TWI507819B - 著色組成物及用此之彩色濾光片 - Google Patents

著色組成物及用此之彩色濾光片 Download PDF

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Publication number
TWI507819B
TWI507819B TW101109907A TW101109907A TWI507819B TW I507819 B TWI507819 B TW I507819B TW 101109907 A TW101109907 A TW 101109907A TW 101109907 A TW101109907 A TW 101109907A TW I507819 B TWI507819 B TW I507819B
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TW
Taiwan
Prior art keywords
group
resin
mass
parts
compound
Prior art date
Application number
TW101109907A
Other languages
English (en)
Chinese (zh)
Other versions
TW201303499A (zh
Inventor
Katsuhiko Mizushima
Yuki Saito
Kenichi Kitamura
Yukino Miyagawa
Shinji Tsunekawa
Masahiro Sasaki
Kazunori Yamada
Takashi Kanoh
Toshinao Makiuchi
Koichi Minato
Toshio Waku
Original Assignee
Toyo Ink Sc Holdings Co Ltd
Toyocolor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2011077030A external-priority patent/JP5659919B2/ja
Priority claimed from JP2011076927A external-priority patent/JP5659918B2/ja
Priority claimed from JP2011077029A external-priority patent/JP5673297B2/ja
Application filed by Toyo Ink Sc Holdings Co Ltd, Toyocolor Co Ltd filed Critical Toyo Ink Sc Holdings Co Ltd
Publication of TW201303499A publication Critical patent/TW201303499A/zh
Application granted granted Critical
Publication of TWI507819B publication Critical patent/TWI507819B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW101109907A 2011-03-31 2012-03-22 著色組成物及用此之彩色濾光片 TWI507819B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011077030A JP5659919B2 (ja) 2011-03-31 2011-03-31 感光性着色組成物及びそれを用いたカラーフィルタ
JP2011076927A JP5659918B2 (ja) 2011-03-31 2011-03-31 カラーフィルタ用着色組成物、およびカラーフィルタ
JP2011077029A JP5673297B2 (ja) 2011-03-31 2011-03-31 カラーフィルタ用着色組成物、及びそれを用いたカラーフィルタ

Publications (2)

Publication Number Publication Date
TW201303499A TW201303499A (zh) 2013-01-16
TWI507819B true TWI507819B (zh) 2015-11-11

Family

ID=46992140

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101109907A TWI507819B (zh) 2011-03-31 2012-03-22 著色組成物及用此之彩色濾光片

Country Status (3)

Country Link
KR (1) KR101909937B1 (ko)
CN (1) CN102736414B (ko)
TW (1) TWI507819B (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103149799A (zh) * 2011-12-07 2013-06-12 三菱化学株式会社 着色树脂组合物、滤色器、液晶显示装置及有机el显示装置
CN102981366A (zh) * 2012-11-29 2013-03-20 惠州市容大油墨有限公司 阻焊组合物及其用于印制电路板的用途
JP2014215474A (ja) * 2013-04-25 2014-11-17 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
TWI632163B (zh) * 2013-02-04 2018-08-11 日商日本傑恩股份有限公司 Radiation-sensitive resin composition and electronic component
CN104298074B (zh) * 2013-07-19 2019-11-01 东友精细化工有限公司 透明像素形成用感光性树脂组合物及使用其形成的滤色器
JP6246086B2 (ja) * 2013-07-29 2017-12-13 富士フイルム株式会社 カラーフィルタ、その製造方法、着色硬化性組成物、固体撮像素子、着色硬化性組成物およびキット
TWI628218B (zh) * 2013-09-18 2018-07-01 東友精細化工有限公司 著色硬化性樹脂組成物
CN106575000B (zh) * 2014-08-20 2019-09-13 东丽株式会社 感光性着色组合物、使用其的固体摄像器件的制造方法及固体摄像器件
KR101946100B1 (ko) * 2015-03-20 2019-02-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
KR102041929B1 (ko) * 2015-09-01 2019-11-07 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 형성된 광경화 패턴
CN106083864B (zh) * 2016-06-14 2018-06-08 浙江永太新材料有限公司 一种酞菁铜蓝色碱性诱导体化合物的制备方法
KR102011090B1 (ko) * 2016-09-19 2019-08-14 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN107275515B (zh) 2017-06-20 2019-12-03 深圳市华星光电技术有限公司 Oled器件封装方法、结构、oled器件及显示屏
EP3502306B1 (de) * 2017-12-19 2022-03-02 Covestro Deutschland AG Mehrschichtkörper, umfassend eine substratschicht enthaltend polycarbonat, talk und wachs
KR102410852B1 (ko) * 2018-03-22 2022-06-17 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
CN112334504B (zh) * 2018-08-07 2023-10-10 大塚化学株式会社 分散剂组合物、着色组合物和彩色滤光片
CN111234094B (zh) * 2018-11-28 2022-06-21 北京鼎材科技有限公司 一种改性染料、包含其的光敏树脂组合物及用途
JP7099355B2 (ja) * 2019-02-18 2022-07-12 信越化学工業株式会社 熱硬化性シリコーン組成物およびその硬化物
US20220120947A1 (en) * 2019-02-28 2022-04-21 Sumitomo Chemical Company, Limited Cyan colored curable composition
KR102590489B1 (ko) * 2019-10-29 2023-10-17 삼성에스디아이 주식회사 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201139343A (en) * 2009-12-01 2011-11-16 Toyo Ink Mfg Co Blue coloring composition for color filter, color filter and color display

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JP4426197B2 (ja) * 2003-03-25 2010-03-03 凸版印刷株式会社 着色組成物及び感光性着色組成物及びカラーフィルタ
CN1918250A (zh) * 2004-11-11 2007-02-21 三菱化学株式会社 色料分散液、着色树脂组合物、滤色片以及液晶显示装置
JP4652967B2 (ja) * 2005-12-14 2011-03-16 凸版印刷株式会社 液晶表示素子用感光性組成物およびこれを用いたカラーフィルタ
JP2009016899A (ja) * 2007-06-29 2009-01-22 Sharp Corp デジタル・アナログ共用チューナ
JP5617177B2 (ja) * 2009-03-27 2014-11-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
JP5834379B2 (ja) * 2009-06-25 2015-12-24 Jsr株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
TW201139343A (en) * 2009-12-01 2011-11-16 Toyo Ink Mfg Co Blue coloring composition for color filter, color filter and color display

Also Published As

Publication number Publication date
KR20120112169A (ko) 2012-10-11
KR101909937B1 (ko) 2018-10-19
CN102736414B (zh) 2015-01-28
CN102736414A (zh) 2012-10-17
TW201303499A (zh) 2013-01-16

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