TWI360675B - Apparatus for manipulation of an optical element,p - Google Patents

Apparatus for manipulation of an optical element,p Download PDF

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Publication number
TWI360675B
TWI360675B TW093127443A TW93127443A TWI360675B TW I360675 B TWI360675 B TW I360675B TW 093127443 A TW093127443 A TW 093127443A TW 93127443 A TW93127443 A TW 93127443A TW I360675 B TWI360675 B TW I360675B
Authority
TW
Taiwan
Prior art keywords
actuator
component
force control
optical
force
Prior art date
Application number
TW093127443A
Other languages
English (en)
Chinese (zh)
Other versions
TW200519445A (en
Inventor
Michael Muehlbeyer
Johannes Lippert
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW200519445A publication Critical patent/TW200519445A/zh
Application granted granted Critical
Publication of TWI360675B publication Critical patent/TWI360675B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G02B7/1828—Motorised alignment using magnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/183—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors specially adapted for very large mirrors, e.g. for astronomy, or solar concentrators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Astronomy & Astrophysics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Sustainable Development (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW093127443A 2003-09-12 2004-09-10 Apparatus for manipulation of an optical element,p TWI360675B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50233403P 2003-09-12 2003-09-12

Publications (2)

Publication Number Publication Date
TW200519445A TW200519445A (en) 2005-06-16
TWI360675B true TWI360675B (en) 2012-03-21

Family

ID=34312383

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093127443A TWI360675B (en) 2003-09-12 2004-09-10 Apparatus for manipulation of an optical element,p

Country Status (7)

Country Link
US (3) US20070052301A1 (enExample)
EP (1) EP1664880A2 (enExample)
JP (2) JP5041810B2 (enExample)
KR (1) KR101129119B1 (enExample)
CN (1) CN1879046B (enExample)
TW (1) TWI360675B (enExample)
WO (1) WO2005026801A2 (enExample)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5041810B2 (ja) * 2003-09-12 2012-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子操作装置
WO2005083487A1 (en) 2004-02-26 2005-09-09 Carl Zeiss Smt Ag Housing structure
US7738193B2 (en) 2004-06-29 2010-06-15 Carl Zeiss Smt Ag Positioning unit and alignment device for an optical element
EP1981066B1 (en) * 2006-01-30 2014-01-22 Nikon Corporation Optical member holding apparatus and exposure apparatus
EP1882983A1 (en) * 2006-07-25 2008-01-30 Carl Zeiss SMT AG Gravity compensating support for an optical element
DE102007047109A1 (de) 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
DE102008054581A1 (de) 2008-02-29 2009-09-03 Carl Zeiss Smt Ag Projektionssystem für eine Projektionsbelichtungsanlage sowie Komponentenhalterung, Retikel-Halteeinrichtung und Wafer-Halteeinrichtung für ein derartiges Projektionssystem
FR2933782B1 (fr) * 2008-07-11 2010-08-13 Thales Sa Dispositif de correction des defauts optiques d'un miroir de telescope
DE102009034166A1 (de) * 2008-08-11 2010-02-18 Carl Zeiss Smt Ag Kontaminationsarme optische Anordnung
DE102009033818A1 (de) 2008-09-19 2010-03-25 Carl Zeiss Smt Ag Temperiervorrichtung für eine optische Baugruppe
JP5134732B2 (ja) * 2008-10-31 2013-01-30 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系
KR101644213B1 (ko) 2009-09-08 2016-07-29 칼 짜이스 에스엠테 게엠베하 낮은 표면 형상 변형을 갖는 광학 요소
DE102010028941B4 (de) * 2010-05-12 2012-03-22 Carl Zeiss Smt Gmbh Vorrichtung für eine optische Anordnung und Verfahren zum Positionieren eines optischen Elements einer optischen Anordnung
DE102011079072A1 (de) 2010-07-26 2012-03-15 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zur Aktuierung eines optischen Elementes
CN103038708B (zh) 2010-07-30 2016-08-17 卡尔蔡司Smt有限责任公司 Euv曝光设备
FR2967742B1 (fr) * 2010-11-23 2013-11-22 Astrium Sas Dispositif d'isolation vibratoire
WO2012084675A1 (en) 2010-12-20 2012-06-28 Carl Zeiss Smt Gmbh Arrangement for mounting an optical element
DE102011004299A1 (de) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
DE102011082994A1 (de) 2011-09-20 2013-03-21 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
WO2012110406A1 (en) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optical mount and euv exposure apparatus
KR101660140B1 (ko) 2011-10-07 2016-09-26 칼 짜이스 에스엠테 게엠베하 리소그래피 시스템에서 광학적 요소의 이동을 제어하기 위한 방법
DE102011086513A1 (de) 2011-11-16 2013-05-16 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
DE102012202167A1 (de) * 2012-02-14 2013-08-14 Carl Zeiss Smt Gmbh Vorrichtung zur magnetfeldkompensierten Positionierung eines Bauelements
NL2011276A (en) * 2012-09-06 2014-03-10 Asml Netherlands Bv Inspection method and apparatus and lithographic processing cell.
RU2642907C2 (ru) 2012-10-05 2018-01-29 Конинклейке Филипс Н.В. Поворотное устройство позиционирования
US20140133897A1 (en) * 2012-11-12 2014-05-15 Micheal Brendan O Ceallaigh Flexurally mounted kinematic coupling with improved repeatability
DE102013201082A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013203032A1 (de) 2013-02-25 2014-02-27 Carl Zeiss Smt Gmbh Optische Anordnung mit einem optischen Element und einem zusätzlichen Wärmeleitelement
DE102013204317B4 (de) 2013-03-13 2015-07-23 Carl Zeiss Smt Gmbh Baugruppe einer mikrolithographischen Projektionsbelichtungsanlage
DE102013204305A1 (de) * 2013-03-13 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines Elementes in einem optischen System
WO2015098120A1 (ja) * 2013-12-27 2015-07-02 パナソニックＩｐマネジメント株式会社 光学部材駆動装置及び投写型映像表示装置
NL1040605C2 (en) * 2014-01-15 2015-07-16 Janssen Prec Engineering Electromagnetically actuated hexapod for nanometric positioning.
NL1040702B1 (en) * 2014-03-04 2015-10-27 Janssen Prec Eng Cryo hexapod positioning system.
KR20160144491A (ko) 2014-04-17 2016-12-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
DE102015201255A1 (de) 2015-01-26 2016-03-10 Carl Zeiss Smt Gmbh Anordnung und Lithographieanlage mit Anordnung
US10471610B2 (en) 2015-06-16 2019-11-12 Samsung Electronics Co., Ltd. Robot arm having weight compensation mechanism
DE102015211286A1 (de) * 2015-06-18 2016-12-22 Carl Zeiss Smt Gmbh Abbildungssystem und verfahren
DE102015217119A1 (de) 2015-09-08 2017-03-09 Carl Zeiss Smt Gmbh Elektromagnetischer Antrieb mit einem Stator und einem Statorhalter
DE102015220494A1 (de) 2015-10-21 2016-10-06 Carl Zeiss Smt Gmbh Tauchspulenaktuator
DE102015225537B4 (de) 2015-12-17 2019-11-14 Carl Zeiss Smt Gmbh Vorrichtung zur Ausrichtung eines Bauteils, Betätigungseinrichtung und Projektionsbelichtungsanlage
WO2017207016A1 (en) * 2016-05-30 2017-12-07 Carl Zeiss Smt Gmbh Optical imaging arrangement with a piezoelectric device
US11681100B2 (en) 2016-09-30 2023-06-20 3Sae Technologies, Inc. Multi-axis positioner
CN110191784B (zh) 2016-09-30 2023-10-20 3Sae技术有限公司 多轴相对定位台
DE102016226085A1 (de) 2016-12-22 2017-03-02 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
DE102017206494A1 (de) 2017-04-18 2017-06-14 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102017207763A1 (de) 2017-05-09 2018-04-19 Carl Zeiss Smt Gmbh Gelenkanordnung für ein optisches Element, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102017209794B4 (de) 2017-06-09 2023-05-17 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Ausrichtung eines optischen Elements, sowie Projektionsbelichtungsanlage
CN107145040B (zh) * 2017-06-30 2019-04-02 中国科学院长春光学精密机械与物理研究所 光学元件运动学支撑装置、投影物镜和光刻机
DE102017212773A1 (de) 2017-07-25 2019-01-31 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
CN108227110A (zh) * 2018-01-30 2018-06-29 中国科学院上海技术物理研究所 一种反射镜调节与固定装置
DE102018216964A1 (de) 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Aktuatoreinrichtung zur Ausrichtung eines Elements, Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Ausrichtung eines Elements
DE102018216934A1 (de) 2018-10-02 2019-09-05 Carl Zeiss Smt Gmbh Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102018219375A1 (de) 2018-11-13 2019-01-03 Carl Zeiss Smt Gmbh Lastabtragende Haltestruktur
CN109696752B (zh) * 2019-01-31 2021-05-18 华中科技大学苏州脑空间信息研究院 光学元器件的全自由度调节装置及其重复定位方法
CN109765937B (zh) * 2019-01-31 2021-12-21 华中科技大学苏州脑空间信息研究院 全自由度调节的扫描装置及运动建模方法及控制方法
DE102019202868A1 (de) 2019-03-04 2020-09-10 Carl Zeiss Smt Gmbh Aktuatoreinrichtung und Verfahren zur Ausrichtung eines optischen Elements, optische Baugruppe sowie Projektionsbelichtungsanlage
DE102020205306A1 (de) 2020-04-27 2021-10-28 Carl Zeiss Smt Gmbh Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
CA3193476A1 (en) * 2020-09-23 2022-03-31 Robert Wiley Multi-axis positioner
KR20240121317A (ko) * 2021-12-16 2024-08-08 어플라이드 머티어리얼스, 인코포레이티드 디지털 포토리소그래피 시스템, 그의 구성요소들 및 관련 방법들
CN115980962A (zh) * 2022-11-30 2023-04-18 中国科学院长春光学精密机械与物理研究所 一种聚光结构、装置以及系统
DE102024204660A1 (de) * 2024-05-21 2025-11-27 Carl Zeiss Smt Gmbh Optische Baugruppe, Verfahren zur Integration der optischen Baugruppe und Projektionsbelichtungsanlage

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4726671A (en) * 1986-06-19 1988-02-23 The Perkin-Elmer Corporation High resonance adjustable mirror mount
JP2878955B2 (ja) * 1993-04-08 1999-04-05 日立金属株式会社 高精度リニアモータ
EP0642084A1 (de) * 1993-08-04 1995-03-08 Siemens Aktiengesellschaft Integrierte Logikschaltung mit Testmöglichkeit
DE4329928A1 (de) * 1993-09-04 1995-03-09 Zeiss Carl Fa Spiegelstützsystem mit Kraftmeßzellen
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
DE29607680U1 (de) * 1996-04-27 1996-06-20 Carl Zeiss Jena Gmbh, 07745 Jena Anordnung zur Verringerung der Crashgefahr bei universellen Positioniersystemen
JP3678887B2 (ja) 1997-03-18 2005-08-03 株式会社リコー 三次元形状測定装置
FR2761486B1 (fr) * 1997-03-28 1999-05-21 Centre Nat Etd Spatiales Dispositif de positionnement micrometrique d'un support d'element optique spatial selon six degres de liberte
FR2773890B1 (fr) * 1998-01-22 2001-11-23 Aerospatiale Ensemble integre et compact de montage isostatique et de correction de position d'un organe, tel qu'un miroir, d'un telescope spatial
JPH11251409A (ja) * 1998-03-02 1999-09-17 Nikon Corp 位置決め装置、及び露光装置
JPH11274031A (ja) * 1998-03-20 1999-10-08 Canon Inc 露光装置およびデバイス製造方法ならびに位置決め装置
JPH11274301A (ja) 1998-03-23 1999-10-08 Nkk Corp メタル配線構造体
US5986827A (en) * 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
TW526630B (en) * 1998-11-10 2003-04-01 Asml Netherlands Bv Actuator and transducer
EP1001512A3 (en) 1998-11-10 2001-02-14 Asm Lithography B.V. Actuator and transducer
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
TW509823B (en) * 2000-04-17 2002-11-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2003532136A (ja) * 2000-04-25 2003-10-28 エーエスエムエル ユーエス，インコーポレイテッド 光学システムにおいてレンズを精密に配置および整列する装置、システム、および方法
KR100775796B1 (ko) 2000-08-18 2007-11-12 가부시키가이샤 니콘 광학소자 유지장치
JP4945864B2 (ja) * 2000-08-18 2012-06-06 株式会社ニコン 保持装置、光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
JP2002359170A (ja) * 2001-05-30 2002-12-13 Nikon Corp ステージ装置及び露光装置
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
US6543740B2 (en) * 2001-09-04 2003-04-08 National Research Council Of Canada Mechanism for transmitting movement in up to six degrees-of-freedom
TWI244119B (en) * 2001-11-07 2005-11-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6850675B1 (en) * 2002-02-04 2005-02-01 Siwave, Inc. Base, payload and connecting structure and methods of making the same
JP2003346359A (ja) * 2002-05-27 2003-12-05 Pioneer Electronic Corp レンズ駆動装置用コイル基板及びレンズ駆動装置
JP2004062091A (ja) * 2002-07-31 2004-02-26 Canon Inc 保持装置、露光装置及びデバイス製造方法
US7221463B2 (en) * 2003-03-14 2007-05-22 Canon Kabushiki Kaisha Positioning apparatus, exposure apparatus, and method for producing device
JP2004281654A (ja) * 2003-03-14 2004-10-07 Canon Inc 駆動機構及びそれを用いた露光装置、デバイスの製造方法
JP2004281644A (ja) * 2003-03-14 2004-10-07 Canon Inc 駆動機構及びそれを用いた露光装置、デバイスの製造方法
US7281808B2 (en) * 2003-06-21 2007-10-16 Qortek, Inc. Thin, nearly wireless adaptive optical device
JP4649136B2 (ja) * 2003-07-31 2011-03-09 キヤノン株式会社 アクチュエータ、露光装置及びデバイス製造方法
JP2005072221A (ja) * 2003-08-25 2005-03-17 Nikon Corp 露光装置及びその調整方法
JP5041810B2 (ja) * 2003-09-12 2012-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子操作装置
US20070284502A1 (en) * 2006-06-13 2007-12-13 Nikon Corporation Hexapod kinematic mountings for optical elements, and optical systems comprising same

Also Published As

Publication number Publication date
CN1879046A (zh) 2006-12-13
US20070052301A1 (en) 2007-03-08
JP5041810B2 (ja) 2012-10-03
JP5779545B2 (ja) 2015-09-16
KR101129119B1 (ko) 2012-03-26
CN1879046B (zh) 2010-07-14
JP2012190041A (ja) 2012-10-04
US20090050776A1 (en) 2009-02-26
KR20070019642A (ko) 2007-02-15
WO2005026801A2 (en) 2005-03-24
US20100157270A1 (en) 2010-06-24
JP2007505345A (ja) 2007-03-08
EP1664880A2 (en) 2006-06-07
TW200519445A (en) 2005-06-16
US8179621B2 (en) 2012-05-15
WO2005026801A3 (en) 2005-06-16

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