TWI319509B - Formation of discontinuous films employing on template dispense during lithography processes - Google Patents

Formation of discontinuous films employing on template dispense during lithography processes

Info

Publication number
TWI319509B
TWI319509B TW094132622A TW94132622A TWI319509B TW I319509 B TWI319509 B TW I319509B TW 094132622 A TW094132622 A TW 094132622A TW 94132622 A TW94132622 A TW 94132622A TW I319509 B TWI319509 B TW I319509B
Authority
TW
Taiwan
Prior art keywords
template
formation
lithography processes
during lithography
discontinuous films
Prior art date
Application number
TW094132622A
Other languages
English (en)
Other versions
TW200604730A (en
Inventor
Choi Byung-Jin
J Meissl Mario
V Sreenivasan Sidlgata
P C Watts Michael
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/194,414 external-priority patent/US6900881B2/en
Priority claimed from US10/194,410 external-priority patent/US6908861B2/en
Priority claimed from US10/194,411 external-priority patent/US6932934B2/en
Priority claimed from US10/194,991 external-priority patent/US7077992B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of TW200604730A publication Critical patent/TW200604730A/zh
Application granted granted Critical
Publication of TWI319509B publication Critical patent/TWI319509B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
    • A61P31/04—Antibacterial agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pharmacology & Pharmacy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Oncology (AREA)
  • Communicable Diseases (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
TW094132622A 2002-07-11 2003-07-10 Formation of discontinuous films employing on template dispense during lithography processes TWI319509B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/194,414 US6900881B2 (en) 2002-07-11 2002-07-11 Step and repeat imprint lithography systems
US10/194,410 US6908861B2 (en) 2002-07-11 2002-07-11 Method for imprint lithography using an electric field
US10/194,411 US6932934B2 (en) 2002-07-11 2002-07-11 Formation of discontinuous films during an imprint lithography process
US10/194,991 US7077992B2 (en) 2002-07-11 2002-07-11 Step and repeat imprint lithography processes

Publications (2)

Publication Number Publication Date
TW200604730A TW200604730A (en) 2006-02-01
TWI319509B true TWI319509B (en) 2010-01-11

Family

ID=31892234

Family Applications (5)

Application Number Title Priority Date Filing Date
TW092118883A TWI289731B (en) 2002-07-11 2003-07-10 A system for forming a pattern on a substrate
TW092118881A TWI326797B (en) 2002-07-11 2003-07-10 Formation of discontinuous films during an imprint lithography process
TW092118862A TWI295227B (en) 2002-07-11 2003-07-10 Step and repeat imprint lithography process
TW092118873A TW200405138A (en) 2002-07-11 2003-07-10 Method and system for imprint lithography using an electric field
TW094132622A TWI319509B (en) 2002-07-11 2003-07-10 Formation of discontinuous films employing on template dispense during lithography processes

Family Applications Before (4)

Application Number Title Priority Date Filing Date
TW092118883A TWI289731B (en) 2002-07-11 2003-07-10 A system for forming a pattern on a substrate
TW092118881A TWI326797B (en) 2002-07-11 2003-07-10 Formation of discontinuous films during an imprint lithography process
TW092118862A TWI295227B (en) 2002-07-11 2003-07-10 Step and repeat imprint lithography process
TW092118873A TW200405138A (en) 2002-07-11 2003-07-10 Method and system for imprint lithography using an electric field

Country Status (8)

Country Link
EP (2) EP2388119B1 (zh)
JP (2) JP2005533393A (zh)
KR (1) KR100963510B1 (zh)
CN (2) CN101710228B (zh)
AU (1) AU2003253862A1 (zh)
MY (2) MY144124A (zh)
TW (5) TWI289731B (zh)
WO (1) WO2004016406A1 (zh)

Families Citing this family (113)

* Cited by examiner, † Cited by third party
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KR101678056B1 (ko) 2010-09-16 2016-11-22 삼성디스플레이 주식회사 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
KR101723506B1 (ko) 2010-10-22 2017-04-19 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
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KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치
KR101923174B1 (ko) 2011-05-11 2018-11-29 삼성디스플레이 주식회사 정전 척, 상기 정전 척을 포함하는 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
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