TWI494469B - 氣相成長裝置以及氣相成長方法 - Google Patents
氣相成長裝置以及氣相成長方法 Download PDFInfo
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- TWI494469B TWI494469B TW103101697A TW103101697A TWI494469B TW I494469 B TWI494469 B TW I494469B TW 103101697 A TW103101697 A TW 103101697A TW 103101697 A TW103101697 A TW 103101697A TW I494469 B TWI494469 B TW I494469B
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- Prior art keywords
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Links
- 238000001947 vapour-phase growth Methods 0.000 title claims description 56
- 238000000034 method Methods 0.000 title claims description 46
- 239000007789 gas Substances 0.000 claims description 615
- 239000004065 semiconductor Substances 0.000 claims description 36
- 239000012530 fluid Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000012071 phase Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 43
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 30
- 239000001257 hydrogen Substances 0.000 description 20
- 229910052739 hydrogen Inorganic materials 0.000 description 20
- 229910002601 GaN Inorganic materials 0.000 description 17
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 17
- 229910021529 ammonia Inorganic materials 0.000 description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000009826 distribution Methods 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 238000000926 separation method Methods 0.000 description 9
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 9
- 230000005484 gravity Effects 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 239000012159 carrier gas Substances 0.000 description 5
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- UWXJKSWTTNLDIF-UHFFFAOYSA-N ethyne;yttrium Chemical compound [Y].[C-]#[C] UWXJKSWTTNLDIF-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C23C16/303—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45574—Nozzles for more than one gas
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013016015A JP6134522B2 (ja) | 2013-01-30 | 2013-01-30 | 気相成長装置および気相成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201430166A TW201430166A (zh) | 2014-08-01 |
| TWI494469B true TWI494469B (zh) | 2015-08-01 |
Family
ID=51163737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103101697A TWI494469B (zh) | 2013-01-30 | 2014-01-17 | 氣相成長裝置以及氣相成長方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9624603B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6134522B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101610638B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN103966574B (cg-RX-API-DMAC7.html) |
| DE (1) | DE102014201554A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI494469B (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI758621B (zh) * | 2019-05-15 | 2022-03-21 | 大陸商拓荊科技股份有限公司 | 多段噴淋組件 |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6199619B2 (ja) * | 2013-06-13 | 2017-09-20 | 株式会社ニューフレアテクノロジー | 気相成長装置 |
| JP6153401B2 (ja) * | 2013-07-02 | 2017-06-28 | 株式会社ニューフレアテクノロジー | 気相成長装置および気相成長方法 |
| US9778561B2 (en) | 2014-01-31 | 2017-10-03 | Lam Research Corporation | Vacuum-integrated hardmask processes and apparatus |
| KR102215965B1 (ko) * | 2014-04-11 | 2021-02-18 | 주성엔지니어링(주) | 가스 분사 장치 및 이를 포함하는 기판 처리 장치 |
| CN104120408B (zh) * | 2014-08-06 | 2016-09-07 | 上海世山科技有限公司 | 一种改进衬底气流方向的hvpe反应器 |
| KR102267923B1 (ko) * | 2014-08-26 | 2021-06-22 | 에이에스엠 아이피 홀딩 비.브이. | 증착 장치 |
| JP6386901B2 (ja) * | 2014-12-17 | 2018-09-05 | 株式会社ニューフレアテクノロジー | 気相成長装置及び気相成長方法 |
| JP6193284B2 (ja) * | 2015-03-18 | 2017-09-06 | 株式会社東芝 | 流路構造、吸排気部材、及び処理装置 |
| JP6054471B2 (ja) | 2015-05-26 | 2016-12-27 | 株式会社日本製鋼所 | 原子層成長装置および原子層成長装置排気部 |
| JP6054470B2 (ja) | 2015-05-26 | 2016-12-27 | 株式会社日本製鋼所 | 原子層成長装置 |
| JP5990626B1 (ja) * | 2015-05-26 | 2016-09-14 | 株式会社日本製鋼所 | 原子層成長装置 |
| WO2018106627A1 (en) * | 2016-12-08 | 2018-06-14 | Applied Materials, Inc. | Temporal atomic layer deposition processing chamber |
| US10796912B2 (en) | 2017-05-16 | 2020-10-06 | Lam Research Corporation | Eliminating yield impact of stochastics in lithography |
| JP6792083B2 (ja) * | 2017-09-01 | 2020-11-25 | 株式会社ニューフレアテクノロジー | 気相成長装置、及び、気相成長方法 |
| US11149350B2 (en) * | 2018-01-10 | 2021-10-19 | Asm Ip Holding B.V. | Shower plate structure for supplying carrier and dry gas |
| JP7012613B2 (ja) * | 2018-07-13 | 2022-01-28 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
| JP7365761B2 (ja) * | 2018-08-24 | 2023-10-20 | 株式会社ニューフレアテクノロジー | 気相成長装置 |
| WO2020102085A1 (en) | 2018-11-14 | 2020-05-22 | Lam Research Corporation | Methods for making hard masks useful in next-generation lithography |
| CN113227909B (zh) | 2018-12-20 | 2025-07-04 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| TW202514246A (zh) | 2019-03-18 | 2025-04-01 | 美商蘭姆研究公司 | 基板處理方法與設備 |
| US12062538B2 (en) | 2019-04-30 | 2024-08-13 | Lam Research Corporation | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
| TWI869221B (zh) | 2019-06-26 | 2025-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| US20220308462A1 (en) * | 2019-06-27 | 2022-09-29 | Lam Research Corporation | Apparatus for photoresist dry deposition |
| US12060652B2 (en) | 2019-11-27 | 2024-08-13 | Sino Nitride Semiconductor Co., Ltd. | Linear showerhead for growing GaN |
| CN111020693B (zh) * | 2019-12-27 | 2021-01-29 | 季华实验室 | 一种碳化硅外延生长设备的进气装置 |
| KR102431292B1 (ko) | 2020-01-15 | 2022-08-09 | 램 리써치 코포레이션 | 포토레지스트 부착 및 선량 감소를 위한 하부층 |
| KR20220148249A (ko) | 2020-02-28 | 2022-11-04 | 램 리써치 코포레이션 | EUV 패터닝의 결함 감소를 위한 다층 하드마스크 (multi-layer hardmask) |
| CN111321463B (zh) | 2020-03-06 | 2021-10-15 | 北京北方华创微电子装备有限公司 | 反应腔室 |
| EP4235757A3 (en) | 2020-07-07 | 2023-12-27 | LAM Research Corporation | Integrated dry processes for patterning radiation photoresist patterning |
| CN115152008A (zh) | 2020-11-13 | 2022-10-04 | 朗姆研究公司 | 用于干法去除光致抗蚀剂的处理工具 |
| CN114107953A (zh) * | 2021-09-18 | 2022-03-01 | 江苏微导纳米科技股份有限公司 | 原子层沉积装置及其喷淋板 |
| KR20240163619A (ko) * | 2022-03-17 | 2024-11-19 | 램 리써치 코포레이션 | 중심 대 에지 조정 가능성을 갖는 이중 플리넘 샤워헤드 |
| WO2024006938A1 (en) | 2022-07-01 | 2024-01-04 | Lam Research Corporation | Cyclic development of metal oxide based photoresist for etch stop deterrence |
| CN116240525B (zh) * | 2022-12-15 | 2025-06-24 | 江苏微导纳米科技股份有限公司 | 喷淋板及处理装置 |
| US12474640B2 (en) | 2023-03-17 | 2025-11-18 | Lam Research Corporation | Integration of dry development and etch processes for EUV patterning in a single process chamber |
| CN116695098B (zh) * | 2023-08-07 | 2023-11-17 | 江苏微导纳米科技股份有限公司 | 一种喷淋板、喷淋方法及处理装置 |
| CN117403210B (zh) * | 2023-11-02 | 2025-12-05 | 希科半导体科技(苏州)有限公司 | 一种外延炉喷淋装置 |
| CN117966129A (zh) * | 2024-01-26 | 2024-05-03 | 江苏微导纳米科技股份有限公司 | 喷淋装置及处理设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001081569A (ja) * | 1999-09-16 | 2001-03-27 | Toshiba Corp | 気相成長装置 |
| TW201109464A (en) * | 2009-03-27 | 2011-03-16 | Sharp Kk | Vapor-phase growth apparatus and vapor-phase growth method |
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| JP3572211B2 (ja) | 1998-12-28 | 2004-09-29 | 京セラ株式会社 | 半導体製造装置用ガス導入ノズル |
| KR100513920B1 (ko) | 2003-10-31 | 2005-09-08 | 주식회사 시스넥스 | 화학기상증착 반응기 |
| CN102154628B (zh) | 2004-08-02 | 2014-05-07 | 维高仪器股份有限公司 | 用于化学气相沉积反应器的多气体分配喷射器 |
| JP4981485B2 (ja) * | 2007-03-05 | 2012-07-18 | 株式会社ニューフレアテクノロジー | 気相成長方法および気相成長装置 |
| JP5140321B2 (ja) * | 2007-05-31 | 2013-02-06 | 株式会社アルバック | シャワーヘッド |
| KR20090011978A (ko) * | 2007-07-27 | 2009-02-02 | 주식회사 아이피에스 | 샤워헤드 및 그를 가지는 반도체처리장치 |
| JP4865672B2 (ja) * | 2007-10-22 | 2012-02-01 | シャープ株式会社 | 気相成長装置及び半導体素子の製造方法 |
| WO2010024814A1 (en) | 2008-08-28 | 2010-03-04 | Applied Materials, Inc. | Methods and apparatus for depositing a uniform silicon film with flow gradient designs |
| JP2010238831A (ja) | 2009-03-31 | 2010-10-21 | Sharp Corp | 気相成長装置及び気相成長方法 |
| US20120012049A1 (en) * | 2010-07-16 | 2012-01-19 | Wei-Yung Hsu | Hvpe chamber |
| JP5622477B2 (ja) * | 2010-08-06 | 2014-11-12 | 三菱重工業株式会社 | 真空処理装置 |
| JP2011109141A (ja) * | 2011-02-28 | 2011-06-02 | Masayoshi Murata | プラズマｃｖｄ装置及びプラズマｃｖｄ装置を用いたシリコン系膜の製造方法 |
| JP5691889B2 (ja) | 2011-07-04 | 2015-04-01 | 富士通セミコンダクター株式会社 | メモリアクセス制御装置、及びメモリアクセス制御方法 |
| JP5259804B2 (ja) | 2011-11-08 | 2013-08-07 | シャープ株式会社 | 気相成長装置及び気相成長方法 |
| JP6038618B2 (ja) | 2011-12-15 | 2016-12-07 | 株式会社ニューフレアテクノロジー | 成膜装置および成膜方法 |
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2013
- 2013-01-30 JP JP2013016015A patent/JP6134522B2/ja active Active
-
2014
- 2014-01-17 TW TW103101697A patent/TWI494469B/zh active
- 2014-01-27 US US14/164,498 patent/US9624603B2/en active Active
- 2014-01-28 CN CN201410041218.1A patent/CN103966574B/zh active Active
- 2014-01-28 KR KR1020140010238A patent/KR101610638B1/ko active Active
- 2014-01-29 DE DE102014201554.5A patent/DE102014201554A1/de active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001081569A (ja) * | 1999-09-16 | 2001-03-27 | Toshiba Corp | 気相成長装置 |
| TW201109464A (en) * | 2009-03-27 | 2011-03-16 | Sharp Kk | Vapor-phase growth apparatus and vapor-phase growth method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI758621B (zh) * | 2019-05-15 | 2022-03-21 | 大陸商拓荊科技股份有限公司 | 多段噴淋組件 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103966574B (zh) | 2017-04-12 |
| KR20140098000A (ko) | 2014-08-07 |
| KR101610638B1 (ko) | 2016-04-08 |
| TW201430166A (zh) | 2014-08-01 |
| CN103966574A (zh) | 2014-08-06 |
| US9624603B2 (en) | 2017-04-18 |
| DE102014201554A1 (de) | 2014-07-31 |
| US20140209015A1 (en) | 2014-07-31 |
| JP2014146767A (ja) | 2014-08-14 |
| JP6134522B2 (ja) | 2017-05-24 |
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