TWI600681B - Diethyl ether compounds and resin compositions having a tau skeleton - Google Patents

Diethyl ether compounds and resin compositions having a tau skeleton Download PDF

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TWI600681B
TWI600681B TW102146069A TW102146069A TWI600681B TW I600681 B TWI600681 B TW I600681B TW 102146069 A TW102146069 A TW 102146069A TW 102146069 A TW102146069 A TW 102146069A TW I600681 B TWI600681 B TW I600681B
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川辺正直
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新日鐵住金化學股份有限公司
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
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    • C07C43/02Ethers
    • C07C43/20Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
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    • C07C67/11Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond being mineral ester groups
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    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
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    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18Fluorenes; Hydrogenated fluorenes

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Description

具有茀骨架之二醚化合物及樹脂組成物 Diether compound and resin composition having an anthracene skeleton

本發明係關於具有茀骨架之雙醚化合物,且關於雙(甲基)丙烯酸酯化合物,其製造方法及作為該中間體之芳香族雙鹵甲基化合物,以及含有其之樹脂組成物。 The present invention relates to a bis-ether compound having an anthracene skeleton, a method for producing a bis(meth) acrylate compound, an aromatic dihalomethyl compound as the intermediate, and a resin composition containing the same.

近年來隨著電子機器之小型化的進展,為了達成電子元件的高積體化而進行印刷配線板的多層化,故增加採用交互地形成並層合絕緣層與導電層之所謂的增層工法。此外,對於其中所使用之樹脂絕緣材料,為了降低因資訊的高速處理化和訊號的高頻化所導致之熱損耗,係要求低介電常數。 In recent years, with the progress of miniaturization of electronic equipment, in order to achieve high integration of electronic components, multilayering of printed wiring boards has been carried out, so that a so-called build-up method of alternately forming and laminating insulating layers and conductive layers has been added. . Further, for the resin insulating material used therein, in order to reduce heat loss due to high-speed processing of information and high frequency of signals, a low dielectric constant is required.

光或熱硬化性樹脂組成物,為人所知者有日本特開平6-1938號公報等,但此等並未使介電常數降低至令人滿意之程度。另一方面,作為達成低介電常數之手法,如日本特開2000-208889號公報或日本特開2001-126534號公報所示,為人所知者有充填填充材之方法或是具有空孔之技術,但在封裝的層間絕緣膜的用途中,均 具有可靠度差之缺點。再者,於日本特開2004-300326號公報中,係揭示一種在相對於特定的不飽和化合物(A),含有光聚合性的(甲基)丙烯酸酯(B)、具有環氧基之化合物(C)、及光聚合起始劑或增感劑(D)之光或熱硬化性樹脂組成物中,於硬化後存在作為樹脂之樹脂份的每100g,含有50mmol以上的甲基丙烯醯基之光或熱硬化性樹脂組成物,可同時兼具低介電常數及高可靠度。然而,其並無法滿足近來被逐漸要求之低介電特性。 A light- or thermosetting resin composition is known as Japanese Patent Publication No. 6-1938, but the dielectric constant is not lowered to a satisfactory level. On the other hand, as a method of achieving a low dielectric constant, as disclosed in Japanese Laid-Open Patent Publication No. 2000-208889 or No. 2001-126534, a method of filling a filler or having a hole is known. Technology, but in the use of encapsulated interlayer insulating film, Has the disadvantage of poor reliability. Further, Japanese Laid-Open Patent Publication No. 2004-300326 discloses a compound containing a photopolymerizable (meth) acrylate (B) having an epoxy group with respect to a specific unsaturated compound (A). (C), and a photopolymerization initiator or a sensitizer (D) light or thermosetting resin composition, which contains 50 mmol or more of methacrylonitrile per 100 g of the resin component as a resin after curing. The light or thermosetting resin composition can have both a low dielectric constant and a high reliability. However, it does not satisfy the low dielectric properties that have recently been required.

另一方面,行動電話等所使用之攝像單元,一般是由:CCD(Charge Coupled Device;電荷耦合裝置)影像感測器或CMOS(Complementary Metal-Oxide Semiconductor;互補金屬氧化物半導體)影像感測器等之固體攝像元件,以及成像於固體攝像元件的感光面之透鏡單元所構成。透鏡單元所含有之透鏡,近年來亦採用由便宜且成形性優異之熱或光硬化性樹脂所形成之透鏡。此外,在以攝像用透鏡為中心使用硬化性樹脂組成物之光學物品及光學透鏡中,係要求各種光學特性的提升。列舉出光學特性的提升所要求之特性的例子,例如要求低比重、高透明性、低黃色度、高折射率、高阿貝數(Abbe's Number)、強韌性等之特性的提升。尤其近年來於行動電話等所使用之攝像單元中,因來自框體的薄型化及電池的大容量化之要求,而強烈要求可達到薄型化。為了可達到構成透鏡單元之透鏡的薄層化,必須使光學透鏡材料達到高折射率化。 On the other hand, an imaging unit used in a mobile phone or the like is generally a CCD (Charge Coupled Device) image sensor or a CMOS (Complementary Metal-Oxide Semiconductor) image sensor. A solid-state imaging element, and a lens unit formed on a photosensitive surface of the solid-state imaging element. In recent years, lenses including lenses made of heat or photocurable resin which are inexpensive and excellent in formability have been used as lenses for lenses. In addition, in optical articles and optical lenses in which a curable resin composition is used as a center of an imaging lens, various optical characteristics are required to be improved. Examples of characteristics required for improvement in optical characteristics include, for example, improvement in characteristics such as low specific gravity, high transparency, low yellowness, high refractive index, high Abbe's Number, and toughness. In particular, in an image pickup unit used for a mobile phone or the like in recent years, it is strongly required to be thinner due to the demand for reduction in thickness of the casing and increase in capacity of the battery. In order to achieve thinning of the lens constituting the lens unit, it is necessary to achieve a high refractive index of the optical lens material.

於日本特開2008-94987號公報中,係揭示一種光學材料用高折射率樹脂組成物及其硬化物,該樹脂組成物具有:具有雙酚茀骨架之二官能(甲基)丙烯酸酯化合物、以及具有聯苯骨架之單官能(甲基)丙烯酸酯化合物。然而,由此所得之光學透鏡,並無法滿足近年來因透鏡單元的薄型化所要求之高折射率,此外,關於尺寸穩定性亦不足。 Japanese Laid-Open Patent Publication No. 2008-94987 discloses a high refractive index resin composition for an optical material having a difunctional (meth) acrylate compound having a bisphenol fluorene skeleton, and a cured product thereof. And a monofunctional (meth) acrylate compound having a biphenyl skeleton. However, the optical lens thus obtained cannot satisfy the high refractive index required for the thinning of the lens unit in recent years, and the dimensional stability is also insufficient.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開平6-1938號公報 [Patent Document 1] Japanese Patent Laid-Open No. 6-1938

[專利文獻2]日本特開2000-208889號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2000-208889

[專利文獻3]日本特開2001-126534號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2001-126534

[專利文獻4]日本特開2004-300326號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2004-300326

[專利文獻5]日本特開2008-94987號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2008-94987

本發明在於提供一種可賦予具有高度的介電特性(低介電常數、低介電正切)且具有高玻璃轉移溫度及難燃性之硬化物之雙(甲基)丙烯醯基末端之苄醚化合物。此外,本發明在於提供一種有用於作為雙(甲基)丙烯醯基末端之苄醚化合物的中間體之芳香族雙鹵甲基化合物。此外,本發明在於提供一種含有雙(甲基)丙烯醯基 末端之苄醚化合物之硬化性組成物,以及由該硬化性組成物所得到,並且在電氣及電子產業、宇宙及航太產業等領域中可作為優異的介電材料、絕緣材料、耐熱材料之硬化物及成形體。再者,本發明在於提供一種高折射率性等之光學特性優異,且可賦予高耐熱性及尺寸穩定性之光學構件與光學透鏡。 The present invention provides a bis(methyl) acrylonitrile-terminated benzyl ether capable of imparting a cured product having a high dielectric property (low dielectric constant, low dielectric tangent) and high glass transition temperature and flame retardancy. Compound. Further, the present invention provides an aromatic dihalomethyl compound having an intermediate for a benzyl ether compound as a bis(meth)acryl oxime group. Further, the present invention provides a bis(meth)acryl oxime group A curable composition of a benzyl ether compound at the end, and obtained from the curable composition, and can be used as an excellent dielectric material, insulating material, and heat resistant material in fields such as the electrical and electronic industries, the universe, and the aerospace industry. Hardened material and formed body. Furthermore, the present invention provides an optical member and an optical lens which are excellent in optical characteristics such as high refractive index and which can impart high heat resistance and dimensional stability.

本發明者們係發現到,具有具備較大平面結構及彎曲部位之雙酚茀骨架之雙(甲基)丙烯醯基末端之苄醚化合物,對於解決上述課題為有效,因而完成本發明。 The inventors of the present invention have found that a benzyl ether compound having a bis(meth)acrylinyl group terminal having a bisphenol fluorene skeleton having a large planar structure and a curved portion is effective for solving the above problems, and thus completed the present invention.

亦即,本發明係由下列式(1)表示之芳香族雙鹵甲基化合物。 That is, the present invention is an aromatic dihalomethyl compound represented by the following formula (1).

(式中,Ar1表示碳數6~50的芳香族烴基,X表示鹵素元素,n表示1~10之數,R1及R2獨立地表示碳數1~50的烴基;p、q獨立地表示0~2之整數)。 (wherein, Ar 1 represents an aromatic hydrocarbon group having 6 to 50 carbon atoms, X represents a halogen element, n represents a number of 1 to 10, and R 1 and R 2 independently represent a hydrocarbon group having 1 to 50 carbon atoms; and p and q are independently The ground represents an integer from 0 to 2.)

此外,本發明係由下列式(2)表示之雙(甲 基)丙烯醯基末端之苄醚化合物。 Further, the present invention is a double (A) represented by the following formula (2) a benzyl ether compound at the end of the acrylonitrile group.

(式(2)中,Ar1表示碳數6~50的芳香族烴基,Y表示氫或甲基,n表示1~10之數,R1及R2獨立地表示碳數1~50的烴基;p、q獨立地表示0~2之整數)。 (In the formula (2), Ar 1 represents an aromatic hydrocarbon group having 6 to 50 carbon atoms, Y represents hydrogen or a methyl group, n represents a number of 1 to 10, and R 1 and R 2 independently represent a hydrocarbon group having 1 to 50 carbon atoms. ;p, q independently represent an integer from 0 to 2).

再者,本發明為上述雙(甲基)丙烯醯基末端之苄醚化合物之製造方法,其特徵為:使上述芳香族雙鹵甲基化合物,與由下列式(4)表示之(甲基)丙烯酸系化合物反應。 Furthermore, the present invention is a process for producing a benzyl ether compound at the terminal of the bis(meth)acrylonitrile group, which comprises the above-mentioned aromatic dihalomethyl compound and (methyl) represented by the following formula (4) The acrylic compound reacts.

(式中,Y表示氫或甲基,Z表示氫、鹼金屬、或(甲基)丙烯醯基)。 (wherein Y represents hydrogen or a methyl group, and Z represents hydrogen, an alkali metal, or a (meth)acrylonitrile group).

再者,本發明是一種硬化性樹脂組成物,其特徵為:含有由上述式(1)表示之雙(甲基)丙烯醯基末端之苄醚化合物與聚合起始劑。 Furthermore, the present invention is a curable resin composition comprising a benzyl ether compound having a bis(meth)acrylonyl group terminal represented by the above formula (1) and a polymerization initiator.

此外,本發明為將上述硬化性樹脂組成物成 形為薄膜狀而成之硬化性薄膜,以及使其硬化而成之薄膜。再者,本發明為使上述硬化性樹脂組成物硬化而成之硬化物。此外,本發明係由上述硬化性樹脂組成物與基材所成之硬化性複合材料,以及使其硬化而得之硬化複合材料。 Further, the present invention is to form the above curable resin composition into A curable film formed into a film shape and a film obtained by hardening it. Further, the present invention is a cured product obtained by curing the curable resin composition. Further, the present invention is a curable composite material composed of the above-mentioned curable resin composition and a substrate, and a cured composite material obtained by curing the cured composite material.

此外,本發明係由上述硬化物所成之光學物品、及光學透鏡。 Further, the present invention is an optical article made of the above cured product and an optical lens.

本發明之具有具備較大平面構造及彎曲部位之雙酚茀骨架之雙(甲基)丙烯醯基末端之苄醚化合物,藉由使用此作為硬化性化合物,可於分子內具有分子大小較大的自由體積,且由極性基較少所起因,而得到高度的低介電常數特性之硬化物。此外,不僅可實現高度的難燃性與耐熱性以及介電常數與介電正切小之材料,並且可得到以高折射率性為首之光學特性優異,且具有高耐熱性及尺寸穩定性之光學材料。 The benzyl ether compound having a bis(meth)acrylonyl end group having a bisphenol fluorene skeleton having a large planar structure and a curved portion of the present invention can be used as a curable compound to have a large molecular size in a molecule. The free volume and the low polar group cause a high degree of low dielectric constant hardening. In addition, not only high flame retardancy and heat resistance, but also materials having a small dielectric constant and dielectric tangent, and excellent optical properties including high refractive index and high heat resistance and dimensional stability can be obtained. material.

本發明之含有雙(甲基)丙烯醯基末端之苄醚化合物之硬化性組成物,於硬化後可顯示出優異的耐藥性、介電特性、低吸水性、耐熱性、難燃性、機械特性,並且在電氣產業、宇宙及航太產業等領域中可用作為介電材料、絕緣材料、耐熱材料、結構材料等。尤其可使用作為單面、雙面、多層印刷基板、可撓性印刷基板、增層基板等。 The curable composition of the benzyl ether compound containing a bis(meth)acryl oxime group of the present invention exhibits excellent chemical resistance, dielectric properties, low water absorption, heat resistance, flame retardancy, and the like after curing. It is used as a dielectric material, an insulating material, a heat-resistant material, a structural material, etc. in the fields of the electrical industry, the universe, and the aerospace industry. In particular, it can be used as a single-sided, double-sided, multilayer printed substrate, a flexible printed substrate, a build-up substrate, or the like.

此外,本發明之光學構件及光學透鏡,由於以高折射率性為首之光學特性優異,且具有高耐熱性及尺寸穩定性,所以可使用作為小型照相機的攝像用、記錄媒體的光拾取頭、顯示裝置、照明裝置、影印裝置、印刷裝置等之光學系、眼鏡、隱形眼鏡等。 In addition, since the optical member and the optical lens of the present invention are excellent in optical characteristics including high refractive index, and have high heat resistance and dimensional stability, an optical pickup which is an imaging and recording medium for a compact camera can be used. Optical systems such as display devices, illumination devices, photocopying devices, and printing devices, glasses, contact lenses, and the like.

第1圖係顯示本發明之芳香族雙氯甲基化合物A之GPC圖。 Fig. 1 is a GPC chart showing the aromatic bischloromethyl compound A of the present invention.

第2圖係顯示本發明之芳香族雙氯甲基化合物B之GPC圖。 Fig. 2 is a GPC chart showing the aromatic bischloromethyl compound B of the present invention.

以下進一步說明本發明。 The invention is further illustrated below.

本發明之由式(1)表示之芳香族雙鹵甲基化合物,該製法並無特別限定,但較佳使芳香族交聯劑與雙酚茀系化合物反應而合成。芳香族交聯劑,可使用能夠賦予由-CH2-Ar1-CH2-表示之交聯基之化合物,有雙鹵甲基化合物、雙羥甲基化合物等,較佳為雙鹵甲基化合物。以下以雙鹵甲基化合物代表芳香族交聯劑來說明,但在需與式(1)的芳香族雙鹵甲基化合物區分時,將此稱為雙鹵甲基類或芳香族雙鹵甲基類。 In the aromatic dihalomethyl compound represented by the formula (1) of the present invention, the production method is not particularly limited, but it is preferred to synthesize an aromatic crosslinking agent by reacting with a bisphenol quinone compound. As the aromatic crosslinking agent, a compound capable of imparting a crosslinking group represented by -CH2-Ar 1 -CH2- may be used, and a dihalomethyl compound or a bismethylmethyl compound may be used, and a dihalomethyl compound is preferred. Hereinafter, the dihalomethyl compound represents an aromatic crosslinking agent, but when it is distinguished from the aromatic dihalomethyl compound of the formula (1), this is called a dihalomethyl group or an aromatic dihalo-methyl group. Base class.

本說明書中,同一記號在無特別言明時乃具有同一涵 義。此外,雙(甲基)丙烯醯基末端之苄醚化合物中的苄基,係意味著式(1)中的Ar1-CH2單位,並不限定於典型的苄基。 In the present specification, the same symbols have the same meanings unless otherwise stated. Further, bis (methyl) benzyl ether compound of the group-terminated Bing Xixi benzyl, lines mean the formula (1) Ar 1 -CH2 unit, typically not limited to benzyl.

式(1)中的Ar1為碳數6~50的芳香族烴基,是由芳香族交聯劑所衍生之結構單位。當芳香族交聯劑為芳香族雙鹵甲基類時,較佳者例如可列舉出由下列式(3)表示之芳香族雙鹵甲基類,但並不限定於此。 Ar 1 in the formula (1) is an aromatic hydrocarbon group having 6 to 50 carbon atoms and is a structural unit derived from an aromatic crosslinking agent. When the aromatic cross-linking agent is an aromatic dihalomethyl group, for example, an aromatic dihalomethyl group represented by the following formula (3) is preferable, but it is not limited thereto.

【化4】X-CH 2 -Ar 1 -CH 2 -X (3)(式中,Ar1與X與式(1)同義) [Chemical Formula 4] X-CH 2 -Ar 1 -CH 2 -X (3) ( in the formula, Ar 1 and X in the formula (1) is synonymous)

Ar1的具體例,較佳為選自由-Ph-、-Ph-Ph-、-Np-、-Np-CH2-Np-、-Ph-CH2-Ph-、-Ph-C(CH3)2-Ph-、-Ph-CH(CH3)-Ph-、-Ph-CH(C6H5)-Ph-、-Ph-Flu-Ph-、及-Flu(CH3)2-所組成之群組之碳數6~50的芳香族烴基,尤佳為碳數6~20的芳香族烴基。在此,Ph表示伸苯基(-C6H4-),Np表示伸萘基(-C10H6-),Flu表示伸茀基。在此,Ph、Np及Flu可具有取代基,例如有烷基、烷氧基、苯基。較佳為碳數1~6的烷基。特佳為無取代、經甲基取代及經二甲基取代之-Ph-Ph-及-Ph-。X表示鹵素元素,從工業實施上的取得容易度來看,較佳可使用選自氯、溴及碘之鹵素元素,尤佳為氯。 Specific examples of Ar 1, is preferably selected from the group consisting of -Ph -, - Ph-Ph - , - Np -, - Np-CH 2 -Np -, - Ph-CH 2 -Ph -, - Ph-C (CH 3 2 -Ph-, -Ph-CH(CH 3 )-Ph-, -Ph-CH(C 6 H 5 )-Ph-, -Ph-Flu-Ph-, and -Flu(CH 3 ) 2 - The aromatic hydrocarbon group having 6 to 50 carbon atoms in the group is particularly preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms. Here, Ph represents a phenyl group (-C 6 H 4 -), Np represents an anthranyl group (-C 10 H 6 -), and Flu represents a thiol group. Here, Ph, Np and Flu may have a substituent such as an alkyl group, an alkoxy group or a phenyl group. It is preferably an alkyl group having 1 to 6 carbon atoms. Particularly preferred are unsubstituted, methyl substituted and dimethyl substituted -Ph-Ph- and -Ph-. X represents a halogen element, and from the viewpoint of ease of industrial implementation, a halogen element selected from chlorine, bromine and iodine is preferably used, and chlorine is particularly preferred.

式(1)中,n表示1~10之數,當具有分子量分布時,為平均值(數量平均)。 In the formula (1), n represents a number from 1 to 10, and when it has a molecular weight distribution, it is an average value (number average).

更具體地例示出由上述式(3)表示之芳香族雙鹵甲基類,係有對雙氯甲基苯、間雙氯甲基苯、對雙溴甲基苯、間雙溴甲基苯、4,4'-雙氯甲基聯苯、4,3'-雙氯甲基聯苯、3,3'-雙氯甲基聯苯、2,2'-雙氯甲基聯苯、4,4'-雙溴甲基聯苯、4,3'-雙溴甲基聯苯、3,3'-雙溴甲基聯苯、2,2'-雙溴甲基聯苯、1,4-雙氯甲基萘、1,5-雙氯甲基萘、1,6-雙氯甲基萘、2,3-雙氯甲基萘、2,4-雙氯甲基萘、2,5-雙氯甲基萘、2,6-雙氯甲基萘、2,7-雙氯甲基萘、1,4-雙溴甲基萘、1,5-雙溴甲基萘、1,6-雙溴甲基萘、2,3-雙溴甲基萘、2,4-雙溴甲基萘、2,5-雙溴甲基萘、2,6-雙溴甲基萘、2,7-雙溴甲基萘、9,9-雙氯甲基茀、9,9-雙溴甲基茀、2,7-雙氯甲基茀、2,7-雙氯甲基-9,9-二甲基茀、2,7-雙氯甲基-9,9-二乙基茀、2,7-雙氯甲基-9,9-二正丙基茀、2,7-雙氯甲基-9,9-二異丙基茀、2,7-雙氯甲基-9,9-二正丁基茀、2,7-雙氯甲基-9,9-二異丁基茀、2,7-雙氯甲基-9,9-二(二級丁基)茀、2,7-雙氯甲基-9,9-二(三級丁基)茀、2,7-雙溴甲基茀、2,7-雙溴甲基-9,9-二甲基茀、2,7-雙溴甲基-9,9-二乙基茀、2,7-雙溴甲基-9,9-二正丙基茀、2,7-雙溴甲基-9,9-二異丙基茀、2,7-雙溴甲基-9,9-二正丁基茀、2,7-雙溴甲基-9,9-二異丁基茀、2,7-雙溴甲基-9,9-二(二級丁基)茀、2,7-雙溴甲基-9,9-二(三級丁基)茀、2,7-雙碘甲基茀、2,7-雙碘甲基-9,9-二甲基茀、2,7-雙碘甲基-9,9-二乙 基茀、2,7-雙碘甲基-9,9-二正丙基茀、2,7-雙碘甲基-9,9-二異丙基茀、2,7-雙碘甲基-9,9-二正丁基茀、2,7-雙碘甲基-9,9-二異丁基茀、2,7-雙碘甲基-9,9-二(二級丁基)茀、2,7-雙碘甲基-9,9-二(三級丁基)茀、9,9-雙(4-氯甲基苯基)茀、9,9-雙(3-氯甲基苯基)茀、9,9-雙(2-氯甲基苯基)茀等,但並不限定於此。特佳為對雙氯甲基苯、間雙氯甲基苯、對雙溴甲基苯、間雙溴甲基苯、4,4'-雙氯甲基聯苯、4,3'-雙氯甲基聯苯、3,3'-雙氯甲基聯苯、2,2'-雙氯甲基聯苯、4,4'-雙溴甲基聯苯、4,3'-雙溴甲基聯苯、3,3'-雙溴甲基聯苯及2,2'-雙溴甲基聯苯以及此等之經甲基取代物及經二甲基取代物。 More specifically, the aromatic dihalomethyl group represented by the above formula (3) is exemplified by p-dichloromethylbenzene, m-dichloromethylbenzene, p-dibromomethylbenzene, m-dibromomethylbenzene. , 4,4'-bischloromethylbiphenyl, 4,3'-bischloromethylbiphenyl, 3,3'-bischloromethylbiphenyl, 2,2'-dichloromethylbiphenyl, 4 , 4'-bisbromomethylbiphenyl, 4,3'-bisbromomethylbiphenyl, 3,3'-bisbromomethylbiphenyl, 2,2'-dibromomethylbiphenyl, 1,4 -Dichloromethylnaphthalene, 1,5-dichloromethylnaphthalene, 1,6-dichloromethylnaphthalene, 2,3-dichloromethylnaphthalene, 2,4-dichloromethylnaphthalene, 2,5 - bischloromethylnaphthalene, 2,6-dichloromethylnaphthalene, 2,7-dichloromethylnaphthalene, 1,4-dibromomethylnaphthalene, 1,5-dibromomethylnaphthalene, 1,6 -dibromomethylnaphthalene, 2,3-dibromomethylnaphthalene, 2,4-dibromomethylnaphthalene, 2,5-dibromomethylnaphthalene, 2,6-dibromomethylnaphthalene, 2,7 - bisbromomethylnaphthalene, 9,9-bischloromethyl hydrazine, 9,9-bisbromomethyl hydrazine, 2,7-dichloromethyl hydrazine, 2,7-dichloromethyl-9,9- Dimethyl hydrazine, 2,7-dichloromethyl-9,9-diethyl fluorene, 2,7-dichloromethyl-9,9-di-n-propyl fluorene, 2,7-dichloromethyl -9,9-diisopropyl fluorene, 2,7-dichloromethyl-9,9-di-n-butyl fluorene, 2,7-dichloromethyl-9,9- Isobutyl hydrazine, 2,7-dichloromethyl-9,9-di(secondary butyl) fluorene, 2,7-dichloromethyl-9,9-di(tertiary butyl) fluorene, 2 ,7-dibromomethylhydrazine, 2,7-dibromomethyl-9,9-dimethylindole, 2,7-dibromomethyl-9,9-diethylanthracene, 2,7-double Bromomethyl-9,9-di-n-propyl fluorene, 2,7-dibromomethyl-9,9-diisopropyl fluorene, 2,7-dibromomethyl-9,9-di-n-butyl Bismuth, 2,7-dibromomethyl-9,9-diisobutylphosphonium, 2,7-dibromomethyl-9,9-di(secondary butyl) fluorene, 2,7-dibromo Base-9,9-di(tributyl)anthracene, 2,7-diiodomethylhydrazine, 2,7-diiodomethyl-9,9-dimethylindole, 2,7-diiodomethyl Base-9,9-two Base, 2,7-diiodomethyl-9,9-di-n-propyl fluorene, 2,7-diiodomethyl-9,9-diisopropyl hydrazine, 2,7-diiodomethyl- 9,9-di-n-butyl fluorene, 2,7-diiodomethyl-9,9-diisobutyl fluorene, 2,7-diiodomethyl-9,9-di(secondary butyl) fluorene , 2,7-diiodomethyl-9,9-di(tributyl)anthracene, 9,9-bis(4-chloromethylphenyl)anthracene, 9,9-bis(3-chloromethyl Phenyl)phosphonium, 9,9-bis(2-chloromethylphenyl)fluorene or the like, but is not limited thereto. Particularly preferred are p-dichloromethylbenzene, m-dichloromethylbenzene, p-dibromomethylbenzene, m-dibromomethylbenzene, 4,4'-dichloromethylbiphenyl, 4,3'-dichloro Methylbiphenyl, 3,3'-bischloromethylbiphenyl, 2,2'-bischloromethylbiphenyl, 4,4'-dibromomethylbiphenyl, 4,3'-dibromomethyl Biphenyl, 3,3'-bisbromomethylbiphenyl and 2,2'-bisbromomethylbiphenyl, and such methyl-substituted and dimethyl-substituted.

式(1)中,p、q分別獨立地表示0~2之整數。R1及R2分別獨立地表示碳數1~50的烴基,較佳為碳數1~12的脂肪族烴基或碳數6~12的芳香族烴基,尤佳為碳數1~12的烷基。 In the formula (1), p and q each independently represent an integer of 0 to 2. R 1 and R 2 each independently represent a hydrocarbon group having 1 to 50 carbon atoms, preferably an aliphatic hydrocarbon group having 1 to 12 carbon atoms or an aromatic hydrocarbon group having 6 to 12 carbon atoms, particularly preferably an alkyl group having 1 to 12 carbon atoms. base.

與芳香族交聯劑反應之雙酚茀系化合物,由下列式(5)表示之化合物。 A bisphenol oxime compound which reacts with an aromatic crosslinking agent, and is a compound represented by the following formula (5).

(式中,R1、R2、p、q與式(1)具有相同涵義) (wherein R 1 , R 2 , p, q have the same meanings as in formula (1))

更具體地例示出由式(5)表示之雙酚茀系化合物,係有9,9-雙(4-羥苯基)茀;9,9-雙(4-羥基-2-甲基苯基)茀、9,9-雙(4-羥基-3-甲基苯基)茀、9,9-雙(4-羥基-3-乙基苯基)茀、9,9-雙(4-羥基-3-三級丁基苯基)茀等之9,9-雙(烷基羥苯基)茀;9,9-雙(4-羥基-3,5-二甲基苯基)茀、9,9-雙(4-羥基-2,6-二甲基苯基)茀、9,9-雙(4-羥基-3,5-二(三級丁基)苯基)茀等之9,9-雙(二烷基羥苯基)茀;9,9-雙(4-羥基-3-環己基苯基)茀等之9,9-雙(環烷基羥苯基)茀;9,9-雙(4-羥基-3-苯基苯基)茀等之9,9-雙(芳基羥苯基)茀等,但並不限定於此。較佳為9,9-雙(4-羥苯基)茀;9,9-雙(4-羥基-2-甲基苯基)茀、9,9-雙(4-羥基-3-甲基苯基)茀、9,9-雙(4-羥基-3,5-二甲基苯基)茀。 More specifically, the bisphenol oxime compound represented by the formula (5) is exemplified by 9,9-bis(4-hydroxyphenyl)fluorene; 9,9-bis(4-hydroxy-2-methylphenyl) ), 9,9-bis(4-hydroxy-3-methylphenyl)anthracene, 9,9-bis(4-hydroxy-3-ethylphenyl)anthracene, 9,9-bis(4-hydroxyl) 9,9-bis(alkylhydroxyphenyl)anthracene of -3-tertiary butylphenyl)anthracene; 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene, 9 9, 9-bis(4-hydroxy-2,6-dimethylphenyl)anthracene, 9,9-bis(4-hydroxy-3,5-di(tri-butyl)phenyl)anthracene, etc. 9-bis(dialkylhydroxyphenyl)anthracene; 9,9-bis(cycloalkylhydroxyphenyl)anthracene 9,9,9-bis(4-hydroxy-3-cyclohexylphenyl)anthracene; 9,9-bis(arylhydroxyphenyl)fluorene or the like such as 9-bis(4-hydroxy-3-phenylphenyl)fluorene, but is not limited thereto. Preferred is 9,9-bis(4-hydroxyphenyl)anthracene; 9,9-bis(4-hydroxy-2-methylphenyl)anthracene, 9,9-bis(4-hydroxy-3-methyl) Phenyl) ruthenium, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene.

本發明之式(1)的芳香族雙鹵甲基化合物,較佳係使芳香族雙鹵甲基類與式(5)的雙酚茀系化合物反應而合成(步驟A)。 The aromatic dihalomethyl compound of the formula (1) of the present invention is preferably synthesized by reacting an aromatic dihalomethyl group with a bisphenol fluorene compound of the formula (5) (step A).

於該步驟A中,式(3)的芳香族雙鹵甲基類與式(5)的雙酚茀系化合物之使用比率,以當量比(鹵甲基:OH之莫耳比)計較佳為100:20~100:99。當位於該範圍內時,接近於雙酚茀系化合物的全量之量會與芳香族雙鹵甲基類反應,而成為於兩末端殘留有芳香族雙鹵甲基類中的鹵甲基之單體或低聚物。此外,藉由控制上述當量比,可控制n之數。該n之值為1~10,更佳為1.2~10,更佳為1.2~8,特佳為1.2~5。n通常為平均值。 本說明書中,為平均值時是指數量平均。 In the step A, the use ratio of the aromatic dihalomethyl group of the formula (3) to the bisphenol fluorene-based compound of the formula (5) is preferably in an equivalent ratio (halogen ratio of halomethyl group: OH). 100:20~100:99. When it is in this range, the total amount of the bisphenol quinone-based compound is reacted with the aromatic dihalomethyl group to form a single halomethyl group in the aromatic dihalomethyl group remaining at both ends. Body or oligomer. Further, by controlling the above equivalent ratio, the number of n can be controlled. The value of n is 1 to 10, more preferably 1.2 to 10, more preferably 1.2 to 8, and particularly preferably 1.2 to 5. n is usually the average. In the present specification, the average value means the number average.

於該步驟A中,為了促進雙酚茀系化合物與芳香族雙鹵甲基化合物之反應,可在鹼金屬氫氧化物的存在下進行反應。 In this step A, in order to promote the reaction of the bisphenol fluorene-based compound with the aromatic dihalomethyl compound, the reaction can be carried out in the presence of an alkali metal hydroxide.

接著說明本發明之由式(2)表示之雙(甲基)丙烯醯基末端之苄醚化合物(以下亦稱為式(2)的苄醚化合物或本發明之苄醚化合物)。該雙(甲基)丙烯醯基末端之苄醚化合物的製法並無特別限定,但較佳是從由式(1)表示之芳香族雙鹵甲基化合物與由式(4)表示之(甲基)丙烯酸系化合物所合成。式(4)中,Z表示氫、鹼金屬、或(甲基)丙烯醯基(CH2=C(Y)-C(O)-),Y與式(2)同義)。 Next, a benzyl ether compound (hereinafter also referred to as a benzyl ether compound of the formula (2) or a benzyl ether compound of the present invention) represented by the formula (2) of the present invention will be described. The method for producing the benzyl ether compound at the terminal of the bis(meth)acrylonitrile group is not particularly limited, but is preferably represented by the aromatic dihalomethyl compound represented by the formula (1) and the formula (4). Synthesis of an acrylic compound. In the formula (4), Z represents hydrogen, an alkali metal, or a (meth)acrylonitrile group (CH 2 =C(Y)-C(O)-), and Y has the same meaning as the formula (2).

於本發明之苄醚化合物的製造中,使在步驟A中所得之由式(1)表示之芳香族雙鹵甲基化合物與賦予(甲基)丙烯酸酯基部分之化合物反應者,就工業上較為有利。將該反應步驟成為步驟B。由式(1)表示之芳香族雙鹵甲基化合物,由於有用於作為本發明之苄醚化合物的中間體,故亦稱為中間體。 In the production of the benzyl ether compound of the present invention, the aromatic dihalomethyl compound represented by the formula (1) obtained in the step A and the compound imparting the (meth) acrylate group are reacted industrially. More favorable. This reaction step was changed to step B. The aromatic dihalomethyl compound represented by the formula (1) is also referred to as an intermediate because it is used as an intermediate of the benzyl ether compound of the present invention.

由式(4)表示之(甲基)丙烯酸系化合物,可使用甲基丙烯酸、丙烯酸、甲基丙烯酸酐、丙烯酸酐及此等之鹽或此等之混合物。此外,若是(甲基)丙烯酸鹼金屬鹽,則反應更容易進行。此時可為(甲基)丙烯酸鋰、(甲基)丙烯酸鉀、或(甲基)丙烯酸鈉。 As the (meth)acrylic compound represented by the formula (4), methacrylic acid, acrylic acid, methacrylic anhydride, acrylic anhydride, and the like or a mixture thereof may be used. Further, in the case of an alkali metal (meth)acrylate, the reaction proceeds more easily. In this case, it may be lithium (meth)acrylate, potassium (meth)acrylate or sodium (meth)acrylate.

式(4)中,當使用Z為K之(甲基)丙烯酸 系化合物,例如(甲基)丙烯酸鉀時,藉由(甲基)丙烯酸酯類的皂化、或由碳酸鉀所進行之(甲基)丙烯酸的中和,可調製出(甲基)丙烯酸鉀,於前述中和的情形時,碳酸鉀相對於(甲基)丙烯酸類較佳為過剩。此時,在芳香族雙鹵甲基化合物與(甲基)丙烯酸鉀之反應前,可不單離(甲基)丙烯酸鉀。過剩的鹼可促進反應。 In formula (4), when Z is a K (meth)acrylic acid When a compound such as potassium (meth)acrylate is used, potassium (meth)acrylate can be prepared by saponification of (meth) acrylate or neutralization of (meth)acrylic acid by potassium carbonate. In the case of the aforementioned neutralization, potassium carbonate is preferably excessive with respect to (meth)acrylic acid. At this time, potassium (meth)acrylate may not be separated from the reaction between the aromatic dihalomethyl compound and potassium (meth)acrylate. Excess alkali can promote the reaction.

步驟B中之式(1)的芳香族雙鹵甲基化合物與式(4)的(甲基)丙烯酸系化合物之反應並無特別限制,例如可列舉出在極性溶劑中以碳酸鉀中和Z為H之(甲基)丙烯酸類以調製出鉀鹽,使該鉀鹽與芳香族雙鹵甲基化合物反應,並藉由過濾來分離所形成之副產物的鹼金屬氯化物,而得到目的之雙(甲基)丙烯醯基末端之苄醚化合物之方法。 The reaction of the aromatic dihalomethyl compound of the formula (1) in the step B and the (meth)acrylic compound of the formula (4) is not particularly limited, and for example, neutralization of Z with potassium carbonate in a polar solvent is exemplified. a (meth)acrylic acid of H to prepare a potassium salt, reacting the potassium salt with an aromatic dihalomethyl compound, and separating the alkali metal chloride of the by-product formed by filtration, thereby obtaining the purpose A method of bis(methyl)acrylonitrile terminated benzyl ether compound.

芳香族雙鹵甲基化合物與(甲基)丙烯酸系化合物之調配比率,以當量比(鹵甲基:(甲基)丙烯醯基類之莫耳比)計較佳為100:95~100:120,尤佳為100:100~100:110。當該當量比位於該範圍內時,接近於所投入之芳香族雙鹵甲基化合物的全量之量會與丙烯酸系化合物反應,使芳香族雙鹵甲基化合物中的鹵甲基形成(甲基)丙烯酸酯化,而在反應物中幾乎不殘存,藉此,在將此用作為硬化性樹脂組成物時,可使硬化反應充分地進行,且顯示出良好的介電特性,並且熱穩定性亦良好,故較佳。 The ratio of the aromatic dihalomethyl compound to the (meth)acrylic compound is preferably from 100:95 to 100:120 in an equivalent ratio (halogen ratio of halomethyl:(meth)acrylonitrile group). , especially good for 100:100~100:110. When the equivalent ratio is in the range, the total amount of the aromatic dihalomethyl compound to be charged is reacted with the acrylic compound to form a halomethyl group in the aromatic dihalomethyl compound (methyl group). Acrylate, and hardly remains in the reactants, whereby when used as a curable resin composition, the hardening reaction can be sufficiently performed, and good dielectric properties are exhibited, and thermal stability is exhibited. It is also good, so it is better.

於進行步驟B的反應時,可使用極性溶劑, 較佳的極性溶劑可列舉出甲醇、乙醇、丙醇、丁醇等之醇類、二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺系溶劑、二噁烷、四氫呋喃、乙二醇二甲醚、1,3-二甲氧丙烷、1,2-二甲氧乙烷等之醚系溶劑類、丙酮、丁酮、甲基異丁酮、環己酮等之酮系溶劑、二甲基亞碸、乙腈或是該混合溶劑。 When carrying out the reaction of step B, a polar solvent can be used. Examples of preferred polar solvents include alcohols such as methanol, ethanol, propanol and butanol, and guanamine solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone. An ether solvent such as dioxane, tetrahydrofuran, ethylene glycol dimethyl ether, 1,3-dimethoxypropane or 1,2-dimethoxyethane, acetone, methyl ethyl ketone, methyl isobutyl ketone, or ring A ketone solvent such as ketone or the like, dimethyl hydrazine, acetonitrile or the mixed solvent.

於進行步驟B的反應時,較佳係使用藉由使式(4)的丙烯酸系化合物之M皂化或中和以形成鹼金屬的鹽而促進反應之方法。較佳之鹼金屬的鹽,可列舉出(甲基)丙烯酸鋰、(甲基)丙烯酸鉀、或(甲基)丙烯酸鈉、以及此等之混合物。於形成鹼金屬的鹽時之丙烯酸酯類或丙烯酸類與化合物之調配比率,以當量比計較佳為1.05~2.0倍的範圍。 In carrying out the reaction of the step B, a method of promoting the reaction by saponifying or neutralizing M of the acrylic compound of the formula (4) to form a salt of an alkali metal is preferably used. Preferred examples of the alkali metal salt include lithium (meth)acrylate, potassium (meth)acrylate, or sodium (meth)acrylate, and mixtures thereof. The ratio of the acrylate or the acrylic compound to the compound in the case of forming an alkali metal salt is preferably in the range of 1.05 to 2.0 times in terms of an equivalent ratio.

步驟B的反應溫度及反應時間,可因應反應而適當地選擇,若分別位於30~100℃、0.5~20小時的範圍,則反應可充分地進行。 The reaction temperature and the reaction time in the step B can be appropriately selected depending on the reaction, and if the reaction is in the range of 30 to 100 ° C for 0.5 to 20 hours, the reaction can be sufficiently carried out.

藉由上述反應可得到由式(3)表示之雙(甲基)丙烯醯基末端之苄醚化合物。藉由該反應所得到之雙(甲基)丙烯醯基末端之苄醚化合物,可進一步藉由再沉澱精製或再結晶來精製,而降低雜質的含量。 By the above reaction, a benzyl ether compound of a bis(meth)acrylinyl group represented by the formula (3) can be obtained. The benzyl ether compound at the terminal of the bis(meth)acrylonitrile group obtained by the reaction can be further purified by reprecipitation purification or recrystallization to reduce the content of impurities.

本發明之雙(甲基)丙烯醯基末端之苄醚化合物,由於具有2個(甲基)丙烯醯基,故有用於作為樹脂原料,尤其有用於作為調配於熱硬化性樹脂用的樹脂組成物之單體。 The bis(meth)acrylonitrile-terminated benzyl ether compound of the present invention has two (meth)acrylonium groups and is used as a resin material, and is particularly useful as a resin composition for thermosetting resins. Monomer of matter.

該樹脂組成物,較佳係含有雙(甲基)丙烯醯基末端之苄醚化合物與聚合起始劑作為必要成分。聚合起始劑,可為一般所知被用作為乙烯基化合物的聚合起始劑之聚合起始劑,可適用紫外線、電子束等之活化能射線的照射或自由基聚合起始劑,但較佳為自由基聚合起始劑(亦稱為自由基聚合催化劑)。 The resin composition preferably contains a benzyl ether compound of a bis(meth)acryl oxime group and a polymerization initiator as essential components. The polymerization initiator may be a polymerization initiator which is generally used as a polymerization initiator of a vinyl compound, and may be applied to an active energy ray irradiation or a radical polymerization initiator of ultraviolet rays, electron beams or the like, but A free radical polymerization initiator (also known as a free radical polymerization catalyst).

含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之樹脂組成物,由於具有硬化性,故亦稱為硬化性樹脂組成物。使該硬化性樹脂組成物硬化所得之硬化物,可使用作為成型物、層合物、注模物、黏著劑、塗膜、薄膜。例如,半導體封合材料的硬化物為注模物或成型物,得到該用途的硬化物之方法,可將該化合物注模,或是使用轉移成形機、射出成形機、壓縮成形機等來成形,並進一步在80~230℃中加熱0.5~10小時而得到硬化物。此外,該硬化性樹脂組成物,可使用活化能射線照射裝置,照射活化能射線而得到硬化物。 The resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention is also called a curable resin composition because of its curability. The cured product obtained by curing the curable resin composition can be used as a molded product, a laminate, an injection molded article, an adhesive, a coating film, and a film. For example, the cured product of the semiconductor sealing material is an injection molded article or a molded product, and a method of obtaining a cured product for the purpose can be injection molded, or formed by using a transfer molding machine, an injection molding machine, a compression molding machine, or the like. And further heating at 80 to 230 ° C for 0.5 to 10 hours to obtain a cured product. Further, in the curable resin composition, an active energy ray irradiation device can be used to irradiate an active energy ray to obtain a cured product.

含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物,藉由上述硬化方法使其硬化,可得到適合作為光學零件之硬化物。如此之適合作為光學零件之硬化物,可成為各種光學特性優異之光學物品,例如光學透鏡。 The curable resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention is cured by the above-described curing method to obtain a cured product suitable as an optical component. Such a suitable material for use as an optical component can be an optical article excellent in various optical characteristics, such as an optical lens.

接著說明本發明之硬化性組成物。 Next, the curable composition of the present invention will be described.

本發明之硬化性組成物,係含有由式(1)表示之雙(甲基)丙烯醯基末端之苄醚化合物與聚合起始劑。聚合 起始劑,可為一般所知被用作為乙烯基化合物的聚合起始劑之聚合起始劑,可適用紫外線、電子束等之活化能射線的照射或自由基聚合起始劑,但較佳為自由基聚合起始劑(亦稱為自由基聚合催化劑)。 The curable composition of the present invention contains a benzyl ether compound of a bis(meth)acrylonyl group represented by the formula (1) and a polymerization initiator. polymerization The initiator may be a polymerization initiator which is generally used as a polymerization initiator of a vinyl compound, and may be applied to an active energy ray irradiation or a radical polymerization initiator of ultraviolet rays, electron beams or the like, but is preferably used. It is a radical polymerization initiator (also known as a radical polymerization catalyst).

自由基聚合起始劑,例如本發明之樹脂組成物係如後述般藉由加熱或活化能射線的照射等手段引起交聯反應而硬化,惟此時是以降低反應溫度或促進不飽和基的交聯反應者為目的而含有自由基聚合起始劑。以該目的所使用之自由基聚合起始劑的量,以雙(甲基)丙烯醯基末端之苄醚化合物為基準,為0.1~10重量%,較佳為0.1~8重量%。自由基聚合起始劑,由於是自由基聚合催化劑,故以下係以自由基聚合起始劑為代表。 The radical polymerization initiator, for example, the resin composition of the present invention is hardened by a crosslinking reaction by heating or activation of an energy ray or the like as described later, but at this time, the reaction temperature is lowered or the unsaturated group is promoted. The crosslinking reaction initiator contains a radical polymerization initiator for the purpose. The amount of the radical polymerization initiator used for the purpose is 0.1 to 10% by weight, preferably 0.1 to 8% by weight based on the benzyl ether compound at the bis(meth)acryl oxime group. Since the radical polymerization initiator is a radical polymerization catalyst, the following is represented by a radical polymerization initiator.

列舉出藉由加熱引起交聯反應之自由基聚合起始劑的代表例,係有過氧化苯甲醯、異丙苯過氧化氫、2,5-二甲基己烷-2,5-二過氧化氫、2,5-二甲基-2,5-二(三級丁基過氧基)己炔-3、過氧化二(三級丁基)、過氧化三級丁基異丙苯、α,α'-雙(三級丁基過氧基-m-異丙基)苯、2,5-二甲基-2,5-二(三級丁基過氧基)己烷、二異丙苯過氧化氫、間苯二甲酸二(三級丁基過氧基)酯、苄酸三級丁基過氧酯、2,2,-雙(三級丁基過氧基)丁烷、2,2,-雙(三級丁基過氧基)辛烷、2,5-二甲基-2,5-二(過氧化苯甲醯)己烷、過氧化二(三甲基矽烷基)、過氧化三甲基矽烷基三苯基矽烷基等之過氧化物,但並不限定於此。此外,雖非過氧化物,但2,3-二甲基-2,3-二苯基丁烷亦可 使用作為用以藉由加熱來促進交聯反應之自由基聚合起始劑(或聚合催化劑)。 Representative examples of the radical polymerization initiator which causes a crosslinking reaction by heating are benzamidine peroxide, cumene hydroperoxide, 2,5-dimethylhexane-2,5-di Hydrogen peroxide, 2,5-dimethyl-2,5-di(tert-butylperoxy)hexyne-3, di(tertiary butyl peroxide), tertiary butyl cumene peroxide , α,α'-bis(tri-butylperoxy-m-isopropyl)benzene, 2,5-dimethyl-2,5-di(tri-butylperoxy)hexane, two Cumene hydroperoxide, di(tertiary butylperoxy) isophthalate, tert-butyl peroxybenzoate, 2,2,-bis(tertiary butylperoxy)butane , 2,2,-bis(tertiary butylperoxy)octane, 2,5-dimethyl-2,5-di(benzoyl peroxide)hexane, bis(trimethyldecane) peroxide And a peroxide such as a trimethylsulfonyltriphenylphosphonium peroxide, but is not limited thereto. In addition, although not a peroxide, 2,3-dimethyl-2,3-diphenylbutane may also A radical polymerization initiator (or a polymerization catalyst) for promoting a crosslinking reaction by heating is used.

另一方面,列舉出藉由照射紫外線、電子束等之活化能射線來促進交聯反應之自由基聚合起始劑的代表例,係有安息香、安息香甲醚、安息香乙醚、安息香丙醚、安息香異丁醚等之安息香類;苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、1,1-二氯苯乙酮、2-搶基-2-甲基-苯基丙烷-1-酮、二乙氧基苯乙酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲基硫)苯基]-2-嗎啉丙烷-1-酮等之苯乙酮類;2-乙基蒽醌、2-三級丁基蒽醌、2-氯蒽醌、2-戊基蒽醌等之蒽醌類;2,4-二乙基噻吨酮、2-異丙基噻吨酮、2-氯噻吨酮等之噻吨酮類;苯乙酮二甲基縮醛、苄基二甲基縮醛等之縮醛類;二苯基酮、4-苯甲醯基-4'-甲基二苯基硫化物、4,4'-雙甲基胺基二苯基酮等之二苯基酮類;2,4,6-三甲基苯甲醯基二苯基膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物等之膦氧化物類等。此等可單獨或作為2種以上的混合物使用,此外,亦可與三乙醇胺、甲基二乙醇胺等之三級胺、N,N-二甲基胺基苯甲酸乙酯、N,N-二甲基胺基苯甲酸異戊酯等之苯甲酸衍生物等的促進劑組合使用,但並不限定於此等例。 On the other hand, a representative example of a radical polymerization initiator which promotes a crosslinking reaction by irradiating an activation energy ray such as an ultraviolet ray or an electron beam is benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin Benzoin such as isobutyl ether; acetophenone, 2,2-diethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1- Dichloroacetophenone, 2-mercapto-2-methyl-phenylpropan-1-one, diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4 Acetophenones such as -(methylthio)phenyl]-2-morpholinpropan-1-one; 2-ethylhydrazine, 2-tributylphosphonium, 2-chloroindole, 2- Anthraquinones such as amyl guanidine; thioxanthones such as 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone; acetophenone dimethyl condensate Acetals such as aldehydes, benzyl dimethyl acetals, etc.; diphenyl ketone, 4-benzylidene-4'-methyldiphenyl sulfide, 4,4'-bismethylaminodiphenyl Diphenyl ketones such as ketones; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzylidene)-phenylphosphine Phosphine oxides such as oxides Wait. These may be used singly or as a mixture of two or more kinds, and may also be a tertiary amine such as triethanolamine or methyldiethanolamine, ethyl N,N-dimethylaminobenzoate, or N,N-di An accelerator such as a benzoic acid derivative such as isoamyl methylaminobenzoate is used in combination, but is not limited thereto.

自由基聚合起始劑的調配量,相對於雙(甲基)丙烯醯基末端之苄醚化合物,若位於0.01~10重量份的範圍,則不會因溶存於本樹脂組成物中之氧而阻礙硬化 反應,可使反應良好地進行。 The amount of the radical polymerization initiator to be added is not in the range of 0.01 to 10 parts by weight based on the benzyl ether compound at the end of the bis(meth)acryl oxime group, and is not caused by the oxygen dissolved in the resin composition. Block hardening The reaction allows the reaction to proceed well.

此外,於含有雙(甲基)丙烯醯基末端之苄醚化合物之硬化性組成物中,可因應必要,調配能夠與本發明之雙(甲基)丙烯醯基末端之苄醚化合物共聚合之其他聚合性單體而硬化。 Further, in the curable composition of the benzyl ether compound containing a bis(meth)acryl oxime group, a benzyl ether compound capable of copolymerizing with the bis(meth)acryl oxime group of the present invention may be blended as necessary. Other polymerizable monomers are hardened.

可共聚合之聚合性單體,係有苯乙烯、苯乙烯二聚物、α-甲基苯乙烯、α-甲基苯乙烯二聚物、二乙烯基苯、乙烯基甲苯、三級丁基苯乙烯、氯苯乙烯、二溴苯乙烯、乙烯基萘、乙烯基聯苯、苊烯、二乙烯基苄醚、烯丙基苯醚、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸1,6-己二醇酯、二(甲基)丙烯酸1,9-壬二醇酯、(甲基)丙烯酸三環癸烷二甲醇酯、二(甲基)丙烯酸雙酚A聚乙氧酯、二(甲基)丙烯酸雙酚A聚丙氧酯、二(甲基)丙烯酸雙酚F聚乙氧酯、二(甲基)丙烯酸乙二醇酯、(甲基)丙烯酸三羥甲基丙烷三氧乙酯、三(甲基)丙烯酸三(2-羥乙基)三聚異氰酸酯、三(甲基)丙烯酸新戊四醇酯、四(甲基)丙烯酸新戊四醇酯、二(甲基)丙烯酸聚乙二醇酯、三聚異氰酸三(丙烯氧乙基)酯、四(甲基)丙烯酸新戊四醇酯、六(甲基)丙烯酸二新戊四醇酯、羥基新戊酸新戊二醇酯的ε-己內酯加成物之二(甲基)丙烯酸酯(例如日本化藥股份有限公司製,KAYARAD HX-220、HX-620等)、三(甲基)丙烯酸三羥甲基丙烷酯、三(甲基)丙烯酸三羥甲基丙烷聚乙氧酯、四(甲基)丙烯酸二(三羥甲基丙烷)酯、丙烯醯基 嗎啉、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸4-羥丁酯、單(甲基)丙烯酸聚乙二醇酯、單(甲基)丙烯酸聚丙二醇酯、單(甲基)丙烯酸環己烷-1,4-二甲醇酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸苯氧乙酯、(甲基)丙烯酸苯基聚乙氧酯、(甲基)丙烯酸2-羥基-3-苯基氧基丙酯、(甲基)丙烯酸鄰苯基酚單乙氧酯、(甲基)丙烯酸鄰苯基酚聚乙氧酯、(甲基)丙烯酸對異丙苯苯氧乙酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸三溴苯基氧乙酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯氧乙酯等之單體類。 Copolymerizable polymerizable monomer, which is styrene, styrene dimer, α-methylstyrene, α-methylstyrene dimer, divinylbenzene, vinyl toluene, tert-butyl Styrene, chlorostyrene, dibromostyrene, vinylnaphthalene, vinylbiphenyl, decene, divinylbenzyl ether, allyl phenyl ether, 1,4-butanediol di(meth)acrylate 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, tricyclodecane dimethanol (meth)acrylate, di(meth)acrylic acid Bisphenol A polyethoxylate, bisphenol A dipropyl (meth)acrylate, bisphenol (poly) ethoxylate, ethylene glycol di(meth)acrylate, (methyl) Trimethylolpropane triethoxyethyl acrylate, tris(2-hydroxyethyl)trimeric isocyanate tris(meth)acrylate, neopentyl glycol tri(meth)acrylate, neopentyl tetra(meth)acrylate Alcohol ester, polyethylene glycol di(meth)acrylate, tris(propyleneoxyethyl) isocyanate, neopentyl tetra(meth)acrylate, dipentyne hexa(meth)acrylate Ε-hexyl ester of tetraol ester and neopentyl glycol hydroxypivalate Diester (meth) acrylate (for example, manufactured by Nippon Kayaku Co., Ltd., KAYARAD HX-220, HX-620, etc.), trimethylolpropane tris(meth)acrylate, tris(methyl) ) Trimethylolpropane acrylate polyethoxylate, bis(trimethylolpropane) tetra(meth)acrylate, propylene fluorenyl Morpholine, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, polyethylene glycol mono(meth)acrylate, single Poly(propylene glycol) methyl acrylate, cyclohexane-1,4-dimethyl methacrylate, tetrahydrofuran (meth) acrylate, phenoxyethyl (meth) acrylate, benzene (meth) acrylate Polyethoxylate, 2-hydroxy-3-phenyloxypropyl (meth)acrylate, o-phenylphenol monoethoxylate (meth)acrylate, o-phenylphenol poly(oxy)(meth)acrylate Ester, p-cumylphenoxyethyl (meth)acrylate, isodecyl (meth)acrylate, tribromophenyloxyethyl (meth)acrylate, dicyclopentanyl (meth)acrylate, (A) A monomer such as dicyclopentenyl acrylate or dicyclopentene oxyethyl (meth)acrylate.

此外,於本發明之硬化性樹脂組成物中,亦可與已知的熱硬化性樹脂,例如乙烯酯樹脂、聚乙烯苄樹脂、不飽和聚酯樹脂、順丁烯二醯亞胺樹脂、環氧樹脂、聚氰酸酯樹脂、酚樹脂等,或是已知的熱可塑性樹脂,例如聚苯乙烯、聚苯醚、聚醚醯亞胺、聚醚碸、PPS樹脂、聚環戊二烯樹脂、聚環烯烴樹脂等,或是已知的熱可塑性彈性體,例如苯乙烯-乙烯-丙烯共聚物、苯乙烯-乙烯-丁烯共聚物、苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物、加氫苯乙烯-丁二烯共聚物、加氫苯乙烯-異戊二烯共聚物等或是橡膠類,例如聚丁二烯、聚異戊二烯一同調配。 Further, in the curable resin composition of the present invention, a known thermosetting resin such as a vinyl ester resin, a polyvinyl benzyl resin, an unsaturated polyester resin, a maleimide resin, or a ring may be used. Oxygen resin, polycyanate resin, phenol resin, etc., or known thermoplastic resins such as polystyrene, polyphenylene ether, polyetherimine, polyether oxime, PPS resin, polycyclopentadiene resin a polycycloolefin resin or the like, or a known thermoplastic elastomer such as a styrene-ethylene-propylene copolymer, a styrene-ethylene-butene copolymer, a styrene-butadiene copolymer, a styrene-different A pentadiene copolymer, a hydrogenated styrene-butadiene copolymer, a hydrogenated styrene-isoprene copolymer, or the like, or a rubber such as polybutadiene or polyisoprene may be blended together.

於本發明之硬化性樹脂組成物中,藉由併用熔融二氧化矽、結晶二氧化矽、氧化鋁、氮化矽、氮化鋁 等之無機質填充材、十溴二苯基乙烷、溴化聚苯乙烯等之難燃性賦予劑,可特別有用於使用作為要求介電特性或難燃性或是耐熱性之電氣或電子零件材料,尤其是半導體封合材料或電路基板用清漆。 In the curable resin composition of the present invention, by using molten cerium oxide, crystalline cerium oxide, aluminum oxide, cerium nitride, aluminum nitride Inorganic fillers, non-flammability imparting agents such as decabromodiphenylethane and brominated polystyrene, etc., may be particularly useful for use as electrical or electronic parts requiring dielectric properties or flame retardancy or heat resistance. Materials, especially varnishes for semiconductor sealing materials or circuit boards.

前述電路基板材料用清漆,可藉由將本發明之硬化性樹脂組成物溶解於甲苯、二甲苯、四氫呋喃、二氧戊環等之溶劑而製造出。前述電路基板材料,具體可列舉出印刷配線基板、印刷電路板、可撓性印刷配線板、增層配線板等。 The varnish for a circuit board material can be produced by dissolving the curable resin composition of the present invention in a solvent such as toluene, xylene, tetrahydrofuran or dioxolane. Specific examples of the circuit board material include a printed wiring board, a printed circuit board, a flexible printed wiring board, and a build-up wiring board.

使本發明之硬化性樹脂組成物硬化而得之硬化物,可使用作為成型物、層合物、注模物、黏著劑、塗膜、薄膜。例如,半導體封合材料的硬化物為注模物或成型物,得到該用途的硬化物之方法,可將該化合物注模,或是使用轉移成形機、射出成形機、壓縮成形機等來成形,並進一步在80~230℃中加熱0.5~10小時而得到硬化物。本發明之硬化性樹脂組成物,可使用活化能射線照射裝置,照射活化能射線而得到硬化物。在此,照射活化能射線使其硬化時所使用之光源的例子,例如可列舉出氙燈、碳極弧燈、殺菌燈、紫外線用螢光燈、影印用高壓汞燈、中壓汞燈、高壓汞燈、超高壓汞燈、無電極燈、金屬鹵化物燈,或是依據掃描型、帷幔型電子束加速路徑所形成之電子束等。此外,當藉由紫外線照射使本發明之硬化性樹脂組成物硬化時,硬化所需之紫外線照射量,可大約為300~40000mJ/cm2。為了充分地硬化樹脂組成物,較佳 是在氮氣等之惰性氣體氛圍氣中照射紫外線等之活化能射線。 The cured product obtained by curing the curable resin composition of the present invention can be used as a molded product, a laminate, an injection molded article, an adhesive, a coating film, and a film. For example, the cured product of the semiconductor sealing material is an injection molded article or a molded product, and a method of obtaining a cured product for the purpose can be injection molded, or formed by using a transfer molding machine, an injection molding machine, a compression molding machine, or the like. And further heating at 80 to 230 ° C for 0.5 to 10 hours to obtain a cured product. In the curable resin composition of the present invention, an active energy ray irradiation device can be used to irradiate an active energy ray to obtain a cured product. Here, examples of the light source used when the active energy ray is irradiated and hardened include, for example, a xenon lamp, a carbon arc lamp, a germicidal lamp, a fluorescent lamp for ultraviolet light, a high pressure mercury lamp for photocopying, a medium pressure mercury lamp, and a high voltage. A mercury lamp, an ultra-high pressure mercury lamp, an electrodeless lamp, a metal halide lamp, or an electron beam formed by a scanning type or a 电子-type electron beam acceleration path. Further, when the curable resin composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation required for curing may be approximately 300 to 40,000 mJ/cm 2 . In order to sufficiently harden the resin composition, it is preferred to irradiate an active energy ray such as ultraviolet rays in an inert gas atmosphere such as nitrogen.

此外,電路基板用清漆的硬化物為層合物,得到該硬化物之方法,可將電路基板用清漆含浸於玻璃纖維、碳纖維、聚酯纖維、聚醯胺纖維、氧化鋁纖維、紙等之基材並加熱乾燥而得到預浸材,並且單獨層合彼此或是與銅箔等之金屬箔層合,然後進行熱模壓成形而得到。 Further, the cured product of the varnish for a circuit board is a laminate, and the cured product is obtained by impregnating the circuit board with a varnish in glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper, or the like. The substrate is heated and dried to obtain a prepreg, and laminated separately or laminated with a metal foil such as copper foil, and then obtained by hot press molding.

此外,藉由調配鈦酸鋇等之無機高電介質粉末,或是肥粒鐵等之無機磁性體,可特別有用於作為電子零件用材料,尤其是高頻電子零件用材料。 Further, by blending an inorganic high dielectric powder such as barium titanate or an inorganic magnetic body such as ferrite iron, it is particularly useful as a material for electronic parts, particularly a material for high frequency electronic parts.

此外,本發明之硬化性樹脂組成物,與後述硬化複合材料相同,可與金屬箔(為包含金屬板之涵義,以下相同)貼合而使用。 In addition, the curable resin composition of the present invention can be used in the same manner as the hardened composite material described later, and can be bonded to a metal foil (which is the same as the metal plate, the same applies hereinafter).

接著說明本發明之硬化性樹脂組成物的硬化性複合材料及其硬化體。由本發明之硬化性樹脂組成物所構成之硬化性複合材料中,為了提高機械強度並增加尺寸穩定性而添加基材。 Next, the curable composite material of the curable resin composition of the present invention and a cured body thereof will be described. In the curable composite material composed of the curable resin composition of the present invention, a base material is added in order to improve mechanical strength and increase dimensional stability.

如此的基材,係有紗束布、布、切股氈、表面氈等之各種玻璃布、石綿布、金屬纖維布及其他合成或天然的無機纖維布;由全芳香族聚醯胺纖維、全芳香族聚酯纖維、聚苯并二噁唑纖維等之液晶纖維所得到之織布或不織布;由聚乙烯醇纖維、聚酯纖維、丙烯酸纖維等之合成纖維所得到之織布或不織布;棉布、麻布、纖維氈等之天然纖維布;碳纖維布、牛皮紙、棉紙、紙-玻璃混合纖 維紙等之天然纖維素系布等之布類、紙類等,此等可分別單獨使用或併用2種以上使用。 Such a substrate is provided with various glass cloths, asbestos cloths, metal fiber cloths and other synthetic or natural inorganic fiber cloths such as yarn bundle cloth, cloth, stranded felt, surface felt, etc.; from wholly aromatic polyamide fibers, all a woven or non-woven fabric obtained from a liquid crystal fiber such as an aromatic polyester fiber or a polybenzoxazole fiber; a woven or non-woven fabric obtained from a synthetic fiber such as polyvinyl alcohol fiber, polyester fiber or acrylic fiber; Natural fiber cloth such as linen, fiber mat, carbon fiber cloth, kraft paper, cotton paper, paper-glass hybrid fiber A cloth such as a natural cellulose-based cloth such as a crepe paper, a paper, or the like may be used alone or in combination of two or more.

基材所佔有之比率,於硬化性複合材料中為5~90wt%,較佳為10~80wt%,更佳為20~70wt%。當基材少於5wt%時,複合材料硬化後之尺寸穩定性或強度不足,此外,當基材多於90wt%時,複合材料的介電特性劣化,故不佳。 The ratio of the substrate is 5 to 90% by weight, preferably 10 to 80% by weight, more preferably 20 to 70% by weight in the curable composite material. When the substrate is less than 5% by weight, the dimensional stability or strength of the composite material after hardening is insufficient, and further, when the substrate is more than 90% by weight, the dielectric properties of the composite material are deteriorated, which is not preferable.

本發明之硬化性複合材料中,可因應必要,以改善樹脂與基材之界面上的黏著性者為目的而使用偶合劑。偶合劑可使用矽烷偶合劑、鈦酸酯偶合劑、鋁系偶合劑、鋁鋯偶合劑等之一般所用者。 In the curable composite material of the present invention, a coupling agent can be used for the purpose of improving the adhesion at the interface between the resin and the substrate as necessary. As the coupling agent, a general use of a decane coupling agent, a titanate coupling agent, an aluminum coupling agent, an aluminum zirconium coupling agent or the like can be used.

製造本發明之硬化性複合材料之方法,例如可列舉出將本發明之硬化性樹脂組成物與因應必要之其他成分均一地溶解或分散於前述芳香族系、酮系等溶劑或其混合溶劑中,並在含浸於基材後進行乾燥之方法。含浸可藉由浸漬(浸泡)、塗佈等來進行。含浸可因應必要重複進行複數次,此外,此時亦可使用組成或濃度不同之複數種溶液來重複進行含浸,而最終調整至所期望之樹脂組成及樹脂量。 In the method of producing the curable composite material of the present invention, for example, the curable resin composition of the present invention and other components as necessary are uniformly dissolved or dispersed in the aromatic solvent, the ketone solvent or the like or a mixed solvent thereof. And drying the method after impregnating the substrate. Impregnation can be carried out by dipping (soaking), coating, or the like. The impregnation may be repeated as many times as necessary. Further, at this time, the impregnation may be repeated using a plurality of solutions having different compositions or concentrations, and finally adjusted to a desired resin composition and resin amount.

藉由加熱等方法使本發明之硬化性複合材料硬化,藉此可得到硬化複合材料。該製造方法並無特別限定,例如可重疊複數片硬化性複合材料,在加熱加壓下黏著各層之間並同時進行熱硬化,而得到期望厚度之硬化複合材料。此外,亦可組合已黏著硬化之硬化複合材料與硬 化性複合材料而得到嶄新的層構成之硬化複合材料。層合成形與硬化,通常使用熱模壓等來同時進行,但兩者亦可分別單獨進行。亦即,可對預先進行層合成形所得到之未硬化或半硬化的複合材料,藉由熱處理或其他方法進行處理使其硬化。 The hardenable composite material of the present invention is cured by a method such as heating, whereby a hardened composite material can be obtained. The production method is not particularly limited. For example, a plurality of sheets of the curable composite material may be laminated, and the layers may be adhered to each other under heat and pressure while being thermally hardened to obtain a hardened composite material having a desired thickness. In addition, it is also possible to combine hardened hardened composite materials with hard A composite material is obtained to obtain a hardened composite material composed of a new layer. The layer formation and hardening are usually carried out simultaneously using hot molding or the like, but the two can also be carried out separately. That is, the uncured or semi-hardened composite material obtained by performing the layer formation in advance may be cured by heat treatment or other methods.

本發明之硬化性複合材料的成形及硬化,可在溫度:80~300℃、壓力:0.1~1000kg/cm2、時間:1分~10小時的範圍,較佳為溫度:150~250℃、壓力:1~500kg/cm2、時間:1分~5小時的範圍中進行。 The curing and hardening of the curable composite material of the present invention can be carried out at a temperature of 80 to 300 ° C, a pressure of 0.1 to 1000 kg/cm 2 , a time of 1 minute to 10 hours, preferably a temperature of 150 to 250 ° C, Pressure: 1 to 500 kg/cm 2 , time: 1 minute to 5 hours.

含有本發明之硬化性樹脂組成物之層合體,是由本發明之硬化複合材料的層與金屬箔的層所構成。在此所使用之金屬箔,例如可列舉出銅箔、鋁箔等。該厚度並無特別限定,可為3~200μm,尤佳為3~105μm的範圍。 The laminate containing the curable resin composition of the present invention is composed of a layer of the cured composite material of the present invention and a layer of a metal foil. Examples of the metal foil used herein include a copper foil, an aluminum foil, and the like. The thickness is not particularly limited and may be in the range of 3 to 200 μm, and more preferably in the range of 3 to 105 μm.

製造含有本發明之硬化性樹脂組成物之層合體之方法,例如可列舉出以因應目的之層構成,來層合以上所說明之由本發明之硬化性樹脂組成物與基材所得到之硬化性複合材料、以及金屬箔,然後在加熱加壓下黏著各層之間並同時進行熱硬化之方法。於本發明之硬化性樹脂組成物之層合體中,硬化複合材料及金屬箔可藉由任意的層構成來層合。金屬箔可用作為表層或中間層。除了上述之外,亦可重複進行複數次層合及硬化而形成多層化。 The method of producing the laminate containing the curable resin composition of the present invention, for example, laminates the curable property obtained from the curable resin composition of the present invention and the substrate described above in accordance with the layer constitution of the purpose. The composite material, as well as the metal foil, is then adhered between the layers under heat and pressure while simultaneously performing thermal hardening. In the laminate of the curable resin composition of the present invention, the hardened composite material and the metal foil may be laminated by any layer constitution. Metal foil can be used as the skin or intermediate layer. In addition to the above, a plurality of laminations and hardening may be repeated to form a multilayer.

與金屬箔之黏著,亦可使用黏著劑。黏著劑可列舉出環氧系、丙烯酸系、酚系、丙烯酸氰酯系等,但 並不特別限定於此等。上述層合成形及硬化,可在與本發明之硬化複合材料的製造為相同之條件下進行。 Adhesive can also be used for adhesion to metal foil. Examples of the adhesive include epoxy, acrylic, phenol, and cyanoacrylate, but It is not particularly limited to this. The above-mentioned layer formation and hardening can be carried out under the same conditions as in the production of the hardened composite material of the present invention.

由本發明之硬化性樹脂組成物所得到之薄膜,為將本發明之硬化性樹脂組成物成形為薄膜狀之硬化性薄膜,以及使其硬化之硬化薄膜。該厚度並無特別限定,可為3~200μm,尤佳為5~105μm的範圍。 The film obtained from the curable resin composition of the present invention is a cured film in which the curable resin composition of the present invention is formed into a film-like curable film and cured. The thickness is not particularly limited and may be in the range of 3 to 200 μm, and more preferably in the range of 5 to 105 μm.

製造本發明之薄膜之方法並無特別限定,例如可列舉出將硬化性樹脂組成物與因應必要之其他成分均一地溶解或分散於芳香族系、酮系等溶劑或其混合溶劑中,並塗佈於PET薄膜等之樹脂薄膜後進行乾燥之方法等。塗佈可因應必要重複進行複數次,此外,此時亦可使用組成或濃度不同之複數種溶液來重複進行塗佈,而最終調整至所期望之樹脂組成及樹脂量。硬化性薄膜,可因應用途於適用前或後進行硬化。 The method of producing the film of the present invention is not particularly limited, and for example, the curable resin composition and other components necessary for the preparation are uniformly dissolved or dispersed in a solvent such as an aromatic or ketone system or a mixed solvent thereof, and coated. A method of drying after coating a resin film such as a PET film. The coating may be repeated as many times as necessary. Further, in this case, the coating may be repeated using a plurality of solutions having different compositions or concentrations, and finally adjusted to a desired resin composition and resin amount. A hardenable film that can be hardened before or after application depending on the application.

使用本發明之硬化性樹脂組成物之附有樹脂的金屬箔,是由本發明之硬化性樹脂組成物與金屬箔所構成。在此所使用之金屬箔,例如可列舉出銅箔、鋁箔等。該厚度並無特別限定,可為3~200μm,尤佳為5~105μm的範圍。 The resin-attached metal foil using the curable resin composition of the present invention is composed of the curable resin composition of the present invention and a metal foil. Examples of the metal foil used herein include a copper foil, an aluminum foil, and the like. The thickness is not particularly limited and may be in the range of 3 to 200 μm, and more preferably in the range of 5 to 105 μm.

製造出使用本發明之硬化性樹脂組成物之附有樹脂的金屬箔之方法並無特別限定,例如可列舉出將硬化性樹脂組成物與因應必要之其他成分均一地溶解或分散於芳香族系、酮系等溶劑或其混合溶劑中,並塗佈於金屬箔後進行乾燥之方法等。塗佈可因應必要重複進行複數 次,此外,此時亦可使用組成或濃度不同之複數種溶液來重複進行塗佈,而最終調整至所期望之樹脂組成及樹脂量。 The method of producing the resin-attached metal foil using the curable resin composition of the present invention is not particularly limited, and for example, the curable resin composition and other components necessary for the preparation are uniformly dissolved or dispersed in the aromatic system. A method in which a solvent such as a ketone system or a mixed solvent thereof is applied to a metal foil and then dried. Coating can be repeated as necessary In addition, at this time, it is also possible to repeat the coating using a plurality of solutions having different compositions or concentrations, and finally adjust to the desired resin composition and resin amount.

使含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物硬化而製造光學物品及光學透鏡之方法,可較佳地使用加熱或活化能射線的照射之一般所用的方法,如後述般,可因應樹脂組成物的種類來適當地選擇,但較佳係在5分鐘以內使上述硬化性樹脂組成物硬化而製造硬化物之方法。具體而言,較佳係將該混合液投入於配合硬化物的形狀之模具,並在5分鐘以內使上述硬化性樹脂組成物硬化。藉由在短時間內使用模具進行硬化,可成為經濟性優異之方法。如此,係成為使上述硬化性樹脂組成物硬化而製造光學物品及光學透鏡之方法。 The method of producing an optical article and an optical lens by curing the curable resin composition containing the benzyl ether compound of the bis(meth)acryl fluorenyl group of the present invention can be preferably used by heating or activation of energy rays. The method of the resin composition can be appropriately selected depending on the type of the resin composition, but it is preferably a method of curing the curable resin composition within 5 minutes to produce a cured product. Specifically, it is preferred to apply the mixed liquid to a mold having a shape of a cured product, and to cure the curable resin composition within 5 minutes. By using a mold for hardening in a short time, it is an economically excellent method. In this manner, the curable resin composition is cured to produce an optical article and an optical lens.

當上述硬化時間(使用模具之硬化時間)超過5分鐘時,生產性會惡化。尤佳為3分鐘以內,更佳為2分鐘以內,最佳為1分鐘以內。藉由加熱來硬化時,硬化溫度可因應所硬化之樹脂組成物等來適當地設定,較佳為80~250℃。尤佳為100~220℃,更佳為120~200℃。含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物,亦可藉由照射紫外線等之活化能射線而得到硬化物。在此,在將紫外線等之活化能射線照射在本發明之光學物品及光學透鏡的成形所使用之硬化性樹脂組成物使其硬化時所使用之光源的具體例,例如可列舉出氙 燈、碳極弧燈、殺菌燈、紫外線用螢光燈、影印用高壓汞燈、中壓汞燈、高壓汞燈、超高壓汞燈、無電極燈、金屬鹵化物燈,或是依據掃描型、帷幔型電子束加速路徑所形成之電子束等。此外,當藉由紫外線照射使本發明之樹脂組成物硬化時,硬化所需之紫外線照射量,可大約為300~30,000mJ/cm2。為了充分地硬化本發明之樹脂組成物,較佳是在氮氣等之惰性氣體氛圍氣中照射紫外線等之活化能射線。 When the above hardening time (hardening time using a mold) exceeds 5 minutes, productivity is deteriorated. It is preferably less than 3 minutes, more preferably less than 2 minutes, and most preferably less than 1 minute. When hardening by heating, the hardening temperature can be appropriately set in accordance with the cured resin composition or the like, and is preferably 80 to 250 °C. It is preferably 100 to 220 ° C, more preferably 120 to 200 ° C. The curable resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention may be obtained by irradiating an active energy ray such as ultraviolet rays. Here, a specific example of the light source used when the curable energy ray such as ultraviolet rays is applied to the curable resin composition used for molding the optical article and the optical lens of the present invention is, for example, a xenon lamp or carbon. Pole arc lamp, germicidal lamp, ultraviolet fluorescent lamp, high pressure mercury lamp for photocopying, medium pressure mercury lamp, high pressure mercury lamp, ultra high pressure mercury lamp, electrodeless lamp, metal halide lamp, or according to scanning type An electron beam or the like formed by an electron beam acceleration path. Further, when the resin composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation required for hardening may be about 300 to 30,000 mJ/cm 2 . In order to sufficiently harden the resin composition of the present invention, it is preferred to irradiate an active energy ray such as ultraviolet rays in an inert gas atmosphere such as nitrogen.

於含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物中,如上述般使用模具在5分鐘以內硬化後,較佳從模具中取出硬化物以進行後硬化(烘烤)。藉由進行後硬化,可使硬化物具有充分的硬度,而能夠較佳地使用在各種用途。此外,於後硬化中,從使具有某種程度的硬化物進一步硬化之觀點來看,其處理性亦佳。因此,由於可不使用模具,故具有能夠以小面積使大量的製品進行後硬化之優點。 In the curable resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention, after hardening within 5 minutes using a mold as described above, it is preferred to remove the cured product from the mold for post-hardening. (bake). By performing post-hardening, the cured product can have sufficient hardness, and can be preferably used in various applications. Further, in the post-curing, the handleability is also good from the viewpoint of further curing the cured product to some extent. Therefore, since the mold can be omitted, there is an advantage that a large number of products can be post-hardened in a small area.

於上述後硬化中,硬化溫度及硬化時間可因應所硬化之樹脂組成物等來適當地選擇。例如,硬化溫度較佳為80~200℃。尤佳為100~180℃,更佳為110~150℃。後硬化的硬化時間雖與硬化溫度相依,但較佳為1~48小時。尤佳為1~10小時,更佳為1~5小時。 In the post-hardening, the hardening temperature and the hardening time can be appropriately selected in accordance with the cured resin composition or the like. For example, the hardening temperature is preferably from 80 to 200 °C. It is preferably 100 to 180 ° C, more preferably 110 to 150 ° C. Although the hardening time of the post-hardening depends on the hardening temperature, it is preferably from 1 to 48 hours. It is preferably 1 to 10 hours, more preferably 1 to 5 hours.

含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物,可藉由上述硬化方法而得到硬化之光學物品,該硬化之光學物品係成為各種光學特 性優異之光學物品及光學透鏡。例如使用含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物之光學物品的濁度(霧度),較佳為2%以下。如此,上述使用含有本發明之雙(甲基)丙烯醯基末端之苄醚化合物之硬化性樹脂組成物之光學物品的濁度為2%以下之樹脂組成物,亦為本發明較佳形態之一。 The curable resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention can obtain a cured optical article by the above-mentioned curing method, and the cured optical article becomes various optical specialties. Excellent optical articles and optical lenses. For example, the haze (haze) of the optical article using the curable resin composition containing the benzyl ether compound of the bis(meth)acryl oxime group of the present invention is preferably 2% or less. Thus, the resin composition using the curable resin composition containing the curable resin composition of the bis(meth)acryl fluorenyl terminal benzyl ether compound of the present invention having a haze of 2% or less is also a preferred embodiment of the present invention. One.

硬化之光學物品的濁度較佳為2%以下,尤佳為2%以下,更佳為1%以下,特佳為0.7%以下。作為透明性,其可見光區域(波長450~780nm的區域)的光穿透率較佳為85%以上。硬化物的光穿透率尤佳為87%以上,更佳為88%以上,特佳為89%以上。 The turbidity of the cured optical article is preferably 2% or less, more preferably 2% or less, still more preferably 1% or less, and particularly preferably 0.7% or less. As the transparency, the light transmittance in the visible light region (the region having a wavelength of 450 to 780 nm) is preferably 85% or more. The light transmittance of the cured product is particularly preferably 87% or more, more preferably 88% or more, and particularly preferably 89% or more.

上述光學物品的用途,具體而言,較佳有眼鏡鏡片、(數位)相機或行動電話或車用照相機等之照相機鏡頭、濾鏡、繞射光柵、稜鏡、光導件、光束聚光透鏡或光擴散用透鏡、觀景窗、顯示裝置用的保護玻璃等之透明玻璃或保護玻璃等的光學用途;光感測器、光開關、LED、發光元件、光導波管、合波器、分波器、斷路器、光分割器、光纖黏著劑等之光學裝置用途;LCD或有機EL或PDP等之顯示元件用基板、彩色濾光片用基板、觸控面板用基板、顯示器保護膜、顯示器背光、導光板、抗反射膜、防霧膜等之顯示裝置用途等。 The use of the above optical article, specifically, a lens lens, a (digital) camera, a camera lens such as a mobile phone or a car camera, a filter, a diffraction grating, a cymbal, a light guide, a beam concentrating lens or Optical applications such as transparent glass or protective glass for lenses for light diffusion, viewing windows, and protective glass for display devices; optical sensors, optical switches, LEDs, light-emitting elements, optical waveguides, multiplexers, and demultiplexers Optical device use such as a device, a circuit breaker, a light splitter, or a fiber-optic adhesive; a substrate for a display element such as an LCD or an organic EL or a PDP, a substrate for a color filter, a substrate for a touch panel, a display protective film, and a display backlight , display devices such as light guide plates, anti-reflection films, and anti-fog films, etc.

[實施例] [Examples]

以下係藉由實施例來說明本發明,但本發明 並不限定於此等。各例中的份均為重量份。此外,實施例中的測定結果係藉由以下所示之方法來進行試樣調製及測定。 The invention is illustrated by the following examples, but the invention It is not limited to this. The parts in each case are parts by weight. Further, in the measurement results in the examples, sample preparation and measurement were carried out by the method shown below.

1)芳香族雙鹵甲基化合物、及雙(甲基)丙烯醯基末端之苄醚化合物的GPC純度 1) GPC purity of aromatic dihalomethyl compound and benzyl ether compound at the end of bis(meth)acrylonitrile

分子量及分子量分布測定,係使用GPC(Tosoh公司製,HLC-8120GPC),以溶劑:四氫呋喃(THF)、流量:1.0ml/min、管柱溫度40℃之條件來進行。並從以UV檢測器(波長:254nm)所檢測之各峰值的面積比來算出。分子量係使用單分散聚苯乙烯的檢量線,並作為經聚苯乙烯的分子量來進行測定。 The molecular weight and molecular weight distribution were measured by using GPC (HLC-8120GPC, manufactured by Tosoh Corporation) under the conditions of a solvent: tetrahydrofuran (THF), a flow rate of 1.0 ml/min, and a column temperature of 40 °C. It was calculated from the area ratio of each peak detected by a UV detector (wavelength: 254 nm). The molecular weight was measured using a calibration curve of monodisperse polystyrene and measured by the molecular weight of polystyrene.

2)芳香族雙鹵甲基化合物、及雙(甲基)丙烯醯基末端之苄醚化合物的結構 2) Structure of aromatic dihalomethyl compound and benzyl ether compound at the end of bis(meth)acrylonitrile

使用日本電子公司製的JNM-LA600型核磁共振分光裝置,藉由13C-NMR及1H-NMR分析來決定。溶劑使用三氯甲烷-d1。並使用NMR測定溶劑的四氯乙烷-d2的共振線作為內部標準。 The JNM-LA600 type nuclear magnetic resonance spectroscopic device manufactured by JEOL Ltd. was determined by 13 C-NMR and 1 H-NMR analysis. The solvent used was chloroform-d 1 . The resonance line of tetrachloroethane-d 2 of the solvent was measured by NMR as an internal standard.

3)黏度 3) Viscosity

使用E型黏度計,於25℃的溫度進行測定。 The measurement was carried out at a temperature of 25 ° C using an E-type viscometer.

4)介電常數及介電正切 4) Dielectric constant and dielectric tangent

使硬化性樹脂組成物清漆流入於夾持0.2mm厚的間隔材之2片玻璃板之間,藉由具備有高壓汞燈之UV照射裝置,以照射強度:30mW/cm2、UV照射量:6,000mJ/cm2進行UV硬化。然後在200℃的烤爐中,對進行UV硬化所得之平板樣本進行30分鐘的後烘烤,並對所得之硬化物平板測定諸項特性。此外,將該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,依據JIS C2565規格,藉由AET股份有限公司製的空孔共振器法介電常數測定裝置,於絕對乾燥後23℃,在濕度50%的室內中放置24小時後,測定2.0GHz的介電常數及介電正切。 The curable resin composition varnish was poured between two glass plates sandwiching a spacer having a thickness of 0.2 mm, and was irradiated with a UV irradiation device having a high-pressure mercury lamp at an irradiation intensity of 30 mW/cm 2 and a UV irradiation amount: UV hardening was performed at 6,000 mJ/cm 2 . Then, the flat plate sample obtained by UV hardening was post-baked in an oven at 200 ° C for 30 minutes, and the properties of the obtained cured plate were measured. In addition, a flat plate-shaped cured product having a thickness of 0.2 mm was cut into a size of 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant measuring device made of a hole-resonator method manufactured by AET Co., Ltd. was used in absolute terms in accordance with JIS C2565. After drying at 23 ° C for 24 hours in a room with a humidity of 50%, the dielectric constant and dielectric tangent of 2.0 GHz were measured.

5)線膨脹係數(CTE)及玻璃轉移溫度(Tg)測定用試驗片的調製及測定 5) Modulation and measurement of test piece for measuring linear expansion coefficient (CTE) and glass transition temperature (Tg)

使硬化性樹脂組成物流入於由中介存在有矽橡膠製的200μm厚的間隔材之2片玻璃板所構成之模具之間,製作出注模樣本,於減壓下去除氣泡。然後對於熱硬化型樣本,將注模樣本設置在氮氣氣流下的惰性氣體烤爐中,於15分鐘間階段性地升溫後,於200℃進行60分鐘的熱硬化。另一方面,對於UV硬化型樣本,使用輸送帶式UV照射裝置,以UV照射量:6,000mJ/cm2進行UV硬化。對於熱硬化型樣本及UV硬化型樣本,均在空氣氣流下,使用惰性氣體烤爐於200℃進行30分鐘的後硬化。從所得之200μm厚的平板中,製作出3mm寬的平板樣本,並使 用作為CTE測定(TMA法)及Tg測定(DMA法)用的試驗片。 The curable resin composition was placed between two molds of a glass plate having a 200 μm-thick spacer made of ruthenium rubber, and an injection molded sample was produced, and the bubbles were removed under reduced pressure. Then, for the thermosetting sample, the injection molded sample was placed in an inert gas oven under a nitrogen gas stream, and the temperature was gradually increased in 15 minutes, followed by thermal hardening at 200 ° C for 60 minutes. On the other hand, for the UV-curable sample, UV curing was performed using a conveyor belt type UV irradiation device at a UV irradiation amount of 6,000 mJ/cm 2 . For the thermosetting sample and the UV-curing sample, post-hardening was carried out at 200 ° C for 30 minutes under an air flow using an inert gas oven. A flat sample of 3 mm width was prepared from the obtained 200 μm-thick flat plate, and a test piece for CTE measurement (TMA method) and Tg measurement (DMA method) was used.

CTE測定(TMA法),係將由上述方法所製作之試驗片設置在TMA(熱機械分析裝置)測定裝置的分析用探針,並在氮氣氣流下,以升溫速度10℃/分從30℃掃描至360℃來進行測定,並求取0~40℃的溫度範圍內之平均線膨脹係數。 The CTE measurement (TMA method) is a test piece prepared by the above method, and is placed in an analysis probe of a TMA (thermomechanical analysis device) measuring device, and scanned at a temperature rising rate of 10 ° C / min from 30 ° C under a nitrogen gas stream. The measurement was carried out at 360 ° C, and the average linear expansion coefficient in the temperature range of 0 to 40 ° C was obtained.

另一方面,由上述方法所製作之硬化試驗片的測定,係使用動態黏彈性測定裝置,以升溫速度2℃/分進行測定,並從損失彈性率的峰值來決定。 On the other hand, the measurement of the hardened test piece produced by the above method was carried out at a temperature increase rate of 2 ° C/min using a dynamic viscoelasticity measuring device, and was determined from the peak value of the loss elastic modulus.

6)難燃性的測定 6) Determination of flame retardancy

於製作線膨脹係數(CTE)及玻璃轉移溫度(Tg)測定用試驗片時,係使用從製作出之平板進行取樣後的硬化樣本,並使用TGA(熱天秤)測定裝置,在氮氣氣流下,以升溫速度10℃/分從30℃掃描至600℃來進行測定,並從550℃中的炭(碳化物)生成量中,如下述方式求取難燃性。 In the case of producing a test piece for measuring a coefficient of linear expansion (CTE) and a glass transition temperature (Tg), a hardened sample sampled from the produced flat plate was used, and a TGA (heat scale) measuring device was used under a nitrogen gas flow. The measurement was carried out by scanning from 30 ° C to 600 ° C at a temperature increase rate of 10 ° C /min, and from the carbon (carbide) formation amount at 550 ° C, flame retardancy was determined as follows.

難燃性A:炭生成量>40wt% Flame retardant A: char production >40wt%

難燃性B:25wt%<炭生成量≦40wt% Flame retardant B: 25wt% < char production ≦ 40wt%

難燃性C:18wt%<炭生成量≦25wt% Flame retardant C: 18wt% < char production ≦ 25wt%

難燃性D:10wt%<炭生成量≦18wt% Flame retardancy D: 10wt% < char production ≦ 18wt%

難燃性E:炭生成量≦10wt% Flame retardant E: carbon production ≦ 10wt%

7)YI、Haze及總透光率的測定 7) Determination of YI, Haze and total light transmittance

YI、Haze及總透光率的測定,係使調製出之硬化性樹脂組成物清漆流入於夾持1.0mm厚的間隔材之2片玻璃板之間,藉由具備有高壓汞燈之UV照射裝置,以照射強度:30mW/cm2、UV照射量:6,000mJ/cm2進行UV硬化。然後在200℃的烤爐中,對進行UV硬化所得之平板樣本進行30分鐘的後烘烤,並使用濁度計及色差計,對所得之硬化物平板進行測定。 YI, Haze, and total light transmittance were measured by flowing the prepared curable resin composition varnish into between two glass plates sandwiching a 1.0 mm thick spacer by UV irradiation with a high pressure mercury lamp. means an irradiation intensity: 30mW / cm 2, UV irradiation amount: 6,000mJ / cm 2 for UV curing. Then, the flat plate sample obtained by UV hardening was post-baked in an oven at 200 ° C for 30 minutes, and the obtained cured plate was measured using a turbidimeter and a color difference meter.

8)折射率及阿貝數的測定 8) Determination of refractive index and Abbe number

折射率及阿貝數的測定,係使調製出之硬化性樹脂組成物清漆流入於夾持1.0mm厚的間隔材之2片玻璃板之間,藉由具備有高壓汞燈之UV照射裝置,以照射強度:30mW/cm2、UV照射量:6,000mJ/cm2進行UV硬化。然後在200℃的烤爐中,對進行UV硬化所得之平板樣本進行30分鐘的後烘烤,而得到硬化物平板。對所得之硬化物平板的端面進行稜鏡加工,於真空乾燥器中,在60℃乾燥5小時後,於20℃、60%RH之恆溫恆濕器的槽內放置2天以上,以進行狀態調節。使用Karunyu折射率計KPR-2000(Shimadzu Device公司製),於25℃測定折射率,並從所得之折射率資料算出阿貝數。 The refractive index and the Abbe number are measured by flowing the prepared curable resin composition varnish into between two glass plates sandwiching a spacer having a thickness of 1.0 mm, and a UV irradiation device having a high-pressure mercury lamp is used. UV hardening was performed with an irradiation intensity: 30 mW/cm 2 and a UV irradiation amount: 6,000 mJ/cm 2 . Then, the flat plate sample obtained by UV hardening was post-baked in an oven at 200 ° C for 30 minutes to obtain a cured plate. The end surface of the obtained cured flat plate was subjected to mash processing, and dried in a vacuum desiccator at 60 ° C for 5 hours, and then placed in a tank of a thermo-hygrostat at 20 ° C and 60% RH for 2 days or more to carry out the state. Adjustment. The refractive index was measured at 25 ° C using a Karunyu refractometer KPR-2000 (manufactured by Shimadzu Device Co., Ltd.), and the Abbe number was calculated from the obtained refractive index data.

9)成形性 9) Formability

將硬化性樹脂組成物的未硬化薄膜,層合於對銅箔光 澤面進行黑化處理之覆銅層合板(銅箔層/芯層=35μm/300μm)之進行黑化處理後的銅箔面上,使用真空疊合機,在溫度:110℃、模壓:0.1MPa下進行真空疊合,並藉由黑化處理銅箔與薄膜之黏著狀態來進行評估。評估,係以黑化處理銅箔與薄膜之黏著狀態良好者為「○」,以黑化處理銅箔與薄膜可容易剝離之黏著狀態者為「×」。 An uncured film of a curable resin composition laminated to a copper foil The surface of the copper foil after blackening treatment of the copper-clad laminate (copper layer/core layer=35 μm/300 μm) of the blackening treatment was carried out using a vacuum laminator at a temperature of 110 ° C and a molding pressure of 0.1. Vacuum lamination was carried out at MPa, and evaluation was carried out by blackening the adhesion state of the copper foil to the film. In the evaluation, the adhesion state of the copper foil and the film by the blackening treatment is "○", and the adhesion state in which the copper foil and the film are easily peeled off by the blackening treatment is "x".

實施例1 Example 1

將9,9-雙(4-羥苯基)茀140.16g(0.40莫耳)、4,4'-雙(氯甲基)聯苯141.40g(0.88莫耳)、及丙酮1200ml加入於反應容器,一邊攪拌一邊升溫至78℃。接著在30分鐘間將KOH-MeOH(KOH:0.88莫耳)滴入於保持在78℃之反應容器。滴入結束後,再於78℃持續攪拌4h。4h後冷卻至室溫,加入甲苯900ml,再加入10% HCl以進行中和。然後將水相分液而分離,並以水300ml進行分液洗淨3次。 Adding 9,9-bis(4-hydroxyphenyl)fluorene 140.16 g (0.40 mol), 4,4'-bis(chloromethyl)biphenyl 141.40 g (0.88 mol), and acetone 1200 ml to the reaction vessel The temperature was raised to 78 ° C while stirring. Next, KOH-MeOH (KOH: 0.88 mol) was dropped into the reaction vessel maintained at 78 ° C for 30 minutes. After the completion of the dropwise addition, stirring was continued at 78 ° C for 4 hours. After 4 h, it was cooled to room temperature, 900 ml of toluene was added, and then 10% HCl was added for neutralization. Then, the aqueous phase was separated and separated, and the mixture was washed three times with 300 ml of water.

藉由對所得之有機相進行蒸餾而濃縮,加入甲醇以使生成物再沉澱。對沉澱物進行過濾及乾燥而得到9,9-雙(4-羥苯基)茀與4,4'-雙(氯甲基)聯苯的反應生成物之芳香族雙氯甲基化合物A(2CM-DMBP-BPFZ)169.33g。所得到之2CM-DMBP-BPFZ為白色粉體。 The organic phase obtained was concentrated by distillation, and methanol was added to reprecipitate the product. The precipitate is filtered and dried to obtain an aromatic dichloromethyl compound A of a reaction product of 9,9-bis(4-hydroxyphenyl)anthracene and 4,4'-bis(chloromethyl)biphenyl ( 2CM-DMBP-BPFZ) 169.33g. The obtained 2CM-DMBP-BPFZ was a white powder.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認。其結果為:1)從GPC測定結果中,可得知在所回 收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,2)從IR測定結果中,可得知來自酚性羥基之峰值減少,3)於1H-NMR測定結果中,可確認到來自4,4'-雙(氯甲基)聯苯的氯甲基之質子的共振射線減少,取而代之的是在5.02ppm附近生成來自苄醚之質子的共振射線,故可確認得到芳香族雙氯甲基化合物A(2CM-DMBP-BPFZ)。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR). As a result, 1) from the GPC measurement results, it was found that the peak of the raw material disappeared in the recovered reaction product, and a new peak was generated on the high molecular weight side, and 2) the IR measurement result was known. The peak from the phenolic hydroxyl group was reduced, and 3) in the 1 H-NMR measurement, it was confirmed that the resonance ray of the proton of the chloromethyl group derived from 4,4'-bis(chloromethyl)biphenyl was reduced, and instead A resonance ray from a proton of benzyl ether was formed in the vicinity of 5.02 ppm, and thus it was confirmed that an aromatic bischloromethyl compound A (2CM-DMBP-BPFZ) was obtained.

第1圖係顯示2CM-DMBP-BPFZ及原料之9,9-雙(4-羥苯基)茀的GPC圖之GPC圖。2CM-DMBP-BPFZ係以實線表示,9,9-雙(4-羥苯基)茀以虛線表示。 Fig. 1 is a GPC chart showing the GPC chart of 2,9-bis(4-hydroxyphenyl)fluorene of 2CM-DMBP-BPFZ and a raw material. 2CM-DMBP-BPFZ is indicated by a solid line, and 9,9-bis(4-hydroxyphenyl)anthracene is indicated by a broken line.

從第1圖之2CM-DMBP-BPFZ的GPC溶出曲線中,原料之9,9-雙(4-羥苯基)茀的峰值消失,可得知其往高分子量側移位。 From the GPC elution curve of 2CM-DMBP-BPFZ in Fig. 1, the peak of 9,9-bis(4-hydroxyphenyl)fluorene of the starting material disappeared, and it was found that it shifted to the high molecular weight side.

2CM-DMBP-BPFZ之n=1以上的成分之GPC純度(面積比)如下所述。 The GPC purity (area ratio) of the component of nCM = 1 or more of 2CM-DMBP-BPFZ is as follows.

n=1成分:7.8% n=1 component: 7.8%

n=2成分:27.2% n=2 component: 27.2%

n=3成分:30.6% n=3 component: 30.6%

n=4成分:18.2% n=4 component: 18.2%

n=5以上的成分:15.1% Composition with n=5 or more: 15.1%

其他成分(低分子量成分):1.2% Other ingredients (low molecular weight ingredients): 1.2%

此外,進行2CM-DMBP-BPFZ的TGA測定時,於TGA測定結果中的示差熱分析(DTA)曲線中,於220℃與271℃觀察到放熱峰值。此外,於220℃的放 熱峰值中觀察到0.75wt%,於271℃的放熱峰值中觀察到4.88wt%的重量減少。此外,於600℃中的碳化物生成量為62.2wt%。 Further, in the TGA measurement of 2CM-DMBP-BPFZ, an exothermic peak was observed at 220 ° C and 271 ° C in the differential thermal analysis (DTA) curve in the TGA measurement results. In addition, at 220 ° C 0.75 wt% was observed in the heat peak, and a weight loss of 4.88 wt% was observed in the exothermic peak at 271 °C. Further, the amount of carbide formation at 600 ° C was 62.2% by weight.

實施例2 Example 2

將9,9-雙(4-羥苯基)茀140.16g(0.40莫耳)、α,α'-二氯對二甲苯157.20g(0.88莫耳)、及MEK 1200ml加入於反應容器,一邊攪拌一邊升溫至78℃。接著在30分鐘間將KOH-MeOH(KOH:0.88莫耳)滴入於保持在78℃之反應容器。滴入結束後,再於78℃持續攪拌4h。4h後冷卻至室溫,加入甲苯900ml,再加入10% HCl以進行中和。然後將水相分液而分離,並以水300ml進行分液洗淨3次。 9,9-bis(4-hydroxyphenyl)fluorene 140.16 g (0.40 mol), α,α'-dichloro-p-xylene 157.20 g (0.88 mol), and MEK 1200 ml were added to the reaction vessel while stirring. The temperature was raised to 78 ° C. Next, KOH-MeOH (KOH: 0.88 mol) was dropped into the reaction vessel maintained at 78 ° C for 30 minutes. After the completion of the dropwise addition, stirring was continued at 78 ° C for 4 hours. After 4 h, it was cooled to room temperature, 900 ml of toluene was added, and then 10% HCl was added for neutralization. Then, the aqueous phase was separated and separated, and the mixture was washed three times with 300 ml of water.

藉由對所得之有機相進行蒸餾而濃縮,加入甲醇以使生成物再沉澱。對沉澱物進行過濾及乾燥而得到9,9-雙(4-羥苯基)茀與α,α'-二氯對二甲苯的反應生成物之芳香族雙氯甲基化合物B(2CM-Xy-BPFZ)123.57g。 The organic phase obtained was concentrated by distillation, and methanol was added to reprecipitate the product. The precipitate was filtered and dried to obtain an aromatic dichloromethyl compound B (2CM-Xy) of a reaction product of 9,9-bis(4-hydroxyphenyl)phosphonium with α,α'-dichloro-p-xylene. -BPFZ) 123.57g.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認。其結果為:1)從GPC測定結果中,可得知在所回收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,2)從IR測定結果中,可得知來自酚性羥基之峰值減少,3)於1H-NMR測定結果中,可確認到來自α,α'-二氯對二甲苯的氯甲基之質子的共振射線減少, 取而代之的是在5.02ppm附近生成來自苄醚之質子的共振射線,故可確認得到芳香族雙氯甲基化合物B(2CM-Xy-BPFZ)。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR). As a result, 1) from the GPC measurement results, it was found that the peak of the raw material disappeared in the recovered reaction product, and a new peak was generated on the high molecular weight side, and 2) the IR measurement result was known. The peak from the phenolic hydroxyl group was decreased, and 3) in the 1 H-NMR measurement, it was confirmed that the resonance ray of the proton of the chloromethyl group derived from α,α'-dichloro-p-xylene was reduced, and was replaced by 5.02 ppm. A resonance ray from a proton of benzyl ether was formed in the vicinity, and thus it was confirmed that an aromatic bischloromethyl compound B (2CM-Xy-BPFZ) was obtained.

第2圖係顯示2CM-Xy-BPFZ及原料之9,9-雙(4-羥苯基)茀的GPC圖之GPC圖。2CM-Xy-BPFZ係以實線表示,9,9-雙(4-羥苯基)茀以虛線表示。 Fig. 2 is a GPC chart showing the GPC chart of 2,9-bis(4-hydroxyphenyl)fluorene of 2CM-Xy-BPFZ and a raw material. 2CM-Xy-BPFZ is indicated by a solid line, and 9,9-bis(4-hydroxyphenyl)anthracene is indicated by a broken line.

從第2圖的GPC溶出曲線中,原料之9,9-雙(4-羥苯基)茀的峰值消失,可得知其往高分子量側移位。此外,2CM-Xy-BPFZ之n=1以上的成分之GPC純度如下所述。 From the GPC elution curve in Fig. 2, the peak of 9,9-bis(4-hydroxyphenyl)fluorene of the starting material disappeared, and it was found that it shifted to the high molecular weight side. Further, the GPC purity of the component of nCM or more of 2CM-Xy-BPFZ is as follows.

n=1成分:36.3% n=1 component: 36.3%

n=2成分:28.5% n=2 component: 28.5%

n=3成分:19.6% n=3 component: 19.6%

n=4成分:10.6% n=4 component: 10.6%

n=5以上的成分:4.1% Composition with n=5 or more: 4.1%

其他成分(低分子量成分):0.9% Other ingredients (low molecular weight ingredients): 0.9%

進行2CM-Xy-BPFZ的TGA測定時,於TGA測定結果中的示差熱分析(DTA)曲線中,於219℃與268℃觀察到放熱峰值。此外,於219℃的放熱峰值中觀察到0.81wt%,於271℃的放熱峰值中觀察到5.21wt%的重量減少。此外,於600℃中的碳化物生成量為57.8wt%。 When the TGA measurement of 2CM-Xy-BPFZ was carried out, an exothermic peak was observed at 219 ° C and 268 ° C in the differential thermal analysis (DTA) curve in the TGA measurement results. Further, 0.81% by weight was observed in the exothermic peak at 219 ° C, and a weight loss of 5.21% by weight was observed in the exothermic peak at 271 ° C. Further, the amount of carbide formation at 600 ° C was 57.8 wt%.

實施例3 Example 3

將碳酸鉀15.28g(0.11莫耳)及N,N-二甲基甲醯胺 (DMF)500ml加入於反應容器,並進行加熱攪拌。一旦反應容器的內溫到達80℃,於30分鐘間將在DMF 50ml中溶解有甲基丙烯酸19.13g(0.22莫耳)之溶液滴入。維持該溫度以進行1小時的反應。接著於30分鐘間將在DMF 500ml中溶解有實施例1中所得之2CM-DMBP-BPFZ 58.27g之溶液滴入。滴入結束後,再於80℃持續攪拌3h。3h後冷卻至室溫,並過濾固體的析出物。然後將甲苯2000ml加入於反應溶液。之後以水洗淨反應溶液4次,以硫酸鎂使油相乾燥並進行過濾。對於所得之有機相,藉由水/甲醇之混合溶劑使生成物再沉澱。 Potassium carbonate 15.28g (0.11 mole) and N,N-dimethylformamide (DMF) 500 ml was added to the reaction vessel and heated and stirred. Once the internal temperature of the reaction vessel reached 80 ° C, a solution of 19.13 g (0.22 mol) of methacrylic acid dissolved in 50 ml of DMF was added dropwise over 30 minutes. This temperature was maintained to carry out a reaction for 1 hour. Next, a solution in which 2CM-DMBP-BPFZ 58.27 g obtained in Example 1 was dissolved in 500 ml of DMF was dropped over 30 minutes. After the completion of the dropwise addition, stirring was continued at 80 ° C for 3 hours. After 3 h, it was cooled to room temperature, and the solid precipitate was filtered. Then, 2000 ml of toluene was added to the reaction solution. Thereafter, the reaction solution was washed with water four times, and the oil phase was dried with magnesium sulfate and filtered. With respect to the obtained organic phase, the product was reprecipitated by a water/methanol mixed solvent.

對沉澱物進行過濾及乾燥,而得到2CM-DMBP-BPFZ與甲基丙烯酸的反應生成物之2MA-DMBP-BPFZ 52.64g。 The precipitate was filtered and dried to obtain 2MA-DMBP-BPFZ 52.64 g of a reaction product of 2CM-DMBP-BPFZ and methacrylic acid.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認。其結果為:1)從GPC測定結果中,可得知在所回收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,2)從IR測定結果中,可得知生成羰基,並且於1H-NMR中,可確認到具有來自甲基丙烯酸基之質子的共振射線,故可確認得到2MA-DMBP-BPFZ。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR). As a result, 1) from the GPC measurement results, it was found that the peak of the raw material disappeared in the recovered reaction product, and a new peak was generated on the high molecular weight side, and 2) the IR measurement result was known. When a carbonyl group was formed and a resonance ray having a proton derived from a methacrylic group was confirmed in 1 H-NMR, 2MA-DMBP-BPFZ was confirmed.

實施例4 Example 4

將碳酸鉀14.59g(0.105莫耳)及N,N-二甲基甲醯胺(DMF)500ml加入於反應容器,並進行加熱攪拌。一旦反應容器的內溫到達80℃,於30分鐘間將在DMF 50ml 中溶解有甲基丙烯酸18.26g(0.21莫耳)之溶液滴入。維持該溫度以進行1小時的反應。接著於30分鐘間將在DMF 500ml中溶解有實施例2中所得之2CM-Xy-BPFZ 62.76g之溶液滴入。滴入結束後,再於80℃持續攪拌3h。3h後冷卻至室溫,並過濾固體的析出物。然後將甲苯2000ml加入於反應溶液。之後以水洗淨反應溶液4次,以硫酸鎂使油相乾燥並進行過濾。對於所得之有機相,藉由水/甲醇之混合溶劑使生成物再沉澱。 To the reaction vessel, 14.59 g (0.105 mol) of potassium carbonate and 500 ml of N,N-dimethylformamide (DMF) were added and heated and stirred. Once the internal temperature of the reaction vessel reaches 80 ° C, it will be 50 ml in DMF in 30 minutes. A solution in which 18.26 g (0.21 mol) of methacrylic acid was dissolved was dropped. This temperature was maintained to carry out a reaction for 1 hour. Then, a solution in which 2CM-Xy-BPFZ 62.76 g obtained in Example 2 was dissolved in 500 ml of DMF was added dropwise over 30 minutes. After the completion of the dropwise addition, stirring was continued at 80 ° C for 3 hours. After 3 h, it was cooled to room temperature, and the solid precipitate was filtered. Then, 2000 ml of toluene was added to the reaction solution. Thereafter, the reaction solution was washed with water four times, and the oil phase was dried with magnesium sulfate and filtered. With respect to the obtained organic phase, the product was reprecipitated by a water/methanol mixed solvent.

對沉澱物進行過濾及乾燥,而得到2CM-Xy-BPFZ與甲基丙烯酸的反應生成物之2MA-Xy-BPFZ 69.53g。 The precipitate was filtered and dried to obtain 2MA-Xy-BPFZ 69.53 g of a reaction product of 2CM-Xy-BPFZ and methacrylic acid.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認。其結果為:1)從GPC測定結果中,可得知在所回收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,2)從IR測定結果中,可得知生成羰基,並且於1H-NMR中,可確認到具有來自甲基丙烯酸基之質子的共振射線,故可確認得到2MA-Xy-BPFZ。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR). As a result, 1) from the GPC measurement results, it was found that the peak of the raw material disappeared in the recovered reaction product, and a new peak was generated on the high molecular weight side, and 2) the IR measurement result was known. When a carbonyl group was formed and a resonance ray having a proton derived from a methacrylic group was confirmed in 1 H-NMR, 2MA-Xy-BPFZ was confirmed.

合成例1 Synthesis Example 1

將雙酚茀型環氧樹脂231g(環氧當量231)、氯化三乙基苄銨450mg、2,6-二異丁基酚100mg、及丙烯酸72.0g投入於500ml的四頸燒瓶中並混合,一邊以每分鐘25ml的速度吹入空氣一邊於90~100℃進行加熱溶解。雖然該溶液呈白濁,但仍直接緩慢升溫,並加熱至120℃以完全 溶解。溶液逐漸變得透明黏稠,但仍持續攪拌,於其間測定酸值,並持續加熱攪拌至酸值成為未達2.0mgKOH/g為止。至酸值達到目標(酸值0.8)為止需花費8小時。然後冷卻至室溫,而得到無色透明的固體之雙酚茀型丙烯酸環氧酯樹脂243.6g。 231 g (epoxy equivalent 231) of bisphenol fluorene type epoxy resin, 450 mg of triethylbenzylammonium chloride, 100 mg of 2,6-diisobutylphenol, and 72.0 g of acrylic acid were placed in a 500 ml four-necked flask and mixed. The mixture was heated and dissolved at 90 to 100 ° C while blowing air at a rate of 25 ml per minute. Although the solution was cloudy, it slowly warmed up slowly and heated to 120 ° C to complete Dissolved. The solution gradually became transparent and viscous, but stirring was continued, and the acid value was measured therebetween, and heating and stirring were continued until the acid value became less than 2.0 mgKOH/g. It takes 8 hours until the acid value reaches the target (acid value of 0.8). Then, it was cooled to room temperature to obtain 243.6 g of a bisphenol fluorene type acrylate epoxy resin which was a colorless transparent solid.

實施例5 Example 5

將實施例3中所得之2MA-DMBP-BPFZ 8g與作為反應性稀釋劑的丙烯酸鄰苯基-苯氧乙酯(新中村化學股份有限公司製,商品名稱:NK Ester A-LEN-10)12g、及作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g混合並溶解,而得到硬化性組成物(清漆A)。 8 g of 2MA-DMBP-BPFZ obtained in Example 3 and o-phenyl-phenoxyethyl acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK Ester A-LEN-10) 12 g as a reactive diluent And 0.40 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator was mixed and dissolved to obtain a curable composition (varnish A).

使調製出之清漆A流入於夾持0.2mm厚的間隔材之2片玻璃板之間,藉由具備有高壓汞燈之UV照射裝置,以照射強度:30mW/cm2、UV照射量:6,000mJ/cm2進行UV硬化。然後在200℃的烤爐中,對進行UV硬化所得之平板樣本進行30分鐘的後烘烤,並對所得之硬化物平板測定諸項特性。此外,將該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測定所得之結果如第1表所示。 The prepared varnish A was poured between two glass plates sandwiching a spacer having a thickness of 0.2 mm, and was irradiated with a UV irradiation device having a high-pressure mercury lamp at an irradiation intensity of 30 mW/cm 2 and a UV irradiation amount of 6,000. UV hardening was performed at mJ/cm 2 . Then, the flat plate sample obtained by UV hardening was post-baked in an oven at 200 ° C for 30 minutes, and the properties of the obtained cured plate were measured. Further, a flat plate-shaped cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. The results obtained by these measurements are shown in Table 1.

比較例1 Comparative example 1

將合成例1中所得之雙酚茀型丙烯酸環氧酯樹脂8g與作為反應性稀釋劑的丙烯酸鄰苯基-苯氧乙酯(新中村化學股份有限公司製,商品名稱:NK Ester A-LEN-10)12g、及作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g混合並溶解,而得到硬化性組成物(清漆B)。 8 g of bisphenol fluorene type acrylate epoxy resin obtained in Synthesis Example 1 and o-phenyl-phenoxyethyl acrylate as a reactive diluent (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK Ester A-LEN -10) 12 g, and 0.40 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator were mixed and dissolved to obtain a curable composition (varnish B). .

使調製出之清漆B流入於夾持0.2mm厚的間隔材之2片玻璃板之間,藉由具備有高壓汞燈之UV照射裝置,以照射強度:30mW/cm2、UV照射量:6,000mJ/cm2進行UV硬化。然後在200℃的烤爐中,對進行UV硬化所得之平板樣本進行30分鐘的後烘烤,並對所得之硬化物平板測定諸項特性。此外,將該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測定所得之結果如第1表所示。 The prepared varnish B was poured between two glass plates sandwiching a spacer having a thickness of 0.2 mm, and was irradiated with a UV irradiation device having a high-pressure mercury lamp at an irradiation intensity of 30 mW/cm 2 and a UV irradiation amount of 6,000. UV hardening was performed at mJ/cm 2 . Then, the flat plate sample obtained by UV hardening was post-baked in an oven at 200 ° C for 30 minutes, and the properties of the obtained cured plate were measured. Further, a flat plate-shaped cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. The results obtained by these measurements are shown in Table 1.

表中,BPF樹脂為雙酚茀型丙烯酸環氧酯樹脂。 In the table, the BPF resin is a bisphenol oxime type epoxy acrylate resin.

實施例6 Example 6

將碳酸鉀15.28g(0.11莫耳)及N,N-二甲基甲醯胺(DMF)500ml加入於反應容器,並進行加熱攪拌。一旦反應容器的內溫到達80℃,於30分鐘間將在DMF 50ml中溶解有丙烯酸15.85g(0.22莫耳)之溶液滴入。維持該溫度以進行1小時的反應。接著於30分鐘間將在DMF 500ml中溶解有9,9-雙(4-羥苯基)茀與4,4'-雙(氯甲基)聯苯的反應生成物之芳香族雙氯甲基化合物(實施例1的2CM-DMBP-BPFZ)58.27g之溶液滴入。滴入結束後,再於80℃持續攪拌3h。3h後冷卻至室溫,並過濾固 體的析出物。然後將甲苯2000ml加入於反應溶液。之後以水洗淨反應溶液4次,以硫酸鎂使油相乾燥並進行過濾。對於所得之有機相,藉由水/甲醇之混合溶劑使生成物再沉澱。 To the reaction vessel, 15.28 g (0.11 mol) of potassium carbonate and 500 ml of N,N-dimethylformamide (DMF) were added and heated and stirred. Once the internal temperature of the reaction vessel reached 80 ° C, a solution of 15.85 g (0.22 mol) of acrylic acid dissolved in 50 ml of DMF was dropped over 30 minutes. This temperature was maintained to carry out a reaction for 1 hour. The aromatic dichloromethyl group of the reaction product of 9,9-bis(4-hydroxyphenyl)fluorene and 4,4'-bis(chloromethyl)biphenyl was dissolved in 500 ml of DMF over 30 minutes. A solution of the compound (2CM-DMBP-BPFZ of Example 1) 58.27 g was added dropwise. After the completion of the dropwise addition, stirring was continued at 80 ° C for 3 hours. After 3 h, cool to room temperature and filter Body precipitates. Then, 2000 ml of toluene was added to the reaction solution. Thereafter, the reaction solution was washed with water four times, and the oil phase was dried with magnesium sulfate and filtered. With respect to the obtained organic phase, the product was reprecipitated by a water/methanol mixed solvent.

對沉澱物進行過濾及乾燥,而得到2CM-DMBP-BPFZ與丙烯酸的反應生成物之2A-DMBP-BPFZ 49.87g。 The precipitate was filtered and dried to obtain 49.87 g of 2A-DMBP-BPFZ as a reaction product of 2CM-DMBP-BPFZ and acrylic acid.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認,從GPC中,可確認到在所回收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,且從IR中,可確認到生成羰基,並且於1H-NMR中,可確認到具有來自丙烯酸基之質子的共振射線,故可確認得到2A-DMBP-BPFZ。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR), and it was confirmed from GPC that the reaction was recovered. The peak from the raw material disappeared, and a new peak was formed on the high molecular weight side. From the IR, it was confirmed that a carbonyl group was formed, and in 1 H-NMR, a resonance ray having a proton derived from an acrylic group was confirmed. Therefore, it was confirmed that 2A-DMBP-BPFZ was obtained.

實施例7 Example 7

將碳酸鉀14.59g(0.105莫耳)及N,N-二甲基甲醯胺(DMF)500ml加入於反應容器,並進行加熱攪拌。一旦反應容器的內溫到達80℃,於30分鐘間將在DMF 50ml中溶解有丙烯酸15.13g(0.21莫耳)之溶液滴入。維持該溫度以進行1小時的反應。接著於30分鐘間將在DMF 500ml中溶解有9,9-雙(4-羥苯基)茀與α,α'-二氯對二甲苯的反應生成物之芳香族雙氯甲基化合物(實施例2的2CM-Xy-BPFZ)62.76g之溶液滴入。滴入結束後,再於80℃持續攪拌3h。3h後冷卻至室溫,並過濾固體的析出 物。然後將甲苯2000ml加入於反應溶液。之後以水洗淨反應溶液4次,以硫酸鎂使油相乾燥並進行過濾。對於所得之有機相,藉由水/甲醇之混合溶劑使生成物再沉澱。 To the reaction vessel, 14.59 g (0.105 mol) of potassium carbonate and 500 ml of N,N-dimethylformamide (DMF) were added and heated and stirred. Once the internal temperature of the reaction vessel reached 80 ° C, a solution of 15.13 g (0.21 mol) of acrylic acid dissolved in 50 ml of DMF was added dropwise over 30 minutes. This temperature was maintained to carry out a reaction for 1 hour. An aromatic bischloromethyl compound in which a reaction product of 9,9-bis(4-hydroxyphenyl)fluorene and α,α'-dichloro-p-xylene is dissolved in 500 ml of DMF in 30 minutes (implementation) A solution of 62.76 g of 2CM-Xy-BPFZ of Example 2 was added dropwise. After the completion of the dropwise addition, stirring was continued at 80 ° C for 3 hours. After 3 h, cooled to room temperature and filtered to precipitate solids. Things. Then, 2000 ml of toluene was added to the reaction solution. Thereafter, the reaction solution was washed with water four times, and the oil phase was dried with magnesium sulfate and filtered. With respect to the obtained organic phase, the product was reprecipitated by a water/methanol mixed solvent.

對沉澱物進行過濾及乾燥,而得到2CM-Xy-BPFZ與丙烯酸的反應生成物之2A-Xy-BPFZ 54.3g。 The precipitate was filtered and dried to obtain 54.3 g of 2A-Xy-BPFZ as a reaction product of 2CM-Xy-BPFZ and acrylic acid.

藉由凝膠滲透層析法(GPC)、紅外線光譜(IR)、1H核磁共振光譜法(1H-NMR)來進行生成物的確認,從GPC中,可確認到在所回收之反應生成物中,來自原料之峰值消失,於高分子量側生成新的峰值,且從IR中,可確認到生成羰基,並且於1H-NMR中,可確認到具有來自丙烯酸基之質子的共振射線,故可確認得到2A-Xy-BPFZ。 The product was confirmed by gel permeation chromatography (GPC), infrared spectroscopy (IR), and 1 H nuclear magnetic resonance spectroscopy ( 1 H-NMR), and it was confirmed from GPC that the reaction was recovered. The peak from the raw material disappeared, and a new peak was formed on the high molecular weight side. From the IR, it was confirmed that a carbonyl group was formed, and in 1 H-NMR, a resonance ray having a proton derived from an acrylic group was confirmed. Therefore, it was confirmed that 2A-Xy-BPFZ was obtained.

實施例8 Example 8

將實施例6中所得之2A-DMBP-BPFZ 8g與作為反應性稀釋劑的丙烯酸鄰苯基-苯氧乙酯(新中村化學股份有限公司製,商品名稱:NK Ester A-LEN-10)12g、及作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g混合並溶解,而得到硬化性組成物(清漆C)。 8 g of 2A-DMBP-BPFZ obtained in Example 6 and o-phenyl-phenoxyethyl acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK Ester A-LEN-10) 12 g as a reactive diluent And 0.40 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator was mixed and dissolved to obtain a curable composition (varnish C).

藉由與實施例5相同之步驟,使用調製出之清漆C製作出硬化物平板,並測定諸項特性。此外,從該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測 定所得之結果如第2表所示。 A cured plate was prepared using the prepared varnish C by the same procedure as in Example 5, and the properties were measured. Further, a flat plate cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. These tests The results obtained are shown in Table 2.

實施例9 Example 9

將實施例7中所得之2A-Xy-BPFZ 8g與作為反應性稀釋劑的丙烯酸鄰苯基-苯氧乙酯(新中村化學股份有限公司製,商品名稱:NK Ester A-LEN-10)12g、及作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g混合並溶解,而得到硬化性組成物(清漆D)。 8 g of 2A-Xy-BPFZ obtained in Example 7 and o-phenyl-phenoxyethyl acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK Ester A-LEN-10) 12 g as a reactive diluent And 0.40 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator was mixed and dissolved to obtain a curable composition (varnish D).

藉由與實施例5相同之步驟,使用調製出之清漆D製作出硬化物平板,並測定諸項特性。此外,從該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測定所得之結果如第2表所示。 A cured plate was prepared using the prepared varnish D by the same procedure as in Example 5, and the properties were measured. Further, a flat plate cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. The results obtained by these measurements are shown in Table 2.

實施例10 Example 10

將實施例3中所得之2MA-DMBP-BPFZ 11g與作為反應性稀釋劑的二乙烯基苯(新日鐵化學股份有限公司製,商品名稱:DVB960)2g、9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]茀(Osaka Gas Chemicals股份有限公司製,商品名稱:Ogsol EA-0200)1g、丙烯酸苯基硫乙酯(BIMAX公司製,商品名稱:BX-PTEA)6g、作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g及三級丁基過氧基-2-乙基已酸酯(日油股份有限公司製,商 品名稱:Perbutyl O)0.04g混合並溶解,而得到硬化性組成物(清漆E)。 2MA-DMBP-BPFZ 11 g obtained in Example 3 and divinylbenzene (manufactured by Nippon Steel Chemical Co., Ltd., trade name: DVB960) 2 g, 9, 9-bis [4-( 2-propenyloxyethoxy)phenyl]anthracene (manufactured by Osaka Gas Chemicals Co., Ltd., trade name: Ogsol EA-0200) 1 g, phenyl thioethyl acrylate (BIMAX company, trade name: BX-PTEA 6 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator 0.40 g and a tertiary butylperoxy-2-ethyl hexanoate ( Nippon Oil Co., Ltd. Product Name: Perbutyl O) 0.04 g was mixed and dissolved to obtain a hardenable composition (varnish E).

藉由與實施例5相同之步驟,使用調製出之清漆E製作出硬化物平板,並測定諸項特性。此外,從該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測定所得之結果如第3表所示。 A cured plate was prepared using the prepared varnish E by the same procedure as in Example 5, and the properties were measured. Further, a flat plate cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. The results obtained by these measurements are shown in Table 3.

實施例11 Example 11

將實施例4中所得之2MA-Xy-BPFZ 11g與作為反應性稀釋劑的二乙烯基苯(新日鐵化學股份有限公司製,商品名稱:DVB960)2g、9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]茀(Osaka Gas Chemicals股份有限公司製,商品名稱:Ogsol EA-0200)1g、丙烯酸苯基硫乙酯(BIMAX公司製,商品名稱:BX-PTEA)6g、作為光聚合起始劑的1-羥基環己基苯基酮(Ciba Specialty Chemicals公司製,商品名稱:Irgacure 184)0.40g及三級丁基過氧基-2-乙基已酸酯(日油股份有限公司製,商品名稱:Perbutyl O)0.04g混合並溶解,而得到硬化性組成物(清漆F)。 2MA-Xy-BPFZ 11g obtained in Example 4 and divinylbenzene (manufactured by Nippon Steel Chemical Co., Ltd., trade name: DVB960) as a reactive diluent 2g, 9,9-bis [4-( 2-propenyloxyethoxy)phenyl]anthracene (manufactured by Osaka Gas Chemicals Co., Ltd., trade name: Ogsol EA-0200) 1 g, phenyl thioethyl acrylate (BIMAX company, trade name: BX-PTEA 6 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) as a photopolymerization initiator 0.40 g and a tertiary butylperoxy-2-ethyl hexanoate ( Nippon Oil Co., Ltd., trade name: Perbutyl O) 0.04 g was mixed and dissolved to obtain a curable composition (varnish F).

藉由與實施例5相同之步驟,使用調製出之清漆F製作出硬化物平板,並測定諸項特性。此外,從該厚度0.2mm的平板硬化物裁切為0.3cm×10cm以製作出試驗片,並測定2.0GHz的介電常數及介電正切。此等經測 定所得之結果如第3表所示。 A cured plate was prepared using the prepared varnish F by the same procedure as in Example 5, and the properties were measured. Further, a flat plate cured product having a thickness of 0.2 mm was cut into 0.3 cm × 10 cm to prepare a test piece, and a dielectric constant and a dielectric tangent of 2.0 GHz were measured. These tests The results obtained are shown in Table 3.

Claims (10)

一種雙(甲基)丙烯醯基末端之苄醚化合物,其特徵為:由下列式(2)表示, (式中,Ar1表示碳數6~20的芳香族烴基,Y表示氫或甲基,n表示1~10之數,R1及R2獨立地表示碳數1~12的脂肪族烴基或碳數6~12的芳香族烴基;p、q獨立地表示0~2之整數)。 A bis(methyl)acrylonitrile-terminated benzyl ether compound characterized by the following formula (2), (wherein Ar 1 represents an aromatic hydrocarbon group having 6 to 20 carbon atoms, Y represents hydrogen or a methyl group, n represents a number of 1 to 10, and R 1 and R 2 independently represent an aliphatic hydrocarbon group having 1 to 12 carbon atoms or An aromatic hydrocarbon group having 6 to 12 carbon atoms; p and q independently represent an integer of 0 to 2). 一種如申請專利範圍第1項之雙(甲基)丙烯醯基末端之苄醚化合物之製造方法,其特徵為:使由下列式(1)表示之芳香族雙鹵甲基化合物,與由下列式(4)表示之(甲基)丙烯酸系化合物反應, (式中,Ar1表示碳數6~20的芳香族烴基,X表示鹵素元素,n表示1~10之數,R1及R2獨立地表示碳數1~12的 脂肪族烴基或碳數6~12的芳香族烴基;p、q獨立地表示0~2之整數), (式中,Y表示氫或甲基,Z表示氫、鹼金屬、或(甲基)丙烯醯基)。 A process for producing a benzyl ether compound having a bis(meth)acrylonyl end group according to the first aspect of the invention, characterized in that the aromatic dihalomethyl compound represented by the following formula (1) is a (meth)acrylic compound represented by the formula (4), (wherein Ar 1 represents an aromatic hydrocarbon group having 6 to 20 carbon atoms, X represents a halogen element, n represents a number of 1 to 10, and R 1 and R 2 independently represent an aliphatic hydrocarbon group or a carbon number of 1 to 12 carbon atoms. 6 to 12 aromatic hydrocarbon groups; p and q independently represent an integer of 0 to 2), (wherein Y represents hydrogen or a methyl group, and Z represents hydrogen, an alkali metal, or a (meth)acrylonitrile group). 一種硬化性樹脂組成物,其特徵為:含有如申請專利範圍第1項之雙(甲基)丙烯醯基末端之苄醚化合物與聚合起始劑。 A curable resin composition comprising a benzyl ether compound having a bis(meth)acryl fluorenyl terminal as in the first aspect of the patent application and a polymerization initiator. 一種硬化性薄膜,其係將如申請專利範圍第3項之硬化性樹脂組成物成形為薄膜狀而成。 A curable film obtained by forming a curable resin composition according to item 3 of the patent application form into a film. 一種薄膜,其係使如申請專利範圍第4項之硬化性薄膜硬化而成。 A film obtained by hardening a curable film as disclosed in claim 4 of the patent application. 一種硬化物,其係使如申請專利範圍第3項之硬化性樹脂組成物硬化而成。 A cured product obtained by hardening a curable resin composition as in item 3 of the patent application. 一種硬化性複合材料,其係由如申請專利範圍第3項之硬化性樹脂組成物與基材所成。 A curable composite material comprising a curable resin composition according to item 3 of the patent application and a substrate. 一種硬化複合材料,其特徵為:使如申請專利範圍第7項之硬化性複合材料硬化而成。 A hardened composite material characterized by hardening a hardenable composite material according to item 7 of the patent application. 一種光學物品,其係由如申請專利範圍第6項之硬化物所成。 An optical article made of a cured product as in claim 6 of the patent application. 如申請專利範圍第9項之光學物品,其中光學物 品為光學透鏡。 An optical article as claimed in claim 9 wherein the optical object The product is an optical lens.
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