KR100982079B1 - Substrate holding apparatus - Google Patents

Abstract

Provided are an optical measuring device capable of easily performing stable measurement, and a substrate holding device.
The substrate holding apparatus according to the present embodiment includes a mounting table 12 on which the end of the substrate 50 is placed, and first and second adsorption units provided on the mounting table to adsorb the substrate ( 13a, 13b, and the movable table 18 which is provided so that a movement below the said board | substrate is possible, and blows the outlet 46 which blows gas with respect to the said board | substrate, ON / the said 1st and 2nd adsorption part Switching parts 15a and 15b for switching OFF, wherein the switching unit turns on one side of the first and second adsorption units and turns off the other side depending on the position of the movable table relative to the substrate. .

Description

Substrate Retention Device {SUBSTRATE HOLDING APPARATUS}

TECHNICAL FIELD This invention relates to a board | substrate holding apparatus. Specifically, It is related with the board | substrate holding apparatus which adsorb | sucks and hold | maintains a board | substrate.

In manufacturing processes, such as a liquid crystal display device, an illumination light is irradiated to a transparent substrate and an inspection is performed. In such an inspection process, the transmitted light which permeate | transmitted the sample may be used, and the reflected light reflected by the sample may be used. Examples of the transparent substrate include a color filter substrate, a liquid crystal panel, a TFT array substrate, and the like. In recent years, the board | substrate size of these board | substrates has enlarged.

In a transmission type inspection apparatus using transmitted light, a substrate to be inspected is placed on a stage. Thereby, it can maintain in a stable state. The light from a light source is irradiated from the front side or the back side of a board | substrate in the state which mounted the board | substrate on the stage. And the light which permeate | transmitted the board | substrate and the stage is detected with a detector of a CCD or a photodiode. Therefore, the transparent stage which transmits the light from a light source is used for the stage used for the transmission defect inspection apparatus (patent document 1).

For example, a detector is arranged on the top of the substrate, and an illumination light source is arranged on the bottom of the transparent stage. Thereby, the transmission image of a board | substrate can be imaged. A glass plate etc. are normally used for such a transparent stage. In order to accurately detect minute defects on the substrate, it is preferable that the substrate does not vibrate. That is, when the substrate vibrates, it becomes impossible to carry out stable measurement. With the enlargement of a board | substrate, the transparent stage for mounting it also causes enlargement. Therefore, the damping prevention becomes more important. However, there is a limitation to the thickness of the transparent glass stage, and it is difficult to make the thickness more than a certain level.

Moreover, the stage apparatus which has a damping rod is disclosed (patent document 2). The vibration damping rod is provided below the stage. Moreover, the inspection apparatus which provided the unit for adsorb | sucking a board | substrate under the board | substrate is disclosed (patent document 3). In this inspection apparatus, a unit is provided below the glass substrate. The unit is provided with a suction port and a jet port. The vibration can be reduced by adsorbing the substrate at the adsorption port. When moving a board | substrate, air is blown out from the blowing port of a unit. And a light receiving part is arrange | positioned between two units.

Japanese Patent Laid-Open No. 2001-148625 (paragraph 0011) Japanese Patent Laid-Open No. 2006-337542 Japanese Patent Publication No. 2003-279495

However, in the stage apparatus of patent document 2, it is necessary to raise and lower the damping rod according to the movement of a head. Therefore, it is necessary to control the drive mechanism which raises and lowers the damping rod. Moreover, in the inspection apparatus of patent document 3, in order to test the whole board | substrate, the board | substrate is moved. In the case of moving the substrate, the inspection apparatus becomes large. As described above, in these apparatuses, the apparatus becomes complicated in order to transmit light. Therefore, in the apparatus using the transmission light, there is a problem that stable measurement cannot be easily performed.

This invention is made | formed in order to solve such a problem, and an object of this invention is to provide the optical measuring apparatus which can perform stable measurement easily, and a board | substrate holding apparatus.

An optical measuring device according to a first aspect of the present invention is an optical measuring device that performs measurement by using transmitted light that has passed through a sample, and includes a mounting table on which an end of the sample is placed, and a first one below the sample. An adsorption table provided so as to be movable in a direction and having an adsorption port for adsorbing the sample, an illumination light source provided at the adsorption table to emit illumination light from below, and the sample transmitted from the illumination light source. A measuring head for receiving the transmitted light from above the sample, a plurality of support members provided below the sample to support the sample from the inside of the mounting table, and mounted on the suction table to contact the support member. The contact part which separates the upper end of a part of said support member from the said sample is provided. Thereby, even if it is the apparatus using transmission illumination, stable measurement can be performed easily.

The optical measuring device according to the second aspect of the present invention is the optical measuring device described above, further comprising a shaft that connects two or more of the plurality of supporting members, wherein the contact portion contacts the supporting member. The supporting member rotates as a rotating shaft, and the upper end of the part of the supporting member is separated from the sample. Thereby, even if the number of support members is increased, it can be set as a simple structure.

The optical measuring device according to the third aspect of the present invention is the optical measuring device described above, wherein the illumination light source illuminates the sample linearly along a second direction different from the first direction. Thereby, since it is only necessary to move the adsorption table in the first direction, the entire sample can be easily measured.

The optical measuring device according to the fourth aspect of the present invention is the optical measuring device described above, wherein suction holes provided in the suction zone are arranged on both sides of the illumination light source in the first direction. Thereby, since the vibration in the area | region to be illuminated can be reduced, stable measurement is attained.

The optical measuring device according to the fifth aspect of the present invention is the optical measuring device described above, wherein a contact surface in contact with the support member of the contact portion is tapered. Thereby, a shock can be alleviated and a suction stand can be moved quickly.

The optical measuring device according to the sixth aspect of the present invention is the optical measuring device described above, wherein the suction table has a jet port for blowing gas to the sample. As a result, the adsorption table can be moved quickly.

The optical measuring device according to the seventh aspect of the present invention is the optical measuring device described above, wherein a return speed at which the support member separated from the sample by the contact portion supports the sample is provided with the support member. Depending on the position of, it is characterized by another. Thereby, the impact which a support member and a sample receive can be alleviated.

The optical measuring device according to the eighth aspect of the present invention is the optical measuring device described above, wherein the mounting stands provided along the first direction are disposed on both sides of the sample, respectively, and the first of the plurality of supporting members is provided. The return speed of the support member provided at the end in the direction is faster than the other support members. Thereby, the impact in the center of a sample can be alleviated.

The optical measuring device according to the ninth aspect of the present invention is the optical measuring device described above, wherein a spring for returning the supporting member to an original angle is provided and the strength of the spring is changed to return the supporting member. I'm changing the speed. Thereby, a shock can be alleviated easily.

The optical measuring device according to the tenth aspect of the present invention is the optical measuring device described above, and further includes a shock absorber that absorbs an impact when the supporting member returns to its original state by colliding with the supporting member. The return speed of the support member is changed by changing the strength of the shock absorber. Thereby, a shock can be alleviated easily.

The optical measuring device according to the eleventh aspect of the present invention is the optical measuring device described above, wherein the return speed of the supporting member is changed by changing the shape of the portion where the contact portion and the supporting member contact. Thereby, a shock can be alleviated easily.

The board | substrate holding apparatus which concerns on the 12th aspect of this invention is the mounting stand which the edge part of a board | substrate puts on, the 1st and 2nd adsorption part attached to the said mounting stand, and adsorb | sucks the said board | substrate, and It is provided so that a movement is possible from below, and has a movable stand which has a blower outlet which blows gas with respect to the said board | substrate, The switch part is provided with the switch part which switches ON / OFF of the said 1st and 2nd adsorption part, The said switch part is the said board | substrate According to the position of the movable table with respect to, one side of the first and second adsorption units is turned on, and the other side is turned off. Thereby, when the movable table moves, the board | substrate of the part can be reliably floated. Since the height of the mounting table and the movable table can be approached, the plan view of the substrate can be improved. Therefore, stable measurement, processing, etc. are attained.

The board | substrate holding apparatus which concerns on the 13th aspect of this invention is a board | substrate holding apparatus which is a 1st so that the said mounting stand may put the edge part of both sides of the said board | substrate, and the said movable stand may pass between the said mounting stands of both sides. The first adsorption section is provided at both ends in the first direction, and the first adsorption section is provided at each end of the mounting stage provided along both sides of the substrate, and moves along the direction. 2 When the adsorption section is provided and the movable table moves to a position corresponding to the first adsorption section, the first adsorption section is turned off, and the second adsorption section is turned on, and the movable table corresponds to the second adsorption section. When moving to the position to be made, the said 1st adsorption part turns ON and the said 2nd adsorption part turns OFF. It is characterized by the above-mentioned. Thereby, when the movable table moves, the board | substrate of the part can be reliably floated. Since the height of the mounting table and the movable table can be approached, the plan view of the substrate can be improved. Therefore, stable measurement, processing, etc. are attained.

A substrate holding apparatus according to a fourteenth aspect of the present invention is the substrate holding apparatus, wherein the first and the first holding portions are located in a boundary region between a position corresponding to the first adsorption portion and a position corresponding to the second adsorption portion. 2 The adsorption part is turned ON. As a result, the substrate does not move even when passing through the boundary region, thereby enabling stable measurement.

According to the present invention, it is possible to provide an optical measuring device and a substrate holding device which can easily perform stable measurement.

1 is a top view schematically showing the configuration of an optical measuring device according to the present embodiment.
FIG. 2: is a perspective view which shows typically the structure of the stage apparatus used for the optical measuring apparatus which concerns on this embodiment.
3 is a side cross-sectional view schematically showing the configuration of an adsorption table used in the optical measuring device according to the present embodiment.
4 is a side view schematically showing the configuration of a stage device used in the optical measuring device according to the present embodiment.
5 is a view for explaining the operation of the supporting member according to the present embodiment.
6 is a top view schematically showing an arrangement of support members according to a modification.
7 is a side view showing a state in which the supporting member is rotating.
8 is a top view schematically showing the configuration of the stage apparatus according to the second embodiment.

Embodiment 1

The measuring apparatus which concerns on this embodiment is an optical measuring apparatus which measures using the transmitted light which permeate | transmitted the sample. The measuring device measures a pattern or a defect provided in the sample. Specifically, the pattern shape, the pattern width, the position of the defect, the size of the defect, the shape of the defect, and the like are measured. Therefore, the microscope and the inspection apparatus using transmitted light can be used as the measuring apparatus which concerns on this embodiment.

The measuring apparatus which concerns on this invention is demonstrated using FIG. 1 and FIG. 1 is a top view schematically illustrating the configuration of a measuring apparatus. 2 is a perspective view schematically showing the configuration of a stage apparatus used for a measuring apparatus. As shown in FIG. 1, the measuring apparatus 100 includes a surface plate 11, a mounting table 12, a guide rail 14, a supporting member 16, a suction table 18, and an X rail. It has 21, the measuring head 22, the Y rail 23, and the contact part 48. As shown in FIG. The measuring device 100 is an inspection device for inspecting the sample 50. In addition, as shown in FIG. 2, the stage device 10 for holding the sample 50 includes a surface plate 11, a mounting table 12, a guide rail 14, a support member 16, and a suction table. Has 18

Here, the sample 50 is demonstrated as a color filter substrate used for display apparatuses, such as a liquid crystal display device. The color filter substrate is provided with a light shielding layer provided between the colored layers of three colors R, G, and B and the colored layer. In the measuring apparatus 100 which concerns on this embodiment, the adsorption | suction stand 18 is provided under the sample 50. As shown in FIG. And the sample 50 is illuminated from the back surface side by the illumination light source 41 provided in the adsorption | suction stand 18. As shown in FIG. On the sample 50, the measurement head 22 is arrange | positioned. The transmitted light transmitted through the sample 50 is received by the photodetector provided in the measuring head 22. The detector is, for example, a CCD camera or the like. Thereby, the image of the sample 50 can be imaged. Thereby, the pattern shape, pattern width, etc. of the sample 50 are measured. Moreover, the magnitude | size and position of a defect can be measured by comparing with a normal pattern. Then, the sample 50 is inspected whether it is normal or not.

As shown to FIG. 1 and FIG. 2, a horizontal plane is made into XY plane. Further, the X direction and the Y direction are orthogonal to each other. The sample 50 is disposed substantially horizontally on the XY plane. In addition, the vertical direction is taken as the Z direction. On the other hand, the upper surface of the surface plate 11 is parallel to the XY plane. The surface plate 11 is fixed so as not to move with respect to the floor surface, for example. Moreover, you may fix the surface plate 11 through the dumper etc. which absorb a vibration.

On both ends of the surface plate 11, the Y rails 23 are arranged, respectively. The Y rail 23 follows the Y direction. That is, the longitudinal direction of the Y rail 23 is parallel to the Y direction. The X rails 21 are provided on the two Y rails 23. The X rail 21 is provided along the X direction so as to pass over the sample 50. The longitudinal direction of the X rail 21 is parallel to the X direction. The measurement head 22 is attached to the X rail 21. The measuring head 22 is provided to be movable with respect to the X rail 21. As a result, the measurement head 22 moves along the X direction. The measuring head 22 is provided with a photodetector such as a camera, a lens, or the like. The measurement head 22 receives the light from the illumination light source 41 of the adsorption | suction stand 18 mentioned later. In addition, a fall illumination optical system may be disposed in the measurement head 22. Thereby, both transmission illumination and fall illumination can be utilized. In addition, you may arrange | position the laser light source for laser processing in the measuring head 22. As shown in FIG. As a result, the defect point can be corrected.

In addition, the X rail 21 is provided to be movable with respect to the Y rail 23. As a result, the X rail 21 moves in the Y direction. Therefore, the measuring head 22 moves above the sample 50 in the XY direction. That is, the measuring head 22 can be moved two-dimensionally by moving the measuring head 22 to the X direction and moving the X rail 21 with the measuring head 22 to the Y direction. As a result, the entire surface of the sample 50 can be measured. Moreover, since the trace of the measuring apparatus 100 can be made small, productivity can be improved. The drive of the measuring head 22 and the X rail 21 can be performed using a well-known method, such as an AC servomotor.

In addition, two mounting tables 12 are fixed on the surface plate 11. The sample 50 is mounted on the mounting table 12. The mounting table 12 is provided along the Y direction. That is, the longitudinal direction of the mounting table 12 becomes parallel to the Y direction. And the mounting table 12 is arrange | positioned between two Y rails 23. As shown in FIG. The mounting table 12 is spaced apart from the sample 50 by a distance corresponding to the size. Therefore, both ends of the sample 50 are mounted on the mounting table 12. That is, the upper surface of the mounting table 12 becomes a mounting surface for placing the sample 50 on.

On the surface plate 11, as shown in FIG. 1, two guide rails 14 are fixed. In addition, in FIG. 2, the one guide rail 14 is abbreviate | omitted and shown. The guide rail 14 is provided along the Y direction. That is, the longitudinal direction of the guide rail 14 is parallel to the Y direction. The guide rail 14 is arrange | positioned between two mounting bases 12. As shown in FIG. On the guide rail 14, the sample 50 is arrange | positioned. Therefore, the guide rail 14 is lower than the mounting table 12. That is, the upper surface of the guide rail 14 is lower than the mounting surface of the mounting table 12. As a result, a gap is formed between the guide rail 14 and the sample 50.

On this guide rail 14, the suction stand 18 is supported to be movable. For example, the suction stand 18 is attached to the guide rail 14 by a linear guide or the like. Here, the suction base 18 is supported by the two guide rails 14 so that a slide movement is possible. As a result, the suction table 18 can be supported horizontally. The suction table 18 moves along the guide rail 14 in the Y direction. Thereby, the adsorption | suction stand 18 can be moved to the position to illuminate.

The suction table 18 is, for example, a rectangular flat plate member. The suction table 18 is provided along the X direction. That is, the longitudinal direction of the suction table 18 becomes parallel to the X direction. The suction table 18 is disposed between the two mounting tables 12. The adsorption table 18 is of approximately the same length as the spacing of the two mounting tables 12. Therefore, the adsorption | suction stand 18 is provided from the inner side vicinity of one mounting stand 12 to the inner side vicinity of the other mounting stand 12. As shown in FIG. In other words, the suction table 18 includes the entire inspection range in the X direction. The suction table 18 slides along the guide rail 14 in the Y direction. That is, the guide rail 14 becomes a slide rail for moving the suction stand 18. The adsorption | suction stand 18 can be driven using well-known methods, such as an AC servomotor.

The suction table 18 is provided with an illumination light source 41. The illumination light source 41 is a linear light source which emits linear light, for example. Here, illumination light having a linear spot parallel to the X direction is emitted from the illumination light source 41. This makes it possible to illuminate the entire inspection range in the X direction. The sample 50 is mounted on this suction stand 18. The adsorption table 18 is provided with an adsorption port for adsorbing the sample 50. The measurement is performed in a state in which the sample 50 is adsorbed. Thereby, vibration can be reduced and stable measurement can be performed.

The structure of this adsorption board 18 is demonstrated with reference to FIG. 3 is a side view illustrating the configuration of the suction table 18. 3 (a) shows a state in which the adsorption table 18 is moved, and FIG. 3 (b) shows a state in which the adsorption table 18 is stopped.

The suction table 18 is provided with an illumination light source 41 which is a linear light source. The illumination light source 41 is arrange | positioned in the substantially center of the adsorption | suction stand 18 in a Y direction. The illumination light source 41 has a light emitting diode (LED) 42 and a diffusion plate 43. The LED 42 and the diffusion plate 43 are embedded in the recess provided in the suction table 18. Specifically, a recess is formed in a substantially center of the suction table 18 in the Y direction. The recess is formed along the X direction. This recessed part is a groove provided in the substantially whole of the adsorption | suction stand 18 in a X direction. Then, LEDs 42 serving as point light sources are arranged in the recesses. Here, a plurality of LEDs 42 are arranged along the X direction. The plurality of LEDs 42 are arranged in a line along the X direction at equal intervals. For example, the LEDs 42 are arranged at 2 cm intervals. Then, the diffusion plate 43 is covered on the plurality of LEDs 42. The diffusion plate 43 is a rectangular flat member having the X direction in the longitudinal direction. As a result, the LEDs 42 arranged in a line are covered with the diffusion plate 43. The diffusion plate 43 is arranged in the recess of the suction table 18. Therefore, the diffusion plate 43 and the LED 42 did not blow out above the recessed portion. A gap arises between the sample 50 adsorbed by the adsorption table 18 and the illumination light source 41. Thereby, the sample 50 can be kept horizontal.

The LED 42 emits illumination light upwards. Illumination light is emitted toward the diffusion plate 43. Then, the light emitted from the LED 42 is diffused into the diffusion plate 43. That is, light from the LED 42 is incident on the sample 50 with the diffusion plate 43 interposed therebetween. As a result, the linear region can be uniformly illuminated. On the other hand, it is preferable that the illumination light source 41 is a linear light source. By using the linear light source, the entire inspection range in the X direction can be illuminated. Therefore, the whole sample 50 can be inspected only by moving an illumination light source only to a Y direction. That is, if the adsorption table 18 has a drive mechanism in one direction, it can measure at arbitrary positions of the sample 50.

In addition, a light guide plate having a high refractive index can be used instead of the diffusion plate 43. In this case, when light is incident on the side surface or the bottom surface of the light guide plate, the light propagates repeatedly by total reflection in the light guide plate. Then, light is emitted from the upper surface of the light guide plate. As a result, even if the number of the LEDs 42 is reduced, the linear region can be uniformly illuminated. In addition, a lamp light source or the like can be used as the illumination light source 41. Of course, the illumination light source 41 is not limited to these structures. In addition, the illumination light source 41 is not limited to the linear light source. Only the area measured by the measuring head 22 may be illuminated. That is, the visual field of the photodetector provided in the measuring head 22 should just be illuminated uniformly. Specifically, only a part of the plurality of LEDs 42 can emit light, so that the field of view can be uniformly illuminated. In this case, when the measuring head 22 moves in the X direction, the LEDs 42 emitting light are sequentially scanned. That is, the LED 42 is switched on and off in accordance with the position of the measurement head 22. Thus, it is preferable to use the illumination light source 41 which can illuminate the linear illumination area. That is, the illumination light source 41 illuminates the linear region along the X direction without moving in the Y direction. The strip-shaped area may be illuminated.

The adsorption table 18 is provided with an adsorption port 45 for adsorbing the sample 50. Therefore, when gas is sucked in from the adsorption port 45, a part of the sample 50 is adsorbed by the adsorption | suction stand 18. As shown in FIG. Specifically, the strip | belt-shaped area | region which makes X direction the longitudinal direction adsorb | suck, as shown to FIG. 3 (b). As a result, the sample 50 is held in the region corresponding to the suction table 18. In this way, the suction table 18 sucks and holds a part of the sample 50. While the measurement is being carried out, the sample 50 is adsorbed by the adsorption table 18. Therefore, the vibration generated during the measurement can be reduced, which enables more stable measurement.

The adsorption port 45 is arrange | positioned at the both sides of the illumination light source 41 which makes X direction the longitudinal direction. That is, two adsorption holes 45 are spaced apart in the Y direction. And the illumination light source 41 is arrange | positioned between the two adsorption holes 45. The suction port 45 is in the shape of a groove extending in the X direction. Alternatively, the plurality of suction ports 45 may be arranged along the X direction. By providing the suction ports 45 on both sides of the illumination light source 41, the illuminated illumination region can be reliably adsorbed. Therefore, it can measure accurately.

In addition, the suction port 18 is provided with a jet port 46 for blowing gas. A jet port 46 is disposed outside the suction port 45. Therefore, in the Y direction, the suction port 45 is provided on both sides of the illumination light source 41. When gas is blown out from the blower outlet 46, the gap (air gap) arises between the sample 50 and the adsorption | suction stand 18. As shown in FIG. As shown to Fig.3 (a), the sample 50 floats in the part which gas ejected from the blowing port 46. That is, the part corresponding to the adsorption | suction stand 18 of the sample 50 swells upwards. As a result, a gap is formed between the suction table 18 and the sample 50. Therefore, when moving, adsorption is stopped and gas is blown out from the blower outlet 46. FIG. As a result, the suction zone 18 can be moved without interfering with the sample 50. The suction stage 18 can be moved quickly. The jet port 46 has a groove shape extending in the X direction. Alternatively, the plurality of jets 46 may be arranged along the X direction. By providing the jet port 46 outside the suction port 45, the sample 50 and the suction table 18 can be reliably separated. The jet port 46 is preferably provided near the end of the suction zone 18 in the Y direction. The suction zone 18 can be moved more quickly.

In practice, the measurement head 22 is disposed on the suction table 18. In other words, the sample 50 is disposed between the suction table 18 and the measurement head 22. And the sample 50 is adsorbed and hold | maintained. The sample 50 is illuminated from below by the illumination light source 41 of the suction table 18. The transmitted light transmitted through the sample 50 is received by a photodetector provided in the measuring head 22. The photodetector is typically a CCD camera. The CCD camera captures an image of the sample 50. Thereby, the pattern shape of the sample 50, etc. can be measured. When the measurement at that position is completed, the measuring head 22 and the suction table 18 are moved in synchronization. In the case of moving, first, adsorption is stopped and gas is blown out from the blower outlet 46. As a result, a gap is formed between the sample 50 and the suction table 18. Then, when it moves to the next measurement position, the ejection is stopped and adsorbed from the suction port 45. As a result, the sample 50 is held. In this way, all or part of the sample 50 is examined.

When the entirety of the sample 50 is inspected, the adsorption table 18 is moved to one end of the sample 50. In addition, the measuring head 22 is moved directly above the suction table 18. Here, the measurement head 22 is moved to the end in the X direction. Then, air is sucked from the adsorption port 45 to adsorb the sample 50. The linear illumination light is emitted from the illumination light source 41 in the state which hold | maintained the sample 50 by adsorption | suction. Of the illumination light, the transmitted light transmitted through the sample 50 is detected by the measuring head 22. The measuring head 22 receives the transmitted light which permeate | transmitted the sample 50 from the upper part of the sample 50. FIG. The measuring head 22 picks up a part of linear illumination area | region. Thereby, the image of the sample 50 is imaged and a part of sample 50 can be observed. Then, the measuring head 22 is moved in the X direction, and inspection for one line is performed. That is, the measurement head 22 is moved from one end to the other end. During movement, the linear illumination area illuminated by the illumination light source 41 is sequentially imaged. In this way, the measurement of the entire linear illumination region is carried out.

When the inspection of one line is complete | finished, adsorption | suction by the adsorption | suction stand 18 is canceled | released and gas is blown out from the blower outlet 46. FIG. As a result, the sample 50 and the suction zone 18 are separated from each other. Then, the suction table 18 and the measurement head 22 are moved in the Y direction while ejecting. That is, the suction table 18 and the measurement head 22 are moved by one line. Similarly, the measurement head 22 is moved in the X direction to measure two lines. This is repeated and the measurement is performed to the other end of the sample 50. In this way, the sample 50 can be measured. That is, the suction head 18 is scanned in the Y direction, and the measuring head 22 is raster scanned. Thereby, the whole sample 50 can be inspected.

Thus, the area | region to measure is arrange | positioned just above the adsorption | suction stand 18. As shown in FIG. And only the area corresponding to a part of the suction table 18 is illuminated. That is, only the linear region corresponding to the illumination light source 41 of the suction zone 18 is illuminated. Only a part of the illumination region illuminated by this illumination light becomes the field of view of the measuring head 22. By absorbing, the vibration which generate | occur | produces in the area | region image | photographed can be reduced.

In addition, as shown in FIG. 1 and FIG. 2, a plurality of support members 16 are provided on the surface plate 11. The supporting member 16 is disposed inside the mounting table 12. The support member 16 is a pin-shaped member that supports the sample 50. Each support member 16 is provided along the Z direction. The sample 50 is supported by the upper end of the support member 16 contacting the sample 50. In other words, portions other than the suction table 18 can be supported by the support member 16. Thereby, the vibration with respect to the sample 50 can be reduced more. In addition, the warpage of the sample 50 is reduced.

The plurality of support members 16 are arranged in a matrix. The plurality of support members 16 may be arranged at equal intervals. 1 and 2, four support members 16 are arranged in the X direction, and seven support members 16 are arranged in the Y direction. Therefore, 28 support members 16 are provided. Of course, the number and arrangement of the supporting members 16 are not limited to the above examples. Here, in the arrangement of the supporting members 16, the X direction is a horizontal row and the Y direction is a vertical column. In the X direction, the supporting member 16 is disposed on both sides of the guide rail 14. That is, the guide rail 14 is arrange | positioned between the vertical row and the vertical row of the support member 16. As shown in FIG. More specifically, one guide rail 14 is disposed between the support member 16 in the first row and the support member 16 in the second row from the right side in FIG. 1. In addition, one guide rail 14 is disposed between the support member 16 in the third row and the support member 16 in the fourth row on the right side of FIG. 1.

The support member 16 is disposed below the sample 50. Accordingly, the upper end of the support member 16 is approximately the same height as the mounting surface of the mounting table 12. In addition, in consideration of the bending of the sample 50, the upper end of the support member 16 may be slightly lower than the mounting surface. The detailed structure of the support member 16 is mentioned later.

In addition, the contact portion 48 is provided on the suction table 18. The contact portion 48 moves together with the suction table 18. As the contact portion 48 comes into contact with the support member 16, the support member 16 rotates. As a result, the support member 16 falls, and a gap is generated between the support member 16 and the sample 50. The suction table 18 passes through the gap. The adsorption table 18 and the support member 16 can be prevented from colliding. That is, when the suction table 18 moves, it does not interfere with the support member 16. For example, the support member 16 of the position to which the suction stand 18 moved is rotated. Therefore, the support member 16 extended and provided in the Z direction falls, and the support member 16 is inclined from the Z direction. As a result, the upper end of the support member 16 is separated from the lower surface of the sample 50. An adsorption zone 18 in which a space for the adsorption zone 18 to pass through the sample 50 is formed to pass between the sample 50 and the support member 16.

Next, the rotation operation of the support member 16 will be described with reference to FIGS. 4 and 5. 4 is a side view schematically showing the configuration of the stage apparatus 10. More specifically, FIG. 4 (a) is a side view showing a state in which the support member 16 supports the sample 50, and FIG. 4 (b) shows a state in which the sample 50 is not supported. It is a side view showing. That is, FIG. 4A shows a state where the support member 16 is not in contact with the contact portion 48. 4B shows a state in which the support member 16 is in contact with the contact portion 48 and the support member 16 is rotated. 5 is a view for explaining the operation of the support member 16.

As shown to Fig.4 (a), the some support member 16 is connected by the shaft 35. As shown to FIG. The shaft 35 is a rotating shaft for rotating the support member 16. The shaft 35 is provided along the X direction. The shaft 35 is connected to the connection part 32 provided in the lower part of the support member 16. As shown in FIG. As a result, the support member 16 adjacent to the X direction is connected by the shaft 35. The support pin 34 extends and is provided above the connection part 32. In the state where the support member 16 is in contact with the contact portion 48, the upper end of the support pin 34 is in contact with the sample 50.

In addition, the shaft 35 connected to the support members 16 at both ends in the X direction is attached to the mounting table 12. The mounting table 12 supports the shaft 35 rotatably. The shaft 35 is inserted into the through hole provided in the guide rail 14. In this way, four support members 16 arranged in the X direction are connected by the shaft 35. That is, all the supporting members 16 in a horizontal line are connected by the shaft 35. Thereby, the several support member 16 located in the same position in a Y direction rotates simultaneously. For example, when one support member 16 rotates the shaft 35 as the rotation axis, the other three support members 16 also rotate. At this time, the four support members 16 rotate at the same angle. The horizontal row of support members 16 rotate simultaneously.

In addition, one of the four support members 16 is provided with a cam roller 31. In FIG. 4, the cam roller 31 is provided in the 2nd support member 16 from the right side. When the suction stand 18 moves to the vicinity of the support member 16, the contact portion 48 contacts the cam roller 31. The contact portion 48 and the cam roller 31 constitute a cam mechanism. Therefore, when the contact part 48 contacts the cam roller 31, as shown in FIG. 5, the support member 16 rotates. That is, the linear motion of the contact part 48 in the Y direction is converted into the rotational motion which makes the shaft 35 a rotational axis. As a result, the support member 16 to which the cam roller 31 is attached rotates. Therefore, the upper end 37 of the support pin 34 that supported the sample 50 is separated from the sample 50. That is, the rotated support member 16 does not support the sample 50.

In addition, the support member 16 provided with the cam roller 31 and the other support member 16 are connected by the shaft 35. For this reason, the support members 16 of a horizontal row rotate simultaneously. As shown in FIG.4 (b), the sample 50 and the support member 16 are separated. In other words, a space for passing the suction table 18 is formed under the sample 50. The suction table 18 can pass through the horizontal row of supporting members 16. In this manner, the simple mechanism can prevent interference between the suction table 18 and the support member 16.

As shown in FIG. 5, the contact part 48 is formed in the width | variety larger than the adsorption surface of the adsorption | suction stand 18 in a Y direction. Thereby, the support member 16 arrange | positioned just under the adsorption | suction stand 18 rotates. A space through which the suction table 18 can pass is secured. Measurements can also be taken immediately above the support member 16. In addition, as shown in FIG. 5, the both ends of the contact part 48 used as a cam are taper-shaped. That is, the contact surface which contacts the cam roller 31 of the contact part 48 becomes a taper surface inclined from the horizontal plane. Here, the contact surface of the contact part 48 is curved. Therefore, the contact surface of the contact part 48 is changing smoothly. As a result, the support member 16 gradually rotates. Therefore, shock can be alleviated. Therefore, the moving speed of the suction stand 18 can be improved, and the suction stand 18 can be moved quickly.

When the suction stand 18 moves further and passes completely through the rotated support member 16, the contact portion 48 is moved away from the cam roller 31. As a result, the support member 16 returns to its original state and comes into contact with the sample 50. That is, the upper end 37 of the support member 16 is in contact with the lower surface of the sample 50. In addition, since both ends of the contact portion 48 are tapered, the support member 16 gradually rotates to return to the original angle. For this reason, the impact when the sample 50 and the support member 16 contact can be alleviated. On the other hand, in the state where the cam roller 31 and the contact part 48 do not contact, you may apply the force so that the support member 16 may return to the original. By this, when the contact part 48 moves away from the cam roller 31, the support member 16 will return to original rotation angle. The upper end of the support member 16 contacts the sample 50 to support the sample 50. Therefore, it returns to the state shown in FIG. On the other hand, the support member 16 rotates in both directions with the shaft 35 as the rotation axis. Thereby, even when the adsorption | suction stand 18 moves to which side of the + Y direction, a clearance arises between the sample 50 and the support member 16. As shown in FIG.

In this way, the support member 16 other than directly under the suction table 18 supports the sample 50. That is, only the horizontal row of support members 16 corresponding to the suction table 18 rotate. Therefore, the horizontal support members 16, such as the support members 16 which contact the contact part 48, rotate. The supporting member 16 in contact with the contact portion 48 and the supporting member 16 in a different row do not rotate and support the sample 50. Support members 16 other than the rotated support member 16 are in contact with the sample 50. In this way, it is supported by the support member 16 at locations other than the suction table 18. Therefore, vibration can be reduced. Moreover, you may rotate the support member 16 of two or more horizontal rows simultaneously by the width | variety and the position of the adsorption | suction stand 18. FIG. Of course, when the suction stand 18 is between the support members 16 adjacent to the Y direction, all the support members 16 may be in contact with the sample 50.

In this way, the contact portion 48 moves together with the suction table 18. When the contact portion 48 comes into contact with the support member 16, the support member 16 is separated from the sample 50. For this reason, even if the support member 16 is provided in order to reduce vibration, the adsorption | suction stand 18 can be moved freely. In addition, since the support member 16 does not need to be elevated, the configuration can be simplified. That is, the lifting mechanism of the support member and its control are unnecessary. Since the measuring device 100 has a simple structure, the assembling process is greatly shortened. Therefore, productivity can be improved.

In addition, when carrying the sample 50, the lifting and lowering of the support member 16 becomes unnecessary. As a result, the tact time can be shortened. For example, when conveying and carrying out the sample 50, the X rail 21 and the adsorption | suction stand 18 are moved to the edge of the surface plate 11. As a result, the measuring head 22 and the suction table 18 are retracted outward from the mounting table 12. And the conveyance robot which hold | maintained the sample 50 is driven, and the sample 50 is put on the mounting base 12. As shown in FIG. Then, the transport robot is lowered and the sample 50 is sent to and placed on the mounting table 12. At this time, the hand of the transfer robot moves to a position which does not interfere with the support member 16 and the guide rail 14. For example, the hand of the transfer robot is moved between the guide rail 14 and the support member 16. The hand may be moved between the support member 16 and the support member 16. Thereby, loading and unloading of the sample 50 can be performed in a short time. Therefore, the tact time can be shortened and productivity can be improved.

In addition, the cam roller 31 may be provided in the 2 or more support members 16 arranged in a horizontal line. And the contact part 48 may be made to contact each cam roller 31. As shown in FIG. On the other hand, by reducing the number of support members 16 on which the cam roller 31 is provided, the component point of the cam mechanism can be reduced. In addition, the number of cam mechanisms can be reduced by connecting two or more support members 16 to the shaft 35. Therefore, even if the number of the support members 16 is increased in order to test a large sized board | substrate, it can be set as a simple structure.

In addition, it is good not only to the structure which rotates the support member 16, but to a structure which moves to an up-down direction. What is necessary is just to provide the cam mechanism which converts a horizontal movement into a vertical movement. In addition, the moving direction of the adsorption | suction stand 18 and the direction of the illumination area | region of an illumination light source are not limited to orthogonal thing. That is, the direction of movement of the adsorption | suction stand 18 and the direction of the illumination area | region of an illumination light source should just be a different direction.

On the other hand, in the above description, although described as a color filter substrate of a display device such as a liquid crystal display device, it can be used for color filter substrates for solid-state image pickup devices such as CCD cameras. Of course, it can be used for pattern substrates other than color filter substrates. For example, it can also be used for the correction of phosphors such as PDP and CRT. Furthermore, it can also be used for the thin film transistor array substrate of a liquid crystal display device. Also, a liquid crystal display panel, a photomask, or the like may be used.

[Modification]

The optical measuring apparatus which concerns on this modification is demonstrated using FIG. FIG. 6: is a top view which shows typically the arrangement | positioning of the support member 16 provided in the stage apparatus 10. As shown in FIG. In addition, description is abbreviate | omitted about the structure similar to Embodiment 1. As shown in FIG. In addition, in FIG. 6, some structure is abbreviate | omitted for simplification of description.

Here, as shown in FIG. 6, in the Y direction, the support member 16 in which the both ends are arrange | positioned is made into the end side support member 16a, and the other support member 16 is the inner support member 16b. ) Therefore, the support member 16 of the 1st row from the top and the 7th row from the top (1st row from the bottom) turns into the end side support member 16a. The support pins of the second to sixth rows from the top serve as the inner support member 16b. In the Y direction, the inner support member 16b is disposed between the two end side support members 16a. In the mounting table 12, the sample 50 is vacuum-adsorbed.

In the present modification, the support member 16 away from the sample 50 by the contact portion 48 changes the return speed to return to the original state. In other words, the speed of returning from the state where the supporting member 16 is separated from the sample 50 to the state supporting the sample 50 is different. Specifically, the return speed of the support member 16 is changed in accordance with the position of the support member 16. In the end side support member 16a and the inner support member 16b, the rotational speed at which the shaft 35 is rotated as the rotation axis is changed. For this reason, the time from the state in which the contact part 48 does not support apart from the support member 16 and the support member 16 moves to the support state which contacts the sample 50 is the support member 16. Depends on Here, the return speed of the end support member 16a is made faster than the return speed of the inner support member 16b.

The mounting table 12 supports both sides of the rectangular sample 50. Here, the long side of the sample 50 is mounted on the mounting table 12. That is, the end of the long side of the sample 50 is supported by the mounting table 12. For this reason, the end of the short side of the rectangular sample 50 is not supported by the mounting table 12. That is, the short side of the sample 50 is open | released. In the vicinity of the short side of the sample 50, the amount of warpage in the state which does not support becomes large. For this reason, the return speed of the end side support member 16a is made faster than the inner support member 16b.

On the other hand, in the inner support member 16b, the return speed can be slowed down. In the part corresponding to the inner support member 16b, the support members 16 are disposed on both sides in the Y direction. For example, the inner support members 16b in the second row and the fourth row are disposed on both sides of the inner support members 16b in the third row. Therefore, even when the inner support members 16b in a row are not supported, the support members 16 on both sides support the sample 50. For this reason, in the part corresponding to the inner side support member 16b, the amount of curvature of the sample 50 becomes smaller than the part corresponding to the end side support member 16a. That is, in the vicinity of the end side support member 16a, the amount of warpage of the sample 50 in a state in which it is not supported becomes large. For this reason, the return speed of the inner support member 16b is made later than the return speed of the return speed of the end side support member 16a. Thereby, it becomes possible to suppress the impact of the glass substrate which is the sample 50, and the load to the adsorption | suction stand 18. Therefore, durability can be improved. In addition, excessive deformation of the glass substrate serving as the sample 50 can be suppressed. Therefore, the vacuum suction of the mounting table 12 can be prevented from shifting.

Next, a configuration example of changing the return speed of the support member 16 will be described with reference to FIG. 7. FIG. 7 is a side view showing a state in which the support member 16 is rotating. As shown in FIG. 7, the support pin 34 rotates by the contact surface of the contact part 48 contacting the cam roller 31. As shown in FIG. Here, the support pin 34 rotates the shaft 35 as a rotating shaft as mentioned above. In addition, description is abbreviate | omitted suitably about the structure similar to said embodiment. In addition, in Fig. 7, three support members 16 are arranged in the Y direction. And the contact part 48 moves from the right side to the left side, and the state of the support pin 34 will be through the state shown to FIG. 7 (b) and FIG. 7 (c) from the state shown to FIG. It changes to the state of 7 (d).

As shown in FIG. 7, the contact part 48 is provided with the taper surface which contacts the cam roller 31. As shown in FIG. That is, the contact surface which contacts the cam roller 31 of the contact part 48 is tapered. In the Y direction, the tapered surfaces are provided on both sides of the contact portion 48. The shape of the left tapered surface is symmetrical with the shape of the right tapered surface. Thereby, even when it moves to + Y direction, it can drive like the support member 16. FIG. In the contact portion 48, a horizontal plane is formed between the tapered surfaces provided at both ends.

When the contact part 48 contacts the cam roller 31 provided in the middle support member 16, the support member 16 rotates. That is, the connection part 32 which supports the cam roller 31 inclines. Here, as shown to Fig.7 (a), the taper surface on the left side of the contact part 48 and the cam roller 31 contact. Thereby, the support pin 34 inclines in the advancing direction of the contact part 48. FIG. Therefore, the upper end of the support pin 34 moves away from the sample 50 (not shown). It will be in the state which does not support the sample 50 but does not support it. Here, the tapered surface and the cam roller 31 are in contact. For this reason, as the contact part 48 advances to the left side, the support pin 34 falls and an angle becomes large.

When the contact part 48 advances to the left from the state of FIG.7 (a), the cam roller 31 contacts the lower surface of the contact part 48, as shown to FIG.7 (b). Here, the horizontal surface of the contact part 48 and the cam roller 31 contact. In the state shown in FIG.7 (b), the support pin 34 falls to the right rather than the state shown in FIG.7 (a). Therefore, the support pin 34 falls and an angle becomes large. On the other hand, while the cam roller 31 is in contact with the horizontal surface, the support pin 34 falls and the angle does not change.

In addition, when the contact portion 48 proceeds, the contact position of the cam roller 31 moves to the right side in the horizontal plane of the contact portion 48. And the taper surface of the right side of the contact part 48 and the cam roller 31 contact as shown in FIG.7 (c). The support pin 34 rotates, the support pin 34 falls, and an angle becomes small. As the contact portion 48 moves to the left, the angle falls. When the taper surface of the contact part 48 moves away from the cam roller 31, as shown in FIG.7 (d), the support pin 34 will return to an original angle. That is, the support pin 34 stands up, and the upper end 37 and the sample 50 contact. Thereby, the support member 16 will be in the state which supports the sample 50. FIG.

In this modification, the spring 38 is provided in order to return the support pin 34 to its original state. One end of the spring 38 is attached to the connecting portion 32, and the other end thereof is fixed to the surface plate 11 (not shown in FIG. 7) or the like. For example, when the contact part 48 and the cam roller 31 contact and the support pin 34 inclines, the spring 38 will stretch. The support pin 34 returns to its original state by the elastic force of the spring 38. That is, when the part which contacts the cam roller 31 of the contact part 48 progresses from a horizontal surface to a tapered surface, the spring 38 will shrink. That is, in the state shown in FIG.7 (c), the spring 38 is shorter than the state shown in FIG.7 (b). By the elastic force of the spring 38, the support pin 34 rotates in the upright direction. And when the taper surface of the contact part 48 passes the cam roller 31, the support pin 34 will return to an original angle by the elastic force of the spring 38, and will be in an upright state. That is, it returns to a support state from the state which the support member 16 does not support.

In addition, a shock absorber 39 that absorbs the shock when the support member 16 returns to its original state is provided. The shock absorber 39 is fixed to the surface plate 11 or the like. The shock absorber 39 collides with the support member 16 when the shock absorber 39 returns to its original state. For example, the shock absorber 39 and the support member 16 are in contact with each other during the transition from the state shown in FIG. 7 (b) to FIG. 7 (c). Here, the shock absorber 39 is in contact with the portion extending downward from the connecting portion 32 of the support member 16. This alleviates the impact on the support member 16.

For example, the return speed can be adjusted by changing the strength of the spring 38 or the shock absorber 39. When adjusting a return speed by the strength of the spring 38, the spring strength (spring constant) of the spring 38 provided in the support member 16 which wants to return quickly is made high. Therefore, the spring strength of the spring 38 of the end side support member 16a is made stronger than the spring strength of the spring 38 of the inner support member 16b. As a result, the return time of the end side support member 16a is shortened.

In the case of adjusting the return speed with the shock absorber 39, the strength of the shock absorber 39 provided in the supporting member 16 to be returned later is strengthened. Therefore, the strength of the shock absorber 39 of the end side support member 16a is made stronger than that of the shock absorber 39 of the inner support member 16b. Thereby, the return speed of the inner support member 16b can be slowed down. Therefore, the impact when the inner support member 16b collides with the sample 50 can be suppressed.

Further, the return speed may be changed by driving the inner support member 16b and the end support member 16a with different cams. For example, the position of the cam roller 31 is changed in the inner support member 16b and the end support member 16a. That is, the position of the cam roller 31 in the X direction is slowed down. By doing in this way, the position of the contact surface in an X direction changes with the end side support member 16a and the inner side support member 16b. In addition, in the inner supporting member 16b and the end supporting member 16a, the shape of the contact surface in contact with the cam roller 31 is changed. For example, the taper angle of the contact surface provided in the support member 16 of the later turning side is made gentle. That is, the inclination of the contact surface provided in the inner support member 16b is made gentle, and the length of the contact surface in a Y direction is lengthened. In this way, the shape of the contact surface can be changed by changing the position of the cam roller 31. Accordingly, the speed at which the support member 16 returns or the timing at which it returns can be changed in accordance with the heat.

Alternatively, the cam roller 31 may have a different shape than the contact surface. Of course, both the cam roller 31 and the contact surface may differ. The return speed can be adjusted by changing the shape of the part where the contact part 48 and the support member 16 contact. In this way, the inner support member 16b and the end side support member 16a are driven by different cams. That is, by providing cams of different shapes on the inner support member 16b and the end side support member 16a, the return speed can be adjusted.

By doing in this way, the impact at the time of the inner support member 16b colliding with the sample 50 can be suppressed. In the mounting table 12, when the sample 50 is adsorbed, the adsorption of the support member 16 and the sample 50 can be prevented from being shifted due to the impact at the time of collision. Of course, two or more of the spring 38, the shock absorber 39, and the cam shape may be combined to change the return speed. Moreover, you may change a return speed by methods other than these.

When all the support members 16 are returned to the original at the same speed, it is necessary to match the return speed of the support member 16 which returns quickly. That is, in order to return the support member 16 of the part with a large amount of bending quickly, it is necessary to match with the return speed of the support member 16. FIG. Therefore, the return speed also increases for the support member 16 which has a small amount of warpage and does not need to be returned quickly. For this reason, it is difficult to suppress the impact when the support member 16 collides with the sample 50. In this modification, since the return speed of the support member 16 is changed according to the position of the support member 16, the return speed of some support members 16 can be slowed down. Therefore, the impact exerted when the support member 16 collides with the sample 50 can be suppressed. Of course, the support member 16 which slows down a return speed is not limited to the inner support member 16b. For example, the return speed of the support member 16, in which the amount of warpage increases in the state where the support member 16 is separated, is increased, and the return speed of the other support members 16 is slowed down. In this way, the return speed may be three or more steps by preparing three or more types of springs 38 and the like. For example, the return speed of the support member 16 can be adjusted for each row.

Embodiment 2

The structure of the stage apparatus 10 which concerns on this embodiment is demonstrated using FIG. FIG. 8: is a top view which shows typically the structure of the stage apparatus 10 which concerns on Embodiment 2. As shown in FIG. In addition, about the structure similar to Embodiment 1, description is abbreviate | omitted suitably. For example, since operation | movement and a structure of the support member 16 etc. are the same as Embodiment 1, illustration and description are abbreviate | omitted. In this embodiment, description will be mainly focused on the configuration of the stage apparatus 10 serving as the substrate holding apparatus.

In the stage apparatus 10 which concerns on Embodiment 2, the adsorption | suction part 13 is provided in the mounting table 12. As shown in FIG. The adsorption part 13 has adsorption holes, adsorption grooves, or the like. That is, suction holes, suction grooves, and the like are formed on the upper surface of the mounting table 12. Then, the atmosphere is sucked from the adsorption hole of the adsorption part 13 or the like. When suction is performed in a state where the sample 50 is placed on the mounting table 12, the inside of the suction hole is depressurized. As a result, the sample 50 can be vacuum adsorbed. In addition, in this embodiment, the adsorption part 13 is divided into two systems. That is, in the mounting table 12, the 1st adsorption part 13a and the 2nd adsorption part 13b are formed.

As shown in FIG. 8, the mounting table 12 is arrange | positioned at both sides of the sample 50. As shown in FIG. That is, the mounting table 12 is arrange | positioned at the right side and the left side of the sample 50, respectively. Therefore, two mounting stages 12 are spaced apart from each other. That is, the two mounting tables 12 are arranged apart from each other in the X direction, and the suction table 18 serving as the movable table moves therebetween.

Each mounting table 12 is provided along the Y direction. Each mounting table 12 is provided with a first adsorption part 13a and a second adsorption part 13b. Here, seven adsorption holes are provided in one mounting table 12. Seven adsorption holes are arranged along the Y direction. Then, the adsorption holes at both ends become the first adsorption part 13a, and the adsorption holes therebetween become the second adsorption part 13b. Therefore, the 1st adsorption part 13a is provided in the edge part of the mounting base 12 in a Y direction, and the 2nd adsorption part 13b is provided in the center part of the mounting base 12. As shown in FIG. In one mounting table 12, the first adsorption part 13a has two adsorption holes, and the second adsorption part 13b has five adsorption holes.

The 1st switch part 15a is connected to the 1st adsorption part 13a through the piping. The 1st switching part 15a controls the operation | movement of the 1st adsorption part 13a. Specifically, ON / OFF of the 1st adsorption part 13a is switched by the 1st switching part 15a. For example, the first switching unit 15a has a vacuum pump, a valve provided in the pipe, and the like. And the ON / OFF operation of the 1st adsorption part 13a is controlled by opening and closing a valve. When the 1st switch part 15a turns ON the 1st adsorption part 13a, the four corners of the sample 50 will adsorb | suck. Moreover, when the 1st switch part 15a turns off the 1st adsorption part 13a, adsorption | suction of the four corners of the sample 50 will be released.

Similarly, the 2nd switch part 15b is connected to the 2nd adsorption part 13b through the piping. Like the first switching unit 15a, the second switching unit 15b controls the operation of the second suction unit 13b. Thereby, ON / OFF operation | movement of the 2nd adsorption part 13b can be switched. When the 2nd switch part 15b turns ON the 2nd adsorption part 13b, the center part of the long side of the sample 50 will be adsorb | sucked. Moreover, when the 2nd switch part 15b turns off the 2nd adsorption part 13b, adsorption | suction of the long side center part of the sample 50 will be released. In this way, the areas in which adsorption is switched are different in the first switching unit 15a and the second switching unit 15b.

The 1st switch part 15a and the 2nd switch part 15b are independent. Therefore, one of the 1st adsorption part 13a and the 2nd adsorption part 13b can be turned ON, and the other can be turned OFF. Of course, you may turn ON both the 1st adsorption part 13a and the 2nd adsorption part 13b. The 1st switching part 15a and the 2nd switching part 15b switch ON / OFF according to the position of the adsorption | suction stand 18. As shown in FIG. On the other hand, in FIG. 8, about the 1st switch part 15a connected to the mounting base 12 of the left side, and the 2nd switch part 15b, the agent connected to the mounting base 12 of the right side Since it is the same as the 1st switching part 15a and the 2nd switching part 15b, it abbreviate | omits.

For example, when the adsorption table 18 is in the area | region A corresponding to the 1st adsorption part 13a, the 1st adsorption part 13a is turned OFF and the 2nd adsorption part 13b is turned ON. . That is, in the Y direction, when the adsorption table 18 is at the end of the sample 50, the first adsorption section 13a at the end of the mounting table 12 is switched from ON to OFF. On the other hand, when the adsorption table 18 is in the area | region C corresponding to the 2nd adsorption part 13b, the 1st adsorption part 13a is turned ON and the 2nd adsorption part 13b is turned OFF. That is, when the adsorption table 18 is in the center part of the sample 50, the 2nd adsorption part 13b in the center of the mounting table 12 is switched from ON to OFF. In addition, when the adsorption | suction stand 18 exists in the area | region of B corresponding to the boundary of the 1st adsorption part 13a and the 2nd adsorption part 13b, the 1st adsorption part 13a and the 2nd adsorption part 13b ON).

Thus, the adsorption part 13 in which the adsorption | suction stand 18 is near is turned off. Thereby, the sample 50 can be reliably floated with respect to the suction stand 18. For example, the sample 50 rises from the suction stand 18 by the air from the blower outlet 46 of the suction stand 18. As a result, a gap for the suction table 18 to pass is generated. And the adsorption | suction stand 18 moves in the state which the sample 50 floated. At this time, the sample 50 is not adsorb | sucked by the mounting table 12 on both outer sides of the adsorption | suction stand 18 in a X direction. Therefore, the sample 50 can be fully floated by the air from the suction stand 18. The clearance for passing the adsorption | suction stand 18 can be provided reliably. Even when the difference between the heights of the adsorption stand 18 and the mounting stand 12 is made small, collision with the adsorption stand 18 and the sample 50 can be prevented. Therefore, since the sample 50 and the adsorption stand 18 do not contact, it is possible to prevent the sample 50 and the adsorption stand 18 from being damaged. The difference of the height of the adsorption | suction stand 18 and the mounting stand 12 can be made small.

Thus, since the clearance gap between the adsorption | suction stand 18 and the sample 50 is ensured, it does not need to make it lower than the mounting base 12 in the adsorption | suction stand 18. For this reason, the top view of the sample 50 can be made high. For example, the difference between the heights of the adsorption | suction stand 18 and the mounting stand 12 can be matched with a micrometer order. Therefore, the measurement can be stably performed even between the mounting table 12 and the suction table 18. In addition, even when the adsorption | suction stand 18 exists in the area | regions A and C, one of the 1st adsorption part 13a and the 2nd adsorption part 13b adsorb | sucks the sample 50. As shown in FIG. For this reason, the position shift of the sample 50 can be prevented.

Moreover, in the area | region of B which becomes the boundary of A and C, both the 1st adsorption part 13a and the 2nd adsorption part 13b are ON. As a result, there is no instant of turning off both the first adsorption portion 13a and the second adsorption portion 13b. That is, at the time of operation switching of the 1st adsorption part 13a and the 2nd adsorption part 13b, both the 1st adsorption part 13a and the 2nd adsorption part 13b turn ON. Therefore, since the sample 50 is always adsorbed by the 1 or more adsorption | suction part 13, the sample 50 can be prevented from moving. Thereby, stable measurement can be performed.

The above configuration is particularly effective in the case of polishing and correcting a defect of the sample 50. For example, it is assumed that an abrasive tape or the like is provided in the measuring head 22. Then, the measuring head 22 is moved to just above the suction table 18. That is, the sample 50 is arrange | positioned between the measuring head 22 and the adsorption | suction stand 18. FIG. In this state, the defect of the sample 50 is correct | amended using the polishing tape provided in the measuring head 22. As shown in FIG. That is, the polishing tape is sent while the polishing tape is in contact with the surface of the sample 50. Thereby, the processus | protrusion which is a defect is polished with an abrasive tape. The protrusion on the sample 50 is removed, and the defect is corrected. By controlling the adsorption portion 13 as described above, the plan view of the sample 50 can be made high. For this reason, it becomes possible to perform stable grinding | polishing and correction.

Moreover, you may use with the processing apparatus which processes other than grinding | polishing. That is, the board | substrate holding apparatus which concerns on this embodiment is suitable for the processing apparatus in which the processing head which moves on the sample 50 is provided. In addition, a processing head may be provided separately from the measuring head 22. In addition, you may divide the adsorption | suction part 13 into three or more systems.

The ON / OFF of the 1st adsorption part 13a and the 2nd adsorption part 13b is switched according to the position of the adsorption | suction stand 18. FIG. That is, when the adsorption table 18 moves in the vicinity of the 1st adsorption part 13a, the 1st adsorption part 13a is OFF and it adsorb | sucks only by the 2nd adsorption part 13b. On the other hand, when the adsorption table 18 moves in the vicinity of the 2nd adsorption part 13b, the 2nd adsorption part 13b is OFF and it adsorb | sucks only by the 1st adsorption part 13a. Thereby, the clearance which the suction stand 18 passes can be ensured. In addition, when passing through the boundary between the 1st adsorption part 13a and the 2nd adsorption part 13b, the 1st adsorption part 13a and the 2nd adsorption part 13b are turned ON. Thereby, since either adsorption part 13 adsorb | sucks, it can hold | maintain firmly.

Regardless of the position of the adsorption table 18, if both the first adsorption portion 13a and the second adsorption portion 13b are always turned ON, a gap may not be secured. For this reason, compared with the mounting table 12, the adsorption table 18 needs to be made low. In this case, since the flatness of the sample 50 deteriorates, it becomes impossible to perform stable measurement and processing. Therefore, in the stage apparatus 10 which concerns on this embodiment, stable measurement and processing can be implement | achieved.

In addition, it is also possible to use combining Embodiment 1, 2, and a modification suitably.

10: stage device
12: put on
14: guide rail
16: support member
18: adsorption table
21: X rail
22: measuring head
23: Y rail
31: Cam Roller
32: connection part
34: support pin
35: shaft
37: top
41: illumination light source
42: LED
43: diffuser plate
45: adsorption port
46: spout
50: sample
13: adsorption part
13a: first adsorption unit
13b: second adsorption unit
15a: first switching unit
15b: second switching unit
16a: end side support member
16b: inner support member
38: spring
39: shock absorber

Claims (3)

A mounting table 12 on which an end of the substrate 50 is placed;
First and second adsorption portions (13a, 13b) provided on the mounting table to adsorb the substrate;
It is provided so that it is movable below a board | substrate, and has the movable stand 18 which has the blowing port 46 which blows gas with respect to the said board | substrate,
It is provided with switching parts 15a and 15b which switch ON / OFF of the said 1st and 2nd adsorption part,
The switch holding unit turns on one side of the first and second adsorption sections and turns the other off in accordance with the position of the movable table relative to the substrate. The method of claim 1, wherein the mounting table is placed on the ends of both sides of the substrate,
Move along the first direction such that the movable table passes between the mounting tables on both sides,
In each of the mounting tables provided on both sides of the substrate, the first adsorption portion 13a is provided at both ends in the first direction.
Between the said 1st adsorption part provided in the both ends, the said 2nd adsorption part 13b is provided,
When the movable table moves to a position A corresponding to the first adsorption part, the first adsorption part is turned off, and the second adsorption part is turned on,
The said 1st adsorption part turns ON and the said 2nd adsorption part turns OFF when the said movable stand moves to the position C corresponding to the said 2nd adsorption part, The board | substrate holding apparatus characterized by the above-mentioned. The said 1st and 2nd of Claim 1 or 2 in the boundary area B of the position A corresponding to the said 1st adsorption part, and the position C corresponding to the said 2nd adsorption part. A substrate holding device in which the suction part is turned on.

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