WO2008117677A1 - フォトマスク保護用粘着テープ - Google Patents
フォトマスク保護用粘着テープ Download PDFInfo
- Publication number
- WO2008117677A1 WO2008117677A1 PCT/JP2008/054708 JP2008054708W WO2008117677A1 WO 2008117677 A1 WO2008117677 A1 WO 2008117677A1 JP 2008054708 W JP2008054708 W JP 2008054708W WO 2008117677 A1 WO2008117677 A1 WO 2008117677A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pressure
- sensitive adhesive
- protection
- adhesive tape
- photo masks
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/35—Heat-activated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2475/00—Presence of polyurethane
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009506284A JPWO2008117677A1 (ja) | 2007-03-23 | 2008-03-14 | フォトマスク保護用粘着テープ |
KR1020097011748A KR101448327B1 (ko) | 2007-03-23 | 2008-03-14 | 포토마스크 보호용 점착 테이프 |
CN2008800029214A CN101589340B (zh) | 2007-03-23 | 2008-03-14 | 用于保护光掩模的胶粘带 |
TW097109575A TWI428418B (zh) | 2007-03-23 | 2008-03-19 | 光罩保護用黏著膠帶 |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007077636 | 2007-03-23 | ||
JP2007-077636 | 2007-03-23 | ||
JP2007104866 | 2007-04-12 | ||
JP2007-104866 | 2007-04-12 | ||
JP2007-314880 | 2007-12-05 | ||
JP2007314880 | 2007-12-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008117677A1 true WO2008117677A1 (ja) | 2008-10-02 |
Family
ID=39788413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/054708 WO2008117677A1 (ja) | 2007-03-23 | 2008-03-14 | フォトマスク保護用粘着テープ |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2008117677A1 (ja) |
KR (1) | KR101448327B1 (ja) |
CN (1) | CN101589340B (ja) |
TW (1) | TWI428418B (ja) |
WO (1) | WO2008117677A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009051059A1 (ja) * | 2007-10-19 | 2009-04-23 | Sekisui Chemical Co., Ltd. | フォトマスク保護用粘着テープ |
JP2010168474A (ja) * | 2009-01-22 | 2010-08-05 | Sekisui Chem Co Ltd | 帯電防止型フォトマスク保護用粘着フィルム |
JP2011153226A (ja) * | 2010-01-27 | 2011-08-11 | Sekisui Chem Co Ltd | フォトレジスト付着防止テープ |
US20110236681A1 (en) * | 2010-01-22 | 2011-09-29 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5995085B2 (ja) * | 2010-01-22 | 2016-09-21 | エルジー・ケム・リミテッド | 光学フィルタ製造用積層フィルム、及び、光学フィルタの製造方法 |
CN105683834B (zh) * | 2013-10-15 | 2021-03-02 | 旭化成株式会社 | 表膜、带表膜的光掩模及半导体元件的制造方法 |
TWI568829B (zh) * | 2015-05-15 | 2017-02-01 | Micro Lithography Inc | A composition for resisting ultraviolet radiation in a mask and its application |
CN106404860A (zh) * | 2016-08-30 | 2017-02-15 | 济南大学 | 一种氮化碳修饰三维石墨电极的制备方法及电致化学发光传感应用 |
KR102117873B1 (ko) | 2018-07-02 | 2020-06-02 | 도레이첨단소재 주식회사 | 노광 공정용 점착보호필름 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07165924A (ja) * | 1993-12-14 | 1995-06-27 | Dainichiseika Color & Chem Mfg Co Ltd | 一液硬化可能なポリシロキサン樹脂化合物 |
JP2002072453A (ja) * | 2000-08-31 | 2002-03-12 | Asahi Glass Co Ltd | 膜面保護層を有するフォトマスクおよびその製造方法 |
JP2003096409A (ja) * | 2001-09-20 | 2003-04-03 | Kimoto & Co Ltd | 表面保護フィルム |
JP2005181565A (ja) * | 2003-12-18 | 2005-07-07 | Kimoto & Co Ltd | 表面保護膜およびこれを用いた表面保護フィルム |
JP2005181931A (ja) * | 2003-12-24 | 2005-07-07 | Kimoto & Co Ltd | 表面保護膜および表面保護フィルム |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4376610B2 (ja) * | 2003-12-18 | 2009-12-02 | 株式会社きもと | 表面保護膜およびこれを用いた表面保護フィルム |
-
2008
- 2008-03-14 CN CN2008800029214A patent/CN101589340B/zh active Active
- 2008-03-14 WO PCT/JP2008/054708 patent/WO2008117677A1/ja active Application Filing
- 2008-03-14 KR KR1020097011748A patent/KR101448327B1/ko active IP Right Grant
- 2008-03-14 JP JP2009506284A patent/JPWO2008117677A1/ja active Pending
- 2008-03-19 TW TW097109575A patent/TWI428418B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07165924A (ja) * | 1993-12-14 | 1995-06-27 | Dainichiseika Color & Chem Mfg Co Ltd | 一液硬化可能なポリシロキサン樹脂化合物 |
JP2002072453A (ja) * | 2000-08-31 | 2002-03-12 | Asahi Glass Co Ltd | 膜面保護層を有するフォトマスクおよびその製造方法 |
JP2003096409A (ja) * | 2001-09-20 | 2003-04-03 | Kimoto & Co Ltd | 表面保護フィルム |
JP2005181565A (ja) * | 2003-12-18 | 2005-07-07 | Kimoto & Co Ltd | 表面保護膜およびこれを用いた表面保護フィルム |
JP2005181931A (ja) * | 2003-12-24 | 2005-07-07 | Kimoto & Co Ltd | 表面保護膜および表面保護フィルム |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009051059A1 (ja) * | 2007-10-19 | 2009-04-23 | Sekisui Chemical Co., Ltd. | フォトマスク保護用粘着テープ |
JP2010168474A (ja) * | 2009-01-22 | 2010-08-05 | Sekisui Chem Co Ltd | 帯電防止型フォトマスク保護用粘着フィルム |
US20110236681A1 (en) * | 2010-01-22 | 2011-09-29 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
US20120013978A1 (en) * | 2010-01-22 | 2012-01-19 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
US9417367B2 (en) * | 2010-01-22 | 2016-08-16 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
US9417368B2 (en) * | 2010-01-22 | 2016-08-16 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
JP2011153226A (ja) * | 2010-01-27 | 2011-08-11 | Sekisui Chem Co Ltd | フォトレジスト付着防止テープ |
Also Published As
Publication number | Publication date |
---|---|
KR101448327B1 (ko) | 2014-10-07 |
TWI428418B (zh) | 2014-03-01 |
CN101589340A (zh) | 2009-11-25 |
TW200902669A (en) | 2009-01-16 |
KR20090122906A (ko) | 2009-12-01 |
CN101589340B (zh) | 2012-03-28 |
JPWO2008117677A1 (ja) | 2010-07-15 |
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