KR102047231B1 - Electrophoretic display device and method of fabricating thereof - Google Patents
Electrophoretic display device and method of fabricating thereof Download PDFInfo
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- KR102047231B1 KR102047231B1 KR1020120143119A KR20120143119A KR102047231B1 KR 102047231 B1 KR102047231 B1 KR 102047231B1 KR 1020120143119 A KR1020120143119 A KR 1020120143119A KR 20120143119 A KR20120143119 A KR 20120143119A KR 102047231 B1 KR102047231 B1 KR 102047231B1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field
- G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
- G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field
- G02F1/1675—Constructional details
- G02F2001/1678—Constructional details characterised by the composition or particle type
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- Electrochemistry (AREA)
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrophoretic display device capable of preventing a specific deterioration of an electrophoretic layer, comprising: a first substrate and a second substrate including an image display unit and a non-display unit including a plurality of pixels: on the first substrate. A formed thin film transistor; A protective layer on the substrate on which the thin film transistor is formed; Barrier ribs formed on the non-image display unit on the passivation layer to define pixels; A pixel electrode formed on the image display unit on the protective layer; An electrophoretic layer formed on the pixels between the partition walls; A common electrode formed on the second substrate; And a surface modification layer formed on at least one substrate of the first substrate and the second substrate and in contact with the electrophoretic layer.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrophoretic display device and a method of manufacturing the same, and more particularly, to an electrophoretic display device having a simplified manufacturing process and a reduced manufacturing cost.
In general, an electrophoretic display device is an image display device using a phenomenon in which colloidal particles move to either polarity when a pair of electrodes to which voltage is applied is immersed in a colloidal solution. Since it has characteristics, such as an electric power, it is attracting attention as an electronic device, such as an electric paper.
The electrophoretic display device has a structure in which an electrophoretic layer is interposed between two substrates, one of the two substrates is made of a transparent substrate, and the other is composed of an array substrate on which a driving element is formed, thereby reflecting input light. The image can be displayed in the reflective mode.
1 is a view showing the structure of a conventional electrophoretic display device (1).
As shown in FIG. 1, the electrophoretic display device 1 may include a
Although not shown in the drawing, a thin film transistor is formed in each pixel region, and an electric field is formed between the
In the electrophoretic display device having such a structure, since the
On the contrary, when a negative voltage is applied to the
A manufacturing method of the conventional electrophoretic display device 1 having the above structure is schematically described as follows.
2 is a flowchart schematically showing a method of manufacturing a conventional electrophoretic display device 1.
As shown in FIG. 2, first, a plurality of gate lines and data lines defining pixel regions are formed on a
Meanwhile, the
Typically, an electrophoretic display device manufacturer receives a
Therefore, since the
The
However, the following problem occurs in the conventional electrophoretic display device 1 manufactured by the above method.
In the conventional electrophoretic display device 1, the
However, since the unit pixels of the electrophoretic display element are formed to have a small size of less than 150 μm in width and length, it is very difficult to align the electrophoretic layer with the pixels so as to exactly fit this size. If the first substrate on which the electrophoretic layer and the thin film transistor are formed is not aligned correctly, the electric field may not be correctly transferred to the electrophoretic particles, which may cause a driving error.
In addition, since the
Meanwhile, the
As described above, in the conventional electrophoretic display device, since the
The present invention is to solve the above problems, to provide an electrophoretic display device and a method for manufacturing the electrophoretic layer that can reduce the manufacturing cost and simplify the manufacturing process by directly forming the electrophoretic layer on the substrate on which the thin film transistor is formed The purpose.
Another object of the present invention is to form a surface modification layer on the surface of the surface in contact with the electrophoretic material electrophoretic display device and method for manufacturing the electrophoretic material which can prevent the characteristics of the electrophoretic material from deteriorating when contacted with the electrophoretic material To provide.
In order to achieve the above object, an electrophoretic display device according to the present invention includes a first substrate and a second substrate including an image display unit and a non-image display unit including a plurality of pixels: a thin film transistor formed on the first substrate; A protective layer on the substrate on which the thin film transistor is formed; Barrier ribs formed on the non-image display unit on the passivation layer to define pixels; A pixel electrode formed on the image display unit on the protective layer; An electrophoretic layer formed on the pixels between the partition walls; A common electrode formed on the second substrate; And a surface modification layer formed on at least one substrate of the first substrate and the second substrate and in contact with the electrophoretic layer.
The electrophoretic material includes white particles and black particles having charge characteristics or includes color particles having charge characteristics, and further includes a dispersion medium.
The surface modification layer is formed on at least one surface of the pixel electrode, the side wall of the partition wall, and the common electrode, wherein the surface modifier is formed of a material including a COOH group.
In addition, the electrophoretic display device manufacturing method according to the present invention comprises the steps of providing a first substrate and a second substrate including an image display unit and a non-image display unit including a plurality of pixels; Forming a thin film transistor on the first substrate; Forming a protective layer on the first substrate on which the thin film transistor is formed; Forming a partition on the non-image display unit on the protective layer; Forming a pixel electrode on the image display unit on the protective layer; Forming a surface modifier on the sidewalls of the partition and the pixel electrode; Forming an electrophoretic layer by filling an electrophoretic material in pixels between the barrier ribs above the protective layer; Forming a common electrode on the second substrate; And bonding the first substrate and the second substrate to each other.
The surface modification layer is formed by laminating a material containing a COOH group on the sidewall of the partition and the surface of the pixel electrode by a spray method.
In the present invention, since the electrophoretic layer is directly formed on the array substrate on which the thin film transistor is formed, the electrophoretic layer can be used to bond the electrophoretic layer to the array substrate, and a protective film for protecting the adhesive layer is not required, thereby reducing manufacturing costs. have. In addition, since the electrophoretic layer may be formed inline on the manufacturing line of the array substrate forming the thin film transistor, the manufacturing process may be simplified.
In addition, in the present invention, the surface in contact with the electrophoretic layer by the surface modification layer surface treatment, it is possible to effectively prevent defects due to deterioration of the characteristics of the electrophoretic layer.
1 is a view showing a conventional electrophoretic display device.
2 is a flow chart briefly showing a method of manufacturing a conventional electrophoretic display device.
3 is a flow chart briefly showing a method of manufacturing an electrophoretic display device according to the present invention.
4A-4G illustrate a method of manufacturing an electrophoretic display device according to the present invention.
5A and 5B are diagrams each illustrating a method of forming an electrophoretic layer of an electrophoretic display device according to the present invention.
Hereinafter, an electrophoretic display device and a method of manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.
3 is a flowchart schematically illustrating a manufacturing process of an electrophoretic display device according to the present invention.
As shown in FIG. 3, first, a plurality of gate lines and data lines defining pixel regions are formed on a first substrate, and thin film transistors, which are driving elements connected to the gate lines and data lines, are formed in each of the pixel regions. (S201). Subsequently, barrier ribs are formed in the image non-display portion on the first substrate on which the thin film transistor is formed, and then pixel electrodes are formed in the image display portion (S202 and S203).
In this case, the barrier rib and the pixel electrode are processed by the same photo process. In general, the formation of a metal pattern or patterning of an insulating layer in a manufacturing process of an electrophoretic display device is performed by photolithography using a photo-mask. In the present invention, the barrier ribs and the pixel electrodes are formed in the same photomask. By the same process. In addition, the pixel electrode may be formed without a separate photo process. That is, a photoresist layer laminated to etch the metal layer is patterned without using a photomask, and the pixel layer is formed by etching the metal layer by the patterned photoresist layer.
Subsequently, an electrophoretic material is applied to the pixel region partitioned by the partition wall of the first substrate, that is, the image display unit to form an electrophoretic layer (S204).
On the other hand, a common electrode is formed on the second substrate (S205), the second substrate on which the common electrode is formed is aligned with the first substrate, and then bonded to complete the electrophoretic display device (S206, S207).
The common electrode is formed by laminating a transparent conductive material on a second substrate by deposition or the like, and is formed by the same manufacturing line as a thin film transistor or a pixel electrode formed on the first substrate. In other words, in the present invention, since the process of the second substrate can be carried out in the same manufacturing line as the process of the first substrate, the first substrate and the first substrate and the first substrate are manufactured by manufacturing and transferring the second substrate in another factory in the conventional electrophoretic display device. Compared to the bonding of the two substrates, the first substrate and the second substrate can be manufactured inline, and the first substrate and the second substrate can be bonded together.
As described above, in the present invention, since the manufacturing process of the first substrate and the second substrate is performed inline, the adhesive layer or the adhesive layer for attaching the substrate on which the transfer of the second substrate or the electrophoretic layer is formed to the thin film transistor substrate is protected. To avoid the need for a protective film, the process of aligning the two substrates, the process of peeling off the protective film for protecting the adhesive layer of the substrate on which the electrophoretic layer is formed, etc., it is possible to simplify the manufacturing process.
Furthermore, in the present invention, since the partition wall and the pixel electrode can be formed by one photomask, the manufacturing process can be further simplified and the manufacturing cost can be greatly reduced.
Hereinafter, a method of manufacturing an electrophoretic display device according to an exemplary embodiment of the present invention will be described in detail with reference to FIGS. 4A to 4I. In this case, although the electrophoretic display device is substantially composed of a plurality of unit pixels, only one pixel is shown in the drawing for convenience of description.
First, as shown in FIG. 4A, a Cr, Mo, Ta, Cu, Ti, Al, or Al alloy is formed on a
Subsequently, as illustrated in FIG. 4B, a semiconductor material such as amorphous silicon (a-Si) is deposited on the entire
Thereafter, as shown in FIG. 4C, an electrically conductive opaque metal such as Cr, Mo, Ta, Cu, Ti, Al, or Al alloy is laminated on the
In addition, although not shown, the
A portion of the
Subsequently, as shown in FIG. 4D, the photosensitive organic material is stacked and etched over the entire
Although not illustrated in the drawing, the
Thereafter, as illustrated in FIG. 4E, a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO), Mo, AlNd, or the like is formed over the entire
In the drawing, the
Subsequently, as shown in FIG. 4F, after the
In the case of the
In addition, in the case of color particles as a dye having a charge characteristic, the color particles may have a negative charge or may have a negative charge.
The electrophoretic material may include a dispersion medium such as a liquid polymer. The dispersion medium is a black particle, a white particle, and a color particle are distributed, and may be a liquid such as a liquid polymer or air itself. As described above, that the dispersion medium is air itself means that the particles move in the air as voltage is applied even without the dispersion medium.
When a liquid polymer is used as the dispersion medium, a black dispersion medium or a color dispersion medium may be used as the dispersion medium. When using a black dispersion medium absorbs light incident from the outside, it is possible to improve the contrast by displaying a clear black when implementing black. In addition, the color dispersion medium is used when the color is implemented by the electrophoretic material, each color pixel includes a dispersion medium of the corresponding color, it is possible to express a more vivid color when implementing the color.
In addition, the electrophoretic material may be a material in which a capsule filled with an electron ink is distributed in a polymer binder. At this time, the electron ink distributed in the capsule is composed of white particles (or white ink) and black particles (or black ink). In this case, the white particles and the black particles have positive and negative charge characteristics, respectively.
On the other hand, white particles, black particles, and color particles may be used not only a specific material but all currently known particles.
The filling of the electrophoretic material into the
5A and 5B illustrate a method of forming the
The method illustrated in FIG. 5A relates to an inkjet method or a nozzle method. As shown in FIG. 5A, an
The method illustrated in FIG. 5B relates to a squeeze method, and as shown in FIG. 5B, after the
Of course, the present invention is not limited to the method as described above. The method described above shows an example of the process of forming the
The
As described above, the
On the other hand, in the present invention, since the
In this case, the
Although the
Subsequently, as shown in FIG. 4G, a
The structure of the electrophoretic display device manufactured by the above method will be described in detail with reference to FIG. 4G.
As shown in FIG. 4G, the electrophoretic display device according to the present invention includes a
In addition, in the present invention, since the
Looking at the driving of the electrophoretic display device of such a structure is as follows. When the
For example, when the
At this time, since the density of the
On the contrary, when a negative voltage is applied to the
Meanwhile, when the
On the contrary, when a negative voltage is applied to the
When the electrophoretic material is formed of color particles, color particles such as R, G, B color particles, cyan, magenta, yellow, etc. may be formed according to a signal applied to the
When the electrophoretic material is composed of a polymer filled with white particles and a capsule filled with black particles, since the white particles and the black particles included in the electron ink distributed in the capsule have positive and negative charge characteristics, signals from outside When a signal is applied to the
On the contrary, when a positive voltage is applied to the
In this state, when light is input from the outside, that is, the upper portion of the
In this case, when the white particles and the black particles in the capsule have negative charge and positive charge characteristics, respectively, white and black may be realized in the opposite operation.
As described above, in the present invention, since the
In addition, the present invention compared to the conventional manufacturing and transporting the electrophoretic layer in a separate factory or manufacturer attached to the
Furthermore, in the present invention, the surface-modified
As described above, in the method of manufacturing the electrophoretic display device according to the present invention, the partition wall is directly formed on the first substrate and the electrophoretic layer is also directly filled between the partition walls of the first substrate so that the electrophoretic layer is directly pixel electrode. Unlike the conventional electrophoretic display, a separate adhesive layer for attaching the electrophoretic layer is not required between the electrophoretic layer, the pixel electrode, and the protective layer. Therefore, the electrophoretic display device of this embodiment can simplify the manufacturing process, thereby reducing the manufacturing cost.
In addition, in the present invention, the surface in contact with the electrophoretic layer by the surface modification layer surface treatment, it is possible to effectively prevent defects due to deterioration of the characteristics of the electrophoretic layer.
Although the preferred embodiments of the present invention have been described in detail above, those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom.
120,140
113: semiconductor layer 115: source electrode
116: drain electrode 118: pixel electrode
124: protective layer 142: common electrode
160: electrophoretic layer 164: white particles
165
184: surface modification layer
Claims (12)
A thin film transistor formed on the first substrate;
A protective layer on the substrate on which the thin film transistor is formed;
Barrier ribs formed on the non-image display unit on the passivation layer to define pixels;
A pixel electrode formed on the image display unit on the protective layer;
An electrophoretic layer formed on the pixels between the partition walls;
A common electrode formed on the second substrate; And
A surface modification layer formed on a surface of the pixel electrode, a sidewall of the partition wall, and a surface of the common electrode;
And the electrophoretic layer is in contact with the surface modification layer, and the electrophoretic layer is not in contact with the pixel electrode, the partition wall, and the common electrode by the surface modification layer.
A gate electrode formed on the substrate;
A semiconductor layer formed on the gate electrode; And
An electrophoretic display device comprising a source electrode and a drain electrode formed on the semiconductor layer.
Forming a thin film transistor on the first substrate;
Forming a protective layer on the first substrate on which the thin film transistor is formed;
Forming a partition on the non-image display unit on the protective layer;
Forming a pixel electrode on the image display unit on the protective layer;
Forming a surface modification layer on the sidewalls of the partition and the pixel electrode;
Forming an electrophoretic layer by filling an electrophoretic material in a pixel between the barrier ribs on the protective layer on which the surface modification layer is formed;
Forming a common electrode on the second substrate;
Forming a surface modification layer formed of a material including a COOH group on the common electrode; And
Comprising the step of bonding the first substrate and the second substrate,
And the electrophoretic layer is in contact with the surface modification layer and the electrophoretic layer is not in contact with the pixel electrode, the partition wall and the common electrode by the surface modification layer.
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KR20080070809A (en) * | 2005-11-21 | 2008-07-31 | 후지필름 가부시키가이샤 | Photosensitive transfer material, partition wall and method for forming same, optical device and method for producing same, and display |
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