TWI645759B - 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板 - Google Patents

印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板 Download PDF

Info

Publication number
TWI645759B
TWI645759B TW105140617A TW105140617A TWI645759B TW I645759 B TWI645759 B TW I645759B TW 105140617 A TW105140617 A TW 105140617A TW 105140617 A TW105140617 A TW 105140617A TW I645759 B TWI645759 B TW I645759B
Authority
TW
Taiwan
Prior art keywords
copper foil
printed wiring
wiring board
coupling agent
roughened
Prior art date
Application number
TW105140617A
Other languages
English (en)
Chinese (zh)
Other versions
TW201735754A (zh
Inventor
齋藤貴広
繪面健
Original Assignee
古河電氣工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 古河電氣工業股份有限公司 filed Critical 古河電氣工業股份有限公司
Publication of TW201735754A publication Critical patent/TW201735754A/zh
Application granted granted Critical
Publication of TWI645759B publication Critical patent/TWI645759B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
TW105140617A 2015-12-09 2016-12-08 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板 TWI645759B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015240007A JP6294862B2 (ja) 2015-12-09 2015-12-09 プリント配線板用表面処理銅箔、プリント配線板用銅張積層板及びプリント配線板
JPJP2015-240007 2015-12-09

Publications (2)

Publication Number Publication Date
TW201735754A TW201735754A (zh) 2017-10-01
TWI645759B true TWI645759B (zh) 2018-12-21

Family

ID=59013245

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105140617A TWI645759B (zh) 2015-12-09 2016-12-08 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板

Country Status (5)

Country Link
JP (1) JP6294862B2 (ko)
KR (1) KR102054281B1 (ko)
CN (1) CN107109679B (ko)
TW (1) TWI645759B (ko)
WO (1) WO2017099093A1 (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7492807B2 (ja) * 2016-12-06 2024-05-30 Jx金属株式会社 表面処理銅箔、キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法
JP7492808B2 (ja) * 2017-03-31 2024-05-30 Jx金属株式会社 表面処理銅箔、樹脂層付き表面処理銅箔、キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法
KR102340473B1 (ko) * 2017-04-25 2021-12-16 후루카와 덴키 고교 가부시키가이샤 표면 처리 동박
JP6965660B2 (ja) * 2017-09-26 2021-11-10 昭和電工マテリアルズ株式会社 表面状態の数値化方法、接合特性の評価方法及び接合体の製造方法
JP7040056B2 (ja) * 2017-09-28 2022-03-23 株式会社Gsユアサ 鉛蓄電池
WO2019111914A1 (ja) * 2017-12-05 2019-06-13 古河電気工業株式会社 表面処理銅箔、並びにこれを用いた銅張積層板及びプリント配線板
JP6413039B1 (ja) * 2018-03-29 2018-10-24 Jx金属株式会社 表面処理銅箔及び銅張積層板
JP7251928B2 (ja) * 2018-06-05 2023-04-04 Jx金属株式会社 表面処理銅箔、銅張積層板及びプリント配線板
TWI656682B (zh) * 2018-10-16 2019-04-11 長春石油化學股份有限公司 電解銅箔、包含其的電極、及包含其的鋰離子電池
US11365486B2 (en) 2018-10-16 2022-06-21 Chang Chun Petrochemical Co., Ltd. Electrolytic copper foil, electrode comprising the same, and lithium ion battery comprising the same
JP7463831B2 (ja) 2019-05-13 2024-04-09 大日本印刷株式会社 積層体
CN110344105B (zh) * 2019-08-05 2020-10-09 中色奥博特铜铝业有限公司 一种压延铜箔的双面表面处理方法
LU101698B1 (en) 2020-03-18 2021-09-20 Circuit Foil Luxembourg Surface-treated copper foil for high-frequency circuit and method for producing same
CN111364032A (zh) * 2020-04-22 2020-07-03 山东金宝电子股份有限公司 一种高频高速覆铜板用铜箔的表面处理剂
CN111640845A (zh) * 2020-05-29 2020-09-08 旭宇光电(深圳)股份有限公司 深紫外led光源及其封装方法
CN113099605B (zh) * 2021-06-08 2022-07-12 广州方邦电子股份有限公司 金属箔、带载体金属箔、覆铜层叠板及印刷线路板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200404920A (en) * 2002-06-04 2004-04-01 Mitsui Mining & Smelting Co Surface-treated copper foil for low dielectric substrate, and copper clad laminate and printed wiring board both using the same
TW201524279A (zh) * 2013-09-20 2015-06-16 Mitsui Mining & Smelting Co 銅箔、具有載子箔的銅箔以及覆銅層積板

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833556A (ko) 1971-09-03 1973-05-11
US4185781A (en) 1978-01-16 1980-01-29 Spraying Systems Co. Quick-disconnect nozzle connection
CN1301046C (zh) 2002-05-13 2007-02-14 三井金属鉱业株式会社 膜上芯片用软性印刷线路板
JP4570070B2 (ja) * 2004-03-16 2010-10-27 三井金属鉱業株式会社 絶縁層形成用の樹脂層を備えたキャリア箔付電解銅箔、銅張積層板、プリント配線板、多層銅張積層板の製造方法及びプリント配線板の製造方法
JP5889443B2 (ja) * 2013-08-01 2016-03-22 古河電気工業株式会社 プリント配線基板用銅箔
JP6343204B2 (ja) * 2013-08-20 2018-06-13 Jx金属株式会社 表面処理銅箔及びそれを用いたキャリア付銅箔、積層板、プリント配線板、電子機器、並びに、プリント配線板の製造方法
JP2015061757A (ja) * 2013-08-21 2015-04-02 Jx日鉱日石金属株式会社 キャリア付銅箔及びそれを用いた積層板、プリント配線板、電子機器、並びに、プリント配線板の製造方法
JP5710737B1 (ja) * 2013-11-29 2015-04-30 Jx日鉱日石金属株式会社 表面処理銅箔、積層板、プリント配線板、プリント回路板及び電子機器
CN105814242B (zh) * 2013-12-10 2018-08-10 Jx金属株式会社 表面处理铜箔、覆铜积层板、印刷配线板、电子机器及印刷配线板的制造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200404920A (en) * 2002-06-04 2004-04-01 Mitsui Mining & Smelting Co Surface-treated copper foil for low dielectric substrate, and copper clad laminate and printed wiring board both using the same
TW201524279A (zh) * 2013-09-20 2015-06-16 Mitsui Mining & Smelting Co 銅箔、具有載子箔的銅箔以及覆銅層積板

Also Published As

Publication number Publication date
JP2017106069A (ja) 2017-06-15
JP6294862B2 (ja) 2018-03-14
TW201735754A (zh) 2017-10-01
KR20180037133A (ko) 2018-04-11
WO2017099093A1 (ja) 2017-06-15
CN107109679A (zh) 2017-08-29
CN107109679B (zh) 2019-10-29
KR102054281B1 (ko) 2019-12-10

Similar Documents

Publication Publication Date Title
TWI645759B (zh) 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板
TWI627307B (zh) 印刷配線板用表面處理銅箔、印刷配線板用覆銅積層板及印刷配線板
JP5871426B2 (ja) 高周波伝送用表面処理銅箔、高周波伝送用積層板及び高周波伝送用プリント配線板
TWI565833B (zh) Surface treatment copper foil, copper laminated board, printed wiring board, printed circuit boards, and electronic equipment
JP5764700B2 (ja) 高周波基板用銅張り積層板及び表面処理銅箔
JP5417538B1 (ja) 表面処理銅箔及びそれを用いた積層板、プリント配線板、電子機器、並びに、プリント配線板の製造方法
WO2013108414A1 (ja) 銅張積層板用表面処理銅箔及びそれを用いた銅張積層板
JP5475897B1 (ja) 表面処理銅箔及びそれを用いた積層板、銅箔、プリント配線板、電子機器、並びに、プリント配線板の製造方法
TWI610803B (zh) 表面處理銅箔
JP5706026B1 (ja) 配線板用銅箔及び配線板
TW201800242A (zh) 表面處理銅箔及使用其製成的覆銅積層板
CN107109663B (zh) 高频信号传输电路形成用表面处理铜箔、覆铜层压板及印刷线路板
KR20190049818A (ko) 구리박 및 이것을 갖는 동장 적층판
TWI751359B (zh) 表面處理銅箔、以及使用其之覆銅積層板及印刷配線板
TWI773219B (zh) 印刷配線板用表面處理銅箔、及使用其的印刷配線板用覆銅層壓板及印刷配線板
JP6379055B2 (ja) 表面処理銅箔及び積層板
JP6081883B2 (ja) 銅箔及びそれを用いた積層板、電子機器の製造方法、並びに、プリント配線板の製造方法
KR20230095677A (ko) 내열성을 가지는 표면처리동박, 이를 포함하는 동박적층판 및 프린트 배선판
JP2014148747A (ja) 表面処理銅箔及びそれを用いた積層板、プリント配線板、電子機器、並びに、プリント配線板の製造方法