TWI417662B - A photosensitive resin composition and a hardened product thereof - Google Patents

A photosensitive resin composition and a hardened product thereof Download PDF

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Publication number
TWI417662B
TWI417662B TW097137563A TW97137563A TWI417662B TW I417662 B TWI417662 B TW I417662B TW 097137563 A TW097137563 A TW 097137563A TW 97137563 A TW97137563 A TW 97137563A TW I417662 B TWI417662 B TW I417662B
Authority
TW
Taiwan
Prior art keywords
group
carbon atoms
resin composition
photosensitive resin
alkyl
Prior art date
Application number
TW097137563A
Other languages
English (en)
Chinese (zh)
Other versions
TW200935175A (en
Inventor
Yoko Shibasaki
Masao Arima
Kazuyoshi Yoneda
Original Assignee
Taiyo Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Holdings Co Ltd filed Critical Taiyo Holdings Co Ltd
Publication of TW200935175A publication Critical patent/TW200935175A/zh
Application granted granted Critical
Publication of TWI417662B publication Critical patent/TWI417662B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW097137563A 2007-10-01 2008-09-30 A photosensitive resin composition and a hardened product thereof TWI417662B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007257359A JP5513711B2 (ja) 2007-10-01 2007-10-01 感光性樹脂組成物及びその硬化物

Publications (2)

Publication Number Publication Date
TW200935175A TW200935175A (en) 2009-08-16
TWI417662B true TWI417662B (zh) 2013-12-01

Family

ID=40537910

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097137563A TWI417662B (zh) 2007-10-01 2008-09-30 A photosensitive resin composition and a hardened product thereof

Country Status (4)

Country Link
JP (1) JP5513711B2 (enExample)
KR (1) KR101057929B1 (enExample)
CN (1) CN101403859B (enExample)
TW (1) TWI417662B (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5653588B2 (ja) * 2009-03-31 2015-01-14 太陽ホールディングス株式会社 光硬化性樹脂組成物
JP5250479B2 (ja) * 2009-05-18 2013-07-31 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5475350B2 (ja) * 2009-07-02 2014-04-16 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5356934B2 (ja) * 2009-07-02 2013-12-04 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
KR101759929B1 (ko) * 2009-11-20 2017-07-20 코오롱인더스트리 주식회사 감광성 수지 조성물
WO2011062446A2 (ko) * 2009-11-20 2011-05-26 코오롱인더스트리 주식회사 감광성 수지 조성물
JP5415923B2 (ja) * 2009-12-14 2014-02-12 太陽ホールディングス株式会社 感光性樹脂組成物、そのドライフィルム及びそれらを用いたプリント配線板
WO2011122025A1 (ja) * 2010-03-31 2011-10-06 太陽ホールディングス株式会社 光硬化性樹脂組成物
CN102859437A (zh) * 2010-04-28 2013-01-02 富士胶片株式会社 感光性组合物、以及感光性薄膜、感光性层叠体、永久图案形成方法以及印刷基板
KR101886667B1 (ko) * 2010-09-13 2018-08-09 가부시키가이샤 가네카 보강판 일체형 플렉서블 프린트 기판, 및 보강판 일체형 플렉서블 프린트 기판의 제조 방법
CN107652383A (zh) * 2011-10-20 2018-02-02 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法
EP2891887B1 (en) * 2012-08-31 2022-11-30 Universal Bio Research Co., Ltd. Dispensing device with built-in deforming element and processing method using built-in deforming element dispensing
JP5523592B2 (ja) * 2013-01-08 2014-06-18 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5809182B2 (ja) * 2013-03-26 2015-11-10 株式会社タムラ製作所 感光性樹脂組成物
JP6178164B2 (ja) * 2013-08-23 2017-08-09 富士フイルム株式会社 感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、有機el液晶表示装置
JP5722418B1 (ja) * 2013-12-02 2015-05-20 太陽インキ製造株式会社 感光性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
TWI731895B (zh) * 2015-12-08 2021-07-01 日商富士軟片股份有限公司 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置
JP6197020B2 (ja) * 2015-12-17 2017-09-13 三井化学株式会社 光硬化性樹脂組成物、表示素子シール剤、液晶シール剤及び液晶表示パネルとその製造方法
TWI639889B (zh) * 2015-12-25 2018-11-01 旭化成股份有限公司 感光性樹脂組合物、感光性樹脂積層體、樹脂圖案製造方法、硬化膜圖案製造方法及顯示裝置
JP6936215B2 (ja) * 2016-03-29 2021-09-15 株式会社Adeka 光重合開始剤組成物及び感光性組成物
JP7194492B2 (ja) * 2016-10-24 2022-12-22 東京応化工業株式会社 感光性組成物、感光性組成物の製造方法、光重合開始剤、及び光重合開始剤の調製方法
JP6789193B2 (ja) * 2017-08-09 2020-11-25 太陽インキ製造株式会社 感光性樹脂組成物、ドライフィルム、硬化物、およびプリント配線板
JP7029267B2 (ja) * 2017-10-06 2022-03-03 日鉄ケミカル&マテリアル株式会社 感光性樹脂組成物及び樹脂膜付き基板の製造方法
CN109085129B (zh) * 2018-06-22 2021-10-15 广州兴森快捷电路科技有限公司 阻焊油墨对uv光吸收的定量测试方法
CN111378088B (zh) * 2018-12-29 2023-02-07 太阳油墨(苏州)有限公司 热固化性树脂组合物、干膜、固化物及电子部件
WO2025213449A1 (zh) * 2024-04-12 2025-10-16 徐州博康信息化学品有限公司 潜伏性固化剂、低温固化的感光树脂组合物、图案固化膜的制备方法以及绝缘膜

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006129697A1 (ja) * 2005-05-31 2006-12-07 Taiyo Ink Manufacturing Co., Ltd. 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板
CN1945434A (zh) * 2005-10-04 2007-04-11 太阳油墨制造株式会社 光固化性·热固化性树脂组合物、其固化物及使用其制得的印刷电路板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY121423A (en) * 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions
JP4008273B2 (ja) * 2002-03-26 2007-11-14 太陽インキ製造株式会社 アルカリ現像型感光性樹脂組成物及びそれを用いたプリント配線基板
JP4393051B2 (ja) * 2002-10-15 2010-01-06 昭和電工株式会社 ヘキサアリールビイミダゾール化合物およびそれを含む光重合開始剤組成物
JP2007041493A (ja) * 2004-10-20 2007-02-15 Mitsubishi Chemicals Corp 感光性組成物、及び青紫色レーザー用感光性組成物並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2007072035A (ja) * 2005-09-06 2007-03-22 Tokyo Ohka Kogyo Co Ltd 感光性組成物
TW200728379A (en) * 2005-09-06 2007-08-01 Taiyo Ink Mfg Co Ltd Resin composition, cured product of the same, and printed circuit board made of the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006129697A1 (ja) * 2005-05-31 2006-12-07 Taiyo Ink Manufacturing Co., Ltd. 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板
CN1945434A (zh) * 2005-10-04 2007-04-11 太阳油墨制造株式会社 光固化性·热固化性树脂组合物、其固化物及使用其制得的印刷电路板

Also Published As

Publication number Publication date
CN101403859A (zh) 2009-04-08
CN101403859B (zh) 2013-06-19
JP5513711B2 (ja) 2014-06-04
KR101057929B1 (ko) 2011-08-18
TW200935175A (en) 2009-08-16
JP2009086414A (ja) 2009-04-23
KR20090033803A (ko) 2009-04-06

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