JP6341434B2 - 成膜マスク、その製造方法及び成膜マスクのリペア方法 - Google Patents

成膜マスク、その製造方法及び成膜マスクのリペア方法 Download PDF

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Publication number
JP6341434B2
JP6341434B2 JP2016241333A JP2016241333A JP6341434B2 JP 6341434 B2 JP6341434 B2 JP 6341434B2 JP 2016241333 A JP2016241333 A JP 2016241333A JP 2016241333 A JP2016241333 A JP 2016241333A JP 6341434 B2 JP6341434 B2 JP 6341434B2
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JP
Japan
Prior art keywords
mask
metal layer
film
mask sheet
support member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2016241333A
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English (en)
Japanese (ja)
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JP2017179591A (ja
JP2017179591A5 (enExample
Inventor
修二 工藤
修二 工藤
良 野口
良 野口
齋藤 雄二
雄二 齋藤
智華 韓
智華 韓
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V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to PCT/JP2017/011844 priority Critical patent/WO2017170172A1/ja
Priority to KR1020187026749A priority patent/KR101986331B1/ko
Priority to CN201780018877.5A priority patent/CN108779550B/zh
Priority to TW106110080A priority patent/TWI657156B/zh
Publication of JP2017179591A publication Critical patent/JP2017179591A/ja
Publication of JP2017179591A5 publication Critical patent/JP2017179591A5/ja
Application granted granted Critical
Publication of JP6341434B2 publication Critical patent/JP6341434B2/ja
Priority to US16/081,828 priority patent/US10920311B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K11/00Resistance welding; Severing by resistance heating
    • B23K11/10Spot welding; Stitch welding
    • B23K11/11Spot welding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • B23K26/21Bonding by welding
    • B23K26/22Spot welding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laser Beam Processing (AREA)
JP2016241333A 2016-03-29 2016-12-13 成膜マスク、その製造方法及び成膜マスクのリペア方法 Expired - Fee Related JP6341434B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PCT/JP2017/011844 WO2017170172A1 (ja) 2016-03-29 2017-03-23 成膜マスク、その製造方法及び成膜マスクのリペア方法
KR1020187026749A KR101986331B1 (ko) 2016-03-29 2017-03-23 성막 마스크, 그 제조 방법 및 성막 마스크의 리페어 방법
CN201780018877.5A CN108779550B (zh) 2016-03-29 2017-03-23 成膜掩模、其制造方法及成膜掩模的修复方法
TW106110080A TWI657156B (zh) 2016-03-29 2017-03-27 成膜遮罩、其製造方法及成膜遮罩之修補方法
US16/081,828 US10920311B2 (en) 2016-03-29 2018-08-31 Deposition mask, method for manufacturing the same, and method for repairing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016066678 2016-03-29
JP2016066678 2016-03-29

Publications (3)

Publication Number Publication Date
JP2017179591A JP2017179591A (ja) 2017-10-05
JP2017179591A5 JP2017179591A5 (enExample) 2018-02-01
JP6341434B2 true JP6341434B2 (ja) 2018-06-13

Family

ID=60005018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016241333A Expired - Fee Related JP6341434B2 (ja) 2016-03-29 2016-12-13 成膜マスク、その製造方法及び成膜マスクのリペア方法

Country Status (5)

Country Link
US (1) US10920311B2 (enExample)
JP (1) JP6341434B2 (enExample)
KR (1) KR101986331B1 (enExample)
CN (1) CN108779550B (enExample)
TW (1) TWI657156B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12058923B2 (en) 2020-09-18 2024-08-06 Samsung Display Co., Ltd. Mask repairing apparatus and mask repairing method using the same
US12577649B2 (en) 2021-12-22 2026-03-17 Samsung Display Co., Ltd. Mask assembly, method of repairing the same, and method of manufacturing the same

Families Citing this family (24)

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CN113737128A (zh) 2017-01-31 2021-12-03 堺显示器制品株式会社 蒸镀掩模、蒸镀掩模及有机半导体元件的制造方法
WO2019186720A1 (ja) * 2018-03-27 2019-10-03 シャープ株式会社 表示デバイスの製造方法、及び表示デバイス
JP6588125B2 (ja) * 2018-04-26 2019-10-09 堺ディスプレイプロダクト株式会社 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法
TWI773911B (zh) * 2018-08-10 2022-08-11 日商大日本印刷股份有限公司 蒸鍍罩、蒸鍍罩裝置、蒸鍍罩之製造方法、蒸鍍罩裝置之製造方法及蒸鍍方法
KR102236542B1 (ko) * 2018-12-03 2021-04-06 주식회사 오럼머티리얼 마스크 지지 템플릿, 마스크 금속막 지지 템플릿, 마스크 지지 템플릿의 제조 방법 및 프레임 일체형 마스크의 제조 방법
KR102800982B1 (ko) * 2019-01-07 2025-04-30 삼성디스플레이 주식회사 마스크 조립체
KR102837467B1 (ko) 2019-02-06 2025-07-24 다이니폰 인사츠 가부시키가이샤 증착 마스크 장치, 마스크 지지 기구 및 증착 마스크 장치의 제조 방법
CN110079762B (zh) * 2019-04-11 2021-06-01 Tcl华星光电技术有限公司 掩膜板及蒸镀oled器件的方法
KR102852453B1 (ko) * 2019-07-02 2025-08-29 삼성디스플레이 주식회사 증착용 마스크 및 그 제조방법
KR102009714B1 (ko) * 2019-07-15 2019-08-13 (주)세우인코퍼레이션 초미세 와이어를 이용한 다중 다각망 구조의 네트 마스크 제조방법
JP7113861B2 (ja) * 2020-03-13 2022-08-05 キヤノントッキ株式会社 マスク取付装置、成膜装置、マスク取付方法、成膜方法、電子デバイスの製造方法
KR20220004880A (ko) * 2020-07-03 2022-01-12 삼성디스플레이 주식회사 마스크 어셈블리 및 이를 포함하는 증착 설비
JP2022067159A (ja) * 2020-10-20 2022-05-06 株式会社ジャパンディスプレイ 蒸着マスクユニットとその製造方法
KR20220068327A (ko) 2020-11-18 2022-05-26 삼성디스플레이 주식회사 마스크 어셈블리 및 그 마스크 어셈블리의 제조 방법
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치
KR20220113588A (ko) * 2021-02-05 2022-08-16 삼성디스플레이 주식회사 마스크 및 이의 제조 방법
KR102912257B1 (ko) * 2021-07-20 2026-01-14 주식회사 선익시스템 섀도우 마스크의 제조 방법
KR102810615B1 (ko) * 2021-08-25 2025-05-22 주식회사 킵스바이오파마 디스플레이 패널용 증착 마스크 프레임 어셈블리 제조방법
CN113714004B (zh) * 2021-09-18 2022-07-05 广东电网有限责任公司 一种配网安健环自动喷漆装置及其使用方法
KR102936519B1 (ko) * 2021-11-08 2026-03-10 삼성디스플레이 주식회사 마스크 어셈블리 및 이의 수리방법
KR102427524B1 (ko) * 2021-12-21 2022-08-01 주식회사 핌스 Oled 증착용 대면적 마스크 시트 및 마스크 조립체
JP2024009519A (ja) 2022-07-11 2024-01-23 ウシオ電機株式会社 蒸着マスク製造方法
KR20240103148A (ko) * 2022-12-26 2024-07-04 삼성디스플레이 주식회사 마스크 및 그것의 제조 방법
CN120272853B (zh) * 2025-06-09 2025-10-24 浙江众凌科技有限公司 一种掩膜组件及其制备方法

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JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
JP2009041054A (ja) 2007-08-07 2009-02-26 Sony Corp 蒸着用マスクおよびその製造方法ならびに表示装置の製造方法
KR101094822B1 (ko) * 2009-10-29 2011-12-16 김주환 마스크 용접장치
US9343679B2 (en) * 2012-01-12 2016-05-17 Dai Nippon Printing Co., Ltd. Method for producing multiple-surface imposition vapor deposition mask, multiple-surface imposition vapor deposition mask obtained therefrom, and method for producing organic semiconductor element
JP6142386B2 (ja) * 2012-12-21 2017-06-07 株式会社ブイ・テクノロジー 蒸着マスクの製造方法
JP6123301B2 (ja) * 2013-01-11 2017-05-10 大日本印刷株式会社 蒸着マスクの製造方法、金属マスク付き樹脂層、及び有機半導体素子の製造方法
JP6078747B2 (ja) * 2013-01-28 2017-02-15 株式会社ブイ・テクノロジー 蒸着マスクの製造方法及びレーザ加工装置
JP6035548B2 (ja) * 2013-04-11 2016-11-30 株式会社ブイ・テクノロジー 蒸着マスク
JP6078818B2 (ja) * 2013-07-02 2017-02-15 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
KR102130546B1 (ko) * 2013-10-11 2020-07-07 삼성디스플레이 주식회사 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치
JP2015074826A (ja) * 2013-10-11 2015-04-20 株式会社ブイ・テクノロジー 成膜マスク及びその製造方法
JP6446736B2 (ja) * 2014-07-14 2019-01-09 株式会社ブイ・テクノロジー 成膜方法及び成膜装置
CN108779553B (zh) * 2016-03-23 2021-04-06 鸿海精密工业股份有限公司 蒸镀掩膜及其制造方法、有机半导体元件的制造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12058923B2 (en) 2020-09-18 2024-08-06 Samsung Display Co., Ltd. Mask repairing apparatus and mask repairing method using the same
US12577649B2 (en) 2021-12-22 2026-03-17 Samsung Display Co., Ltd. Mask assembly, method of repairing the same, and method of manufacturing the same

Also Published As

Publication number Publication date
US20200199732A1 (en) 2020-06-25
CN108779550B (zh) 2019-07-02
JP2017179591A (ja) 2017-10-05
TW201802267A (zh) 2018-01-16
CN108779550A (zh) 2018-11-09
KR20180112030A (ko) 2018-10-11
US10920311B2 (en) 2021-02-16
TWI657156B (zh) 2019-04-21
KR101986331B1 (ko) 2019-06-05

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