CN1879046B - 光学元件操纵仪 - Google Patents

光学元件操纵仪 Download PDF

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Publication number
CN1879046B
CN1879046B CN2004800333165A CN200480033316A CN1879046B CN 1879046 B CN1879046 B CN 1879046B CN 2004800333165 A CN2004800333165 A CN 2004800333165A CN 200480033316 A CN200480033316 A CN 200480033316A CN 1879046 B CN1879046 B CN 1879046B
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CN
China
Prior art keywords
manipulator
optical element
optical
lorentz
force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2004800333165A
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English (en)
Chinese (zh)
Other versions
CN1879046A (zh
Inventor
M·米尔拜尔
J·科佩尔特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication date
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Publication of CN1879046A publication Critical patent/CN1879046A/zh
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Publication of CN1879046B publication Critical patent/CN1879046B/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G02B7/1828—Motorised alignment using magnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/183—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors specially adapted for very large mirrors, e.g. for astronomy, or solar concentrators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Astronomy & Astrophysics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Sustainable Development (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN2004800333165A 2003-09-12 2004-09-07 光学元件操纵仪 Expired - Fee Related CN1879046B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US50233403P 2003-09-12 2003-09-12
US60/502,334 2003-09-12
PCT/EP2004/009941 WO2005026801A2 (en) 2003-09-12 2004-09-07 Apparatus for manipulation of an optical element

Publications (2)

Publication Number Publication Date
CN1879046A CN1879046A (zh) 2006-12-13
CN1879046B true CN1879046B (zh) 2010-07-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2004800333165A Expired - Fee Related CN1879046B (zh) 2003-09-12 2004-09-07 光学元件操纵仪

Country Status (7)

Country Link
US (3) US20070052301A1 (enExample)
EP (1) EP1664880A2 (enExample)
JP (2) JP5041810B2 (enExample)
KR (1) KR101129119B1 (enExample)
CN (1) CN1879046B (enExample)
TW (1) TWI360675B (enExample)
WO (1) WO2005026801A2 (enExample)

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JP5041810B2 (ja) * 2003-09-12 2012-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子操作装置
WO2005083487A1 (en) 2004-02-26 2005-09-09 Carl Zeiss Smt Ag Housing structure
US7738193B2 (en) 2004-06-29 2010-06-15 Carl Zeiss Smt Ag Positioning unit and alignment device for an optical element
EP1981066B1 (en) * 2006-01-30 2014-01-22 Nikon Corporation Optical member holding apparatus and exposure apparatus
EP1882983A1 (en) * 2006-07-25 2008-01-30 Carl Zeiss SMT AG Gravity compensating support for an optical element
DE102007047109A1 (de) 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
DE102008054581A1 (de) 2008-02-29 2009-09-03 Carl Zeiss Smt Ag Projektionssystem für eine Projektionsbelichtungsanlage sowie Komponentenhalterung, Retikel-Halteeinrichtung und Wafer-Halteeinrichtung für ein derartiges Projektionssystem
FR2933782B1 (fr) * 2008-07-11 2010-08-13 Thales Sa Dispositif de correction des defauts optiques d'un miroir de telescope
DE102009034166A1 (de) * 2008-08-11 2010-02-18 Carl Zeiss Smt Ag Kontaminationsarme optische Anordnung
DE102009033818A1 (de) 2008-09-19 2010-03-25 Carl Zeiss Smt Ag Temperiervorrichtung für eine optische Baugruppe
JP5134732B2 (ja) * 2008-10-31 2013-01-30 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系
KR101644213B1 (ko) 2009-09-08 2016-07-29 칼 짜이스 에스엠테 게엠베하 낮은 표면 형상 변형을 갖는 광학 요소
DE102010028941B4 (de) * 2010-05-12 2012-03-22 Carl Zeiss Smt Gmbh Vorrichtung für eine optische Anordnung und Verfahren zum Positionieren eines optischen Elements einer optischen Anordnung
DE102011079072A1 (de) 2010-07-26 2012-03-15 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zur Aktuierung eines optischen Elementes
CN103038708B (zh) 2010-07-30 2016-08-17 卡尔蔡司Smt有限责任公司 Euv曝光设备
FR2967742B1 (fr) * 2010-11-23 2013-11-22 Astrium Sas Dispositif d'isolation vibratoire
WO2012084675A1 (en) 2010-12-20 2012-06-28 Carl Zeiss Smt Gmbh Arrangement for mounting an optical element
DE102011004299A1 (de) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
DE102011082994A1 (de) 2011-09-20 2013-03-21 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
WO2012110406A1 (en) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optical mount and euv exposure apparatus
KR101660140B1 (ko) 2011-10-07 2016-09-26 칼 짜이스 에스엠테 게엠베하 리소그래피 시스템에서 광학적 요소의 이동을 제어하기 위한 방법
DE102011086513A1 (de) 2011-11-16 2013-05-16 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
DE102012202167A1 (de) * 2012-02-14 2013-08-14 Carl Zeiss Smt Gmbh Vorrichtung zur magnetfeldkompensierten Positionierung eines Bauelements
NL2011276A (en) * 2012-09-06 2014-03-10 Asml Netherlands Bv Inspection method and apparatus and lithographic processing cell.
RU2642907C2 (ru) 2012-10-05 2018-01-29 Конинклейке Филипс Н.В. Поворотное устройство позиционирования
US20140133897A1 (en) * 2012-11-12 2014-05-15 Micheal Brendan O Ceallaigh Flexurally mounted kinematic coupling with improved repeatability
DE102013201082A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013203032A1 (de) 2013-02-25 2014-02-27 Carl Zeiss Smt Gmbh Optische Anordnung mit einem optischen Element und einem zusätzlichen Wärmeleitelement
DE102013204317B4 (de) 2013-03-13 2015-07-23 Carl Zeiss Smt Gmbh Baugruppe einer mikrolithographischen Projektionsbelichtungsanlage
DE102013204305A1 (de) * 2013-03-13 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines Elementes in einem optischen System
WO2015098120A1 (ja) * 2013-12-27 2015-07-02 パナソニックＩｐマネジメント株式会社 光学部材駆動装置及び投写型映像表示装置
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NL1040702B1 (en) * 2014-03-04 2015-10-27 Janssen Prec Eng Cryo hexapod positioning system.
KR20160144491A (ko) 2014-04-17 2016-12-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
DE102015201255A1 (de) 2015-01-26 2016-03-10 Carl Zeiss Smt Gmbh Anordnung und Lithographieanlage mit Anordnung
US10471610B2 (en) 2015-06-16 2019-11-12 Samsung Electronics Co., Ltd. Robot arm having weight compensation mechanism
DE102015211286A1 (de) * 2015-06-18 2016-12-22 Carl Zeiss Smt Gmbh Abbildungssystem und verfahren
DE102015217119A1 (de) 2015-09-08 2017-03-09 Carl Zeiss Smt Gmbh Elektromagnetischer Antrieb mit einem Stator und einem Statorhalter
DE102015220494A1 (de) 2015-10-21 2016-10-06 Carl Zeiss Smt Gmbh Tauchspulenaktuator
DE102015225537B4 (de) 2015-12-17 2019-11-14 Carl Zeiss Smt Gmbh Vorrichtung zur Ausrichtung eines Bauteils, Betätigungseinrichtung und Projektionsbelichtungsanlage
WO2017207016A1 (en) * 2016-05-30 2017-12-07 Carl Zeiss Smt Gmbh Optical imaging arrangement with a piezoelectric device
US11681100B2 (en) 2016-09-30 2023-06-20 3Sae Technologies, Inc. Multi-axis positioner
CN110191784B (zh) 2016-09-30 2023-10-20 3Sae技术有限公司 多轴相对定位台
DE102016226085A1 (de) 2016-12-22 2017-03-02 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
DE102017206494A1 (de) 2017-04-18 2017-06-14 Carl Zeiss Smt Gmbh Anordnung zur Halterung eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102017207763A1 (de) 2017-05-09 2018-04-19 Carl Zeiss Smt Gmbh Gelenkanordnung für ein optisches Element, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102017209794B4 (de) 2017-06-09 2023-05-17 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Ausrichtung eines optischen Elements, sowie Projektionsbelichtungsanlage
CN107145040B (zh) * 2017-06-30 2019-04-02 中国科学院长春光学精密机械与物理研究所 光学元件运动学支撑装置、投影物镜和光刻机
DE102017212773A1 (de) 2017-07-25 2019-01-31 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
CN108227110A (zh) * 2018-01-30 2018-06-29 中国科学院上海技术物理研究所 一种反射镜调节与固定装置
DE102018216964A1 (de) 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Aktuatoreinrichtung zur Ausrichtung eines Elements, Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Ausrichtung eines Elements
DE102018216934A1 (de) 2018-10-02 2019-09-05 Carl Zeiss Smt Gmbh Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102018219375A1 (de) 2018-11-13 2019-01-03 Carl Zeiss Smt Gmbh Lastabtragende Haltestruktur
CN109696752B (zh) * 2019-01-31 2021-05-18 华中科技大学苏州脑空间信息研究院 光学元器件的全自由度调节装置及其重复定位方法
CN109765937B (zh) * 2019-01-31 2021-12-21 华中科技大学苏州脑空间信息研究院 全自由度调节的扫描装置及运动建模方法及控制方法
DE102019202868A1 (de) 2019-03-04 2020-09-10 Carl Zeiss Smt Gmbh Aktuatoreinrichtung und Verfahren zur Ausrichtung eines optischen Elements, optische Baugruppe sowie Projektionsbelichtungsanlage
DE102020205306A1 (de) 2020-04-27 2021-10-28 Carl Zeiss Smt Gmbh Baugruppe, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
CA3193476A1 (en) * 2020-09-23 2022-03-31 Robert Wiley Multi-axis positioner
KR20240121317A (ko) * 2021-12-16 2024-08-08 어플라이드 머티어리얼스, 인코포레이티드 디지털 포토리소그래피 시스템, 그의 구성요소들 및 관련 방법들
CN115980962A (zh) * 2022-11-30 2023-04-18 中国科学院长春光学精密机械与物理研究所 一种聚光结构、装置以及系统
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JP5779545B2 (ja) 2015-09-16
TWI360675B (en) 2012-03-21
KR101129119B1 (ko) 2012-03-26
JP2012190041A (ja) 2012-10-04
US20090050776A1 (en) 2009-02-26
KR20070019642A (ko) 2007-02-15
WO2005026801A2 (en) 2005-03-24
US20100157270A1 (en) 2010-06-24
JP2007505345A (ja) 2007-03-08
EP1664880A2 (en) 2006-06-07
TW200519445A (en) 2005-06-16
US8179621B2 (en) 2012-05-15
WO2005026801A3 (en) 2005-06-16

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