TWI389937B - A photosensitive polyimide resin soluble in an alkali aqueous solution, a composition containing the resin, and a film obtained from the composition - Google Patents
A photosensitive polyimide resin soluble in an alkali aqueous solution, a composition containing the resin, and a film obtained from the composition Download PDFInfo
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- TWI389937B TWI389937B TW096130960A TW96130960A TWI389937B TW I389937 B TWI389937 B TW I389937B TW 096130960 A TW096130960 A TW 096130960A TW 96130960 A TW96130960 A TW 96130960A TW I389937 B TWI389937 B TW I389937B
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- Taiwan
- Prior art keywords
- group
- resin
- formula
- resin composition
- photosensitive resin
- Prior art date
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- 239000011347 resin Substances 0.000 title claims description 95
- 229920005989 resin Polymers 0.000 title claims description 95
- 239000000203 mixture Substances 0.000 title description 20
- 239000007864 aqueous solution Substances 0.000 title description 9
- 229920001721 polyimide Polymers 0.000 title description 9
- 239000009719 polyimide resin Substances 0.000 title description 7
- 239000003513 alkali Substances 0.000 title description 6
- -1 acryl Chemical group 0.000 claims description 34
- 239000011342 resin composition Substances 0.000 claims description 31
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 125000000962 organic group Chemical group 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 15
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 239000003999 initiator Substances 0.000 claims description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 150000001298 alcohols Chemical class 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical class CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims 1
- 125000004018 acid anhydride group Chemical group 0.000 claims 1
- 150000002170 ethers Chemical class 0.000 claims 1
- 239000010408 film Substances 0.000 description 37
- 239000000243 solution Substances 0.000 description 31
- 230000015572 biosynthetic process Effects 0.000 description 23
- 238000003786 synthesis reaction Methods 0.000 description 23
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 20
- 239000007787 solid Substances 0.000 description 15
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 239000001294 propane Substances 0.000 description 10
- 238000011161 development Methods 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 7
- 235000013824 polyphenols Nutrition 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000012670 alkaline solution Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910000029 sodium carbonate Inorganic materials 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 230000001476 alcoholic effect Effects 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000008065 acid anhydrides Chemical group 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 150000007514 bases Chemical class 0.000 description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000013039 cover film Substances 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 2
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229960000956 coumarin Drugs 0.000 description 2
- 235000001671 coumarin Nutrition 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- XPKFLEVLLPKCIW-UHFFFAOYSA-N ethyl 4-(diethylamino)benzoate Chemical compound CCOC(=O)C1=CC=C(N(CC)CC)C=C1 XPKFLEVLLPKCIW-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- DDKMFQGAZVMXQV-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CCl DDKMFQGAZVMXQV-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 1
- XGRXUECZGSQQRL-UHFFFAOYSA-N 1-(1-hydroxypropan-2-yloxy)-3-methoxypropan-2-ol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COCC(O)COC(C)CO XGRXUECZGSQQRL-UHFFFAOYSA-N 0.000 description 1
- HNSSKFWZYMGHDO-UHFFFAOYSA-N 1-(2-isocyanatoethoxy)prop-1-ene Chemical compound C(=CC)OCCN=C=O HNSSKFWZYMGHDO-UHFFFAOYSA-N 0.000 description 1
- BHUXAQIVYLDUQV-UHFFFAOYSA-N 1-(diethylamino)propan-2-ol Chemical compound CCN(CC)CC(C)O BHUXAQIVYLDUQV-UHFFFAOYSA-N 0.000 description 1
- NCXUNZWLEYGQAH-UHFFFAOYSA-N 1-(dimethylamino)propan-2-ol Chemical compound CC(O)CN(C)C NCXUNZWLEYGQAH-UHFFFAOYSA-N 0.000 description 1
- JEIHSRORUWXJGF-UHFFFAOYSA-N 1-[(2-methylpropan-2-yl)oxy]propan-2-yl acetate Chemical compound CC(=O)OC(C)COC(C)(C)C JEIHSRORUWXJGF-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- OZHIYEINSCNALY-UHFFFAOYSA-N 1-aminobutan-1-ol Chemical compound CCCC(N)O OZHIYEINSCNALY-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- IVMHNKJWTRJTRU-UHFFFAOYSA-N 1-isocyanato-2-methoxyethane Chemical compound COCCN=C=O IVMHNKJWTRJTRU-UHFFFAOYSA-N 0.000 description 1
- IDCPFAYURAQKDZ-UHFFFAOYSA-N 1-nitroguanidine Chemical compound NC(=N)N[N+]([O-])=O IDCPFAYURAQKDZ-UHFFFAOYSA-N 0.000 description 1
- PIRWSGXNBGFLEA-UHFFFAOYSA-N 1-phenylbutane-1,2-dione Chemical compound CCC(=O)C(=O)C1=CC=CC=C1 PIRWSGXNBGFLEA-UHFFFAOYSA-N 0.000 description 1
- STFXXRRQKFUYEU-UHFFFAOYSA-N 16-methylheptadecyl prop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C=C STFXXRRQKFUYEU-UHFFFAOYSA-N 0.000 description 1
- YTPFRRRNIYVFFE-UHFFFAOYSA-N 2,2,3,3,5,5-hexamethyl-1,4-dioxane Chemical compound CC1(C)COC(C)(C)C(C)(C)O1 YTPFRRRNIYVFFE-UHFFFAOYSA-N 0.000 description 1
- IAKGBURUJDUUNN-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)-3-methylbutane-1,4-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(C)C(CO)(CO)CO IAKGBURUJDUUNN-UHFFFAOYSA-N 0.000 description 1
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- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
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- 125000005843 halogen group Chemical group 0.000 description 1
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- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/20—Manufacture of shaped structures of ion-exchange resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
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Description
本發明係關於一種感光性聚醯亞胺樹脂,詳而言之,係關於一種除感光性基外,尚具有羧基,對於鹼性水溶液顯示優異之溶解性的樹脂。又,本發明係亦關於一種含該樹脂之感光性樹脂、由該組成物所得到之皮膜等。該感光性樹脂係從其耐熱性、耐藥品性、絕緣性,適宜使用於覆蓋膜、半導體元件用保護絕緣膜、多層印刷基板用絕緣膜、焊錫保護膜等。
以往,感光性之聚醯亞胺系材料已提出利用聚醯亞胺之前驅體之聚醯胺酸的材料,例如聚醯胺酸之羧基藉酯鍵導入感光基者(專利文獻1及2);由聚醯胺酸與具有感光性之胺化合物所構成之材料(專利文獻3)等。但,此等之材料係形成被圖型化之皮膜後,必須以超過300℃之高溫進行聚醯亞胺化處理,必須為如承受此高溫之基底基材,又,或配線之銅被氧化之問題仍存在。
解決此問題之方法,以後硬化溫度之低溫化為目的,含有(甲基)丙烯基,已被聚醯亞胺化之感光性聚醯亞胺樹脂(專利文獻4~6)已有各種提案。此等之樹脂組成物係可藉有機溶劑進行顯像,但從環境上、安全上之觀點,宜為以鹼性水溶液進行顯像。但,此等之樹脂組成物係不可能以鹼性水溶液進行顯像,或即使可能,亦必須很強之鹼性水溶液。
可以鹼性水溶液進行顯像之樹脂,已知有具有酚性羥基之聚醯亞胺(專利文獻7)、以組合聚醯胺骨架與二偶氮萘醌之正型的提案(專利文獻8及9)。然而,此等之樹脂係有光透過性差、很難形成超過10微米之厚膜的圖型之問題存在。又,從確保顯像性之觀點,樹脂分子量為低分子量,感光劑之二偶氮萘醌的添加量相對於樹脂為大量,故樹脂濃度低,膜之強度等有問題。
(專利文獻1)特開昭49-115541號公報(專利文獻2)特開昭55-45746號公報(專利文獻3)特開昭54-145794號公報(專利文獻4)特開平10-274850號公報(專利文獻5)特開平10-265571號公報(專利文獻6)特開2001-335619號公報(專利文獻7)特開平3-209478號公報(專利文獻8)特公平1-46862號公報(專利文獻9)特開平11-65107號公報。
因此,本發明係提供一種可以比較低溫進行醯亞胺化,具有良好的鹼顯像性且具有接著性之感光性聚醯亞胺樹脂及含有該樹脂而成之感光性樹脂組成物。又,本發明之目的在於提供一種由該樹脂組成物所得到之皮膜的方法。
本發明人發現於分子中一併具有(甲基)丙烯基與羧基之聚醯亞胺樹脂,含有此聚醯亞胺樹脂而成之組成物具優異之鹼顯像性且可形成良好的圖型者。又,此感光性樹脂及圖案形成後,藉加熱所得到的硬化皮膜係耐熱性、電絕緣性優,終完成本發明。
亦即本發明係下述者。
本發明之聚醯亞胺樹脂,其特徵在於:由下述3種之重複單元所構成、重量平均分子量(聚苯乙烯換算)為5000~500000、丙烯基當量為400~3000、且羧酸當量為300~2500;
(式中,X為4價之有機基,Y為具有至少一種選自(甲基)丙烯基、羧基、及羥基之基的2價之有機基,Z為不具有(甲基)丙烯基、羧基、及羥基之任一者之2價的有機基,W為具有聚有機矽氧烷構造之2價的有機基,但,X、Y、Z、W分別為2種以上之構造,k、m、n係分別為滿足0.2≦k≦1.0,0≦m≦0.8,0≦n≦0.8之數目,但k+m+n=1)。
上述本發明之樹脂係可藉鹼顯像性高且碳酸鈉水溶液等之弱鹼性水溶液進行顯像。所圖型形成之皮膜係對基材之接著性、電特性等優,適宜使用於半導體元件的保護膜、配線保護膜、覆蓋膜、阻焊劑等。
以下,詳細說明有關本發明。本發明之聚醯亞胺樹脂係重量平均分子量(聚苯乙烯換算)為5000~500000,宜為10000~300000。分子量下足前述下限值時,聚醯亞胺樹脂之被膜強度不充分,超過在前述上限值時,有時對於溶劑之相溶性不足。
本發明之聚醯亞胺樹脂係下述3種之重複單元呈嵌段狀或隨機狀結合。
上式中,X為4價之有機基,可從四羧酸二酐進行衍生。Y為具有至少一種選自(甲基)丙烯基、羧基、及羥基之基的2價之有機基,Z為不具有(甲基)丙烯基、羧基、及羥基之任一者之2價的有機基,W為具有聚有機矽氧烷構造之2價的有機基,但,X、Y、Z、W分別為2種以上之構造,式(1)中k、m、n係分別為滿足0.2≦k≦1.0,0≦m≦0.8,0≦n≦0.8之數目,或k為0.4~1.0,m為0~0.4,n為0~0.4,但k+m+n=1。
本發明之聚醯亞胺樹脂係丙烯當量為400~3000,更宜為400~2000,最宜為400~1800,羧酸當量為300~2500,更宜為300~1500,最宜為300~1000。在本說明書中,丙烯基當量為(甲基)丙烯基每一莫耳的重量,從原料以計算所求出之理論值。又,羧酸等量係羧基每一莫耳的重量,於樹脂中加入特定量之鹼液而中和,以酸滴定過剩之鹼液來求取。丙烯基當量超過前述上限值時,無法得到充分之感光性,而不足前述下限值時,有時硬化後之薄膜強度會不足。又,羧酸當量超過前述上限值時,無法達成充分的顯像性,反之,不足前述下限值時,恐於硬化後之薄膜強度等的特性招致惡化。
式(1)中之各種的基宜選自下述所示之基。
X係選自下述之基的四羧酸二酐殘留基的至少一種。
Y係以式(3)所示之至少一種的有機基。
式(3)中,A係選自下述之基的2價有機基。
又,B、C係分別獨立地為碳數1~4之烷基、烷氧基或氫原子,a及b為0或1,c為0~10之整數。
R1
係互相獨立地選自下述之基的基。
但,R3
係亦可含有碳數3~34之氧原子及/或氮原子,具有至少一種選自(甲基)丙烯基、羧基、及羥基的一價之基的基。
較佳係R3
以下述式所示。
-R4
(ORa
)2
在上式中,R4
為碳數3~6之3價的烴基,Ra
係互相獨立地選自氫原子、碳數6~14之(甲基)丙烯醯氧基異氰酸酯殘留基及碳數4~14之酸酐殘留基之基。
較佳之(甲基)丙烯醯氧基異氰酸酯殘留基及酸酐殘留基係下述之基。
較佳係R4
為下述之任一者之基。
上述各式中,各鍵結係結合於氧原子上。
Z為以下述式(4)所示之2價的有機基。
上述式(4)中,D為互相獨立地選自下述之基的2價之有機基,
d、e及f為0或1。
W為具有以下述式(5)所示之聚有機矽氧烷構造之基。
上述式(5)中,R2
係互相獨立地為碳數1~8的一價烴基,可舉例如甲基、乙基、丙基、丁基、戊基、己基等之烷基、環戊基、環己基等之環烷基、苯基等之芳基、苯甲基、苯乙基等之芳烷基、乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基等之烯烴基、丙烯基或甲基丙烯基等。從原料取得容易性,宜為甲基、乙基、苯基、乙烯基。又,g為1~80的整數,但宜為3~70,更宜為5~50。
含有上述本發明之樹脂的Y之重複單元係如下般做法而得到。亦即,使R1
為酚性羥基或羧基之二胺、與用以衍生上述X之四羧酸二酐依常用的方法而在適當的有機溶劑中縮合反應,一旦,得到聚醯胺酸後,將此樹脂溶液加熱至100℃以上,從溶液除去所生成之水,俾合成於分子中具有酚性羥基、或羧基之聚醯亞胺樹脂溶液。在該聚醯亞胺樹脂溶液中具有與酚性羥基或羧基反應性之基例如縮水甘油基之化合物、較佳係添加環氧丙醇特定量,而加熱此混合溶液至150℃左右,俾合成具有醇性羥基之聚醯亞胺樹脂。其後,於上述溶液中,與羥基反應性之基例如添加縮水甘油基、異氰酸酯基,鹵素基,較佳係異氰酸酯基,與具有(甲基)丙烯基之化合物、例如2-甲基丙烯醯氧基異氰酸酯、2-丙烯醯氧基異氰酸酯必需量,在60℃下進行加熱,可得到具有(甲基)丙烯基、或丙烯基之聚醯亞胺樹脂。具有上述(甲基)丙烯基之化合物,或,尚且,添加酸酐例如六氫酞酸酐必需量,以50~70℃反應,俾製作含具有羧基之Y的聚醯亞胺樹脂。
含有Z及W之重複單元係可各別之末端結合胺基之二胺、與用以使X衍生之羧酸二酐反應而得到。
本發明係關於一種含有上述本發明之聚醯亞胺樹脂(以下為「(A)聚醯亞胺樹脂」)之感光性樹脂組成物。該組成物係除了(A)聚醯亞胺樹脂外,尚至少含有(B)光聚合起始劑及/或增感劑者。
本發明所使用之(B)光聚合起始劑及/或增感劑者係產生起始聚合之自由基,或形成提高聚合性之作用者。該(B)成份係可使用公知者。可舉例如苯偶因異丙基醚、2-甲基-[4-(甲基硫)苯基]-2-嗎啉基-1-丙酮、1-苯基-1,2-丁二酮-2-(鄰甲氧基羰基)肟、N-苯基甘氨酸、3-苯基-5-甲基異噁唑酮。又,前述增感劑可舉例如4-二乙基胺基安息香酸乙酯、二苯甲酮、乙醯苯、蒽酮、菲、硝基芴、硝基苊(acenaphene)、P,P’-四甲基二胺基二苯甲酮、P,P’-四乙基二胺基二苯甲酮、氯硫雜蒽酮、苯並蒽酮、2,6-雙-(4-二乙基胺基苄基)-環己酮、2,6-雙-(4-二乙基胺基苄基)-4-甲基-環己酮、4,4’-雙(二乙基胺基)-苯丙烯醯苯(chalcone)、2,4-二乙基硫雜蒽酮、N-苯基-二乙醇胺、二乙基胺基乙基丙烯酸甲酯、香豆素化合物苯甲基[例如羰基雙(二乙基胺基香豆素)]、苯偶因異丙基醚、1-羥-環己基-苯基酮、樟腦醌、雙咪唑類[例如2,2’-雙(鄰-氣苯基)-4’,5’-四苯基-1’-雙咪唑]。此等之光聚合起始劑及增感劑分別可一種單獨亦可組合2種以上而使用。
(B)成份之調配量係相對於(A)成份與(B)成份之合計量100質量份,一般為0.1~20質量份,宜為0.5~15質量份,更宜為0.5~10質量份。(B)成份若少於0.1質量份,硬化無法充分進行,反之,若多於20質量份,相同地光聚合性會降低,或有保存安定性明顯惡化之傾向。
本發明之感光性樹脂組成物係依需要亦可調配(C)有機溶劑。有機溶劑宜為上述(A)聚醯亞胺樹脂、(B)光聚合起始劑可溶解之溶劑。如此之有機溶劑可舉例如環己酮、環戊酮、甲基-2-正戊酮等之酮類;3-甲氧基丁醇、3-甲基-3-甲氧基丁醇、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇等之醇類;丙二醇單甲基醚、乙二醇單甲基醚、丙二醇單乙基醚、乙二醇單乙基醚、丙二醇二甲基醚、二乙二醇二甲基醚等之醚類;丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、乳酸乙酯、丙酮酸乙酯、醋酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、醋酸第三丁酯、丙酸第三丁酯、丙二醇-單-第三丁基醚乙酸酯、γ-丁內酯等之酯類、N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺等之醯胺類等,可使此等之一種單獨或併用2種以上而使用。
此等之中尤宜樹脂之溶解性最優之乳酸乙酯、環己酮、環戊酮、γ-丁內酯、N,N-二甲基乙醯胺、丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、及其混合溶劑。
上述有機溶劑之使用量相對於全固形分100質量份有50~2000質量份,尤宜為100~1000質量份。若不足50質量份,有時上述各成份(A)、(B)之相溶性變成不充分。反之,即使超過2000質量份,相溶性亦不太變化外,黏度過低,恐不適於樹脂之塗佈。
又,本發明之感光性組成物中係為更提昇感光感度,亦可調配交聯性單體或寡聚物。該單體或寡聚物宜使光聚合容易,若為公知者,無特別限定。若例示可舉例如1,6-己二醇二丙烯酸酯、異戊二醇二丙烯酸酯、乙二醇二丙烯酸酯、季戊四醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、二季戊四醇六丙烯酸酯、四羥甲基丙烷四丙烯酸酯、四乙二醇二丙烯酸酯,1,6-己二醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、乙二醇二甲基丙烯酸酯、季戊四醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、季戊四醇三甲基丙烯酸酯、二季戊四醇六甲基丙烯酸酯、四羥甲基丙烷四甲基丙烯酸酯、四乙二醇二甲基丙烯酸酯、甲氧基二乙二醇甲基丙烯酸酯、甲氧基聚乙二醇甲基丙烯酸酯、β-甲基丙烯醯氧乙基氫酞酸酯、β-甲基丙烯醯氧乙基氫琥珀酸酯、3-氯-2-羥丙基甲基丙烯酸酯、硬脂基甲基丙烯酸酯、苯氧基乙基丙烯酸酯、苯氧基二乙二醇丙烯酸酯、苯氧基聚乙二醇丙烯酸酯、β-丙烯醯氧乙基氫琥珀酸酯、月桂基丙烯酸酯、乙二醇二甲基丙烯酸基、二乙二醇二甲基丙烯酸酯、三乙二醇二甲基丙烯酸酯、聚乙二醇二甲基丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、聚丙二醇二甲基丙烯酸酯、2-羥基-1,3-二甲基丙烯氧丙烷、2,2-雙[4-(甲基丙烯氧乙氧基)苯基]丙烷、2,2-雙[4-(甲基丙烯氧/二乙氧基)苯基]丙烷、2,2-雙[4-(甲基丙烯氧/聚乙氧基)苯基]丙烷、聚乙二醇二丙烯酸酯、三丙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、2,2-雙[4-(丙烯氧/二乙氧基)苯基]丙烷、2,2-雙[4-(丙烯氧/聚乙氧基)苯基]丙烷、2-羥-1-丙烯氧-3-甲基丙烯氧丙烷、三羥甲基丙烷三甲基丙烯酸酯、四羥甲基甲烷三丙烯酸酯、四羥甲基甲烷四丙烯酸酯、甲氧基二丙二醇甲基丙烯酸酯、甲氧基三乙二醇丙烯酸酯、壬基苯氧基聚乙二醇丙烯酸酯、壬基苯氧基聚丙二醇丙烯酸酯、1-丙烯醯氧丙基-2-酞酸酯、異硬脂基丙烯酸酯、聚氧乙烯烷基醚丙烯酸酯、壬基苯氧基乙二醇丙烯酸酯、聚丙二醇二甲基丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、3-甲基-1,5-戊二醇二甲基丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、1,9-壬二醇甲基丙烯酸酯、2,4-二乙基-1,5-戊二醇二甲基丙烯酸酯、1,4-環己烷二甲醇二甲基丙烯酸酯、二聚丙二醇二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、2,2-添加氫雙[4-(丙烯氧/聚乙氧基)苯基]丙烷、2,2-雙[4-(丙烯氧/聚丙氧基)苯基]丙烷、2,4-二乙基-1,5-戊二醇二丙烯酸酯、乙氧基化三羥甲基丙烷三丙烯酸酯、丙氧基化三羥甲基丙烷三丙烯酸酯、三聚異氰酸三(乙烷丙烯酸酯)、季戊四醇四丙烯酸酯、乙氧基化季戊四醇四丙烯酸酯、丙氧基化季戊四醇四丙烯酸酯、雙三羥甲基丙烷四丙烯酸酯、二季戊四醇聚丙烯酸酯等,但為提昇交聯密度,尤宜使用2官能以上者。
該單體或寡聚物係相對於本發明之聚醯亞胺樹脂100質量份,宜為調配0.5~100質量份,更宜為1~50質量份的範圍。在0.5質量份以下,幾乎不能得到目的之效果。又,反之,若為100質量份以上,損及原來聚醯亞胺樹脂具有之特性本身外尚恐對顯像性不佳之影響。又,該單體或寡聚物係可使用1種類之化合物,亦可混合數種而使用。
其他,於本發明之感光性樹脂組成物中係上述各成份以外,進一步亦可調配添加成份。如此之添加成份係可添加例如用以提昇塗佈性所慣用之界面活性劑。界面活性劑宜為非離子性者,可舉例如氟系界面活性劑、具體上係全氟烷基聚氧乙烯乙醇、氟化烷基酯、全氟烷基胺氧化物、含氟有機矽氧烷系化合物等。此等係可使用市售者。可舉例如Fluraid「FC-4430」(任一者均為住友3M(股)製)、Sarflon「S-141」及「S-145」(任一者均為旭硝子(股)製)、Unidain「DS-401」、「DS-4031」及「DS-451」(任一者均為Daikin工業(股)製)、Megafax「F-8151」(大日本油墨工業(股)製)、「X-70-093」(任一者均為信越化學工業(股)製)等。此等之中尤宜為「X-70-093」(信越化學工業(股)製)及Fluraid「FC-4430」(住友3M(股)製)。
又,亦可添加矽烷偶合劑例如環氧系矽烷偶合劑KBM-403(信越化學製)、丙烯基系矽烷偶合劑KBM-503(信越化學製)、或胺系矽烷偶合劑KBM-903等作為密著性之提昇劑。尚且,使用本發明之感光性樹脂組成物作為光阻材料等時,一般可使用於光阻材料等,可添加其他之任意的添加成份。又上述添加成份之添加量係於不妨礙本發明之效果的範圍進行調整。
本發明之感光性樹脂組成物的調整係以一般之方法進行,但可攪拌混合上述各成份及依需要之上述有機溶劑、添加劑等,其後依需要,使固形分藉過濾器等進行過濾,可調製本發明之感光性樹脂組成物。
如此做法所調製之本發明的感光性樹脂組成物係可適宜使用來作為例如半導體元件的保護膜、配線之保護膜、覆蓋膜、阻焊劑、進一步係微細加工用光阻等之材料。
使用上述感光性樹脂組成物而形成圖型之圖型形成方法,含有下述之步驟者。
(i)對基板上施予上述本發明之感光性樹脂組成物之層的步驟;(ii)使用可形成特定之圖型的光罩,而以波長240~500nm之光使感光性樹脂組成物的層進行曝光之步驟;(iii)以顯像液使感光性樹脂組成物的層進行顯像之步驟。
依所希望,亦可含有於步驟(ii)與(iii)之間加熱感光性樹脂組成物之層的步驟(所謂PEB步驟)。
藉以上之3步驟形成圖型後,進一步(iv)形成圖型後,為後硬化進行加熱之步驟,形成最終目的之圖型。
本發明之圖型形成方法中首先使上述感光性樹脂組成物例如藉塗佈施予至基板上。上述基板可舉例如矽晶圓、塑膠或陶瓷製電路基板等。又,使此溶液另外進行薄膜化,再貼合於基板之方法。塗佈法係可使用公知之技術例如浸漬法、旋塗法、輥塗法等之方法。塗佈量可依目的而適宜選擇,但宜形成膜厚0.1~100μm。又,亦可預先形成此組成物之薄膜,再使其薄膜貼合於基材。此處,為有效率地進行光硬化反應,依需要,亦可藉預備加熱,使溶劑等預先揮發。預備加熱例如可以40~140℃進行1分~1小時左右。
然後,使用可形成特定圖型之光罩,而以波長240~500nm之光進行曝光,硬化。上述光罩係例如宜為貫穿所希望之圖型的鋼板切割機。又,光罩之材質宜為遮蔽上述波長240~500nm之光,例如可適宜使用鉻等,不限定於此。上述波長240~500nm之光可舉例如藉輻射線產生裝置所產生之各種波長之光,例如g線、i線等之紫外線光、遠紫外線光(248nm)等。曝光量宜為例如10~3000mJ/cm2
。
依所希望,亦可曝光後進行加熱處理。上述曝光後加熱處理係例如可以40~150℃進行0.5~10分鐘。上述曝光後或曝光之後進行加熱之後,以顯像液進行顯像。顯像液係以目前常使用之氫氧化四甲基銨水溶液或碳酸鈉水溶液為首,可使用於水中溶解各種鹼性化合物之鹼性性水溶液。上述鹼性化合物可舉例如鹼金屬、鹼土族金屬或銨離子之氫氧化物或碳酸鹽、或胺化合物等,具體上,可使用2-二甲基胺基乙醇、3-二甲基胺基-1-丙醇、4-二甲基胺基-1-丁醇、5-二甲基胺基-1-戊醇、6-二甲基胺基-1-己醇、2-二甲基胺基-2-甲基-1-丙醇、3-二甲基胺基-2,2-二甲基-1-丙醇、2-二乙基胺基乙醇、3-二乙基胺基-1-丙醇、2-二異丙基胺基乙醇、2-二正丁基胺基乙醇、N,N-二苯甲基-2-胺基乙醇、2-(2-二甲基胺基乙氧基)乙醇、2-(2-二乙基胺基乙氧基)乙醇、1-二甲基胺基-2-丙醇、1-二乙基胺基-2-丙醇、N-甲基二乙醇胺、N-乙基二乙醇胺、N-正丁基二乙醇胺、N-第三丁基二乙醇胺、N-月桂基二乙醇胺、3-二乙基胺基-1,2-丙二醇、三乙醇胺、三異丙醇胺、N-甲基乙醇胺、N-乙基乙醇胺、N-正丁基乙醇胺、N-第三丁基乙醇胺、二乙醇胺、二異丙醇胺、2-胺基乙醇、3-胺基-1-丙醇、4-胺基-1-丁醇、6-胺基-1-己醇、1-胺基-2-丙醇、2-胺基-2,2-二甲基-1-丙醇、1-胺基丁醇、2-胺基-1-丁醇、N-(2-胺基乙基)乙醇胺、2-胺基-2-甲基-1,3-丙二醇、2-胺基-2-乙基-1,3-丙二醇、3-胺基-1,2-丙二醇、2-胺基-2-羥甲基-1,3-丙二醇、氫氧化鈉、氫氧化鉀、氫氧化銨、碳酸鈉、碳酸鉀、碳酸銨、碳酸氫鈉、碳酸氫鉀、碳酸氫銨、氫氧化四甲基銨、氫氧化四乙基銨、氫氧化四丙基銨、氫氧化四異丙基銨、胺基甲醇、2-胺基乙醇、3-胺基丙醇、2-胺基丙醇、甲基胺、乙基胺、丙基胺、異丙基胺、二甲基胺、二乙基胺、二丙基胺、二異丙基胺、三甲基胺、三乙基胺、三丙基胺、三異丙基胺等。
鹼性化合物之濃度一般為0.1~30重量%,但對支撐基板等之影響等,宜為0.1~15重量%。
又,依所希望,於水溶液以外,可使用甲醇溶液或乙醇溶液等之鹼性醇溶液,或使用有機溶劑。使用有機溶劑時,可單獨使用一種之有機溶劑,亦可使用充分溶解感光性組成物之良溶劑與不太溶解之弱溶劑之混合系。
顯像係可藉一般之方法例如浸漬圖型形成物等進行。其後,依需要,進行洗淨、清淨、乾燥等,可得到具有所希望之圖型的組成物皮膜。
欲形成僅皮膜時係不使用上述光罩而使全面曝光以外係只要進行與於上述圖型形成方法所述同樣之方法即可。
又,進一步使用烘箱或加熱板而以120~300℃、加熱所得到之圖型約10分~10小時,俾提昇交聯密度,又,除去所殘存之揮發成份,可提昇對於基材之密著力,可形成耐熱性或強度、進而電氣特性亦良好之皮膜。
如此做法而從上述感光性樹脂組成物所得到之硬化皮膜,可適宜使用來作為與基材之密著性、耐熱性、電絕緣性優,且電氣、電子零件、半導體元件等之保護膜。
以下顯示合成例、實施例及比較例而具體地說明本發明,但本發明係不限定於下述例。
於具備攪拌機、溫度計、氮取代裝置及酯接收器之燒瓶內,饋入2,2’-雙(3-胺基-4-羥苯基)丙烷57.9g、作為溶劑之N,N-二甲基乙醯胺500.0g。攪拌此溶液後,饋入4,4’-氧二酞酸酐69.5g,繼續攪拌10小時。其後,於反應溶液中加入100.0g之甲苯、加熱混合溶液150℃,放置6小時。其中,通過酯接受器而回收8.0g之水。加熱終了後,冷卻至室溫,得到含有以式(I-1):
所示之重複單元所構成的聚醯亞胺樹脂660.0g(樹脂固形分17.5%)之溶液。於此樹脂之IR光譜分析中,未觀測到源自聚醯胺酸之吸收,而於1780cm-1
及1720 cm-1
觀測到依據醯亞胺基之吸收,又,於3400 cm-1
附近觀測到源自酚性羥基之吸收。
使上述樹脂溶液200.0g(樹脂固形分17.5%)與環氧丙醇7.5g饋入燒瓶中,以150℃加熱5小時而反應。反應終了後,冷卻至室溫,將反應溶液投入於2升之純水中,將所析出之樹脂以35℃減壓乾燥,回收34g之樹脂。若以NMR觀察此樹脂,對應於(I-1)之酚性羥基之10.1ppm的譜峰減少至原料樹脂之30%,於4.6ppm與4.8ppm之2處觀測到對應於1級與2級之醇性羥基的譜峰,可得到以下述之式(I-2):
所示,M為源自環氧丙醇之基者,與H原子者之此為0.70對0.30之樹脂。從NMR等之解析,此樹脂之1級醇性羥基的羥當量為450。又,以四氫呋喃作為溶劑之凝膠滲透色層分析之結果,此樹脂之聚苯乙烯換算的重量平均分子量為38000。
於燒瓶中饋入如此做法所得到之上述(I-2)的樹脂30g與N,N-二甲基乙醯胺270g,使液溫昇溫至60℃後,在60℃下,滴下甲基丙烯醯氧乙基異氰酸酯(CalendsMOI、昭和電工(股)製)6.1g,攪拌1小時。其後,繼而以60℃下添加六氫酞酸酐14.2g(最終生成物之羧基當量;540),進一步,藉由攪拌4小時,得到以下述式(I-3):
所示之聚醯亞胺樹脂310g(樹脂固形分16.1%)的溶液。又,此樹脂之平均重量分子量為63000,丙烯基當量為1300。
除了於合成例I中,使於(I-2)的樹脂30g反應之甲基丙烯醯氧乙基異氰酸酯的量8.1g,六氫酞酸酐之量為12.2g以外,其餘係與合成例I完全同樣做法,而得到以下述式(II-3):
所示之聚醯亞胺樹脂之溶液310g(樹脂固形分16.1%)的溶液。又,此樹脂之平均重量分子量為62000,丙烯基當量為950,羧基當量為630。
依合成例I記載之方法,而得到下述式(III-1)~(III-3)。亦即,使作為四羧酸二酐之4,4’-氧二酞酸酐為31.0g,使作為二胺成份之2,2’-雙(3-胺基-4-羥苯基)丙烷20.5g、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷4.1g、以式(5)具有g=9之構造式的二胺基聚二甲基矽氧烷2.5g,作為溶劑之N,N-二甲基乙醯胺240.0g、甲苯50.0g,依與合成例I同樣之方法,而得到以下述式(III-1):
所示之含酚基的聚醯亞胺樹脂溶液300g(樹脂固形分18.2%)。
其次,此樹脂溶液300g(樹脂固形分18.2%)中添加環氧丙醇11.2g,而以140℃加熱5小時後,於水中析出樹脂,俾以下述(III-2):
所示之酚羥基幾乎全部環氧丙醇之環氧基反應之樹脂54g。所得到之樹脂的一級醇性羥基當量為500,平均重量分子量為52000。
進一步於燒瓶中饋入如此做法所得到之上述(III-2)的樹脂30g與N,N-二甲基乙醯胺270g,在60℃下,滴下甲基丙烯醯氧乙基異氰酸酯5.8g,攪拌1小時。其後,繼而以60℃下添加六氫酞酸酐11.8g,進一步,藉由攪拌4小時,得到以下述式(III-3):
所示之聚醯亞胺樹脂300g(樹脂固形分15.7%)。又,此樹脂之平均重量分子量為81000,丙烯基當量為1300,羧基當量為600。
於合成例III中,就與(III-2)之樹脂30g反應之(甲基)丙烯基化合物,使用2-丙烯醯氧乙基異氰酸酯(Calends AOI、昭和電工(股)製)5.4g,使用琥珀酸酐8.8g(最終生成物之羧基單量:500)取代六氫酞酸酐作為酸酐以外,其餘係與合成例III相同做法,得到以下述式(IV-3):
所示之聚醯亞胺樹脂之溶液300g(樹脂固形分14.5%)。又,此樹脂之平均重量分子量為72000,丙烯基當量為1200。
於合成例I中,就與(I-2)之樹脂30g反應之甲基丙烯醯氧乙基異氰酸酯之量10.2g,六氫酞酸酐之量2.1g以外,其餘係與合成例I相同做法,得到以下述式(V-3):
所示之聚醯亞胺樹脂之溶液300g(樹脂固形分13.9%)。又,此樹脂之平均重量分子量為53000,丙烯基當量為640,羧基當量為3100。
於合成例I中,就與(I-2)之樹脂30g反應之甲基丙烯醯氧乙基異氰酸酯之量2.1g,六氫酞酸酐之量10.1g以外,其餘係與合成例I相同做法,得到以下述式(VI-3):
所示之聚醯亞胺樹脂之溶液300g(樹脂固形分13.9%)。又,此樹脂之平均重量分子量為52000,丙烯基當量為3100,羧基當量為640。
於合成例I之記載中,使(I-1)之樹脂200.0g(樹脂固形分17.5%)與環氧丙醇3.3g反應後,於純水中析出樹脂,減壓乾燥,俾得到以下述(VII-2):
所示之樹脂26g。所得到之樹脂的一級醇性羥基當量為1000,重量平均分子量為35000。
進一步於燒瓶中饋入如此做法所得到之樹脂(VII-2)20g與N,N-二甲基乙醯胺180g,在60℃下,滴下甲基丙烯醯氧乙基異氰酸酯6.6g,攪拌1小時,得到以下述式(VII-3):
所示之聚醯亞胺樹脂之溶液190g(樹脂固形分13.9%)。又,此樹脂之平均重量分子量為40000,丙烯基當量為1300。
從上述合成例I至VII所合成之聚醯亞胺樹脂((A)成份)的溶液,樹脂固形分成為40%之方式進行濃縮的物中,以表1所記載之組成調配(B)成份及其他添加物等,進行攪拌混合而溶解。然後,以0.1微米玻璃過濾器進行精密過濾,得到實施例1至8之本發明的感光性樹脂組成物,以及參考例1~3及比較例1之感光性樹脂組成物。
然後,以六甲基二矽氮烷底漆處理之6英吋矽晶圓2片、於6英吋矽晶圓全面以膜厚2微米電解鍍銅之銅基板1片,使用旋塗器而以表中記載之膜厚塗佈各組合物,為除去溶劑,以加熱板進行在115℃/2分鐘之加熱乾燥。有關矽晶圓基板之1片,使用具有寬10微米至50微米之線/間距的石英製光罩,以表1中記載的曝光量照射。又於曝光係使用Nikon製步進器型曝光裝置NSR-1755i7A(光源:365nm)。照射後,進行115℃/2分鐘之加熱,繼而,冷卻至室溫。然後,對於上述塗佈基板,使用噴塗顯像機,進行以1%碳酸鈉水溶液之顯像表1記載之時間。於表1中,一併記載此時之解析的線寬與顯像後之膜厚。顯像後之膜厚藉90℃/30秒之加熱除去水分後進行測定。在表1中,解析度係藉顯微鏡觀擦,顯示線/間隙明確顯像者之最小線寬。
有關其他之矽晶圓與銅基板上之各組成物膜係不使用石英製光罩,而對基板全面光照射,加熱之後,以1%碳酸鈉水溶液進行顯像步驟10分鐘。此操作之後,以220℃之烘箱加熱所殘留之皮膜1小時,而得到硬化皮膜。利用此硬化皮膜,測定有關接著性特性與絕緣特性。結果表示於表2中。接著性評估係使用電壓力鍋,在飽和2氣壓(121℃/100%RH)中放置各試驗體24小時,其後,以棋盤眼剝離試驗測定剝離數來實施。又,絕緣玻璃強度係依JIS C2103而測定。
又,上述表1中之各添加劑,如下述般。
a):2,2’-雙(鄰氯苯基)-4’,5’-四苯基-1’-雙咪唑b):4-二乙基胺基安息香酸乙酯c):N-苯基甘氨酸d):2,4-二乙基硫雜蔥酮e):X-70-093(氟聚矽氧系界面活性劑(信越化學工業(股)製))f):R-604(多官能丙烯基酯、日本化藥(股)製)g):KBE-403(環氧改性烷氧基矽烷接著助劑(信越化學工業(股)製))
比較例之組成物係不具有羧基,而無法顯像。又,參考例1之組成物因羧基之量少,故溶解性不足。參考例2及3之組成物係羧基太多,結果丙烯基之量變少,故圖型被溶解。然而,具有特定之丙烯基當量與羧酸當量之實施例1~8的組成物,係即使藉由碳酸鈉水溶液之弱鹼性水溶液,亦顯示良好之顯像性,可確認出作為感光性材料而具有充分之特性,又,源自其等之組成物的硬化膜係具有對各種基材良好的接著性、絕緣耐壓。
本發明之聚醯亞胺樹脂係感光性及弱鹼性溶液之溶解性優,適宜作為感光性材料。又,硬化膜係可用來作為電路或電子零件之保護膜。
Claims (13)
- 一種聚醯亞胺樹脂,其特徵在於:由下述3種之重複單元所構成、重量平均分子量(聚苯乙烯換算)為5000~500000、丙烯基當量為400~3000、且羧酸當量為300~2500;
- 如申請專利範圍第1項之聚醯亞胺樹脂,其中丙烯基當量為400~2000、且羧酸當量為300~1500。
- 如申請專利範圍第1或2項之聚醯亞胺樹脂,其中Y為以式(3)所示之2價有機基;
- 如申請專利範圍第3項之聚醯亞胺樹脂,其中R3 為以下述式所示,-R4 (ORa )2 (R4 係碳數3~6之3價的烴基,Ra 係互相獨立地選自氫原子、碳數6~14之(甲基)丙烯醯氧基異氰酸酯殘留基及碳數4~14之酸酐殘留基之基)。
- 如申請專利範圍第4項之聚醯亞胺樹脂,其中通式(3)中之Ra 為至少一種選自下述之基的基
- 如申請專利範圍第4或5項之聚醯亞胺樹脂,其中R4 為下述之任一者的基
- 如申請專利範圍第1~6項中任一項之聚醯亞胺樹脂,其中在式(1)中之X為至少一種選自下述之基的基
- 一種感光性樹脂組成物,係含有(A)如申請專利範圍第1~7項中任一項之聚醯亞胺樹脂、及相對於(A)成份與(B)成份之合計量100質量份為0.1~20質量份之(B)光聚合起始劑及/或增感劑。
- 如申請專利範圍第8項之感光性樹脂組成物,其中進一步相對於(A)成份與(B)成份之合計量100質量份含有(C)選自酯、醚、醇、酮、醯胺之至少一種的有機溶劑50~2000質量份。
- 一種圖型形成方法,係含有如下步驟,(i)對基板上施予如申請專利範圍第8或9項之感光性樹脂組成物之層的步驟;(ii)使用可形成特定之圖型的光罩,而以波長240~500nm之光使感光性樹脂組成物的層進行曝光之步驟;(iii)以顯像液使感光性樹脂組成物的層進行顯像之步驟。
- 如申請專利範圍第10項之方法,其中進一步含有於步驟(ii)與(iii)之間加熱感光性樹脂組成物之層的步驟。
- 如申請專利範圍第10或11項之方法,其中於步驟(iii)之後,進一步含有(iv)進行加熱之步驟。
- 一種保護用皮膜之形成方法,係含有如下步驟;(i)對被保護表面施予如申請專利範圍第8或9項之感光性樹脂組成物之層的步驟;(ii)以波長240~500nm之光使感光性樹脂組成物的層進行曝光之步驟;(iii)使感光性樹脂組成物的層以120℃至300℃之範圍的溫度進行後硬化之步驟。
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JP2008050401A (ja) | 2008-03-06 |
TW200821340A (en) | 2008-05-16 |
KR20080018122A (ko) | 2008-02-27 |
KR101367466B1 (ko) | 2014-02-25 |
US7638259B2 (en) | 2009-12-29 |
US20080057446A1 (en) | 2008-03-06 |
JP4386454B2 (ja) | 2009-12-16 |
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