TWI568802B - 著色組成物、彩色濾光片及顯示元件 - Google Patents

著色組成物、彩色濾光片及顯示元件 Download PDF

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Publication number
TWI568802B
TWI568802B TW102112019A TW102112019A TWI568802B TW I568802 B TWI568802 B TW I568802B TW 102112019 A TW102112019 A TW 102112019A TW 102112019 A TW102112019 A TW 102112019A TW I568802 B TWI568802 B TW I568802B
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TW
Taiwan
Prior art keywords
group
formula
independently
integer
mass
Prior art date
Application number
TW102112019A
Other languages
English (en)
Chinese (zh)
Other versions
TW201402710A (zh
Inventor
柳孝典
蓑輪貴樹
和田夏子
Original Assignee
Jsr股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2012091850A external-priority patent/JP6031807B2/ja
Priority claimed from JP2012141321A external-priority patent/JP5838923B2/ja
Application filed by Jsr股份有限公司 filed Critical Jsr股份有限公司
Publication of TW201402710A publication Critical patent/TW201402710A/zh
Application granted granted Critical
Publication of TWI568802B publication Critical patent/TWI568802B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials For Photolithography (AREA)
TW102112019A 2012-04-13 2013-04-03 著色組成物、彩色濾光片及顯示元件 TWI568802B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012091850A JP6031807B2 (ja) 2012-04-13 2012-04-13 着色組成物、カラーフィルタ及び表示素子
JP2012141321A JP5838923B2 (ja) 2012-06-22 2012-06-22 着色組成物、カラーフィルタ及び表示素子

Publications (2)

Publication Number Publication Date
TW201402710A TW201402710A (zh) 2014-01-16
TWI568802B true TWI568802B (zh) 2017-02-01

Family

ID=49460105

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102112019A TWI568802B (zh) 2012-04-13 2013-04-03 著色組成物、彩色濾光片及顯示元件

Country Status (3)

Country Link
KR (1) KR102095248B1 (ko)
CN (1) CN103374240A (ko)
TW (1) TWI568802B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6520091B2 (ja) * 2013-12-16 2019-05-29 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
WO2015182278A1 (ja) * 2014-05-27 2015-12-03 富士フイルム株式会社 着色組成物、膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および赤外線センサ
KR102524653B1 (ko) * 2020-03-05 2023-04-20 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
KR102378532B1 (ko) * 2020-05-11 2022-03-24 울산과학기술원 흑색 안료와의 분산형이 우수한 폴리에스터계 바인더 고분자 포함 흑색 감광성 수지 조성물 및 이를 이용한 전자 소자

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200819473A (en) * 2006-10-16 2008-05-01 Cheil Ind Inc Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
JP2010197512A (ja) * 2009-02-23 2010-09-09 Fujifilm Corp 感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子

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JPS4733231Y1 (ko) 1967-01-11 1972-10-06
JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
JP3940523B2 (ja) * 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP4027861B2 (ja) * 2002-12-25 2007-12-26 三菱化学株式会社 着色感光性組成物、カラーフィルター及びこれを用いて形成された液晶表示装置
CN101300064A (zh) * 2005-11-02 2008-11-05 东洋油墨制造株式会社 分散剂、其制造方法和使用其的颜料组合物
TW200804533A (en) * 2006-06-02 2008-01-16 Fujifilm Corp Organic nano-particle and its dispersion composition, and colored photosensitive resin composition and photosensitive resin transcription material comprising them, and color filter, liquid crystal device, CCD device using them
TWI427100B (zh) * 2006-07-14 2014-02-21 Toyo Ink Mfg Co 聚酯分散劑及其製造方法，暨使用其之顏料組成物
JP4733231B2 (ja) * 2008-03-25 2011-07-27 綜研化学株式会社 感光性樹脂およびこれを利用した感光性樹脂組成物
KR20100109860A (ko) * 2009-04-01 2010-10-11 도요 잉키 세이조 가부시끼가이샤 감광성 착색 조성물 및 컬러 필터
JP5834379B2 (ja) * 2009-06-25 2015-12-24 Jsr株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP5446507B2 (ja) * 2009-06-26 2014-03-19 大日本印刷株式会社 レーキ顔料を含む樹脂組成物
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200819473A (en) * 2006-10-16 2008-05-01 Cheil Ind Inc Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
JP2010197512A (ja) * 2009-02-23 2010-09-09 Fujifilm Corp 感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子

Also Published As

Publication number Publication date
KR20130116176A (ko) 2013-10-23
TW201402710A (zh) 2014-01-16
CN103374240A (zh) 2013-10-30
KR102095248B1 (ko) 2020-04-01

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