TWI505932B - 低發射率及emi屏蔽視窗膜 - Google Patents
低發射率及emi屏蔽視窗膜 Download PDFInfo
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- TWI505932B TWI505932B TW100106734A TW100106734A TWI505932B TW I505932 B TWI505932 B TW I505932B TW 100106734 A TW100106734 A TW 100106734A TW 100106734 A TW100106734 A TW 100106734A TW I505932 B TWI505932 B TW I505932B
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- composite film
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- film
- reflective layer
- transparent
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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Description
本申請案主張美國臨時專利申請案序號61/339,152的優先權,其於2010年3月1日提出申請,全文揭露藉由參考方式在此併入。
本揭示係有關於視窗膜之領域,其具有低發射率(低e)以最小化熱能藉由輻射之傳送,並且適用於電磁干擾(EMI)屏蔽應用。
低發射率(low e)玻璃視窗係經設計以讓一特定頻寬內的頻率能夠通過該視窗,例如可見光,同時反射此預期頻寬以外的其他頻率,例如紅外線(IR)。低發射率造成IR光譜內某些波的高度反射,並可改善建築物與交通工具之視窗的隔熱。因此,這些低e視窗在寒冷氣候下特別有用,其可保存居家、辦公室、及車輛與其他加熱環境的熱,減少溫暖的內部空氣透過視窗逸散至寒冷的外部。這些低e視窗在炎熱氣候下也是有用的,其可抵制來自高溫的外部之熱能輻射通過視窗,因而保持較涼爽的內部溫度。該等視窗能夠有效地提供舒適、可見性、以及強化的能源效益。
視窗玻璃本身可經製造而提供該等低e特性。在製造製程期間以及安裝前,該玻璃係以薄金屬層處理及/或塗覆,除了其他材料之外,以達到預期的IR反射。此種處理及塗覆的範例在美國專利第6,852,419號及第7,659,002號中描述。但是,由於種種原因,此經過處理的玻璃是有問題的。首先,其通常無法提供對抗紫外線(UV)輻射的適當保護。再者,金屬或其他塗層可能並沒有受到對抗環境之充分保護,而導致機械強度降低並使玻璃遭到腐蝕。在這點上,若是或者當玻璃腐蝕或破裂時,就必須換掉整個視窗。這不僅昂貴,並且也可能難以與原始的周邊玻璃視窗之外觀及色澤相同。
一種更實際且具經濟效益的方法是使用彈性聚合物膜,其可黏附在視窗玻璃上。此類薄膜被廣泛使用並提供多種隔熱(solar control)功能。該等薄膜使用容易,移除與更換方便,並且可輕易做到複製換下的薄膜之色澤與外觀。此外,彈性膜讓改裝既存的透明玻璃視窗窗格相當容易,並且可賦予同等的隔熱功能。在這點上,該等聚合物膜也提供家用物件一程度的UV傷害保護,例如,家具褪色。
絕大多數隔熱膜係藉由金屬化一聚合物基板膜來製造,通常是聚(乙烯對苯二甲酸酯)(PET),然後在該金屬化的基板膜表面上層積一第二PET膜。但是,這些先前隔熱膜,犧牲可見光穿透率(即,穿透該膜的可見光量,”VLT”)以達到預期發射率,反之亦然,並且發射率受限在至多約0.3等級。
此種低e視窗膜(約0.3等級)之一範例在美國專利第6,030,671號中揭示。此種及其他先前的低e視窗膜利用一金屬層來反射IR輻射;但是,金屬易腐蝕、刮傷、和磨損。因此,在此種應用中,一保護硬塗層係經設置在該等金屬層上,並面對欲反射的內部空間(即房間內部)。此保護硬塗層是習知的交聯丙烯酸聚酯基塗層,並且必須供應抗破裂、腐蝕、刮傷、及磨損的薄膜。
因為此硬塗層可吸收紅外線,並且位於該IR反射金屬層與房間內部之間,其降低該薄膜的複合發射率。因此,該硬塗層厚度係在厚度足以發揮一保護塗層的作用,同時保持IR吸收在最小值兩者間的折中結果。無論如何,該硬塗層通常無法提供充分的抗磨損性,並且當該硬塗層厚度足以供應該薄膜必要的耐受性時,對於發射值仍舊有嚴重的不利效應。例如,美國專利第6,030,671號描述設置在該等光學層(即PET與金屬層)上的硬塗層厚度係介於1-3微米間,並且厚度為3.0微米的硬塗層會致使膜複合物擁有大於0.35的發射率。此外,為了達到此薄膜複合發射率,可見光穿透率會限制在約50%。
除了控制IR輻射,尚存有控制電磁輻射的需要。在包含住家、例如辦公室之工作場所、製造與軍事設施、船舶、飛機及他結構之各式場所中使用的許多裝置會發射出各種頻率的電磁輻射。此類裝置的範例包含電腦、電腦監視器、電腦鍵盤、收音機設備、通訊裝置等。若此輻射從該場所逸散,為了破解與逸散輻射相關或編碼在其中之資料,其可能被攔截並分析。例如,存在一種從一建築物外部之一遠端位置或從一建築物內之一位置,重建顯示在該建築物內之一電腦監視器上的影像之技術,其係藉由偵測來自該監視器銀幕的特定波長頻率,即使無法從該遠端位置看到該監視器銀幕。這是由已知技術達成,其中來自監視器銀幕的特定頻率光線,即使是從該監視器所在之建築物或房間內的各種表面反射之後,逸散並被位於該監視器所在的建築物或房間外的另一位置之竊聽者攔截且分析。顯然,竊聽者攔截此種輻射的能力造成重要的安全風險,這在保密極其重要的場所中是偏向於排除的。
雖然牆壁,例如磚牆、砌石牆或石壁可有效避免光線頻率從一場所中逸散,但是射頻可穿過未受適當屏蔽以防止此類穿越的牆。此外,視窗容許輻射穿越至其可能被攔截的外部,也可讓諸多型態的輻射進入該場所內,例如雷射光束、紅外線、以及射頻。因此,可從該結構內收集敏感或機密的數據。
確實,美國政府長期以來即關切電子設備,例如電腦、印表機、及電子打字機,發出電子發射物的事實。TEMPEST(瞬時電磁脈衝發射標準的縮寫)計畫係經創造以推行能夠減少用來處理、傳送、或儲存敏感資訊的裝置之發射物的洩漏機會之標準。這通常是藉由設計該電子設備以減少或消除瞬時發射物,或以銅或其他導電材料屏蔽該設備(或者有時候一個房間或整個建築物)來完成。兩種方式都可能十分昂貴。
從一結構除去視窗顯然會最小化上述的安全風險。但是一個無視窗或封閉的結構之缺點是不言而喻的。因此,高度期望能夠避免與資料相關的輻射逸散通過視窗,同時容許其他輻射穿過,因而可獲得由該等視窗提供的令人愉快的視覺效果,但不會有過度的安全風險。
降低不預期的電磁輻射效應之需要帶動視窗過濾器與薄膜的發展,以阻斷不想要的電磁干擾(EMI)的傳輸。但是該等EMI屏蔽膜通常不具有上述之預期低e與高VLT。
鑒於無止境的改善能量效率之需要以及現今高度競爭市場中安全的重要性等兩個因素,需要一種能夠保全能量及電子隱密性兩者,同時維持適當的保護免於受暴露環境傷害之薄膜。
因為這些與其他技藝中的問題,在此所述者,除了其他的以外,為一種低發射率透明複合膜,其至少包含:一透明膜基板;一底層,由耐磨硬塗層材料構成,其與該透明膜基板相容;以及至少一紅外線反射層;該複合膜擁有低於約0.30的發射率,並且其中該底層係設置在該透明膜基板與該紅外線反射層之間。
在特定實施例中,該紅外線反射層可由一選自鋁、銅、金、鎳、銀、鉑、鈀、鎢、鈦、或其合金所組成之族群的金屬層構成。在另一實施例中,該複合膜更包含一透明保護頂塗層,具有低於約0.5微米的乾燥厚度,並且該保護頂塗層係設置在該紅外線反射層上方。
該底層可擁有小於約5%的抗磨損指數(abrasion delta haze)。在某些實施例中,該紅外線反射層包含能夠保護該紅外線反射層之至少一薄金屬膜。在另一實施例中,該薄金屬膜係由一選自由鎳、鉻、鈮、鉑、鈷、鋅、鉬、鋯、釩、及其合金所組成的族群之金屬構成。在又另一實施例中,該薄金屬膜係由一鎳-鉻合金構成。
該複合膜也可包含至少一間隙層,其係由一透明導電層,一介電層,或其組合物構成。在一實施例中,該間隙層包含一種選自由氧化銦、氧化銦鋅、或氧化銦錫所組成的族群之材料。
該複合膜也可包含複數個薄的間隙層,該間隙層設置在複數個透明導電層之間。
也在此揭示的是一種低發射率透明複合膜,其至少包含:一透明膜基板;一底層,由耐磨硬塗層材料構成,其與該透明膜基板相容;以及至少一紅外線反射層;該複合膜擁有低於約0.25的發射率。
該複合膜也可擁有低於約0.20的發射率。在一實施例中,該複合膜擁有高至約75%的可見光穿透率。
該複合膜也可擁有低於約0.10的發射率。在一實施例中,該複合物擁有約28%至約47%的可見光穿透率。在另一實施例中,該複合膜擁有高至約70%的可見光穿透率。
在特定實施例中,該複合膜的耐磨硬塗層材料係選自由高度交聯聚合物塗層、熱硬化丙烯酸酯塗層、基於矽酸鹽、鈦酸鹽、鋯酸鹽、或其混合物之熱硬化溶膠凝膠塗層、混成有機-無機溶膠凝膠材料、熱硬化矽氧烷硬塗層、及熱硬化聚丙烯酸酯塗層所組成的族群。在一實施例中,該底層係由一紫外線硬化聚丙烯酸酯合成物構成。在另一實施例中,該底層係由一含有金屬氧化物奈米微粒之紫外線硬化聚丙烯酸酯合成物構成。
在其他實施例中,該紅外線反射層可由一選自由鋁、銅、金、鎳、銀、鉑、鈀、鎢、鈦、或其合金所組成的族群之金屬層構成。
也揭示一種製造一低發射率透明複合膜的方法。該方法包含如下步驟:提供一透明膜基板;混合一耐磨硬塗層材料,其含有一聚丙烯酸酯合成物,以形成一混合物;施加該混合物至該透明膜基板的一側;硬化該基板之塗覆側以形成一底層;以及在該底層上濺鍍一紅外線反射層。
在此所述者,除了其他的以外,為複合膜,其與習知視窗膜相比發射率顯著降低,同時也容許一預期水準的可見光穿透率(VLT),增加磨損及破裂的耐受性,並且屏蔽電磁干擾(EMI)。在一實施例中,此複合膜係由一透明膜基板構成,其一側上擁有一底層,該底層係由一耐磨的硬化丙烯酸酯樹脂構成,以及至少一紅外線反射層覆蓋在該底層上。
該底層有利地增加機械強度以及,令人驚訝地,該複合膜的耐磨性,即使該底層並非位於該複合膜外表面上。換句話說,該底層係介於該複合物所黏附的表面與該IR反射層之間;因此,該IR反射層係更近地暴露在欲反射的區域中。因此,若該複合膜係設置在一視窗內部,來自該房間內部的IR不需要穿過該底層以從此處反射。或者,若該複合膜係設置在該視窗外部,再次,來自外部或外來的IR不需要穿過該底層以從此處反射。因此,該複合膜的發射率(即散發或放射IR的能力)可大幅降低。
該等複合膜通常係施加在一視窗的內或外表面上,並且較佳地在內表面。如在此所使用者,該”頂”係該複合物暴露在欲反射的區域中之一側。在這點上,該膜的發射率係來自該”頂”表面之IR能量發射的測量(例如,當設置在該視窗內表面上時,反射回該房間的IR能量)。另一方面,該”底”係該複合物黏附在該視窗上的一側。為了本揭示,也應了解在此所使用的IR能量通常是論述長波長IR輻射,其比較短波長IR輻射而言與熱更直接相關。但是,任何波長的IR輻射都可被反射。
但是應注意到,雖然在此應用中常明確討論該等複合膜做為視窗膜之用途,熟知技藝者會了解眾多其他應用也是適當的。例如,該複合膜可黏附在一建築物或臨時結構的牆壁上,以做為一絕緣層或一保溫層,以將熱反射回一房間內。在這點上,該複合膜也可經裝點並黏附在一牆壁上,以在該牆壁上形成一裝飾層。該複合膜也可設置在冰冷或冷凍空間外表面上,以防止熱進入此空間。此外,沒有下面討論之做為該複合物一部分的黏附層,該等複合膜可以滾筒型態應用,以用做帳篷、涼棚、遮罩、或懸吊在一視窗或天窗鄰近處,但不附著在其上的捲簾。就此類應用而言,可能預期擁有非常低的可見光穿透率以盡可能阻斷光線,同時仍反射與滯留熱在該複合膜內部。具有黏附層的複合膜也可用在絕緣玻璃窗的空氣縫隙中。這些額外的用途僅是例示且絕非限制性。據此,應了解當用來做為在此應用中所描述之視窗膜時,其他用途也適用,如熟知技藝者會了解般。
為了解本揭示之複合膜,了解與一複合膜相關的性質與特性以及用來測量一聚合物中間層片材之該等性質與特性的試驗也是重要的。發射率是一材料表面以輻射型態發射或反射能量的相對能力,例如IR輻射。換一種方式說,若一材料表面擁有低發射率,則可降低熱輻射之熱傳輸。其係在相同溫度下一特定材料放射的能量對一黑體放射的能量之比例,並且係根據ASTM C1371-04A標準測量。本揭示的複合膜擁有之放射率為:低於約0.38;低於約0.35;低於約0.3;低於約0.25;低於約0.2;低於約0.17;低於約0.15;低於約0.1;低於約0.07;低於約0.03;約0.2至約0.3;約0.07至約0.10;約0.08;以及約0.17。
總隔熱率(%TSER),如其名所指,是複合膜阻隔的總太陽能(熱)。該數值越高,被阻隔的總太陽能(熱)就越多。其係根據ASTM E903-82標準由經塗覆的膜在Varian Analytical Cary 5分光光度計上測得之光與熱阻隔性質計算得出,該反射及穿透數據係利用Parry Moon在Franklin Institute期刊第230卷第583-618頁(1940)之”工程用之建議標準太陽輻射曲線”所描述的參數來分析,其完整揭示在此藉由引用的方式併入本文中。
太陽能吸收率是入射的太陽輻射被該視窗膜吸收的百分比。該數值越低,被吸收的太陽輻射就越少。日光反射率是入射的太陽輻射被該視窗膜/玻璃系統反射的百分比。該數值越低,被反射的太陽輻射就越少。太陽能吸收率與日光反射率兩者皆可用上述測量總隔熱率的方法來測量。
可見光穿透率是穿透該視窗膜/玻璃系統的總可見光百分比。該數值越低,穿透的可見光就越少。其係利用CIE標準觀測器(CIE 1924 1931)與D65日光來計算。本揭示的複合膜擁有之可見光穿透率為,取決於發射率,低於約1%;約2%至約5%;約25%至約50%;約28.5%至約47%;約30%至約45%;約28.5%;約47%;約55%;高至約70%;以及高至約75%。
熟知技藝者對電化學阻抗光譜(EIS)知之甚詳,並且已應用在腐蝕研究上多年,其為一種精確的測量腐蝕率之方法。如在此所使用者,其係用來測量該膜複合物在氯化鈉溶液之氯離子的影響下的耐腐蝕性。高的阻抗值(以M歐姆測量)代表低腐蝕。本揭示之複合膜的阻抗值為約3.0 M歐姆至約13.8 M歐姆;約5.0 M歐姆至約13.8 M歐姆;約5.0 M歐姆至約8.0 M歐姆;約3.0 M歐姆至約6.2 M歐姆。
腐蝕也可以鹽水噴霧試驗來測量,其提供一受控制的腐蝕環境,常用來產生暴露在一特定試驗室中之金屬與塗佈的金屬樣品之相對抗腐蝕資訊。此試驗係根據ASTM B117-09標準執行。在1000和2000小時後,接著藉由攝影與影像分析來測量該複合膜樣品的腐蝕。腐蝕程度係基於如下等級:1=無腐蝕;2=非常輕度腐蝕;3=輕度腐蝕;4=中度腐蝕;以及5=高度腐蝕。在此揭示的複合膜表現出無腐蝕或非常輕度腐蝕。
該等複合膜的腐蝕也可以鹽水暴露試驗來測量。以一鹽溶液噴灑該等複合膜,黏附在一個水箱的蓋子上,然後在50℃烤箱中老化數天。在老化4、7、與10天後,以自來水沖洗該等樣品並檢驗其腐蝕。上述關於鹽水噴霧試驗的等級也可應用在這些樣品上。在老化4天後,該等複合膜並無腐蝕(1)。在老化7天後,該等複合膜係非常輕度至無腐蝕。最後,在老化10天後,該等複合膜有非常輕度至輕度腐蝕。
耐磨耗試驗(Taber Abrasion Test)是用於玻璃或顯示器應用的視窗膜與其他膜之常用試驗。此試驗根據ASTM D1044標準使用磨損試驗機(Taber Abrader),利用每一個承載至500克的CS-T3滾輪。隨著該等滾輪刮擦與磨損該表面,該等膜變得更霧化。因此,抗磨損指數是一膜在受到該滾輪的磨耗後霧化程度之改變的測量。結果在100個滾輪週期之後以抗磨損值引述。例如,一聚酯膜的抗磨損指數通常是約大於30%。本揭示之該等複合膜,並且更明確地說該等底層,的抗磨損指數係小於約5%;約3%至約5%;以及約4.1%。
酒精磨耗試驗(Alcohol Abrasion Test)(稱為脫色試驗(Crock Test))運用M238BB類型的SDL Atlas磨擦脫色評估儀。選擇純的(100%)異丙醇(IPA)做為試驗清潔劑流體。將擁有可移除織物端的機械手臂與一樣品膜接觸設置。該織物係經浸泡在IPA中然後重複來回循環。結果是主觀的,而產物係在50次循環區間後審視對IR反射層的磨損或穿透(breakthrough)。磨損程度係基於如下等級:1=無穿透;2=非常輕微的穿透;3=輕微穿透;4=50%穿透;以及5=大於50%穿透。在此所揭示的複合膜優越地表現出輕微、非常輕微、以及無穿透。
黏著試驗係根據ASTM D 3356標準。將膠帶(3M 810與600膠帶)貼至該等樣品表面上並保持約10秒,然後以180°角撕下。該等樣品在測試之前並未清潔或標示。硬塗層樣品在一成/敗判定中評估。
EMI屏蔽強度係根據ASTM D-4935標準評估,透過運用同軸橫向電磁室的遠場型試驗。該試驗測量產品阻斷電磁輻射的能力。結果係以分貝(dB)發表,如熟知且常用者。分貝值越負值,就有越多電磁輻射被阻斷。本揭示的複合膜擁有約-23 dB(其對應約99.5%的電磁輻射阻斷)和約-31 dB(其對應約99.9%的電磁輻射阻斷)的屏蔽效率。換一種方式說,本揭示的複合膜可阻斷多至約99.9%的電磁輻射與多至約99.5%的電磁輻射。
參見第1圖,示出複合膜(10)之一實施例,其包含一透明的聚合物膜基板(11),一側上塗覆以一底層(12)。該底層(12)係覆蓋以一IR反射層(20)。雖然絕非必要,但該IR反射層(20)可另外覆以一保護頂塗層(13)。如上所述,該複合膜(10)底部會是該基板沒有該底層(12)的一側,而該複合膜(10)頂部會是暴露出的一側。
做為一外部或內部視窗膜時,或做為黏著在牆壁上的絕緣層時,可另外在該基板(11)底部提供一種黏著該基板至一視窗的構件。例如第1圖所示般,該複合物(10)擁有提供在該基板(11)上的黏附層(14)。該黏附層(14)可由任何適於接合該基板(11)至一視窗、牆壁或任何其他基板的膠黏劑構成。在接合至一視窗時,感壓膠黏劑是較佳地,具有丙烯酸基膠黏劑則是更佳的。Gelva 263(可由Cytec工業取得)是此種膠黏劑之一範例。該黏附層(14)也可擁有黏附在其上的釋離襯墊(15)。該釋離襯墊(15)有利地提供對於該具黏性的黏附層之釋離效果。所示實施例中的釋離襯墊(15)可包含:任何擁有矽氧釋離塗層的聚乙烯對苯二甲酸酯(PET)膜,其可從該黏附層(14)剝離,留下該黏附層(14)在該基座底板(11)上。或者,該黏附與釋離層可包含:擁有聚丙烯襯墊的透明無扭曲膠黏劑。
該透明膜基板(11)係由一彈性、透明的聚酯膜構成。該基板(11)較佳地係厚度約2密耳(0.05毫米)的聚乙烯對苯二甲酸酯(PET)或聚乙烯萘(PEN)。雖然絕非必要,但可以紫外線吸收劑處理該PET或PEN膜,以便吸收多至99%的紫外線輻射。此種紫外線(UV)吸收劑膜的範例在美國專利第6,221,112號中描述,其整體揭示在此藉由引用的方式併入本文中。Melinex454或ST505聚酯膜(可由DuPont Teijin薄膜取得,”DuPont”)係此類較佳薄膜的範例。此外,該薄膜可以化學品進行表面處理,以改善對其之黏著度。
該底層(12)在該下方基板(11)與該上方IR反射層(20)間提供一中間層,並且與其接合在一起,改善這些下方與上方光學層(即該複合膜(10))的強度、硬度、與耐久性。另外,該IR反射層(20)通常包含:易於大氣腐蝕的金屬;但是,該底層(12)在抗破裂方面提供高水準的耐受性,即使該底層(12)並沒有覆蓋該IR反射層(20)。因此,該複合膜(10)擁有增加的機械強度和較大的磨損、破裂、與刮擦耐受性,且不會負面衝擊到發射率。換一種方式來說,該底層(12)保護該金屬IR反射層(20)不受對於磨損與刮擦的敏感性所影響。本揭示之底層的抗磨損指數係低於約5%;約3%至約5%;以及約4.1%。
該底層(12)可由任何硬塗層構成,如熟知技藝者很容易理解該用詞般,其係與該基板(11)相容,並且能夠透過習知捲繞式塗佈法(roll-to-roll coating)應用在其表面上。此類硬塗層的範例包含,但不限於,高度交聯聚合物塗層、熱硬化丙烯酸酯塗層、基於矽酸鹽、鈦酸鹽、鋯酸鹽、或其混合物之熱硬化溶膠凝膠塗層、混成有機-無機溶膠凝膠材料(例如可由Fraunhofer取得的Ormocer聚合物)、及熱硬化矽氧烷硬塗層。該硬塗層的熱硬化,若可實施,可利用熱進行,例如在一烤箱中,或利用近紅外線加熱。
一較佳底層(12)是一UV硬化的無奈米微粒之聚丙烯酸酯合成物。一更佳底層(12)係一含有奈米微粒並由如下成分構成的UV硬化聚丙烯酸酯合成物:丙烯酸基樹脂、金屬氧化物奈米微粒、交聯劑、光啟始劑(photointiator)、溶劑、與介面活性劑。如下方更完整討論般,並非所有這些皆是該合成物的必要成分。此外,下方的合成物係基於內含溶劑來討論重量百分比。該溶劑之添加僅是用來輔助施加該濕式底層(12)至該基板(11)上,而該溶劑在乾燥時即揮發。因此,如熟知技藝者可輕易了解般,例如下方描述的丙烯酸與奈米微粒的重量百分比可能取決於包含在該濕式底層(12)合成物中之溶劑的量與類型而改變。
該丙烯酸基樹脂可包含:二丙烯酸酯,例如二丙烯酸己二醇酯(hexanediol diacrylate)、壓克力樹酯(tricyclodecane dimethanol dicarylate)(可由Sartomer有限公司以Sartomer SR833商品名取得)、以及二氧六環乙二醇二丙烯酸酯(dioxane glycol diacrylate)(可由Sartomer有限公司以Sartomer CD536商品名取得)或二丙烯酸酯的混合物。其他適合的丙烯酸基樹脂是氨基甲酸乙酯脂肪族丙烯酸酯(urethane aliphatic acrylates)(Ebecryl8301)。該底層(12)較佳地包含約10至約60重量百分比(wt%)的丙烯酸基樹脂。如上所述,該等重量百分比包含:下面討論的溶劑之添加。因此,在最後,乾燥型態下,該底層(12)可包含約40 wt%至約99 wt%的丙烯酸基樹脂。
該等金屬氧化物奈米微粒填充物通常是二氧化矽(SiO2
)及三氧化二鋁(Al2
O3
)。這些奈米微粒絕非必要;但是,添加該等奈米微粒至該底層(12)改善該複合膜(10)的機械與物理性質。明確地說,該等奈米微粒增加該底層(12)與複合膜(10)的硬度與彎曲模數。該等奈米微粒係以受控制的方式分佈,以同時提供該複合膜(10)一個水準的良好表面粗糙度。此表面粗糙度減少編塊(blocking),輔助捲繞處理,並改善對於該IR反射層(20)的黏附。此外,因為該等奈米微粒非常小(通常是50奈米或更小,平均微粒尺寸),其有低霧化與吸收,因此在該複合膜的清晰度或穿透性質上沒有任何顯著的有害效應。
二氧化矽奈米微粒是更佳的。其係以分散的奈米微粒型態添加至丙烯酸酯單體及/或氨基甲酸乙酯丙烯酸酯單體中,並可由許多供應商取得。該等奈米微粒的範例包含:NanocrylC140和XP21/2135(可由Hanse Chemie取得)、HighlinkNanO-G 103-53(可由Clariant公司取得)、FCS100(可由Momentive Performance Materials公司取得)、以及Ebecryl8311(可由Cytec工業取得)。該等奈米微粒通常擁有0.1微米或更低的微粒尺寸。該等奈米微粒在薄模形成、乾燥、與UV硬化期間保持穩定分散,而不會對霧化或光澤度降低造成任何顯著貢獻。該底層(12)可包含:0 wt%至約65 wt%,並且較佳地約21 wt%。再次,在最後,乾燥型態下,在該溶劑揮發後,該底層(12)可包含:不同數量的奈米微粒,例如,較佳地約43 wt%。
交聯劑在該混合物受到UV或EB(電子束)輻射時,透過交聯分子或官能基來誘發該丙烯酸基樹脂的聚合物鏈間共價化學鍵的形成。交聯將該混合物轉化為更加固化的狀態,提供該底層(12)高機械強度與耐磨性,並改善對於該IR反射層(20)的黏著度。交聯劑可包含:戊四醇四丙烯酸酯(pentaerythritol tetraacrylates)與三丙烯酸酯及其混合物,或適合的氨基甲酸乙酯丙烯酸酯(urethane acrylates)。濕式型態的底層(12)(即具有溶劑)較佳地包含:約16 wt%至約40 wt%的交聯劑,並且更佳地約21 wt%的交聯劑。
該光啟始劑係用來促進聚合反應,並輔助形成該底層(12)的硬度。可使用熟知技藝者知悉的任何適當光啟始劑,包含但不限於,偶氮雙異丁腈(azobisisobutyronitrile)與過氧化苯甲醯(benzoyl peroxide)。光啟始劑的範例係Irgacure184與Irgacure907(可由Ciba Specialty Chemicals取得)。該底層(12)較佳地包含:約2 wt%至約7 wt%的光啟始劑,約2 wt%至約3.5 wt%,以及更佳地約3.5 wt%的光啟始劑。
該溶劑係經添加以稀薄化該合成物,並形成可更容易施加至該基板(11)的溶液。在乾燥後,該溶劑從該溶液揮發,因此該最終的乾燥底層(12)會含少量至無溶劑。適合的溶劑包含,但不限於,正乙酸丁酯(n-butyl acetate)、異丙醇(isopropyl alcohol)、以及MEK(甲基乙基酮)。該底層(12)較佳地包含約:10 wt%至約50 wt%的溶劑,並且更佳地約25 wt%的溶劑。
許多介面活性劑是可接受的,包含常用在塗層配方中以整平一薄膜基板者。適當的介面活性劑包含,但不限於:Ebecryl1360(可由Cytec工業取得);Byk 3570、Byk UV-3530、與Byk UV-3500(可由Byk Chemie取得);以及Tego Wet 270與Tego Glide 432(可由Evonik工業取得)。該底層(12)較佳地包含:約0.1 wt%至約0.2 wt%的介面活性劑,並且更佳地約0.11 wt%的介面活性劑。
混合上述之底層(12)合成物的成分以塗佈該基板(11)至約3至約6微米的濕膜厚度,利用熟知技藝者知悉的任何適當製程,其均勻地塗佈且平整地整平,例如一反向式凹版印刷製程(reverse gravure process)。在施加至該基板(11)上後,在一烤箱內乾燥該塗層,並在紫外線燈下以每分鐘約80英呎的線速進行UV硬化。該最終之硬化、乾燥的底層(12)厚度為約1.5微米至約6微米;更佳地約2微米至約5微米;並且最佳地約2.5微米。若該底層(12)太薄,該複合膜(10)無法有預期的機械耐久性、硬度、或耐磨性,該複合膜(10)也無法承受安裝與生命期使用上的典型應力。
該IR反射層(20)覆蓋該底層(12),並且可利用濺鍍施加至該底層(12)上,如熟知技藝者對該製程知之甚詳般,或任何適當的沈積應用,包含,例如,蒸鍍或任何化學或物理沈積。該IR反射層(20)可由在IR範圍內高度反射的任何透明金屬層構成。在第1圖實施例中,該IR反射層(20)係一由選自鋁、銅、鎳、金、銀、鉑、鈀、鎢、鈦、或其合金所組成的族群之金屬層構成的核心層(16)。金與銀與其合金通常是較佳的。如下方更完整討論般,可操控該IR反射層內的金屬與金屬合金之類型與量以達到預期的發射率及VLT。例如,鎢和鈦比銀和金對於光線的吸收更高,因此對於較低VLT的實施例而言會是最有用的。
此外,如熟知技藝者能輕易理解般,反射該IR的層,第1圖中的IR反射層(20),可由單一層金屬或導電金屬氧化物,或是金屬、金屬氧化物、及/或其他光學層的多層堆疊構成,無論由金屬或他種材料構成。例如,透明導電層或介電層可與一核心金屬層並用以控制IR光線反射及VLT,並保護該核心金屬層不受腐蝕。任何透明導電層皆適合,如在技藝中對該用辭的理解般,包含但不限於,氧化銦鋅(IZO)、氧化銦錫(ITO)、氧化銻錫(ATO)、氧化銦、氧化鋅、氧化錫、及其他金屬氧化物、或其混合物。若夠薄,許多這些透明導電層也可用來做為介電層,如在技藝中對該用辭的理解般。在這點上,任何對可見光來說透明的介電材料皆適合,包含但不限於,氧化銦鋅、氧化銦錫、二氧化矽、氧化鋁、氮化矽、或其混合物。當一特定層係由一透明導電層、介電層、或其混合物構成時,在此將其稱為一”間隙層”。第2-4圖示出擁有上述多層堆疊的實施例之範例,並在下方更完整討論。
也可添加硬陶瓷,例如氮氧化矽(SiOxNy)和氮氧化鋁(AlOxNy),以改善該薄膜(10)的機械與物理性質,且不會對熱及光學效能造成不利影響。或者,較厚的陶瓷及/或金屬氧化物層也可與該IR反射層(20)並用或做為其一部分,以創造特定顏色或反射水準,但是因為這些層的吸收率多半更高,其可能在冰冷氣候中降低保溫水準。在這點上,可操控該等金屬、金屬合金、金屬氧化物、及硬陶瓷層的類型、量、與厚度以達到預期發射率、VLT、機械強度、與視覺外觀。
該保護頂塗層(13)是透明的,並密封該(等)濺鍍IR反射層的表面,且應該非常薄(例如,低於0.5微米),因此對該複合物發射率沒有顯著影響。在這點上,該保護頂塗層(13)對該複合膜(10)用以對抗刮痕的硬度並無貢獻。
要達到預期的發射率、VLT、與耐磨水準,此保護頂塗層(13)絕非必要,如熟知技藝者可輕易理解般。但是,該保護頂塗層(13)提供該複合膜(10)其他附加益處。例如,該頂塗層(13)避免污染物進入,包含但不限於,大氣污染物,像污染地區的氣態硫化合物與來自指紋的氯離子。不添加該頂塗層(13),這些污染物可能傷害該複合膜(10)的物理及/或機械性質。該頂塗層(13)也作用為該(等)下方IR反射層的化學屏障,因此可減少腐蝕,並讓摩擦物滑過表面但不造成刮痕。此外,在某些實施例中,該頂塗層(13)可擁有低表面能量與磨擦力,其輔助該複合膜(10)的安裝與清潔。明確地說,刮漿板(squeegees)或其他安裝或清潔裝置能夠更輕易地在該複合膜(10)表面上移動。
上述該保護頂塗層(13)的益處可在不顯著影響該複合膜(10)的發射率下達到,因為該底層(12)額外提供許多這些先前要求該保護硬塗層的益處(例如耐磨性),因此容許使用一相當薄的保護層。熟知技藝者可輕易辨明其他未在此提及的益處。
該保護頂塗層(13)通常含有某類型的矽,包含但不限於,聚矽氮烷(polysilazane)、氟烷基矽烷(fluoroalkyl silane)、與氟矽烷(fluoro silane)。該保護頂塗層(13)可包含,例如,約7 wt%至約8 wt%的聚矽氮烷。此種聚矽氮烷之一範例是G-ShieldTM
(可由KiON Specialty Polymers公司取得)。或者,該保護頂塗層(13)可由範圍如下的氟烷基矽烷或是氟矽烷構成:約0.5 wt%至約1.5 wt%;低於約0.5 wt%;以及低於約1.5 wt%。此類氟烷基矽烷或氟矽烷的範例分別是DynasylanF8261(可從Evonik工業取得)及FluorolinkS10(可由義大利的Solvay Solexis Spa公司取得)。該保護頂塗層(13)可另外包含:溶劑、光酸催化劑(photo-acid catalysts)、光啟始劑、與其他添加劑,例如驅散劑(repellants)(如SivoClear,可由Silanex AB公司取得)。
但是,矽基化合物絕非必要,如熟知技藝者可輕易理解般。反之,該保護頂塗層(13)僅是設計來處理該薄膜的表面,並提供上述益處且不會對發射率有顯著影響。例如,也可使用用來處理玻璃表面的防護層,像蠟型態塗層,以及防污用的氟碳化合物。
一較佳保護頂塗層(13)是一UV或EB硬化的氟化樹脂,其係由約1.0部位的氟矽烷樹脂、約0.5至約1.5部位的光啟始劑、及約97至約99部位的溶劑構成,其中該部位是重量部位(parts by weight)。
該溶劑係經添加以稀薄化該合成物,並形成可更容易施加至該IR反射層(20)的溶液。在乾燥後,該溶劑從該溶液揮發,因此該最終的乾燥保護頂塗層(13)會含少量至無溶劑。適合的溶劑包含,但不限於,異丙醇(isopropyl alcohol)(IPA)、乙二醇醚(glycol ether)、乙酸丁酯(butyl acetate)、二甲苯(xylene)、水、及其任何混合物。該合成物可含有:一或多種該等溶劑。適合的氟矽烷包含,但不限於,氟烷基矽烷。此種氟矽烷之一範例是分散的FluorolinkS10(可由義大利的Solvay Solexix Spa公司取得)。較佳的光啟始劑包含:CyracureTM
6976(可從Dow化學取得)與Chivacure1176(可由Chitech公司取得)。
一特別佳的頂塗層合成物包含:約70 wt%的IPA、約20 wt%的乙二醇醚、約5.9 wt%的水、約1.48 wt%的氟矽烷分散物、及約1.48 wt%的光啟始劑。應注意到當在此討論較佳合成物時,該總合成物可大於或小於100 wt%。如熟知技藝者可輕易了解般,這僅是對所給予的重量百分比並不精確,且可捨入以表達約略(或”大約”)的重量百分比之事實的反映。此外,如上所述,在此討論的重量百分比可取決於所添加溶劑的量與類型而改變,如熟知技藝者可輕易理解般。
混合上述保護頂塗層(13)合成物的成分以塗佈該(等)IR反射層(20)至約1微米至約3微米的濕膜厚度,利用熟知技藝者知悉的任何適當製程,其均勻地塗佈且平整地整平,例如但不限於,一反向式凹版印刷製程。在施加該PET膜後,在一烤箱內約80℃至約110℃的溫度下,乾燥該塗層5至20秒。然後以每秒約20至30公尺的運轉速度將該保護頂塗層(13)UV硬化。該最終之硬化、乾燥的保護頂塗層(13)厚度為小於約0.5微米,且較佳地約0.05微米。
現在參見第2圖,該複合物(110)基本上與該複合物(10)相同,除了該IR反射層(120)係一多層堆疊之外。在一較佳實施例中,該IR反射層(120)可包含:至少一核心層(116)。該核心層(116)可由在IR範圍內高度反射的任何金屬構成,包含但不限於,一種選自由鋁、銅、鎳、金、銀、鉑、鈀、鎢、鈦、或其任何合金所組成的族群之金屬層。在一較佳實施例中,該核心層(116)係一金-銀合金,擁有約7奈米和約35奈米之間的厚度,取決於所要求的薄膜(110)發射率。但是,上面討論的其他金屬或合金在此實施例中也會是適合的。
該IR反射層(120)也可包含:一矽基層(114),毗鄰該底層(12)並輔助對其之附著。該矽基層(114)可由氮化矽、氧化矽、或氮氧化矽層構成,較佳地一氮化矽,並擁有約1奈米和約25奈米之間的厚度。該矽基層(114)係被一薄金屬膜(115)覆蓋,擁有約1奈米至約5奈米之間的厚度。該薄金屬膜(115)作用為保護該核心層(116),並可由選自由鎳、鉻、鈮、金、鉑、鈷、鋅、鉬、鋯、釩、及其合金所組成的族群之任何金屬構成。一鎳-鉻合金是特別佳的,例如HastelloyTM
(可由Haynes國際取得)或InconelTM
(可由Special Metals公司取得),並且如美國專利第6,859,310號所描述般,其整體揭示在此藉由引用的方式併入本文中。
然後用一第二薄金屬膜(117)覆蓋該IR反射層(116),較佳地鎳-鉻合金,並擁有約1奈米至約5奈米間的厚度。該第二薄金屬膜(117)轉而由一厚度介於約40和約80奈米的間隙層(118)覆蓋。如上所述,該間隙層係由任何導電層、介電層、或其組合物構成。該間隙層(118)較佳地係一由ITO構成的透明導電層。然後以一由氮化矽、氧化矽、或氮氧化矽之一形成且厚度介於約1至約25奈米之間的第二矽基層(119)覆蓋該間隙層(118)。接著以該保護頂層(13)塗佈此矽基層(119)。該等層(114)至(119)係由濺鍍形成,如技藝中熟知般。
現在參見第3圖,該複合膜(210)基本上與該複合物(10)相同,除了該IR反射層(220)係一多層堆疊之外,其係由包圍在一多層堆疊內並夾在兩個間隙層((214)與(218))之間的核心層(216)構成,該兩間隙層係由任何導電層、介電層或其組合物構成,如上所述般。該IR反射層(220)係由毗鄰該底層(12)且厚度約45奈米的第一間隙層(214)組成。然後以一厚度約12奈米的核心層(216)覆蓋該第一間隙層(214),其厚度係取決於所要求的複合膜(210)發射率。再次,該核心層(216)可由在IR範圍內高度反射的任何金屬構成,包含但不限於,一種選自由鋁、銅、鎳、金、銀、鉑、鈀、鎢、鈦、或其任何合金所組成的族群之金屬層。在此實例中,該核心層(216)較佳地係純金或金是主要成分的金合金。然後以一厚度約35奈米的第二間隙層(218)覆蓋該核心層(216),其轉而由厚度10奈米且由氮化矽或氮化矽鋁構成的矽基層(219)覆蓋。該等層(214)、(216)、(218)、與(219)係利用,例如,濺鍍形成。然後將該矽基層(219)覆以該保護頂塗層(13)。
現在參見第4圖,該複合物(310)基本上與該複合物(10)相同,除了該IR反射層(320)現在係由一多層堆疊提供之外,該多層堆疊係由複數個透明導電層((314)、(316)、及(318)),其作用為IR反射層並且較佳地係由IZO構成,中間插入薄的金屬氧化層((315)和(317)),其在該複合物(310)中導入彈性。該等薄金屬氧化層((315)和(317))較佳地係,但絕非必要,由鎳-鉻氧化物構成。例如,該薄金屬氧化層((315)和(317))另外可由一間隙層構成,如上面定義之該用詞般。該IR反射層(320)係設置在該底層(12)上方,並且可提供以一保護頂塗層(13)。
較佳地,該紅外線反射層包含:複數個薄間隙層,該等複數個薄間隙層設置在複數個透明導電層之間,其中透明導電層比間隙層多一個。但是,此配置絕非必要。透明導電層和間隙層(或薄金屬氧化層)的數量可取決於所要求的IR反射層(320)之彈性而改變,並且該IR反射層(320)中透明導電層的總厚度通常會決定發射率,而該等透明導電層的總厚度通常是多於約200奈米。無論如何,透明導電層和中間插入的間隙層的總厚度較佳地不應超過260奈米,雖然這絕非必要,如熟知技藝者可輕易理解般。
在一實施例中,該IR反射層(320)係由毗鄰該底層(12)且厚度約65奈米的第一透明導電層(314)、厚度約5奈米且覆蓋該第一透明導電層(314)的第一薄金屬氧化層(315)、厚度約65奈米且覆蓋該第一薄金屬氧化層(315)的第二透明導電層(316)、厚度約5奈米且覆蓋該第二透明導電層(316)的第二薄金屬氧化層(317)、以及選擇性塗佈以該保護層(13)的第三透明導電層(318)組成。該等層((314)-(318))係利用濺鍍形成,如技藝中熟知般。
第1-4圖所示的複合膜可用於包括車輛與建築物之視窗玻璃的外部或內部。該等複合膜可與單層玻璃視窗或者雙或三層玻璃視窗並用,並且可改善視窗的熱貫流率(U-factor)。熱貫流率測量熱透過一視窗的傳輸或流失速率,如美國國家開窗產品評估協會所制定者。此外,該等複合膜之任何及所有實施例皆可提供或不提供該黏附層與釋離襯墊。
上述實施例提供一種改善的低發射率複合物,併有異常低之發射率以及抗磨損與刮擦之理想性質。例如,在此揭示之實施例擁有約28.5%和約47%之間的VLT,以及約0.1或更低之非常低的發射率。此種實施例在較溫暖晴朗的氣候下是理想的。在此揭示之另一實施例可擁有較高VLT,例如高至約75%,以及約0.20或更低的發射率。此種實施例是理想的,例如,在較冷、北方的氣候下。此外,上面所述實施例有效降低EMI。例如,在此揭示實施例擁有約-23 dB和約-31 dB的EMI屏蔽值。
現在將參考如下非限制性範例描述此刻描述的複合膜。
範例1-2
複合膜”樣品A”與”樣品B”係根據第2圖建構,並且如上所述般具有如下表1中所示之層與厚度。
然後根據上述試驗方法測試樣品A與B之光學及物理性質。結果在下方表2
中示出。
範例3-5
樣品A也經測試以與多個類似樣品做比較。樣品A係如上面範例1中所述般設計,具有一未處理的PET膜層。樣品C提供如樣品A般的相同堆疊設計,除了該PET膜經過處理並且省略該底層之外。樣品D提供如樣品A般的相同堆疊設計(具有一未處理的PET膜層),除了省略該底層外。樣品E提供如樣品A般的相同堆疊設計,除了去除該保護頂塗層外。試驗結果在下方表3
中示出。
表3
的結果顯示出沒有該支撐底層,該等複合物樣品會在脫色試驗中失敗。出人意外的,該耐磨底層的存在影響該保護頂塗層和IR反射層對於損害的耐受性。
範例6-7
複合膜”樣品F”與”樣品G”係分別根據第3圖與第4圖建構,並如上述般具有如下表4-5
中所示的層與厚度。
然後根據上述試驗方法測試樣品F和G之光學及物理性質。結果在下方表6
中示出。
範例8-13
保護頂塗層「樣品H」、「樣品I」、「樣品J」、「樣品K」、「樣品L」、及「樣品M」係根據上面描述建構,具有如下表7
中所示的成分(基於重量百分比)。
然後根據上述試驗方法測試樣品H-M之光學及物理性質。結果在下方表8
中示出。
如上所述,該鹽水噴霧試驗與該鹽水暴露之腐蝕程度係基於如下等級:1=無腐蝕;2=非常輕度腐蝕;3=輕度腐蝕;4=中度腐蝕;以及5=高度腐蝕。
範例13-18
底層「樣本N」、「樣本O」、「樣本P」、「樣本Q」、「樣本R」、與「樣本S」係根據上面描述建構,具有如下表9
中所示的成分(基於重量百分比)。
樣品N-S然後形成以如上所述之該(等)IR反射層並運用如上方法。此外,接下來製備具有與不具有該保護頂塗層(樣品H)的樣品N-S,然後根據上述脫色試驗方法測試耐磨性。結果在下方表10
中示出。
如上所述,磨損程度係基於如下等級:1=無穿透;2=非常輕微的穿透;3=輕微穿透;4=50%穿透;以及5=大於50%穿透。上面結果僅顯示該底層,沒有一保護頂塗層,可提供足夠的、非常輕微的耐磨性。此外,該等結果顯示出本揭示之保護頂塗層可提供耐磨性一相當程度的加成效果。
雖然已結合某些實施例的描述,包含相信是目前較佳的實施例者,來揭示本發明,但詳細描述旨在例示,且不應被理解為是對本揭示範圍的限制。如熟知技藝者可理解般,不同於在此詳細描述者的實施例係包含在本發明中。可在不背離本發明之精神與範圍下對所述實施例做出調整與變動。
可進一步了解就本揭示之任何成分所提出的任何範圍、數值、或特性皆可與就本揭示之任何其他成分所提出的任何範圍、數值、或特性交替使用,當相容時,以形成具備每一種成分的界定值之實施例,如在此通篇所提出者。此外,提供予一種類或一類別的範圍,例如介電金屬氧化物,也可應用在該種類內或該類別成員之物種上,例如氧化銦鋅,除非特別註明。
10、110、210、310...複合膜
11...聚合物膜基板
12...底層
13...頂塗層
14...黏附層
15...釋離襯墊
16、116、216...核心層
20、120、220、314、316、318、320...IR反射層
114、119、219...矽基層
115、117、315、317...金屬膜
118、214、218...間隙層
第1圖係低發射率與EMI屏蔽視窗膜之一實施例的剖面圖,其包含一保護頂塗層、一黏附層、以及一釋離襯墊。
第2圖係低發射率與EMI屏蔽視窗膜之另一實施例的剖面圖,其包含一保護頂塗層。
第3圖係低發射率與EMI屏蔽視窗膜之另一實施例的剖面圖,其包含一保護頂塗層。
第4圖係低發射率與EMI屏蔽視窗膜之另一實施例的剖面圖,其包含一保護頂塗層。
10...複合膜
11...聚合物膜基板
12...底層
13...頂塗層
14...黏附層
15...釋離襯墊
16...核心層
20...IR反射層
Claims (18)
- 一種低發射率透明複合膜,其包含:一透明聚酯膜基板;一底層,其係由耐磨硬塗層材料構成,該底層係設置在該膜基板之表面,且包含交聯丙烯酸酯聚合物,該底層具有約2至約6微米之乾燥厚度;至少一紅外線反射層;及一透明保護頂塗層,其包含聚矽氮烷、氟矽烷、氟烷基矽烷或其組合,且具有小於約0.5微米之厚度;其中,該複合膜具有低於約0.30之發射率及5%或更小之抗磨損指數(abrasion delta haze)。
- 如請求項1之複合膜,其中該紅外線反射層包含一金屬層,其係選自由鋁、銅、金、鎳、銀、鉑、鈀、鎢、鈦、或其合金所組成之群組。
- 如請求項1之複合膜,其中該紅外線反射層係包含至少一能夠保護該紅外線反射層之薄金屬膜。
- 如請求項3之複合膜,其中該薄金屬膜係由選自由鎳、鉻、鈮、鉑、鈷、鋅、鉬、鋯、釩、及其合金所組成之群組之金屬構成。
- 如請求項4之複合膜,其中該薄金屬膜係由鎳-鉻合金構成。
- 如請求項2之複合膜,其中該紅外線反射層包含至少一間隙層,其係由一透明導電層、一介電層、或其組合構成。
- 如請求項6之複合膜,其中該間隙層包含一選自由氧化銦、氧化銦鋅、或氧化銦錫所組成之群組之材料。
- 如請求項1之複合膜,其中該紅外線反射層包含複數個薄的間隙層,該等複數個薄的間隙層係設置在複數個透明導電層之間。
- 一種低發射率透明複合膜,其包含:一透明聚酯膜基板;一底層,其係由耐磨硬塗層材料構成,該底層係設置在該膜基板之表面,且包含交聯丙烯酸酯聚合物,該底層具有約2至約6微米之乾燥厚度;至少一紅外線反射層;及一透明保護頂塗層,其包含聚矽氮烷、氟矽烷、氟烷基矽烷或其組合,且具有小於約0.5微米之厚度;其中,該複合膜具有低於約0.25之發射率及5%或更小之抗磨損指數。
- 如請求項9之複合膜,其中該複合膜具有低於約0.20之發射率。
- 如請求項10之複合膜,其中該複合膜具有至高約75%之可見光穿透率。
- 如請求項9之複合膜,其中該複合膜具有低於約0.10之發射率。
- 如請求項12之複合膜,其中該複合膜具有約28%至約47%之可見光穿透率。
- 如請求項12之複合膜,其中該複合膜具有至高約70%之可 見光穿透率。
- 如請求項9之複合膜,其中該耐磨硬塗層材料係選自由高度交聯聚合物塗層、熱硬化丙烯酸酯塗層、基於矽酸鹽、鈦酸鹽、鋯酸鹽、或其混合物之熱硬化溶膠凝膠塗層、混成有機-無機溶膠凝膠材料、熱硬化矽氧烷硬塗層、及熱硬化聚丙烯酸酯塗層所組成之群組。
- 如請求項15之複合膜,其中該底層係由一含有金屬氧化物奈米微粒的紫外線硬化聚丙烯酸酯組合物構成。
- 如請求項9之複合膜,其中該紅外線反射層包含一選自由鋁、銅、金、鎳、銀、鉑、鈀、鎢、鈦、或其合金所組成之群組之金屬層。
- 一種製造低發射率透明複合膜之方法,該方法包含:提供一透明聚酯膜基板;混合一含有聚丙烯酸酯組合物之耐磨硬塗層材料以形成一混合物;將該混合物施加至該透明聚酯膜基板之一側;使該基板之塗覆側硬化以形成一具有約2至約6微米之乾燥厚度之底層;在該底層上濺鍍一紅外線反射層;及在該紅外線反射層上設置一透明保護頂塗層,其包含聚矽氮烷、氟矽烷、氟烷基矽烷或其組合,且具有小於約0.5微米之厚度。
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TW201139135A (en) | 2011-11-16 |
WO2011109306A3 (en) | 2011-12-22 |
EP2542405A2 (en) | 2013-01-09 |
US20130342899A1 (en) | 2013-12-26 |
RU2559444C2 (ru) | 2015-08-10 |
AU2011223927B2 (en) | 2015-06-25 |
NZ602103A (en) | 2014-07-25 |
CN102834258B (zh) | 2016-01-20 |
RU2012141608A (ru) | 2014-04-10 |
JP5931753B2 (ja) | 2016-06-08 |
KR20170109699A (ko) | 2017-09-29 |
US20120052320A1 (en) | 2012-03-01 |
WO2011109306A2 (en) | 2011-09-09 |
CA2791785A1 (en) | 2011-09-09 |
AU2011223927A1 (en) | 2012-09-20 |
US9097842B2 (en) | 2015-08-04 |
US8613822B2 (en) | 2013-12-24 |
CN102834258A (zh) | 2012-12-19 |
US20150301244A1 (en) | 2015-10-22 |
US20140065439A1 (en) | 2014-03-06 |
US8637169B2 (en) | 2014-01-28 |
EP2542405A4 (en) | 2017-09-06 |
KR101963525B1 (ko) | 2019-03-28 |
EP2542405B1 (en) | 2022-12-28 |
US8753758B2 (en) | 2014-06-17 |
BR112012021760A2 (pt) | 2016-05-10 |
JP2013521160A (ja) | 2013-06-10 |
US20110308693A1 (en) | 2011-12-22 |
US8771444B2 (en) | 2014-07-08 |
US20140072786A1 (en) | 2014-03-13 |
SG183487A1 (en) | 2012-10-30 |
KR20130048718A (ko) | 2013-05-10 |
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