TWI588513B - 梯度聚合物結構及方法 - Google Patents
梯度聚合物結構及方法 Download PDFInfo
- Publication number
- TWI588513B TWI588513B TW102105170A TW102105170A TWI588513B TW I588513 B TWI588513 B TW I588513B TW 102105170 A TW102105170 A TW 102105170A TW 102105170 A TW102105170 A TW 102105170A TW I588513 B TWI588513 B TW I588513B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- region
- optical
- linear
- optical article
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 76
- 229920000642 polymer Polymers 0.000 title description 17
- 239000000203 mixture Substances 0.000 claims description 222
- 230000003287 optical effect Effects 0.000 claims description 188
- 229920001400 block copolymer Polymers 0.000 claims description 175
- -1 polyoxymethylene Polymers 0.000 claims description 90
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 60
- 239000000463 material Substances 0.000 claims description 59
- 239000007787 solid Substances 0.000 claims description 54
- 239000002904 solvent Substances 0.000 claims description 39
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 35
- 229920006324 polyoxymethylene Polymers 0.000 claims description 35
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 33
- 230000015572 biosynthetic process Effects 0.000 claims description 17
- DKZRLCHWDNEKRH-UHFFFAOYSA-N 1-nonoxynonane Chemical group CCCCCCCCCOCCCCCCCCC DKZRLCHWDNEKRH-UHFFFAOYSA-N 0.000 claims description 16
- 239000012943 hotmelt Substances 0.000 claims description 11
- 229910020175 SiOH Inorganic materials 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 239000000565 sealant Substances 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 6
- 230000001788 irregular Effects 0.000 claims description 6
- 238000003786 synthesis reaction Methods 0.000 claims description 6
- 239000006227 byproduct Substances 0.000 claims description 5
- 230000000996 additive effect Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003100 immobilizing effect Effects 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 161
- 229920005989 resin Polymers 0.000 description 158
- 239000011347 resin Substances 0.000 description 158
- 239000000243 solution Substances 0.000 description 108
- 239000010410 layer Substances 0.000 description 95
- 239000008247 solid mixture Substances 0.000 description 95
- 239000012071 phase Substances 0.000 description 63
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 58
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 48
- 238000006243 chemical reaction Methods 0.000 description 46
- 239000004032 superbase Substances 0.000 description 46
- 150000007525 superbases Chemical class 0.000 description 43
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 42
- 238000010992 reflux Methods 0.000 description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 36
- 125000006612 decyloxy group Chemical group 0.000 description 36
- 239000003054 catalyst Substances 0.000 description 35
- 238000009833 condensation Methods 0.000 description 34
- 230000005494 condensation Effects 0.000 description 34
- 239000000758 substrate Substances 0.000 description 33
- 239000003381 stabilizer Substances 0.000 description 30
- 238000005481 NMR spectroscopy Methods 0.000 description 26
- 229920001577 copolymer Polymers 0.000 description 26
- 238000010438 heat treatment Methods 0.000 description 25
- 239000011541 reaction mixture Substances 0.000 description 24
- 230000008569 process Effects 0.000 description 23
- 238000003860 storage Methods 0.000 description 23
- 239000003960 organic solvent Substances 0.000 description 22
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 21
- 238000000576 coating method Methods 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 21
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 21
- 239000011701 zinc Substances 0.000 description 21
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 20
- 239000011572 manganese Substances 0.000 description 20
- 125000000217 alkyl group Chemical group 0.000 description 19
- 229910052950 sphalerite Inorganic materials 0.000 description 19
- 229910052984 zinc sulfide Inorganic materials 0.000 description 19
- 229910052757 nitrogen Inorganic materials 0.000 description 18
- 230000009477 glass transition Effects 0.000 description 17
- 238000002156 mixing Methods 0.000 description 17
- 229920003255 poly(phenylsilsesquioxane) Polymers 0.000 description 17
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 16
- 229910052725 zinc Inorganic materials 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- 125000003118 aryl group Chemical group 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 150000003384 small molecules Chemical class 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 229910052684 Cerium Inorganic materials 0.000 description 13
- 239000000460 chlorine Substances 0.000 description 13
- 239000010949 copper Substances 0.000 description 13
- 229910052748 manganese Inorganic materials 0.000 description 13
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 12
- 239000004809 Teflon Substances 0.000 description 12
- 229920006362 Teflon® Polymers 0.000 description 12
- 229910052771 Terbium Inorganic materials 0.000 description 12
- 229910052782 aluminium Inorganic materials 0.000 description 12
- 239000008393 encapsulating agent Substances 0.000 description 12
- 239000003623 enhancer Substances 0.000 description 12
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 11
- 125000003545 alkoxy group Chemical group 0.000 description 11
- 238000000429 assembly Methods 0.000 description 11
- 230000000712 assembly Effects 0.000 description 11
- 239000002585 base Substances 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- 230000000704 physical effect Effects 0.000 description 11
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 238000004132 cross linking Methods 0.000 description 10
- 239000004205 dimethyl polysiloxane Substances 0.000 description 10
- 239000011777 magnesium Substances 0.000 description 10
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 238000010533 azeotropic distillation Methods 0.000 description 9
- 150000001639 boron compounds Chemical class 0.000 description 9
- 229910052793 cadmium Inorganic materials 0.000 description 9
- 238000006482 condensation reaction Methods 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- 125000006611 nonyloxy group Chemical group 0.000 description 9
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 8
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 8
- 239000011575 calcium Substances 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 229910052749 magnesium Inorganic materials 0.000 description 8
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- 229910052712 strontium Inorganic materials 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 6
- 229910052787 antimony Inorganic materials 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 229910052791 calcium Inorganic materials 0.000 description 6
- 239000013522 chelant Substances 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 125000005375 organosiloxane group Chemical group 0.000 description 6
- QULYNCCPRWKEMF-UHFFFAOYSA-N parachlorobenzotrifluoride Chemical compound FC(F)(F)C1=CC=C(Cl)C=C1 QULYNCCPRWKEMF-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 5
- 229910004283 SiO 4 Inorganic materials 0.000 description 5
- 239000008346 aqueous phase Substances 0.000 description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000005286 illumination Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- PZKBIVOXIFYDRI-UHFFFAOYSA-N CC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound CC(C(OCC)(OCC)OCC)CCCCCCCC PZKBIVOXIFYDRI-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 229910052693 Europium Inorganic materials 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 4
- 150000001642 boronic acid derivatives Chemical group 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 150000002923 oximes Chemical class 0.000 description 4
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 4
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 229920002620 polyvinyl fluoride Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 229910003450 rhodium oxide Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001110 calcium chloride Substances 0.000 description 3
- 229910001628 calcium chloride Inorganic materials 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000032798 delamination Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000000518 rheometry Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000013517 stratification Methods 0.000 description 3
- 238000005382 thermal cycling Methods 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 2
- OEBXWWBYZJNKRK-UHFFFAOYSA-N 1-methyl-2,3,4,6,7,8-hexahydropyrimido[1,2-a]pyrimidine Chemical compound C1CCN=C2N(C)CCCN21 OEBXWWBYZJNKRK-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical class [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical class [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 2
- 229910020068 MgAl Inorganic materials 0.000 description 2
- 229910016006 MoSi Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920002675 Polyoxyl Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910003668 SrAl Inorganic materials 0.000 description 2
- LINDOXZENKYESA-UHFFFAOYSA-N TMG Natural products CNC(N)=NC LINDOXZENKYESA-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000003849 aromatic solvent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000003012 bilayer membrane Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MJSNUBOCVAKFIJ-LNTINUHCSA-N chromium;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Cr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O MJSNUBOCVAKFIJ-LNTINUHCSA-N 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000002633 crown compound Substances 0.000 description 2
- 238000010227 cup method (microbiological evaluation) Methods 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- PXRMLPZQBFWPCV-UHFFFAOYSA-N dioxasilirane Chemical compound O1O[SiH2]1 PXRMLPZQBFWPCV-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002429 hydrazines Chemical class 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- KPADFPAILITQBG-UHFFFAOYSA-N non-4-ene Chemical compound CCCCC=CCCC KPADFPAILITQBG-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 150000002924 oxiranes Chemical class 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 2
- 230000002028 premature Effects 0.000 description 2
- 230000004224 protection Effects 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 241000894007 species Species 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 239000003643 water by type Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- KYPCCSCZXRYUAE-UHFFFAOYSA-N (2,6-dimethoxy-4-methylphenyl)boronic acid Chemical compound COC1=CC(C)=CC(OC)=C1B(O)O KYPCCSCZXRYUAE-UHFFFAOYSA-N 0.000 description 1
- UQMOSSMYPIJNTO-UHFFFAOYSA-N (2-hydroxy-3-methylphenyl)boronic acid Chemical compound CC1=CC=CC(B(O)O)=C1O UQMOSSMYPIJNTO-UHFFFAOYSA-N 0.000 description 1
- BJPNVVXTUYMJPN-UHFFFAOYSA-N (3-chloro-2-methylphenyl)boronic acid Chemical compound CC1=C(Cl)C=CC=C1B(O)O BJPNVVXTUYMJPN-UHFFFAOYSA-N 0.000 description 1
- OVVBLFYHZAMJIK-UHFFFAOYSA-N (3-ethoxy-5-fluorophenyl)boronic acid Chemical compound CCOC1=CC(F)=CC(B(O)O)=C1 OVVBLFYHZAMJIK-UHFFFAOYSA-N 0.000 description 1
- QQPLHUGOUZKARP-UHFFFAOYSA-N (3-fluoro-5-methylphenyl)boronic acid Chemical compound CC1=CC(F)=CC(B(O)O)=C1 QQPLHUGOUZKARP-UHFFFAOYSA-N 0.000 description 1
- HJJYROZZJOJOOW-UHFFFAOYSA-N (3-fluoro-5-propan-2-yloxyphenyl)boronic acid Chemical compound CC(C)OC1=CC(F)=CC(B(O)O)=C1 HJJYROZZJOJOOW-UHFFFAOYSA-N 0.000 description 1
- XWWPIVKWAIMBMU-UHFFFAOYSA-N (3-tert-butyl-5-methylphenyl)boronic acid Chemical compound CC1=CC(B(O)O)=CC(C(C)(C)C)=C1 XWWPIVKWAIMBMU-UHFFFAOYSA-N 0.000 description 1
- LUJMSRVFSBMEOY-UHFFFAOYSA-N (4-fluoro-3-methoxyphenyl)boronic acid Chemical compound COC1=CC(B(O)O)=CC=C1F LUJMSRVFSBMEOY-UHFFFAOYSA-N 0.000 description 1
- QPOZYGYRIMYFHZ-UHFFFAOYSA-N (4-methylphenoxy)-phenylborinic acid Chemical compound C1=CC(C)=CC=C1OB(O)C1=CC=CC=C1 QPOZYGYRIMYFHZ-UHFFFAOYSA-N 0.000 description 1
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- RWOVIHFIKCUATE-UHFFFAOYSA-N 1,1,1-trifluoro-4-methyltridecane Chemical compound FC(CCC(CCCCCCCCC)C)(F)F RWOVIHFIKCUATE-UHFFFAOYSA-N 0.000 description 1
- BTEUIBDFAWRTOO-UHFFFAOYSA-N 1,1,1-trifluorotridecane Chemical compound CCCCCCCCCCCCC(F)(F)F BTEUIBDFAWRTOO-UHFFFAOYSA-N 0.000 description 1
- USGNHCIMRGKVOP-UHFFFAOYSA-N 1,1,1-triphenylnonan-2-ylbenzene Chemical compound C1(=CC=CC=C1)C(C(C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1)CCCCCCC USGNHCIMRGKVOP-UHFFFAOYSA-N 0.000 description 1
- BTEIWWXAPYLKDK-UHFFFAOYSA-N 1,1-diphenyldecylbenzene Chemical compound CCCCCCCCCC(c1ccccc1)(c1ccccc1)c1ccccc1 BTEIWWXAPYLKDK-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical group NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GJFNRSDCSTVPCJ-UHFFFAOYSA-N 1,8-bis(dimethylamino)naphthalene Chemical compound C1=CC(N(C)C)=C2C(N(C)C)=CC=CC2=C1 GJFNRSDCSTVPCJ-UHFFFAOYSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- AWBIJARKDOFDAN-UHFFFAOYSA-N 2,5-dimethyl-1,4-dioxane Chemical compound CC1COC(C)CO1 AWBIJARKDOFDAN-UHFFFAOYSA-N 0.000 description 1
- XTDKZSUYCXHXJM-UHFFFAOYSA-N 2-methoxyoxane Chemical compound COC1CCCCO1 XTDKZSUYCXHXJM-UHFFFAOYSA-N 0.000 description 1
- ZAZPDOYUCVFPOI-UHFFFAOYSA-N 2-methylpropylboronic acid Chemical compound CC(C)CB(O)O ZAZPDOYUCVFPOI-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- BGWUXZLHDLNYHW-UHFFFAOYSA-N 3-methoxy-5-nitroaniline Chemical compound COC1=CC(N)=CC([N+]([O-])=O)=C1 BGWUXZLHDLNYHW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OKESAOJLENXIQT-UHFFFAOYSA-N B(C(=O)C1=C(C=CC(=C1)OC)F)(O)O Chemical compound B(C(=O)C1=C(C=CC(=C1)OC)F)(O)O OKESAOJLENXIQT-UHFFFAOYSA-N 0.000 description 1
- KTBISZFYFDAYGC-UHFFFAOYSA-N B(O)(O)OC1=C(C=C(C(=C1)C)Br)C Chemical compound B(O)(O)OC1=C(C=C(C(=C1)C)Br)C KTBISZFYFDAYGC-UHFFFAOYSA-N 0.000 description 1
- YFOJSGMCNWXPLW-UHFFFAOYSA-N B(O)O.CC(=C)C Chemical compound B(O)O.CC(=C)C YFOJSGMCNWXPLW-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229910016066 BaSi Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- UEYMLSDWUUKDND-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)OCC)CCCCCCCC UEYMLSDWUUKDND-UHFFFAOYSA-N 0.000 description 1
- RVDRXAVMMMTERV-UHFFFAOYSA-N C(C)OC(=O)C=1C=C(C=C(C1)F)OB(O)O Chemical compound C(C)OC(=O)C=1C=C(C=C(C1)F)OB(O)O RVDRXAVMMMTERV-UHFFFAOYSA-N 0.000 description 1
- LNEJJQMNHUGXDW-UHFFFAOYSA-N CC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CC(C(OCC)(OCC)C)CCCCCCCC LNEJJQMNHUGXDW-UHFFFAOYSA-N 0.000 description 1
- COQYUAJAXLUAHF-UHFFFAOYSA-N CC(CCCCCCCCCOC)(C)C Chemical compound CC(CCCCCCCCCOC)(C)C COQYUAJAXLUAHF-UHFFFAOYSA-N 0.000 description 1
- ICLWANDVDRTPBG-UHFFFAOYSA-N CC(CCCCCCCCCOCC)(C)C Chemical compound CC(CCCCCCCCCOCC)(C)C ICLWANDVDRTPBG-UHFFFAOYSA-N 0.000 description 1
- KCMZYCFSSYXEQR-UHFFFAOYSA-N CCCC[K] Chemical compound CCCC[K] KCMZYCFSSYXEQR-UHFFFAOYSA-N 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 229910004762 CaSiO Inorganic materials 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910017857 MgGa Inorganic materials 0.000 description 1
- 229910017639 MgSi Inorganic materials 0.000 description 1
- 238000012565 NMR experiment Methods 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- GKEMDZIGTOAZRK-UHFFFAOYSA-N [3-methoxy-5-(trifluoromethyl)phenyl]boronic acid Chemical compound COC1=CC(B(O)O)=CC(C(F)(F)F)=C1 GKEMDZIGTOAZRK-UHFFFAOYSA-N 0.000 description 1
- BUSMBMGODABSIN-UHFFFAOYSA-N [4-methoxy-3-(trifluoromethyl)phenyl]boronic acid Chemical compound COC1=CC=C(B(O)O)C=C1C(F)(F)F BUSMBMGODABSIN-UHFFFAOYSA-N 0.000 description 1
- DWKNRQOBEUJPQO-UHFFFAOYSA-N [O].C1COCCO1 Chemical compound [O].C1COCCO1 DWKNRQOBEUJPQO-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 description 1
- 150000004729 acetoacetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
- 150000008046 alkali metal hydrides Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 125000005620 boronic acid group Chemical class 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical class CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000012973 diazabicyclooctane Substances 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000002518 distortionless enhancement with polarization transfer Methods 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- QHSJIZLJUFMIFP-UHFFFAOYSA-N ethene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F QHSJIZLJUFMIFP-UHFFFAOYSA-N 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229940030980 inova Drugs 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- IDBFBDSKYCUNPW-UHFFFAOYSA-N lithium nitride Chemical compound [Li]N([Li])[Li] IDBFBDSKYCUNPW-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- WXPNTKUIDRYHOP-UHFFFAOYSA-L magnesium;3-oxobutanoate Chemical compound [Mg+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O WXPNTKUIDRYHOP-UHFFFAOYSA-L 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229930003658 monoterpene Natural products 0.000 description 1
- 235000002577 monoterpenes Nutrition 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229940062043 nitrogen 50 % Drugs 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000001979 organolithium group Chemical group 0.000 description 1
- 125000002734 organomagnesium group Chemical group 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000006146 oximation reaction Methods 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000003304 ruthenium compounds Chemical group 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 238000001998 small-angle neutron scattering Methods 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- ZPBLKGWQKXKXOZ-UHFFFAOYSA-N yttrium zinc Chemical compound [Zn].[Y] ZPBLKGWQKXKXOZ-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/852—Encapsulations
- H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/14—Polymer mixtures characterised by other features containing polymeric additives characterised by shape
- C08L2205/18—Spheres
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0362—Manufacture or treatment of packages of encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0363—Manufacture or treatment of packages of optical field-shaping means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Silicon Polymers (AREA)
- Laminated Bodies (AREA)
- Chemical & Material Sciences (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261596959P | 2012-02-09 | 2012-02-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201344232A TW201344232A (zh) | 2013-11-01 |
| TWI588513B true TWI588513B (zh) | 2017-06-21 |
Family
ID=47741314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102105170A TWI588513B (zh) | 2012-02-09 | 2013-02-08 | 梯度聚合物結構及方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9705056B2 (enExample) |
| EP (1) | EP2812738B1 (enExample) |
| JP (1) | JP6358960B2 (enExample) |
| KR (1) | KR102001403B1 (enExample) |
| CN (1) | CN104220902B (enExample) |
| TW (1) | TWI588513B (enExample) |
| WO (1) | WO2013119796A1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6358960B2 (ja) | 2012-02-09 | 2018-07-18 | ダウ シリコーンズ コーポレーション | 勾配ポリマー構造及び方法 |
| JP6387355B2 (ja) | 2012-12-21 | 2018-09-05 | ダウ シリコーンズ コーポレーション | 層状ポリマー構造及び方法 |
| US20160009866A1 (en) * | 2013-03-15 | 2016-01-14 | Dow Corning Corporation | Compositions of Resin-Linear Organosiloxane Block Copolymers |
| KR20150133779A (ko) * | 2013-03-15 | 2015-11-30 | 다우 코닝 코포레이션 | 분말 형태의 고체 실리콘-함유 핫 멜트 조성물을 침착하는 단계 및 그의 봉지재를 형성하는 단계를 포함하는, 광학 조립체의 제조 방법 |
| WO2014197617A1 (en) * | 2013-06-05 | 2014-12-11 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
| WO2015042285A1 (en) | 2013-09-18 | 2015-03-26 | Dow Corning Corporation | Compositions of resin-linear organosiloxane block copolymers |
| WO2015200587A1 (en) * | 2014-06-25 | 2015-12-30 | Dow Corning Corporation | Layered polymer structures and methods |
| US9930750B2 (en) * | 2014-08-20 | 2018-03-27 | Lumens Co., Ltd. | Method for manufacturing light-emitting device packages, light-emitting device package strip, and light-emitting device package |
| KR20170058999A (ko) * | 2014-09-23 | 2017-05-29 | 다우 코닝 코포레이션 | 접착제 조성물 및 이의 용도 |
| FR3038710B1 (fr) * | 2015-07-10 | 2021-05-28 | Cpc Tech | Capteur d'une caracteristique physique, comportant de preference une structure multicouches |
| JP7036505B2 (ja) * | 2015-09-30 | 2022-03-15 | スリーエム イノベイティブ プロパティズ カンパニー | ガラス様層を含む複合構造物及び形成方法 |
| DE102016114921A1 (de) * | 2016-08-11 | 2018-02-15 | Osram Opto Semiconductors Gmbh | Silikonzusammensetzung |
| JPWO2018066559A1 (ja) * | 2016-10-04 | 2019-07-18 | 東レ・ダウコーニング株式会社 | 化粧料組成物または外用剤組成物、および化粧料原料組成物 |
| EP3658639A1 (en) | 2017-07-27 | 2020-06-03 | Dow Silicones Corporation | Hydrosilylation curable polysiloxane |
| JP6562044B2 (ja) * | 2017-07-28 | 2019-08-21 | セイコーエプソン株式会社 | 電気光学装置、電子機器、及び電気光学装置の製造方法 |
| KR102334936B1 (ko) * | 2017-11-08 | 2021-12-02 | 시아먼 산안 옵토일렉트로닉스 테크놀로지 캄파니 리미티드 | 자외선 led 패키징 구조 |
| WO2025170712A1 (en) | 2024-02-07 | 2025-08-14 | Dow Silicones Corporation | Epoxy-functional resin-linear polyorganosiloxane copolymer, composition containing the copolymer, and methods for their preparation and use |
| WO2025178717A1 (en) | 2024-02-20 | 2025-08-28 | Dow Silicones Corporation | Alkenyl ester – functional resin – linear polyorganosiloxane block copolymer, composition containing the copolymer, and methods for their preparation and use |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020190408A1 (en) * | 2000-06-13 | 2002-12-19 | Zms, Llc | Morphology trapping and materials suitable for use therewith |
| TW200804467A (en) * | 2006-05-17 | 2008-01-16 | 3M Innovative Properties Co | Method of making light emitting device with multilayer silicon-containing encapsulant |
| JP2008034546A (ja) * | 2006-07-27 | 2008-02-14 | Nichia Chem Ind Ltd | 発光装置 |
Family Cites Families (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3017385A (en) | 1959-01-21 | 1962-01-16 | Gen Electric | Novel organopolysiloxanes |
| US3294737A (en) * | 1963-12-23 | 1966-12-27 | Gen Electric | Organopolysiloxanes |
| US3436439A (en) * | 1965-08-13 | 1969-04-01 | Dow Corning | Preparation of siloxane block copolymers |
| FR2633088B1 (fr) | 1988-06-15 | 1990-11-16 | Sgn Soc Gen Tech Nouvelle | Dispositif pour cisailler un assemblage de tubes |
| US5075103A (en) | 1990-07-06 | 1991-12-24 | Dow Corning Corporation | Hair fixatives comprising nonpolar silsesquioxanes |
| JPH04325645A (ja) | 1991-04-25 | 1992-11-16 | Furukawa Alum Co Ltd | 焼付け硬化後の強度に優れたアルミニウム合金およびその製造方法 |
| JP2646046B2 (ja) | 1991-10-21 | 1997-08-25 | 信越化学工業株式会社 | 高減衰性シリコーン組成物及びその硬化物 |
| JPH0827036A (ja) | 1994-07-12 | 1996-01-30 | Chuo Aerosol Kagaku Kk | 液体溶剤組成物 |
| JPH0841446A (ja) | 1994-08-03 | 1996-02-13 | Chuo Aerosol Kagaku Kk | 均一に相溶してなる混合液体組成物 |
| JPH0892600A (ja) | 1994-09-22 | 1996-04-09 | Canon Inc | 混合溶剤組成物、それを用いる洗浄方法及び洗浄装置 |
| IT1282378B1 (it) | 1996-04-24 | 1998-03-20 | Ausimont Spa | Perfluoroelastomeri a base di diossoli |
| US6144795A (en) | 1996-12-13 | 2000-11-07 | Corning Incorporated | Hybrid organic-inorganic planar optical waveguide device |
| IT1293515B1 (it) | 1997-07-31 | 1999-03-01 | Ausimont Spa | Dispersioni di fluoropolimeri |
| IT1293516B1 (it) | 1997-07-31 | 1999-03-01 | Ausimont Spa | Dispersione di perfluoropolimeri |
| JPH1160720A (ja) | 1997-08-22 | 1999-03-05 | Showa Denko Kk | ポリエーテル化合物及び磁気記録媒体 |
| ITMI981506A1 (it) | 1998-06-30 | 1999-12-30 | Ausimont Spa | Manufatti di fluoropolimeri amorfi |
| JP2001031997A (ja) | 1999-07-21 | 2001-02-06 | Asahi Glass Co Ltd | 溶剤組成物 |
| KR100335663B1 (ko) * | 1999-10-19 | 2002-05-06 | 윤종용 | 테입리스 ｌｏｃ 패키징용 폴리(이미드-실록산) 화합물 |
| EP1160313A1 (en) | 2000-06-02 | 2001-12-05 | The Procter & Gamble Company | Cleaning composition and device for electronic equipment |
| EP1201698B1 (en) | 2000-10-27 | 2008-05-07 | The Procter & Gamble Company | Compositions and methods for treating surfaces |
| KR20080098556A (ko) | 2000-11-08 | 2008-11-10 | 솔베이(소시에떼아노님) | 용매 조성물 |
| JP2003064345A (ja) | 2001-08-28 | 2003-03-05 | Sony Corp | 表面改質材、表面改質膜用組成物、表面改質膜、光学部品及び表示装置 |
| EP1306417B1 (en) | 2001-10-23 | 2012-08-01 | Solvay Specialty Polymers Italy S.p.A. | Use of fluorinated liquids for the heat exchange or as working fluids in the presence of ionizing radiations and/or irradiation with neutrons |
| JP2004075736A (ja) | 2002-08-12 | 2004-03-11 | Nikko Materials Co Ltd | 撥水・撥油剤およびその製造方法 |
| US7426328B2 (en) * | 2002-08-28 | 2008-09-16 | Phosistor Technologies, Inc. | Varying refractive index optical medium using at least two materials with thicknesses less than a wavelength |
| JP2004115622A (ja) | 2002-09-25 | 2004-04-15 | Int Screen:Kk | 含フッ素樹脂組成物 |
| US7072564B2 (en) * | 2003-11-25 | 2006-07-04 | Rohm And Haas Electronic Materials Llc | Waveguide compositions and waveguides formed therefrom |
| JP4744077B2 (ja) * | 2003-12-18 | 2011-08-10 | 京セラ株式会社 | シロキサンポリマ皮膜形成方法および光導波路の作製方法 |
| EP1733077B1 (en) | 2004-01-15 | 2018-04-18 | Samsung Electronics Co., Ltd. | Nanocrystal doped matrixes |
| WO2005069388A1 (ja) * | 2004-01-20 | 2005-07-28 | Nichia Corporation | 半導体発光素子 |
| US7352011B2 (en) * | 2004-11-15 | 2008-04-01 | Philips Lumileds Lighting Company, Llc | Wide emitting lens for LED useful for backlighting |
| ITMI20050006A1 (it) | 2005-01-05 | 2006-07-06 | Solvay Solexis Spa | Composizioni a base di oli perfluoropolieterei per la formazione di film lubrificanti |
| US7373060B2 (en) | 2005-02-28 | 2008-05-13 | Chisso Corporation | Optical waveguide using polymer composed of silsesquioxane derivative |
| DE102005009066A1 (de) | 2005-02-28 | 2006-09-07 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optischen und eines strahlungsemittierenden Bauelementes und optisches sowie strahlungsemittierendes Bauelement |
| TW200732382A (en) | 2005-12-22 | 2007-09-01 | Rohm & Haas | Siloxane encapsulants |
| JP4325645B2 (ja) | 2006-06-14 | 2009-09-02 | 日亜化学工業株式会社 | トランスファーモールド用タブレット、その製造方法、発光装置及びその製造方法 |
| JP4636275B2 (ja) | 2006-07-18 | 2011-02-23 | 信越化学工業株式会社 | シリコーン樹脂組成物で封止された半導体装置及び該半導体装置封止用シリコーン樹脂タブレット |
| US8299198B2 (en) | 2006-07-21 | 2012-10-30 | Kaneka Corporation | Polysiloxane composition, molded body obtained from the same, and optodevice member |
| WO2008027283A2 (en) * | 2006-08-25 | 2008-03-06 | Dow Global Technologies Inc. | Production of meta-block copolymers by polymer segment interchange |
| JP4400752B2 (ja) | 2006-11-06 | 2010-01-20 | 信越化学工業株式会社 | コーティング剤組成物 |
| JP2008133342A (ja) * | 2006-11-28 | 2008-06-12 | Shin Etsu Chem Co Ltd | エマルジョンコーティング剤組成物及びそれを被覆した物品 |
| US9944031B2 (en) | 2007-02-13 | 2018-04-17 | 3M Innovative Properties Company | Molded optical articles and methods of making same |
| WO2008103229A1 (en) * | 2007-02-22 | 2008-08-28 | Dow Corning Corporation | Reinforced silicone resin film and method of preparing same |
| JP4927019B2 (ja) | 2007-04-10 | 2012-05-09 | 信越化学工業株式会社 | 蛍光体含有接着性シリコーン組成物、該組成物からなる組成物シート、及び該シートを使用する発光装置の製造方法 |
| CN101765494B (zh) | 2007-07-25 | 2013-06-12 | Hoya株式会社 | 塑料透镜的制造方法 |
| US20090065792A1 (en) | 2007-09-07 | 2009-03-12 | 3M Innovative Properties Company | Method of making an led device having a dome lens |
| US7566409B1 (en) | 2008-01-24 | 2009-07-28 | Mainstream Engineering Corporation | Replacement solvents having improved properties for refrigeration flushes |
| EP2100909A1 (en) | 2008-03-14 | 2009-09-16 | Solvay Solexis S.p.A. | (Per)fluorinated addition products |
| JP2010107680A (ja) * | 2008-10-29 | 2010-05-13 | Seiko Epson Corp | 光学素子および光学素子の製造方法 |
| CN101736346A (zh) | 2008-11-24 | 2010-06-16 | 3M创新有限公司 | 在不锈钢表面形成易清洁层的制品及其制备方法 |
| WO2010063745A1 (en) | 2008-12-05 | 2010-06-10 | Solvay Solexis S.P.A. | Polyfunctional (per)fluoropolyethers |
| JP5245902B2 (ja) | 2009-02-20 | 2013-07-24 | 信越化学工業株式会社 | 微粉末状又はペースト状の重合生成物の製造方法 |
| US8664353B2 (en) | 2009-05-15 | 2014-03-04 | Solvay Solexis S.P.A. | Process for the purification of polyol PFPE derivatives |
| JP5165644B2 (ja) | 2009-07-02 | 2013-03-21 | 信越化学工業株式会社 | オルガノポリシロキサン組成物及びその製造方法 |
| JP5404225B2 (ja) | 2009-07-15 | 2014-01-29 | 株式会社Ｌｉｘｉｌ | 防汚塗料及びガラス層をもつ製品 |
| US20110062424A1 (en) | 2009-09-11 | 2011-03-17 | Nitto Denko Corporation | Polymer compositions comprising additive block copolymers |
| JP5914351B2 (ja) * | 2009-12-21 | 2016-05-11 | ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ | アルキル官能性シルセスキオキサン樹脂を使用した柔軟性導波路の製造方法 |
| US8043173B2 (en) * | 2010-01-26 | 2011-10-25 | Nasrin Menalagha | Sports training system |
| US20120009382A1 (en) | 2010-07-06 | 2012-01-12 | Tosoh F-Tech, Inc. | Guard substrate for optical electromotive force equipment, and its production process |
| EP2619249B1 (en) * | 2010-09-22 | 2014-05-14 | Dow Corning Corporation | High refractive index compositions containing resin-linear organosiloxane block copolymers |
| CN103201317B (zh) | 2010-09-22 | 2015-05-27 | 道康宁公司 | 含有树脂-线型有机硅氧烷嵌段共聚物的热稳定组合物 |
| EP2619247A1 (en) | 2010-09-22 | 2013-07-31 | Dow Corning Corporation | Organosiloxane block copolymer |
| JP5662580B2 (ja) | 2010-09-22 | 2015-02-04 | ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ | 樹脂−直鎖状オルガノシロキサンブロックコポリマー |
| JP2012102167A (ja) | 2010-11-05 | 2012-05-31 | Nitto Denko Corp | シリコーン樹脂、封止材料および光半導体装置 |
| EP2670789A1 (en) * | 2011-02-04 | 2013-12-11 | Dow Corning Corporation | Curable organosiloxane block copolymer emulsions |
| WO2013082451A1 (en) | 2011-12-02 | 2013-06-06 | Dow Corning Corporation | Curable compositions of resin-linear organosiloxane block copolymers |
| EP2791263B1 (en) * | 2011-12-14 | 2016-08-31 | Dow Corning Corporation | Curable compositions of resin-linear organosiloxane block copolymers |
| JP6001676B2 (ja) | 2011-12-30 | 2016-10-05 | ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ | 固体ライト及び形成方法 |
| JP6309898B2 (ja) | 2012-01-16 | 2018-04-11 | ダウ シリコーンズ コーポレーション | 光学物品及び形成方法 |
| JP6358960B2 (ja) | 2012-02-09 | 2018-07-18 | ダウ シリコーンズ コーポレーション | 勾配ポリマー構造及び方法 |
| JP6218757B2 (ja) | 2012-03-09 | 2017-10-25 | ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ | 樹脂−直鎖状オルガノシロキサンブロックコポリマーの組成物 |
| US9076934B2 (en) * | 2012-03-21 | 2015-07-07 | Dow Corning Corporation | Process for preparing resin-linear organosiloxane block copolymers |
| JP2015515516A (ja) * | 2012-03-21 | 2015-05-28 | ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ | 樹脂−直鎖状オルガノシロキサンブロックコポリマーの組成物 |
-
2013
- 2013-02-07 JP JP2014556659A patent/JP6358960B2/ja active Active
- 2013-02-07 WO PCT/US2013/025126 patent/WO2013119796A1/en not_active Ceased
- 2013-02-07 EP EP13705350.0A patent/EP2812738B1/en not_active Not-in-force
- 2013-02-07 KR KR1020147025160A patent/KR102001403B1/ko not_active Expired - Fee Related
- 2013-02-07 US US14/377,770 patent/US9705056B2/en active Active
- 2013-02-07 CN CN201380015908.3A patent/CN104220902B/zh active Active
- 2013-02-08 TW TW102105170A patent/TWI588513B/zh not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020190408A1 (en) * | 2000-06-13 | 2002-12-19 | Zms, Llc | Morphology trapping and materials suitable for use therewith |
| TW200804467A (en) * | 2006-05-17 | 2008-01-16 | 3M Innovative Properties Co | Method of making light emitting device with multilayer silicon-containing encapsulant |
| JP2008034546A (ja) * | 2006-07-27 | 2008-02-14 | Nichia Chem Ind Ltd | 発光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20150207047A1 (en) | 2015-07-23 |
| JP6358960B2 (ja) | 2018-07-18 |
| TW201344232A (zh) | 2013-11-01 |
| KR20140125843A (ko) | 2014-10-29 |
| EP2812738A1 (en) | 2014-12-17 |
| CN104220902A (zh) | 2014-12-17 |
| CN104220902B (zh) | 2018-06-26 |
| EP2812738B1 (en) | 2016-10-12 |
| KR102001403B1 (ko) | 2019-07-18 |
| WO2013119796A1 (en) | 2013-08-15 |
| US9705056B2 (en) | 2017-07-11 |
| JP2015511332A (ja) | 2015-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI588513B (zh) | 梯度聚合物結構及方法 | |
| KR102067384B1 (ko) | 고체 조명 장치 및 형성 방법 | |
| KR102026598B1 (ko) | 광학 물품 및 형성 방법 | |
| CN104838516B (zh) | 层状聚合物结构和方法 | |
| KR20140138311A (ko) | 광 가이드 및 관련된 광 어셈블리 | |
| TW201500474A (zh) | 粉末樹脂直鏈有機聚矽氧烷組成物 | |
| KR20110132533A (ko) | 열경화성 실리콘 수지용 조성물 | |
| TWI425031B (zh) | A compound containing silicon, a hardened composition and a hardened product | |
| TW201811880A (zh) | 矽樹脂薄膜、可固化矽樹脂組成物、光學半導體裝置及光學半導體裝置之封裝方法 | |
| WO2020241369A1 (ja) | 硬化性オルガノポリシロキサン組成物、及びその硬化物からなる光学部材 | |
| CN106433452A (zh) | 硅树脂薄膜、可固化硅树脂组成物、光学半导体装置及其封装方法 | |
| CN105051114A (zh) | 含磷光剂的可固化有机硅组合物及由其制得的可固化热熔膜 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |