TWI620339B - 高速光偵測器 - Google Patents

高速光偵測器 Download PDF

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Publication number
TWI620339B
TWI620339B TW103119120A TW103119120A TWI620339B TW I620339 B TWI620339 B TW I620339B TW 103119120 A TW103119120 A TW 103119120A TW 103119120 A TW103119120 A TW 103119120A TW I620339 B TWI620339 B TW I620339B
Authority
TW
Taiwan
Prior art keywords
layer
photodetector
band gap
semiconductor material
gap energy
Prior art date
Application number
TW103119120A
Other languages
English (en)
Chinese (zh)
Other versions
TW201507187A (zh
Inventor
馬瑞克 葛茲格羅 查辛斯基
尼可拉 潘塔茲 契塔卡
Original Assignee
梅爾那斯科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 梅爾那斯科技有限公司 filed Critical 梅爾那斯科技有限公司
Publication of TW201507187A publication Critical patent/TW201507187A/zh
Application granted granted Critical
Publication of TWI620339B publication Critical patent/TWI620339B/zh

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/223Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/124Active materials comprising only Group III-V materials, e.g. GaAs
    • H10F77/1243Active materials comprising only Group III-V materials, e.g. GaAs characterised by the dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/124Active materials comprising only Group III-V materials, e.g. GaAs
    • H10F77/1248Active materials comprising only Group III-V materials, e.g. GaAs having three or more elements, e.g. GaAlAs, InGaAs or InGaAsP

Landscapes

  • Light Receiving Elements (AREA)
TW103119120A 2013-05-31 2014-05-30 高速光偵測器 TWI620339B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13002838.4A EP2808908B1 (en) 2013-05-31 2013-05-31 High-speed photodetector
??13002838.4 2013-05-31

Publications (2)

Publication Number Publication Date
TW201507187A TW201507187A (zh) 2015-02-16
TWI620339B true TWI620339B (zh) 2018-04-01

Family

ID=48538955

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103119120A TWI620339B (zh) 2013-05-31 2014-05-30 高速光偵測器

Country Status (7)

Country Link
US (1) US9882080B2 (enExample)
EP (1) EP2808908B1 (enExample)
JP (1) JP6466416B2 (enExample)
CN (1) CN105283964B (enExample)
SG (1) SG11201508462PA (enExample)
TW (1) TWI620339B (enExample)
WO (1) WO2014191275A1 (enExample)

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EP3329518A1 (en) * 2015-07-28 2018-06-06 University Of Rochester Low dark current, resonant cavity-enhanced infrared photodetectors
JP6880601B2 (ja) * 2016-08-22 2021-06-02 富士通株式会社 光検出器及び撮像装置
US10396527B2 (en) * 2017-06-14 2019-08-27 Mellanox Technologies, Ltd. Vertical-cavity surface-emitting laser with high modulation speed
US10490687B2 (en) 2018-01-29 2019-11-26 Waymo Llc Controlling detection time in photodetectors
CN109244152B (zh) * 2018-08-02 2023-09-29 芯思杰技术(深圳)股份有限公司 一种短距离通信高速光电二极管芯片及其制作方法
UA120025C2 (uk) * 2019-03-26 2019-09-10 Андрій Дмитрович Хворостяний Напівпровідниковий термоелектричний генератор
TWI835924B (zh) * 2019-11-18 2024-03-21 晶元光電股份有限公司 光偵測元件
CN112420859B (zh) * 2020-11-18 2022-05-13 上海科技大学 850nm波段吸收区部分耗尽光电探测器及其制备方法
CN114520270B (zh) * 2020-11-20 2024-07-05 苏州华太电子技术股份有限公司 一种间接带隙半导体光电探测器件及其制作方法
CN114864730B (zh) * 2021-02-04 2024-12-27 迈络思科技有限公司 高调制速度pin型光电二极管
US12278304B2 (en) 2021-02-04 2025-04-15 Mellanox Technologies, Ltd. High modulation speed PIN-type photodiode
US20230299223A1 (en) * 2022-03-16 2023-09-21 Sensors Unlimited, Inc. Photodiode structures
US20230375729A1 (en) * 2022-05-20 2023-11-23 Redlen Technologies, Inc. Radiation detector having asymmetric contacts
WO2025238716A1 (ja) * 2024-05-14 2025-11-20 Ntt株式会社 受光素子
CN118825104A (zh) * 2024-06-21 2024-10-22 中国电子科技集团公司第十一研究所 一种高性能铟镓砷红外探测器结构
CN119947336A (zh) * 2025-01-20 2025-05-06 隆基绿能科技股份有限公司 一种太阳能电池片以及光伏组件

Citations (2)

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TW200903819A (en) * 2007-04-13 2009-01-16 Semiconductor Energy Lab Photovoltaic device and method for manufacturing the same
US20110100441A1 (en) * 2008-02-01 2011-05-05 President & Fellows Of Harvard College Multijunction photovoltaic device

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GB2256746B (en) * 1991-06-12 1995-05-03 Marconi Gec Ltd Semiconductor devices
US5576559A (en) * 1994-11-01 1996-11-19 Intevac, Inc. Heterojunction electron transfer device
US5818096A (en) 1996-04-05 1998-10-06 Nippon Telegraph And Telephone Corp. Pin photodiode with improved frequency response and saturation output
JP2000223736A (ja) * 1999-01-28 2000-08-11 Nippon Telegr & Teleph Corp <Ntt> 金属−半導体−金属型受光素子
US7202102B2 (en) 2001-11-27 2007-04-10 Jds Uniphase Corporation Doped absorption for enhanced responsivity for high speed photodiodes
JP2003174185A (ja) * 2001-12-05 2003-06-20 Fujitsu Ltd 半導体受光素子
CA2474556C (en) 2002-02-01 2014-10-07 Picometrix, Inc. Enhanced photodetector
JP4030847B2 (ja) * 2002-09-20 2008-01-09 ユーディナデバイス株式会社 半導体受光装置
US6740908B1 (en) * 2003-03-18 2004-05-25 Agilent Technologies, Inc. Extended drift heterostructure photodiode having enhanced electron response
JP2006229156A (ja) * 2005-02-21 2006-08-31 Ntt Electornics Corp フォトダイオード
JP2011176094A (ja) * 2010-02-24 2011-09-08 Nippon Telegr & Teleph Corp <Ntt> フォトダイオード
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TW200903819A (en) * 2007-04-13 2009-01-16 Semiconductor Energy Lab Photovoltaic device and method for manufacturing the same
US20110100441A1 (en) * 2008-02-01 2011-05-05 President & Fellows Of Harvard College Multijunction photovoltaic device

Also Published As

Publication number Publication date
US9882080B2 (en) 2018-01-30
US20160172523A1 (en) 2016-06-16
CN105283964B (zh) 2018-04-13
TW201507187A (zh) 2015-02-16
CN105283964A (zh) 2016-01-27
JP2016522578A (ja) 2016-07-28
EP2808908A1 (en) 2014-12-03
EP2808908B1 (en) 2023-04-19
JP6466416B2 (ja) 2019-02-06
WO2014191275A1 (en) 2014-12-04
SG11201508462PA (en) 2015-11-27

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