TWI911220B - 含有聚合性不飽和基的鹼可溶性樹脂及其製造方法、以及感光性樹脂組成物及感光性樹脂組成物的硬化物 - Google Patents

含有聚合性不飽和基的鹼可溶性樹脂及其製造方法、以及感光性樹脂組成物及感光性樹脂組成物的硬化物

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Publication number
TWI911220B
TWI911220B TW110117520A TW110117520A TWI911220B TW I911220 B TWI911220 B TW I911220B TW 110117520 A TW110117520 A TW 110117520A TW 110117520 A TW110117520 A TW 110117520A TW I911220 B TWI911220 B TW I911220B
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TW
Taiwan
Prior art keywords
acid
photosensitive resin
polymerizable unsaturated
unsaturated groups
group
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TW110117520A
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English (en)
Chinese (zh)
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TW202202544A (zh
Inventor
宗正浩
石原一男
柳起煥
林淸來
Original Assignee
日商日鐵化學材料股份有限公司
南韓商國都化學股份有限公司
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Publication of TW202202544A publication Critical patent/TW202202544A/zh
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Publication of TWI911220B publication Critical patent/TWI911220B/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
TW110117520A 2020-05-19 2021-05-14 含有聚合性不飽和基的鹼可溶性樹脂及其製造方法、以及感光性樹脂組成物及感光性樹脂組成物的硬化物 TWI911220B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020087317 2020-05-19
JP2020-087317 2020-05-19

Publications (2)

Publication Number Publication Date
TW202202544A TW202202544A (zh) 2022-01-16
TWI911220B true TWI911220B (zh) 2026-01-11

Family

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Country Status (5)

Country Link
JP (2) JPWO2021235299A1 (https=)
KR (1) KR20230007429A (https=)
CN (1) CN115551915B (https=)
TW (1) TWI911220B (https=)
WO (1) WO2021235299A1 (https=)

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JP7828034B2 (ja) * 2022-02-22 2026-03-11 Dic株式会社 エポキシエステル樹脂、ビニル変性エポキシエステル樹脂、樹脂組成物、塗料および当該塗料で塗装した物品
WO2023248488A1 (ja) * 2022-06-23 2023-12-28 Dic株式会社 （メタ）アクリレート樹脂の製造方法
JP7380949B1 (ja) * 2022-06-23 2023-11-15 Dic株式会社 （メタ）アクリレート樹脂の製造方法
CN118580466B (zh) * 2024-05-08 2025-11-18 广东博兴新材料科技股份有限公司 支化脂环族特种改性丙烯酸酯树脂的制备方法和应用

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CN1701248A (zh) * 2003-03-12 2005-11-23 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备

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JPH04345608A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラーフィルター用材料及びその硬化物
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JP7368162B2 (ja) * 2019-09-30 2023-10-24 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂、その製造方法、感光性樹脂組成物、及びその硬化膜。

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WO2021235299A1 (ja) 2021-11-25
KR20230007429A (ko) 2023-01-12
CN115551915A (zh) 2022-12-30
JP2025020272A (ja) 2025-02-12
JPWO2021235299A1 (https=) 2021-11-25
TW202202544A (zh) 2022-01-16
CN115551915B (zh) 2025-06-03

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