TWI532110B - 半導體封裝結構銲帽凸塊與其製作方法 - Google Patents

半導體封裝結構銲帽凸塊與其製作方法 Download PDF

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TWI532110B
TWI532110B TW101132466A TW101132466A TWI532110B TW I532110 B TWI532110 B TW I532110B TW 101132466 A TW101132466 A TW 101132466A TW 101132466 A TW101132466 A TW 101132466A TW I532110 B TWI532110 B TW I532110B
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layer
conductive
solder
pads
ball
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TW101132466A
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TW201314805A (zh
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沈更新
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南茂科技股份有限公司
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Description

半導體封裝結構銲帽凸塊與其製作方法
本發明係關於一半導體封裝結構，特別是一種具均勻高度的銲帽凸塊形成方法，並藉以提升在該半導體封裝結構中的一銲帽凸塊與一銲墊間的彼此連接關係。
隨著半導體科技的日新月異，電子產業經歷了由體積厚到薄的快速變革，以及從不停歇的微小化製程改良。半導體封裝是一門建立半導體元件之間連結以形成一電路的科學，也因應半導體與電子產業的不斷進步而快速發展。
電子產品(如行動電話、筆電、個人數位助理PDA等)對於尺寸不斷縮小且功能不斷提高的需求與日劇增，高密度的積體電路也必須被封裝在有限且壓縮的封裝結構如覆晶與球格陣列(Ball Grid Array，BGA)中。例如在球格陣列中，銲球被陣列式地排列以用來與所對應的球銲墊相接觸以形成一"球格(ball grid)"陣列。一般而言，球格陣列的封裝結構較一般傳統的封裝結構可包覆更高的密度並有較高的輸出入腳位數。
圖1A至1F是針對習知的形成銲帽凸塊的剖面示意圖。如圖1A所示，一晶圓110提供一主動表面112，該晶圓110並具有一鈍化層114與複數個接線銲墊116。須注意的是，該鈍化層114經圖案化處理後露出該些接線銲墊116，進一步地，形成一金屬層120覆蓋在該鈍化層114與該些接線銲墊116。該金屬層120為一位於接線銲墊116與之後形成的導 電柱140之間的介面(參圖1C)。
根據圖1B至1F，一圖案化罩幕層130在金屬層120上形成，圖案化罩幕層130包含複數個位於接線銲墊116上方的開孔132，該些開孔將至少一部份的金屬層120露出。接著以金屬層120為種子層用電鍍的方式將導電材料填入開孔132中以形成一導電柱140將開孔132部分填滿，接著以電鍍或印刷的方式形成柱狀的銲帽150。移除罩幕層130與部分的金屬層120以形成一個具有銲帽的凸塊結構160。值得注意的是，該銲帽可以是圓柱形150或半球形150a覆蓋於導電柱140上。
傳統具有銲帽的凸塊的一個缺點是銲帽只能透過電鍍將純錫(Sn)或錫銀合金形成，實務上要透過電鍍形成其他銲料合金極其困難。另外，電鍍形成銲帽在體積控制上也是不易，無法達成對於高度均勻度的要求。因此，如何能夠提供一個新穎且可改良精準度、體積控制與產出速度的銲帽形成方法確實有其必要。
本發明的目的為提供一種凸塊可供一半導體封裝結構與其製造方法，其中該凸塊上的銲帽的尺寸大小、體積可被精確地控制以改善其高度的均勻度進而增加凸塊與銲墊之間的相互連接，提升封裝結構的可靠度。
本發明的另一目的為提供一半導體封裝結構之凸塊及其製造方法，使得凸塊可選用的材料有較多選擇，以增加 製作封裝結構的便利性。
本發明的另一目的為提供一銲球陣列具有較高的製作速度，以降低製造成本。
另一方面，本發明提供在一半導體元件上形成一銲帽凸塊的方法，該方法包含提供一半導體基板，該基板具有複數個銲墊間隔地設置於該基板上表面以及一沉積在該些銲墊上方的鈍化層，其中複數個銲墊開孔形成於該鈍化層中，藉使該些銲墊至少一部份露出；形成複數個導電柱於該些銲墊開孔，使得該些導電柱可透過該些銲墊開孔與銲墊電連接；設置或沉積一圖案化層以覆蓋該鈍化層與該些導電柱上以暴露出至少一部份的導電柱的上表面，其中，該圖案化層包含複數個位於導電柱上方且具有一特定尺寸的導電柱開孔，該導電柱開孔的尺寸略小於導電柱上表面的寬度；置放每一銲球於每一導電柱開孔，其中，該銲球的尺寸小於該導電柱開孔的特定尺寸及導電柱上表面之寬度；移除該圖案化層使該鈍化層、該些導電柱、與在該些導電柱上的銲球露出；以及對該些銲球進行迴銲以形成一半球型的銲帽於該導電柱上。也可選擇性地在銲球置放(ball drop)之前先在導電柱的上表面塗上一助銲劑。
在本發明一實施例中，該導電柱可以是一高度小於或等於60μm之導電球下冶金層，且該球下冶金層以電鍍形成。在本發明另一實施例中，導電柱的材料可為銅、金或其合金。又本發明另一實施例中，該圖案化層可為一鋼板或一光阻層。又本發明另一實施例中，所述形成複數個導電柱於該些銲墊開孔的步驟進一步包含形成一冶金種子層於 該些銲墊開孔以及以電鍍形成該些導電柱於該冶金種子層上。
另一方面，本發明一半導體基板包含複數個銲墊間隔設置於該基板上表面，以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以露出該些銲墊之至少一部份；該複數個銲料凸塊，包含(a)複數個導電柱於鈍化層中的該些銲墊開孔中，該導電柱透過該些銲墊開孔與該銲墊電連接，其中，一圖案化層形成於該些導電柱上方，該圖案化層具有複數個具特定尺寸的導電柱開孔，接著，置放一對應該導電柱開孔的之特定尺寸的銲球沈置其中；以及(b)實行一迴銲製程將該銲球形成該銲帽，使其覆蓋於每一該導電柱之上表面；以及一承載基板包含複數個接線銲墊，以與位在該半導體基板的該銲帽凸塊電連接。
在一實施例中，該半導體封裝結構進一步包含一用來填充位於該承載基板及該半導體基板間空隙的封膠層。在另一實施例中，該導電柱可為球下冶金層(UBM)。在一實施例中，該導電柱或球下冶金層的材料可為銅、金或其合金。在一實施例中，該銲帽底部的寬度對應該導電柱或球下冶金層上表面大小。在一實施例中，該半導體封裝結構進一步包含一導電跡線(Trace)電連接於該導電柱與該半導體基板的銲墊。也可選擇性地在銲球置放之前先在導電柱或球下冶金層的上表面塗上一助銲劑。
另一方面，本發明可為一形成覆晶封裝結構的方法， 該方法包含提供一半導體基板，該基板具有間隔設置且位於該基板上表面的複數個銲墊以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以使該些銲墊至少一部份露出；形成複數個導電球下冶金層結構於位於該鈍化層中的該些銲墊開孔，使其可透過該些銲墊開孔與該些銲墊電連接；沉積或設置一圖案化層以覆蓋該鈍化層與該些導電球下冶金層結構以暴露出至少一部份的該些導電球下冶金層結構的上表面，其中，該圖案化層具有複數個具有特定尺寸之球下冶金層開孔，該球下冶金層開孔的尺寸略小於該些導電球下冶金層結構的該上表面的寬度；置放每一銲球於每一球下冶金層開孔，其中，該銲球的尺寸小於該球下冶金層開孔的特定尺寸及該些導電球下冶金層結構的該上表面的該寬度；移除該圖案化層使該鈍化層、該些導電球下冶金層結構、與在該些導電球下冶金層結構上的銲球露出；對該些銲球進行迴銲以形成一半球型的銲帽於每一個導電球下冶金層結構上；以及提供一承載基板包含複數個接線銲墊，其中該接線銲墊是用來接合該導電球下冶金層結構的銲帽並電連接該承載基板與該半導體基板。
在一實施例中，該製造方法進一步包含一用來填充位於該承載基板及該半導體基板間空隙的封膠層。在另一實施例中，該球下冶金層是以電鍍形成，且球下冶金層的材料可為銅、金或其合金。又本發明另一實施例中，該圖案化層可為一鋼板或一光阻層。又本發明另一實施例中，所述 形成複數個球下冶金層於該些銲墊開孔的步驟進一步包含形成一冶金種子層於該些銲墊開孔以及形成該些球下冶金層於該冶金種子層上。
為能進一步了解本發明的上述與其他的優點可透過以下的實施方式與所附的例圖綜觀之。
以下所述的詳細內容主要是用來舉例說明本發明中所提的例示裝置或方法，所述內容不應用來限定本發明，而且對於任何與本發明概念均等的功能與元件皆不脫離本發明的精神。
除非有特別定義，本說明書中所用的技術與科學用語應與本領域技藝人士所通用的相同，任何與本說明所述相關或均等的方法、元件或材料均在本發明保護涵蓋範圍，以下說明皆僅為例示說明。
所有用來描述本發明所提及並含括作為參考的公開物，如所述的設計、方法主要是用來揭示並提供對照，並作為與本發明相關的連接，但不代表本發明內容未在其先完成。
如上所述，電鍍是用來形成傳統銲料凸塊的方法。由於純錫(Sn)或錫銀合金只能透過電鍍形成，實務上要透過電鍍形成其他銲料合金極其困難，因此在製作時材料的選擇性變得極為有限。進一步言，由於銲帽的體積控制不易 ，因此形成的高度也不均勻使得凸塊與銲墊間的相互連接無法有效形成。因此，如何能夠提供一個新穎且可改良精準度、體積控制與產出速度的銲帽形成方法確實有其必要。
參考第2A圖，一半導體元件200包含一半導體基板210，複數個間隔設置的銲墊212，該銲墊212之形成方式例如是利用化學氣相沉積(下稱CVD)、電漿化學氣相沉積(下稱PECVD)或物理氣相沉積(下稱PVD)如濺鍍或蒸鍍形成在基板210上表面，以及一塗佈在基板210上表面的鈍化層214。接著圖案化該鈍化層214以露出銲墊212的至少一部分，再將一金屬層215沉積在鈍化層214上，其中部分的金屬層215直接與銲墊212的露出部分直接接觸，而一開孔216形成於對應金屬層215與銲墊212之區域。
如第2B圖所示，金屬層215為一電鍍用的種子層，並在種子層上形成複數個導電柱217後圖案化該金屬層215，該導電柱217與銲墊212電連接。種子層一般位於導電柱217與銲墊212之間用來促進電鍍製程的進行。關於導電柱217所用的材料，可選自銅(Cu)、金(Au)或由其組成的合金。在本發明所例示的一實施例中，導電柱217的高度若小於或等於60μm時可視為一球下冶金層(UBM)。
如上所述，銲帽的高度不一致將影響到凸塊與銲墊間的相互連接，因此本發明透過一圖案化層230可有效的控制銲帽的一致性及其體積。於本實施例中，圖案化層230不僅是用來將銲球精確地放置在導電柱頂端，也可控制銲球的 體積。如第2C圖所示，圖案化層230沉積在鈍化層214與導電柱217上，接著於圖案化層230上形成一導電柱開孔231用來露出至少一部份的導電柱217的上表面。在一實施例中，可在銲球置放之前先在導電柱217的上表面塗上一助銲劑(圖未示)，以對後續的迴銲有所助益。在另一實施例中，導電柱開孔231的尺寸大小略小於導電柱217上表面的寬度(w)。接著將一銲球220置於導電柱217上表面，再將圖案化層230移除(第2D圖)。在一些實施例中，圖案化層230是一鋼板(stencil layer)，而在另一些實施例中，圖案化層230是一光阻層。值得注意的是，銲球的尺寸(或體積)可經由複數個參數來決定，在第4圖中將有詳述。
如第2E圖所示，透過一熔化或迴銲製程形成一銲帽凸塊240。尤其特別的是，在迴銲過程中，銲球220被熔化並在導電柱217上表面形成一具有半球型或帽狀覆蓋態樣的銲帽220'，且該銲帽220'具有一致的凸塊高度。
覆晶封裝在近來漸受歡迎且已成為用來將積體電路晶片與基板直接電連接的方式。在製造過程中，需將銲料凸塊置於晶片的上表面上，接著將該晶片翻轉，使得晶片上的接線銲墊可以和基板上相對應的接線銲墊對齊，接著透過加熱基板與晶片將銲料熔化並濕潤該些銲墊，進而完成相互連接。接著再將基板與晶片冷卻以固化該銲料形一電連接的關係。根據本發明一例示的實施例，如第3A與3B圖所示，將一連接結構200'翻轉並藉於一承載基板以形成一覆晶封裝結構330。該承載基板包含一半導體基板310，複數 個沉積在半導體基板310上表面的接線銲墊312，以及一塗佈在接線銲墊312與半導體基板310上的鈍化層314。透過圖案化該鈍化層314以露出至少部分的接線銲墊312來形成複數個銲墊開孔316。銲墊開孔316的大小可由銲帽凸塊240的銲帽220'的大小加以決定。在迴銲的製程中，可以將銲錫膏施加在銲墊開孔316上(圖未示)來幫助銲帽與接線銲墊312的連接。
如第3B圖所示，藉由連接結構200'使銲帽220'置於銲墊開孔316並與接線銲墊312電連接。要注意的是，由於銲球220的體積可經由圖案化層230之導電柱開孔231加以控制，且銲帽220'與銲帽凸塊240高度的一致性也大幅改善，所以銲帽220'與接線銲墊312之間具有較佳的相互連接使得封裝結構的可靠度也大幅提升。
續看第3B圖，可以用如環氧樹脂的包覆材料用來填充位於該承載基板310及該半導體基板210之間的空隙320，並可密封或保護電路元件避免受到外在環境如濕氣、腐蝕化學品、過熱、震動、機械刮傷等侵害。
如上所述，銲球的尺寸大小可被控制以達成銲帽高度的均勻度。第4圖為一示意圖用來說明控制銲球體積大小的重要參數。d為銲球420的直徑，t代表圖案化層430的厚度，h是球下冶金層結構的高度，g是從圖案化層430底部到一基板410的距離，b是圖案化層430上表面到銲球420頂端的距離(亦即球的突出高度)，Φ是圖案化層430中的球下冶金層開孔的寬度。
根據第4圖，可以一等式表示該些參數的幾何關係：d+h=t+g+b，所以t=d+h-g-b。在一般狀況下，球下冶金層結構的厚度與銲球高度相比並不顯著，所以可加以忽略，因此可將公式簡化如下以決定圖案化層430的最大厚度(tmax)：t max =d-g-b (1)
至於圖案化層430中的球下冶金層開孔的寬度Φ較銲球420的直徑d略大些，可以下面的公式求得：Φ=d+2y+η (2)其中d是銲球420的直徑，y是銲球至圖案化層430中的球下冶金層開孔任一端的間距，η是銲球直徑的變異。例如，當銲球的直徑為200μm，間距為10μm，且直徑的變異為5μm，則球下冶金層開孔的寬度Φ為200+2x10+5=225μm。至於該球的突出高度b，一般為銲球直徑d的15%。
根據第5圖所示的本發明的另一實施例，是一形成一覆晶封裝結構的製造流程500，包含了提供一半導體基板，該基板具有間隔設置於該基板上表面的複數個銲墊以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以使該些銲墊至少一部份露出(510)；形成複數個導電球下冶金層結構於位於該鈍化層中的該些銲墊開孔中，使複數個導電球下冶金層結構可透過該些銲墊開孔與該些銲墊電連接(520)；沉積或設置一圖案化層以覆蓋該鈍化層與該些導電球下冶金層結構，其中，該圖案化層包含複數個位於該些導電球下冶金層結構上方且具有一特定 尺寸的球下冶金層開孔(530)；置放一銲球於每一球下冶金層開孔，其中，該銲球的尺寸小於該球下冶金層開孔的特定尺寸(540)；移除該圖案化層使該鈍化層、該些導電球下冶金層結構、與在該些導電球下冶金層結構上的銲球露出(550)； 對該些銲球進行迴銲以形成一半球型的銲帽於該導電球下冶金層結構上，並進而形成該銲帽凸塊(560)；提供一承載基板包含複數個接線銲墊，其中該接線銲墊是用來接合該導電球下冶金層結構的銲帽並電連接該承載基板與該半導體基板(570)。
該形成一覆晶封裝結構的製造流程500可進一步包含形成一用來填充位於該承載基板及該半導體基板間空隙的封膠層(580)。在一實施例中，形成複數個導電球下冶金層結構於位於該鈍化層中的該些銲墊開孔的步驟(520)可進一步包含形成一金屬種子層於該銲墊開孔並在該金屬化種子層上形成該導電球下冶金層結構。在另一實施例中，是以電鍍形成該導電球下冶金層結構且該導電球下冶金層結構的材料可選自銅、金與其合金。在又一實施例中，用來決定銲球大小的圖案化層可為一鋼板。在某些實施例中，圖案化層可為一光阻層。
本發明之技術內容及技術特點已揭示如上，然而熟悉本項技術之人士仍可能基於本發明之教示及揭示而作種種不背離本發明精神之替換及修飾。因此，本發明之保護範圍應不限於實施例所揭示者，而應包括各種不背離本發明 之替換及修飾，並為以下之申請專利範圍所涵蓋。
110‧‧‧晶圓
112‧‧‧主動表面
114‧‧‧鈍化層
116‧‧‧接線銲墊
120‧‧‧金屬層
130‧‧‧圖案化罩幕層
132‧‧‧開孔
140‧‧‧導電柱
150‧‧‧銲帽
150a‧‧‧半球形
160‧‧‧凸塊結構
200‧‧‧半導體元件
210‧‧‧半導體基板
212‧‧‧銲墊
214‧‧‧鈍化層
215‧‧‧金屬層
216‧‧‧開孔
217‧‧‧導電柱
220‧‧‧銲球
230‧‧‧圖案化層
231‧‧‧導電柱開孔
200'‧‧‧連接結構
220'‧‧‧銲帽
240‧‧‧銲帽凸塊
300‧‧‧承載基板
310‧‧‧半導體基板
312‧‧‧接線銲墊
314‧‧‧鈍化層
316‧‧‧銲墊開孔
320‧‧‧空隙
330‧‧‧覆晶封裝結構
410‧‧‧基板
420‧‧‧銲球
430‧‧‧圖案化層
500~580‧‧‧流程圖步驟
第1A-1F圖顯示一習知製造銲帽凸塊的製程；第2A-2E圖顯示係本發明一用以提升銲帽凸塊高度均勻度的製造方法；第3A-3B圖顯示係本發明一具有經改良高度均勻度的銲帽凸塊的覆晶封裝結構的剖面圖；第4圖顯示本發明如何決定銲球尺寸大小的幾何示意圖；第5圖顯示本發明一用以提升銲帽凸塊高度均勻度的製造方法流程圖。
500~580‧‧‧流程圖步驟

Claims (14)

  1. 一種一半導體元件形成銲帽凸塊的方法，該方法包含：提供一半導體基板，該基板具有間隔設置於該基板上表面的複數個銲墊，以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以使該些銲墊至少一部份露出；形成複數個導電柱於該些銲墊開孔，使得該些導電柱可透過該些銲墊開孔與銲墊電連接；設置一圖案化層於該鈍化層與該些導電柱上以暴露出至少一部份的導電柱的上表面，其中，該圖案化層包含複數個具有一特定尺寸的導電柱開孔，該導電柱開孔的尺寸略小於導電柱上表面的寬度；置放每一銲球於每一導電柱開孔，其中，該銲球的尺寸小於該導電柱開孔的特定尺寸及導電柱上表面之寬度；移除該圖案化層使該鈍化層、該些導電柱、與在該些導電柱上的銲球露出；以及對該些銲球進行迴銲以形成一半球型的銲帽於該導電柱上，並進而形成該銲帽凸塊。
  2. 根據請求項1所述在一半導體元件形成銲帽凸塊的方法，其中該導電柱為一球下冶金層結構。
  3. 根據請求項1所述在一半導體元件形成銲帽凸塊的方法，其中所述形成複數個導電柱於該些銲墊開孔的步驟進一步包含形成一冶金種子層於該些銲墊開孔並以電鍍形成該 些導電柱於該冶金種子層上。
  4. 根據請求項3所述在一半導體元件形成銲帽凸塊的方法，其中該導電柱的材料可為銅、金或其合金。
  5. 根據請求項1所述在一半導體元件形成銲帽凸塊的方法，其中該圖案化層為一鋼板或一光阻層。
  6. 根據請求項1所述在一半導體元件形成銲帽凸塊的方法，其中該導電柱為一球下冶金層結構且該球下冶金層結構的高度小於或等於60μm。
  7. 一種由請求項1之半導體元件形成銲帽凸塊的方法所製造之半導體封裝結構包含：一半導體基板包含複數個分開置放於該基板上表面的複數個銲墊以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以使該些銲墊至少一部份露出；複數個銲帽凸塊，包含(a)複數個導電柱於鈍化層中的該些銲墊開孔中，該導電柱透過該些銲墊開孔與該銲墊電連接，其中形成在一圖案化層的複數個具有特定尺寸的導電柱開孔位於該些導電柱上方，且有一小於該導電柱開孔的特定尺寸的銲球置設於導電柱開孔中；以及 (b)一銲帽位於每一該導電柱上表面，其中以一迴銲製程將該銲球形成該銲帽；以及一承載基板包含複數個接線銲墊電連接於位在該半導體基板的該銲帽凸塊的該些銲帽。
  8. 根據請求項7所述的該半導體封裝結構進一步包含一用來填充位於該承載基板及該半導體基板間空隙的封膠層。
  9. 根據請求項7所述的該半導體封裝結構，其中該導電柱為一球下冶金層結構且該球下冶金層結構的高度小於或等於60μm。
  10. 根據請求項7所述的該半導體封裝結構，其中銲帽的底部寬度對應於該導電柱的上表面大小。
  11. 一覆晶封裝結構製造流程，該製造流程包含：提供一半導體基板，該基板具有分開置放且位於該基板上表面的複數個銲墊以及一沉積在該些銲墊上方的鈍化層，其中有複數個銲墊開孔形成於該鈍化層中以使該些銲墊至少一部份露出；形成複數個導電球下冶金層結構於位於該鈍化層中的該些銲墊開孔，使其可透過該些銲墊開孔與該些銲墊電連接；設置一圖案化層於該鈍化層與該些導電球下冶金層結構上以暴露出至少一部份的該些導電球下冶金層結構的 上表面，其中，該圖案化層包含複數個具有一特定尺寸的球下冶金層開孔，該球下冶金層開孔的尺寸略小於該些導電球下冶金層結構的該上表面的寬度；置放每一銲球於每一球下冶金層開孔，其中，該銲球的尺寸小於該球下冶金層開孔的該特定尺寸及該些導電球下冶金層結構的該上表面的該寬度；移除該圖案化層使該鈍化層、該些導電球下冶金層結構、與在該些導電球下冶金層結構上的銲球露出；對該些銲球進行迴銲以形成一半球型的銲帽於每一個導電球下冶金層結構上，並進而形成該銲帽；以及提供一承載基板包含複數個接線銲墊，其中該接線銲墊是用來接合該導電球下冶金層結構的銲帽並電連接該承載基板與該半導體基板。
  12. 根據請求項11所述的覆晶封裝結構製造流程，進一步包含一用來填充位於該承載基板及該半導體基板間空隙的封膠層，其中該球下冶金層結構之高度為小於或等於60μm。
  13. 根據請求項11所述的覆晶封裝結構製造流程，其中形成複數個導電球下冶金層結構於位於該鈍化層中的該些銲墊開孔的步驟進一步包含形成一金屬化種子層並以電鍍在該金屬化種子層上形成該導電球下冶金層結構。
  14. 根據請求項11所述的覆晶封裝結構製造流程，其中該圖案化層為一鋼板或一光阻層。
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