WO2002038324A1 - Dispositif d'usinage optique - Google Patents
Dispositif d'usinage optique Download PDFInfo
- Publication number
- WO2002038324A1 WO2002038324A1 PCT/JP2001/009697 JP0109697W WO0238324A1 WO 2002038324 A1 WO2002038324 A1 WO 2002038324A1 JP 0109697 W JP0109697 W JP 0109697W WO 0238324 A1 WO0238324 A1 WO 0238324A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- nozzle
- optical processing
- optical
- laser light
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 238000003754 machining Methods 0.000 title abstract 6
- 238000007599 discharging Methods 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 19
- 238000001816 cooling Methods 0.000 abstract description 12
- 239000006059 cover glass Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 235000008247 Echinochloa frumentacea Nutrition 0.000 abstract 1
- 240000004072 Panicum sumatrense Species 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 27
- 239000000356 contaminant Substances 0.000 description 6
- 239000000428 dust Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002274 desiccant Substances 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 230000005679 Peltier effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1462—Nozzles; Features related to nozzles
- B23K26/1464—Supply to, or discharge from, nozzles of media, e.g. gas, powder, wire
- B23K26/1476—Features inside the nozzle for feeding the fluid stream through the nozzle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/16—Removal of by-products, e.g. particles or vapours produced during treatment of a workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
Definitions
- the present invention relates to an optical processing device that processes a workpiece with laser light.
- the conventional optical processing device shown in Fig. 2 condenses the light emitted from the semiconductor laser 101, which converts electrical energy (without describing the electrical circuit) into optical energy and outputs it. Irradiate 1 1
- the output end face 102 of the semiconductor laser 101 and the surface of the lens group 105 forming the condensing optical system are used in order to make effective use of the generated optical energy.
- a conventional processing apparatus has a desiccant 113 provided in a closed room 103 in which a semiconductor laser 101 and a lens group 105 are installed. Water droplets and other contaminants are prevented from adhering to the surface of the output end face 102 of 1.
- the shielding gas 110 is generally supplied using a side nozzle 108 attached at a different position and angle from the optical processing device.
- the semiconductor laser 101 and the lens group 105 are large heating elements.
- the semiconductor laser 101 mainly uses a water-cooled structure, and also uses an electronic cooling system using the Peltier effect.
- lens group 105 fix the lens during processing
- the temperature of the case 104 changes greatly, the positional accuracy and optical accuracy of the lens group 105 for condensing light are affected by the temperature change, and the light collecting performance, that is, the processing performance is changed.
- the cover glass 107 is added to the lens group to protect the lens group 105 from contaminant gas such as fumes and dust generated from the processing portion 112 of the workpiece 111. Installed.
- the mounting angle 0 of the side nozzle 1 08 that supplies the shielding gas 1 10 that protects the processing section 1 1 2 of the work 1 1 1 from the surrounding air 0, the distance d from the processing section, the processing direction X and the side nozzle 1
- the surrounding air may be entrained, and the processed portion 112 may not be shielded well.
- a water-cooled structure is mainly used for the semiconductor laser 101 in order to reduce the temperature of the optical processing apparatus.
- the temperature gradient between the cooling end inside the semiconductor laser 101 and the heat source increases, and the heat source, that is, the light emitting unit temperature rises, and the semiconductor laser 1 01
- the life of 1 may be adversely affected.
- the optical processing device has a laser light source, a case in which the laser light source is housed and an inlet for introducing gas and an outlet for discharging gas are formed, and the path of laser light emitted from the laser light source.
- the lens includes a lens disposed thereon, a lens holder that holds the lens, and a tube that covers an outer periphery of the lens holder and that forms a gap through which gas flows between the lens holders.
- FIG. 1 is a sectional view showing an internal configuration of an optical processing device according to an embodiment of the present invention.
- FIG. 2 is a cross-sectional view of a main part illustrating an internal configuration and a processing state of a conventional optical processing apparatus.
- the optical processing apparatus uses a shielding gas 10 for welding mainly composed of argon or nitrogen for processing.
- the gas 10 entered from the gas inlet 9 serving as the gas inlet enters the room 3 and passes through the semiconductor laser 1 which is a water-cooled laser-light source and the surrounding optical system. After that, the gas 10 passes through a slit 14 provided as a gas discharge port provided around the lens holder 6, flows through the gap between the case 4 and the lens holder 16, and is rectified by the nozzle 8 before the work 11 It flows out to cover the processed part.
- a shielding gas 10 for welding mainly composed of argon or nitrogen for processing.
- the dry state can be constantly maintained in the room 3, and a dustproof effect can be obtained.
- the gas 10 deprives the heat generated by the semiconductor laser 1 and the surrounding optical system, and the cooling action is further improved by adding the air cooling action as compared with the case where the semiconductor laser 1 is cooled only by water cooling. .
- the gas 10 flows around the lens holder 6, and the temperature rise of the lens holder 8 is suppressed by the air cooling action, so that the accuracy of the optical system can be maintained.
- the flow path of gas 10 is changed by the nozzle 8, and part of the gas 10 is covered by the cover glass 7 that protects the lens surface from contaminant gases such as fumes generated from the processing section 12 and particles generated by dust and the like. Flows along the surface. Therefore, gas 10 prevents contaminant gases and generated particles from reaching the surface of cover glass 7, Since the surface contamination is prevented, the processing performance of the apparatus is stabilized.
- the gas 10 is emitted from the nozzle 8 coaxially with the light condensed and irradiated by the lens group 5 and is sprayed onto the work 11 to evenly shield the processing portion 12. Therefore, a stable shielding effect that is less affected by the processing direction and the processing distance can be obtained.
- the semiconductor laser and the optical system around the semiconductor laser can always be operated in a clean gas, so that the moisture resistance and the dust resistance are improved, and the reliability is improved.
- the heat generated by the semiconductor laser and the surrounding optical system can also be air-cooled by the gas, so the life is improved compared to a device that only uses water-cooling for cooling.
- the optical accuracy can be maintained by air cooling the optical system, and the processing performance is stabilized.
- contaminant gas and contaminant particles generated from the processing section are prevented from reaching the surface of the optical processing device, and maintenance man-hours and costs are reduced. Further, the processing quality is improved because the processing portion is reliably shielded by the processing gas.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Semiconductor Lasers (AREA)
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002396643A CA2396643C (en) | 2000-11-07 | 2001-11-06 | Optical machining device |
US10/169,480 US6791061B2 (en) | 2000-11-07 | 2001-11-06 | Optical machining device |
EP01980985.4A EP1332829B1 (en) | 2000-11-07 | 2001-11-06 | Optical machining device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000338633A JP4055353B2 (ja) | 2000-11-07 | 2000-11-07 | 光加工装置 |
JP2000-338633 | 2000-11-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002038324A1 true WO2002038324A1 (fr) | 2002-05-16 |
Family
ID=18813814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/009697 WO2002038324A1 (fr) | 2000-11-07 | 2001-11-06 | Dispositif d'usinage optique |
Country Status (6)
Country | Link |
---|---|
US (1) | US6791061B2 (ja) |
EP (1) | EP1332829B1 (ja) |
JP (1) | JP4055353B2 (ja) |
CN (1) | CN1179817C (ja) |
CA (1) | CA2396643C (ja) |
WO (1) | WO2002038324A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020054593A1 (ja) * | 2018-09-13 | 2020-03-19 | パナソニック株式会社 | 光学装置 |
CN111717352A (zh) * | 2020-06-28 | 2020-09-29 | 南京信息工程大学 | 一种水下机器人自动烘干系统 |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2846581B1 (fr) * | 2002-10-31 | 2006-01-13 | Usinor | Procede et dispositif de pointage d'un jet fin de fluide, notamment en soudage, usinage, ou rechargement laser |
US7060932B2 (en) | 2003-03-18 | 2006-06-13 | Loma Linda University Medical Center | Method and apparatus for material processing |
US7057134B2 (en) * | 2003-03-18 | 2006-06-06 | Loma Linda University Medical Center | Laser manipulation system for controllably moving a laser head for irradiation and removal of material from a surface of a structure |
US7286223B2 (en) * | 2003-03-18 | 2007-10-23 | Loma Linda University Medical Center | Method and apparatus for detecting embedded rebar within an interaction region of a structure irradiated with laser light |
US7379483B2 (en) * | 2003-03-18 | 2008-05-27 | Loma Linda University Medical Center | Method and apparatus for material processing |
US7038166B2 (en) * | 2003-03-18 | 2006-05-02 | Loma Linda University Medical Center | Containment plenum for laser irradiation and removal of material from a surface of a structure |
US7880116B2 (en) * | 2003-03-18 | 2011-02-01 | Loma Linda University Medical Center | Laser head for irradiation and removal of material from a surface of a structure |
JP2005088052A (ja) * | 2003-09-18 | 2005-04-07 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP2006049605A (ja) * | 2004-08-05 | 2006-02-16 | Sumitomo Electric Ind Ltd | 半導体レーザ装置 |
EP1657020A1 (de) * | 2004-11-10 | 2006-05-17 | Synova S.A. | Verfahren und Vorrichtung zur Optimierung der Kohärenz eines Flüssigkeitsstrahls für eine Materialbearbeitung und Flüssigkeitsdüse für eine solche Vorrichtung |
KR101352895B1 (ko) * | 2005-12-01 | 2014-02-19 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 레이저 마이크로기계가공 응용제품들에 있어서 광학컴포넌트 청결 및 파편 관리 |
JP4840110B2 (ja) * | 2006-03-09 | 2011-12-21 | 日産自動車株式会社 | レーザ溶接装置およびレーザ溶接方法 |
CN100463977C (zh) * | 2006-07-31 | 2009-02-25 | 中国航天科技集团公司第五研究院第五一○研究所 | 大气环境下激光表面改性气体保护方法及装置 |
TWI341242B (en) * | 2007-07-31 | 2011-05-01 | Nat Applied Res Laboratories | Device for cutting brittle material |
JP4657267B2 (ja) * | 2007-08-10 | 2011-03-23 | トヨタ自動車株式会社 | レーザ溶接検査装置 |
FR2940154B1 (fr) * | 2008-12-23 | 2011-02-25 | Commissariat Energie Atomique | Avaloir d'aspiration de particules fines et dispositif d'ablation laser d'une couche superficielle d'une paroi comprenant un tel avaloir |
DE102009008232A1 (de) * | 2009-02-10 | 2010-08-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Einrichtung und Verfahren zur Anbindung einer optischen Messeinrichtung an ein Messvolumen |
DE102011016932A1 (de) * | 2011-04-13 | 2012-10-18 | Precitec Kg | Kassette zur Halterung einer Optik in einem Laserbearbeitungskopf |
CN102699529A (zh) * | 2012-05-30 | 2012-10-03 | 深圳市华星光电技术有限公司 | 改进的激光退火设备 |
CN104174993A (zh) * | 2013-05-23 | 2014-12-03 | 深圳市通发激光设备有限公司 | 具有自动消除固体激光器热透镜效应装置的激光焊接机 |
CN103521921B (zh) * | 2013-10-29 | 2016-06-22 | 西安炬光科技股份有限公司 | 一种高功率半导体激光器加工系统 |
CN103537795B (zh) * | 2013-10-29 | 2016-03-30 | 西安炬光科技股份有限公司 | 高功率半导体激光器加工系统 |
DE102014201763A1 (de) * | 2014-01-31 | 2015-08-06 | Siemens Aktiengesellschaft | Probenaufnahme für eine Messeinrichtung zum Messen einer Staubprobe |
US10464167B2 (en) * | 2014-07-15 | 2019-11-05 | Toyokoh Co., Ltd. | Laser irradiation apparatus |
JP2016225527A (ja) * | 2015-06-02 | 2016-12-28 | 株式会社リコー | レーザ発光装置、エンジン点火プラグシステム |
JP6166310B2 (ja) * | 2015-06-11 | 2017-07-19 | ファナック株式会社 | レーザ発振部、空気冷却機、および除湿器を共通の冷却水にて冷却するレーザ装置 |
US11285566B2 (en) * | 2017-03-14 | 2022-03-29 | Honda Motor Co., Ltd. | Laser machining apparatus |
JP7004381B2 (ja) * | 2017-03-22 | 2022-01-21 | 株式会社Screenホールディングス | 描画装置、及び描画装置の汚染防止方法 |
JP6659745B2 (ja) * | 2018-02-16 | 2020-03-04 | ファナック株式会社 | アシストガスを整流する機能を有するレーザ加工ヘッド |
JP6852031B2 (ja) * | 2018-09-26 | 2021-03-31 | 株式会社東芝 | 溶接装置及びノズル装置 |
JP6986165B2 (ja) * | 2018-10-05 | 2021-12-22 | 英弘精機株式会社 | 気象観測用ライダー |
DE102019103659B4 (de) * | 2019-02-13 | 2023-11-30 | Bystronic Laser Ag | Gasführung, Laserschneidkopf und Laserschneidmaschine |
JP7362409B2 (ja) * | 2019-10-17 | 2023-10-17 | キヤノン株式会社 | 照明装置およびカメラシステム |
CN111541146A (zh) * | 2020-05-13 | 2020-08-14 | 山西烽通光电技术有限责任公司 | 一种高效散热的半导体激光器 |
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JPS61216380A (ja) * | 1985-03-20 | 1986-09-26 | Fuji Photo Film Co Ltd | 半導体レ−ザ光源装置 |
JPH10180476A (ja) | 1996-12-26 | 1998-07-07 | Ishikawajima Harima Heavy Ind Co Ltd | 水中レーザトーチ |
JP2001358397A (ja) * | 2000-06-15 | 2001-12-26 | Matsushita Electric Ind Co Ltd | レーザ加熱装置 |
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US3696230A (en) * | 1970-01-19 | 1972-10-03 | Hughes Aircraft Co | Laser lens cooling and cleaning system |
JPS56102392A (en) * | 1980-01-22 | 1981-08-15 | Nec Corp | Laser working optical device |
JPS58128781A (ja) * | 1982-01-27 | 1983-08-01 | Hitachi Ltd | レ−ザ発生装置 |
CA2034551C (en) * | 1990-01-29 | 2000-08-01 | Henry Kobsa | Method for laser cutting metal plates |
CN2108601U (zh) | 1991-12-25 | 1992-07-01 | 华中理工大学 | 激光加工机透镜辅助气体冷却装置 |
DE4339628C2 (de) * | 1993-11-20 | 2003-04-10 | Ismar Maschinen Gmbh | Knetvorrichtung |
NZ272635A (en) | 1994-08-02 | 1998-02-26 | Mcneil Ppc Inc | Laser cutting/drilling processing head that creates a vortex gas flow within the head to clean and prevent back spatting of particles onto the lens therein |
JP3237441B2 (ja) * | 1995-02-28 | 2001-12-10 | 三菱電機株式会社 | レーザ加工装置 |
US5898522A (en) * | 1995-10-06 | 1999-04-27 | Herpst; Robert D. | Protective window assembly and method of using the same for a laser beam generating apparatus |
JP2001030199A (ja) * | 1999-07-16 | 2001-02-06 | Olympus Optical Co Ltd | レーザープローブ |
-
2000
- 2000-11-07 JP JP2000338633A patent/JP4055353B2/ja not_active Expired - Fee Related
-
2001
- 2001-11-06 CA CA002396643A patent/CA2396643C/en not_active Expired - Fee Related
- 2001-11-06 WO PCT/JP2001/009697 patent/WO2002038324A1/ja active Application Filing
- 2001-11-06 US US10/169,480 patent/US6791061B2/en not_active Expired - Fee Related
- 2001-11-06 EP EP01980985.4A patent/EP1332829B1/en not_active Expired - Lifetime
- 2001-11-06 CN CNB01803425XA patent/CN1179817C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS61216380A (ja) * | 1985-03-20 | 1986-09-26 | Fuji Photo Film Co Ltd | 半導体レ−ザ光源装置 |
JPH10180476A (ja) | 1996-12-26 | 1998-07-07 | Ishikawajima Harima Heavy Ind Co Ltd | 水中レーザトーチ |
JP2001358397A (ja) * | 2000-06-15 | 2001-12-26 | Matsushita Electric Ind Co Ltd | レーザ加熱装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1332829A4 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020054593A1 (ja) * | 2018-09-13 | 2020-03-19 | パナソニック株式会社 | 光学装置 |
US11476639B2 (en) | 2018-09-13 | 2022-10-18 | Panasonic Holdings Corporation | Optical apparatus |
US11894653B2 (en) | 2018-09-13 | 2024-02-06 | Panasonic Holdings Corporation | Optical apparatus |
CN111717352A (zh) * | 2020-06-28 | 2020-09-29 | 南京信息工程大学 | 一种水下机器人自动烘干系统 |
CN111717352B (zh) * | 2020-06-28 | 2021-03-23 | 南京信息工程大学 | 一种水下机器人自动烘干系统 |
Also Published As
Publication number | Publication date |
---|---|
US6791061B2 (en) | 2004-09-14 |
EP1332829A4 (en) | 2008-01-09 |
US20030132210A1 (en) | 2003-07-17 |
EP1332829B1 (en) | 2014-05-07 |
JP2002144073A (ja) | 2002-05-21 |
EP1332829A1 (en) | 2003-08-06 |
CN1179817C (zh) | 2004-12-15 |
CA2396643A1 (en) | 2002-05-16 |
CA2396643C (en) | 2007-04-17 |
CN1394156A (zh) | 2003-01-29 |
JP4055353B2 (ja) | 2008-03-05 |
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