TWI275120B - Discharge vessel with excimer fill, and associated discharge lamp - Google Patents
Discharge vessel with excimer fill, and associated discharge lamp Download PDFInfo
- Publication number
- TWI275120B TWI275120B TW091115822A TW91115822A TWI275120B TW I275120 B TWI275120 B TW I275120B TW 091115822 A TW091115822 A TW 091115822A TW 91115822 A TW91115822 A TW 91115822A TW I275120 B TWI275120 B TW I275120B
- Authority
- TW
- Taiwan
- Prior art keywords
- discharge
- bottle
- layer
- discharge bottle
- lamp
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000002161 passivation Methods 0.000 claims abstract description 14
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 9
- 150000002367 halogens Chemical class 0.000 claims abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 4
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 17
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
- 239000011737 fluorine Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 238000005253 cladding Methods 0.000 claims description 7
- 239000011261 inert gas Substances 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 238000003980 solgel method Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000002243 precursor Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 108010025899 gelatin film Proteins 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229930013930 alkaloid Natural products 0.000 claims 1
- 150000003797 alkaloid derivatives Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 229910052756 noble gas Inorganic materials 0.000 abstract 1
- 229910052706 scandium Inorganic materials 0.000 abstract 1
- 229910052727 yttrium Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 46
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 13
- 230000005855 radiation Effects 0.000 description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 230000005284 excitation Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052746 lanthanum Inorganic materials 0.000 description 6
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052684 Cerium Inorganic materials 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 206010036790 Productive cough Diseases 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 210000003802 sputum Anatomy 0.000 description 2
- 208000024794 sputum Diseases 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
- H01J61/827—Metal halide arc lamps
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/125—Selection of substances for gas fillings; Specified operating pressure or temperature having an halogenide as principal component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10137015A DE10137015A1 (de) | 2001-07-30 | 2001-07-30 | Entladungsgefäß mit Excimerfüllung und zugehörige Entladungslampe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI275120B true TWI275120B (en) | 2007-03-01 |
Family
ID=7693545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091115822A TWI275120B (en) | 2001-07-30 | 2002-07-16 | Discharge vessel with excimer fill, and associated discharge lamp |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6734629B2 (https=) |
| EP (1) | EP1282153A3 (https=) |
| JP (1) | JP4340047B2 (https=) |
| KR (1) | KR100942846B1 (https=) |
| CA (1) | CA2396018A1 (https=) |
| DE (1) | DE10137015A1 (https=) |
| TW (1) | TWI275120B (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7268355B2 (en) | 2002-12-27 | 2007-09-11 | Franek Olstowski | Excimer UV fluorescence detection |
| DE10350114B4 (de) * | 2003-10-28 | 2006-01-12 | Tuilaser Ag | Optisches Element sowie Excimerlaser mit optischem Element |
| WO2006017644A2 (en) * | 2004-08-03 | 2006-02-16 | Franek Olstowski | Improved closed-loop light intensity control and related fluorescence application method |
| KR100706184B1 (ko) * | 2005-12-26 | 2007-04-12 | 주식회사 디엠에스 | 형광램프 및 이의 제조방법 |
| DE102006028749A1 (de) * | 2006-06-20 | 2007-12-27 | Universität Bielefeld | Verfahren zur Herstellung einer transparenten Aluminiumoxid-Schutzschicht auf einem Glassubstrat |
| JP2008146906A (ja) * | 2006-12-07 | 2008-06-26 | Toshiba Corp | 紫外線発生装置 |
| JP4424394B2 (ja) * | 2007-08-31 | 2010-03-03 | ウシオ電機株式会社 | エキシマランプ |
| DE102007046343A1 (de) | 2007-09-27 | 2009-04-02 | Osram Gesellschaft mit beschränkter Haftung | Verfahren zum Verbinden eines Entladungsgefäßes einer Entladungslampe mit einem Rohrstück, insbesondere einem Pumprohr |
| JP4462448B2 (ja) * | 2007-12-29 | 2010-05-12 | ウシオ電機株式会社 | エキシマランプ |
| DE102008009029A1 (de) | 2008-02-14 | 2009-08-20 | Osram Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines Entladungsgefäßes für eine Entladungslampe |
| JP5223443B2 (ja) * | 2008-04-28 | 2013-06-26 | ウシオ電機株式会社 | ＡｒＦエキシマランプ |
| JP2010198977A (ja) * | 2009-02-26 | 2010-09-09 | Seiko Epson Corp | 放電ランプ及びその製造方法、光源装置、プロジェクタ |
| DE102009014425B4 (de) * | 2009-03-26 | 2011-02-03 | Heraeus Noblelight Gmbh | Deuteriumlampe |
| JP5741603B2 (ja) * | 2013-01-30 | 2015-07-01 | ウシオ電機株式会社 | エキシマランプ |
| CA2944903A1 (en) | 2014-04-24 | 2015-10-29 | Dana-Farber Cancer Institute, Inc. | Tumor suppressor and oncogene biomarkers predictive of anti-immune checkpoint inhibitor response |
| BR112019026983B1 (pt) * | 2017-06-20 | 2022-02-01 | General Fusion Inc | Isolante elétrico compatível a vácuo e sistema de plasma |
| RU208591U1 (ru) * | 2020-12-02 | 2021-12-24 | Игорь Георгиевич Рудой | Газоразрядная лампа ультрафиолетового диапазона спектра |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3821585A (en) * | 1973-04-30 | 1974-06-28 | Westinghouse Electric Corp | Tungsten halogen incandescent lamp with group iva metal getter and method of manufacture |
| US4256988A (en) * | 1977-01-17 | 1981-03-17 | Thorn Lighting Limited | Incandescent halogen lamp with protective envelope coating |
| US4363998A (en) * | 1981-05-19 | 1982-12-14 | Westinghouse Electric Corp. | Fluorescent lamp processing which improves performance of zinc silicate phosphor used therein |
| NL8202778A (nl) * | 1982-07-09 | 1984-02-01 | Philips Nv | Lagedrukkwikdampontladingslamp. |
| CH672380A5 (en) | 1987-01-27 | 1989-11-15 | Bbc Brown Boveri & Cie | Reduce darkening of mercury vapour UV tube - using hafnium, lanthanum, thorium or aluminium oxide coating |
| JPH01211854A (ja) * | 1988-02-19 | 1989-08-25 | Mitsubishi Electric Corp | ラピッドスタート型蛍光ランプ |
| US5270615A (en) | 1991-11-22 | 1993-12-14 | General Electric Company | Multi-layer oxide coating for high intensity metal halide discharge lamps |
| US5218269A (en) * | 1991-11-29 | 1993-06-08 | Gte Products Corporation | Negative glow discharge lamp having wire anode |
| US5258689A (en) * | 1991-12-11 | 1993-11-02 | General Electric Company | Fluorescent lamps having reduced interference colors |
| JP3189481B2 (ja) * | 1993-03-19 | 2001-07-16 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| BE1007440A3 (nl) | 1993-08-20 | 1995-06-13 | Philips Electronics Nv | Lagedrukkwikdampontladingslamp. |
| US5473226A (en) * | 1993-11-16 | 1995-12-05 | Osram Sylvania Inc. | Incandescent lamp having hardglass envelope with internal barrier layer |
| JP3087565B2 (ja) * | 1994-03-30 | 2000-09-11 | ウシオ電機株式会社 | 誘電体バリア放電ランプ |
| US6027792A (en) * | 1995-10-03 | 2000-02-22 | Kabushiki Kaisha Kobe Seiko Sho | Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same |
| US5898265A (en) | 1996-05-31 | 1999-04-27 | Philips Electronics North America Corporation | TCLP compliant fluorescent lamp |
| JPH10139480A (ja) * | 1996-10-31 | 1998-05-26 | Toshiba Ceramics Co Ltd | アルミナ被覆石英ガラス及びその製造方法並びに半導体製造装置用部品 |
| HU224147B1 (hu) * | 1997-03-21 | 2005-05-30 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH. | Lapos fénycső háttérvilágításhoz, valamint ilyen fénycsövet tartalmazó világítási rendszer és LCD kijelzős készülék |
| IT1306214B1 (it) | 1998-09-09 | 2001-05-30 | Gel Design And Engineering Srl | Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti. |
| US6130512A (en) * | 1999-08-25 | 2000-10-10 | College Of William & Mary | Rf capacitively-coupled electrodeless light source |
| DE19953533A1 (de) | 1999-11-05 | 2001-05-10 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Elektrodenhalterung |
| EP1099962B1 (en) * | 1999-11-10 | 2005-01-05 | Denglas Technologies, LLC | Niobium oxide-based layers for thin film optical coatings and processes for producing the same |
-
2001
- 2001-07-30 DE DE10137015A patent/DE10137015A1/de not_active Ceased
-
2002
- 2002-07-10 EP EP02015380A patent/EP1282153A3/de not_active Ceased
- 2002-07-16 TW TW091115822A patent/TWI275120B/zh not_active IP Right Cessation
- 2002-07-29 KR KR1020020044615A patent/KR100942846B1/ko not_active Expired - Fee Related
- 2002-07-29 CA CA002396018A patent/CA2396018A1/en not_active Abandoned
- 2002-07-30 JP JP2002221343A patent/JP4340047B2/ja not_active Expired - Fee Related
- 2002-07-30 US US10/207,129 patent/US6734629B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1282153A2 (de) | 2003-02-05 |
| KR100942846B1 (ko) | 2010-02-17 |
| KR20030011659A (ko) | 2003-02-11 |
| DE10137015A1 (de) | 2003-02-20 |
| CA2396018A1 (en) | 2003-01-30 |
| US6734629B2 (en) | 2004-05-11 |
| EP1282153A3 (de) | 2006-04-19 |
| JP2003059457A (ja) | 2003-02-28 |
| JP4340047B2 (ja) | 2009-10-07 |
| US20030020407A1 (en) | 2003-01-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI275120B (en) | Discharge vessel with excimer fill, and associated discharge lamp | |
| EP1120817B1 (en) | Use of a corrosion-resistant member | |
| EP0506391B1 (en) | Use of a corrosion-resistant member formed from aluminium nitride | |
| US4983255A (en) | Process for removing metallic ions from items made of glass or ceramic materials | |
| TW201026632A (en) | Protective coatings resistant to reactive plasma processing | |
| JP2002338388A (ja) | ダイヤモンドコート部材 | |
| KR19990013565A (ko) | 내식성 부재, 웨이퍼 설치 부재 및 내식성 부재의 제조 방법 | |
| TW200941540A (en) | Excimer lamp | |
| JP2007214540A (ja) | 耐腐食性ヒータとそのアセンブリ | |
| TWI248130B (en) | Semiconductor or liquid crystal manufacturing apparatus | |
| JP3071933B2 (ja) | 解離したハロゲン系腐蝕性ガスに対する耐蝕性部材およびその製造方法 | |
| JP2002033079A (ja) | 電灯の製造方法 | |
| WO2011104904A1 (ja) | 加圧式ランプアニール装置、薄膜の製造方法及び加圧式ランプアニール装置の使用方法 | |
| JP3623054B2 (ja) | プラズマプロセス装置用部材 | |
| JP2533679B2 (ja) | 盤状セラミックスヒ―タ―及びその製造方法 | |
| TWI360150B (https=) | ||
| US20230167543A1 (en) | Method for fabricating chamber parts | |
| JP3078671B2 (ja) | 耐蝕性部材、その使用方法およびその製造方法 | |
| JP2003179043A (ja) | プラズマｃｖｄ装置 | |
| KR20020067640A (ko) | 다이아몬드 코팅 부재 | |
| JP3133961B2 (ja) | 耐蝕性部材、その使用方法およびその製造方法 | |
| Wei et al. | Dysprosium oxide ceramic arc tube for HID lamps | |
| JPH04181725A (ja) | 半導体ウエハー加熱用セラミックスヒーター | |
| JP2000040846A (ja) | 誘電材料で覆われたセラミックインシュレ―タを組込んだレ―ザチャンバ | |
| JP2002110558A (ja) | 基板処理装置および基板処理方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |