TWI557073B - 供石英玻璃應用之高純度矽石顆粒 - Google Patents

供石英玻璃應用之高純度矽石顆粒 Download PDF

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Publication number
TWI557073B
TWI557073B TW101105523A TW101105523A TWI557073B TW I557073 B TWI557073 B TW I557073B TW 101105523 A TW101105523 A TW 101105523A TW 101105523 A TW101105523 A TW 101105523A TW I557073 B TWI557073 B TW I557073B
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Taiwan
Prior art keywords
vermiculite
particles
less
ppm
high purity
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TW101105523A
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English (en)
Chinese (zh)
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TW201247540A (en
Inventor
克里斯汀 潘茲
蓋都 提茲
史文 慕勒
馬克斯 魯夫
波多 弗林斯
哈特威格 羅里德
喬根 班尼斯赫
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贏創德固賽有限責任公司
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/008—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in molecular form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C01P2006/17—Pore diameter distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
TW101105523A 2011-02-22 2012-02-20 供石英玻璃應用之高純度矽石顆粒 TWI557073B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011004532A DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen

Publications (2)

Publication Number Publication Date
TW201247540A TW201247540A (en) 2012-12-01
TWI557073B true TWI557073B (zh) 2016-11-11

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TW101105523A TWI557073B (zh) 2011-02-22 2012-02-20 供石英玻璃應用之高純度矽石顆粒

Country Status (12)

Country Link
US (2) US20140072803A1 (OSRAM)
EP (1) EP2678280B1 (OSRAM)
JP (1) JP5897043B2 (OSRAM)
KR (1) KR101911566B1 (OSRAM)
CN (2) CN103402933A (OSRAM)
CA (1) CA2827899C (OSRAM)
DE (1) DE102011004532A1 (OSRAM)
ES (1) ES2628382T3 (OSRAM)
PL (1) PL2678280T3 (OSRAM)
RU (1) RU2602859C2 (OSRAM)
TW (1) TWI557073B (OSRAM)
WO (1) WO2012113655A1 (OSRAM)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014511330A (ja) 2011-02-22 2014-05-15 エボニック デグサ ゲーエムベーハー アルカリ金属ケイ酸塩溶液からの高純度水性コロイダルシリカゾルの製造方法
CN104860322B (zh) * 2015-05-07 2017-09-26 中海油天津化工研究设计院有限公司 一种低钠离子含量高纯硅溶胶的制备方法
KR20180095616A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
TWI812586B (zh) 2015-12-18 2023-08-21 德商何瑞斯廓格拉斯公司 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
EP3390308B1 (de) 2015-12-18 2024-08-28 Heraeus Quarzglas GmbH & Co. KG Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt
JP6881776B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 不透明石英ガラス体の調製
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
JP7390198B2 (ja) * 2019-01-28 2023-12-01 三井金属鉱業株式会社 ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法
CN111943215B (zh) * 2019-05-14 2022-02-22 中天科技精密材料有限公司 石英粉的制备方法
RU2723623C1 (ru) * 2019-12-30 2020-06-16 Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") Способ получения кускового силикагеля
CN111976485B (zh) * 2020-08-17 2022-01-11 宿州竹梦光学科技有限公司 一种汽车中控触屏ag玻璃
CN113104855B (zh) * 2021-04-30 2022-03-15 武汉大学 球形二氧化硅的制备方法
CN113880098B (zh) * 2021-11-17 2022-12-09 江苏海格新材料有限公司 一种高纯球形硅微粉的生产方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1413169A (zh) * 1999-12-28 2003-04-23 株式会社渡边商行 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法
TW201029924A (en) * 2008-09-30 2010-08-16 Evonik Degussa Gmbh Method for the production of high purity SiO2 from silicate solutions
TW201029925A (en) * 2008-09-30 2010-08-16 Evonik Degussa Gmbh Method for the production of high purity SiO2 from silicate solutions

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3459522A (en) 1963-07-08 1969-08-05 Corning Glass Works Method of treating a porous,high silica content glass
US4042361A (en) 1976-04-26 1977-08-16 Corning Glass Works Method of densifying metal oxides
JPS60204612A (ja) * 1984-03-29 1985-10-16 Nippon Sheet Glass Co Ltd 高純度二酸化珪素の製造方法
JPS60215532A (ja) * 1984-04-12 1985-10-28 Seiko Epson Corp 石英ガラスの製造方法
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
US4973462A (en) * 1987-05-25 1990-11-27 Kawatetsu Mining Company, Ltd. Process for producing high purity silica
JPS63291808A (ja) * 1987-05-25 1988-11-29 Kawatetsu Kogyo Kk 高純度シリカの製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JPH02229735A (ja) * 1989-02-28 1990-09-12 Shin Etsu Chem Co Ltd 石英ガラス部材
US5063179A (en) 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
JPH054827A (ja) * 1990-09-07 1993-01-14 Mitsubishi Kasei Corp シリカガラス粉末及びその製法並びにこれを用いたシリカガラス成形体
EP0474158B1 (en) * 1990-09-07 1995-04-19 Mitsubishi Chemical Corporation Silica glass powder and a method for its production and a silica glass body product made thereof
DE19601415A1 (de) 1995-02-04 1996-08-08 Degussa Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
JP2001192225A (ja) * 1999-12-28 2001-07-17 Watanabe Shoko:Kk 石英ガラスの製造方法
DE10058616A1 (de) * 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
EP1258456A1 (en) 2001-05-18 2002-11-20 Degussa AG Silica glass formation process
ATE307784T1 (de) 2001-08-01 2005-11-15 Novara Technology Srl Sol-gel-verfahren für die herstellung von vorformen für optische fasern
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
DE102004005409A1 (de) * 2004-02-03 2005-08-18 Degussa Ag Hydrophile Fällungskieselsäure für Entschäumerformulierungen
EP1717202A1 (en) 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials
JP2010018470A (ja) * 2008-07-09 2010-01-28 Tosoh Corp 高純度熔融石英ガラスおよびその製造方法並びに、これを用いた部材および装置
DE102008035867A1 (de) * 2008-08-01 2010-02-04 Evonik Degussa Gmbh Neuartige Fällungskieselsäuren für Trägeranwendungen
CN101844770A (zh) * 2010-04-27 2010-09-29 中国神华能源股份有限公司 一种利用粉煤灰提铝残渣制备白炭黑的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1413169A (zh) * 1999-12-28 2003-04-23 株式会社渡边商行 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法
TW201029924A (en) * 2008-09-30 2010-08-16 Evonik Degussa Gmbh Method for the production of high purity SiO2 from silicate solutions
TW201029925A (en) * 2008-09-30 2010-08-16 Evonik Degussa Gmbh Method for the production of high purity SiO2 from silicate solutions

Also Published As

Publication number Publication date
KR20140022380A (ko) 2014-02-24
PL2678280T3 (pl) 2017-10-31
CN108658451A (zh) 2018-10-16
CA2827899C (en) 2018-06-12
CA2827899A1 (en) 2012-08-30
US20140072803A1 (en) 2014-03-13
TW201247540A (en) 2012-12-01
KR101911566B1 (ko) 2018-10-24
RU2602859C2 (ru) 2016-11-20
DE102011004532A1 (de) 2012-08-23
US20170066654A1 (en) 2017-03-09
RU2013142832A (ru) 2015-03-27
ES2628382T3 (es) 2017-08-02
CN103402933A (zh) 2013-11-20
JP5897043B2 (ja) 2016-03-30
JP2014514229A (ja) 2014-06-19
EP2678280A1 (de) 2014-01-01
WO2012113655A1 (de) 2012-08-30
EP2678280B1 (de) 2017-05-03

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