TWI604918B - 薄板狀工件之研磨方法及雙面平面磨床 - Google Patents
薄板狀工件之研磨方法及雙面平面磨床 Download PDFInfo
- Publication number
- TWI604918B TWI604918B TW101124333A TW101124333A TWI604918B TW I604918 B TWI604918 B TW I604918B TW 101124333 A TW101124333 A TW 101124333A TW 101124333 A TW101124333 A TW 101124333A TW I604918 B TWI604918 B TW I604918B
- Authority
- TW
- Taiwan
- Prior art keywords
- carrier
- static pressure
- carrier ring
- static
- workpiece
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 29
- 230000003068 static effect Effects 0.000 claims description 159
- 238000007667 floating Methods 0.000 claims description 71
- 230000002706 hydrostatic effect Effects 0.000 claims description 43
- 230000007246 mechanism Effects 0.000 claims description 43
- 230000002093 peripheral effect Effects 0.000 claims description 34
- 238000005498 polishing Methods 0.000 claims description 25
- 239000012530 fluid Substances 0.000 claims description 21
- 238000005259 measurement Methods 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012050 conventional carrier Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/10—Single-purpose machines or devices
- B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
- B24B7/17—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011152022A JP5627114B2 (ja) | 2011-07-08 | 2011-07-08 | 薄板状ワークの研削方法及び両頭平面研削盤 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201313386A TW201313386A (zh) | 2013-04-01 |
| TWI604918B true TWI604918B (zh) | 2017-11-11 |
Family
ID=46507898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101124333A TWI604918B (zh) | 2011-07-08 | 2012-07-06 | 薄板狀工件之研磨方法及雙面平面磨床 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2543475B1 (enExample) |
| JP (1) | JP5627114B2 (enExample) |
| KR (1) | KR101911553B1 (enExample) |
| SG (1) | SG187316A1 (enExample) |
| TW (1) | TWI604918B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5724958B2 (ja) * | 2012-07-03 | 2015-05-27 | 信越半導体株式会社 | 両頭研削装置及びワークの両頭研削方法 |
| CN104259984A (zh) * | 2014-09-18 | 2015-01-07 | 洛阳巨优机床有限公司 | 一种往复式双端面磨床往复送料板一浮一定式装置 |
| CN104369058A (zh) * | 2014-11-27 | 2015-02-25 | 石家庄轴设机电设备有限公司 | 滚子双端面磨床支撑及其使用方法 |
| CN115741453B (zh) * | 2022-11-30 | 2024-02-27 | 大连理工大学 | 一种多传感器融合的智能双面研磨机 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3431681A (en) * | 1965-07-23 | 1969-03-11 | Landis Tool Co | Work support shoe assembly |
| JP3673904B2 (ja) | 1996-12-03 | 2005-07-20 | 光洋機械工業株式会社 | 薄板円板状ワークの両面研削装置 |
| JP3702379B2 (ja) | 1996-12-13 | 2005-10-05 | 光洋機械工業株式会社 | 薄板円板状ワークの両面研削装置 |
| JP2002036078A (ja) * | 2001-06-25 | 2002-02-05 | Koyo Mach Ind Co Ltd | 薄板円板状ワークの両面研削装置 |
| JP3993856B2 (ja) * | 2004-01-22 | 2007-10-17 | 光洋機械工業株式会社 | 両頭平面研削装置 |
| JP4143563B2 (ja) * | 2004-03-16 | 2008-09-03 | 住友重機械工業株式会社 | ワーク保持装置及び両面加工装置 |
| JP4780142B2 (ja) * | 2008-05-22 | 2011-09-28 | 信越半導体株式会社 | ウェーハの製造方法 |
| JP2010042488A (ja) * | 2008-08-15 | 2010-02-25 | Mori Seiki Co Ltd | ワーク受け及びこれを備えた研削盤 |
-
2011
- 2011-07-08 JP JP2011152022A patent/JP5627114B2/ja active Active
-
2012
- 2012-06-22 SG SG2012046975A patent/SG187316A1/en unknown
- 2012-06-27 KR KR1020120069087A patent/KR101911553B1/ko active Active
- 2012-07-06 EP EP12175279.4A patent/EP2543475B1/en active Active
- 2012-07-06 TW TW101124333A patent/TWI604918B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2543475A3 (en) | 2017-01-04 |
| KR101911553B1 (ko) | 2018-10-24 |
| JP5627114B2 (ja) | 2014-11-19 |
| KR20130006303A (ko) | 2013-01-16 |
| JP2013018065A (ja) | 2013-01-31 |
| EP2543475B1 (en) | 2019-03-27 |
| EP2543475A2 (en) | 2013-01-09 |
| TW201313386A (zh) | 2013-04-01 |
| SG187316A1 (en) | 2013-02-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI604918B (zh) | 薄板狀工件之研磨方法及雙面平面磨床 | |
| KR101810331B1 (ko) | 연마 장치 | |
| EP1616662B1 (en) | Both side grinding method and both side grinder of thin disc-like work | |
| JP5612936B2 (ja) | センターレス研削盤 | |
| JP3969956B2 (ja) | 両面同時研削方法および両面同時研削盤並びに両面同時ラップ方法および両面同時ラップ盤 | |
| JP3993856B2 (ja) | 両頭平面研削装置 | |
| CN103962939A (zh) | 研磨装置及研磨方法 | |
| KR20130084861A (ko) | 차량용 브레이크 디스크의 측정장치 | |
| JPH10230451A (ja) | 研磨装置及びワーク測定方法 | |
| JP2015051478A (ja) | 計測装置及びその計測装置を備えた研削盤 | |
| JP4414449B2 (ja) | 平面研削盤、スピンドル装置及び平面研削方法 | |
| TWI808215B (zh) | 研磨裝置及研磨方法 | |
| JP2016535683A (ja) | 工具研削盤のスピンドル | |
| JP2015150638A (ja) | 円すいころの研削装置及び円すいころの研削方法 | |
| KR20220121890A (ko) | 워크의 양면 연마 장치 | |
| KR101993533B1 (ko) | 저널 표면 가공장치 | |
| KR101537074B1 (ko) | 복수의 가공부를 구비한 베어링 가공장치 | |
| JP7068849B2 (ja) | 研削装置 | |
| JP5344851B2 (ja) | 簡易回転伝達ユニットおよび研削盤 | |
| JP4289764B2 (ja) | テープ研磨装置 | |
| TWI224037B (en) | Grinder structure for wafer | |
| JP2012179692A (ja) | 加工液供給装置 | |
| JP6777530B2 (ja) | 研磨方法 | |
| JP2000263428A (ja) | 枚葉式両面ラップ盤 | |
| JPH1148135A (ja) | 研磨装置および研磨方法 |