KR20230007429A - 중합성 불포화기 함유 알칼리 가용성 수지 및 그 제조 방법, 및 감광성 수지 조성물 및 그 경화물 - Google Patents

중합성 불포화기 함유 알칼리 가용성 수지 및 그 제조 방법, 및 감광성 수지 조성물 및 그 경화물 Download PDF

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Publication number
KR20230007429A
KR20230007429A KR1020227041182A KR20227041182A KR20230007429A KR 20230007429 A KR20230007429 A KR 20230007429A KR 1020227041182 A KR1020227041182 A KR 1020227041182A KR 20227041182 A KR20227041182 A KR 20227041182A KR 20230007429 A KR20230007429 A KR 20230007429A
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South Korea
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group
acid
alkali
polymerizable unsaturated
resin composition
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English (en)
Korean (ko)
Inventor
마사히로 소
카즈오 이시하라
유기환
임청래
Original Assignee
닛테츠 케미컬 앤드 머티리얼 가부시키가이샤
국도화학 주식회사
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Publication of KR20230007429A publication Critical patent/KR20230007429A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
KR1020227041182A 2020-05-19 2021-05-12 중합성 불포화기 함유 알칼리 가용성 수지 및 그 제조 방법, 및 감광성 수지 조성물 및 그 경화물 Ceased KR20230007429A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020087317 2020-05-19
JPJP-P-2020-087317 2020-05-19
PCT/JP2021/018120 WO2021235299A1 (ja) 2020-05-19 2021-05-12 重合性不飽和基含有アルカリ可溶性樹脂及びその製造方法、並びに感光性樹脂組成物及びその硬化物

Publications (1)

Publication Number Publication Date
KR20230007429A true KR20230007429A (ko) 2023-01-12

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KR1020227041182A Ceased KR20230007429A (ko) 2020-05-19 2021-05-12 중합성 불포화기 함유 알칼리 가용성 수지 및 그 제조 방법, 및 감광성 수지 조성물 및 그 경화물

Country Status (5)

Country Link
JP (2) JPWO2021235299A1 (https=)
KR (1) KR20230007429A (https=)
CN (1) CN115551915B (https=)
TW (1) TWI911220B (https=)
WO (1) WO2021235299A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7828034B2 (ja) * 2022-02-22 2026-03-11 Dic株式会社 エポキシエステル樹脂、ビニル変性エポキシエステル樹脂、樹脂組成物、塗料および当該塗料で塗装した物品
WO2023248488A1 (ja) * 2022-06-23 2023-12-28 Dic株式会社 （メタ）アクリレート樹脂の製造方法
JP7380949B1 (ja) * 2022-06-23 2023-11-15 Dic株式会社 （メタ）アクリレート樹脂の製造方法
CN118580466B (zh) * 2024-05-08 2025-11-18 广东博兴新材料科技股份有限公司 支化脂环族特种改性丙烯酸酯树脂的制备方法和应用

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61213213A (ja) 1985-03-19 1986-09-22 Fuji Photo Film Co Ltd 光重合性組成物
JPH01152449A (ja) 1987-12-09 1989-06-14 Matsushita Electric Ind Co Ltd カラーフィルタ
JPH04340965A (ja) 1991-05-17 1992-11-27 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物
JPH04345608A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラーフィルター用材料及びその硬化物
JPH04345673A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd ソルダーレジストインキ組成物及びその硬化物
JPH04355450A (ja) 1991-05-31 1992-12-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JPH04363311A (ja) 1991-06-06 1992-12-16 Nippon Kayaku Co Ltd カラーフイルターの保護膜用材料及びその硬化物

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JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JP2931860B2 (ja) * 1992-01-31 1999-08-09 日石三菱株式会社 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP4426123B2 (ja) * 2001-01-31 2010-03-03 昭和高分子株式会社 硬化性樹脂および硬化性樹脂組成物
JP3938375B2 (ja) * 2003-03-12 2007-06-27 三菱化学株式会社 感光性着色組成物、カラーフィルタ、及び液晶表示装置
CN101017324A (zh) * 2003-03-12 2007-08-15 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP5142175B2 (ja) * 2005-07-07 2013-02-13 日本化薬株式会社 エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP5255813B2 (ja) * 2007-10-19 2013-08-07 Ｊｆｅケミカル株式会社 ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
JP6822758B2 (ja) * 2014-09-30 2021-01-27 日鉄ケミカル＆マテリアル株式会社 タッチパネル用感光性樹脂組成物およびその硬化膜、ならびに当該硬化膜を有するタッチパネル
JP6275620B2 (ja) * 2014-10-17 2018-02-07 日本化薬株式会社 感光性樹脂組成物及びその硬化物
KR101767082B1 (ko) * 2014-11-17 2017-08-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
WO2019004365A1 (ja) * 2017-06-29 2019-01-03 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
JP7029267B2 (ja) * 2017-10-06 2022-03-03 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物及び樹脂膜付き基板の製造方法
JP7132784B2 (ja) * 2018-07-26 2022-09-07 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
US11884773B2 (en) * 2018-12-19 2024-01-30 Nippon Steel Chemical & Material Co., Ltd. Phenolic resin, epoxy resin, epoxy resin composition and cured product of same
JP7368162B2 (ja) * 2019-09-30 2023-10-24 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂、その製造方法、感光性樹脂組成物、及びその硬化膜。

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61213213A (ja) 1985-03-19 1986-09-22 Fuji Photo Film Co Ltd 光重合性組成物
JPH01152449A (ja) 1987-12-09 1989-06-14 Matsushita Electric Ind Co Ltd カラーフィルタ
JPH04340965A (ja) 1991-05-17 1992-11-27 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物
JPH04345608A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラーフィルター用材料及びその硬化物
JPH04345673A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd ソルダーレジストインキ組成物及びその硬化物
JPH04355450A (ja) 1991-05-31 1992-12-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JPH04363311A (ja) 1991-06-06 1992-12-16 Nippon Kayaku Co Ltd カラーフイルターの保護膜用材料及びその硬化物

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WO2021235299A1 (ja) 2021-11-25
TWI911220B (zh) 2026-01-11
CN115551915A (zh) 2022-12-30
JP2025020272A (ja) 2025-02-12
JPWO2021235299A1 (https=) 2021-11-25
TW202202544A (zh) 2022-01-16
CN115551915B (zh) 2025-06-03

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