WO2008117677A1 - フォトマスク保護用粘着テープ - Google Patents

フォトマスク保護用粘着テープ Download PDF

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Publication number
WO2008117677A1
WO2008117677A1 PCT/JP2008/054708 JP2008054708W WO2008117677A1 WO 2008117677 A1 WO2008117677 A1 WO 2008117677A1 JP 2008054708 W JP2008054708 W JP 2008054708W WO 2008117677 A1 WO2008117677 A1 WO 2008117677A1
Authority
WO
WIPO (PCT)
Prior art keywords
pressure
sensitive adhesive
protection
adhesive tape
photo masks
Prior art date
Application number
PCT/JP2008/054708
Other languages
English (en)
French (fr)
Inventor
Hiroshi Tada
Nobuto Kamiya
Original Assignee
Sekisui Chemical Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co., Ltd. filed Critical Sekisui Chemical Co., Ltd.
Priority to CN2008800029214A priority Critical patent/CN101589340B/zh
Priority to JP2009506284A priority patent/JPWO2008117677A1/ja
Priority to KR1020097011748A priority patent/KR101448327B1/ko
Priority to TW097109575A priority patent/TWI428418B/zh
Publication of WO2008117677A1 publication Critical patent/WO2008117677A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35—Heat-activated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2475/00—Presence of polyurethane
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2483/00—Presence of polysiloxane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

　粘着性を有するフォトレジストに密着して繰り返し使用しても剥離性が低下せず使用が可能であるフォトマスク保護用粘着テープを提供する。 　透明な基材フィルムまたはシート（Ａ）と、その片面に形成された粘着剤層（Ｂ）と、粘着剤層（Ｂ）の面とは反対側の面に形成された表面層（Ｃ）とを含むフォトマスク保護用粘着テープであって、表面層（Ｃ）は、イソシアネートシラン（ｘ）と末端に水酸基を持つシロキサン（ｙ）とを含有する混合物から得られる特定の硬化物からなる。 　
PCT/JP2008/054708 2007-03-23 2008-03-14 フォトマスク保護用粘着テープ WO2008117677A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008800029214A CN101589340B (zh) 2007-03-23 2008-03-14 用于保护光掩模的胶粘带
JP2009506284A JPWO2008117677A1 (ja) 2007-03-23 2008-03-14 フォトマスク保護用粘着テープ
KR1020097011748A KR101448327B1 (ko) 2007-03-23 2008-03-14 포토마스크 보호용 점착 테이프
TW097109575A TWI428418B (zh) 2007-03-23 2008-03-19 光罩保護用黏著膠帶

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-077636 2007-03-23
JP2007077636 2007-03-23
JP2007104866 2007-04-12
JP2007-104866 2007-04-12
JP2007-314880 2007-12-05
JP2007314880 2007-12-05

Publications (1)

Publication Number Publication Date
WO2008117677A1 true WO2008117677A1 (ja) 2008-10-02

Family

ID=39788413

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054708 WO2008117677A1 (ja) 2007-03-23 2008-03-14 フォトマスク保護用粘着テープ

Country Status (5)

Country Link
JP (1) JPWO2008117677A1 (ja)
KR (1) KR101448327B1 (ja)
CN (1) CN101589340B (ja)
TW (1) TWI428418B (ja)
WO (1) WO2008117677A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009051059A1 (ja) * 2007-10-19 2009-04-23 Sekisui Chemical Co., Ltd. フォトマスク保護用粘着テープ
JP2010168474A (ja) * 2009-01-22 2010-08-05 Sekisui Chem Co Ltd 帯電防止型フォトマスク保護用粘着フィルム
JP2011153226A (ja) * 2010-01-27 2011-08-11 Sekisui Chem Co Ltd フォトレジスト付着防止テープ
US20110236681A1 (en) * 2010-01-22 2011-09-29 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101064585B1 (ko) * 2010-01-22 2011-09-15 주식회사 엘지화학 광배향막 배향 처리용 점착 필름
KR20180043404A (ko) * 2013-10-15 2018-04-27 아사히 가세이 가부시키가이샤 펠리클, 펠리클 부착 포토마스크 및 반도체 소자의 제조 방법
TWI568829B (zh) * 2015-05-15 2017-02-01 Micro Lithography Inc A composition for resisting ultraviolet radiation in a mask and its application
CN106404860A (zh) * 2016-08-30 2017-02-15 济南大学 一种氮化碳修饰三维石墨电极的制备方法及电致化学发光传感应用
KR102117873B1 (ko) 2018-07-02 2020-06-02 도레이첨단소재 주식회사 노광 공정용 점착보호필름

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07165924A (ja) * 1993-12-14 1995-06-27 Dainichiseika Color & Chem Mfg Co Ltd 一液硬化可能なポリシロキサン樹脂化合物
JP2002072453A (ja) * 2000-08-31 2002-03-12 Asahi Glass Co Ltd 膜面保護層を有するフォトマスクおよびその製造方法
JP2003096409A (ja) * 2001-09-20 2003-04-03 Kimoto & Co Ltd 表面保護フィルム
JP2005181931A (ja) * 2003-12-24 2005-07-07 Kimoto & Co Ltd 表面保護膜および表面保護フィルム
JP2005181565A (ja) * 2003-12-18 2005-07-07 Kimoto & Co Ltd 表面保護膜およびこれを用いた表面保護フィルム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4376610B2 (ja) * 2003-12-18 2009-12-02 株式会社きもと 表面保護膜およびこれを用いた表面保護フィルム

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07165924A (ja) * 1993-12-14 1995-06-27 Dainichiseika Color & Chem Mfg Co Ltd 一液硬化可能なポリシロキサン樹脂化合物
JP2002072453A (ja) * 2000-08-31 2002-03-12 Asahi Glass Co Ltd 膜面保護層を有するフォトマスクおよびその製造方法
JP2003096409A (ja) * 2001-09-20 2003-04-03 Kimoto & Co Ltd 表面保護フィルム
JP2005181565A (ja) * 2003-12-18 2005-07-07 Kimoto & Co Ltd 表面保護膜およびこれを用いた表面保護フィルム
JP2005181931A (ja) * 2003-12-24 2005-07-07 Kimoto & Co Ltd 表面保護膜および表面保護フィルム

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009051059A1 (ja) * 2007-10-19 2009-04-23 Sekisui Chemical Co., Ltd. フォトマスク保護用粘着テープ
JP2010168474A (ja) * 2009-01-22 2010-08-05 Sekisui Chem Co Ltd 帯電防止型フォトマスク保護用粘着フィルム
US20110236681A1 (en) * 2010-01-22 2011-09-29 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US20120013978A1 (en) * 2010-01-22 2012-01-19 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US9417368B2 (en) * 2010-01-22 2016-08-16 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US9417367B2 (en) * 2010-01-22 2016-08-16 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
JP2011153226A (ja) * 2010-01-27 2011-08-11 Sekisui Chem Co Ltd フォトレジスト付着防止テープ

Also Published As

Publication number Publication date
JPWO2008117677A1 (ja) 2010-07-15
TW200902669A (en) 2009-01-16
CN101589340A (zh) 2009-11-25
KR20090122906A (ko) 2009-12-01
TWI428418B (zh) 2014-03-01
KR101448327B1 (ko) 2014-10-07
CN101589340B (zh) 2012-03-28

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