TWI455883B - 矽石以及環氧樹脂 - Google Patents

矽石以及環氧樹脂 Download PDF

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Publication number
TWI455883B
TWI455883B TW098106468A TW98106468A TWI455883B TW I455883 B TWI455883 B TW I455883B TW 098106468 A TW098106468 A TW 098106468A TW 98106468 A TW98106468 A TW 98106468A TW I455883 B TWI455883 B TW I455883B
Authority
TW
Taiwan
Prior art keywords
surface area
fuel gas
air
average
oxide powder
Prior art date
Application number
TW098106468A
Other languages
English (en)
Chinese (zh)
Other versions
TW201000400A (en
Inventor
Juergen Meyer
Mario Scholz
Pia Buckel
Andreas Hille
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of TW201000400A publication Critical patent/TW201000400A/zh
Application granted granted Critical
Publication of TWI455883B publication Critical patent/TWI455883B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/11Powder tap density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/10Process efficiency
    • Y02P20/129Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2993Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995Silane, siloxane or silicone coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
TW098106468A 2008-03-04 2009-02-27 矽石以及環氧樹脂 TWI455883B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008000499A DE102008000499A1 (de) 2008-03-04 2008-03-04 Kieselsäure sowie Epoxidharze

Publications (2)

Publication Number Publication Date
TW201000400A TW201000400A (en) 2010-01-01
TWI455883B true TWI455883B (zh) 2014-10-11

Family

ID=40740192

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098106468A TWI455883B (zh) 2008-03-04 2009-02-27 矽石以及環氧樹脂

Country Status (7)

Country Link
US (1) US8480846B2 (enExample)
EP (2) EP2268575B1 (enExample)
JP (1) JP5583032B2 (enExample)
CN (2) CN103435056B (enExample)
DE (1) DE102008000499A1 (enExample)
TW (1) TWI455883B (enExample)
WO (1) WO2009109442A2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102040804B (zh) * 2010-11-19 2013-02-13 明基材料有限公司 环氧树脂组成物
JP5643623B2 (ja) * 2010-12-02 2014-12-17 デクセリアルズ株式会社 異方性導電材料及びその製造方法
JP6443041B2 (ja) * 2014-12-26 2018-12-26 三菱マテリアル株式会社 シリカゾル分散液及びシリカ多孔質膜形成用組成物
CN104830259B (zh) * 2015-04-21 2018-05-15 长兴铁鹰电气有限公司 一种铅酸蓄电池极柱密封胶及其制备方法
JP6796253B2 (ja) * 2016-04-04 2020-12-09 日立金属株式会社 接着フィルム及びフラット配線材
DE102017203998A1 (de) 2017-03-10 2017-06-01 Wacker Chemie Ag Verfahren zur Herstellung von pyrogener Kieselsäure
CN106978103A (zh) * 2017-04-07 2017-07-25 德山化工(浙江)有限公司 硅油处理热解法二氧化硅、其制备方法及应用
CN111655802B (zh) * 2018-01-25 2023-02-21 卡博特公司 含水的疏水性二氧化硅分散体
CN112638490B (zh) 2018-06-15 2023-01-03 格雷斯公司 消泡剂活性物质、其制造方法和消泡制剂
JP7527770B2 (ja) * 2018-11-29 2024-08-05 キヤノン株式会社 硬化性シリコーンゴム混合物、電子写真用部材、および電子写真画像形成装置
WO2021035383A1 (en) * 2019-08-23 2021-03-04 Evonik Specialty Chemicals (Shanghai) Co., Ltd. Thermal conductive filler and preparation method thereof
EP4050122A4 (en) * 2019-10-21 2022-12-28 JFE Steel Corporation Electromagnetic steel sheet with insulation coating film
EP3954743A1 (de) 2020-08-12 2022-02-16 Evonik Operations GmbH Verwendung von siliziumdioxid zur verbesserung der leitfähigkeit von beschichtungen
JP2022185978A (ja) * 2021-06-03 2022-12-15 日本アエロジル株式会社 表面改質無機酸化物粉末及びその製造方法
JP2022185980A (ja) * 2021-06-03 2022-12-15 日本アエロジル株式会社 表面改質無機酸化物粉末及びその製造方法
CN116285475A (zh) * 2023-02-13 2023-06-23 青岛中邦新材料科技有限公司 一种疏水二氧化硅及其制备方法
CN115974089B (zh) * 2023-02-17 2023-10-20 江苏海格新材料有限公司 一种活性硅微粉的生产方法
WO2024236144A1 (en) * 2023-05-18 2024-11-21 Ams-Osram International Gmbh Modified siloxanes, method for modifying siloxanes and their use

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200502170A (en) * 2003-05-06 2005-01-16 Tokuyama Corp Hydrophobic fumed silica
CN1803603A (zh) * 2005-01-12 2006-07-19 德古萨股份公司 热解法制造的二氧化硅粉末以及含有该粉末的硅树脂密封组合物

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GB932753A (en) * 1959-10-12 1963-07-31 Ici Ltd Improvements in or relating to fillers and pigments by treatment with dihydrocarbyl polysiloxane
DE1567454A1 (de) * 1966-03-10 1970-08-06 Degussa Verfahren zur Herstellung stabiler hochprozentiger Dispersionen von pyrogen gewonnener Kieselsaeure
US3592679A (en) * 1969-05-29 1971-07-13 Cabot Corp Surface treatment of polymeric materials
JPS6136338A (ja) * 1984-07-27 1986-02-21 Mitsubishi Chem Ind Ltd 疎水性の酸化物微粉体及び該酸化物から成る揺変付与剤
US4852965A (en) * 1987-02-27 1989-08-01 American Telephone And Telegraph Company At&T Bell Laboratories Composite service and distribution communications media
US5285513A (en) * 1992-11-30 1994-02-08 At&T Bell Laboratories Optical fiber cable provided with stabilized waterblocking material
US5543487A (en) * 1994-01-19 1996-08-06 The United States Of America As Represented By The Secretary Of Agriculture Hydroxymethylated resorcinol coupling agent and method for bonding wood
DE4402370A1 (de) 1994-01-27 1995-08-03 Degussa Silanisierte Kieselsäuren
DE10138490A1 (de) * 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10145162A1 (de) * 2001-09-13 2003-04-10 Wacker Chemie Gmbh Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen
DE10222153B4 (de) * 2002-05-17 2018-11-22 Evonik Degussa Gmbh 2-Komponenten-Mischsysteme
US6645341B1 (en) * 2002-08-06 2003-11-11 National Starch And Chemical Investment Holding Corporation Two part epoxide adhesive with improved strength
DE10239424A1 (de) 2002-08-28 2004-03-11 Degussa Ag Kieselsäuren
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WO2004055105A1 (en) * 2002-12-18 2004-07-01 Degussa Ag Texture-coated silica
DE10260323A1 (de) * 2002-12-20 2004-07-08 Wacker-Chemie Gmbh Wasserbenetzbare silylierte Metalloxide
DE10326049A1 (de) * 2003-06-10 2004-12-30 Degussa Ag Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung
JP2005154222A (ja) * 2003-11-27 2005-06-16 Tokuyama Corp 微粒子状シリカ
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Publication number Priority date Publication date Assignee Title
TW200502170A (en) * 2003-05-06 2005-01-16 Tokuyama Corp Hydrophobic fumed silica
CN1803603A (zh) * 2005-01-12 2006-07-19 德古萨股份公司 热解法制造的二氧化硅粉末以及含有该粉末的硅树脂密封组合物

Also Published As

Publication number Publication date
CN101959796B (zh) 2013-09-04
WO2009109442A3 (en) 2010-08-05
CN103435056A (zh) 2013-12-11
CN103435056B (zh) 2015-12-02
EP2433905A2 (en) 2012-03-28
EP2268575A2 (en) 2011-01-05
US20100286311A1 (en) 2010-11-11
JP2011516373A (ja) 2011-05-26
TW201000400A (en) 2010-01-01
EP2433905B1 (en) 2016-08-17
EP2268575B1 (en) 2013-04-03
JP5583032B2 (ja) 2014-09-03
CN101959796A (zh) 2011-01-26
DE102008000499A1 (de) 2009-09-10
EP2433905A3 (en) 2012-05-30
US8480846B2 (en) 2013-07-09
WO2009109442A2 (en) 2009-09-11

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