TWI485517B - 撥液阻劑組成物 - Google Patents

撥液阻劑組成物 Download PDF

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Publication number
TWI485517B
TWI485517B TW097114077A TW97114077A TWI485517B TW I485517 B TWI485517 B TW I485517B TW 097114077 A TW097114077 A TW 097114077A TW 97114077 A TW97114077 A TW 97114077A TW I485517 B TWI485517 B TW I485517B
Authority
TW
Taiwan
Prior art keywords
fluorine
group
weight
liquid
based polymer
Prior art date
Application number
TW097114077A
Other languages
English (en)
Chinese (zh)
Other versions
TW200916956A (en
Inventor
Masamichi Morita
Original Assignee
Daikin Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Ind Ltd filed Critical Daikin Ind Ltd
Publication of TW200916956A publication Critical patent/TW200916956A/zh
Application granted granted Critical
Publication of TWI485517B publication Critical patent/TWI485517B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097114077A 2007-04-18 2008-04-18 撥液阻劑組成物 TWI485517B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007108997 2007-04-18

Publications (2)

Publication Number Publication Date
TW200916956A TW200916956A (en) 2009-04-16
TWI485517B true TWI485517B (zh) 2015-05-21

Family

ID=40146964

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097114077A TWI485517B (zh) 2007-04-18 2008-04-18 撥液阻劑組成物

Country Status (3)

Country Link
JP (1) JP5326335B2 (ja)
KR (1) KR101421738B1 (ja)
TW (1) TWI485517B (ja)

Families Citing this family (39)

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JP5085342B2 (ja) * 2008-01-11 2012-11-28 東京応化工業株式会社 着色感光性樹脂組成物
JP5173543B2 (ja) * 2008-04-08 2013-04-03 東京応化工業株式会社 ポジ型感光性樹脂組成物
JP5412125B2 (ja) * 2008-05-01 2014-02-12 東京応化工業株式会社 液浸露光用ネガ型レジスト組成物およびレジストパターン形成方法
JP5401126B2 (ja) 2008-06-11 2014-01-29 東京応化工業株式会社 液浸露光用レジスト組成物およびそれを用いたレジストパターン形成方法
JP5172505B2 (ja) * 2008-07-07 2013-03-27 東京応化工業株式会社 ネガ型レジスト組成物およびそれを用いたレジストパターン形成方法
EP2189846B1 (en) * 2008-11-19 2015-04-22 Rohm and Haas Electronic Materials LLC Process for photolithography applying a photoresist composition comprising a block copolymer
US7989346B2 (en) * 2009-07-27 2011-08-02 Adam Letize Surface treatment of silicon
JP5428657B2 (ja) * 2009-08-31 2014-02-26 ダイキン工業株式会社 撥液−親液パターニング用トップコート組成物
JP2011075691A (ja) * 2009-09-29 2011-04-14 Dainippon Printing Co Ltd 有機エレクトロルミネッセンス表示装置用カラーフィルタ
KR101727772B1 (ko) * 2009-12-28 2017-04-17 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자
JP2011197666A (ja) * 2010-02-26 2011-10-06 Toray Ind Inc 感光性導電ペースト、電極付基板の製造方法およびプラズマディスプレイ用基板の製造方法
WO2011152126A1 (ja) * 2010-06-02 2011-12-08 Dic株式会社 カチオン重合性組成物、それを含む接着剤、ならびに、それらを用いて得られた硬化物及び偏光板
WO2012057058A1 (ja) * 2010-10-29 2012-05-03 住友化学株式会社 感光性樹脂組成物、パターン構造物、表示装置および隔壁
JP2012220855A (ja) * 2011-04-13 2012-11-12 Nagase Chemtex Corp 感放射線性樹脂組成物
JP5246369B2 (ja) * 2011-08-12 2013-07-24 ダイキン工業株式会社 撥液性硬化性インク組成物
JP2013160825A (ja) * 2012-02-02 2013-08-19 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5976357B2 (ja) * 2012-03-27 2016-08-23 日本合成化学工業株式会社 活性エネルギー線硬化性樹脂組成物およびそれを用いたコーティング剤、ならびに積層体
KR101511476B1 (ko) 2014-02-28 2015-04-10 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물
JP6221862B2 (ja) * 2014-03-14 2017-11-01 Jsr株式会社 感放射線性組成物、表示素子用スペーサーまたは層間絶縁膜及びそれらの形成方法
JP6368558B2 (ja) * 2014-06-25 2018-08-01 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法及び高分子化合物
US10109691B2 (en) 2014-06-25 2018-10-23 Joled Inc. Method for manufacturing organic EL display panel
JP6395503B2 (ja) * 2014-08-20 2018-09-26 キヤノン株式会社 インクジェット記録ヘッドおよびその製造方法
JP2016110943A (ja) 2014-12-10 2016-06-20 株式会社Ｊｏｌｅｄ 有機ｅｌ表示パネル及びその製造方法
CN108351591A (zh) * 2015-11-10 2018-07-31 旭硝子株式会社 荧光分析生物芯片用感光性组合物、荧光分析生物芯片的制造方法以及荧光分析生物芯片
KR102607911B1 (ko) * 2017-04-21 2023-11-29 닛산 가가쿠 가부시키가이샤 감광성 수지 조성물
CN110537147B (zh) * 2017-04-21 2024-03-12 日产化学株式会社 感光性树脂组合物
JP7028054B2 (ja) * 2017-05-22 2022-03-02 Jnc株式会社 硬化性組成物、硬化体及び液晶表示素子
US10543677B2 (en) 2017-07-14 2020-01-28 Canon Kabushiki Kaisha Transfer member for transfer-type inkjet recording, inkjet recording method and inkjet recording apparatus
CN111566561A (zh) * 2018-01-26 2020-08-21 三菱化学株式会社 着色感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明
CN108919605B (zh) 2018-07-27 2021-12-21 京东方科技集团股份有限公司 光阻组合物、像素界定层、其制备方法及应用
CN112533974A (zh) * 2018-08-08 2021-03-19 Ａｇｃ株式会社 光学构件、其制造方法和光学构件用固化性组合物
JP7213647B2 (ja) * 2018-09-27 2023-01-27 第一工業製薬株式会社 共重合体および撥水撥油剤
JP7347442B2 (ja) * 2018-11-08 2023-09-20 株式会社レゾナック 共重合体、およびその共重合体を含む樹脂組成物
WO2020095789A1 (ja) * 2018-11-08 2020-05-14 昭和電工株式会社 共重合体、およびその共重合体を含む樹脂組成物
JP2020118735A (ja) * 2019-01-18 2020-08-06 ダイキン工業株式会社 親撥パターン形成剤、親撥パターン形成剤を表面に有する基材、及び親撥パターンを少なくとも一部の表面に有する物品の製造方法
JP7289666B2 (ja) * 2019-02-05 2023-06-12 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物及び電子部品
WO2020188681A1 (ja) * 2019-03-18 2020-09-24 株式会社ニコン 露光システム、露光装置、及び露光方法
TWI837443B (zh) * 2019-12-31 2024-04-01 南韓商羅門哈斯電子材料韓國公司 塗料組成物、經塗覆的基底及形成電子裝置的方法
US12074027B2 (en) * 2021-05-28 2024-08-27 Taiwan Semiconductor Manufacturing Co., Ltd. Underlayer of multilayer structure and methods of use thereof

Citations (1)

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Publication number Priority date Publication date Assignee Title
WO2006129800A1 (ja) * 2005-06-03 2006-12-07 Daikin Industries, Ltd. パターン形成用表面処理剤

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JP4018454B2 (ja) 2002-05-31 2007-12-05 富士フイルム株式会社 ポジ型レジスト組成物
WO2004042474A1 (ja) * 2002-11-06 2004-05-21 Asahi Glass Company, Limited ネガ型感光性樹脂組成物
JP2004277494A (ja) 2003-03-13 2004-10-07 Asahi Glass Co Ltd 含フッ素樹脂および感光性樹脂組成物
JP2005023234A (ja) 2003-07-04 2005-01-27 Jsr Corp アクリル系重合体および感放射線性樹脂組成物
JP4474991B2 (ja) * 2004-04-27 2010-06-09 旭硝子株式会社 レジスト組成物及びその塗膜
JP5159608B2 (ja) * 2006-03-28 2013-03-06 富士フイルム株式会社 感光性樹脂組成物、感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
JP2008208253A (ja) * 2007-02-27 2008-09-11 Fujifilm Corp 樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2008216497A (ja) * 2007-03-01 2008-09-18 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP5249588B2 (ja) * 2008-01-11 2013-07-31 東京応化工業株式会社 着色感光性樹脂組成物

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
WO2006129800A1 (ja) * 2005-06-03 2006-12-07 Daikin Industries, Ltd. パターン形成用表面処理剤

Also Published As

Publication number Publication date
TW200916956A (en) 2009-04-16
KR20080093929A (ko) 2008-10-22
KR101421738B1 (ko) 2014-07-22
JP2008287251A (ja) 2008-11-27
JP5326335B2 (ja) 2013-10-30

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