TWI657156B - 成膜遮罩、其製造方法及成膜遮罩之修補方法 - Google Patents
成膜遮罩、其製造方法及成膜遮罩之修補方法 Download PDFInfo
- Publication number
- TWI657156B TWI657156B TW106110080A TW106110080A TWI657156B TW I657156 B TWI657156 B TW I657156B TW 106110080 A TW106110080 A TW 106110080A TW 106110080 A TW106110080 A TW 106110080A TW I657156 B TWI657156 B TW I657156B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal layer
- mask
- film
- forming
- unit
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 230000008021 deposition Effects 0.000 title 1
- 229910052751 metal Inorganic materials 0.000 claims abstract description 110
- 239000002184 metal Substances 0.000 claims abstract description 110
- 239000010409 thin film Substances 0.000 claims abstract description 53
- 238000005304 joining Methods 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 62
- 230000035882 stress Effects 0.000 claims description 27
- 230000002093 peripheral effect Effects 0.000 claims description 22
- 230000002950 deficient Effects 0.000 claims description 13
- 238000007747 plating Methods 0.000 claims description 12
- 230000000873 masking effect Effects 0.000 claims description 10
- 238000003466 welding Methods 0.000 claims description 7
- 230000006355 external stress Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 29
- 230000015572 biosynthetic process Effects 0.000 abstract description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- 229920001721 polyimide Polymers 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 11
- 229910052738 indium Inorganic materials 0.000 description 7
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 7
- 238000005530 etching Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229910000851 Alloy steel Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
- B05B12/20—Masking elements, i.e. elements defining uncoated areas on an object to be coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K11/00—Resistance welding; Severing by resistance heating
- B23K11/10—Spot welding; Stitch welding
- B23K11/11—Spot welding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/20—Bonding
- B23K26/21—Bonding by welding
- B23K26/22—Spot welding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016066678 | 2016-03-29 | ||
| JP2016-066678 | 2016-03-29 | ||
| JP2016-241333 | 2016-12-13 | ||
| JP2016241333A JP6341434B2 (ja) | 2016-03-29 | 2016-12-13 | 成膜マスク、その製造方法及び成膜マスクのリペア方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201802267A TW201802267A (zh) | 2018-01-16 |
| TWI657156B true TWI657156B (zh) | 2019-04-21 |
Family
ID=60005018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106110080A TWI657156B (zh) | 2016-03-29 | 2017-03-27 | 成膜遮罩、其製造方法及成膜遮罩之修補方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10920311B2 (enExample) |
| JP (1) | JP6341434B2 (enExample) |
| KR (1) | KR101986331B1 (enExample) |
| CN (1) | CN108779550B (enExample) |
| TW (1) | TWI657156B (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113737128A (zh) | 2017-01-31 | 2021-12-03 | 堺显示器制品株式会社 | 蒸镀掩模、蒸镀掩模及有机半导体元件的制造方法 |
| WO2019186720A1 (ja) * | 2018-03-27 | 2019-10-03 | シャープ株式会社 | 表示デバイスの製造方法、及び表示デバイス |
| JP6588125B2 (ja) * | 2018-04-26 | 2019-10-09 | 堺ディスプレイプロダクト株式会社 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
| TWI773911B (zh) * | 2018-08-10 | 2022-08-11 | 日商大日本印刷股份有限公司 | 蒸鍍罩、蒸鍍罩裝置、蒸鍍罩之製造方法、蒸鍍罩裝置之製造方法及蒸鍍方法 |
| KR102236542B1 (ko) * | 2018-12-03 | 2021-04-06 | 주식회사 오럼머티리얼 | 마스크 지지 템플릿, 마스크 금속막 지지 템플릿, 마스크 지지 템플릿의 제조 방법 및 프레임 일체형 마스크의 제조 방법 |
| KR102800982B1 (ko) * | 2019-01-07 | 2025-04-30 | 삼성디스플레이 주식회사 | 마스크 조립체 |
| KR102837467B1 (ko) | 2019-02-06 | 2025-07-24 | 다이니폰 인사츠 가부시키가이샤 | 증착 마스크 장치, 마스크 지지 기구 및 증착 마스크 장치의 제조 방법 |
| CN110079762B (zh) * | 2019-04-11 | 2021-06-01 | Tcl华星光电技术有限公司 | 掩膜板及蒸镀oled器件的方法 |
| KR102852453B1 (ko) * | 2019-07-02 | 2025-08-29 | 삼성디스플레이 주식회사 | 증착용 마스크 및 그 제조방법 |
| KR102009714B1 (ko) * | 2019-07-15 | 2019-08-13 | (주)세우인코퍼레이션 | 초미세 와이어를 이용한 다중 다각망 구조의 네트 마스크 제조방법 |
| JP7113861B2 (ja) * | 2020-03-13 | 2022-08-05 | キヤノントッキ株式会社 | マスク取付装置、成膜装置、マスク取付方法、成膜方法、電子デバイスの製造方法 |
| KR20220004880A (ko) * | 2020-07-03 | 2022-01-12 | 삼성디스플레이 주식회사 | 마스크 어셈블리 및 이를 포함하는 증착 설비 |
| KR102836418B1 (ko) | 2020-09-18 | 2025-07-22 | 삼성디스플레이 주식회사 | 마스크 수리 장치 및 그것을 이용한 마스크 수리 방법 |
| JP2022067159A (ja) * | 2020-10-20 | 2022-05-06 | 株式会社ジャパンディスプレイ | 蒸着マスクユニットとその製造方法 |
| KR20220068327A (ko) | 2020-11-18 | 2022-05-26 | 삼성디스플레이 주식회사 | 마스크 어셈블리 및 그 마스크 어셈블리의 제조 방법 |
| KR102868862B1 (ko) * | 2020-12-10 | 2025-10-13 | 삼성디스플레이 주식회사 | 증착용 마스크 및 이를 포함하는 증착 장치 |
| KR20220113588A (ko) * | 2021-02-05 | 2022-08-16 | 삼성디스플레이 주식회사 | 마스크 및 이의 제조 방법 |
| KR102912257B1 (ko) * | 2021-07-20 | 2026-01-14 | 주식회사 선익시스템 | 섀도우 마스크의 제조 방법 |
| KR102810615B1 (ko) * | 2021-08-25 | 2025-05-22 | 주식회사 킵스바이오파마 | 디스플레이 패널용 증착 마스크 프레임 어셈블리 제조방법 |
| CN113714004B (zh) * | 2021-09-18 | 2022-07-05 | 广东电网有限责任公司 | 一种配网安健环自动喷漆装置及其使用方法 |
| KR102936519B1 (ko) * | 2021-11-08 | 2026-03-10 | 삼성디스플레이 주식회사 | 마스크 어셈블리 및 이의 수리방법 |
| KR102427524B1 (ko) * | 2021-12-21 | 2022-08-01 | 주식회사 핌스 | Oled 증착용 대면적 마스크 시트 및 마스크 조립체 |
| KR20230096185A (ko) | 2021-12-22 | 2023-06-30 | 삼성디스플레이 주식회사 | 마스크 어셈블리, 이의 수리방법, 및 이의 제조방법 |
| JP2024009519A (ja) | 2022-07-11 | 2024-01-23 | ウシオ電機株式会社 | 蒸着マスク製造方法 |
| KR20240103148A (ko) * | 2022-12-26 | 2024-07-04 | 삼성디스플레이 주식회사 | 마스크 및 그것의 제조 방법 |
| CN120272853B (zh) * | 2025-06-09 | 2025-10-24 | 浙江众凌科技有限公司 | 一种掩膜组件及其制备方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201520349A (zh) * | 2013-10-11 | 2015-06-01 | V Technology Co Ltd | 成膜遮罩及其製造方法 |
| TW201805451A (zh) * | 2016-03-23 | 2018-02-16 | 鴻海精密工業股份有限公司 | 蒸鍍遮罩、蒸鍍遮罩之製造方法及有機半導體元件之製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4439203B2 (ja) * | 2003-05-09 | 2010-03-24 | 大日本印刷株式会社 | 多面付けマスク装置及びその組立方法 |
| JP2009041054A (ja) | 2007-08-07 | 2009-02-26 | Sony Corp | 蒸着用マスクおよびその製造方法ならびに表示装置の製造方法 |
| KR101094822B1 (ko) * | 2009-10-29 | 2011-12-16 | 김주환 | 마스크 용접장치 |
| US9343679B2 (en) * | 2012-01-12 | 2016-05-17 | Dai Nippon Printing Co., Ltd. | Method for producing multiple-surface imposition vapor deposition mask, multiple-surface imposition vapor deposition mask obtained therefrom, and method for producing organic semiconductor element |
| JP6142386B2 (ja) * | 2012-12-21 | 2017-06-07 | 株式会社ブイ・テクノロジー | 蒸着マスクの製造方法 |
| JP6123301B2 (ja) * | 2013-01-11 | 2017-05-10 | 大日本印刷株式会社 | 蒸着マスクの製造方法、金属マスク付き樹脂層、及び有機半導体素子の製造方法 |
| JP6078747B2 (ja) * | 2013-01-28 | 2017-02-15 | 株式会社ブイ・テクノロジー | 蒸着マスクの製造方法及びレーザ加工装置 |
| JP6035548B2 (ja) * | 2013-04-11 | 2016-11-30 | 株式会社ブイ・テクノロジー | 蒸着マスク |
| JP6078818B2 (ja) * | 2013-07-02 | 2017-02-15 | 株式会社ブイ・テクノロジー | 成膜マスク及び成膜マスクの製造方法 |
| KR102130546B1 (ko) * | 2013-10-11 | 2020-07-07 | 삼성디스플레이 주식회사 | 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치 |
| JP6446736B2 (ja) * | 2014-07-14 | 2019-01-09 | 株式会社ブイ・テクノロジー | 成膜方法及び成膜装置 |
-
2016
- 2016-12-13 JP JP2016241333A patent/JP6341434B2/ja not_active Expired - Fee Related
-
2017
- 2017-03-23 CN CN201780018877.5A patent/CN108779550B/zh active Active
- 2017-03-23 KR KR1020187026749A patent/KR101986331B1/ko not_active Expired - Fee Related
- 2017-03-27 TW TW106110080A patent/TWI657156B/zh active
-
2018
- 2018-08-31 US US16/081,828 patent/US10920311B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201520349A (zh) * | 2013-10-11 | 2015-06-01 | V Technology Co Ltd | 成膜遮罩及其製造方法 |
| TW201805451A (zh) * | 2016-03-23 | 2018-02-16 | 鴻海精密工業股份有限公司 | 蒸鍍遮罩、蒸鍍遮罩之製造方法及有機半導體元件之製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200199732A1 (en) | 2020-06-25 |
| CN108779550B (zh) | 2019-07-02 |
| JP2017179591A (ja) | 2017-10-05 |
| TW201802267A (zh) | 2018-01-16 |
| CN108779550A (zh) | 2018-11-09 |
| KR20180112030A (ko) | 2018-10-11 |
| US10920311B2 (en) | 2021-02-16 |
| KR101986331B1 (ko) | 2019-06-05 |
| JP6341434B2 (ja) | 2018-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW201802267A (zh) | 成膜遮罩、其製造方法及成膜遮罩之修補方法 | |
| TWI588276B (zh) | 成膜遮罩之製造方法 | |
| CN105051243B (zh) | 成膜掩模的制造方法 | |
| JP2017179591A5 (enExample) | ||
| TWI611031B (zh) | 成膜罩體及成膜罩體之製造方法 | |
| KR100704688B1 (ko) | 증착용 마스크의 제조방법 및 증착용 마스크 | |
| CN112030102B (zh) | 蒸镀掩模的制造方法 | |
| JP6142194B2 (ja) | 蒸着マスクの製造方法及び蒸着マスク | |
| JP5976527B2 (ja) | 蒸着マスク及びその製造方法 | |
| JP2015074826A (ja) | 成膜マスク及びその製造方法 | |
| JP6357777B2 (ja) | 積層マスクの製造方法 | |
| JP6256000B2 (ja) | 蒸着マスク装置の製造方法 | |
| JP2017210633A (ja) | 蒸着マスクおよびその製造方法 | |
| CN109689922B (zh) | 蒸镀掩模、带框架的蒸镀掩模、蒸镀掩模制备体、蒸镀图案形成方法、有机半导体元件的制造方法、有机el显示装置的制造方法 | |
| JP2015129334A (ja) | 積層マスクの製造方法、積層マスクおよび保護フィルム付き積層マスク | |
| WO2017170172A1 (ja) | 成膜マスク、その製造方法及び成膜マスクのリペア方法 | |
| JP6078746B2 (ja) | 蒸着マスクの製造方法 | |
| JP2015028194A (ja) | 成膜マスクの製造方法、成膜マスク及びタッチパネル基板 | |
| CN112534080B (zh) | 蒸镀掩模的制造方法和有机el显示装置的制造方法 | |
| JP6497596B2 (ja) | 蒸着マスク装置の中間体 |