TWI788463B - 用於形成完全自對準介層窗的選擇性膜沉積方法 - Google Patents

用於形成完全自對準介層窗的選擇性膜沉積方法 Download PDF

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TWI788463B
TWI788463B TW107141017A TW107141017A TWI788463B TW I788463 B TWI788463 B TW I788463B TW 107141017 A TW107141017 A TW 107141017A TW 107141017 A TW107141017 A TW 107141017A TW I788463 B TWI788463 B TW I788463B
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gas
substrates
substrate
exposing
silanol
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TW107141017A
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Chinese (zh)
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TW201930625A (zh
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坎達巴拉 Ｎ 泰伯利
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日商東京威力科創股份有限公司
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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