Liquid Crystal Related Market (Volume 2) (Table Yoshiyoshi, Fuji Chimera Research Institute, Inc., published in 2003) ”.

  The display device of the present invention includes ECB (Electrically Controlled Birefringence), TN (Twisted Nematic), IPS (In-Plane Switching), FLC (Ferroelectric Liquid Crystal), OCB (OpticBandNitRic). Various display modes such as (Vertical Aligned), HAN (Hybrid Aligned Nematic), and GH (Guest Host) can be adopted.

  Since the display device of the present invention includes a color filter that suppresses color mixing and has good color purity and hue by using the photosensitive transfer material of the present invention as described above, when mounted on a television or a monitor, An image having a wide color reproduction range and a high contrast ratio can be displayed without display unevenness such as unevenness. It is also suitable for large screen display devices such as notebook personal computer displays and television monitors.

  Hereinafter, the present invention will be described more specifically with reference to examples. The materials, reagents, ratios, instruments, operations, and the like shown in the following examples can be appropriately changed without departing from the scope of the present invention, and therefore the present invention is not limited to the examples shown below. In the following examples, unless otherwise specified, both “%” and “part” are based on mass, and the molecular weight represents a weight average molecular weight.

Example 1
[Synthesis of Binder 1]
In a nitrogen stream, 250 g of propylene glycol monomethyl ether acetate [MMPG-Ac, manufactured by Daicel Chemical Industries, Ltd.] is placed in a 1000 ml three-necked flask equipped with a condenser, and the internal temperature is 80 ° C. in a water bath containing paraffin. Until heated. To this, MMPG-Ac 80 g, methacrylic acid [MAA, manufactured by Mitsubishi Rayon Co., Ltd.] 19.35 g and benzyl methacrylate [BzMA, manufactured by Kyoeisha Chemical Co., Ltd.] 6.72 g and methyl methacrylate [MMA, Kyoeisha Chemical Co., Ltd.] Made by dissolving 24.68 g and MMPG-Ac 20 g, 2,2′-azobis (methyl isobutyrate) [V601, manufactured by Wako Pure Chemical Industries, Ltd.] 3.14 g, respectively. It dripped over 3 hours with the plunger pump. After completion of dropping, the mixture was stirred for 5 hours, and disappearance of the residual monomer was confirmed by ¹ H-NMR. This was further diluted with MMPG-Ac to 27%.
As described above, MAA / BzMA / MMA = 7.2 / 2.5 / 90.3 (mass ratio) binder 1 was synthesized. The binder 1 had a glass transition temperature of 110 ° C. and a weight average molecular weight of 30,000.
The monomer disappeared and the synthesis of the resin was confirmed from the generation of the high molecular weight component.

Here, the glass transition temperature was measured with respect to the obtained binder 1 using differential scanning calorimetry (DSC; EXSTER6000 manufactured by Seiko Instruments Inc.).
The weight average molecular weight was measured by gel permeation chromatography (GPC). GPC uses HLC-8120GPC, SC-8020 (manufactured by Tosoh Corporation), and TSKgel, SuperHM-H (manufactured by Tosoh Corporation, 6.0 mm ID × 15 cm) as the column, eluent THF (tetrahydrofuran) was used. The conditions were as follows: the sample concentration was 0.5 mass%, the flow rate was 0.6 ml / min, the sample injection amount was 10 μl, the measurement temperature was 40 ° C., and the RI detector was used. In addition, the calibration curve is “polystyrene standard sample TSK standard” manufactured by Tosoh Corporation: “A-500”, “F-1”, “F-10”, “F-80”, “F-380”, “A-”. It was prepared from 10 samples of “2,500”, “F-4”, “F-40”, “F-128”, and “F-700”.

[Preparation of K pigment dispersion 1]
Components of the following composition were mixed to prepare K pigment dispersion 1.
・ Carbon black (Nexex 35 manufactured by Degussa) ... 13.1%
・ Dispersant (Compound 1 below) 0.65%
・ Random copolymer of polymer (benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio]), Tg = 76 ° C., weight average molecular weight = 30,000) ・ ・ ・ 6.72%
・ Propylene glycol monomethyl ether acetate: 79.53%

[Preparation of photosensitive resin composition K1]
K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in the following composition are weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), stirred at 150 rpm for 10 minutes, and further stirred. Methyl ethyl ketone, cyclohexanone, binder 1, phenothiazine, DPHA solution, 2,4-bis (trichloromethyl) -6- [4 '-(N, N-bisdiethoxycarbonylmethyl) amino-3' -Bromophenyl] -s-triazine and Surfactant 1 are weighed and added in this order at a temperature of 25 ° C. (± 2 ° C.), and stirred at 150 rpm for 30 minutes to produce a photosensitive resin Composition K1 was prepared.

<Composition of photosensitive resin composition K1>
-K pigment dispersion 1 ... 30.33%
・ Propylene glycol monomethyl ether acetate: 8.60%
・ Methyl ethyl ketone 34.16%
・ Cyclohexanone: 8.55%
・ 2,4-Bis (trichloromethyl) -6- [4 ′-(N, Ndiethoxycarbonylmethyl) amino-3′-bromophenyl] -s-triazine 0.24%
・ Binder 1 ... 11.59%
・ The following DPHA solution: 6.46%
・ Phenothiazine: 0.01%
・ Surfactant 1 below: 0.06%

The details of each component are as follows.
~ DPHA solution ~
-Dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, manufactured by Nippon Kayaku Co., Ltd., trade name: KAYARAD DPHA) 76%
・ Propylene glycol monomethyl ether acetate 24%

~ Surfactant 1 ~
・ The following structure 1 ・ ・ ・ 30%
・ Methyl ethyl ketone 70%

In addition, when 2 or more types of binders are contained in the photosensitive resin layer in this invention, the "glass transition temperature of a binder polymer" said to this invention is computed by the weight average of each binder.
That is, in Example 1, a random copolymer (Tg = 76 ° C., weight average molecular weight = 30000) of benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio]) from K pigment dispersion 1 was 2. 0.04%, and MAA / BzMA / MMA = 7.2 / 2.5 / 90.3 (mass ratio; Tg = 110 ° C., weight average molecular weight = 30,000) from binder 1 is 3.13%. Therefore, the “glass transition temperature of the binder polymer” referred to in the present invention is (76 × (2.04 / (2.04 + 3.13)) + (110 × (3.13 / (2.04 + 3.13))) = Calculated as 96.6 ° C.
The calculation of “weight average molecular weight of the binder polymer” in the present invention is also the same.

[Partition formation]
(Preparation of photosensitive transfer material K1)
Using a slit-like nozzle on a 75 μm thick polyethylene terephthalate film temporary support (PET temporary support), a thermoplastic resin layer coating solution having the following formulation H1 is applied and dried to form a thermoplastic resin layer. Formed. Next, an intermediate layer coating liquid having the following formulation P1 was further applied on the thermoplastic resin layer and dried to form an intermediate layer (oxygen barrier film). On the intermediate layer, the photosensitive resin composition K1 was further applied and dried to form the photosensitive resin layer K1.
Thus, a thermoplastic resin layer having a dry film thickness of 14.6 μm, an intermediate layer having a dry film thickness of 1.6 μm, and a photosensitive resin having a dry film thickness of 2.3 μm on the PET temporary support. The layer K1 was laminated, and a protective film (12 μm thick polypropylene film) was pressure-bonded to the surface of the photosensitive resin layer K1.
As described above, the photosensitive transfer material K1 in which the temporary support, the thermoplastic resin layer, the intermediate layer, and the photosensitive resin layer K1 were integrated was produced.

<Coating solution for thermoplastic resin layer: Formulation H1>
Methyl ethyl ketone: 171.6 parts Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55 / 11.7 / 4.5 / 28.8, Molecular weight = 100,000, Tg≈70 ° C., 21%, methyl ethyl ketone 26%, propylene glycol monomethyl ether 13%, methanol 40% solution) ・ ・ ・ 444.7 parts ・ Styrene / acrylic acid copolymer (copolymerization composition ratio ( (Molar ratio) = 63/37, average molecular weight = 10,000, Tg≈100 ° C., 42%, methyl ethyl ketone 49.5%, propylene glycol monomethyl ether 8.5%) 271.8 parts 2,2-bis [4- (Methacryloxypolyethoxy) phenyl] propane (manufactured by Shin-Nakamura Chemical Co., Ltd.) 106. Part-said surfactant 1 ... 5.94 parts

<Interlayer coating solution: Formulation P1>
-PVA205 ... 32.2 parts (polyvinyl alcohol, manufactured by Kuraray Co., Ltd., saponification degree = 88%, polymerization degree 550)
・ Polyvinylpyrrolidone (APS Japan, K-30) ・ ・ ・ 14.9 parts ・ Distilled water ・ ・ ・ 524 parts ・ Methanol ・ ・ ・ 429 parts

  Next, an alkali-free glass substrate (hereinafter also simply referred to as “glass substrate”) was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds with a shower. The shower was washed with water. Thereafter, a silane coupling liquid (N-β (aminoethyl) γ-aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.) was sprayed for 20 seconds with a shower, and pure water The shower was washed. This substrate was heated at 100 ° C. for 2 minutes by a substrate preheating device.

The protective film is removed from the photosensitive transfer material K1 obtained as described above on the obtained silane coupling treated glass substrate, and the exposed photosensitive resin layer K1 is removed from the surface of the silane coupling treated glass substrate. In contact with each other, FIG. Lamination was performed using a large two-clad laminator described in No. 24. At this time, the details of the laminator are as follows.

~ Evaluation of bubbles ~
The silane coupling-treated glass substrate on which the photosensitive transfer material K1 is laminated is placed on the high-intensity Schaukasten so that the photosensitive transfer material K1 side is on (observation side), and the PET temporary support is placed on the thermoplastic resin layer. It peeled at the interface and the number of pinholes of 10 μm or more was counted. The results are shown in Table 2 below.

Subsequently, after the temporary support is peeled off from the thermoplastic resin layer, the photosensitive resin layer is patterned at an exposure amount of 100 mJ / cm ² by a mirror projection type exposure machine (MPA-8800CF, manufactured by Canon Inc.). Exposed.

  Next, a triethanolamine developer (containing 30% triethanolamine, trade name: T-PD2 (manufactured by FUJIFILM Corporation) 12 times with pure water (1 part of T-PD2 and 11 parts of pure water). The mixture was diluted with a ratio at a flat nozzle pressure of 0.04 MPa for 30 seconds at 30 ° C. to remove the thermoplastic resin layer and the intermediate layer. Subsequently, after air was blown off on the upper surface of the glass substrate, pure water was sprayed for 10 seconds by a shower, pure water shower cleaning was performed, and air was blown to reduce a liquid pool on the substrate.

  Subsequently, a sodium carbonate developer (0.38 mol / liter sodium bicarbonate, 0.47 mol / liter sodium carbonate, 5% sodium dibutylnaphthalenesulfonate, anionic surfactant, antifoaming agent, and stabilizer Contained; Trade name: T-CD1 (manufactured by Fuji Film Co., Ltd.) diluted 5 times with pure water) and shower-developed at 29 ° C. for 30 seconds at a cone type nozzle pressure of 0.15 MPa. The resin layer K1 was developed to obtain a pattern image.

  Subsequently, a solution obtained by diluting a cleaning agent (containing phosphate, silicate, nonionic surfactant, antifoaming agent, stabilizer; trade name: T-SD1 (manufactured by Fuji Film Co., Ltd.)) 10 times with pure water And sprayed with a shower at a cone type nozzle pressure of 0.02 MPa for 20 seconds at 33 ° C., and further, the residue was removed by rubbing the formed pattern image with a rotating brush having nylon bristles to obtain a desired partition wall pattern. .

Thereafter, post-exposure was performed on both sides of the glass substrate on which the partition wall pattern was formed with an exposure amount of 3000 mJ / cm ² using an exposure machine manufactured by USHIO INC. Having a metal halide lamp, and then at 220 ° C. for 20 minutes. Heat treatment was performed to obtain a stripe-shaped partition wall having an opening having an optical density of 4.0, a film thickness of 2.0 μm, and a width of 100 μm.

[Ink repellent plasma treatment]
The glass substrate on which the partition walls were formed was subjected to ink-repellent plasma treatment under the following conditions using a cathode coupling parallel plate type plasma treatment apparatus.
(conditions)
・ Used gas: CF4
・ Gas flow rate: 80sccm
・ Pressure: 40 Pa
・ RF power: 50W
・ Processing time: 30 sec

[Preparation of colored liquid composition]
Among the following components, first, a pigment, a polymer dispersant and a solvent were mixed, and a pigment dispersion was obtained using a three roll and bead mill. While sufficiently stirring the pigment dispersion with a dissolver or the like, other materials were added little by little to prepare a colored liquid composition (ink R) for red (R) pixels.

<Composition of colored liquid composition for red pixel>
Pigment (CI Pigment Red 254) 5 parts Polymer dispersant (Solsperse 24000 manufactured by AVECIA) 1 part Binder 3 parts (benzyl methacrylate / methacrylic acid (= 72 / 28 [molar ratio]) random copolymer, weight average molecular weight 37,000)
First epoxy resin: 2 parts (Novolac type epoxy resin, Epicoat 154 manufactured by Yuka Shell)
・ Second epoxy resin (neopentyl glycol diglycidyl ether) 5 parts ・ Curing agent (trimellitic acid) 4 parts ・ Solvent: Ethyl 3-ethoxypropionate 80 parts

Further, C.I. I. Pigment Red 254 with the same amount of C.I. I. A colored liquid composition (ink G) for green (G) pixels was prepared in the same manner as the colored liquid composition for red pixels except that the pigment green 36 was used.
Still further, C.I. I. Pigment Red 254 with the same amount of C.I. I. A colored liquid composition (ink B) for blue (B) pixels was prepared in the same manner as the colored liquid composition for red pixels except that the pigment blue 15: 6 was used.

[Formation of pixels by inkjet method]
Ink was ejected in the following form using SE-128 made by Dimatix as an inkjet head and Apollo II made by Dimatix as an ejection control device.
The inkjet head is mounted on an automatic two-dimensional moving stage (KS211-200 manufactured by Suruga Seiki), and the stage is moved so that a predetermined amount of ink is ejected into the recess surrounded by the partition of the glass substrate on which the partition is formed. However, the ejection from the head by the ejection control device was synchronized. Here, inks of three colors, ink R, ink G, and ink B, are filled in different heads, and each head is fixed on the XY stage so that each ink lands on a predetermined position. In addition, the three heads were independently controlled by the discharge control device.
The droplet ejection ejects ink of each color until the desired density is reached, and after the ejection is completed, the ink is dried by heating at 100 ° C. for 2 minutes on a hot plate and then baked in an oven at 230 ° C. for 30 minutes. A color filter (hereinafter referred to as “color filter substrate”) in which both the partition walls and the colored pixels (R pixel, G pixel, and B pixel) were cured well was produced.

~ Evaluation of color filter ~
The degree of color mixture in the obtained color filter substrate was evaluated by the following method.
The color filter was observed using an optical microscope, and the presence or absence of ink color mixture was observed for 3000 pixels arbitrarily selected from the color filter, and evaluated according to the following evaluation criteria. The results are shown in Table 2 below. The practically acceptable ranks are A rank, B rank, and C rank.
<Evaluation criteria>
A rank: There was no color mixing at all.
Rank B: 1 to 2 color mixtures were recognized.
C rank: 3-4 color mixing was recognized.
D rank: 5 to 10 mixed colors were recognized.
E rank: 11 or more color mixtures were recognized.

[Production of display device]
An ITO (Indium Tin Oxide) transparent electrode was further formed by sputtering on the R pixel, G pixel, B pixel, and partition walls of the color filter substrate obtained above. Separately, a glass substrate was prepared as a counter substrate, and an ITO transparent electrode was similarly formed by sputtering. Then, a photo spacer was provided in a portion corresponding to the upper part of the partition on the ITO transparent electrode, and an alignment film made of polyimide was further provided thereon.

-Formation of liquid crystal alignment split projections-
A coating liquid for photosensitive resin layer for protrusions having the following formulation A was applied onto the ITO transparent electrode on the color filter by the same slit coater as described above and dried to form a photosensitive resin layer for protrusions.
Next, a protective layer having a dry film thickness of 1.6 μm was provided on the protrusion photosensitive resin layer using the intermediate layer coating liquid composed of the formulation P1.

<Coating liquid for photosensitive resin layer for protrusions: Formulation A>
-Positive resist solution 53.3 parts (FH-2413F, manufactured by FUJIFILM Electronics Materials Co., Ltd.)
-Methyl ethyl ketone-46.7 parts-Surfactant 1-0.04 parts

Next, a proximity exposure machine is arranged so that the position of the photomask is at a distance of 100 μm from the surface of the photosensitive resin layer for protrusions, and the irradiation energy is 150 mJ / cm ² with an ultrahigh pressure mercury lamp through the photomask. Proximity exposure. Thereafter, a 2.38% tetramethylammonium hydroxide aqueous solution was developed by spraying on the photosensitive resin layer for protrusions at 33 ° C. for 30 seconds in a shower type developing device, and an unnecessary portion (exposure) of the photosensitive resin layer for protrusions was exposed. Part) was developed and removed. As a result, protrusions patterned in a desired shape were formed on portions above the ITO transparent electrode of the color filter and above the R, G, and B pixels. Next, the color filter substrate on which the protrusions are formed is baked at 240 ° C. for 50 minutes, so that a height of 1.5 μm and a longitudinal sectional shape (surface parallel to the normal direction of the glass substrate surface) are formed on the color filter substrate. Can be formed.

  After that, a UV curable resin sealant is applied to the position corresponding to the outer wall of the partition wall that surrounds the pixel group of the color filter by the dispenser method, and the MVA mode liquid crystal is dropped and bonded to the counter substrate. The bonded substrate was irradiated with UV and then heat-treated to cure the sealant. A liquid crystal cell was thus obtained. A polarizing plate HLC2-2518 (manufactured by Sanritz Co., Ltd.) was pasted on both sides of this liquid crystal cell, and then placed on the back surface side of the liquid crystal cell provided with the polarizing plate by constituting a backlight of a cold cathode tube, A liquid crystal display device was obtained.

-Evaluation of display devices-
The display device was energized and the displayed image was visually observed and evaluated according to the following evaluation criteria. The results are shown in Table 2 below.
<Evaluation criteria>
Normal: There was no display unevenness such as color unevenness.
Uneven: Color unevenness was observed.

(Example 2-6, Example 1-2, Comparative Example 1-3)
In Example 1, as shown in Table 2 below, a color filter was produced and evaluated in the same manner as in Example 1 except that the type of the binder polymer was changed, and a liquid crystal display device was produced. The evaluation results are shown in Table 2 below.

(Comparative Example 4)
In Example 1, except that the photosensitive resin composition K1 was replaced by the photosensitive resin composition K2 having the following composition, a color filter was prepared and evaluated in the same manner as in Example 1, and a liquid crystal display was used. A device was made. The evaluation results are shown in Table 2 below.
<Composition of photosensitive resin composition K2>
-K pigment dispersion 1 ... 30.33%
・ Propylene glycol monomethyl ether acetate ・ ・ ・ 10.97%
・ Methyl ethyl ketone 34.16%
・ Cyclohexanone: 8.55%
・ 2,4-Bis (trichloromethyl) -6- [4 ′-(N, Ndiethoxycarbonylmethyl) amino-3′-bromophenyl] -s-triazine 0.29%
・ Binder 1 ... 3.57%
-DPHA solution ... 4.36%
・ Phenothiazine: 0.01%
・ Surfactant 1 ... 0.06%

(Comparative Example 5)
In Example 1, except that the thermoplastic resin layer was not provided, a color filter was produced and evaluated in the same manner as in Example 1, and a liquid crystal display device was produced. The evaluation results are shown in Table 2 below.

As shown in Table 2, in the example, it was possible to significantly prevent air bubbles from being mixed during lamination. Thus, the occurrence of color mixing is suppressed, and the displayed image is a normal image without color unevenness.
On the other hand, in the comparative example, the mixing of bubbles at the time of lamination was remarkable, color mixing occurred during the production of the color filter, and color unevenness occurred in the displayed image.

Claims (11)

On the temporary support, it has at least a thermoplastic resin layer and a photosensitive resin layer in order from the temporary support side, and the photosensitive resin layer has at least a colorant and a glass transition temperature (Tg (b)). Includes a binder polymer, a monomer, and a polymerization initiator that are 108 ° C. or higher and 140 ° C. or lower, satisfy the following mathematical formula (1), and the content of the monomer in the photosensitive resin layer is the total amount of the photosensitive resin layer: A photosensitive transfer material having a solid content of 35% by mass or less and a ratio (M / B) of a monomer (M) to a binder polymer (B) of 0.7 to 1.0.
Tg (b) × (Mw (b) / 10000) ≧ 215 (1)
[Tg (b): glass transition temperature of binder polymer [° C.], Mw (b): weight average molecular weight of binder polymer]   The photosensitive transfer material according to claim 1, wherein the content of the binder polymer is 30% by mass or more of the total solid content of the photosensitive resin layer.   The photosensitive transfer material according to claim 1, wherein the color material is a pigment.   The binder polymer according to any one of claims 1 to 3, wherein the binder polymer is a copolymer obtained by copolymerizing benzyl methacrylate, and the copolymerization ratio of the benzyl methacrylate is 20 mol% or less. The photosensitive transfer material as described. A method for forming a partition, comprising a step of pressure-bonding the photosensitive transfer material according to any one of claims 1 to 4 to a permanent support so that the photosensitive resin layer is in contact with the permanent support. 6. The method for forming a partition wall according to claim 5 , further comprising a step of exposing and developing at least the photosensitive resin layer after the pressure bonding. Barrier ribs formed by the formation method of the partition wall according to claim 5 or claim 6. Forming a partition wall by forming method of the partition wall according to claim 5 or claim 6, the color filter manufacturing method and a step of forming a colored area between barrier ribs formed. The method for producing a color filter according to claim 8 , wherein the colored region is formed by a method of applying a colored liquid composition between the partition walls by an ink jet method. The color filter produced by the manufacturing method of the color filter of Claim 8 or Claim 9 . A display device comprising the color filter according to claim 10 .