TWI471281B - 摻雜二氧化鈦石英玻璃構件及其製造方法 - Google Patents

摻雜二氧化鈦石英玻璃構件及其製造方法 Download PDF

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Publication number
TWI471281B
TWI471281B TW98122787A TW98122787A TWI471281B TW I471281 B TWI471281 B TW I471281B TW 98122787 A TW98122787 A TW 98122787A TW 98122787 A TW98122787 A TW 98122787A TW I471281 B TWI471281 B TW I471281B
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TW
Taiwan
Prior art keywords
quartz glass
refractive index
titanium dioxide
doped titanium
less
Prior art date
Application number
TW98122787A
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English (en)
Chinese (zh)
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TW201011331A (en
Inventor
每田繁
大塚久利
Original Assignee
信越化學工業股份有限公司
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Publication of TW201011331A publication Critical patent/TW201011331A/zh
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Publication of TWI471281B publication Critical patent/TWI471281B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/0026—Re-forming shaped glass by gravity, e.g. sagging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31616—Next to polyester [e.g., alkyd]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
TW98122787A 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法 TWI471281B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008177076A JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法

Publications (2)

Publication Number Publication Date
TW201011331A TW201011331A (en) 2010-03-16
TWI471281B true TWI471281B (zh) 2015-02-01

Family

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Family Applications (2)

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TW98122787A TWI471281B (zh) 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法
TW103134408A TWI541212B (zh) 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法

Family Applications After (1)

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TW103134408A TWI541212B (zh) 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法

Country Status (6)

Country Link
US (2) US8105734B2 (https=)
EP (2) EP2145865B1 (https=)
JP (1) JP5202141B2 (https=)
KR (1) KR101513310B1 (https=)
CN (2) CN102849929B (https=)
TW (2) TWI471281B (https=)

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WO2011068100A1 (ja) * 2009-12-04 2011-06-09 旭硝子株式会社 インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
US8567214B2 (en) 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
CN102985379A (zh) * 2010-07-08 2013-03-20 旭硝子株式会社 含有TiO2的石英玻璃基材及其制造方法
JP5737070B2 (ja) * 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
KR20140012053A (ko) * 2011-01-31 2014-01-29 아사히 가라스 가부시키가이샤 티타니아를 함유하는 실리카 유리체의 제조 방법 및 티타니아를 함유하는 실리카 유리체
JP5768452B2 (ja) * 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
WO2013084978A1 (ja) * 2011-12-09 2013-06-13 信越石英株式会社 チタニア－シリカガラス製ｅｕｖリソグラフィ用フォトマスク基板
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
JP6336792B2 (ja) * 2013-04-25 2018-06-06 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
EP2960219B1 (de) * 2014-06-27 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Rohling aus Titan-dotiertem Kieselglas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
JP6819451B2 (ja) * 2017-05-08 2021-01-27 信越化学工業株式会社 大型合成石英ガラス基板並びにその評価方法及び製造方法
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
JP7122997B2 (ja) 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
WO2024044114A1 (en) * 2022-08-26 2024-02-29 Corning Incorporated Homogenous silica-titania glass
WO2025193428A1 (en) * 2024-03-12 2025-09-18 Corning Incorporated Methods to produce titania-silica glass using a directional temperature difference

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US20050245383A1 (en) * 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and optical material for EUV lithography
US20050245382A1 (en) * 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and process for its production
JP2006240978A (ja) * 2005-02-01 2006-09-14 Shinetsu Quartz Prod Co Ltd 均質なシリカ・チタニアガラスの製造方法
US20070207911A1 (en) * 2005-01-25 2007-09-06 Asahi Glass Co., Ltd. Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same

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US20050245383A1 (en) * 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and optical material for EUV lithography
US20050245382A1 (en) * 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and process for its production
US20070207911A1 (en) * 2005-01-25 2007-09-06 Asahi Glass Co., Ltd. Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2
JP2006240978A (ja) * 2005-02-01 2006-09-14 Shinetsu Quartz Prod Co Ltd 均質なシリカ・チタニアガラスの製造方法
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same

Also Published As

Publication number Publication date
CN101639624B (zh) 2013-08-07
US20100003609A1 (en) 2010-01-07
TW201011331A (en) 2010-03-16
CN102849929B (zh) 2016-02-24
KR20100005679A (ko) 2010-01-15
KR101513310B1 (ko) 2015-04-17
US20120104336A1 (en) 2012-05-03
CN102849929A (zh) 2013-01-02
JP5202141B2 (ja) 2013-06-05
EP2145865A1 (en) 2010-01-20
EP2341036A1 (en) 2011-07-06
EP2145865B1 (en) 2016-08-10
US8377612B2 (en) 2013-02-19
TWI541212B (zh) 2016-07-11
CN101639624A (zh) 2010-02-03
JP2010013335A (ja) 2010-01-21
US8105734B2 (en) 2012-01-31
TW201512131A (zh) 2015-04-01

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