WO2002058154A2 - Halbleiter-bauelement mit esd-schutz - Google Patents

Halbleiter-bauelement mit esd-schutz Download PDF

Info

Publication number
WO2002058154A2
WO2002058154A2 PCT/DE2002/000175 DE0200175W WO02058154A2 WO 2002058154 A2 WO2002058154 A2 WO 2002058154A2 DE 0200175 W DE0200175 W DE 0200175W WO 02058154 A2 WO02058154 A2 WO 02058154A2
Authority
WO
WIPO (PCT)
Prior art keywords
conductor track
semiconductor component
component according
signal
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2002/000175
Other languages
German (de)
English (en)
French (fr)
Other versions
WO2002058154A3 (de
Inventor
Marco Troost
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to JP2002558338A priority Critical patent/JP3886905B2/ja
Priority to DE50211919T priority patent/DE50211919D1/de
Priority to KR10-2003-7009295A priority patent/KR100530449B1/ko
Priority to EP02706607A priority patent/EP1360726B1/de
Publication of WO2002058154A2 publication Critical patent/WO2002058154A2/de
Anticipated expiration legal-status Critical
Priority to US10/623,815 priority patent/US7250659B2/en
Publication of WO2002058154A3 publication Critical patent/WO2002058154A3/de
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W42/00Arrangements for protection of devices
    • H10W42/80Arrangements for protection of devices protecting against overcurrent or overload, e.g. fuses or shunts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/932Plan-view shape, i.e. in top view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Definitions

  • the invention relates to a semiconductor component according to the features of the preamble of patent claim 1.
  • Integrated circuits are supplied with external supply potentials as well as input signals to be processed and processed output signals are tapped.
  • the input signal connections are very sensitive, since the conductor tracks used for feeding lead directly to a gate connection of an input switching stage.
  • the human body can thus be electrostatically charged, which charges are then discharged via the outward leads of the semiconductor component containing the integrated circuit.
  • Tools from placement machines or test equipment can also be electrostatically charged and discharged via the semiconductor component. With ever smaller structural widths on the semiconductor body carrying the integrated circuit, there is a need for protection against such electrostatic discharges.
  • ESD protective elements electrostatic discharge
  • the input connection is connected to reference potential (ground) via an ESD protection structure, which essentially has a diode characteristic.
  • the ESD protection structure is completely in
  • the protective structure is to be dimensioned such that it is to be processed when creating Signal does not switch within the specified specification and attenuates the signal curves as little as possible.
  • the diode characteristic must therefore have a high breakdown voltage.
  • the diodes used or transistors connected as diodes must be dimensioned over a large area in order to have a correspondingly high current carrying capacity. It is therefore disadvantageous that the ESD protective structures require a high area consumption in the semiconductor body in order to meet the set conditions after high breakdown voltage and high current carrying capacity.
  • EP 0 736 904 AI Another semiconductor circuit with protective elements against electrostatic discharges is shown in EP 0 736 904 AI.
  • Protective elements are arranged there between a connection pad and conductor tracks running on the semiconductor chip. In sections, the conductor tracks run parallel to the edge of the semiconductor chip. One of the conductor tracks forms a ring running around the semiconductor chip.
  • the object of the invention is to provide a semiconductor component in which the area consumption in the semiconductor body is as small as possible, but sufficient ESD protection is nevertheless guaranteed.
  • a semiconductor component comprising: a semiconductor body, in which an electronic circuit is arranged, which has a connection for a signal to be processed, to which an input stage or
  • Output stage of the electronic circuit is connected, and which has a connection for a supply potential to which the input stage or the output stage is connected, each one of the interconnects assigned to one of the connections, which runs outside the semiconductor body and which is connected to the respectively assigned connection Element for dissipating electrostatic discharges, through which the working signal to the supply potential can be dissipated, in which a further conductor is also provided, which runs outside the semiconductor body and which is connected to the conductor associated with the connection for the supply potential, and in which the element for discharging electrostatic charges on the one hand with the further conductor and on the other hand, is connected to the conductor track assigned to the connection for the signal to be processed.
  • the ESD elements are no longer implemented in the semiconductor body.
  • an integrated design of ESD protective structures would not consume a negligible amount of space. This area consumption is saved in the semiconductor component according to the invention.
  • the ESD protection elements are arranged outside the semiconductor body.
  • a further conductor track is provided which leads to supply potential, preferably ground, and is guided past those conductor tracks via which the input or output signals are input or output to the functional units of the semiconductor body.
  • the invention is suitable both for discrete-value, digitally operating input and output stages and for continuous-value, analogue input and output stages.
  • it is advantageous that the ESD protection element arranged outside the semiconductor body can now be made larger than when it is integrated. This increases the ESD resistance.
  • connection pads are provided in the integrated semiconductor chip, i.e. extensive metallizations, which the
  • H P CQ pi ⁇ - • ⁇ - ⁇ ; 3 meets Mi CQ ⁇ - ⁇ N «H rt LQ. H K ⁇ H ⁇
  • Pi ⁇ - P rt H ⁇ O ⁇ P ⁇ - ⁇ co P ⁇ ⁇ ⁇ * ⁇ P tr ⁇ ⁇ Pi rt rt ⁇ ! Pi PJ tr ⁇ tr ⁇ ⁇ PPH ⁇ - ii PH 0 Pi h- 1 Ü li ⁇ ⁇ ⁇ 0 ⁇ PP )
  • the further conductor track can have a short section branching off from its main course direction.
  • the section expediently runs in the direction of the semiconductor body or in the opposite direction away from the semiconductor body. This branch serves as a contact surface for the anode of the ESD protection diode.
  • An input stage can consist of an inverter.
  • the input connection of the inverter is formed by the coupled gate connections of its complementary MOS transistors and is connected to the assigned connection pad.
  • the source connection of the n-channel MOS transistor of the inverter is connected to reference potential ground, that is to say it is connected to a signal line in the semiconductor body which leads to the connection pad which is supplied by the conductor track carrying the reference potential, which in turn is connected to the further conductor track crossing the conductor tracks of the lead frame is connected.
  • FIG. 1 shows a semiconductor body 1 on which an integrated circuit is arranged.
  • a CMOS input switching stage 13 is shown in part of the integrated circuit. It includes two with their drain-source
  • the additional conductor track 3 also crosses the conductor tracks 14, 15 of the lead frame that carry the signals DQ1, DQ2.
  • ESD elements 32, 33 are provided, which are connected between the conductor track 3 and the relevant one of the conductor tracks 14, 15.
  • the anode of a diode 32 is connected to the conductor track 3 at the point 321 and to the conductor track 15 at the point 322.
  • the diode 32 serves as an ESD protective element. It has a high breakdown voltage in order not to burden the signal DQ1 within the specification.
  • the diode 32 breaks down and is dimensioned sufficiently so that sufficient charge can flow away from the conductor track 15 via the contact points 322, 321 to the conductor track 3 and further via the bonding wire 31 to the ground conductor track 16. This protects the gate oxide on transistor 131 of inverter 13 from a breakdown.
  • the ESD protection diode 32 does not take up any area on the semiconductor body. The area consumption would not be negligible, since a high breakdown voltage would have to be achieved with sufficient current carrying capacity.
  • the conductor track 14 for the signal DQ2 to be processed is connected to the ring conductor track 3 via another ESD protection diode 33.
  • a branch 34 of the conductor track 3 is provided in the vicinity of the point of intersection of the conductor track 14 with the conductor track 3 and runs parallel to the corresponding section of the conductor track 14.
  • the branch 34 is directed outwards; alternatively, it can also be directed inwards towards the semiconductor body 1.
  • the branch 34 is so far away from the crossing point that the anode of the ESD protective diode contacts the branch 34 and the cathode contacts the conductor track 14.
  • the signal DQ1 is one which is incorporated in the circuit on the semiconductor body 1 is to be entered.
  • the signal DQ2 is, for example, one which is to be output by the circuit.
  • the connecting pad 10 is connected to an output driver of the integrated circuit, for example an output of an inverter or 'a tri-state level. It is also possible that the signals DQ1, DQ2 are bidirectional signals and both serve to supply or tap data or analog signals to the integrated circuit.
  • crossing locations of further metal conductor track 3 and signal-carrying conductor tracks 14, 15 are to be designed such that contact between the conductor track 3 carrying ground potential GND and the conductor tracks 14, 15 carrying an input / output signal is prevented. On the one hand, this can be achieved in that the conductor tracks are sufficiently far apart from one another at the crossings. On the other hand, insulation 36, 37 is appropriate. which is arranged between the mutually opposite surfaces of the metallic conductor tracks 3, 15 and 14.

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
PCT/DE2002/000175 2001-01-19 2002-01-21 Halbleiter-bauelement mit esd-schutz Ceased WO2002058154A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002558338A JP3886905B2 (ja) 2001-01-19 2002-01-21 Esd保護を備える半導体部品
DE50211919T DE50211919D1 (de) 2001-01-19 2002-01-21 Halbleiter-Bauelement mit ESD-Schutz
KR10-2003-7009295A KR100530449B1 (ko) 2001-01-19 2002-01-21 Esd 보호 소자를 포함하는 반도체 소자
EP02706607A EP1360726B1 (de) 2001-01-19 2002-01-21 Halbleiter-Bauelement mit ESD-Schutz
US10/623,815 US7250659B2 (en) 2001-01-19 2003-07-21 Semiconductor component with ESD protection

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10102354A DE10102354C1 (de) 2001-01-19 2001-01-19 Halbleiter-Bauelement mit ESD-Schutz
DE10102354.5 2001-01-19

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/623,815 Continuation US7250659B2 (en) 2001-01-19 2003-07-21 Semiconductor component with ESD protection

Publications (2)

Publication Number Publication Date
WO2002058154A2 true WO2002058154A2 (de) 2002-07-25
WO2002058154A3 WO2002058154A3 (de) 2003-08-21

Family

ID=7671118

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/000175 Ceased WO2002058154A2 (de) 2001-01-19 2002-01-21 Halbleiter-bauelement mit esd-schutz

Country Status (7)

Country Link
US (1) US7250659B2 (https=)
EP (1) EP1360726B1 (https=)
JP (1) JP3886905B2 (https=)
KR (1) KR100530449B1 (https=)
CN (1) CN1244151C (https=)
DE (2) DE10102354C1 (https=)
WO (1) WO2002058154A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004031455B4 (de) * 2004-06-29 2014-10-30 Infineon Technologies Ag Verfahren zur Erstellung eines ESD-Schutzes bei einem mikroelektronischen Baustein und entsprechend ausgebildeter mikroelektronischer Baustein
US9387313B2 (en) 2004-08-03 2016-07-12 Interventional Spine, Inc. Telescopic percutaneous tissue dilation systems and related methods
JP4993092B2 (ja) * 2007-05-31 2012-08-08 富士電機株式会社 レベルシフト回路および半導体装置
US7586179B2 (en) * 2007-10-09 2009-09-08 Fairchild Semiconductor Corporation Wireless semiconductor package for efficient heat dissipation
US10015916B1 (en) * 2013-05-21 2018-07-03 Xilinx, Inc. Removal of electrostatic charges from an interposer via a ground pad thereof for die attach for formation of a stacked die
US9960227B2 (en) 2013-09-11 2018-05-01 Xilinx, Inc. Removal of electrostatic charges from interposer for die attachment
US11088134B2 (en) 2016-11-07 2021-08-10 Dialog Semiconductor (Uk) Limited Electrostatic discharge device and split multi rail network with symmetrical layout design technique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH065705B2 (ja) * 1989-08-11 1994-01-19 株式会社東芝 半導体集積回路装置
JPH03156965A (ja) * 1989-11-15 1991-07-04 Fujitsu Ltd 半導体集積回路装置
JPH05308107A (ja) * 1991-07-01 1993-11-19 Sumitomo Electric Ind Ltd 半導体装置及びその製作方法
JP2888005B2 (ja) * 1992-01-24 1999-05-10 住友電気工業株式会社 マイクロ波デバイス用パッケージ
EP0623958B1 (de) * 1993-05-04 1998-04-01 Siemens Aktiengesellschaft Integrierte Halbleiterschaltung mit einem Schutzmittel
DE19507313C2 (de) * 1995-03-02 1996-12-19 Siemens Ag Halbleiterbauelement mit Schutzstruktur zum Schutz vor elektrostatischer Entladung
DE59510495D1 (de) * 1995-04-06 2003-01-16 Infineon Technologies Ag Integrierte Halbleiterschaltung mit einem Schutzmittel
US5917362A (en) * 1996-01-29 1999-06-29 Sony Corporation Switching circuit
JPH1022448A (ja) 1996-07-03 1998-01-23 Oki Micro Design Miyazaki:Kk 静電破壊/ラッチアップ対策半導体装置
US6476486B1 (en) * 1997-10-30 2002-11-05 Agilent Technologies, Inc. Ball grid array package with supplemental electronic component
US5886862A (en) * 1997-11-26 1999-03-23 Digital Equipment Corporation Cross-referenced electrostatic discharge protection systems and methods for power supplies

Also Published As

Publication number Publication date
EP1360726B1 (de) 2008-03-19
CN1244151C (zh) 2006-03-01
CN1488171A (zh) 2004-04-07
DE10102354C1 (de) 2002-08-08
US20040056339A1 (en) 2004-03-25
EP1360726A2 (de) 2003-11-12
KR100530449B1 (ko) 2005-11-22
KR20030072594A (ko) 2003-09-15
JP3886905B2 (ja) 2007-02-28
DE50211919D1 (de) 2008-04-30
JP2004531051A (ja) 2004-10-07
WO2002058154A3 (de) 2003-08-21
US7250659B2 (en) 2007-07-31

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