CN103864586B - 具有芴骨架的双醚化合物和树脂组合物 - Google Patents

具有芴骨架的双醚化合物和树脂组合物 Download PDF

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Publication number
CN103864586B
CN103864586B CN201310689562.7A CN201310689562A CN103864586B CN 103864586 B CN103864586 B CN 103864586B CN 201310689562 A CN201310689562 A CN 201310689562A CN 103864586 B CN103864586 B CN 103864586B
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methyl
double
resin composition
acryloyl group
ether compound
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Expired - Fee Related
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CN201310689562.7A
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Chinese (zh)
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CN103864586A (zh
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川边正直
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Nippon Steel Chemical and Materials Co Ltd
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Nippon Steel Chemical Co Ltd
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Priority claimed from JP2012274480A external-priority patent/JP6006631B2/ja
Priority claimed from JP2012274474A external-priority patent/JP5996412B2/ja
Application filed by Nippon Steel Chemical Co Ltd filed Critical Nippon Steel Chemical Co Ltd
Publication of CN103864586A publication Critical patent/CN103864586A/zh
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/602Dicarboxylic acid esters having at least two carbon-to-carbon double bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/20Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/225Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/10Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond
    • C07C67/11Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond being mineral ester groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18Fluorenes; Hydrogenated fluorenes

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN201310689562.7A 2012-12-17 2013-12-17 具有芴骨架的双醚化合物和树脂组合物 Expired - Fee Related CN103864586B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012-274480 2012-12-17
JP2012-274474 2012-12-17
JP2012274480A JP6006631B2 (ja) 2012-12-17 2012-12-17 ビス(メタ)アクリロイル末端ベンジルエーテル化合物を含有する硬化性樹脂組成物及び硬化物
JP2012274474A JP5996412B2 (ja) 2012-12-17 2012-12-17 ビス(メタ)アクリロイル末端ベンジルエーテル化合物及びその製造方法

Publications (2)

Publication Number Publication Date
CN103864586A CN103864586A (zh) 2014-06-18
CN103864586B true CN103864586B (zh) 2018-01-09

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CN201310689562.7A Expired - Fee Related CN103864586B (zh) 2012-12-17 2013-12-17 具有芴骨架的双醚化合物和树脂组合物

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Country Link
KR (1) KR102101873B1 (ko)
CN (1) CN103864586B (ko)
TW (1) TWI600681B (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI524141B (zh) 2014-06-27 2016-03-01 奇美實業股份有限公司 感光性樹脂組成物、保護膜及具有保護膜之元件
TWI524150B (zh) 2014-06-27 2016-03-01 奇美實業股份有限公司 感光性樹脂組成物、保護膜及具有保護膜之元件
CN105061270B (zh) * 2015-09-21 2017-08-01 东莞市贝特利新材料有限公司 一种含多乙氧基双苯硫基芴结构光固化树脂及其制备方法
US10252965B2 (en) * 2015-11-11 2019-04-09 Air Water Inc. Vinylbenzylated phenol compound, method of manufacturing vinylbenzylated phenol compound, activated ester resin, method of manufacturing activated ester resin, thermoset resin composition, hardened material of thermoset resin composition, interlayer insulating material, prepreg, and method of manufacturing prepreg
CN106893092B (zh) * 2015-12-18 2019-02-01 台光电子材料(昆山)有限公司 含芴酚聚苯醚
JP6431999B1 (ja) * 2018-05-22 2018-11-28 デクセリアルズ株式会社 漏油補修材、漏油補修方法、及び、配管
JP2024516247A (ja) * 2021-05-04 2024-04-12 エスエイチピーピー グローバル テクノロジーズ べスローテン フェンノートシャップ キャップドビスフェノールポリエーテルオリゴマーおよび組成物、製造方法、およびそれにより作製される物品
CN116253870A (zh) * 2022-09-09 2023-06-13 西安近代化学研究所 一种端丙烯酸酯基聚缩水甘油醚硝酸酯、制备方法及应用

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JP2004182678A (ja) * 2002-12-05 2004-07-02 Nitto Denko Corp 重合性液晶化合物、液晶性組成物、コレステリック液晶組成物、光学フィルム、及び画像表示装置
WO2006121242A1 (en) * 2005-05-09 2006-11-16 Cheil Industries Inc. Antireflective hardmask composition and methods for using same
KR100740550B1 (ko) * 2006-02-10 2007-07-18 주식회사 코오롱 수지 블랙 매트릭스용 감광성 수지 조성물
JP2011237755A (ja) * 2009-09-18 2011-11-24 Jnc Corp 液晶配向剤、液晶配向膜、液晶配向膜の製造方法および液晶表示素子

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JP2575572B2 (ja) * 1992-06-19 1997-01-29 新日本製鐵株式会社 アルカリ現像型感光性カラーフィルター用インク及びそれを用いたカラーフィルター
JP4057704B2 (ja) * 1998-07-10 2008-03-05 本州化学工業株式会社 9,9−ビス(アルキル置換−4−ヒドロキシフェニル)フルオレン類とその製造方法
JP2000208889A (ja) 1999-01-13 2000-07-28 Toppan Printing Co Ltd 低誘電配線基板用樹脂組成物及びそれを用いた低誘電配線基板
JP2001126534A (ja) 1999-10-28 2001-05-11 Ube Ind Ltd 低誘電率フィルム
JP2002356544A (ja) * 2001-03-30 2002-12-13 Dainippon Ink & Chem Inc 低誘電性電子材料および電子材料用樹脂組成物
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JP2008094987A (ja) 2006-10-13 2008-04-24 Nippon Kayaku Co Ltd 光学材料用高屈折率樹脂組成物およびその硬化物

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* Cited by examiner, † Cited by third party
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JP2004182678A (ja) * 2002-12-05 2004-07-02 Nitto Denko Corp 重合性液晶化合物、液晶性組成物、コレステリック液晶組成物、光学フィルム、及び画像表示装置
WO2006121242A1 (en) * 2005-05-09 2006-11-16 Cheil Industries Inc. Antireflective hardmask composition and methods for using same
KR100740550B1 (ko) * 2006-02-10 2007-07-18 주식회사 코오롱 수지 블랙 매트릭스용 감광성 수지 조성물
JP2011237755A (ja) * 2009-09-18 2011-11-24 Jnc Corp 液晶配向剤、液晶配向膜、液晶配向膜の製造方法および液晶表示素子

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Experimental and computational study of complexes between quats and naphthalenophanes;antonella dalla cort et al.,;《Supramolecular Chemistry》;20011231;第13卷;第315页 *

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Publication number Publication date
KR20140078552A (ko) 2014-06-25
KR102101873B1 (ko) 2020-04-17
TWI600681B (zh) 2017-10-01
TW201437256A (zh) 2014-10-01
CN103864586A (zh) 2014-06-18

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Effective date of registration: 20191211

Address after: No.13-1, No.1, No.1, No

Patentee after: NIPPON STEEL & SUMIKIN CHEMICAL Co.,Ltd.

Address before: Tokyo, Japan

Patentee before: NIPPON STEEL & SUMIKIN CHEMICAL Co.,Ltd.

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