TWI387748B - Optical measuring device - Google Patents

Description

Optical measuring device

The present invention relates to an optical measuring device and a substrate holding device. More specifically, the present invention relates to an optical measuring device that performs measurement using transmitted light that penetrates a sample, and a substrate holding device that adsorbs and holds the substrate.

In the manufacturing process of a liquid crystal display device or the like, illumination light is irradiated on a transparent substrate for inspection. This inspection step includes the case of using the transmitted light penetrating the sample and the case of using the reflected light reflected by the sample. The transparent substrate is, for example, a color filter substrate, a liquid crystal panel, a TFT array substrate, or the like. In recent years, the substrate size of these substrates has been increasing.

A penetration type inspection device that uses transmitted light mounts a substrate to be inspected on a stage. Thereby, it can be maintained in a stable state. The light from the light source is irradiated from the front side or the back side of the substrate in a state where the substrate is placed on the stage. Next, a detector that passes through the substrate and the stage is detected by a detector of a CCD or a photodiode. Therefore, the stage used for the penetration type defect inspection apparatus is a transparent stage which can penetrate the light from a light source (patent document 1).

For example, a detector is disposed on an upper portion of the substrate, and the illumination source is disposed at a lower portion of the transparent stage. Thereby, a penetrating image of the substrate can be taken. A glass plate or the like can be usually used for such a transparent stage. In order to correctly detect fine defects on the substrate, it is preferable that the substrate does not vibrate. That is, once the substrate is vibrated, stable measurement cannot be performed. As the size of the substrate increases, the transparent stage on which the substrate is placed is also increased in size. Therefore, the vibration suppression strategy becomes heavier Want. However, the thickness of the transparent glass stage is limited, and it is difficult to form it to a certain thickness or more.

Further, a stage device having a damper is disclosed (Patent Document 2). The damper rod is located on the lower side of the stage. Further, an inspection apparatus in which a unit for adsorbing a substrate is provided under a substrate is disclosed (Patent Document 3). This inspection apparatus is provided with a unit below the glass substrate. The unit is provided with a suction port and a discharge port. The vibration can be reduced by adsorbing the substrate with the adsorption port. When the substrate is moved, air is ejected from the discharge port of the unit. Further, a light receiving portion is disposed between the two units.

[Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-148625 (paragraph 0011)

[Patent Document 2] Japanese Patent Laid-Open Publication No. 2006-337542

[Patent Document 3] Japanese Patent Laid-Open Publication No. 2003-279495

However, in the stage device of Patent Document 2, it is necessary to raise and lower the damper rod in response to the movement of the measuring head. Therefore, it is necessary to control the drive mechanism for lifting the damper rod. Further, in the inspection apparatus of Patent Document 3, the substrate is moved in order to perform inspection of the entire substrate. When the substrate is moved, the inspection device is enlarged. As mentioned above, the devices can become complicated for penetrating illumination. Therefore, there is a problem that a device that penetrates illumination cannot be easily and stably measured.

The present invention has been made in order to solve such a problem, and an object of the invention is to provide an optical measuring apparatus and a substrate holding apparatus which can easily perform stable measurement.

An optical measuring apparatus according to a first aspect of the present invention is an optical measuring apparatus that performs measurement using transmitted light that has passed through a sample, and is characterized in that the mounting table is provided with an end portion on which the sample is placed, and the adsorption stage is attached thereto. The lower side of the sample is provided to be movable in the first direction, and has a suction port for adsorbing the sample; the illumination source is provided on the adsorption stage, and the illumination light is emitted from the lower side to the sample; The upper side of the sample receives the transmitted light that has penetrated the sample from the illumination source; the plurality of support members are disposed on the lower side of the sample, and support the sample at the inner side of the mounting table; and the abutting portion, The adsorption stage is provided on the adsorption stage, and a part of the support member is separated from the sample by abutment with the support member. Thereby, even if a device that penetrates illumination is used, stable measurement can be easily performed.

An optical measuring apparatus according to a second aspect of the present invention is the optical measuring apparatus described above, further comprising: a shaft that connects two or more of the plurality of supporting members, wherein the abutting portion is brought into contact with the support The member rotates the support member with the shaft as a rotation axis, and the upper end of the part of the support member is separated from the sample. Thereby, even when the number of support members is increased, a simple configuration can be formed.

An optical measuring apparatus according to a third aspect of the present invention is the optical measuring apparatus described above, wherein the illumination light source illuminates the sample in a line shape in a second direction different from the first direction. Thereby, the adsorption stage can be moved only in the first direction, so that the entire sample can be easily measured.

An optical measuring apparatus according to a fourth aspect of the present invention is the optical measuring described above In the apparatus, in the first direction, the adsorption ports provided in the adsorption stage are disposed on both sides of the illumination light source. Thereby, the vibration of the illuminated area can be reduced, so that stable measurement can be achieved.

An optical measuring apparatus according to a fifth aspect of the present invention is the optical measuring apparatus described above, wherein the abutting surface of the abutting portion that abuts against the support member has a sloped shape. Thereby, the impact can be alleviated and the adsorption stage can be moved quickly.

An optical measuring apparatus according to a sixth aspect of the present invention is the optical measuring apparatus described above, wherein the adsorption stage has a discharge port for discharging a gas to the sample. Thereby, the movement of the adsorption stage can be performed quickly.

According to a seventh aspect of the present invention, in the optical measuring apparatus of the present invention, the optical measuring device according to the above aspect of the present invention, wherein the returning speed of the supporting member that is separated from the sample by the abutting portion to the state in which the sample is supported is based on the The position of the support member is different. Thereby, the impact of the support member and the sample can be alleviated.

In the optical measuring apparatus according to the eighth aspect of the present invention, the optical measuring device according to the first aspect, wherein the mounting table provided along the first direction is disposed on each side of the sample, and the plurality of supporting members are provided in the plurality of supporting members. The recovery speed of the support member at the end portion in the first direction is faster than the recovery speed of the other support members. Thereby, the impact of the sample in the center can be alleviated.

An optical measuring apparatus according to a ninth aspect of the present invention is the optical measuring apparatus described above, wherein the spring is provided with a spring that restores the support member to an original angle, and the return speed of the support member is changed by changing the strength of the spring. Thereby, the impact can be easily alleviated.

According to a tenth aspect of the present invention, in the optical measuring device of the present invention, the optical measuring device further includes a shock absorber that absorbs an impact when the supporting member returns to the original state by collision with the supporting member. The recovery speed of the aforementioned support member is changed by changing the strength of the aforementioned damper. Thereby, the impact can be easily alleviated.

An optical measuring apparatus according to an eleventh aspect of the present invention is the optical measuring apparatus described above, wherein the recovery speed of the support member is changed by changing a shape of a portion of the contact portion that is in contact with the support member. Thereby, the impact can be easily alleviated.

According to the present invention, it is possible to provide an optical measuring apparatus and a substrate holding apparatus which can easily perform stable measurement.

(Embodiment 1)

The measuring device of the present embodiment is an optical measuring device that performs measurement using transmitted light that has passed through the sample. The measuring device is used to measure the pattern or defect provided in the sample. Specifically, it is used to measure the shape of the pattern, the width of the pattern, the position of the defect, the size of the defect, the shape of the defect, and the like. Therefore, a microscope or an inspection apparatus using transmitted light can be used as the measuring apparatus of the present embodiment.

The measurement apparatus of the present invention will be described with reference to Figs. 1 and 2 . Fig. 1 is a plan view schematically showing the configuration of a measuring device. Fig. 2 is a perspective view schematically showing the configuration of a stage device used in the measuring device. As shown in Fig. 1, the measuring device 100 has a fixed base 11 and is placed The table 12, the guide rail 14, the support member 16, the adsorption stage 18, the X rail 21, the measuring head 22, the Y rail 23, and the abutting portion 48. The measuring device 100 is an inspection device for inspecting the sample 50. Further, as shown in FIG. 2, the stage device 10 for holding the sample 50 has a fixed base 11, a mounting table 12, a guide rail 14, a support member 16, and a suction stage 18.

Here, the sample 50 will be described as a color filter substrate used in a display device such as a liquid crystal display device. The color filter substrate includes a coloring layer of three colors of R, G, and B and a light shielding layer provided between the colored layers. In the measuring device 100 of the present embodiment, the adsorption stage 18 is provided under the sample 50. Further, the sample 50 is illuminated from the back side by the illumination light source 41 provided on the adsorption stage 18. The measuring head 22 is placed on the sample 50. The light passing through the sample 50 is received by the photodetector provided in the measuring head 22. The detector is, for example, a CCD camera or the like. Thereby, the image of the sample 50 can be taken. Therefore, the pattern shape, the pattern width, and the like of the sample 50 can be measured. Furthermore, the size and position of the defect can be determined by comparison with a normal pattern. Further, it is possible to check whether the sample 50 is normal or not.

As shown in Fig. 1 and Fig. 2, the horizontal plane is set to the XY plane. Further, the X direction and the Y direction are orthogonal to each other. The sample 50 is arranged substantially horizontally on the XY plane. Furthermore, the vertical direction is set to the Z direction. Further, the upper surface of the fixed base 11 is parallel to the XY plane. The fixed base 11 is, for example, mounted and fixed to the ground. Further, the fixed base 11 may be attached via a damper or the like for absorbing vibration.

Y rails 23 are respectively disposed at both ends of the fixed base 11. The Y track 23 is along the Y direction. That is, the length direction of the Y track 23 is the Y side. Parallel. An X-track 21 is provided above the two Y-tracks 23. The X rail 21 is provided along the X direction so as to straddle the sample 50. The length direction of the X track 21 is parallel to the X direction. A measuring head 22 is attached to the X rail 21. The measuring head 22 is arranged to be movable relative to the X-track 21. Therefore, the measuring head 22 moves in the X direction. A photodetector such as a camera, a lens, or the like is provided on the measuring head 22. The measuring head 22 receives light from the illumination light source 41 of the adsorption stage 18 which will be described later. Further, the epi-illumination optical system may be disposed in the measuring head 22. Thereby, both penetrating illumination and epi illumination can be utilized. Further, a laser light source for laser processing may be disposed in the measuring head 22. Thereby, the defective part can be corrected.

Furthermore, the X track 21 is arranged to be movable relative to the Y track 23. Therefore, the X track 21 moves in the Y direction. Therefore, the measuring head 22 moves in the XY direction on the sample 50. In other words, by moving the measuring head 22 in the X direction and moving the X-track 21 to which the measuring head 22 is attached in the Y direction, the measuring head 22 can be moved in the XY plane. Thereby, the sample 50 can be measured comprehensively. Moreover, since the installation space of the measuring apparatus 100 can be reduced, productivity can be improved. The driving of the measuring head 22 and the X rail 21 can be performed by a well-known method such as an AC servo motor.

Furthermore, two mounting tables 12 are fixed above the fixed base 11. The sample 50 is placed on the mounting table 12. The mounting table 12 is disposed along the Y direction. That is, the longitudinal direction of the mounting table 12 is parallel to the Y direction. Further, the mounting table 12 is disposed between the two Y rails 23. The stage 12 is separated by a distance corresponding to the size of the sample 50. Therefore, both ends of the sample 50 are placed on the mounting table 12. That is, the upper surface of the mounting table 12 is A mounting surface on which the sample 50 is placed is formed.

On the fixed base 11, as shown in Fig. 1, two guide rails 14 are fixed. Further, Fig. 2 omits illustration of a guide rail 14. The guide rails 14 are disposed along the Y direction. That is, the longitudinal direction of the guide rail 14 is parallel to the Y direction. The guide rail 14 is disposed between the two mounting bases 12. A sample 50 is placed on the guide rail 14. Therefore, the guide rail 14 is lower than the mounting table 12. That is, the upper surface of the guide rail 14 is lower than the mounting surface of the mounting table 12. Therefore, a gap is provided between the guide rail 14 and the sample 50.

An adsorption stage 18 is movably supported on the guide rail 14. For example, the suction stage 18 is mounted on the guide rail 14 by a linear guide or the like. Here, the adsorption stage 18 is supported in a slidable state by the two guide rails 14. Therefore, the adsorption stage 18 can be supported horizontally. The suction stage 18 moves in the Y direction along the guide rail 14. Thereby, the adsorption stage 18 can be moved to the position to be illuminated.

The adsorption stage 18 is, for example, a rectangular flat member. The adsorption stage 18 is disposed along the X direction. That is, the longitudinal direction of the adsorption stage 18 is parallel to the X direction. The adsorption stage 18 is disposed between the two mounting stages 12. The adsorption stage 18 is formed to have the same length as the interval between the two mounting stages 12. Therefore, the adsorption stage 18 extends from the vicinity of the inner side of one of the mounting stages 12 to the inner side of the other of the other mounting stages 12. That is, the adsorption stage 18 includes the entire inspection range in the X direction. The suction stage 18 slides along the guide rail 14 in the Y direction. That is, the guide rail 14 is formed as a slide rail that moves the suction stage 18. The driving of the adsorption stage 18 can be performed using a well-known method such as an AC servo motor.

An illumination source 41 is provided on the adsorption stage 18. The illumination source 41 is for example shot A linear light source that emits linear light. Here, illumination light having a linear spot parallel to the X direction is emitted from the illumination light source 41. Thereby, the entire inspection range can be illuminated in the X direction. The sample 50 is placed on the adsorption stage 18. Further, the adsorption stage 18 is provided with an adsorption port for adsorbing the sample 50. The measurement can be carried out in the state in which the sample 50 is adsorbed. Thereby, vibration can be reduced and stable measurement can be performed.

The configuration of the adsorption stage 18 will be described with reference to Fig. 3 . Fig. 3 is a side view showing the configuration of the adsorption stage 18. Fig. 3(a) shows a state in which the adsorption stage 18 is moving, and Fig. 3(b) shows a state in which the adsorption stage 18 is stopped.

An illumination source 41 as a linear light source is provided on the adsorption stage 18. The illumination light source 41 is substantially at the center of the adsorption stage 18 disposed in the Y direction. The illumination light source 41 has an LED (Light Emitting Diode) 42 and a diffusion plate 43. The LED 42 and the diffusion plate 43 are embedded in a recess provided in the adsorption stage 18. Specifically, a concave portion is formed substantially at the center of the adsorption stage 18 in the Y direction. The recess is formed along the X direction. The concave portion is a groove provided in a substantially entire entirety of the adsorption stage 18 in the X direction. Further, an LED 42 as a point light source is disposed in the recess. Here, the plurality of LEDs 42 are arranged along the X direction. The plurality of LEDs 42 are arranged in a row along the X direction at equal intervals. For example, the LEDs 42 are arranged every 2 cm. And the diffusion plate 43 is covered on the plurality of LEDs 42. The diffusion plate 43 is a rectangular flat member having a longitudinal direction in the X direction. Therefore, the LEDs 42 arranged in a row are covered by the diffusion plate 43. The diffusion plate 43 is disposed in a recess of the adsorption stage 18. Therefore, the diffusion plate 43 and the LED 42 do not protrude above the upper side of the concave portion. A gap is generated between the sample 50 adsorbed by the adsorption stage 18 and the illumination source 41. Horizontally Keep the sample 50.

The LED 42 emits illumination light upward. The illumination light is emitted toward the diffusion plate 43. Then, the light emitted from the LED 42 is diffused on the diffusion plate 43. That is, light from the LED 42 is incident on the sample 50 via the diffusion plate 43. Thereby, the linear region can be uniformly illuminated. Further, the illumination source 41 is preferably a linear light source. By using a linear light source, the entire inspection range in the X direction can be illuminated. Therefore, the entire sample 50 can be inspected as long as the illumination source is moved only in the Y direction. That is, as long as the adsorption stage 18 has a one-way drive mechanism, the measurement can be performed at any position of the sample 50.

Further, a light guide plate having a high refractive index can be used instead of the diffusion plate 43. In this case, when light is incident on the side or the lower side of the light guide plate, the light is totally reflected and propagated in the light guide plate. Then, light is emitted from the upper surface of the light guide plate. Thereby, even if the number of the LEDs 42 is reduced, the linear region can be uniformly illuminated. Further, as the illumination light source 41, for example, a lamp light source or the like can be used. Of course, the illumination source 41 is not limited to these configurations. Moreover, the illumination light source 41 is not limited to a linear light source. It is also possible to illuminate only the area measured by the measuring head 22. In other words, the field of view of the photodetector provided in the measuring head 22 may be uniformly illuminated. Specifically, only a part of the plurality of LEDs 42 can be illuminated, and the field of view can be uniformly illuminated. In this case, when the measuring head 22 moves in the X direction, the LEDs 42 that emit light are sequentially scanned. That is, the ON/OFF of the LED 42 is switched depending on the position of the measuring head 22. Thus, it is preferred to use an illumination source 41 that illuminates a linear illumination area. That is, the illumination light source 41 illuminates the linear region along the X direction even if it is not moved in the Y direction. It can also be used to illuminate the banded area.

The adsorption stage 18 is provided with an adsorption port 45 for adsorbing the sample 50. Therefore, when the gas is sucked from the adsorption port 45, a part of the sample 50 is adsorbed to the adsorption stage 18. Specifically, the strip-shaped region having the longitudinal direction in the X direction is adsorbed as shown in Fig. 3(b). Thereby, the sample 50 can be held in a region corresponding to the adsorption stage 18. As such, the adsorption stage 18 adsorbs and holds a portion of the sample 50. During the measurement, the sample 50 is adsorbed by the adsorption stage 18. Thereby, the vibration generated in the measurement can be reduced, and a more stable measurement can be performed.

The adsorption port 45 is disposed on both sides of the illumination light source 41 having the longitudinal direction in the X direction. That is, the two adsorption ports 45 are disposed separately in the Y direction. Further, an illumination light source 41 is disposed between the two adsorption ports 45. The adsorption port 45 is a groove shape extending in the X direction. Alternatively, a plurality of adsorption ports 45 may be arranged along the X direction. By providing the adsorption ports 45 on both sides of the illumination light source 41, the illumination area being illuminated can be reliably absorbed. Thereby, the measurement can be performed correctly.

Further, the adsorption stage 18 is provided with a discharge port 46 for discharging a gas. A discharge port 46 is disposed outside the adsorption port 45. Therefore, the adsorption ports 45 are provided on both sides of the illumination light source 41 in the Y direction. When gas is ejected from the discharge port 46, a gap (air gap) is generated between the sample 50 and the adsorption stage 18. As shown in Fig. 3(a), the sample 50 floats in a portion where gas is ejected from the discharge port 46. That is, the portion of the sample 50 corresponding to the adsorption stage 18 will bulge upward. Therefore, a gap is generated between the adsorption stage 18 and the sample 50. Therefore, when moving, the adsorption is stopped, and the gas is ejected from the discharge port 46. Thereby, the adsorption stage 18 can be moved without interfering with the sample 50. Adsorption station 18 Move quickly. The discharge port 46 has a groove shape extending in the X direction. Alternatively, a plurality of discharge ports 46 may be arranged in the X direction. By providing the discharge port 46 on the outer side of the adsorption port 45, the sample 50 and the adsorption stage 18 can be surely separated. The discharge port 46 is preferably provided in the vicinity of the end of the adsorption stage 18 in the Y direction. The adsorption stage 18 can be moved more quickly.

When the inspection is actually performed, the measurement head 22 is placed on the adsorption stage 18. That is, the sample 50 is disposed between the adsorption stage 18 and the measurement head 22. Next, the sample 50 is adsorbed and held. The sample 50 is illuminated from the lower side by the illumination source 41 of the adsorption stage 18. The transmitted light penetrating through the sample 50 is received by a photodetector provided in the measuring head 22. The photodetector is typically a CCD camera. The image of the sample 50 is taken by the CCD camera. Thereby, the pattern shape and the like of the sample 50 can be measured. After the measurement of the position is completed, the measuring head 22 and the adsorption stage 18 are moved in synchronization. To move it, the adsorption is first stopped, and the gas is ejected from the discharge port 46. Thereby, a gap is generated between the sample 50 and the adsorption stage 18. Then, after moving to the next measurement position, the discharge is stopped and the adsorption is performed from the adsorption port 45. Thereby, the sample 50 can be held. All or a portion of the sample 50 is inspected in the manner described above.

When the entire sample 50 is to be inspected, the adsorption stage 18 is moved to one end of the sample 50. Further, the measuring head 22 is moved right above the adsorption stage 18. Here, the measuring head 22 is first moved to the end in the X direction. Next, air is sucked from the adsorption port 45 to adsorb the sample 50. In a state where the sample 50 is adsorbed and held, linear illumination light is emitted from the illumination light source 41. The penetrating light that has passed through the sample 50 in the illumination light is detected by the measuring head 22. The measuring head 22 receives the transmitted light that has passed through the sample 50 on the upper side of the sample 50. Measuring head 22 will take part of the linear illumination area. Thereby, the image of the sample 50 is taken, and a part of the sample 50 is observed. Next, the measuring head 22 is gradually moved in the X direction, and a line inspection is performed. That is, the measuring head 22 is gradually moved from one end to the other end. During the movement, a linear illumination area illuminated by the illumination source 41 is sequentially photographed. In this way, the entire line-shaped illumination area is gradually measured.

After the inspection of one line is completed, the adsorption by the adsorption stage 18 is released, and the gas is ejected from the discharge port 46. Thereby, a state in which the sample 50 is separated from the adsorption stage 18 is formed. Next, in a state where the gas is ejected, the adsorption stage 18 and the measuring head 22 are shifted in the Y direction. That is, the adsorption stage 18 and the measuring head 22 are moved by the amount of one line. Next, the measuring head 22 is also moved in the X direction, and then the measurement of the second line is performed. This step is repeated and the measurement is performed until the other end of the sample 50. Sample 50 can be measured in this manner. That is, the adsorption stage 18 is scanned in the Y direction, and the measurement head 22 is scanned by a raster scan. Thereby, the entire sample 50 can be inspected.

Thus, the area to be measured is placed directly above the adsorption stage 18. Moreover, only the area corresponding to one portion of the adsorption stage 18 is illuminated. That is, only the linear regions of the corresponding illumination source 41 of the adsorption stage 18 are illuminated. Only a part of the illumination area illuminated by the illumination light becomes the field of view of the measurement head 22. By performing the adsorption, the vibration generated in the region where the image is taken can be reduced.

Further, as shown in FIGS. 1 and 2, a plurality of support members 16 are provided on the fixed base 11. The support member 16 is disposed inside the mounting table 12. The support member 16 is a needle-shaped member that supports the sample 50. Support structure The piece 16 is arranged along the Z direction. Further, the sample 50 is supported by bringing the upper end of the support member 16 into contact with the sample 50. That is, the support member 16 can be used to support a portion other than the adsorption stage 18. Thereby, the vibration with respect to the sample 50 can be further reduced. Moreover, the deflection of the sample 50 can be reduced.

A plurality of support members 16 are arranged in a matrix. A plurality of support members 16 may also be arranged at equal intervals. In the first and second figures, four support members 16 are arranged in the X direction, and seven support members 16 are arranged in the Y direction. Therefore, 28 support members 16 are provided. Of course, the number and arrangement of the support members 16 are not limited to the above examples. Here, the arrangement of the support members 16 is a course in the X direction and a column in the Y direction. In the X direction, the support members 16 are disposed on both sides of the guide rail 14. That is, the guide rail 14 is disposed between the column and the column of the support member 16. More specifically, one guide rail 14 is disposed between the support member 16 of the first row and the second row of support members 16 from the right in the first figure. Further, one guide rail 14 is disposed between the support member 16 and the fourth row of support members 16 in the third row from the right in the first figure.

The support member 16 is disposed on the lower side of the sample 50. Therefore, the upper ends of the support members 16 are formed at substantially the same height as compared with the mounting surface of the mounting table 12. Further, the flexibility of the sample 50 may be considered so that the upper end of the support member 16 is slightly lower than the mounting surface. The detailed configuration of the support member 16 will be described later.

Further, the adsorption stage 18 is provided with an abutting portion 48. The abutting portion 48 moves together with the adsorption stage 18. Since the abutting portion 48 abuts against the support member 16, the support member 16 is rotated. Thereby, the support member 16 is dropped, and a gap is generated between the support member 16 and the sample 50. Adsorption station 18 is connected Pass the gap. The suction table 18 can be prevented from colliding with the support member 16. That is, the interference with the support member 16 is prevented when the adsorption stage 18 moves. For example, the support member 16 at the position after the adsorption stage 18 is moved will rotate. Therefore, the support member 16 extending in the Z direction will fall down, and the support member 16 will be inclined from the Z direction. Thereby, the upper end of the support member 16 will leave the lower surface of the sample 50. The space for the adsorption stage 18 to pass directly under the sample 50 is formed, and the adsorption stage 18 is passed between the sample 50 and the support member 16.

Next, the rotation operation of the support member 16 will be described using Figs. 4 and 5 . Fig. 4 is a side view schematically showing the configuration of the stage device 10. More specifically, Fig. 4(a) is a side view showing a state in which the supporting member 16 supports the sample 50, and Fig. 4(b) is a side view showing a state in which the sample 50 is not supported. That is, FIG. 4(a) shows a state in which the support member 16 is not in contact with the abutting portion 48. Fig. 4(b) shows a state in which the support member 16 abuts against the abutting portion 48, and the support member 16 is rotating. FIG. 5 is an explanatory diagram of the operation of the support member 16.

As shown in Fig. 4(a), a plurality of support members 16 are connected by a shaft 35. The shaft 35 is a rotating shaft formed to rotate the support member 16. The shaft 35 is disposed along the X direction. The shaft 35 is connected to a connecting portion 32 provided at a lower portion of the support member 16. Thereby, the support members 16 adjacent in the X direction are connected by the shaft 35. A support pin 34 is provided above the connecting portion 32. In a state where the support member 16 and the abutting portion 48 are not in contact, the upper end of the support pin 34 is in contact with the sample 50.

Further, the shaft 35 connected to the support member 16 at both ends in the X direction is attached to the mounting table 12. The mounting table 12 supports the shaft 35 in a rotatable shape. state. The shaft 35 is inserted into a through hole provided in the guide rail 14. As described above, the four support members 16 arranged in the X direction are coupled by the shaft 35. That is, all of the support members 16 in the horizontal row are connected by the shaft 35. Thereby, a plurality of support members 16 located at the same position in the Y direction are simultaneously rotated. For example, when one support member 16 rotates with the shaft 35 as a rotation axis, the other three support members 16 also rotate. At this time, the four support members 16 will rotate at the same angle. The support members 16 of the horizontal row will rotate simultaneously.

Further, a cam roller 31 is provided at one of the four support members 16. In Fig. 4, the second support member 16 from the right side is provided with a cam roller 31. When the suction stage 18 is moved to the vicinity of the support member 16, the abutment portion 48 abuts against the cam roller 31. The abutting portion 48 and the cam roller 31 constitute a cam mechanism. Therefore, when the abutting portion 48 comes into contact with the cam roller 31, as shown in Fig. 5, the support member 16 rotates. That is, the straight motion of the abutting portion 48 in the Y direction is converted into a rotational motion with the shaft 35 as the rotational axis. Thereby, the support member 16 to which the cam roller 31 is attached is rotated. Therefore, the upper end 37 of the support pin 34 which originally supports the sample 50 is separated from the sample 50. That is, the rotating support member 16 no longer supports the sample 50.

Further, the support member 16 provided with the cam roller 31 and the other support members 16 are coupled by the shaft 35. Therefore, the support members 16 of the horizontal row will rotate simultaneously. As shown in Fig. 4(b), the sample 50 is separated from the support member 16. That is, a space through which the adsorption stage 18 can pass is formed below the sample 50. The suction stage 18 can be passed through the rotating support member 16 in a row. As described above, interference between the adsorption stage 18 and the support member 16 can be prevented by a simple mechanism.

As shown in Fig. 5, the abutting portion 48 has a width wider than the adsorption surface of the adsorption stage 18 in the Y direction. Therefore, the support member 16 disposed directly below the adsorption stage 18 is rotated. The space available for the adsorption stage 18 can be ensured. The measurement can also be performed directly above the support member 16. Further, as shown in Fig. 5, both ends of the abutting portion 48 forming the cam are formed in a bevel shape. That is, the abutting surface of the abutting portion 48 that abuts against the cam roller 31 is formed as a slope that is inclined from the horizontal plane. Here, the abutting surface of the abutting portion 48 is a curved surface. Therefore, the abutting surface of the abutting portion 48 gently changes. Thereby, the support member 16 gradually rotates gradually. Therefore, the impact can be alleviated. Thereby, the moving speed of the adsorption stage 18 can be increased, and the adsorption stage 18 can be moved quickly.

When the suction stage 18 moves further and passes completely through the rotating support member 16, the abutment portion 48 will move away from the cam roller 31. Thereby, the support member 16 returns to the original state and abuts against the sample 50. That is, the upper end 37 of the support member 16 comes into contact with the lower surface of the sample 50. Further, since both ends of the abutting portion 48 are formed in a bevel shape, the support member 16 is slowly rotated to return to the original angle. Therefore, the impact when the sample 50 comes into contact with the support member 16 can be alleviated. Further, the cam roller 31 may be biased in a state where the cam roller 31 and the abutting portion 48 are not in contact with each other, and the support member 16 may be returned to the original shape. Thereby, when the abutting portion 48 is separated from the cam roller 31, the support member 16 returns to the original rotation angle. The upper end of the support member 16 is in contact with the sample 50 and supports the sample 50. Thereby, it will return to the state of Fig. 4. Further, the support member 16 is rotated in two directions with the shaft 35 as a rotation axis. Thereby, a gap is generated between the sample 50 and the support member 16 regardless of whether the adsorption stage 18 is moved in either of the ±Y directions.

As described above, the support member 16 other than the suction table 18 supports the sample 50. That is, only the support members 16 corresponding to the horizontal rows of the adsorption stage 18 are rotated. Therefore, the support member 16 that is in the same course as the support member 16 that the contact portion 48 abuts is rotated, and the support member 16 that is different from the support member 16 that the contact portion 48 abuts does not rotate. Supporting sample 50. The support member 16 other than the rotating support member 16 is in contact with the sample 50. As described above, the portion other than the adsorption stage 18 is supported by the support member 16. This reduces vibration. Further, depending on the width and position of the suction stage 18, the support members 16 of the two or more rows may be rotated at the same time. Of course, in a case where the adsorption stage 18 is located between the support members 16 adjacent in the Y direction, all of the support members 16 may be brought into contact with the sample 50.

As described above, the abutment portion 48 moves together with the adsorption stage 18. Since the abutting portion 48 abuts against the support member 16, the support member 16 will leave the sample 50. Therefore, even if the support member 16 is provided in order to reduce vibration, the adsorption stage 18 can be freely moved. Moreover, since it is not necessary to raise and lower the support member 16, a simple configuration can be formed. That is, the lifting mechanism of the supporting member and its control are not required. Since the measuring device 100 is formed in a simple structure, the assembly process can be greatly shortened. Therefore, productivity can be improved.

Further, when the sample 50 is to be transported, the lifting and lowering of the support member 16 is not required. This can shorten the tact time. For example, when the sample 50 is transported or carried out, the X rail 21 and the suction stage 18 are moved to the end of the fixed base 11. Thereby, the measuring head 22 and the adsorption stage 18 are retracted to the outside of the mounting table 12. Next, drive the transport robot holding the sample 50 The sample 50 is transported to the mounting table 12. Next, the transport robot is lowered, and the sample 50 is delivered to the mounting table 12. At this time, the arm of the transport robot moves to a position that does not interfere with the support member 16 and the guide rail 14. For example, the arm of the transport robot is moved between the guide rail 14 and the support member 16. The arm can also be moved between the support member 16 and the support member 16. Thereby, the loading and unloading of the sample 50 can be performed in a short time. This reduces production time and increases productivity.

Further, the cam roller 31 may be provided in two or more support members 16 arranged side by side in a row. Further, the abutting portion 48 may be brought into contact with each of the cam rollers 31. Further, the number of parts of the cam mechanism can be reduced by reducing the number of the support members 16 on which the cam roller 31 is to be provided. Furthermore, the number of cam mechanisms can be reduced by connecting two or more support members 16 with the shaft 35. Therefore, even in the case where the number of the support members 16 is increased in order to inspect a large substrate, a simple configuration can be formed.

Further, the configuration is not limited to the configuration in which the support member 16 is rotated, and the configuration may be configured to move in the vertical direction. It suffices to provide a cam mechanism that converts the motion in the horizontal direction into the motion in the vertical direction. Further, the moving direction of the adsorption stage 18 and the direction of the illumination area of the illumination source are not limited to being orthogonal. That is, it suffices that the direction of movement of the adsorption stage 18 is different from the direction of the illumination area of the illumination source.

Further, the above description has been made on a color filter substrate of a display device such as a liquid crystal display device, but a color filter substrate for a solid-state image sensor such as a CCD camera may be used. Of course, a pattern substrate other than the color filter substrate can be used. For example, it can also be used in PDP or cathode ray Correction of phosphors such as tubes. Further, a thin film transistor array substrate of a liquid crystal display device can also be used. Further, it may be a liquid crystal display panel, a photomask, or the like.

(Modification)

The optical measuring apparatus according to the present modification will be described using FIG. Fig. 6 is a plan view schematically showing the arrangement of the support members 16 provided in the stage device 10. In addition, the description of the same configuration as that of the first embodiment will be omitted. Further, Fig. 6 is a simplification of the description, and a part of the configuration is omitted.

Here, as shown in Fig. 6, in the Y direction, the support members 16 disposed at both ends are the end side support members 16a, and the other support members 16 are the inner support members 16b. Therefore, the support member 16 of the first column and the seventh column from the above (the first column is counted from below) is the end side support member 16a. The support pins of the second to sixth columns from the above are the inner support members 16b. An inner support member 16b is disposed between the two end side support members 16a in the Y direction. Further, the sample 50 is vacuum-adsorbed on the mounting table 12.

In the present modification, the speed at which the support member 16 separated from the sample 50 by the abutting portion 48 is returned to the original state is changed. That is, the speed from the state in which the support member 16 is separated from the sample 50 to the state in which the sample 50 is supported is changed. Specifically, the recovery speed of the support member 16 is changed in accordance with the position of the support member 16. The rotation speed at which the shaft 35 rotates as a rotation axis is changed by the end side support member 16a and the inner side support member 16b. Therefore, the time from the unsupported state in which the abutting portion 48 is separated from the support member 16 to the support state in which the support member 16 is in contact with the sample 50 differs depending on the support member 16. End support member The recovery speed of 16a is faster than the recovery speed of the inner support member 16b.

The mounting table 12 supports both sides of the rectangular sample 50. Here, the long side of the sample 50 is placed on the mounting table 12. That is, the end portion on the long side of the sample 50 is supported by the mounting table 12. Therefore, the end portion on the short side of the rectangular sample 50 is not supported by the mounting table 12. That is, the short side of the sample 50 is in an open state. The amount of deflection in the unsupported state near the short side of the sample 50 becomes large. Therefore, the recovery speed of the end side support member 16a is made faster than that of the inner support member 16b.

On the other hand, in the inner side support member 16b, the recovery speed can be slowed down. In the portion corresponding to the inner side support member 16b, the support member 16 is disposed on both sides in the Y direction. For example, the inner side support members 16b of the second row and the fourth row are disposed on both sides of the inner side support member 16b in the third row. Therefore, even if one row of the inner side support members 16b is formed in an unsupported state, the support members 16 on both sides support the sample 50. Therefore, at the portion corresponding to the inner side support member 16b, the amount of deflection of the sample 50 becomes smaller than the portion corresponding to the end side support member 16a. That is, in the vicinity of the end side support member 16a, the amount of deflection of the sample 50 in the unsupported state becomes large. Therefore, the recovery speed of the inner side support member 16b is made slower than the recovery speed of the end side support member 16a. Thereby, the impact of the glass substrate as the sample 50 and the load on the adsorption stage 18 can be suppressed. Therefore, durability can be improved. Moreover, excessive deformation of the glass substrate as the sample 50 can be suppressed. Therefore, the vacuum adsorption of the mounting table 12 can be prevented from coming off.

Next, a configuration example of changing the recovery speed of the support member 16 will be described with reference to FIG. Figure 7 is a view showing that the support member 16 is spinning Side view of the turning motion. As shown in Fig. 7, since the abutting surface of the abutting portion 48 comes into contact with the cam roller 31, the support pin 34 rotates. Here, similarly to the above, the support pin 34 rotates with the shaft 35 as a rotation axis. In addition, the description of the same configuration as that of the above embodiment will be appropriately omitted. Further, in Fig. 7, the three support members 16 are arranged in the Y direction. Further, the abutting portion 48 gradually moves from the right side toward the left side, and the angle of the support pin 34 is from the state shown in Fig. 7(a) to the state shown in Figs. 7(b) and 7(c). , changes to the state of Figure 7 (d).

As shown in FIG. 7, the abutting portion 48 is provided with a slope which is in contact with the cam roller 31. That is, the abutting surface of the abutting portion 48 that abuts against the cam roller 31 is formed in a bevel shape. In the Y direction, the slopes are provided on both sides of the abutting portion 48. The shape of the left bevel is symmetrical with the shape of the right bevel. Thereby, even when moving in the ±Y direction, the support member 16 can be driven in the same manner. A horizontal plane is formed between the inclined surfaces provided at both ends of the abutting portion 48.

When the abutting portion 48 comes into contact with the cam roller 31 of the support member 16 provided at the center, the support member 16 rotates. That is, the connecting portion 32 supporting the cam roller 31 is inclined. Here, as shown in Fig. 7(a), the inclined surface on the left side of the abutting portion 48 comes into contact with the cam roller 31. Thereby, the support pin 34 is inclined toward the reverse direction of the abutment portion 48. Therefore, the upper end of the support pin 34 is gradually separated from the sample 50 (not shown). And an unsupported state in which the sample 50 is not supported is formed. Here, the inclined surface and the cam roller 31 are in contact with each other. Therefore, as the abutting portion 48 travels to the left side, the chamfering of the support pin 34 gradually becomes larger.

When the abutting portion 48 advances from the state of Fig. 7(a) to the left side, as in the seventh As shown in (b), the cam roller 31 comes into contact with the lower surface of the abutting portion 48. Here, the horizontal plane of the abutting portion 48 comes into contact with the cam roller 31. In the state shown in Fig. 7(b), the support pin 34 is further tilted to the right side than the state shown in Fig. 7(a). Therefore, the chamfering of the support pin 34 becomes large. Further, the chamfer of the support pin 34 does not change during the contact of the cam roller 31 with the horizontal plane.

Further, when the abutting portion 48 advances, in the horizontal plane of the abutting portion 48, the contact position of the cam roller 31 gradually moves toward the right side. Next, as shown in Fig. 7(c), the inclined surface on the right side of the abutting portion 48 and the cam roller 31 come into contact with each other. The support pin 34 will gradually rotate and the chamfer of the support pin 34 will become smaller. As the abutment portion 48 moves to the left, the chamfer will gradually become smaller. When the slope of the abutting portion 48 is separated from the cam roller 31, as shown in Fig. 7(d), the support pin 34 returns to the original angle. That is, the support pin 34 will stand upright, bringing the upper end 37 into contact with the sample 50. Thereby, the support member 16 is formed in a state of supporting the sample 50.

In the present modification, in order to return the support pin 34 to its original shape, a spring 38 is provided. One end of the spring 38 is attached to the connecting portion 32, and the other end is fixed to the fixed base 11 (not shown in Fig. 7). For example, when the abutment portion 48 comes into contact with the cam roller 31 to tilt the support pin 34, the spring 38 is elongated. Then, the support pin 34 is returned to its original shape by the elastic force of the spring 38. That is, when the portion of the abutting portion 48 that is in contact with the cam roller 31 gradually advances from the horizontal plane to the inclined surface, the spring 38 is gradually shortened. That is, in the state shown in Fig. 7(c), the spring 38 becomes shorter than the state shown in Fig. 7(b). The support pin 34 is gradually rotated in the upright direction by the elastic force of the spring 38. Next, when the inclined surface of the abutting portion 48 exceeds the cam roller 31, the support pin 34 returns to the original angle and is formed in an upright state by the elastic force of the spring 38. That is, the support member 16 will return from the unsupported state to the support state.

Further, a damper 39 for absorbing the impact when the support member 16 returns to the original state is provided. The damper 39 is fixed to the fixed base 11 and the like. Moreover, the damper 39 collides with the support member 16 when it is restored to its original state. For example, from the state shown in Fig. 7(b) to the middle of Fig. 7(c), the damper 39 and the support member 16 abut. Here, the damper 39 comes into contact with a portion of the support member 16 that extends downward from the connecting portion 32. Thereby, the impact applied to the support member 16 can be alleviated.

For example, the recovery speed can be adjusted by changing the strength of the spring 38 or the damper 39. When the recovery speed is adjusted by the strength of the spring 38, the spring strength (spring constant) of the spring 38 provided to the support member 16 to be quickly restored is increased. Therefore, the spring strength of the spring 38 of the end side support member 16a is made stronger than the spring strength of the spring 38 of the inner side support member 16b. Thereby, the recovery time of the end side support member 16a can be shortened.

When the damper 39 is used to adjust the recovery speed, the strength of the damper 39 provided to the support member 16 to be restored a little slower is reinforced. Therefore, the strength of the damper 39 of the end side support member 16a is made stronger than that of the damper 39 of the inner side support member 16b. Thereby, the recovery speed of the inner support member 16b can be slowed down. Therefore, the impact when the inner support member 16b collides with the sample 50 can be suppressed.

Further, different cams may be used to drive the inner side support member 16b and the end side support member 16a to change the recovery speed. For example, in the medial branch The holding member 16b and the end side support member 16a change the position of the cam roller 31. That is, the position of the cam roller 31 in the X direction is shifted. Thereby, the position of the contact surface in the X direction is changed in the end side support member 16a and the inner side support member 16b. Further, the inner support member 16b and the end side support member 16a change the shape of the abutting surface that abuts against the cam roller 31. For example, the angle of the slope of the abutting surface of the support member 16 that is slowly recovered is relaxed. In other words, the inclination of the abutting surface provided on the inner side support member 16b is relaxed, and the length of the abutting surface in the Y direction is lengthened. As described above, by changing the position of the cam roller 31, the shape of the abutting surface can be changed. Therefore, the speed at which the support member 16 is replied and the time of recovery can be changed depending on the column.

Alternatively, instead of the abutting surface, the shape of the cam roller 31 may be different. Of course, the cam roller 31 and the abutting surface can also be made different. The speed of recovery can be adjusted by changing the shape of the portion of the abutment portion 48 that is in contact with the support member 16. As described above, the inner side support member 16b and the end side support member 16a are driven by different cams. That is, the recovery speed can be adjusted by providing cams of different shapes on the inner side support member 16b and the end side support member 16a.

Thereby, the impact at the time of collision of the inner side support member 16b with the sample 50 can be suppressed. Moreover, when the sample 50 is adsorbed on the mounting table 12, it is possible to prevent the adsorption of the support member 16 and the sample 50 from being detached by the impact at the time of collision. Of course, two or more of the spring 38, the damper 39, and the cam shape may be combined to change the recovery speed. Furthermore, other methods can be used to change the recovery speed.

In order for the support member 16 to return to its original state at the same speed, it is necessary to It is adapted to match the recovery speed of the quick-recovering support member 16. That is, in order to quickly restore the support member 16 of the portion having a large amount of deflection, it is necessary to match the recovery speed of the support member 16. Therefore, with respect to the support member 16 having a small amount of deflection and requiring no quick recovery, the recovery speed is also increased. Therefore, it is difficult to suppress the impact when the support member 16 collides with the sample 50. In the present modification, since the recovery speed of the support member 16 is changed in accordance with the position of the support member 16, the recovery speed of a part of the support member 16 can be reduced. Thereby, the impact applied when the support member 16 collides with the sample 50 can be suppressed. Of course, the support member 16 to slow the recovery speed is not limited to the inner support member 16b. For example, the recovery speed of the support member 16 in which the amount of deflection in the state separated from the support member 16 is increased, and the recovery speed of the other support members 16 is slowed down. Thereby, three or more types of springs 38 and the like can be prepared to form the recovery speed in three or more stages. For example, the recovery speed of the support member 16 can be adjusted per column.

(Embodiment 2)

The configuration of the stage device 10 of the present embodiment will be described with reference to Fig. 8. Fig. 8 is a plan view schematically showing the configuration of the stage device 10 of the second embodiment. In addition, about the same structure as Embodiment 1, the description is abbreviate|omitted suitably. For example, the operation and configuration of the support member 16 and the like are the same as those of the first embodiment, and thus the illustration and description thereof are omitted. In the present embodiment, the configuration of the stage device 10 as the substrate holding device will be mainly described.

In the stage device 10 of the second embodiment, the adsorption unit 13 is provided on the mounting table 12. The adsorption unit 13 has an adsorption hole, an adsorption groove, and the like. That is, an adsorption hole, an adsorption groove, and the like are formed on the upper surface of the mounting table 12. Moreover, it can be adsorbed The adsorption holes of the portion 13 and the like attract the atmosphere. When suction is performed in a state where the sample 50 is placed on the mounting table 12, the inside of the adsorption hole is depressurized. Thereby, the sample 50 can be vacuum-adsorbed. Further, in the present embodiment, the adsorption unit 13 is divided into two systems. In other words, the first adsorption unit 13a and the second adsorption unit 13b are formed on the mounting table 12.

As shown in Fig. 8, the mounting table 12 is disposed on both sides of the sample 50. That is, the mounting table 12 is disposed on the right side and the left side of the sample 50, respectively. Therefore, the two mounting tables 12 are separately arranged. That is, the two mounting stages 12 are disposed separately in the X direction, and the adsorption stage 18 is moved therebetween.

Each of the mounting stages 12 is disposed along the Y direction. The first adsorption unit 13a and the second adsorption unit 13b are provided in each of the mounting stages 12. Here, seven adsorption holes are provided in one mounting table 12. The seven adsorption holes are arranged along the Y direction. Further, the adsorption holes at both ends are the first adsorption portions 13a, and the adsorption holes therebetween are the second adsorption portions 13b. Therefore, the first adsorption portion 13a is provided at the end of the mounting table 12 in the Y direction, and the second adsorption portion 13b is provided at the center portion of the mounting table 12. In one of the mounting stages 12, the first adsorption unit 13a has two adsorption holes, and the second adsorption unit 13b has five adsorption holes.

The first switching unit 15a is connected to the first adsorption unit 13a via a pipe. The first switching unit 15a controls the operation of the first adsorption unit 13a. Specifically, the first switching unit 15a can be switched on/off (ON/OFF) by the first switching unit 15a. For example, the first switching unit 15a includes a vacuum pump, a valve provided in the piping, and the like. Further, the ON/OFF operation of the first adsorption unit 13a is controlled by opening and closing the valve. When the first switching unit 15a turns on the first adsorption unit 13a, the four corners of the sample 50 are adsorbed. Also, when the first cut When the changing portion 15a turns off the first adsorption portion 13a, the adsorption of the four corners of the sample 50 is released.

In the same manner, the second switching unit 15b is connected to the second adsorption unit 13b via a pipe. The second switching unit 15b controls the operation of the second adsorption unit 13b in the same manner as the first switching unit 15a. Thereby, the ON/OFF operation of the second adsorption unit 13b can be switched. When the second switching unit 15b turns on the second adsorption unit 13b, the central portion of the long side of the sample 50 is adsorbed. When the second switching unit 15b turns off the second adsorption unit 13b, the adsorption of the central portion of the long side of the sample 50 is released. As described above, the first switching unit 15a and the second switching unit 15b are different in the area in which the switching is to be performed.

The first switching unit 15a and the second switching unit 15b are independent. Therefore, one of the first adsorption unit 13a and the second adsorption unit 13b can be turned ON, and the other can be turned OFF. Of course, both the first adsorption unit 13a and the second adsorption unit 13b may be turned ON. The first switching unit 15a and the second switching unit 15b are switched ON/OFF depending on the position of the suction stage 18. In addition, in the eighth diagram, the first switching unit 15a and the second switching unit 15b connected to the left side mounting table 12 are the same as the first switching unit 15a and the second switching unit 15b connected to the right side mounting table 12, Omitted.

For example, when the adsorption stage 18 is located in the A region corresponding to the first adsorption unit 13a, the first adsorption unit 13a is turned OFF, and the second adsorption unit 13b is turned ON. That is, in the Y direction, when the adsorption stage 18 is located at the end of the sample 50, the first adsorption portion 13a located at the end of the mounting table 12 is switched from ON to OFF. On the other hand, when the adsorption stage 18 is located in the C area corresponding to the second adsorption unit 13b, the first adsorption unit 13a is set to ON, the second adsorption unit 13b is turned OFF. That is, when the adsorption stage 18 is located at the center of the sample 50, the second adsorption unit 13b located at the center of the stage 12 is switched from ON to OFF. In addition, when the adsorption stage 18 is located in the B area corresponding to the boundary between the first adsorption unit 13a and the second adsorption unit 13b, the adsorption of the first adsorption unit 13a and the second adsorption unit 13b is turned ON.

As described above, the adsorption portion 13 located in the vicinity of the adsorption stage 18 is turned OFF. Thereby, the sample 50 can be surely floated with respect to the adsorption stage 18. For example, the sample 50 is floated from the adsorption stage 18 by the air from the discharge port 46 of the adsorption stage 18. Therefore, a gap for the adsorption stage 18 to pass is generated. Next, the adsorption stage 18 is moved while the sample 50 is floating. At this time, the sample 50 is not adsorbed by the mounting table 12 on both outer sides of the adsorption stage 18 in the X direction. Therefore, the sample 50 can be floated by a sufficient amount by the air from the adsorption stage 18. The gap through which the adsorption stage 18 passes can be surely set. Even when the height difference between the adsorption stage 18 and the mounting table 12 is reduced, the adsorption stage 18 can be prevented from colliding with the sample 50. Thereby, the sample 50 and the adsorption stage 18 are not in contact with each other, so that the sample 50 or the adsorption stage 18 can be prevented from being damaged. Moreover, the height difference between the adsorption stage 18 and the mounting table 12 can be reduced.

As described above, even if the adsorption stage 18 is not made lower than the mounting table 12, the gap between the adsorption stage 18 and the sample 50 can be ensured. Therefore, the flatness of the sample 50 can be improved. For example, the height difference between the adsorption stage 18 and the stage 12 can be adjusted in units of μm. Thereby, even between the mounting table 12 and the adsorption stage 18, measurement can be performed stably. In addition, even when the adsorption stage 18 is located in the A and C regions, the sample 50 is adsorbed to one of the first adsorption unit 13a and the second adsorption unit 13b. Therefore, the positional deviation of the sample 50 can be prevented.

Further, in the B region where the boundary between A and C is formed, both the first adsorption portion 13a and the second adsorption portion 13b are turned ON. As a result, the moment when both the first adsorption unit 13a and the second adsorption unit 13b are turned off will disappear. In other words, when the operations of the first adsorption unit 13a and the second adsorption unit 13b are switched, both the first adsorption unit 13a and the second adsorption unit 13b are turned on. Thereby, the sample 50 is often adsorbed by one or more adsorption sections 13, so that the sample 50 can be prevented from moving. Thereby, a stable measurement can be performed.

The above configuration is particularly effective when the defect of the polishing sample 50 is polished. For example, it is assumed that a polishing belt or the like is provided on the measuring head 22. Next, the measuring head 22 is moved right above the adsorption stage 18. That is, the sample 50 is disposed between the measuring head 22 and the adsorption stage 18. In this state, the defect of the sample 50 is corrected using the polishing belt provided on the measuring head 22. That is, the polishing tape is fed in a state where the polishing tape is in contact with the surface of the sample 50. Thereby, the protrusion which is itself defective can be ground by the grinding belt. The protrusion on the sample 50 is removed and the defect is corrected. By controlling the adsorption unit 13 as described above, the flatness of the sample 50 can be improved. Therefore, stable polishing and correction can be performed.

Further, a processing apparatus for processing other than polishing may be used. That is, the substrate holding device of the present embodiment is suitably used in a processing device provided with a processing head that moves on the sample 50. Further, a processing head different from the measuring head 22 may be provided. Further, the adsorption unit 13 may be divided into three or more systems.

The ON/OFF of the first adsorption unit 13a and the second adsorption unit 13b is switched in accordance with the position of the adsorption stage 18. In other words, when the adsorption stage 18 moves to the vicinity of the first adsorption unit 13a, the first adsorption unit 13a is turned OFF, only by the first 2 The adsorption portion 13b is adsorbed. On the other hand, when the adsorption stage 18 moves to the vicinity of the second adsorption unit 13b, the second adsorption unit 13b is turned OFF, and is adsorbed only by the first adsorption unit 13a. Thereby, the gap through which the adsorption stage 18 passes can be ensured. In addition, when the first adsorption unit 13a and the second adsorption unit 13b are in contact with each other, the first adsorption unit 13a and the second adsorption unit 13b are turned ON. Thereby, since any one of the adsorption portions 13 is adsorbed, it can be reliably held.

When both the first adsorption unit 13a and the second adsorption unit 13b are constantly turned on, regardless of the position of the adsorption stage 18, the gap may not be secured. Therefore, it is necessary to make the adsorption stage 18 lower than the mounting table 12. As a result, the flatness of the sample 50 is deteriorated, so that stable measurement and processing cannot be performed. Thereby, stable measurement and processing can be realized by the stage device 10 of the present embodiment.

Further, the above-described first, second, and modified examples can be used as appropriate.

10‧‧‧Terminal device

11‧‧‧Fixed base

12‧‧‧ mounting table

13‧‧‧Adsorption Department

13a‧‧‧1st adsorption department

13b‧‧‧2nd adsorption department

14‧‧‧ rails

15a‧‧‧1st switching department

15b‧‧‧2nd Switching Department

16‧‧‧Support components

16a‧‧‧Endside support members

16b‧‧‧Inner support member

18‧‧‧Adsorption station

21‧‧‧X track

22‧‧‧Measurement head

23‧‧‧Y track

31‧‧‧Cam Roller

32‧‧‧Connecting Department

34‧‧‧Support pins

35‧‧‧Axis

37‧‧‧Upper

38‧‧‧ Spring

39‧‧‧ Shock absorbers

41‧‧‧Light source

42‧‧‧LED

43‧‧‧Diffuser

45‧‧‧ adsorption port

46‧‧‧Spray outlet

48‧‧‧Apartment

50‧‧‧ samples

100‧‧‧Measurement device

Fig. 1 is a plan view schematically showing the configuration of an optical measuring apparatus according to the present embodiment.

Fig. 2 is a perspective view schematically showing a configuration of a stage device used in the optical measuring device of the embodiment.

Fig. 3 (a) and (b) are side cross-sectional views schematically showing the configuration of a suction stage used in the optical measuring apparatus of the embodiment.

4(a) and 4(b) are side views schematically showing the configuration of a stage device used in the optical measuring device of the embodiment.

Fig. 5 is an explanatory view showing the operation of the supporting member of the embodiment.

Fig. 6 is a plan view schematically showing the arrangement of support members of a modification.

Fig. 7 (a) to (d) are side views showing a state in which the supporting member is rotating.

Fig. 8 is a plan view schematically showing the configuration of the stage device of the second embodiment.

11‧‧‧Fixed base

12‧‧‧ mounting table

14‧‧‧ rails

16‧‧‧Support components

18‧‧‧Adsorption station

21‧‧‧X track

22‧‧‧Measurement head

23‧‧‧Y track

41‧‧‧Light source

48‧‧‧Apartment

50‧‧‧ samples

100‧‧‧Measurement device

Claims (11)

An optical measuring apparatus that uses a penetrating light that has passed through a sample to perform measurement, and is characterized in that it includes a mounting table on which an end portion of the sample is placed, and an adsorption stage that is disposed on a lower side of the sample. The movable body is movable in the first direction and has a suction port for adsorbing the sample; the illumination light source is provided on the adsorption stage, and the illumination light is emitted from the lower side to the sample; and the measurement head is received on the upper side of the sample. a light that penetrates the sample from the illumination light source; a plurality of support members are disposed on a lower side of the sample, and support the sample at an inner side of the mounting table; and an abutting portion is disposed on the adsorption stage And a part of the upper end of the support member is separated from the sample by abutment with the support member. The optical measuring device according to claim 1, further comprising: a shaft that connects two or more of the plurality of support members, wherein the abutting portion abuts against the supporting member to cause the supporting member The shaft is rotated about the rotation axis, and the upper end of the part of the support member is separated from the sample. The optical measuring apparatus according to claim 1 or 2, wherein the illumination source illuminates the sample in a line shape in a second direction different from the first direction. The optical measuring apparatus according to claim 1 or 2, wherein in the first direction, the adsorption ports provided in the adsorption stage are disposed on both sides of the illumination light source. The optical measuring device according to claim 1 or 2, wherein the abutting surface of the abutting portion that abuts against the support member has a sloped shape. The optical measuring apparatus according to claim 1 or 2, wherein the adsorption stage has a discharge port for ejecting gas to the sample. The optical measuring device according to the first or second aspect of the invention, wherein the returning speed of the support member that is separated from the sample by the abutting portion to the state in which the sample is supported is based on the support member The location is different. The optical measuring device according to claim 7, wherein the mounting stages provided along the first direction are disposed on both sides of the sample, and the plurality of supporting members are provided at the end of the first direction The recovery speed of the aforementioned support member is higher than the recovery speed of the other support members. An optical measuring apparatus according to claim 7, wherein a spring for returning the supporting member to an original angle is provided, and a return speed of the supporting member is changed by changing a strength of the spring. An optical measuring device according to claim 7, wherein the absorbing member absorbs the aforementioned branch by collision with the support member The shock absorber that impacts the member when returning to the original state changes the recovery speed of the support member by changing the strength of the shock absorber. The optical measuring apparatus according to claim 7, wherein the recovery speed of the support member is changed by changing a shape of a portion of the abutting portion that contacts the support member.