CN103374240A - 着色组合物、滤色器及显示元件 - Google Patents

着色组合物、滤色器及显示元件 Download PDF

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Publication number
CN103374240A
CN103374240A CN2013101164019A CN201310116401A CN103374240A CN 103374240 A CN103374240 A CN 103374240A CN 2013101164019 A CN2013101164019 A CN 2013101164019A CN 201310116401 A CN201310116401 A CN 201310116401A CN 103374240 A CN103374240 A CN 103374240A
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CN
China
Prior art keywords
methyl
formula
represent
expression
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2013101164019A
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English (en)
Chinese (zh)
Inventor
柳孝典
蓑轮贵树
和田夏子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2012091850A external-priority patent/JP6031807B2/ja
Priority claimed from JP2012141321A external-priority patent/JP5838923B2/ja
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN103374240A publication Critical patent/CN103374240A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials For Photolithography (AREA)
CN2013101164019A 2012-04-13 2013-04-03 着色组合物、滤色器及显示元件 Pending CN103374240A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012091850A JP6031807B2 (ja) 2012-04-13 2012-04-13 着色組成物、カラーフィルタ及び表示素子
JP2012-091850 2012-04-13
JP2012-141321 2012-06-22
JP2012141321A JP5838923B2 (ja) 2012-06-22 2012-06-22 着色組成物、カラーフィルタ及び表示素子

Publications (1)

Publication Number Publication Date
CN103374240A true CN103374240A (zh) 2013-10-30

Family

ID=49460105

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2013101164019A Pending CN103374240A (zh) 2012-04-13 2013-04-03 着色组合物、滤色器及显示元件

Country Status (3)

Country Link
KR (1) KR102095248B1 (ko)
CN (1) CN103374240A (ko)
TW (1) TWI568802B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6520091B2 (ja) * 2013-12-16 2019-05-29 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
WO2015182278A1 (ja) * 2014-05-27 2015-12-03 富士フイルム株式会社 着色組成物、膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および赤外線センサ
KR102524653B1 (ko) * 2020-03-05 2023-04-20 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
KR102378532B1 (ko) * 2020-05-11 2022-03-24 울산과학기술원 흑색 안료와의 분산형이 우수한 폴리에스터계 바인더 고분자 포함 흑색 감광성 수지 조성물 및 이를 이용한 전자 소자

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000310706A (ja) * 1999-04-27 2000-11-07 Seiko Epson Corp インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP2004219980A (ja) * 2002-12-25 2004-08-05 Mitsubishi Chemicals Corp 着色感光性組成物、カラーフィルター及びこれを用いて形成された液晶表示装置
CN101081941A (zh) * 2006-06-02 2007-12-05 富士胶片株式会社 有机纳米粒子及其分散组合物、感光性树脂组合物、转印材料、滤色器、液晶显示装置及ccd器件
CN101300064A (zh) * 2005-11-02 2008-11-05 东洋油墨制造株式会社 分散剂、其制造方法和使用其的颜料组合物
CN101490128A (zh) * 2006-07-14 2009-07-22 东洋油墨制造株式会社 聚酯分散剂及其制备方法、以及使用该分散剂的颜料组合物
CN101876788A (zh) * 2009-04-01 2010-11-03 东洋油墨制造株式会社 感光性着色组合物及滤色器
CN101930177A (zh) * 2009-06-25 2010-12-29 Jsr株式会社 着色组合物、滤色器及彩色液晶显示元件
CN101965375A (zh) * 2008-03-25 2011-02-02 综研化学株式会社 感光性树脂以及利用其的感光性树脂组合物
JP2011128239A (ja) * 2009-12-16 2011-06-30 Jsr Corp 着色組成物、カラーフィルタおよびカラー液晶表示素子

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4733231Y1 (ko) 1967-01-11 1972-10-06
JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
KR100725023B1 (ko) * 2006-10-16 2007-06-07 제일모직주식회사 카도계 수지를 함유한 수지 조성물 및 그에 의한 패턴의 제조방법, 이를 이용한 컬러필터
JP5361441B2 (ja) * 2009-02-23 2013-12-04 富士フイルム株式会社 感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5446507B2 (ja) * 2009-06-26 2014-03-19 大日本印刷株式会社 レーキ顔料を含む樹脂組成物

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000310706A (ja) * 1999-04-27 2000-11-07 Seiko Epson Corp インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP2004219980A (ja) * 2002-12-25 2004-08-05 Mitsubishi Chemicals Corp 着色感光性組成物、カラーフィルター及びこれを用いて形成された液晶表示装置
CN101300064A (zh) * 2005-11-02 2008-11-05 东洋油墨制造株式会社 分散剂、其制造方法和使用其的颜料组合物
CN101081941A (zh) * 2006-06-02 2007-12-05 富士胶片株式会社 有机纳米粒子及其分散组合物、感光性树脂组合物、转印材料、滤色器、液晶显示装置及ccd器件
CN101490128A (zh) * 2006-07-14 2009-07-22 东洋油墨制造株式会社 聚酯分散剂及其制备方法、以及使用该分散剂的颜料组合物
CN101965375A (zh) * 2008-03-25 2011-02-02 综研化学株式会社 感光性树脂以及利用其的感光性树脂组合物
CN101876788A (zh) * 2009-04-01 2010-11-03 东洋油墨制造株式会社 感光性着色组合物及滤色器
CN101930177A (zh) * 2009-06-25 2010-12-29 Jsr株式会社 着色组合物、滤色器及彩色液晶显示元件
JP2011128239A (ja) * 2009-12-16 2011-06-30 Jsr Corp 着色組成物、カラーフィルタおよびカラー液晶表示素子

Also Published As

Publication number Publication date
KR20130116176A (ko) 2013-10-23
TW201402710A (zh) 2014-01-16
TWI568802B (zh) 2017-02-01
KR102095248B1 (ko) 2020-04-01

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WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20131030

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