TWI600720B - Organic pigment composition for color filter, its manufacturing method, and color filter - Google Patents

Organic pigment composition for color filter, its manufacturing method, and color filter Download PDF

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Publication number
TWI600720B
TWI600720B TW102108756A TW102108756A TWI600720B TW I600720 B TWI600720 B TW I600720B TW 102108756 A TW102108756 A TW 102108756A TW 102108756 A TW102108756 A TW 102108756A TW I600720 B TWI600720 B TW I600720B
Authority
TW
Taiwan
Prior art keywords
organic pigment
copolymer
color filter
meth
pigment composition
Prior art date
Application number
TW102108756A
Other languages
English (en)
Chinese (zh)
Other versions
TW201348345A (zh
Inventor
Masanori Fujimaki
Masyumi Tokuoka
Skira Kimurs
Yasuhiko Gunji
Ikuro Kiyoto
Katsunori Shimada
Masaharu Takahashi
Original Assignee
Dainippon Ink & Chemicals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink & Chemicals filed Critical Dainippon Ink & Chemicals
Publication of TW201348345A publication Critical patent/TW201348345A/zh
Application granted granted Critical
Publication of TWI600720B publication Critical patent/TWI600720B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006Preparation of organic pigments
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW102108756A 2012-03-28 2013-03-13 Organic pigment composition for color filter, its manufacturing method, and color filter TWI600720B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012073768 2012-03-28

Publications (2)

Publication Number Publication Date
TW201348345A TW201348345A (zh) 2013-12-01
TWI600720B true TWI600720B (zh) 2017-10-01

Family

ID=49363095

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102108756A TWI600720B (zh) 2012-03-28 2013-03-13 Organic pigment composition for color filter, its manufacturing method, and color filter

Country Status (4)

Country Link
JP (3) JP2013228714A (ja)
KR (1) KR101968958B1 (ja)
CN (1) CN103360786B (ja)
TW (1) TWI600720B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017010028A (ja) * 2015-06-22 2017-01-12 Dic株式会社 カラーフィルタ用顔料組成物及びカラーフィルタ
TWI738310B (zh) * 2019-12-09 2021-09-01 日商Dic股份有限公司 濾色器用鹵化鋅酞青素顏料、及濾色器用鹵化鋅酞青素顏料之製造方法
KR20220101044A (ko) 2019-12-09 2022-07-19 디아이씨 가부시끼가이샤 컬러 필터용 할로겐화아연프탈로시아닌 안료 및 컬러 필터용 할로겐화아연프탈로시아닌 안료의 제조 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1768086A (zh) * 2003-02-07 2006-05-03 三菱化学株式会社 着色树脂组合物、滤色器和液晶显示器
TW201041982A (en) * 2009-03-26 2010-12-01 Fujifilm Corp Pigment dispersion, colored curable composition, color filter and method of manufacturing the same

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JPH04220465A (ja) * 1990-12-21 1992-08-11 Nippon Shokubai Co Ltd 表面処理された有機顔料の製造方法
JP3130217B2 (ja) 1994-12-22 2001-01-31 東洋インキ製造株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP3864321B2 (ja) * 1995-08-09 2006-12-27 大日本インキ化学工業株式会社 水性顔料分散体の製造方法、および水性着色剤組成物
JPH09217019A (ja) * 1996-02-13 1997-08-19 Dainippon Ink & Chem Inc 顔料組成物の製造方法及びその方法による顔料組成物を含有する水性着色液
JP2002356602A (ja) * 2000-07-28 2002-12-13 Sekisui Chem Co Ltd 着色樹脂エマルジョン、インクジェット印刷用インク、電着液及びカラーフィルター
JP2003206413A (ja) * 2002-01-10 2003-07-22 Dainippon Ink & Chem Inc 表面処理微細有機顔料及びカラーフィルター
JP4111717B2 (ja) * 2002-01-29 2008-07-02 富士フイルム株式会社 反射型カラーフィルタ及びその製造方法
KR100870020B1 (ko) * 2002-10-04 2008-11-21 삼성전자주식회사 용해 특성을 조절하는 감광성 수지 조성물 및 이를 이용한이층 구조의 패턴 형성 방법
EP1621587A4 (en) * 2003-04-30 2009-07-22 Hitachi Maxell AQUEOUS DISPERSION AND METHOD FOR THE PRODUCTION THEREOF
JP4923495B2 (ja) * 2004-09-29 2012-04-25 住友化学株式会社 着色感光性樹脂組成物
KR101136358B1 (ko) * 2004-12-10 2012-04-18 삼성전자주식회사 컬러필터용 잉크 조성물 및 이를 이용하여 제조된컬러필터 기판, 및 이를 이용한 컬러필터 기판의 제조 방법
KR100984994B1 (ko) * 2007-06-21 2010-10-04 미쓰비시 가가꾸 가부시키가이샤 안료 분산액, 컬러 필터용 착색 조성물, 컬러 필터, 액정 표시 장치 및 유기 el 디스플레이
WO2008156148A1 (ja) * 2007-06-21 2008-12-24 Mitsubishi Chemical Corporation 顔料分散液、カラーフィルタ用着色組成物、カラーフィルタ、液晶表示装置及び有機elディスプレイ
KR101018324B1 (ko) 2008-11-27 2011-03-04 디아이씨 가부시끼가이샤 컬러 필터용 안료 조성물, 그 제조 방법 및 컬러 필터
JP2010235782A (ja) * 2009-03-31 2010-10-21 Dic Corp ポリマー処理顔料およびその製造方法
KR101859710B1 (ko) * 2010-06-08 2018-05-21 토요잉크Sc홀딩스주식회사 칼라 필터용 착색 조성물 및 칼라 필터

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1768086A (zh) * 2003-02-07 2006-05-03 三菱化学株式会社 着色树脂组合物、滤色器和液晶显示器
TW201041982A (en) * 2009-03-26 2010-12-01 Fujifilm Corp Pigment dispersion, colored curable composition, color filter and method of manufacturing the same

Also Published As

Publication number Publication date
KR20130110094A (ko) 2013-10-08
CN103360786B (zh) 2016-12-28
JP2019109548A (ja) 2019-07-04
JP2013228714A (ja) 2013-11-07
TW201348345A (zh) 2013-12-01
JP2017226857A (ja) 2017-12-28
KR101968958B1 (ko) 2019-04-15
JP6536645B2 (ja) 2019-07-03
CN103360786A (zh) 2013-10-23

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