TWI366052B - Liquid crystal display, thin film transistor array panel therefor, and manufacturing method thereof - Google Patents

Liquid crystal display, thin film transistor array panel therefor, and manufacturing method thereof

Info

Publication number
TWI366052B
TWI366052B TW093109237A TW93109237A TWI366052B TW I366052 B TWI366052 B TW I366052B TW 093109237 A TW093109237 A TW 093109237A TW 93109237 A TW93109237 A TW 93109237A TW I366052 B TWI366052 B TW I366052B
Authority
TW
Taiwan
Prior art keywords
manufacturing
liquid crystal
thin film
crystal display
film transistor
Prior art date
Application number
TW093109237A
Other languages
English (en)
Other versions
TW200424719A (en
Inventor
Dong-Gyu Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200424719A publication Critical patent/TW200424719A/zh
Application granted granted Critical
Publication of TWI366052B publication Critical patent/TWI366052B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G02F1/139—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent
    • G02F1/1393—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent the birefringence of the liquid crystal being electrically controlled, e.g. ECB-, DAP-, HAN-, PI-LC cells

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Nonlinear Science (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)
TW093109237A 2003-04-04 2004-04-02 Liquid crystal display, thin film transistor array panel therefor, and manufacturing method thereof TWI366052B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030021311A KR100935670B1 (ko) 2003-04-04 2003-04-04 액정표시장치, 박막 트랜지스터 표시판 및 그의 제조 방법

Publications (2)

Publication Number Publication Date
TW200424719A TW200424719A (en) 2004-11-16
TWI366052B true TWI366052B (en) 2012-06-11

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW093109237A TWI366052B (en) 2003-04-04 2004-04-02 Liquid crystal display, thin film transistor array panel therefor, and manufacturing method thereof

Country Status (5)

Country Link
US (2) US7202498B2 (zh)
JP (1) JP4977308B2 (zh)
KR (1) KR100935670B1 (zh)
CN (1) CN100378555C (zh)
TW (1) TWI366052B (zh)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7612373B2 (en) * 2004-06-30 2009-11-03 Lg Display Co., Ltd. Liquid crystal display device and method of manufacturing liquid crystal display device with color filter layer on thin film transistor
TWI379113B (en) * 2004-07-07 2012-12-11 Samsung Display Co Ltd Array substrate, manufacturing method thereof and display device having the same
US20060023151A1 (en) * 2004-08-02 2006-02-02 Samsung Electronics Co., Ltd. Liquid crystal display and panel therefor
KR20060016920A (ko) * 2004-08-19 2006-02-23 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR101282397B1 (ko) * 2004-12-07 2013-07-04 삼성디스플레이 주식회사 표시 장치용 배선, 상기 배선을 포함하는 박막 트랜지스터표시판 및 그 제조 방법
KR101133760B1 (ko) * 2005-01-17 2012-04-09 삼성전자주식회사 박막 트랜지스터 표시판 및 이를 포함하는 액정 표시 장치
KR101085451B1 (ko) * 2005-02-11 2011-11-21 삼성전자주식회사 표시장치용 박막트랜지스터 기판과 그 제조방법
TWI345313B (en) 2005-09-05 2011-07-11 Au Optronics Corp Thin film transistor and method of manufacturing the same
CN100433368C (zh) * 2005-09-30 2008-11-12 友达光电股份有限公司 薄膜晶体管及其制造方法
KR101250316B1 (ko) * 2005-10-18 2013-04-03 엘지디스플레이 주식회사 액정표시장치 및 그 제조 방법
JP5144055B2 (ja) * 2005-11-15 2013-02-13 三星電子株式会社 表示基板及びこれを有する表示装置
EP2042916A4 (en) * 2006-07-19 2010-10-13 Sharp Kk ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL PANEL, DISPLAY, TELEVISION RECEIVER
JP5130711B2 (ja) * 2006-12-26 2013-01-30 セイコーエプソン株式会社 電気光学装置及びその製造方法
KR101430526B1 (ko) * 2006-12-28 2014-08-19 삼성디스플레이 주식회사 표시 기판 및 이를 갖는 표시 장치
EP1939676B1 (en) 2006-12-28 2012-06-06 Samsung Electronics Co., Ltd. Display substrate and display apparatus having the same
KR101448000B1 (ko) * 2008-08-26 2014-10-14 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조 방법
KR101542399B1 (ko) 2008-08-26 2015-08-07 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조 방법
KR101492538B1 (ko) * 2008-09-12 2015-02-12 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 이의 제조 방법
KR101525801B1 (ko) * 2008-11-14 2015-06-08 삼성디스플레이 주식회사 어레이 기판 및 그 제조 방법
KR101557817B1 (ko) * 2008-12-15 2015-10-07 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR101635528B1 (ko) * 2009-10-27 2016-07-04 삼성디스플레이 주식회사 박막 트랜지스터 기판
KR101620534B1 (ko) * 2010-01-29 2016-05-13 삼성디스플레이 주식회사 액정 표시 장치
KR101728497B1 (ko) 2010-04-16 2017-04-20 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR101692954B1 (ko) * 2010-05-17 2017-01-05 삼성디스플레이 주식회사 유기 발광 디스플레이 장치 및 그 제조 방법
JP5610390B2 (ja) * 2010-11-25 2014-10-22 Ｎｌｔテクノロジー株式会社 液晶表示装置
DE112013007498B3 (de) 2012-07-20 2022-05-05 Semiconductor Energy Laboratory Co., Ltd. Anzeigevorrichtung
KR101984896B1 (ko) * 2013-05-31 2019-06-03 엘지디스플레이 주식회사 액정표시장치 및 이의 제조 방법
KR102066623B1 (ko) * 2013-08-21 2020-01-17 삼성디스플레이 주식회사 표시 기판 및 표시 기판의 제조 방법
KR102210524B1 (ko) * 2013-11-13 2021-02-03 삼성디스플레이 주식회사 표시패널
KR102166898B1 (ko) 2014-01-10 2020-10-19 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
CN104166280A (zh) 2014-07-24 2014-11-26 京东方科技集团股份有限公司 一种阵列基板及其制备方法、显示装置
KR102276698B1 (ko) * 2014-12-26 2021-07-13 삼성디스플레이 주식회사 표시 장치용 어레이 기판
KR102334140B1 (ko) * 2015-03-17 2021-12-03 삼성디스플레이 주식회사 표시 장치 및 그 제조 방법
CN105097668A (zh) * 2015-06-30 2015-11-25 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示装置
CN105321959B (zh) 2015-09-10 2018-10-12 京东方科技集团股份有限公司 阵列基板及其制作方法、液晶显示面板和显示装置
KR101702570B1 (ko) * 2015-10-30 2017-02-03 엘지디스플레이 주식회사 투명 유기 발광 표시 장치
CN105353555B (zh) * 2015-12-08 2018-08-14 深圳市华星光电技术有限公司 量子点彩膜基板的制作方法
KR102665790B1 (ko) * 2016-01-14 2024-05-14 삼성디스플레이 주식회사 표시 패널 및 이의 제조 방법
KR102589859B1 (ko) * 2016-03-22 2023-10-16 삼성디스플레이 주식회사 색필터 표시판 및 이를 포함하는 표시 장치
CN107045223A (zh) * 2017-04-13 2017-08-15 深圳市华星光电技术有限公司 一种液晶显示面板及其制作方法、液晶显示器
CN106873278A (zh) * 2017-04-25 2017-06-20 京东方科技集团股份有限公司 阵列基板及其制作方法、显示装置
KR20210024345A (ko) * 2019-08-22 2021-03-05 삼성디스플레이 주식회사 표시 장치

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0862629A (ja) * 1994-08-16 1996-03-08 Toshiba Corp 液晶表示装置
JP3268723B2 (ja) * 1996-03-25 2002-03-25 シャープ株式会社 アクティブマトリクス基板および液晶表示装置
JP3721682B2 (ja) * 1996-12-26 2005-11-30 セイコーエプソン株式会社 アクティブマトリクス基板の製造方法
US6037609A (en) * 1997-01-17 2000-03-14 General Electric Company Corrosion resistant imager
JP4234820B2 (ja) * 1998-09-24 2009-03-04 三菱電機株式会社 液晶表示装置およびその製造方法
JP2000098368A (ja) * 1998-09-25 2000-04-07 Canon Inc アクティブマトリクス基板とその製造方法、該基板を用いた液晶素子
US7119870B1 (en) * 1998-11-27 2006-10-10 Sanyo Electric Co., Ltd. Liquid crystal display device having particular drain lines and orientation control window
JP3267271B2 (ja) * 1998-12-10 2002-03-18 日本電気株式会社 液晶表示装置およびその製造法
JP2000187209A (ja) * 1998-12-22 2000-07-04 Advanced Display Inc 反射型液晶表示装置およびその製造方法
JP3339489B2 (ja) 1999-03-26 2002-10-28 富士ゼロックス株式会社 薄膜トランジスタ一体型カラーフィルターの製造方法
US6503772B1 (en) * 1999-03-26 2003-01-07 Fuji Xerox Co., Ltd. Method of manufacturing a thin film transistor-integrated color filter
JP2001005038A (ja) * 1999-04-26 2001-01-12 Samsung Electronics Co Ltd 表示装置用薄膜トランジスタ基板及びその製造方法
KR100623980B1 (ko) 1999-07-22 2006-09-13 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 기판 및 그 제조 방법
US6466281B1 (en) * 1999-08-23 2002-10-15 Industrial Technology Research Institute Integrated black matrix/color filter structure for TFT-LCD
JP3498020B2 (ja) * 1999-09-29 2004-02-16 Ｎｅｃ液晶テクノロジー株式会社 アクティブマトリックス基板及びその製造方法
JP2001117085A (ja) 1999-10-15 2001-04-27 Nec Corp カラー液晶表示パネル及びその製造方法
JP2001175198A (ja) * 1999-12-14 2001-06-29 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP3793402B2 (ja) 2000-07-28 2006-07-05 株式会社日立製作所 カラー液晶表示装置
US6784965B2 (en) * 2000-11-14 2004-08-31 Lg.Philips Lcd Co., Ltd. In-plane switching mode liquid crystal display device and manufacturing method thereof
KR100648422B1 (ko) * 2000-12-15 2006-11-24 엘지.필립스 엘시디 주식회사 액정 표시 장치용 어레이 기판 및 그의 제조 방법
KR100518051B1 (ko) 2001-01-11 2005-09-28 엔이씨 엘씨디 테크놀로지스, 엘티디. 능동 매트릭스형 액정 디스플레이 장치와 그 제조 방법
JP4689851B2 (ja) 2001-02-23 2011-05-25 Ｎｅｃ液晶テクノロジー株式会社 アクティブマトリクス型液晶表示装置
KR100397671B1 (ko) 2001-03-07 2003-09-17 엘지.필립스 엘시디 주식회사 잉크젯 방식 컬러필터를 가지는 액정표시장치 및 그의제조방법
TWI248531B (en) * 2001-03-30 2006-02-01 Au Optronics Corp Flat panel display and method for forming the same
JP4523730B2 (ja) * 2001-03-30 2010-08-11 シャープ株式会社 液晶表示装置とその製造方法
JP2002365614A (ja) * 2001-06-04 2002-12-18 Nec Kagoshima Ltd 液晶表示装置の製造方法
JP4876341B2 (ja) * 2001-07-13 2012-02-15 日本電気株式会社 アクティブマトリクス基板及びその製造方法
KR101061850B1 (ko) * 2004-09-08 2011-09-02 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조방법

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US7632692B2 (en) 2009-12-15
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US20040195573A1 (en) 2004-10-07
JP2004310099A (ja) 2004-11-04
US7202498B2 (en) 2007-04-10
US20070164286A1 (en) 2007-07-19
CN1540426A (zh) 2004-10-27
CN100378555C (zh) 2008-04-02
TW200424719A (en) 2004-11-16

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