TWI600681B - Diethyl ether compounds and resin compositions having a tau skeleton - Google Patents

Diethyl ether compounds and resin compositions having a tau skeleton Download PDF

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Publication number
TWI600681B
TWI600681B TW102146069A TW102146069A TWI600681B TW I600681 B TWI600681 B TW I600681B TW 102146069 A TW102146069 A TW 102146069A TW 102146069 A TW102146069 A TW 102146069A TW I600681 B TWI600681 B TW I600681B
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TW
Taiwan
Prior art keywords
meth
bis
resin composition
group
compound
Prior art date
Application number
TW102146069A
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English (en)
Chinese (zh)
Other versions
TW201437256A (zh
Inventor
川辺正直
Original Assignee
新日鐵住金化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2012274480A external-priority patent/JP6006631B2/ja
Priority claimed from JP2012274474A external-priority patent/JP5996412B2/ja
Application filed by 新日鐵住金化學股份有限公司 filed Critical 新日鐵住金化學股份有限公司
Publication of TW201437256A publication Critical patent/TW201437256A/zh
Application granted granted Critical
Publication of TWI600681B publication Critical patent/TWI600681B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/602—Dicarboxylic acid esters having at least two carbon-to-carbon double bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/225—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/10—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond
    • C07C67/11—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond being mineral ester groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041—Lenses
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW102146069A 2012-12-17 2013-12-13 Diethyl ether compounds and resin compositions having a tau skeleton TWI600681B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012274480A JP6006631B2 (ja) 2012-12-17 2012-12-17 ビス（メタ）アクリロイル末端ベンジルエーテル化合物を含有する硬化性樹脂組成物及び硬化物
JP2012274474A JP5996412B2 (ja) 2012-12-17 2012-12-17 ビス（メタ）アクリロイル末端ベンジルエーテル化合物及びその製造方法

Publications (2)

Publication Number Publication Date
TW201437256A TW201437256A (zh) 2014-10-01
TWI600681B true TWI600681B (zh) 2017-10-01

Family

ID=50903666

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102146069A TWI600681B (zh) 2012-12-17 2013-12-13 Diethyl ether compounds and resin compositions having a tau skeleton

Country Status (3)

Country Link
KR (1) KR102101873B1 (ko)
CN (1) CN103864586B (ko)
TW (1) TWI600681B (ko)

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TWI524141B (zh) 2014-06-27 2016-03-01 奇美實業股份有限公司 感光性樹脂組成物、保護膜及具有保護膜之元件
TWI524150B (zh) 2014-06-27 2016-03-01 奇美實業股份有限公司 感光性樹脂組成物、保護膜及具有保護膜之元件
CN105061270B (zh) * 2015-09-21 2017-08-01 东莞市贝特利新材料有限公司 一种含多乙氧基双苯硫基芴结构光固化树脂及其制备方法
US10252965B2 (en) * 2015-11-11 2019-04-09 Air Water Inc. Vinylbenzylated phenol compound, method of manufacturing vinylbenzylated phenol compound, activated ester resin, method of manufacturing activated ester resin, thermoset resin composition, hardened material of thermoset resin composition, interlayer insulating material, prepreg, and method of manufacturing prepreg
CN106893092B (zh) * 2015-12-18 2019-02-01 台光电子材料(昆山)有限公司 含芴酚聚苯醚
JP6431999B1 (ja) * 2018-05-22 2018-11-28 デクセリアルズ株式会社 漏油補修材、漏油補修方法、及び、配管
JP2024516247A (ja) * 2021-05-04 2024-04-12 エスエイチピーピー グローバル テクノロジーズ べスローテン フェンノートシャップ キャップドビスフェノールポリエーテルオリゴマーおよび組成物、製造方法、およびそれにより作製される物品
CN116253870A (zh) * 2022-09-09 2023-06-13 西安近代化学研究所 一种端丙烯酸酯基聚缩水甘油醚硝酸酯、制备方法及应用

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JP2575572B2 (ja) * 1992-06-19 1997-01-29 新日本製鐵株式会社 アルカリ現像型感光性カラーフィルター用インク及びそれを用いたカラーフィルター
JP4057704B2 (ja) * 1998-07-10 2008-03-05 本州化学工業株式会社 ９，９−ビス（アルキル置換−４−ヒドロキシフェニル）フルオレン類とその製造方法
JP2000208889A (ja) 1999-01-13 2000-07-28 Toppan Printing Co Ltd 低誘電配線基板用樹脂組成物及びそれを用いた低誘電配線基板
JP2001126534A (ja) 1999-10-28 2001-05-11 Ube Ind Ltd 低誘電率フィルム
JP2002356544A (ja) * 2001-03-30 2002-12-13 Dainippon Ink & Chem Inc 低誘電性電子材料および電子材料用樹脂組成物
JP4121075B2 (ja) * 2002-12-05 2008-07-16 日東電工株式会社 重合性液晶化合物、液晶性組成物、コレステリック液晶組成物、光学フィルム、及び画像表示装置
JP4202171B2 (ja) 2003-03-31 2008-12-24 新日鐵化学株式会社 低誘電性光硬化性樹脂組成物
US7829638B2 (en) * 2005-05-09 2010-11-09 Cheil Industries, Inc. Antireflective hardmask composition and methods for using same
KR100740550B1 (ko) * 2006-02-10 2007-07-18 주식회사 코오롱 수지 블랙 매트릭스용 감광성 수지 조성물
JP2008094987A (ja) 2006-10-13 2008-04-24 Nippon Kayaku Co Ltd 光学材料用高屈折率樹脂組成物およびその硬化物
JP5884258B2 (ja) * 2009-09-18 2016-03-15 Jnc株式会社 液晶配向剤、液晶配向膜、液晶配向膜の製造方法および液晶表示素子

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Kyung Min Lee,et al.,"Journal of Membrane Science",Vol.383,P.254-261.2011/09/02 *

Also Published As

Publication number Publication date
KR20140078552A (ko) 2014-06-25
KR102101873B1 (ko) 2020-04-17
CN103864586B (zh) 2018-01-09
TW201437256A (zh) 2014-10-01
CN103864586A (zh) 2014-06-18

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