TWI739920B - 鈍態形成性輕金屬上的熱處理式導電性被膜形成方法 - Google Patents
鈍態形成性輕金屬上的熱處理式導電性被膜形成方法 Download PDFInfo
- Publication number
- TWI739920B TWI739920B TW106134260A TW106134260A TWI739920B TW I739920 B TWI739920 B TW I739920B TW 106134260 A TW106134260 A TW 106134260A TW 106134260 A TW106134260 A TW 106134260A TW I739920 B TWI739920 B TW I739920B
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- Taiwan
- Prior art keywords
- nickel
- acid
- film
- mol
- phosphorus
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1689—After-treatment
- C23C18/1692—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
- C23C18/1831—Use of metal, e.g. activation, sensitisation with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP2016-208639 | 2016-10-25 | ||
JP2016208639A JP6326591B2 (ja) | 2016-10-25 | 2016-10-25 | 不導態形成性の軽金属上への熱処理式の導電性皮膜形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201819690A TW201819690A (zh) | 2018-06-01 |
TWI739920B true TWI739920B (zh) | 2021-09-21 |
Family
ID=62023416
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106134260A TWI739920B (zh) | 2016-10-25 | 2017-10-03 | 鈍態形成性輕金屬上的熱處理式導電性被膜形成方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6326591B2 (ja) |
KR (2) | KR102409545B1 (ja) |
CN (1) | CN109891004B (ja) |
TW (1) | TWI739920B (ja) |
WO (1) | WO2018079188A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11202112883PA (en) * | 2019-07-31 | 2021-12-30 | Showa Denko Kk | Laminate and method for producing same |
CN110484943A (zh) * | 2019-08-12 | 2019-11-22 | 天津市凯鑫金属制品有限公司 | 一种高位下拉训练器把手的电镀工艺 |
CN113737233A (zh) * | 2021-06-23 | 2021-12-03 | 中国科学院深圳先进技术研究院 | 一种Fe-Ni-P合金电镀液、Fe-Ni-P合金镀层的电沉积方法及合金镀层 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101407930A (zh) * | 2007-10-12 | 2009-04-15 | 中国船舶重工集团公司第七二五研究所 | 一种钛合金高结合强度镀金工艺 |
CN105112960A (zh) * | 2015-09-21 | 2015-12-02 | 无锡清杨机械制造有限公司 | 一种次磷酸盐体系镀Ni-P合金的电镀液及电镀方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2781362B2 (ja) * | 1995-07-12 | 1998-07-30 | マルイ工業株式会社 | クロムめっき製品の製造方法 |
JPH11302854A (ja) | 1998-04-20 | 1999-11-02 | Shimizuchou Kinzoku Kogyo Kk | アルミニウム又はアルミニウム合金のめっき方法 |
JP2000087291A (ja) * | 1998-09-17 | 2000-03-28 | Furukawa Electric Co Ltd:The | アルミ基複合材製電子機器用ベース板およびその製造方法 |
JP3502921B2 (ja) | 1999-10-29 | 2004-03-02 | Tdk株式会社 | 現像ローラー及びその製造方法 |
JP2003239057A (ja) * | 2002-02-19 | 2003-08-27 | Osaka Gas Co Ltd | アルミニウムおよび/または亜鉛溶融用部材 |
AU2006207665A1 (en) | 2005-01-19 | 2006-07-27 | Aleris Aluminum Koblenz Gmbh | Method of electroplating and pre-treating aluminium workpieces |
TWI431150B (zh) | 2007-01-12 | 2014-03-21 | Uyemura C & Co Ltd | 鋁或鋁合金之表面處理方法 |
JP2009019217A (ja) | 2007-07-10 | 2009-01-29 | Heitetsu Park | 電解めっきを用いてマグネシウム合金と密着性の良い銅めっき層を形成する方法 |
US7998594B2 (en) * | 2008-02-11 | 2011-08-16 | Honeywell International Inc. | Methods of bonding pure rhenium to a substrate |
JP2010180457A (ja) * | 2009-02-06 | 2010-08-19 | Toyota Central R&D Labs Inc | 耐食導電材の製造方法 |
KR101365661B1 (ko) * | 2011-10-24 | 2014-02-24 | (주)지오데코 | 무전해 니켈-인 도금액 및 이를 이용한 도금방법 |
JP2013237895A (ja) * | 2012-05-15 | 2013-11-28 | Ricoh Co Ltd | 皮膜及びその製造方法、並びに金型 |
JP6090693B2 (ja) * | 2012-12-28 | 2017-03-08 | 福田金属箔粉工業株式会社 | 表面処理銅箔及び当該表面処理銅箔を用いたプリント配線板 |
JP6274556B2 (ja) | 2013-12-03 | 2018-02-07 | スズキ株式会社 | 電解めっき方法 |
JP6369748B2 (ja) * | 2014-04-23 | 2018-08-08 | スズキ株式会社 | アルミニウム部材の表面被覆方法及び表面被覆アルミニウム部材並びに内燃機関用ピストン |
CN104947162A (zh) * | 2015-07-22 | 2015-09-30 | 四川华丰企业集团有限公司 | 一种钛合金表面电镀方法 |
-
2016
- 2016-10-25 JP JP2016208639A patent/JP6326591B2/ja active Active
-
2017
- 2017-09-29 KR KR1020217011088A patent/KR102409545B1/ko active IP Right Grant
- 2017-09-29 WO PCT/JP2017/035477 patent/WO2018079188A1/ja active Application Filing
- 2017-09-29 KR KR1020197011955A patent/KR20190057105A/ko not_active Application Discontinuation
- 2017-09-29 CN CN201780066043.1A patent/CN109891004B/zh active Active
- 2017-10-03 TW TW106134260A patent/TWI739920B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101407930A (zh) * | 2007-10-12 | 2009-04-15 | 中国船舶重工集团公司第七二五研究所 | 一种钛合金高结合强度镀金工艺 |
CN105112960A (zh) * | 2015-09-21 | 2015-12-02 | 无锡清杨机械制造有限公司 | 一种次磷酸盐体系镀Ni-P合金的电镀液及电镀方法 |
Also Published As
Publication number | Publication date |
---|---|
CN109891004B (zh) | 2021-05-25 |
KR20210045505A (ko) | 2021-04-26 |
CN109891004A (zh) | 2019-06-14 |
WO2018079188A1 (ja) | 2018-05-03 |
JP6326591B2 (ja) | 2018-05-23 |
KR102409545B1 (ko) | 2022-06-15 |
KR20190057105A (ko) | 2019-05-27 |
TW201819690A (zh) | 2018-06-01 |
JP2018070911A (ja) | 2018-05-10 |
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