TWI407588B - Semiconductor light emitting element and manufacturing method thereof - Google Patents
Semiconductor light emitting element and manufacturing method thereof Download PDFInfo
- Publication number
- TWI407588B TWI407588B TW098108580A TW98108580A TWI407588B TW I407588 B TWI407588 B TW I407588B TW 098108580 A TW098108580 A TW 098108580A TW 98108580 A TW98108580 A TW 98108580A TW I407588 B TWI407588 B TW I407588B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- light
- electrode layer
- emitting device
- metal electrode
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/882—Scattering means
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- Led Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008077421A JP5651288B2 (ja) | 2008-03-25 | 2008-03-25 | 半導体発光素子及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200952219A TW200952219A (en) | 2009-12-16 |
| TWI407588B true TWI407588B (zh) | 2013-09-01 |
Family
ID=41115743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098108580A TWI407588B (zh) | 2008-03-25 | 2009-03-17 | Semiconductor light emitting element and manufacturing method thereof |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8101964B2 (https=) |
| JP (1) | JP5651288B2 (https=) |
| TW (1) | TWI407588B (https=) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5571870B2 (ja) | 2007-09-21 | 2014-08-13 | 株式会社東芝 | 極微細構造を有する光透過型金属電極およびその製造方法 |
| JP5283926B2 (ja) * | 2008-02-25 | 2013-09-04 | 株式会社東芝 | 光透過型金属電極およびその製造方法 |
| US20100327300A1 (en) * | 2009-06-25 | 2010-12-30 | Koninklijke Philips Electronics N.V. | Contact for a semiconductor light emitting device |
| JP2011054598A (ja) * | 2009-08-31 | 2011-03-17 | Toshiba Corp | 半導体発光素子およびその製造方法 |
| KR101081166B1 (ko) * | 2009-09-23 | 2011-11-07 | 엘지이노텍 주식회사 | 발광소자, 발광소자의 제조방법 및 발광소자 패키지 |
| US8574950B2 (en) * | 2009-10-30 | 2013-11-05 | International Business Machines Corporation | Electrically contactable grids manufacture |
| KR101103892B1 (ko) * | 2009-12-08 | 2012-01-12 | 엘지이노텍 주식회사 | 발광소자 및 발광소자 패키지 |
| KR101104564B1 (ko) | 2010-01-08 | 2012-01-11 | 고려대학교 산학협력단 | 발광 다이오드의 광추출 효율을 높이기 위한 광결정 패터닝 방법 및 이에 따른 발광 다이오드 |
| JP5284300B2 (ja) | 2010-03-10 | 2013-09-11 | 株式会社東芝 | 半導体発光素子、およびそれを用いた照明装置、ならびに半導体発光素子の製造方法 |
| JP5036840B2 (ja) * | 2010-03-25 | 2012-09-26 | 株式会社東芝 | 発光素子 |
| US20120018770A1 (en) * | 2010-07-23 | 2012-01-26 | Min-Hao Michael Lu | Oled light source having improved total light emission |
| JP2012059790A (ja) * | 2010-09-06 | 2012-03-22 | Toshiba Corp | 半導体発光素子及びその製造方法 |
| JP5292374B2 (ja) * | 2010-09-06 | 2013-09-18 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
| JP5204177B2 (ja) * | 2010-09-06 | 2013-06-05 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
| JP2012059969A (ja) * | 2010-09-09 | 2012-03-22 | Toshiba Corp | 半導体発光素子 |
| JP5674389B2 (ja) * | 2010-09-09 | 2015-02-25 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
| JP2012114329A (ja) * | 2010-11-26 | 2012-06-14 | Toshiba Corp | 半導体発光素子及びその製造方法 |
| JP5254381B2 (ja) * | 2011-02-23 | 2013-08-07 | 株式会社東芝 | パターン形成方法 |
| JP5433609B2 (ja) | 2011-03-03 | 2014-03-05 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
| JP2012186195A (ja) | 2011-03-03 | 2012-09-27 | Toshiba Corp | 半導体発光素子及びその製造方法 |
| JP5479391B2 (ja) | 2011-03-08 | 2014-04-23 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
| JP5501319B2 (ja) * | 2011-09-24 | 2014-05-21 | 株式会社東芝 | 半導体発光素子 |
| KR102217128B1 (ko) * | 2014-06-26 | 2021-02-18 | 서울바이오시스 주식회사 | 발광 다이오드 및 그 제조 방법 |
| KR101740531B1 (ko) | 2012-07-02 | 2017-06-08 | 서울바이오시스 주식회사 | 표면 실장용 발광 다이오드 모듈 및 이의 제조방법. |
| US9461212B2 (en) | 2012-07-02 | 2016-10-04 | Seoul Viosys Co., Ltd. | Light emitting diode module for surface mount technology and method of manufacturing the same |
| KR101972048B1 (ko) * | 2012-10-29 | 2019-08-16 | 엘지이노텍 주식회사 | 전극 구조물 및 이를 포함하는 발광소자 |
| KR20140086624A (ko) * | 2012-12-28 | 2014-07-08 | 삼성전자주식회사 | 질화물 반도체 발광 소자 |
| JP2013141038A (ja) * | 2013-04-22 | 2013-07-18 | Toshiba Corp | 半導体発光素子及びその製造方法 |
| US10057983B1 (en) * | 2014-06-13 | 2018-08-21 | Verily Life Sciences Llc | Fabrication methods for bio-compatible devices using an etch stop and/or a coating |
| US10879420B2 (en) | 2018-07-09 | 2020-12-29 | University Of Iowa Research Foundation | Cascaded superlattice LED system |
| KR102761236B1 (ko) * | 2019-06-10 | 2025-02-05 | 에스케이하이닉스 주식회사 | 패턴 형성 방법 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6258618B1 (en) * | 1998-09-11 | 2001-07-10 | Lumileds Lighting, Us, Llc | Light emitting device having a finely-patterned reflective contact |
| US20060097278A1 (en) * | 2002-06-20 | 2006-05-11 | Osamu Goto | Gan semiconductor device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3940546A (en) * | 1971-07-13 | 1976-02-24 | Gerdec | Chlorinated siliceous materals as fillers and reactants |
| US5153889A (en) * | 1989-05-31 | 1992-10-06 | Kabushiki Kaisha Toshiba | Semiconductor light emitting device |
| DE69831860T2 (de) * | 1998-07-04 | 2006-07-20 | Au Optronics Corp. | Elektrode zur verwendung in elektrooptischen bauelementen |
| JP3940546B2 (ja) * | 1999-06-07 | 2007-07-04 | 株式会社東芝 | パターン形成方法およびパターン形成材料 |
| US6512248B1 (en) * | 1999-10-19 | 2003-01-28 | Showa Denko K.K. | Semiconductor light-emitting device, electrode for the device, method for fabricating the electrode, LED lamp using the device, and light source using the LED lamp |
| JP4142234B2 (ja) * | 2000-07-04 | 2008-09-03 | 株式会社エンプラス | 面光源装置及び液晶表示装置 |
| EP1291904A3 (en) * | 2001-09-10 | 2009-10-07 | FUJIFILM Corporation | GaN substrate formed over GaN layer having discretely formed minute holes produced by selective growth |
| JP2004055646A (ja) * | 2002-07-17 | 2004-02-19 | Sumitomo Electric Ind Ltd | 発光ダイオード素子のp側電極構造 |
| JP4130163B2 (ja) * | 2003-09-29 | 2008-08-06 | 三洋電機株式会社 | 半導体発光素子 |
| JP5011628B2 (ja) | 2004-01-20 | 2012-08-29 | 日亜化学工業株式会社 | 半導体発光素子 |
| JP4068074B2 (ja) | 2004-03-29 | 2008-03-26 | 株式会社東芝 | 凸凹パターンの形成方法および凸凹パターン形成用部材 |
| US20060226429A1 (en) * | 2005-04-08 | 2006-10-12 | Sigalas Mihail M | Method and apparatus for directional organic light emitting diodes |
| JP5123573B2 (ja) * | 2007-06-13 | 2013-01-23 | ローム株式会社 | 半導体発光素子およびその製造方法 |
| KR100921466B1 (ko) * | 2007-08-30 | 2009-10-13 | 엘지전자 주식회사 | 질화물계 발광 소자 및 그 제조방법 |
| JP5571870B2 (ja) * | 2007-09-21 | 2014-08-13 | 株式会社東芝 | 極微細構造を有する光透過型金属電極およびその製造方法 |
| JP5343860B2 (ja) * | 2007-12-28 | 2013-11-13 | 三菱化学株式会社 | GaN系LED素子用電極およびGaN系LED素子ならびにそれらの製造方法。 |
-
2008
- 2008-03-25 JP JP2008077421A patent/JP5651288B2/ja not_active Expired - Fee Related
-
2009
- 2009-01-30 US US12/363,198 patent/US8101964B2/en not_active Expired - Fee Related
- 2009-03-17 TW TW098108580A patent/TWI407588B/zh not_active IP Right Cessation
-
2011
- 2011-12-23 US US13/335,984 patent/US8450768B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6258618B1 (en) * | 1998-09-11 | 2001-07-10 | Lumileds Lighting, Us, Llc | Light emitting device having a finely-patterned reflective contact |
| US20060097278A1 (en) * | 2002-06-20 | 2006-05-11 | Osamu Goto | Gan semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009231689A (ja) | 2009-10-08 |
| US8450768B2 (en) | 2013-05-28 |
| US8101964B2 (en) | 2012-01-24 |
| JP5651288B2 (ja) | 2015-01-07 |
| TW200952219A (en) | 2009-12-16 |
| US20090242925A1 (en) | 2009-10-01 |
| US20120091499A1 (en) | 2012-04-19 |
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Legal Events
| Date | Code | Title | Description |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |