TWI526515B - A protective film, a mask for a protective film, and a method for manufacturing the semiconductor element - Google Patents

A protective film, a mask for a protective film, and a method for manufacturing the semiconductor element Download PDF

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Publication number
TWI526515B
TWI526515B TW103135723A TW103135723A TWI526515B TW I526515 B TWI526515 B TW I526515B TW 103135723 A TW103135723 A TW 103135723A TW 103135723 A TW103135723 A TW 103135723A TW I526515 B TWI526515 B TW I526515B
Authority
TW
Taiwan
Prior art keywords
polymer
protective film
acrylic
adhesive
less
Prior art date
Application number
TW103135723A
Other languages
English (en)
Chinese (zh)
Other versions
TW201520302A (zh
Inventor
Susumu Asada
Hideaki Tamaya
Kohei Yano
Daiki Yamashita
Original Assignee
Asahi Kasei E Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Publication of TW201520302A publication Critical patent/TW201520302A/zh
Application granted granted Critical
Publication of TWI526515B publication Critical patent/TWI526515B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/10—Homopolymers or copolymers of methacrylic acid esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW103135723A 2013-10-15 2014-10-15 A protective film, a mask for a protective film, and a method for manufacturing the semiconductor element TWI526515B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013215005 2013-10-15

Publications (2)

Publication Number Publication Date
TW201520302A TW201520302A (zh) 2015-06-01
TWI526515B true TWI526515B (zh) 2016-03-21

Family

ID=52828097

Family Applications (2)

Application Number Title Priority Date Filing Date
TW103135723A TWI526515B (zh) 2013-10-15 2014-10-15 A protective film, a mask for a protective film, and a method for manufacturing the semiconductor element
TW104138833A TWI614324B (zh) 2013-10-15 2014-10-15 護膜、附護膜之光罩及半導體元件之製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW104138833A TWI614324B (zh) 2013-10-15 2014-10-15 護膜、附護膜之光罩及半導體元件之製造方法

Country Status (5)

Country Link
JP (1) JP6326059B2 (ko)
KR (2) KR20180043404A (ko)
CN (1) CN105683834B (ko)
TW (2) TWI526515B (ko)
WO (1) WO2015056653A1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6430118B2 (ja) * 2013-12-12 2018-11-28 旭化成株式会社 ペリクル、ペリクル付フォトマスク及び半導体素子の製造方法
JP2017090718A (ja) * 2015-11-11 2017-05-25 旭化成株式会社 ペリクル
TWI618974B (zh) * 2016-12-28 2018-03-21 Micro Lithography Inc Dust-proof frame structure for reticle
EP3562902A2 (en) * 2016-12-30 2019-11-06 3M Innovative Properties Company Tapes and methods of use for masking aluminum surfaces in chromic acid anodization
CN110835982B (zh) * 2018-08-17 2023-02-17 Sika技术股份公司 自粘性屋面膜

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2962447B2 (ja) 1992-04-01 1999-10-12 信越化学工業株式会社 耐紫外線性ペリクル
JP4021054B2 (ja) * 1998-05-18 2007-12-12 株式会社クラレ ブロック共重合体組成物およびその粘着剤用途
KR20060116152A (ko) * 2005-05-09 2006-11-14 미쓰이 가가쿠 가부시키가이샤 오염이 적은 펠리클
WO2008117677A1 (ja) * 2007-03-23 2008-10-02 Sekisui Chemical Co., Ltd. フォトマスク保護用粘着テープ
JP2010155923A (ja) * 2008-12-26 2010-07-15 Dainippon Printing Co Ltd 保護用粘着フィルム
JP2011006584A (ja) * 2009-06-26 2011-01-13 Ａｓ Ｒ＆Ｄ合同会社 有機減衰材料
TWI579354B (zh) * 2009-11-18 2017-04-21 Asahi Kasei E-Materials Corp Mask mask
JP5319500B2 (ja) * 2009-11-18 2013-10-16 旭化成イーマテリアルズ株式会社 ペリクル
WO2012004951A1 (ja) * 2010-07-09 2012-01-12 三井化学株式会社 ペリクル及びそれに用いるマスク接着剤
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル

Also Published As

Publication number Publication date
TW201608004A (zh) 2016-03-01
CN105683834A (zh) 2016-06-15
JP6326059B2 (ja) 2018-05-16
KR20160055859A (ko) 2016-05-18
TW201520302A (zh) 2015-06-01
WO2015056653A1 (ja) 2015-04-23
TWI614324B (zh) 2018-02-11
KR20180043404A (ko) 2018-04-27
CN105683834B (zh) 2021-03-02
JPWO2015056653A1 (ja) 2017-03-09
KR102032601B1 (ko) 2019-10-15

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