PL2678280T3 - Sposób wytwarzania granulatu dwutlenku krzemu o wysokiej czystości do zastosowań szkła kwarcowego - Google Patents
Sposób wytwarzania granulatu dwutlenku krzemu o wysokiej czystości do zastosowań szkła kwarcowegoInfo
- Publication number
- PL2678280T3 PL2678280T3 PL12704510T PL12704510T PL2678280T3 PL 2678280 T3 PL2678280 T3 PL 2678280T3 PL 12704510 T PL12704510 T PL 12704510T PL 12704510 T PL12704510 T PL 12704510T PL 2678280 T3 PL2678280 T3 PL 2678280T3
- Authority
- PL
- Poland
- Prior art keywords
- silicon dioxide
- quartz glass
- producing high
- purity silicon
- dioxide granules
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 3
- 239000008187 granular material Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 235000012239 silicon dioxide Nutrition 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/126—Preparation of silica of undetermined type
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/126—Preparation of silica of undetermined type
- C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/022—Purification of silica sand or other minerals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/008—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in molecular form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
- C01P2006/17—Pore diameter distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Ceramic Engineering (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011004532A DE102011004532A1 (de) | 2011-02-22 | 2011-02-22 | Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen |
| PCT/EP2012/052251 WO2012113655A1 (de) | 2011-02-22 | 2012-02-10 | Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren |
| EP12704510.2A EP2678280B1 (de) | 2011-02-22 | 2012-02-10 | Herstellungsverfahren eines hochreinen siliciumdioxidgranulats für quarzglasanwendungen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2678280T3 true PL2678280T3 (pl) | 2017-10-31 |
Family
ID=45688164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL12704510T PL2678280T3 (pl) | 2011-02-22 | 2012-02-10 | Sposób wytwarzania granulatu dwutlenku krzemu o wysokiej czystości do zastosowań szkła kwarcowego |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US20140072803A1 (OSRAM) |
| EP (1) | EP2678280B1 (OSRAM) |
| JP (1) | JP5897043B2 (OSRAM) |
| KR (1) | KR101911566B1 (OSRAM) |
| CN (2) | CN103402933A (OSRAM) |
| CA (1) | CA2827899C (OSRAM) |
| DE (1) | DE102011004532A1 (OSRAM) |
| ES (1) | ES2628382T3 (OSRAM) |
| PL (1) | PL2678280T3 (OSRAM) |
| RU (1) | RU2602859C2 (OSRAM) |
| TW (1) | TWI557073B (OSRAM) |
| WO (1) | WO2012113655A1 (OSRAM) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014511330A (ja) | 2011-02-22 | 2014-05-15 | エボニック デグサ ゲーエムベーハー | アルカリ金属ケイ酸塩溶液からの高純度水性コロイダルシリカゾルの製造方法 |
| CN104860322B (zh) * | 2015-05-07 | 2017-09-26 | 中海油天津化工研究设计院有限公司 | 一种低钠离子含量高纯硅溶胶的制备方法 |
| KR20180095616A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조 |
| KR20180095880A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 합성 석영 유리 결정립의 제조 |
| TWI812586B (zh) | 2015-12-18 | 2023-08-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點 |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| EP3390308B1 (de) | 2015-12-18 | 2024-08-28 | Heraeus Quarzglas GmbH & Co. KG | Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt |
| JP6881776B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラス体の調製 |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| JP7390198B2 (ja) * | 2019-01-28 | 2023-12-01 | 三井金属鉱業株式会社 | ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法 |
| CN111943215B (zh) * | 2019-05-14 | 2022-02-22 | 中天科技精密材料有限公司 | 石英粉的制备方法 |
| RU2723623C1 (ru) * | 2019-12-30 | 2020-06-16 | Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") | Способ получения кускового силикагеля |
| CN111976485B (zh) * | 2020-08-17 | 2022-01-11 | 宿州竹梦光学科技有限公司 | 一种汽车中控触屏ag玻璃 |
| CN113104855B (zh) * | 2021-04-30 | 2022-03-15 | 武汉大学 | 球形二氧化硅的制备方法 |
| CN113880098B (zh) * | 2021-11-17 | 2022-12-09 | 江苏海格新材料有限公司 | 一种高纯球形硅微粉的生产方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3459522A (en) | 1963-07-08 | 1969-08-05 | Corning Glass Works | Method of treating a porous,high silica content glass |
| US4042361A (en) | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
| JPS60204612A (ja) * | 1984-03-29 | 1985-10-16 | Nippon Sheet Glass Co Ltd | 高純度二酸化珪素の製造方法 |
| JPS60215532A (ja) * | 1984-04-12 | 1985-10-28 | Seiko Epson Corp | 石英ガラスの製造方法 |
| JPS6212608A (ja) * | 1985-07-11 | 1987-01-21 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製造方法 |
| US4973462A (en) * | 1987-05-25 | 1990-11-27 | Kawatetsu Mining Company, Ltd. | Process for producing high purity silica |
| JPS63291808A (ja) * | 1987-05-25 | 1988-11-29 | Kawatetsu Kogyo Kk | 高純度シリカの製造方法 |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| JPH02229735A (ja) * | 1989-02-28 | 1990-09-12 | Shin Etsu Chem Co Ltd | 石英ガラス部材 |
| US5063179A (en) | 1990-03-02 | 1991-11-05 | Cabot Corporation | Process for making non-porous micron-sized high purity silica |
| JPH054827A (ja) * | 1990-09-07 | 1993-01-14 | Mitsubishi Kasei Corp | シリカガラス粉末及びその製法並びにこれを用いたシリカガラス成形体 |
| EP0474158B1 (en) * | 1990-09-07 | 1995-04-19 | Mitsubishi Chemical Corporation | Silica glass powder and a method for its production and a silica glass body product made thereof |
| DE19601415A1 (de) | 1995-02-04 | 1996-08-08 | Degussa | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| JP2001192225A (ja) * | 1999-12-28 | 2001-07-17 | Watanabe Shoko:Kk | 石英ガラスの製造方法 |
| US7140201B2 (en) * | 1999-12-28 | 2006-11-28 | M. Watanabe & Co., Ltd. | Method for producing silica particles |
| DE10058616A1 (de) * | 2000-11-25 | 2002-05-29 | Degussa | Fällungskieselsäuren mit hoher Struktur |
| EP1258456A1 (en) | 2001-05-18 | 2002-11-20 | Degussa AG | Silica glass formation process |
| ATE307784T1 (de) | 2001-08-01 | 2005-11-15 | Novara Technology Srl | Sol-gel-verfahren für die herstellung von vorformen für optische fasern |
| DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| DE102004005409A1 (de) * | 2004-02-03 | 2005-08-18 | Degussa Ag | Hydrophile Fällungskieselsäure für Entschäumerformulierungen |
| EP1717202A1 (en) | 2005-04-29 | 2006-11-02 | Degussa AG | Sintered silicon dioxide materials |
| JP2010018470A (ja) * | 2008-07-09 | 2010-01-28 | Tosoh Corp | 高純度熔融石英ガラスおよびその製造方法並びに、これを用いた部材および装置 |
| DE102008035867A1 (de) * | 2008-08-01 | 2010-02-04 | Evonik Degussa Gmbh | Neuartige Fällungskieselsäuren für Trägeranwendungen |
| CA2738559A1 (en) * | 2008-09-30 | 2010-04-08 | Evonik Degussa Gmbh | Method for producing high-purity sio2 from silicate solutions |
| WO2010037705A1 (de) * | 2008-09-30 | 2010-04-08 | Evonik Degussa Gmbh | Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen |
| CN101844770A (zh) * | 2010-04-27 | 2010-09-29 | 中国神华能源股份有限公司 | 一种利用粉煤灰提铝残渣制备白炭黑的方法 |
-
2011
- 2011-02-22 DE DE102011004532A patent/DE102011004532A1/de not_active Withdrawn
-
2012
- 2012-02-10 EP EP12704510.2A patent/EP2678280B1/de active Active
- 2012-02-10 WO PCT/EP2012/052251 patent/WO2012113655A1/de not_active Ceased
- 2012-02-10 KR KR1020137024272A patent/KR101911566B1/ko active Active
- 2012-02-10 US US14/000,954 patent/US20140072803A1/en not_active Abandoned
- 2012-02-10 ES ES12704510.2T patent/ES2628382T3/es active Active
- 2012-02-10 CA CA2827899A patent/CA2827899C/en active Active
- 2012-02-10 PL PL12704510T patent/PL2678280T3/pl unknown
- 2012-02-10 CN CN2012800100352A patent/CN103402933A/zh active Pending
- 2012-02-10 JP JP2013554843A patent/JP5897043B2/ja active Active
- 2012-02-10 CN CN201810913825.0A patent/CN108658451A/zh active Pending
- 2012-02-10 RU RU2013142832/03A patent/RU2602859C2/ru active
- 2012-02-20 TW TW101105523A patent/TWI557073B/zh not_active IP Right Cessation
-
2016
- 2016-10-17 US US15/295,899 patent/US20170066654A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140022380A (ko) | 2014-02-24 |
| CN108658451A (zh) | 2018-10-16 |
| CA2827899C (en) | 2018-06-12 |
| CA2827899A1 (en) | 2012-08-30 |
| US20140072803A1 (en) | 2014-03-13 |
| TW201247540A (en) | 2012-12-01 |
| KR101911566B1 (ko) | 2018-10-24 |
| RU2602859C2 (ru) | 2016-11-20 |
| DE102011004532A1 (de) | 2012-08-23 |
| TWI557073B (zh) | 2016-11-11 |
| US20170066654A1 (en) | 2017-03-09 |
| RU2013142832A (ru) | 2015-03-27 |
| ES2628382T3 (es) | 2017-08-02 |
| CN103402933A (zh) | 2013-11-20 |
| JP5897043B2 (ja) | 2016-03-30 |
| JP2014514229A (ja) | 2014-06-19 |
| EP2678280A1 (de) | 2014-01-01 |
| WO2012113655A1 (de) | 2012-08-30 |
| EP2678280B1 (de) | 2017-05-03 |
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