TWI811272B - 含三烷基硼烷錯合物起始劑及光酸的光學清透黏著劑 - Google Patents
含三烷基硼烷錯合物起始劑及光酸的光學清透黏著劑 Download PDFInfo
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- TWI811272B TWI811272B TW107144791A TW107144791A TWI811272B TW I811272 B TWI811272 B TW I811272B TW 107144791 A TW107144791 A TW 107144791A TW 107144791 A TW107144791 A TW 107144791A TW I811272 B TWI811272 B TW I811272B
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- Prior art keywords
- optically clear
- clear adhesive
- adhesive composition
- composition
- acrylate
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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Abstract
本發明係一種光學清透黏著劑組成物，該光學清透黏著劑組成物包括可自由基聚合的丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物、三烷基硼烷錯合物起始劑、光酸產生劑、及光敏劑。緊接在混合後之組成物的黏度及混合後約24小時之組成物的黏度變化小於約10%。
Description
本發明大致上係關於光學清透黏著劑的領域。具體而言，本發明係關於含三烷基硼烷(trialkyl borane)錯合物起始劑及光酸的光學清透黏著劑。
液體形式之光學清透黏著劑(optically clear adhesives in liquid format,LOCA)在顯示器工業中已非常普遍用以填充在保護蓋板(cover lens)與觸控感測器之間、在觸控感測器與液晶模組之間、及/或在保護蓋板與液晶模組之間的空氣間隙。圖1A及圖1B繪示可能的顯示器組態的剖面視圖。在圖1A中，LOCA 10定位在保護蓋板12與觸控感測器14之間以及觸控感測器14與液晶顯示器(liquid crystal display,LCD)16之間。在圖1B中，LOCA 10定位在保護蓋板12與觸控感測器14之間。在兩種組態中油墨梯級(ink step)18皆存在於保護蓋板12下方。
大部分LOCA係UV可固化丙烯酸酯及/或聚矽氧樹脂。構造一般係從顯示器之正面/頂部往回建構，使得保護蓋板(具有遮光(light obscuring)油墨梯級)黏合至觸控感測器，然後堆疊接著黏
合至LCD模組及/或AMOLED堆疊。以光學可靠性及顯示器效能而言，關鍵是固化所有的液體光學清透黏著劑，甚至是塗佈於觀看區以外以及位於油墨梯級下者，如此可避免顯示器缺陷(諸如黃斑(yellow mura)及漏光)，或外觀缺陷(諸如滲出(oozing))。雖可使用UV可穿透油墨(參見例如WO2012/071144)，但並非本工業中常見實務。遮光油墨梯級經常不透射UV光，導致油墨梯級下未充分固化及/或未固化。
為了在油墨梯級下提供固化，一種方法是在層壓之前預固化黏著劑(參見例如美國專利第8,628,637號或WO2013/111810)。然而，這可能導致黏著效能的損失，以及因塗層缺陷(例如圖像框化(picture framing))及/或不良層壓所致之顯示器缺陷(例如黃斑以及漏光)。替代地，可諸如藉由使用熱起始劑而使用次級固化(如例如美國專利第8,087,967號或US2011/021655中所述)，以固化油墨梯級下區域。然而，這需要額外的儀器(諸如熱烘箱)，並需使顯示器堆疊暴露在高於60℃之溫度以達成固化。大部分的顯示器製造商不希望將液晶模組暴露在高於40℃之溫度。最後，從油墨梯級下之側輻射(如例如美國專利第7,927,533號中所述)可用於試圖固化LOCA。此方法需要困難地瞄準100μm厚的LOCA層而且可能無法達到所需固化深度及/或穿越撓性電路或其他遮蔽來自側邊固化之物件而固化，尤其是在其中撓性尾部可從顯示器之頂部側邊脫落的單元內(in-cell)構造中。
在一實施例中，本發明係一種光學清透黏著劑組成物，該光學清透黏著劑組成物包括一可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物、一三烷基硼烷錯合物起始劑、一光酸產生劑、及一光敏劑。緊接在混合後之該組成物的一黏度及混合後約24小時之該組成物的一黏度變化小於約10%。
在另一實施例中，本發明係一種在一油墨梯級下固化之方法。該方法包括將一光學清透黏著劑組成物定位為至少部分地在該油墨梯級之下以及將該光學清透黏著劑組成物暴露於光化輻射以固化該油墨梯級下的該光學清透黏著劑組成物。該光學清透黏著劑組成物包括一可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物、一三烷基硼烷錯合物起始劑、一光酸產生劑、及一光敏劑。緊接在混合後之該組成物的一黏度及混合後約24小時之該組成物的一黏度變化小於約10%。
在另一實施例中，本發明係一種層壓體，該層壓體包括一第一基材、一第二基材、及一光學清透黏著劑組成物，該光學清透黏著劑組成物定位於該第一基材與該第二基材之間並與該第一基材及該第二基材接觸。該光學清透黏著劑層係衍生自包括下列之前驅物：一可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物、一三烷基硼烷錯合物起始劑、一光酸產生劑、及一光敏劑。緊接在混合後之該組成物的一黏度及混合後約24小時之該組成物的一黏度變化小於約10%。
10‧‧‧LOCA
12‧‧‧保護蓋板
14‧‧‧觸控感測器
16‧‧‧液晶顯示器
18‧‧‧油墨梯級
100‧‧‧橡膠聚矽氧間隔物
圖1A表示用於在先前技術之顯示器應用中使用液體光學清透黏著劑的第一組態的剖面視圖。
圖1B表示用於在先前技術之顯示器應用中使用液體光學清透黏著劑的第二組態的剖面視圖。
本發明是一種光學清透黏著劑組成物、一種包括該光學清透黏著劑組成物的層壓體、及一種在油墨梯級下使用該光學清透黏著劑組成物固化之方法。光學清透黏著劑組成物大致上包括可自由基聚合的丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物、三烷基硼烷錯合物起始劑、光酸產生劑、及光敏劑。光學清透黏著劑組成物是單件式系統，其中三烷基硼烷最初以一級胺保護。當用光化輻射諸如紫外(ultraviolet,UV)光來活化組成物時，光酸產生劑產生超強酸(superacid)，且一級胺自三烷基硼烷解錯合，致使三烷基硼烷與組成物中的丙烯酸酯或(甲基)丙烯酸酯基寡聚物反應，以起始對(甲基)丙烯酸酯基寡聚物的自由基聚合。光酸產生劑可在顯示器構造的透明區域(例如，其中光不被油墨遮罩遮蔽的區域)中被活化，並且還可固化顯示器構造的遮光區域(例如，油墨遮罩下方)。
光學清透黏著劑組成物可以是液體光學清透黏著劑或後UV可固化之光學清透黏著劑膜的形式。如本文中所使用，用語「光學清透(optically clear)」係指在400至700nm波長範圍中具有大於約80%且具體為大於約90%之光透射率、小於約5%且具體為小於約2%
之霧度、及小於約1%之不透明度的材料。光透射率及霧度兩者皆可使用例如ASTM-D 1003-95來判定。一般而言，光學清透黏著劑係目視無氣泡的。
丙烯酸酯及(甲基)丙烯酸酯官能基係摻入作為必需使液體黏著劑進行反應(自由基聚合)以從液態轉變成固態的可自由基聚合的基團。在一實施例中，光學清透黏著劑組成物包括介於約20wt%與約100wt%之間的可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物，具體為介於約50wt%與約99wt%之間的可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物，且更具體為介於約90wt%與約99wt%之間的可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物。合適的可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物的實例包括但不限於美國專利第9,309,443號中所揭示者，該專利特此以引用方式併入本文中。
三烷基硼烷錯合物起始劑由三烷基硼烷及胺的組合形成，並且是自由基起始劑的組分。三烷基硼烷用胺進行穩定作用以提供穩定的自由基聚合起始劑已在例如Macromolecules 2006,Vol.39,2507-2513中敘述。胺可以是單官能或多官能的，並且可以是芳族胺、脂族胺、或其混合。如上所述，三烷基硼烷最初以一級胺保護。常用的胺的一實例是1,3-二胺丙烷。在一實施例中，光學清透黏著劑組成物包括介於約0.01wt%與約10wt%之間的三烷基硼烷錯合物起始劑，具體為介於約0.01wt%與約5wt%之間的三烷基硼烷錯合物起始劑，且更具體為介於約0.01wt%與約2wt%之間的三烷基硼烷錯合
物起始劑。合適的三烷基硼烷錯合物的實例包括但不限於三烷基硼烷胺錯合物起始劑。
光學清透黏著劑的光酸產生劑在暴露於光化輻射後產生超強酸。光酸產生劑一般而言係已知的，且可參考K.Dietliker,Chemistry and Technology of UV and EB Formulation for Coatings,Inks and Paints,vol.III,SITA Technology Ltd.,London,1991，其特此以引用方式併入本文中。還可進一步參照Crivello J.V.(1984)Cationic polymerization-Iodonium and sulfonium salt photoinitiators.In：Initiators-Poly-Reactions-Optical Activity.Advances in Polymer Science,vol 62.Springer,Berlin,Heidelberg，其亦特此以引用方式併入本文中。「光化輻射(actinic radiation)」意指光化學活性輻射及粒子束，包括電磁輻射，例如，微波、紅外線輻射、可見光、紫外光、X射線、及γ射線。在一些實施例中，可使用具有介於約200與約800nm之間之波長的光化輻射，且具體為具有介於約200與約400nm之間之波長的光化輻射。超強酸接著與一級胺反應，使一級胺得以自三烷基硼烷解錯合，並且致使三烷基硼烷與組成物中的丙烯酸酯或(甲基)丙烯酸酯基寡聚物反應，以起始(甲基)丙烯酸酯基寡聚物的自由基聚合。
當用光化輻射來活化組成物時，光酸產生劑產生超強酸，且一級胺自三烷基硼烷解錯合，致使三烷基硼烷與組成物中的丙烯酸酯或(甲基)丙烯酸酯基寡聚物反應。此反應起始(甲基)丙烯酸酯基寡聚物的自由基聚合。在一實施例中，光學清透黏著劑組成物包括介
於約0.01wt%與約10wt%之間的光酸產生劑，具體為介於約0.01wt%與約5wt%之間的光酸產生劑，且更具體為介於約0.01wt%與約2wt%之間的光酸產生劑。合適的光酸產生劑的實例包括但不限於：碘(iodonium)鹽及鋶(sulfonium)鹽，諸如二芳基碘鹽、三芳基統鹽、二烷基苯甲醯甲基鋶(dialkylphenacylsulfonium)鹽、及二烷基-4-羥苯基鋶(dialkyl-4-hydroxyphenylsulfonium)鹽。
可用的碘鹽光酸產生劑包括但不限於：雙(4-第三丁基苯基)碘鎓六氟銻酸鹽(bis(4-t-butylphenyl)iodonium hexafluoroantimonate)(例如，Hampford Research Inc.,Stratford,CT的FP5034TM)、雙(4-第三丁基苯基)碘鎓六氟磷酸鹽(bis(4-tert-butylphenyl)iodonium hexafluorophosphate)(例如，Hampford Research Inc.,Stratford,CT的FP5035TM)、(4-甲氧基苯基)苯基碘鎓三氟甲磺酸鹽((4-methoxyphenyl)phenyl iodonium triflate)、雙(4-第三丁基苯基)碘鎓樟腦磺酸鹽(bis(4-tert-butylphenyl)iodonium camphorsulfonate)、雙(4-第三丁基苯基)碘鎓六氟銻酸鹽、雙(4-第三丁基苯基)碘鎓六氟磷酸鹽、雙(4-第三丁基苯基)碘鎓四苯硼酸鹽、雙(4-第三丁基苯基)碘鎓甲苯磺酸鹽、雙(4-第三丁基苯基)碘鎓三氟甲磺酸鹽、(4-辛基氧苯基)苯基碘鎓六氟磷酸鹽(例如，Hampford Research Inc.,Stratford,CT的FP5384TM)、(4-辛基氧苯基)苯基碘鎓六氟銻酸鹽(例如，Hampford Research Inc.,Stratford,CT的FPFP5386TM)、(4-甲基苯基)碘鎓四(五氟苯基)硼酸鹽(例如，Bluestar Silicones,East Brunswick,NJ的Rhodorsil 2074TM)、雙(4-
甲基苯基)碘鎓六氟磷酸鹽(例如，IGM Resins Bartlett,IL的Omnicat 440TM)、及4-(2-烴基-1-四癸氧基)苯基]苯基碘鎓六氟銻酸鹽(4-(2-hydroxy-1-tetradecycloxy)phenyl]phenyl iodonium hexafluoroantimonate)。
可用的鋶鹽光酸產生劑包括但不限於：二苯基(4-苯硫基)苯基鋶六氟磷酸鹽、雙(4-二苯基鋶苯基)硫化物雙(六氟磷酸鹽)、二苯基(4-苯硫基)苯基鋶六氟銻酸鹽、雙(4-二苯基鋶苯基)硫化物雙(六氟銻酸鹽)、及可以分別用於PF6鹽及SbF6鹽之以商標名稱UVI-6992TM及UVI-6976TM購自Synasia,Metuchen,NJ的三芳基鋶鹽的摻合物。其他可用的鋶鹽包括但不限於：三苯基鋶六氟銻酸鹽(例如，Chitec Technology Corp.Taipei,Taiwan的CT-548TM)、二苯基(4-苯硫基)苯基鋶六氟磷酸鹽(例如，San-Apro Limited,Tokyo Japan的CPI-100)、及二苯基(4-苯硫基)苯基鋶[(Rf)nPF-6-n]，其中Rf係全氟化烷基(例如，San-Apro Limited,Tokyo Japan的CPI-200)。
可用的二烷基苯甲醯甲基鋶鹽光酸產生劑已由Crivello.J.V.and Lam,J.H.W.in J.Polym.Sci.Polym.Chem.Ed.17,2877(1979)敘述，且一實例係苯甲醯甲基四亞甲基鋶六氟磷酸鹽(phenacyltetramethylenesulfonium)。
可用的二烷基-4-羥苯基鋶鹽光酸產生劑已由Crivello,J.V.and Lam.J.H.W.in J.Polym.Sci.Polym.Chem.Ed.18,1021(1980)敘述，且一實例係二甲基-3,5-二甲基-4-羥苯基鋶六氟銻酸鹽。
與上述鎓鹽陽離子中任意一者錯合的陰離子的非限制性實例係：-BF4、-AsF6、-PF6、-SbF6、-C(SO2CF3)3、-CH(SO2CF3)2、-B(C6H5)4、-B(C6F5)4、及-[(Rf)nPF6-n]，其中Rf係全氟化烷基。
合適的超強酸的實例包括但不限於：氟銻酸(HSbF6)、六氟磷酸(HPF6)、全氟化四苯基硼酸(HB(C6F5)4)、三-(三氟甲基磺醯基)甲烷(HC(SO2CF3)3)、三氟甲烷磺酸(CF3SO3H)(亦稱作三氟甲磺酸)、及氟磺酸(HSO3F)。
在一實施例中，光學清透黏著劑組成物包括可吸收光並將能量或電子傳遞至光酸產生劑的光敏劑。一般而言，光學清透黏著劑組成物可包括介於約0.01wt%與約5wt%之間的光敏劑，具體為介於約0.01wt%與約2wt%之間的光敏劑，更體為介於約0.01wt%與約1wt%之間的光敏劑。合適的光敏劑的實例包括但不限於：經取代及未經取代的二苯甲酮、樟腦醌(camphorquinone)、及硫雜蒽酮化合物、經取代及未經取代的多環芳族烴(諸如蔥及並)、香豆素及香豆素酮衍生物、以及傳統的自由基光起始劑，諸如安息香衍生物、安息香及其衍生物，諸如α-安息香甲基醚；α-苯基安息香；α-烯丙基安息香；α-苄基安息香；安息香醚，諸如二苯乙二酮二甲基縮酮(例如，IGM Resins USA Inc.,Charlotte,North Carolina的OMNIRAD 651)、安息香甲基醚、安息香乙基醚、安息香正丁基醚；苯乙酮及其衍生物，諸如2-羥基-2-甲基-1-苯基-1-丙酮(例如，IGM Resins USA Inc.的OMNIRAD 1173)及1-羥基環己基苯基酮(例如，IGM Resins USA Inc.的OMNIRAD 184)。可用作敏化劑的其他自由基光起始劑
包括醯基氧化膦衍生物，諸如乙基-2,4,6-三甲基苄醯基苯基膦酸酯(例如，IGM Resins USA Inc.的OMNIRAD TPO-L)、及雙(2,4,6-三甲基苄醯基)-苯基氧化膦(例如，IGM Resins USA Inc.的OMNIRAD 819)。
可為了特殊目的添加其他材料至光學清透黏著劑組成物，包括例如：熱或光起始劑、交聯劑、膠黏劑、分子量控制劑、耦合劑、油、塑化劑、抗氧化劑、UV穩定劑、UV吸收劑、顏料、催化劑、固化劑、聚合物添加劑、奈米粒子、及其他添加劑。這些其他材料可為了特殊目的添加至光學清透黏著劑組成物，前提是其等不會顯著減少聚合及塗層後總成層的光學清透度。如本文中所使用，用語「光學清透(optically clear)」係指在400至700nm波長範圍中具有大於約90%之光透射率、小於約2%之霧度、及小於約1%之不透明度的材料。光透射率及霧度兩者皆可使用例如ASTM-D 1003-92來判定。一般而言，光學清透的總成層係目視無氣泡的。
在光學清透黏著劑組成物中存在單體或低分子量反應性物種可導致提早聚合。因此，在一實施例中，光學清透黏著劑組成物實質上無單體。在另一實施例中，光學清透黏著劑的組成物實質上無低分子量反應性物種。在又另一實施例中，光學清透黏著劑的組成物實質上無單體及低分子量反應性物種。「實質上無(substantially free)」用於本說明書意指少於約5wt%，具體為少於約2wt%，更具體為少於約1wt%，且最具體為少於約0.5wt%。
緊接在將組分混合在一起後及約24小時後，光學清透黏著劑組成物的黏度變化小於約10%，具體為小於約5%，且更具體為小於約1%。小於10%或更多的黏度變化表明組成物未提早凝膠化/聚合，且具有可靠的儲放穩定性。
本發明亦是一種包括光學清透黏著劑組成物的層壓體。層壓體定義為至少一光學清透黏著劑組成物夾置於二個基材層或其多層之間的多層複合物。在一實施例中，層壓體包括第一基材、第二基材、及定位於第一基材與第二基材之間並與第一基材及第二基材接觸的光學清透黏著劑組成物。在一實施例中，第一基材及第二基材之至少一者係光學清透的。在一實施例中，當光學清透黏著劑組成物置於二個基材(其中該等基材之至少一者係透明)之間並製成層壓體時，層壓體當固化時具有小於約5%的霧度、大於約80%的透射率、及大於約95%的光學清透度。
在一實施例中，基材可以是玻璃、COP、PET、PMMA、聚碳酸酯、偏振器(例如TAC表面)等。
層壓體具有下列性質的至少一者：在使用層壓體之物品的使用壽命期間具光學透射性、在使用層壓體之物品的若干層之間維持足夠接合強度的能力、抵抗或避免分層、及在使用壽命期間抗起泡。可以使用加速老化測試來評估抗氣泡形成性及光學透射性的保持。在加速老化測試中，光學清透黏著劑組成物係定位於二基材之間。接著使所得的層壓體暴露於高溫、通常結合高濕度達一段時間。即使在暴露於高溫及高濕之後，層壓體(包括光學清透黏著劑組成
物)將維持光學清透度。例如：包括光學清透黏著劑組成物的層壓體在70℃及90%相對溼度下老化約72小時並接著冷卻至室溫之後仍維持光學清透。老化之後，黏著劑在400奈米(nm)與700nm之間的平均透射率大於約80%且具體地大於約90%，而霧度小於約5%且具體地小於約2%。
本發明亦包括一種在油墨梯級下固化之方法。該方法包括將光學清透黏著劑組成物定位為至少部分地在油墨梯級之下，並且將光學清透黏著劑組成物暴露於光化輻射。當本發明的光學清透黏著劑組成物暴露於光化輻射時，光學清透黏著劑組成物不僅在沒有阻擋光的透明區域中固化，而且還在油墨梯級下固化。
本發明在以下實例中被更具體地描述，該等實例只意圖作為說明，因為在本發明範圍內的許多改變和變化對於所屬技術領域中具有通常知識者而言將是顯而易見的。除非另外註明，否則以下實例中所報告之所有份數、百分比、及比率均以重量計。
藉由將具有15mm直徑之圓自中心移除的0.031吋(0.794mm)厚的橡膠聚矽氧間隔物(Diversified Silicone Products,Santa Fe,California的-70 DUROMETER red specification grade，# DSP7038GP-010-36，177573批)鋪至1吋(25mm)×3吋(76mm)×0.04吋(1mm)的玻璃載玻片上方來製備FTIR固化分析的樣本。將約150μL之LOCA滴施加至該圓之中心，然後將第二載玻片(2吋(51
mm)×3吋(76mm)×0.04吋(1mm))放在橡膠聚矽氧間隔物100及LOCA上方。然後將總成與黏合劑夾鉗夾在一起。LOCA填充該圓的整個區域。
使用Nicolet Nexus 670 FTIR(Thermo Scientific,Waltham,MA)連同385nm之LED光源(Excelitas Technologies Corp.,Waltham MA的Omnicure LX400)進行即時IR分析。藉由分析近IR區域(關注的峰值位於約6200cm-1，-CH拉伸)來判定丙烯酸酯雙鍵的轉化。收集標籤(collect tab)中用於軟體的參數設定為32次掃描、解析度16、及最後格式為吸光度。在機台標籤(Bench tab)之內設定進一步參數，樣本艙設定為主要，偵測器設定為MCT/A，選擇KBr分光器，光源係IR，配件選擇為透射E.S.P.，增益為1，速度設定為3.7974，且孔徑設定為32。每100分鐘收集背景光譜，且在UV暴露之前測量基準線光譜，以及在UV暴露之後測量後光譜。
為了判定遮光區域(即黑色遮罩)下方的固化，0.031吋(0.794mm)厚及2mm寬之橡膠襯墊置於載玻片上方。以LOCA填充襯墊。隨後用黑色膠帶覆蓋蓋玻片的整個區域，惟一3mm×6mm之窗口除外，且蓋玻片置於填充有LOCA之填充襯墊上方。如上所述，使用Nicolet Nexus FTIR(Thermo Scientific,Waltham,MA)連同385nm之LED光源(Omnicure LX400)進行這些測量。
在固化前取得基準線IR光譜。在如上所述之相同組態中使樣本暴露於385nm之UV LED達20秒。然後，移除黑色膠帶，並且從暴露窗口的中心每0.5mm地測量IR，以測量功能性固化的側向延伸。延長測量直到樣本室的界限或直到光譜顯示無固化為止。
使用DHR-2流變儀(TA Instruments,New Castle,DE)連同UV LED固化設備來進行光流變分析。UV LED光源係具有50mW/cm2之UV-A輸出的365nm之LED。幾何形狀係20mm之可棄式鋁上部板及20mm之可棄式UV透明丙烯酸下部板。將LOCA樣本置於下部板上，並且將間隙修整至500μm厚，移除已滲出間隙的多餘黏著劑。在5Hz下分析樣本，取得30秒的基準線，隨後施加40秒之UV LED劑量，並且取得關閉UV LED後110秒的額外資料擷取。
將配方置於50℃烘箱中，隨後針對凝膠在24小時後及48小時後針對凝膠含量進行視覺觀察。凝膠含量記錄為在暴露後存在或不存在。包含單體及光酸產生劑及TEB-DAP的混合物提供凝膠。
藉由將LOCA混合物夾置於2"×3"之LCD玻璃(Corning Display Technologies,Corning,NY的Eagle 2000)之間厚
度為約150微米處，然後在使用石英UVD燈泡的Fusion UV燈(Fusion UV Systems INC.Gaithersburg,Maryland)下以UV-A區域之總能量係3J/cm2進行固化，以測量LOCA材料的光學性質。藉由使用沿著基板之一的邊緣的一層3M(St.Paul,MN)Scotch 898絲狀帶來控制LOCA樣本的厚度。於老化之前及之後在環境測試條件下使用HunterLab UltraScan PRO(Hunter Associates Laboratory,Inc,Reston,Virginia)來測量經固化之LOCA的霧度、透射率、及顏色。係依據習知CIE參數L*(亮度)、a*(紅色/綠色座標)、及b*(黃色/藍色座標)來記錄顏色座標。
用於實例的配方均由鹼酸摻合物或預備液體光學清透黏著劑配方(Preparatory Liquid Optically Clear Adhesive Formulation，以下稱PLOCA)、超強酸、光敏劑、及三烷基硼烷錯合物起始劑所構成。
在聚合之第一步驟中，在不鏽鋼反應容器中充填55百份率(pph)之丙烯酸2-乙基己酯(2-EHA)、25pph之異莰基丙烯酸酯(IBOA)、20pph之烴乙基丙烯酸酯(HEA)、5.4pph之巰基乙酸異辛酯(IOTG)、0.02pph之MEHQ、0.05pph之BHT、及0.0175pph之Vazo 52。封閉反應器並以氧吹掃，然後保持在大約5psig(34.5kPa)
氮壓。將反應混合物加熱至60℃之誘導溫度，而聚合反應絕熱地進行，並在大約153℃達到高峰。當反應完成後，將混合物冷卻至60℃。
在聚合之第二步驟中，將1.8pph之IOTG、0.02pph之Vazo 52、0.04pph之Vazo 67、0.05pph之Vazo 88、及0.75pph之2-EHA(2-EHA用以溶解Vazo 52、Vazo 67、及Vazo 88)添加至反應混合物中。封閉反應器並以氧吹掃，然後保持在5psig(34.5kPa)氮壓。將反應混合物加熱至60℃，而聚合反應絕熱地進行，並在大約115℃達到高峰。接著使反應混合物在5psig(34.5kPa)之氮壓下保持在115℃達3小時。
接著，將混合物冷卻至70℃，並添加4.4pph之甲基丙烯酸異氰酸基乙酯(IEM)。以90/10體積之氮/氧混合物緩慢氣流鼓泡通過保持在70℃之混合物達8小時。
在聚合之第一步驟中，在不鏽鋼反應容器中充填74.0百份率(pph)之丙烯酸十三酯(TDA)、26pph之丙烯酸2-羥基丙基酯(2-HPA)、5.0pph之經烷基矽氧烷處理之發煙二氧化矽、2.873pph巰基乙酸異辛酯(IOTG)、0.02pph之MEHQ、及0.00165pph之Vazo 52。封閉反應器並以氧吹掃，然後保持在大約5psig(34.5kPa)氮壓。將反應混合物加熱至60℃之誘導溫度，而聚合反應絕熱地進行，
並在大約125℃達到高峰。當反應完成後，將混合物冷卻至60℃。經重量分析，確定反應混合物聚合成50.0固體。
在聚合之第二步驟中，將1.768pph之IOTG、0.025pph之Vazo 52、0.04pph之Vazo 67、及0.05pph之Vazo 88添加至反應混合物中。封閉反應器並以氧吹掃，然後保持在5psig(34.5kPa)氮壓。將反應混合物加熱至60℃，而反應絕熱地進行，並在大約113.0C達到高峰。接著，將混合物保持在115.0C達三小時。
接著，將該混合物冷卻至90℃，並添加3.0pph(基於100份之TDA+HPA)之甲基丙烯酸異氰酸基乙酯(IEM)。以90/10體積之氮/氧混合物緩慢氣流鼓泡通過保持在90℃之混合物達2小時。
在產物脫水前添加0.5pph之矽烷A-174、0.05pph之丁基化羥基甲苯、1.0pph之Evanstab 13、及0.1pph之TPO-L(皆基於100份之TDA+HPA)。
表2所列之實例配方之各者係藉由將50.0g之PLOCA配方、碘鹽、及光敏劑添加至DAC MAX100杯中而化合。這些材料係使用DAC400 Speedmixer(FlackTek,Landrum SC)以1000RPM達30秒、2000RPM達90秒、及2700RPM達8分鐘來混合。將0.5g之TEB DAP添加至DAC MAX100杯中的材料。這些材料係使用DAC400 Speedmixer以1000RPM達60秒來混合。
在表2中，各配方係基於50g的PLOCA-1或PLOCA-2之基礎液體OCA。光酸產生劑選項包括雙(4-十二烷基苯基)碘鎓SbF6、OPPI、及Rhodorsil 2074。光敏劑選項包括ITX及Omnirad 651。
表3展示使用FTIR進行固化分析的結果，表中報告隨暴露而變動的固化程度。可以看出，Omnirad 651展示更顯著程度的雙鍵轉化。
表4展示固化傳播(cure propagation)實驗的結果，表中展示初始固化暴露後及處於50℃達24小時後各種配方的固化側向延伸。可以看出，處於50℃達24小時後觀察到完全固化。
表5展示用於凝膠點的光流變測定法的測試結果，凝膠點由儲存模數(G’)變得大於損耗模數(G”)的點來定義。可以看出，IS-3及IS-4展現出交叉點，而IS-5未表露出交叉點。
表6展示來自經固化之LOCA的光學性質測量，其表示霧度<0.2、b*<0.4、及透射率(未經校正)>90%。
表7展示來自LOCA的室溫儲放穩定性，其中完整配製的材料(含LOCA、光敏劑、三烷基硼烷錯合物起始劑、及超強酸)僅在其等實質上無(甲基)丙烯酸酯單體時穩定。其中所有組分(LOCA+陽離子光起始劑+三烷基硼烷)皆有添加單體的比較例A及B不穩定且將凝膠化。比較例C並非實質上無單體，該比較例含陽離子光起始劑但缺乏三烷基硼烷。該比較例穩定，此係因為該比較例沒有導致反應的三烷基硼烷。比較例D並非實質上無單體，該比較例含三烷基硼烷但缺乏陽離子光起始劑。該比較例穩定，此係因為該比較例沒有陽離子光起始劑存在。比較例E並非實質上無單體，該比較例含陽離子光起始劑但缺乏三烷基硼烷。該比較例穩定，此係因為該比較例沒有導致反應的三烷基硼烷。
表7：LOCA的室溫儲放穩定性
雖然本發明已參照較佳的實施例加以描述，但所屬技術領域中具有通常知識之工作者應能理解形式及細節可改變而不會偏離本發明的精神及範疇。
10‧‧‧LOCA
12‧‧‧保護蓋板
14‧‧‧觸控感測器
16‧‧‧液晶顯示器
18‧‧‧油墨梯級
Claims (19)
- 一種光學清透黏著劑組成物，其包含：可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物；三烷基硼烷錯合物起始劑；光酸產生劑；及光敏劑，其中該光敏劑為安息香醚，其中緊接在混合後之該組成物的黏度及混合後約24小時之該組成物的黏度變化小於約10%。
- 如請求項1之光學清透黏著劑組成物，其中該光學清透黏著劑組成物係液體光學清透黏著劑及後UV可固化之光學清透黏著劑膜中之一者。
- 如請求項1之光學清透黏著劑組成物，其中該光酸產生劑在暴露於光化輻射後產生超強酸。
- 如請求項1之光學清透黏著劑組成物，其中該光酸產生劑包含二芳基碘鹽、三芳基鋶鹽、二烷基苯甲醯甲基鋶鹽、及二烷基-4-羥苯基鋶鹽中之一者。
- 如請求項1之光學清透黏著劑組成物，其中該光學清透黏著劑組成物包含介於約0.01wt%與約10wt%之間的三烷基硼烷錯合物起始劑。
- 如請求項1之光學清透黏著劑組成物，其中該光學清透黏著劑組成物包含介於約0.01wt%與約10wt%之間的光酸產生劑。
- 如請求項1之光學清透黏著劑組成物，其中該光學清透黏著劑組成物包含介於約0.01wt%與約5wt%之間的光敏劑。
- 如請求項1之光學清透黏著劑組成物，其中該光學清透黏著劑組成物是單件式系統。
- 如請求項1之光學清透黏著劑組成物，其中該組成物包含小於約5%的單體。
- 如請求項1之光學清透黏著劑組成物，其中該組成物包含少於約5%的低分子量反應性物種。
- 如請求項1之光學清透黏著劑組成物，其中當該光學清透黏著劑組成物置於二個基材之間並製成層壓體時，其中該等基材之至少一者係透明，該層壓體當固化時具有小於約5%的霧度、大於約80%的透射率、及大於約95%的光學清透度。
- 一種在油墨梯級下固化之方法，該方法包含：將光學清透黏著劑組成物定位為至少部分地在該油墨梯級之下，其中該光學清透黏著劑組成物包含：可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物；三烷基硼烷錯合物起始劑；光酸產生劑；及光敏劑，其中該光敏劑為安息香醚，其中緊接在混合後之該組成物的黏度及混合後約24小時之該組成物的黏度變化小於約10%；及將該光學清透黏著劑組成物暴露於光化輻射以固化該油墨梯級下的該光學清透黏著劑組成物。
- 如請求項12之方法，其中將該光學清透黏著劑組成物暴露於光化輻射產生超強酸。
- 如請求項12之方法，其中該光酸產生劑包含碘鹽、二芳基碘鹽、三芳基鋶鹽、二烷基苯甲醯甲基鋶鹽、及二烷基-4-羥苯基鋶鹽中之一者。
- 如請求項12之方法，其中該組成物實質上無單體及低分子量反應性物種。
- 一種層壓體，其包含：第一基材；第二基材；及光學清透黏著劑組成物，其定位於該第一基材與該第二基材之間並與該第一基材及該第二基材接觸，其中該光學清透黏著劑層係衍生自包含下列之前驅物：可自由基聚合之丙烯酸酯或甲基(丙烯酸酯)官能基寡聚物；三烷基硼烷錯合物起始劑；光酸產生劑；及光敏劑，其中該光敏劑為安息香醚，其中緊接在混合後之該組成物的黏度及混合後約24小時之該組成物的黏度變化小於約10%。
- 如請求項16之層壓體，其中該第一基材及該第二基材之至少一者係光學清透的。
- 如請求項16之層壓體，其中將該光學清透黏著劑組成物暴露於光化輻射產生超強酸。
- 如請求項16之層壓體，其中，該層壓體當固化時具有小於約5%的霧度、大於約80%的透射率、及大於約95%的光學清透度。
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| WO2019116201A1 (en) | 2019-06-20 |
| US20200317956A1 (en) | 2020-10-08 |
| KR102625644B1 (ko) | 2024-01-15 |
| CN111479693A (zh) | 2020-07-31 |
| CN111479693B (zh) | 2023-06-16 |
| US11866609B2 (en) | 2024-01-09 |
| TW201927976A (zh) | 2019-07-16 |
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