KR101911553B1 - 박판형 워크의 연삭 방법 및 양두 평면 연삭기 - Google Patents
박판형 워크의 연삭 방법 및 양두 평면 연삭기 Download PDFInfo
- Publication number
- KR101911553B1 KR101911553B1 KR1020120069087A KR20120069087A KR101911553B1 KR 101911553 B1 KR101911553 B1 KR 101911553B1 KR 1020120069087 A KR1020120069087 A KR 1020120069087A KR 20120069087 A KR20120069087 A KR 20120069087A KR 101911553 B1 KR101911553 B1 KR 101911553B1
- Authority
- KR
- South Korea
- Prior art keywords
- carrier
- static pressure
- static
- pressure
- carrier ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/10—Single-purpose machines or devices
- B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
- B24B7/17—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2011-152022 | 2011-07-08 | ||
| JP2011152022A JP5627114B2 (ja) | 2011-07-08 | 2011-07-08 | 薄板状ワークの研削方法及び両頭平面研削盤 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130006303A KR20130006303A (ko) | 2013-01-16 |
| KR101911553B1 true KR101911553B1 (ko) | 2018-10-24 |
Family
ID=46507898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020120069087A Active KR101911553B1 (ko) | 2011-07-08 | 2012-06-27 | 박판형 워크의 연삭 방법 및 양두 평면 연삭기 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2543475B1 (enExample) |
| JP (1) | JP5627114B2 (enExample) |
| KR (1) | KR101911553B1 (enExample) |
| SG (1) | SG187316A1 (enExample) |
| TW (1) | TWI604918B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5724958B2 (ja) * | 2012-07-03 | 2015-05-27 | 信越半導体株式会社 | 両頭研削装置及びワークの両頭研削方法 |
| CN104259984A (zh) * | 2014-09-18 | 2015-01-07 | 洛阳巨优机床有限公司 | 一种往复式双端面磨床往复送料板一浮一定式装置 |
| CN104369058A (zh) * | 2014-11-27 | 2015-02-25 | 石家庄轴设机电设备有限公司 | 滚子双端面磨床支撑及其使用方法 |
| CN115741453B (zh) * | 2022-11-30 | 2024-02-27 | 大连理工大学 | 一种多传感器融合的智能双面研磨机 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009279704A (ja) * | 2008-05-22 | 2009-12-03 | Shin Etsu Handotai Co Ltd | 両頭研削装置及びウェーハの製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3431681A (en) * | 1965-07-23 | 1969-03-11 | Landis Tool Co | Work support shoe assembly |
| JP3673904B2 (ja) | 1996-12-03 | 2005-07-20 | 光洋機械工業株式会社 | 薄板円板状ワークの両面研削装置 |
| JP3702379B2 (ja) | 1996-12-13 | 2005-10-05 | 光洋機械工業株式会社 | 薄板円板状ワークの両面研削装置 |
| JP2002036078A (ja) * | 2001-06-25 | 2002-02-05 | Koyo Mach Ind Co Ltd | 薄板円板状ワークの両面研削装置 |
| JP3993856B2 (ja) * | 2004-01-22 | 2007-10-17 | 光洋機械工業株式会社 | 両頭平面研削装置 |
| JP4143563B2 (ja) * | 2004-03-16 | 2008-09-03 | 住友重機械工業株式会社 | ワーク保持装置及び両面加工装置 |
| JP2010042488A (ja) * | 2008-08-15 | 2010-02-25 | Mori Seiki Co Ltd | ワーク受け及びこれを備えた研削盤 |
-
2011
- 2011-07-08 JP JP2011152022A patent/JP5627114B2/ja active Active
-
2012
- 2012-06-22 SG SG2012046975A patent/SG187316A1/en unknown
- 2012-06-27 KR KR1020120069087A patent/KR101911553B1/ko active Active
- 2012-07-06 EP EP12175279.4A patent/EP2543475B1/en active Active
- 2012-07-06 TW TW101124333A patent/TWI604918B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009279704A (ja) * | 2008-05-22 | 2009-12-03 | Shin Etsu Handotai Co Ltd | 両頭研削装置及びウェーハの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2543475A3 (en) | 2017-01-04 |
| JP5627114B2 (ja) | 2014-11-19 |
| KR20130006303A (ko) | 2013-01-16 |
| JP2013018065A (ja) | 2013-01-31 |
| TWI604918B (zh) | 2017-11-11 |
| EP2543475B1 (en) | 2019-03-27 |
| EP2543475A2 (en) | 2013-01-09 |
| TW201313386A (zh) | 2013-04-01 |
| SG187316A1 (en) | 2013-02-28 |
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