KR101513310B1 - 티타니아 도핑 석영 유리 부재 및 그의 제조 방법 - Google Patents

티타니아 도핑 석영 유리 부재 및 그의 제조 방법 Download PDF

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Publication number
KR101513310B1
KR101513310B1 KR1020090061106A KR20090061106A KR101513310B1 KR 101513310 B1 KR101513310 B1 KR 101513310B1 KR 1020090061106 A KR1020090061106 A KR 1020090061106A KR 20090061106 A KR20090061106 A KR 20090061106A KR 101513310 B1 KR101513310 B1 KR 101513310B1
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South Korea
Prior art keywords
titania
quartz glass
refractive index
doped quartz
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KR1020090061106A
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Korean (ko)
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KR20100005679A (ko
Inventor
시게루 마이다
히사또시 오쯔까
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신에쓰 가가꾸 고교 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/0026—Re-forming shaped glass by gravity, e.g. sagging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31616—Next to polyester [e.g., alkyd]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
KR1020090061106A 2008-07-07 2009-07-06 티타니아 도핑 석영 유리 부재 및 그의 제조 방법 Active KR101513310B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-177076 2008-07-07
JP2008177076A JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法

Publications (2)

Publication Number Publication Date
KR20100005679A KR20100005679A (ko) 2010-01-15
KR101513310B1 true KR101513310B1 (ko) 2015-04-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090061106A Active KR101513310B1 (ko) 2008-07-07 2009-07-06 티타니아 도핑 석영 유리 부재 및 그의 제조 방법

Country Status (6)

Country Link
US (2) US8105734B2 (https=)
EP (2) EP2145865B1 (https=)
JP (1) JP5202141B2 (https=)
KR (1) KR101513310B1 (https=)
CN (2) CN102849929B (https=)
TW (2) TWI471281B (https=)

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US9399000B2 (en) 2006-06-20 2016-07-26 Momentive Performance Materials, Inc. Fused quartz tubing for pharmaceutical packaging
JPWO2010131662A1 (ja) * 2009-05-13 2012-11-01 旭硝子株式会社 ＴｉＯ２−ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２−ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
WO2011068100A1 (ja) * 2009-12-04 2011-06-09 旭硝子株式会社 インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
US8567214B2 (en) 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
CN102985379A (zh) * 2010-07-08 2013-03-20 旭硝子株式会社 含有TiO2的石英玻璃基材及其制造方法
JP5737070B2 (ja) * 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
KR20140012053A (ko) * 2011-01-31 2014-01-29 아사히 가라스 가부시키가이샤 티타니아를 함유하는 실리카 유리체의 제조 방법 및 티타니아를 함유하는 실리카 유리체
JP5768452B2 (ja) * 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
WO2013084978A1 (ja) * 2011-12-09 2013-06-13 信越石英株式会社 チタニア－シリカガラス製ｅｕｖリソグラフィ用フォトマスク基板
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
JP6336792B2 (ja) * 2013-04-25 2018-06-06 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
EP2960219B1 (de) * 2014-06-27 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Rohling aus Titan-dotiertem Kieselglas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
JP6819451B2 (ja) * 2017-05-08 2021-01-27 信越化学工業株式会社 大型合成石英ガラス基板並びにその評価方法及び製造方法
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
JP7122997B2 (ja) 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
WO2024044114A1 (en) * 2022-08-26 2024-02-29 Corning Incorporated Homogenous silica-titania glass
WO2025193428A1 (en) * 2024-03-12 2025-09-18 Corning Incorporated Methods to produce titania-silica glass using a directional temperature difference

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07187683A (ja) * 1993-12-27 1995-07-25 Nikon Corp 石英ガラス製バーナー、これを用いて製造される 石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法
JP2007182367A (ja) * 2005-12-08 2007-07-19 Shin Etsu Chem Co Ltd チタニアドープ石英ガラス、ｅｕｖリソグラフィ用部材、ｅｕｖリソグラフィ用フォトマスク基板及びチタニアドープ石英ガラスの製造方法

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JP3071362B2 (ja) 1994-07-15 2000-07-31 信越化学工業株式会社 ＡｒＦエキシマレーザリソグラフィー用合成石英マスク基板およびその製造方法
JPH0959034A (ja) 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd 合成石英ガラス材及びその製造方法
JP3223873B2 (ja) * 1997-12-24 2001-10-29 住友金属工業株式会社 シリコンウエーハ及びその製造方法
US6990836B2 (en) * 2000-02-23 2006-01-31 Shin-Etsu Chemical Co., Ltd. Method of producing fluorine-containing synthetic quartz glass
JP3796653B2 (ja) 2000-02-23 2006-07-12 信越化学工業株式会社 フッ素含有合成石英ガラス及びその製造方法
US6610447B2 (en) * 2001-03-30 2003-08-26 Intel Corporation Extreme ultraviolet mask with improved absorber
JP3975321B2 (ja) 2001-04-20 2007-09-12 信越化学工業株式会社 フォトマスク用シリカガラス系基板及びフォトマスク用シリカガラス系基板の平坦化方法
JP4792706B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP4792705B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JPWO2004092082A1 (ja) * 2003-04-11 2006-07-06 株式会社ニコン ＳｉＯ２−ＴｉＯ２系ガラスの製造方法、ＳｉＯ２−ＴｉＯ２系ガラス及び露光装置
JP4665443B2 (ja) 2004-06-22 2011-04-06 旭硝子株式会社 ガラス基板の研磨方法
JP4487783B2 (ja) * 2005-01-25 2010-06-23 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材
JP4646314B2 (ja) * 2005-02-01 2011-03-09 信越石英株式会社 均質なシリカ・チタニアガラスの製造方法
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07187683A (ja) * 1993-12-27 1995-07-25 Nikon Corp 石英ガラス製バーナー、これを用いて製造される 石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法
JP2007182367A (ja) * 2005-12-08 2007-07-19 Shin Etsu Chem Co Ltd チタニアドープ石英ガラス、ｅｕｖリソグラフィ用部材、ｅｕｖリソグラフィ用フォトマスク基板及びチタニアドープ石英ガラスの製造方法

Also Published As

Publication number Publication date
CN101639624B (zh) 2013-08-07
US20100003609A1 (en) 2010-01-07
TW201011331A (en) 2010-03-16
CN102849929B (zh) 2016-02-24
KR20100005679A (ko) 2010-01-15
US20120104336A1 (en) 2012-05-03
CN102849929A (zh) 2013-01-02
JP5202141B2 (ja) 2013-06-05
EP2145865A1 (en) 2010-01-20
EP2341036A1 (en) 2011-07-06
EP2145865B1 (en) 2016-08-10
US8377612B2 (en) 2013-02-19
TWI471281B (zh) 2015-02-01
TWI541212B (zh) 2016-07-11
CN101639624A (zh) 2010-02-03
JP2010013335A (ja) 2010-01-21
US8105734B2 (en) 2012-01-31
TW201512131A (zh) 2015-04-01

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