WO1993007179A2 - Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente - Google Patents
Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente Download PDFInfo
- Publication number
- WO1993007179A2 WO1993007179A2 PCT/EP1992/002327 EP9202327W WO9307179A2 WO 1993007179 A2 WO1993007179 A2 WO 1993007179A2 EP 9202327 W EP9202327 W EP 9202327W WO 9307179 A2 WO9307179 A2 WO 9307179A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compound
- group
- composite materials
- thermally
- polymer
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/355—Non-linear optics characterised by the materials used
- G02F1/361—Organic materials
- G02F1/3615—Organic materials containing polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
- Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
Definitions
- the invention relates to composite materials which contain nanoscale particles (hereinafter also referred to as "clusters") in a polymer matrix.
- the invention further relates to a process for the production of such composite materials, in which sols of nanoscale metal antimonides, arsenides, chalcogenides, halides or phosphides are stabilized using special stabilizers and then condensed or polymerized into a polymer matrix. Finally, the invention relates to the use of those produced in this way
- the invention relates to a process for the production of composite materials containing nanoscale particles, in which an organic solvent is used
- a bifunctional compound which has at least one electron pair donor group and at least one by polymerization or polycondensation have a group that can be converted into an organic or inorganic network
- Suitable metal compounds (a) are
- Solvent-soluble compounds for example salts (e.g. halides, sulfates, nitrates, phosphates),
- Complex salts e.g. tetrafluoroborates, hexachloroplatinates
- alcoholates e.g. methylates, ethylates
- Isopropylates butylates, glycolates
- phenolates carbonates
- carboxylates e.g. formates, acetates, propionates, oxalates, succinates, benzoates
- hydrides e.g. formates, acetates, propionates, oxalates, succinates, benzoates
- complexes coordination compounds such as amine complexes, amine complexes, cyanocomplexes and chelates such as acetyoxyl acetonates
- aminocarboxylates e.g. formates, acetates, propionates, oxalates, succinates, benzoates
- hydrides e.g. formates, acetates, propionates, oxalates, succinates, benzoates
- complexes coordination compounds such as amine complexes, amine complexes, cyanocomplexes and chelates such as acetyoxy
- the precipitation reagent (b) is a compound which, when reacted with the metal compound (a), is an antimonide,
- Precipitation reagents (b) include, for example, salts soluble in the reaction medium (e.g. alkali metal or
- Antimonides arsenides, hydroxides, sulfides, selenides,
- the metal compound (a) and the precipitation reagent (b) are each selected so that a compound which is insoluble or poorly soluble in the reaction medium is formed in the form of a sol.
- nanoscale particles that can be produced are oxides such as ZnO, CdO, SiO 2 , TiO 2 , ZrO 2 , CeO 2 , SnO 2 ,
- the bifunctional compound (c) contains at least one electron pair donor group or a group which can be converted into such an electron pair donor group.
- the electron pair donor group can be neutral or electrically negatively charged and is usually derived from atoms such as O, N or S.
- Such groups are e.g. B. primary, secondary or tertiary amine or amide groups, nitrile, isonitrile, cyanate, isocyanate, thiocyanate, isothiocyanate, azide, thiol, thiolate, sulfide, sulfinate, sulfonate, phosphate , Hydroxyl, alcoholate, phenolate, carbonyl and carboxylate groups.
- Groups which can be converted into an electron pair donor group are e.g. B. the carboxylic acid or carboxylic acid anhydride group and
- Electron pair donor groups contain e.g. Legs
- Ethylenediamine group or corresponding fully or partially alkylated groups a glycol or glycolate group, a ketocarboxylic acid or ketocarboxylic acid ester group, a ß-dicarbonyl group (e.g. acetylactonate group), a ß-ketoester group (e.g. acetoacetic acid ethyl, allyl or - vinyl ester group) or a (meth) acrylic acid group.
- the bifunctional compound (c) contains at least one group which can be converted into an inorganic network by polycondensation.
- Bifunctional compounds of this type are e.g. B. called in US-PS 5030608.
- the bifunctional compound (c) contains
- organic Network transferable group examples include the epoxy group and radicals with double or triple bonds, such as vinyl, allyl, (meth) acrylic and ethinyl.
- bifunctional compound (c) are either direct
- Bridge group (e.g. alkylene or arylene) connected to each other.
- Compounds (c) are: H 2 N- (CH 2 ) 3 -Si (OC 2 H 5 ) 3 , (C 2 H 5 ) 2 N (CH 2 ) 3 Si (OC 2 H 5 ) 3 ,
- Compound (c) can e.g. B. at temperatures from 0 ° C to the boiling point of the solvent used.
- the work is preferably carried out at room temperature.
- the reaction pressure is also not critical.
- the reaction is usually carried out at atmospheric pressure; but it can also be worked at increased or reduced pressure.
- preferred organic solvents are alcohols, such as methanol, ethanol, propanol and butanol, ethers, such as diethyl ether, dibutyl ether and
- Tetrahydrofuran ether alcohols such as butoxyethanol, esters such as ethyl acetate, aliphatic and cycloaliphatic hydrocarbons such as pentane, hexane and cyclohexane, and aromatic hydrocarbons such as toluene.
- ether alcohols such as butoxyethanol
- esters such as ethyl acetate
- aliphatic and cycloaliphatic hydrocarbons such as pentane, hexane and cyclohexane
- aromatic hydrocarbons such as toluene.
- reaction takes place within a few minutes to a few hours.
- inert gas protection e.g.
- Nitrogen, argon, carbon dioxide worked.
- the precipitation reagent (b) is generally used at least in the stoichiometrically required amount, preferably in a slight excess, based on the metal compound (a).
- Bifunctional compound (c) is preferably 1: 1 to 1:50, in particular 1: 5 to 1:20.
- the resulting sol of nanoscale particles stabilized by the bifunctional compound (c) is formed, if appropriate after partial separation of the
- polymerizable compound (d) can be replaced by a corresponding finished polymer (f), which additionally z. B. is mixed in the form of an organic solution.
- Plastics e.g. B. polyacrylic acid, polymethacrylic acid, polyacrylates, polymethacrylates, polyolefins, polystyrene, polyamides, polyimides, polyvinyl compounds, such as
- Polyvinyl chloride, polyvinyl alcohol, polyvinyl butyral, polyvinyl acetate and corresponding copolymers e.g. B.
- Polyarylates polycarbonates, polyethers, e.g. B.
- Polyoxymethylene Polyethylene oxide or polyphenylene oxide, polyether ketones, polysulfones, polyepoxides, fluoropolymers, e.g. B. polytetrafluoroethylene, and organopolysiloxanes.
- Transparent polymers (f) are preferably used.
- the compound (d) which is curable or polymerisable thermally or photochemically to form a polymer is generally a polycondensable or
- Tetrafluoroethylene chlorotrifluoroethylene, vinyl chloride, vinyl fluoride, vinylidene fluoride, vinylidene chloride),
- Vinyl acetate, vinyl pyrrolidone, vinyl carbazole and mixtures such monomers can also be used, for. B. butadiene and
- Ethylene dimethacrylate examples of monomers (d) which give an organic / inorganic or purely inorganic polymer matrix are
- hydrolyzable and condensable compounds are preferably those of Si, Al, B, Pb, Sn, Ti, Zr, V and Zn, in particular those of Si, Al, Ti and Zr or mixtures thereof. But others can too
- hydrolyzable compounds are used,
- the compounds just mentioned preferably make up no more than 20 and in particular no more than 10 mol% of the hydrolyzable monomeric compounds used overall.
- hydrolyzable groups in these compounds are halogen (F, Cl, Br and I, especially Cl and Br), alkoxy (especially C 1-4 alkoxy, such as methoxy, ethoxy, n-propoxy, i-propoxy and butoxy) , Aryloxy
- Propionyloxy and alkylcarbonyl (e.g. acetyl).
- hydrolyzable groups which may be mentioned are hydrogen and alkoxy radicals having 5 to 20, in particular 5 to 10, carbon atoms and halogen and alkoxy-substituted
- Alkoxy groups (such as ß-methoxyethoxy). Since the hydrolyzable groups are practically no longer present in the end product, but by hydrolysis
- hydrolyzable groups are special, and the hydrolysis product must sooner or later also have to be removed in any suitable manner
- Low molecular weight hydrolysis products such as e.g. lower alcohols, such as methanol, ethanol, propanol, n-, i-, sec- and tert-butanol.
- the latter groups are also preferred because they have practically no influence on the pH during hydrolysis (in contrast to e.g. halogen), which is advantageous because the pH of the
- Starting mixture is preferably in the range from 4 to 9, in particular 5 to 6.5, and hydrolysis products which shift the pH value appreciably out of this range are preferably neutralized by adding suitable substances (acids or bases).
- Polycondensable monomers (d) are preferably selected from alkyl (in particular C 1-4 alkyl, such as, for example
- Methyl, ethyl, propyl and butyl alkenyl (especially C 2-4 alkenyl such as vinyl, 1-propenyl, 2-propenyl and butenyl), alkynyl (especially C 2-4 alkynyl such as acetylenyl and propargyl) and Aryl (especially C 6-10 aryl, such as phenyl and naphthyl), the groups just mentioned optionally having one or more substituents, such as halogen, hydroxy, alkoxy, epoxy, if appropriate
- alkyl radicals also include the corresponding cyclic and aryl substituted radicals, e.g. Cyclohexyl and benzyl, while the alkenyl and alkynyl groups can also be cyclic and the aryl groups mentioned
- alkaryl groups such as tolyl and xylyl
- Particularly preferred non-hydrolyzable groups are those which have a (poly) unsaturated group Feature carbon-carbon bond.
- Context should be mentioned in particular groups which have a (meth) acryloxy radical, in particular a (meth) acryloxy-C 1-4 -alkyl radical such as (meth) acryloxypropyl.
- Organosilanes e.g. 3-glycidyloxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane or vinylsilanes.
- monomers (d) are also suitable silicon, aluminum, titanium and zirconium alkoxides, acylates and halides and other z.
- the compound (d) and / or the polymer (f) can either as such or preferably as a solution in one
- organic solvents are used.
- the solvent used here is either identical to that used in the previous precipitation reaction
- Polymer (f) are generally used in such amounts
- Total amount of polymer (f) and compound (d) at least 1 percent by weight and at most 95 percent by weight
- Polymerization and crosslinking of the existing unsaturated compounds can be induced thermally and / or photochemically, e.g. the commercially available
- Photoinitiators examples include Irgacure R 184 (1-hydroxycyclohexylphenyl ketone), Irgacure R 500 (1-hydroxycyclohexylphenyl ketone, benzophenone) and others from the Photo initiators available from Ciba-Geigy
- Irgacure R type Darocur R 1173, 1116, 1398, 1174 and 1020 (available from Merck), benzophenone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, benzoin, 4,4'-dimethoxybenzoin, benzoin ethyl ether,
- the thermal initiators include organic peroxides in the form of diacyl peroxides, peroxydicarbonates,
- Alkyl peresters dialkyl peroxides, perketals,
- the polycondensation-inducing polymerization catalysts (e) are e.g. B. Brönsted acids and bases, such as mineral acids or tertiary amines, for anionic polycondensation and Lewis acids, such as metal alcoholates (for example aluminum alcoholates in the case of epoxysilanes) for cationic polycondensation.
- the polymerization initiator, (e) is usually used in an amount of 0.1 to 5, preferably 0.5 to 3
- Weight percent based on the mixture, applied.
- Groups in all the starting compounds used are preferably in the range from 1: 1 to 0.3: 1,
- the polycondensation can z. B. in air at temperatures from 0 ° C to
- Boiling point of the solvent used usually at room temperature.
- the reaction end can e.g. B. can be determined by Karl Fischer titration.
- the reaction mixture can be further processed either as such or after partial or complete removal of the organic solvent used or of the solvent formed during the reaction (e.g. the alcohols formed by hydrolysis of the alkoxides).
- the organic solvent used or of the solvent formed during the reaction e.g. the alcohols formed by hydrolysis of the alkoxides.
- reaction mixture either directly or after partial removal of the
- Reaction mixture z. B. pour into suitable molds and then completely remove the solvent so that a gel remains.
- the material is then cured, depending on the type of polymer matrix and the polymerization initiator (s) used, thermally and / or by irradiation with actinic radiation (for example UV light or laser beams).
- actinic radiation for example UV light or laser beams.
- the curing conditions temperature, UV wavelength, etc.
- Thermal curing usually takes place at temperatures below 150 ° C.
- the composite materials according to the invention contain
- Nanoscale particles with an average particle size of about 0.5 to 20 nm distributed in the polymer matrix.
- the cluster size and Cluster distribution can be set specifically.
- the composite materials according to the invention are eminently suitable for optical applications.
- Both optically transparent moldings and coatings can be produced which, for. B. can be structured by laser writing, embossing or photomask technology. Special areas of application are:
- Elements for active applications such as signal processing, computation, frequency doubling or tripling, light amplification for optical information transmission, lasing, laser self-focusing, wave mixing, phase conjugation or holography, e.g. B. optical switches, bleachable absorbers and holographic elements;
- Example 1 2 -10 mol of cadmium acetate at room temperature in 200 ml
- the resulting coating solution is applied to glass substrates by dipping and cured at 60 ° C. for 60 minutes.
- the resulting coating solution is applied to glass substrates by dipping and cured at 60 ° C. for 60 minutes.
- Example 2 The procedure is as in Example 1, but instead of 3-aminopropyltriethoxysilane, N- [2-aminoethyl] -3- aminopropyltrimethoxysilane is used.
- the resulting coating solution is applied to glass substrates by dipping and cured at 60 ° C. for 60 minutes.
- the resulting coating solution is applied to glass substrates by dipping and cured at 60 ° C. for 60 minutes.
- 3-aminopropyltriethoxysilane freshly made from 2.10 -2 (3-triethoxysilylpropyl) succinic anhydride and 2-10 mol water (3-triethoxysilylpropyl) succinic acid used.
- Example 7 2-10 mol of cadmium acetate are dissolved in 200 ml of ethanol at room temperature and mixed with 2-10 -2 mol of 3-aminopropyltrioethoxysilane. The mixture is degassed under an N 2 atmosphere. 2-10 -2 mol of H 2 S are added to the mixture and the mixture is stirred at room temperature (RT) for 10 minutes and then 150 ml of the solvent are distilled off. The solution obtained is then with 2.10 -1 mol
- 3-methacryloxypropyltrimethoxysilane was added and the mixture was stirred at RT for 15 minutes.
- 3.3-10 mol of H 2 O are added to the mixture and the mixture is stirred at room temperature for 3 hours.
- the resulting viscous solution is used to coat substrates and to produce moldings
- Example 10 The procedure is as in Example 7, but 3-mercaptopropyltriethoxysilane is used instead of 3-aminopropyltriethoxysilane.
- 3-aminopropyltriethoxysilane freshly produced from 2.10 -2 (3-triethoxysilylpropyl) succinic anhydride and 2.10 -2 mol water (3-triethoxysilylpropyl) succinic acid.
- Example 2 The procedure is as in Example 2, but silver nitrate is used instead of cadmium acetate.
- Example 3 The procedure is as in Example 3, but silver nitrate is used instead of cadmium acetate.
- Example 4 The procedure is as in Example 4, but silver nitrate is used instead of cadmium acetate.
- Example 18 The procedure is as in Example 5, but silver nitrate is used instead of cadmium acetate.
- Example 6 The procedure is as in Example 6, but silver nitrate is used instead of cadmium acetate.
- Example 8 The procedure is as in Example 8, but silver nitrate is used instead of cadmium acetate.
- Example 10 The procedure is as in Example 10, but silver nitrate is used instead of cadmium acetate.
- Example 11 The procedure is as in Example 11, but silver nitrate is used instead of cadmium acetate.
- Example 25 The procedure is as in Example 12, but silver nitrate is used instead of cadmium acetate.
- Example 25
- Example 25 The procedure is as in Example 25, but silver nitrate is used instead of cadmium acetate.
- Example 29 0.1 mol of cadmium acetate are dissolved in 250 ml of ethanol at room temperature and 2 mol of 3-aminopropyltriethoxysilane are added. The mixture is degassed under an N 2 atmosphere. 0.1 mol of (CH 3 ) 3 -Si-S-Si (CH 3 ) 3 (diluted with tetrahydrofuran 1: 1) is added dropwise to the mixture. 200 ml of solvent are then distilled off in vacuo.
- Example 1 Further processing is carried out as in Example 1.
- Example 30 As a modification of this method, the conditions of Examples 2 to 4 and 13 are used.
- Example 30 As a modification of this method, the conditions of Examples 2 to 4 and 13 are used.
- Example 31 The further processing is carried out as in Example 29.
- Example 31
- Example 32 The procedure is as in Example 30, but lead thoxyethanolate is used instead of the zinc acetate.
- Example 32
- Molar ratio Au / Si is in the range of 1/5 to 1: 100). This leads to the spontaneous formation of metal clusters and the formation of a long-term stable sol. The further one
- Example 7 Processing takes place as in Example 7, i.e. 0.2 mol of 3-methacryloxypropyltrimethoxysilane (MEMO) is added to the solution.
- MEMO 3-methacryloxypropyltrimethoxysilane
- Example 32 The procedure is as in Example 32, but silver acetate or nitrate is used instead of HAuCl 4 .
- Example 35 The procedure is as in Example 32, but H 2 PtCl 6 is used instead of HAuCl 4 .
- HAuCl 4 0.01 mol HAuCl 4 are dissolved in 50 ml ethanol and treated with N-aminoethyl-3-aminopropyltrimethoxysilane (DIAMO). Then 0.1 mol of MEMO pre-hydrolyzate is added. The resulting coating solution is mixed with 0.1% by weight of azoisobutyronitrile starter and used further for coating glass substrates. Wet films are treated photothermally (1 min, UV, 120 ° C). This results in simultaneous Au particle formation and matrix hardening.
- DIAMO N-aminoethyl-3-aminopropyltrimethoxysilane
- Example 35 The procedure is as in Example 35, but silver acetate or nitrate is used instead of HAuCl 4 .
- the ZnO / MEMO molar ratio is variable between 1/3 and 1: 100. The solvent is removed and the product is used for the production of moldings.
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP92920737A EP0607213B1 (de) | 1991-10-10 | 1992-10-09 | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente |
US08/211,431 US5470910A (en) | 1991-10-10 | 1992-10-09 | Composite materials containing nanoscalar particles, process for producing them and their use for optical components |
DE59207816T DE59207816D1 (de) | 1991-10-10 | 1992-10-09 | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente |
JP05506632A JP3115323B2 (ja) | 1991-10-10 | 1992-10-09 | ナノスケール粒子含有複合材料、その製造および該材料からなる光学素子 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4133621A DE4133621A1 (de) | 1991-10-10 | 1991-10-10 | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung fuer optische elemente |
DEP4133621.6 | 1991-10-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1993007179A2 true WO1993007179A2 (de) | 1993-04-15 |
WO1993007179A3 WO1993007179A3 (de) | 1993-05-27 |
Family
ID=6442447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1992/002327 WO1993007179A2 (de) | 1991-10-10 | 1992-10-09 | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente |
Country Status (5)
Country | Link |
---|---|
US (1) | US5470910A (de) |
EP (1) | EP0607213B1 (de) |
JP (1) | JP3115323B2 (de) |
DE (2) | DE4133621A1 (de) |
WO (1) | WO1993007179A2 (de) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0689067A3 (de) * | 1994-06-22 | 1997-04-09 | Fujitsu Ltd | Herstellungsverfahren für ein optisches Wellenleitersystem, optisches Bauelement und optischer Koppler mit dessen Verwendung, optisches Netzwerk und optische Leiterplatte |
WO1997016479A1 (de) * | 1995-10-31 | 1997-05-09 | Institut für Neue Materialien Gemeinnützige GmbH | Kompositmaterialien mit nanoskaligen füllstoffen |
WO1997020881A1 (de) * | 1995-12-01 | 1997-06-12 | W.L. Gore & Associates Gmbh | Ptfe-körper aus mikroporösem polytetrafluorethylen mit füllstoff |
WO1997038333A1 (de) * | 1996-04-04 | 1997-10-16 | Institut Für Neue Materialien Gem. Gmbh | Optische bauteile mit gradientenstruktur und verfahren zu deren herstellung |
WO1998037127A1 (de) * | 1997-02-19 | 1998-08-27 | Institut Für Neue Materialien Gem. Gmbh | Hydroxylgruppen-arme organisch/anorganische komposite, verfahren zu deren herstellung und deren verwendung |
WO1999017716A2 (en) * | 1997-10-03 | 1999-04-15 | Dentsply International Inc. | Dental materials having a nanoscale filler |
WO1999032546A1 (de) * | 1997-12-19 | 1999-07-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Polymer mit darin isoliert dispergierten nanoskaligen feststoffteilchen, verfahren zu seiner herstellung und seine verwendung |
US6855396B1 (en) | 1999-10-28 | 2005-02-15 | Institut Fuer Neue Materialien Gemeinnuetzige Gmbh | Substrate comprising an abrasion-resistant diffusion barrier layer system |
WO2006028730A1 (en) * | 2004-09-01 | 2006-03-16 | Ppg Industries Ohio, Inc. | Process for making polymers having nanostructures incorporated into the matrix of the polymer |
US9598527B2 (en) | 2004-09-01 | 2017-03-21 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US9657134B2 (en) | 2004-09-01 | 2017-05-23 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US9822211B2 (en) | 2004-09-01 | 2017-11-21 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US9994670B2 (en) | 2004-09-01 | 2018-06-12 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11008418B2 (en) | 2004-09-01 | 2021-05-18 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11149107B2 (en) | 2004-09-01 | 2021-10-19 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11248083B2 (en) | 2004-09-01 | 2022-02-15 | Ppg Industries Ohio, Inc. | Aircraft windows |
US11591436B2 (en) | 2004-09-01 | 2023-02-28 | Ppg Industries Ohio, Inc. | Polyurethane article and methods of making the same |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5817410A (en) * | 1991-11-18 | 1998-10-06 | Matsushita Electric Industrial Co., Ltd. | Nonlinear optical composites using linear transparent substances and method for producing the same |
DE4338361A1 (de) * | 1993-11-10 | 1995-05-11 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Zusammensetzungen auf der Basis von Epoxidgruppen-haltigen Silanen |
US5587422A (en) * | 1994-05-18 | 1996-12-24 | Cornell Research Foundation, Inc. | Single phase solids containing metalloploymers |
US5711803A (en) * | 1995-09-29 | 1998-01-27 | Midwest Research Institute | Preparation of a semiconductor thin film |
US6126740A (en) * | 1995-09-29 | 2000-10-03 | Midwest Research Institute | Solution synthesis of mixed-metal chalcogenide nanoparticles and spray deposition of precursor films |
EP0880349A4 (de) * | 1996-09-27 | 2005-04-13 | Southwest Res Inst | Metalloxidverbindungen und methode |
DE19710685B4 (de) * | 1997-03-14 | 2005-12-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Nanokristalline Partikel enthaltendes Material, Verfahren zur Herstellung und dessen Verwendung |
US6099798A (en) * | 1997-10-31 | 2000-08-08 | Nanogram Corp. | Ultraviolet light block and photocatalytic materials |
US7226966B2 (en) | 2001-08-03 | 2007-06-05 | Nanogram Corporation | Structures incorporating polymer-inorganic particle blends |
DE19740343A1 (de) * | 1997-09-13 | 1998-09-17 | Kuhnke Gmbh Kg H | Vorrichtung, insbesondere fluidische oder elektromagnetische Vorrichtung |
US7347974B1 (en) * | 1998-05-04 | 2008-03-25 | The United States Of America As Represented By The Secretary Of The Navy | Materials, method and apparatus for detection and monitoring of chemical species |
GB9815270D0 (en) * | 1998-07-14 | 1998-09-09 | Cambridge Display Tech Ltd | Particles and devices comprising particles |
GB9815271D0 (en) | 1998-07-14 | 1998-09-09 | Cambridge Display Tech Ltd | Particles and devices comprising particles |
US6329058B1 (en) | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
US6294401B1 (en) * | 1998-08-19 | 2001-09-25 | Massachusetts Institute Of Technology | Nanoparticle-based electrical, chemical, and mechanical structures and methods of making same |
CN1094467C (zh) * | 1999-02-15 | 2002-11-20 | 上海跃龙有色金属有限公司 | 纳米铈锆复合氧化物、其制备方法及用途 |
DE19948548B4 (de) * | 1999-04-19 | 2006-04-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Pastöse Massen mit nanokristallinen Materialien für elektrochemische Bauelemente und daraus hergestellte Schichten und elektrochemische Bauelemente |
GB9923747D0 (en) * | 1999-10-07 | 1999-12-08 | Welding Inst | Composite materials,their production and uses |
US6730156B1 (en) | 1999-10-28 | 2004-05-04 | 3M Innovative Properties Company | Clustered particle dental fillers |
US6376590B2 (en) | 1999-10-28 | 2002-04-23 | 3M Innovative Properties Company | Zirconia sol, process of making and composite material |
US6387981B1 (en) | 1999-10-28 | 2002-05-14 | 3M Innovative Properties Company | Radiopaque dental materials with nano-sized particles |
US6572693B1 (en) | 1999-10-28 | 2003-06-03 | 3M Innovative Properties Company | Aesthetic dental materials |
JP4537528B2 (ja) * | 2000-03-29 | 2010-09-01 | 株式会社東芝 | 光記録媒体 |
AT410859B (de) * | 2000-04-27 | 2003-08-25 | Qsel Quantum Solar Energy Linz | Verfahren zum herstellen einer photovoltaischen zelle mit einer photoaktiven schicht aus zwei organischen komponenten |
AT411306B (de) * | 2000-04-27 | 2003-11-25 | Qsel Quantum Solar Energy Linz | Photovoltaische zelle mit einer photoaktiven schicht aus zwei molekularen organischen komponenten |
AT410729B (de) | 2000-04-27 | 2003-07-25 | Qsel Quantum Solar Energy Linz | Photovoltaische zelle mit einer photoaktiven schicht aus zwei molekularen organischen komponenten |
JP3559962B2 (ja) * | 2000-09-04 | 2004-09-02 | 日本航空電子工業株式会社 | 熱電変換材料及びその製造方法 |
FR2816756B1 (fr) * | 2000-11-15 | 2003-10-31 | Univ Paris Curie | Procede d'obtention d'une composition polymere dopee par des nanoparticules pour la realisation de materiaux composites polymeres, dispositif pour sa mise en oeuvre, composition et materiaux obtenus |
US20060084705A1 (en) * | 2000-11-24 | 2006-04-20 | Frank Caruso | Phase transfer of nanoparticles |
DE10136583B4 (de) * | 2000-11-24 | 2006-01-05 | Nanosolutions Gmbh | Phasentransfer von Nanopartikeln, Nanopartikel enthaltende wässrige oder alkoholische Phase und deren Verwendung |
US6458462B1 (en) | 2000-12-13 | 2002-10-01 | 3M Innovative Properties Company | Sporting goods having a ceramer coating |
US6552111B2 (en) * | 2000-12-22 | 2003-04-22 | Eastman Kodak Company | Cyclic olefin polymeric nanocomposite optical plastic article and method of making same |
US6759452B2 (en) * | 2000-12-22 | 2004-07-06 | Eastman Kodak Company | Polycarbonate nanocomposite optical plastic article and method of making same |
US6586096B2 (en) * | 2000-12-22 | 2003-07-01 | Eastman Kodak Company | Polymethylmethacrylate nanocomposite optical article and method of making same |
US6498208B2 (en) * | 2000-12-22 | 2002-12-24 | Eastman Kodak Company | Polystyrene nanocomposite optical plastic article and method of making same |
US6441077B1 (en) * | 2000-12-22 | 2002-08-27 | Eastman Kodak Company | Polysulfone nanocomposite optical plastic article and method of making same |
US6518353B2 (en) * | 2000-12-22 | 2003-02-11 | Eastman Kodal Company | Reduced temperature sensitive polymeric optical article and method of making same |
US7265174B2 (en) * | 2001-03-22 | 2007-09-04 | Clemson University | Halogen containing-polymer nanocomposite compositions, methods, and products employing such compositions |
DE10118309C2 (de) * | 2001-04-12 | 2003-03-20 | Bayer Ag | Anionisch stabilisierte, wässrige Dispersionen von nanopartikulärem Zinkoxid, Verfahren zu deren Herstellung sowie deren Verwendung |
US6979708B2 (en) | 2001-08-23 | 2005-12-27 | Sunoco, Inc. (R&M) | Hydrotalcites, syntheses, and uses |
US6846870B2 (en) * | 2001-08-23 | 2005-01-25 | Sunoco, Inc. (R&M) | Hydrotalcites, syntheses, and uses |
US7588699B2 (en) * | 2001-11-02 | 2009-09-15 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Electrically conductive, optically transparent polymer/carbon nanotube composites and process for preparation thereof |
US6642295B2 (en) * | 2001-12-21 | 2003-11-04 | Eastman Kodak Company | Photoresist nanocomposite optical plastic article and method of making same |
DE10200760A1 (de) * | 2002-01-10 | 2003-07-24 | Clariant Gmbh | Nanokompositmaterial zur Herstellung von Brechzahlgradientenfolien |
DE10200648A1 (de) * | 2002-01-10 | 2003-07-24 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung Optischer Elemente mit Gradientenstruktur |
JP2004168846A (ja) * | 2002-11-19 | 2004-06-17 | Asahi Glass Co Ltd | 複合微粒子およびその製造方法 |
TWI252215B (en) * | 2003-03-27 | 2006-04-01 | Univ Nat Central | Zirconia sol and method of preparing the same |
JP4283026B2 (ja) * | 2003-04-07 | 2009-06-24 | 株式会社日本触媒 | 光学樹脂用添加剤とその製造方法および光学樹脂組成物 |
WO2005008310A1 (ja) * | 2003-07-23 | 2005-01-27 | Konica Minolta Opto, Inc. | 撮像レンズ及び撮像装置 |
US6913830B2 (en) * | 2003-08-14 | 2005-07-05 | Ppg Industries Ohio, Inc. | Coating compositions containing semiconductor colorants |
US7507480B2 (en) * | 2005-05-31 | 2009-03-24 | Brookhaven Science Associates, Llc | Corrosion-resistant metal surfaces |
US8718437B2 (en) | 2006-03-07 | 2014-05-06 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
WO2007103310A2 (en) | 2006-03-07 | 2007-09-13 | Qd Vision, Inc. | An article including semiconductor nanocrystals |
US7749761B2 (en) * | 2005-09-29 | 2010-07-06 | Industrial Technology Research Institute | Hydrogel composition for cell culture apparatus |
US9874674B2 (en) | 2006-03-07 | 2018-01-23 | Samsung Electronics Co., Ltd. | Compositions, optical component, system including an optical component, devices, and other products |
US9951438B2 (en) | 2006-03-07 | 2018-04-24 | Samsung Electronics Co., Ltd. | Compositions, optical component, system including an optical component, devices, and other products |
US8849087B2 (en) | 2006-03-07 | 2014-09-30 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
JP5771873B2 (ja) | 2006-05-04 | 2015-09-02 | エルジー・ケム・リミテッド | 伝導性(導電性)高分子複合体を用いた高容量/高出力の電気化学エネルギー貯蔵素子 |
US8822030B2 (en) | 2006-08-11 | 2014-09-02 | Aqua Resources Corporation | Nanoplatelet metal hydroxides and methods of preparing same |
WO2008021256A2 (en) * | 2006-08-11 | 2008-02-21 | Aqua Resources Corporation | Nanoplatelet metal hydroxides and methods of preparing same |
WO2008063658A2 (en) | 2006-11-21 | 2008-05-29 | Qd Vision, Inc. | Semiconductor nanocrystals and compositions and devices including same |
WO2008063652A1 (en) | 2006-11-21 | 2008-05-29 | Qd Vision, Inc. | Blue emitting semiconductor nanocrystals and compositions and devices including same |
WO2008063653A1 (en) | 2006-11-21 | 2008-05-29 | Qd Vision, Inc. | Semiconductor nanocrystals and compositions and devices including same |
US8322754B2 (en) * | 2006-12-01 | 2012-12-04 | Tenaris Connections Limited | Nanocomposite coatings for threaded connections |
US7972691B2 (en) * | 2006-12-22 | 2011-07-05 | Nanogram Corporation | Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites |
US8647426B2 (en) | 2006-12-28 | 2014-02-11 | 3M Innovative Properties Company | Dental filler and methods |
US8836212B2 (en) | 2007-01-11 | 2014-09-16 | Qd Vision, Inc. | Light emissive printed article printed with quantum dot ink |
US8119233B2 (en) * | 2007-02-17 | 2012-02-21 | Nanogram Corporation | Functional composites, functional inks and applications thereof |
JP5773646B2 (ja) | 2007-06-25 | 2015-09-02 | キユーデイー・ビジヨン・インコーポレーテツド | ナノ材料を被着させることを含む組成物および方法 |
WO2009014707A2 (en) | 2007-07-23 | 2009-01-29 | Qd Vision, Inc. | Quantum dot light enhancement substrate and lighting device including same |
US8128249B2 (en) | 2007-08-28 | 2012-03-06 | Qd Vision, Inc. | Apparatus for selectively backlighting a material |
CN101970558A (zh) * | 2007-12-28 | 2011-02-09 | 陶氏环球技术公司 | 小尺寸功能材料 |
CN101960364A (zh) * | 2007-12-28 | 2011-01-26 | 陶氏环球技术公司 | 包含吸收有液晶物质的聚合物纳米粒子的相位补偿膜 |
WO2009145813A1 (en) | 2008-03-04 | 2009-12-03 | Qd Vision, Inc. | Particles including nanoparticles, uses thereof, and methods |
JP2009256616A (ja) * | 2008-03-21 | 2009-11-05 | Shin Etsu Chem Co Ltd | グリセリン変性シリコーン及びそれを含む化粧料 |
JP5353357B2 (ja) * | 2008-04-03 | 2013-11-27 | 信越化学工業株式会社 | カルボキシル基を有するオルガノポリシロキサン |
KR101995369B1 (ko) | 2008-04-03 | 2019-07-02 | 삼성 리서치 아메리카 인코포레이티드 | 양자점들을 포함하는 발광 소자 |
JP5532648B2 (ja) * | 2008-04-03 | 2014-06-25 | 信越化学工業株式会社 | カルボキシル基を有するオルガノポリシロキサンで表面処理された粉体、該粉体の分散物および該粉体を含む化粧料 |
US9525148B2 (en) | 2008-04-03 | 2016-12-20 | Qd Vision, Inc. | Device including quantum dots |
EP2297762B1 (de) | 2008-05-06 | 2017-03-15 | Samsung Electronics Co., Ltd. | Halbleiter-beleuchtungsanordnungen mit quanteneingeschlossenen halbleiternanopartikeln |
EP2370362B1 (de) * | 2008-10-15 | 2013-11-27 | 3M Innovative Properties Company | Füllstoffe und verbundwerkstoffe mit zirconiumoxid- und siliciumoxid-nanopartikeln |
CN104072993A (zh) | 2009-01-08 | 2014-10-01 | 纳克公司 | 聚硅氧烷聚合物与无机纳米颗粒的复合物及其形成方法 |
US20100264371A1 (en) * | 2009-03-19 | 2010-10-21 | Nick Robert J | Composition including quantum dots, uses of the foregoing, and methods |
JP2013502047A (ja) | 2009-08-14 | 2013-01-17 | キユーデイー・ビジヨン・インコーポレーテツド | 照明装置、照明装置用光学部品および方法 |
EP2475717A4 (de) | 2009-09-09 | 2015-01-07 | Qd Vision Inc | Partikel mit nanopartikeln, verwendungen davon und verfahren dafür |
WO2011031876A1 (en) | 2009-09-09 | 2011-03-17 | Qd Vision, Inc. | Formulations including nanoparticles |
JP2011256394A (ja) * | 2011-08-09 | 2011-12-22 | Asahi Kasei E-Materials Corp | 感光性耐熱性樹脂前駆体組成物 |
US9929325B2 (en) | 2012-06-05 | 2018-03-27 | Samsung Electronics Co., Ltd. | Lighting device including quantum dots |
BR112015006873A2 (pt) | 2012-09-27 | 2017-07-04 | Rhodia Operations | processo para produzir nanoestruturas de prata e copolímero útil em tal processo |
AR100953A1 (es) | 2014-02-19 | 2016-11-16 | Tenaris Connections Bv | Empalme roscado para una tubería de pozo de petróleo |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0220026A2 (de) * | 1985-10-18 | 1987-04-29 | Sumitomo Chemical Company, Limited | Kieselsol oder Aluminiumoxyd-sol mit einem reaktiven Manomer als Dispergiermittel |
EP0351759A2 (de) * | 1988-07-18 | 1990-01-24 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren zur Fixierung einer anorganischen Spezies in einer organischen Matrix |
US5030608A (en) * | 1989-08-23 | 1991-07-09 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Process for the preparation of composite materials which contain small particles of metal or metal oxide in an oxide matrix and the composite materials prepared by the process |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3891594A (en) * | 1972-04-07 | 1975-06-24 | Lynn J Taylor | Direct synthesis of composite materials |
JPS6137817A (ja) * | 1984-07-31 | 1986-02-22 | Toray Ind Inc | ポリエステルの製造方法 |
JP3133357B2 (ja) * | 1990-06-11 | 2001-02-05 | 日本エーアールシー株式会社 | 高屈折率耐擦傷性被膜形成用コーティング組成物および該組成物を用いる成形体 |
AU653825B2 (en) * | 1991-06-25 | 1994-10-13 | Itoh Optical Industrial Co., Ltd. | Coating composition for optical plastic moldings |
-
1991
- 1991-10-10 DE DE4133621A patent/DE4133621A1/de not_active Withdrawn
-
1992
- 1992-10-09 DE DE59207816T patent/DE59207816D1/de not_active Expired - Lifetime
- 1992-10-09 US US08/211,431 patent/US5470910A/en not_active Expired - Lifetime
- 1992-10-09 JP JP05506632A patent/JP3115323B2/ja not_active Expired - Lifetime
- 1992-10-09 WO PCT/EP1992/002327 patent/WO1993007179A2/de active IP Right Grant
- 1992-10-09 EP EP92920737A patent/EP0607213B1/de not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0220026A2 (de) * | 1985-10-18 | 1987-04-29 | Sumitomo Chemical Company, Limited | Kieselsol oder Aluminiumoxyd-sol mit einem reaktiven Manomer als Dispergiermittel |
EP0351759A2 (de) * | 1988-07-18 | 1990-01-24 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren zur Fixierung einer anorganischen Spezies in einer organischen Matrix |
US5030608A (en) * | 1989-08-23 | 1991-07-09 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Process for the preparation of composite materials which contain small particles of metal or metal oxide in an oxide matrix and the composite materials prepared by the process |
Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0689067A3 (de) * | 1994-06-22 | 1997-04-09 | Fujitsu Ltd | Herstellungsverfahren für ein optisches Wellenleitersystem, optisches Bauelement und optischer Koppler mit dessen Verwendung, optisches Netzwerk und optische Leiterplatte |
EP1315006A1 (de) * | 1994-06-22 | 2003-05-28 | Fujitsu Limited | Verfahren zur Herstellung von Wellenleitersystemen, dessen Verwendung in optischem Bauelement und Koppler sowie optisches Netzwerk und optische Leiterplatte |
WO1997016479A1 (de) * | 1995-10-31 | 1997-05-09 | Institut für Neue Materialien Gemeinnützige GmbH | Kompositmaterialien mit nanoskaligen füllstoffen |
WO1997020881A1 (de) * | 1995-12-01 | 1997-06-12 | W.L. Gore & Associates Gmbh | Ptfe-körper aus mikroporösem polytetrafluorethylen mit füllstoff |
WO1997038333A1 (de) * | 1996-04-04 | 1997-10-16 | Institut Für Neue Materialien Gem. Gmbh | Optische bauteile mit gradientenstruktur und verfahren zu deren herstellung |
WO1998037127A1 (de) * | 1997-02-19 | 1998-08-27 | Institut Für Neue Materialien Gem. Gmbh | Hydroxylgruppen-arme organisch/anorganische komposite, verfahren zu deren herstellung und deren verwendung |
WO1999017716A2 (en) * | 1997-10-03 | 1999-04-15 | Dentsply International Inc. | Dental materials having a nanoscale filler |
WO1999017716A3 (en) * | 1997-10-03 | 1999-09-10 | Dentsply Int Inc | Dental materials having a nanoscale filler |
WO1999032546A1 (de) * | 1997-12-19 | 1999-07-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Polymer mit darin isoliert dispergierten nanoskaligen feststoffteilchen, verfahren zu seiner herstellung und seine verwendung |
US6855396B1 (en) | 1999-10-28 | 2005-02-15 | Institut Fuer Neue Materialien Gemeinnuetzige Gmbh | Substrate comprising an abrasion-resistant diffusion barrier layer system |
CN101010363B (zh) * | 2004-09-01 | 2012-07-04 | Ppg工业俄亥俄公司 | 制造在聚合物的基质中引入有纳米结构的聚合物的方法 |
US9951173B2 (en) | 2004-09-01 | 2018-04-24 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
WO2006028730A1 (en) * | 2004-09-01 | 2006-03-16 | Ppg Industries Ohio, Inc. | Process for making polymers having nanostructures incorporated into the matrix of the polymer |
US9598527B2 (en) | 2004-09-01 | 2017-03-21 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US9657134B2 (en) | 2004-09-01 | 2017-05-23 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US9701807B2 (en) | 2004-09-01 | 2017-07-11 | Ppg Industries Ohio, Inc. | Process for making polymers having nanostructures incorporated into the matrix of the polymer |
US9822211B2 (en) | 2004-09-01 | 2017-11-21 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US8178615B2 (en) | 2004-09-01 | 2012-05-15 | Ppg Industries Ohio, Inc | Process for making polymers having nanostructures incorporated into the matrix of the polymer |
US9994670B2 (en) | 2004-09-01 | 2018-06-12 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US10533068B2 (en) | 2004-09-01 | 2020-01-14 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US10590230B2 (en) | 2004-09-01 | 2020-03-17 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11008418B2 (en) | 2004-09-01 | 2021-05-18 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11149107B2 (en) | 2004-09-01 | 2021-10-19 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11248083B2 (en) | 2004-09-01 | 2022-02-15 | Ppg Industries Ohio, Inc. | Aircraft windows |
US11472912B2 (en) | 2004-09-01 | 2022-10-18 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
US11591436B2 (en) | 2004-09-01 | 2023-02-28 | Ppg Industries Ohio, Inc. | Polyurethane article and methods of making the same |
Also Published As
Publication number | Publication date |
---|---|
US5470910A (en) | 1995-11-28 |
EP0607213B1 (de) | 1997-01-02 |
WO1993007179A3 (de) | 1993-05-27 |
JP3115323B2 (ja) | 2000-12-04 |
JPH07502055A (ja) | 1995-03-02 |
DE59207816D1 (de) | 1997-02-13 |
EP0607213A1 (de) | 1994-07-27 |
DE4133621A1 (de) | 1993-04-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0607213B1 (de) | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung für optische elemente | |
EP0728164B1 (de) | Verfahren zur herstellung von zusammensetzungen auf der basis von epoxidgruppen-haltigen silanen | |
DE2846529C2 (de) | ||
EP0891565B1 (de) | Optische bauteile mit gradientenstruktur und verfahren zu deren herstellung | |
WO2003058292A1 (de) | Verfahren zur herstellung optischer elemente mit gradientenstruktur | |
EP1631620B1 (de) | Zusammensetzung mit nichtnewtonschem verhalten | |
DE69920642T2 (de) | Organische/anorganische Hybridmaterialien und Verfahren zu deren Herstellung | |
EP0351759A2 (de) | Verfahren zur Fixierung einer anorganischen Spezies in einer organischen Matrix | |
DE19540623A1 (de) | Verfahren zur Herstellung von Kompositmaterialien mit hohem Grenzflächenanteil und dadurch erhältliche Kompositmaterialien | |
KR101587933B1 (ko) | 고굴절률 분말, 그 제조 방법 및 용도 | |
DE2804283A1 (de) | Wasserfreie polymerisierbare massen auf basis von hydrolysierbaren silanen und verfahren zur kondensation von hydrolysierbaren silanen | |
WO1994007948A1 (de) | Oberflächenmodifizierte oxidpartikel und ihre anwendung als füll- und modifizierungsmittel in polymermaterialien | |
US20100092761A1 (en) | Nanoparticles | |
JP2002121549A (ja) | 半導体超微粒子 | |
WO1993006508A1 (de) | Optische elemente und verfahren zu deren herstellung | |
WO2016016260A1 (de) | Hybridmaterial zur verwendung als beschichtungsmittel in optoelektronischen bauteilen | |
JP3932866B2 (ja) | 重合性液体組成物 | |
DE19719948A1 (de) | Nanostrukturierte Formkörper und Schichten sowie Verfahren zu deren Herstellung | |
DE19746885A1 (de) | Nanostrukturierte Formkörper und Schichten sowie Verfahren zu deren Herstellung | |
JP4750051B2 (ja) | 光学部材用架橋樹脂組成物及び光学部材 | |
DE102008035524A1 (de) | Zinkoxid-Partikel, Zinkoxid-Pulver und Verwendung dieser | |
JP2003183414A (ja) | 超微粒子を含有する架橋樹脂組成物成形体 | |
Holzinger et al. | Hybrid inorganic–organic core–shell metal oxide nanoparticles from metal salts | |
DE102013108664A1 (de) | Oberflächenmodifizierte Metallkolloide und ihre Herstellung | |
JP2002249633A (ja) | 半導体結晶粒子を含有する高分子組成物及びその薄膜状成形体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): JP US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL SE |
|
AK | Designated states |
Kind code of ref document: A3 Designated state(s): JP US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A3 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL SE |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1992920737 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 08211431 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 1992920737 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 1992920737 Country of ref document: EP |