TWI433209B - A method of manufacturing an exposure apparatus and an element - Google Patents

A method of manufacturing an exposure apparatus and an element Download PDF

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Publication number
TWI433209B
TWI433209B TW093120588A TW93120588A TWI433209B TW I433209 B TWI433209 B TW I433209B TW 093120588 A TW093120588 A TW 093120588A TW 93120588 A TW93120588 A TW 93120588A TW I433209 B TWI433209 B TW I433209B
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TW
Taiwan
Prior art keywords
liquid
substrate
supply
exposure
supplied
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TW093120588A
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English (en)
Chinese (zh)
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TW200507064A (en
Inventor
長坂博之
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尼康股份有限公司
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Publication of TW200507064A publication Critical patent/TW200507064A/zh
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Publication of TWI433209B publication Critical patent/TWI433209B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093120588A 2003-07-09 2004-07-09 A method of manufacturing an exposure apparatus and an element TWI433209B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003272616 2003-07-09

Publications (2)

Publication Number Publication Date
TW200507064A TW200507064A (en) 2005-02-16
TWI433209B true TWI433209B (zh) 2014-04-01

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Family Applications (1)

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TW093120588A TWI433209B (zh) 2003-07-09 2004-07-09 A method of manufacturing an exposure apparatus and an element

Country Status (5)

Country Link
US (4) US7379157B2 (https=)
JP (2) JP5273135B2 (https=)
KR (1) KR101296501B1 (https=)
TW (1) TWI433209B (https=)
WO (1) WO2005006418A1 (https=)

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US7580114B2 (en) 2009-08-25
US7855777B2 (en) 2010-12-21
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KR20060030106A (ko) 2006-04-07
JP2012109617A (ja) 2012-06-07
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US8879043B2 (en) 2014-11-04
US20110063589A1 (en) 2011-03-17

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