TWI253603B - Organic EL panel - Google Patents

Organic EL panel Download PDF

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TWI253603B
TWI253603B TW093126145A TW93126145A TWI253603B TW I253603 B TWI253603 B TW I253603B TW 093126145 A TW093126145 A TW 093126145A TW 93126145 A TW93126145 A TW 93126145A TW I253603 B TWI253603 B TW I253603B
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organic
electric field
organic electric
electrode
line
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TW093126145A
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TW200512697A (en
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Shoichiro Matsumoto
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Sanyo Electric Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/351Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels comprising more than three subpixels, e.g. red-green-blue-white [RGBW]
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/04Structural and physical details of display devices
    • G09G2300/0439Pixel structures
    • G09G2300/0452Details of colour pixel setup, e.g. pixel composed of a red, a blue and two green components
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • G09G2300/0842Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Geometry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Description

1253603 九、發明說明: 【發明所屬之技術領域】 …一本么明係有關於使至少具有有機發光層之有機電場發 光兀件王订列狀配置於一對電極間而成之有機電場發光面 板。 【先前技術】 、、 以來,有機電場發光(以下稱£L)顯示器係作為取 ,液日日‘,、、員不态之次世代的平面顯示器之一而受到矚目。此 顯示面板(以下稱有機EL面板),可藉由變更使用於各晝素 之有機發光層的發光材料’而決定各晝素之發光色。因此, 使各晝素之發光色互異,而可進行rgb顯示。 如上述之有機肛面板中,I進行明亮顯示,只要增 =供給至各有機EL元件之電流量即可。然而,增加電流 置的話’、會有使有機EL元件之壽命對應縮短之問題。因 f要f將各晝素中的發光領域之面積(開口率)盡可能地 去大藉由提兩開口率,可在將流通於有機元件之電 〜抑制於較小值之同時,進行明亮的顯示。 (專利文獻1) 【發明内容】 曰本特開2001-290441號公報 (發明所欲解決之課題) 在此提回開口率係指提高各畫素中有機EL元件之 =領域所佔的比例。主動型有機EL面板中,各書素敦 驅動有機紅元件之最少兩個的TFT,尤其用以控 制對於有機EL元件的驅動電流之驅動所,係電性地配 316235 5 1253603 與有機EL元件中間, =在接近電源収有機EL7t : 该驅動TFT係依照問極電麗,讀。另一方面, 流,且成為間極長度很長之構/制有機EL元件之驅動電 配置困難之問題。尤並3, 因此,有該驅動TFT之 位於驅動TFT兩端之;二動TFT之閉極線必須繞過 有該配線導致開電極之— (用以解決課題之手段) 列狀=機發光層之有機虹元件呈行 二:::線之電流供給至前述有機ε“件之驅動電晶 :體】形Γ大之半導體層,且在該半 域與汲極領域之中間部,極領域’並在源極領 致L字形之半導體層二邊狀延伸於前述大 域。 社之閘極電極所覆蓋之通道領
Hz好^電源線係於行方向延伸,前述半導體 部份,與從該第, 延伸又,前述W在與㈣1份相同的方向 又,最好前述第-部份之前端部與前 前述第二部分與前述有機EL元件連接。 〜泉連接, 又,最好前述電源線具有向前述驅動電晶體側突出之 316235 6 1253603 犬出部’該突出部與前述第一部份透過接觸(contact)而相 連接。 (發明之效果) 如上所述’根據本發明,驅動電晶體具有彎曲成大致 L字形(L字形或倒L字形)形狀之半導體層。因而,其配置 之自由度提高,尤其可將閘極電極形成為直線狀,使閘極 電極之配線圖案單純化,而可提高開口率。 【實施方式】 以下,根據圖式說明本發明之實施形態。 第1圖係模式地顯示實施形態之構成。資料線DL·雖 對應1行晝素而:置1冑,但係在每隔!行之晝素行間各 配置兩條。又,電源線p L係設在未設置資料線D L之畫素 行間此外’閘極線GL係設於各晝素列間。 各晝素設有選擇TFT卜驅動TFT 2、保持電容3、以 及有機EL元件4。選擇TFT 1在本例中係p通道TFT,且 源極連接於資料線DL,汲極連接於驅動tft2之間極, 閘極連接於問極線GL。驅動TFT2在本例中係p通道 TFT,b且源極連接於電源線PL,汲極連接於有機El元件 4之陽極。有機EL元件4之陰極係接地。此外,驅動TFT 2之問極係連接保持電容3之—端,保持電容3之另 係連接於保持電容線SL。 因而’藉由將閘極線GL設為低準位⑹,該列之選擇 _仏至I導通购。在餘許’依序將該行之晝素資料 …、°订之資料線DL,藉此將驅動TFT 2之開極設定 316235 7 1253603 為畫素資料之電壓,且該電壓保持於 依照晝素資料之電流係從電 ' η ' ^ 至右_ 甩,原、、泉托經由驅動TFT2供仏 有件4,而進行按照畫素資料之發光。 B(藍二:白本刪態中,各晝素係分別以R(紅)、G(綠), (白)之四色發光,成為久〃- (strine)刑ι 风马各订以同一色發光之條咬 (如PC)型。本例中,r、b、g I文 叹疋成尺與b之書辛大 yj 辛最夫 —京大Μ見度)大致相同,〇之全 I取大,W之晝素最小。而 - 於R之查I y # 且,黾源線PL形成有··配置 趴K之畫素行與B之書 i罝 與w之晝素行之問之:插I間,以及配置於^之畫素行 金f扞盥R、 θ 頌。亦即,電源線PL係在 旦素仃與6之晝素行共用,扃Γ+去士 丁牡Κ之 共用。 在G之晝素行與界之晝素行 畫素之大小係根據有機Εϊ 定。并卢 , 兀件4之電流效率而決 此處,黾流效率係指每—單 外部量子效率。本實施彤^卜主^之务先篁,亦稱為 之最大電-曰二情形’係對應於利用於顯示 〜取穴包机1。亦即,有著 只丁 差之Ρ孫, 要取大電流越大電流效率越 產之關係。該電流效率係手越 料等而決定。 械兀件4之有機發光材 FT -,4-, 是乙兀件4之電流效率最高, 之有械EL凡件4之電流效 ° 的色平衡而必須對電产 _為了、、隹持全衫顯示中 面,由於有ϋ FT _ μ 邙巴加大電流1。另一方 田於有祛ELTC件4之壽命 有希望使夂开杜士认 f依电机抢度而定,因而 使σ凡件中的電流密度 效率越差的顏色之有機 因此’使電流 316235 8 1253603 EL元件4之電流密度保持—定。 :外’在電流效率最好之〜與最差之 一條電源線PL,在電产畤玄Λ ^ —京仃共用 條電源線PL。!^ It 之R、G之畫素行共用1 接近。電源線二二^線⑶巾的電流量將變得比較 右1 '、、’ 線見雖以最大電流量來決定,但線寬 可使而:’無法過大。如本實施形態之取得電流量的平衡, 電流供給。 的⑽里接近而可進行有效率的 以往之情形是必須針對各晝素行配置^夺 與1條資料線DL,且該箄而γ欠始^班 ’、、、袭 Μ規則置於各4素行間。根據 去、吊係在各配線線間設置4心左右之間隙。 ’⑧在-個畫素行間設置㈣電 源線孔之線寬為1〇 且1條- 源線PL加起來之寬产為24之^此種情形’兩條電 -為“夂千Λ "m。本實施形態中,將其統 :、W原線PL,此時可知線寬在…爪左右即可。 追疋由於雖將兩條電源線PL統一為ι條時,需要有· Γ,Γ卜絕對㈣來^必要的餘裕係就一條線的情形來決 疋在可以1但小線寬,此縮小的份與兩條線之間的間隙 之4心份加起來,共可減少的線寬。藉此,可減少 配線配置所需之面積,而可加大開口率。 另外,本實施形態中,雖電流效率為W、R、B、G之 順序’但依發光材料而定,亦可為不同的順序。此外,r、 G、B三色之情形,可對發光效率佳的r將電源線設為丨 條,而在比較差的G、B共用1條電源線。 316235 9 1253603 第2圖顯示具體的配置構成。選 層形成,且其閛極線证之—部份 係、由半導體 而形成祕電極lg。又,選擇抓〗之源^道領域上 由接觸(contact)而與上方之資料線沉連接=1 s係藉 域lei之半導體層依照原樣成為電容電極%外^及極領 電極3a相向配置有保持電兵此電谷 3。 口不)而形成保持電容 透過接觸(Contact) ’驅動TFT 2之 電極3a連接。該閘極電極 电合 狀延伸,日—" 請” 4、線pL平行且呈直線 L伸且一。卩伤配置於電源線PL之下方。 又,構成驅動TFT2之半導體層(圖中之2s、2c、2d =後述之符號2P),係形成為從設於自電_ L向晝素領域之内側突出的部分之接觸(contact)沿著上方 、伸後,以直角彎曲之L字形或倒L字形。而且,另—端 藉由接觸(_咖)而與位於上方之錢EL7^4之 接0 ^例中’驅動TFT 通道型,連接於電源線孔 之部分為源極’連接於有機EL元件4之陽極為汲極。此 外閘極电極係覆蓋半導體層之源極、沒極間之未推雜不 純物之通道領域而形成。 如上所述,藉由將驅動TFT 2設為L字形(或倒L字 形),可將閘極電極2g之至少一部分配置於電源線pL之下 側’而可利用電源線PL之下側空間以提高開口率。 又’與有機EL元件4之接觸(contact)(圖中2s附近) 316235 10 1253603 =畫Γ員域之内側,因此間極電極2g成為直線狀,可防 止開口干因閘極電極要繞過接觸(c〇mact)而減少。 J者,本實施形態中,由於將晝素領域之高度設為— 此可使閘極線GL成為直線。又,雖變更畫素領域 直Ϊ又為條紋型,而可使電源、線&及資料線沉成為 二再者,藉由變更晝素領域之内部的發光領域之形狀, 領域之有效率的配置。例如,〇之晝素中,由於 旦素«之寬度很寬,可將保持電容3設在選擇π”之 側方’使發光領域延伸至上方 “ 貝认伸至上方,而有效利用畫素領域。 此外,所有驅動TFT之大、执盔知门 之椹成▲ < &丄 口又為相同,並且與電源線
之構成也汉為相同。亦即’圖中與驅動TFT 2之電源線pL 之接觸點(接觸)以及與有機El ’、7 於上下方向同-位置,且為從之接觸點(接觸)係位 詈… 電源線此來看之相同之位 力置:,可容易地使各晝素中驅動τ„2之電流供給能 另外’第2圖中,有機; μ 丄 分以兩點制矣-彳* 中之透明電極的部 ^鏈線表不,但錢时易觀看_小顯示。 弟3圖係1畫素之發光領域與驅動TFT之部分構成 剖口面圖(第2圖之X_X剖面圖),顯示沿著L字形之驅動t 2主直角¥曲的線之剖面。在破璃基板%上全面 SiN與Si02之積層所構成之緩 乂 :):成一域)形成有多二:t 覆蓋主動層2ρ及緩衝層η品认人工 滑11而於全面形成閘極絕緣膜 11 316235 1253603 13 ’該閘極絕緣膜w备 _ Pa ^ ^ 、係例如和層Si〇2及SiN而形成。在 邊閘極%緣膜13上方,B *、s、, 且在通這領域2c之上形成有例如 由將不绅g ^ ^ °然後’將閘極電極2g作為遮罩,藉 由將不純物#雜至主動芦 極電極下方之中"^ ^而在該主動層^之位於閘 甲央邛刀形成未摻雜不純物之通道領域 ::::域2。兩側之經捧雜不純物之源極領域 然後’覆蓋閘極罐纟套替 成層間絕緣膜15,並在’思及閘極電極2g而於全面形 在°亥層間絕緣膜15内部之源極領域 2s、汲極領域2d之上部形成 一 配置在層間絕緣膜15上面„透過該接觸孔,形成 上面之源極電極53及汲極電極26。 所、fM (未圖示)連接於源極電極53。在此,如上 2述形权㈣TFT雖在本财 為 η 通道 TFT。 p < Ί~ ;J> J ^ 覆蓋層間絕緣膜1 s 平坦化膜17之上t置全面形成平坦化膜17,在該 透明電極61。W 有機ELit件4之陽極的功能之 成孙办 ,在汲極電極26上方之平坦化臈17形 烕貝牙该平坦化膜之桩奋 ^ 與透明電極61相連接。,透過該接觸孔,汲極電極26 層間絶緣胺15及平坦化膜17通 有機膜’但亦可利用TE0S等之無機膜 53、汲極電極26# / /原極電極 通常利㈣。⑽寺之金屬,而透明電極61則 在透明電極61之上形成有:形成於全面之電洞輸送層 316235 12 1253603 62;形成為比發光領域稍大之有機發 面之電子輸送層64所構成之有機層65 9 ,由形成於全 形成於全面之金屬製(例如銘)的對^電極:及作為陰極之 在透明電極61之週邊部分上 66。 形成有平坦化膜07,藉由#+ 、电/5别达層62之下方 領域限定為在透明電 61直接相接之部分,此部分成為發曰二:透::: 膜㈣通常利用丙稀樹脂等之有機 另
等之無機膜。 -丌了利用TEOS 另外,電洞輸送層62、有機發 64係使用通常利用於有機E 曰1子輸送層 光声63之封枓什之材抖’且依據有機發 1 63之材枓(通爷係接雜劑)而決定發光色 洞輸送層62使用NPB、在紅色之有機發光層63使用 TB層+而B、在綠色之有機發光層 、在藍色之有機發光層〇使用TBADN+TBP、 在電子輸送層64使用Alq3等。 如以上所述構成中,驅動TFT按照閉極電極 ^ 定電壓而導通(ON)時,炎白Φ、、/5細* 士上 又 )才木自电源線之電流即從透明電極61 流至對向電極66,且藉由此電流,於有機發光層63中激 起發光,此光通過透明電極6卜平坦化膜17、層間絕緣膜 15、閘極絕緣膜13、及玻璃基板3〇,向圖中的下方射出。 【圖式簡單說明】 第1圖係模式地顯示實施形態的平面構成之圖。 第2圖係顯示實施形態的平面構成之圖。 316235 13 1253603 第3圖係顯示實施形態之要部的剖面之圖。 【主要元件符號說明】 1 選擇TFT lc 通道領域 lg ' 2g 閘極電極 Is、2s 源極領域 2 驅動TFT 2d 汲極領域 2p 主動層 3 保持電容 3a 電容電極 4 有機EL元件 13 閘極絕緣膜 15 層間絕緣膜 17 ^ 67 平坦化膜 26 汲極電極 30 玻璃基板 53 源極電極 61 透明電極 62 電洞輸送層 63 有機發光層 64 電子輸送層 65 有基層 66 對向電極 DL 資料線 GL 閘極線 PL 電源線 14 316235

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1253603 申晴專利範圍: :有機電場發光面板’係使至 發光元件呈行列狀配置於—對電極f二之: 件之電流供給至前述有機電場發光元 體層,日日版,係具有彎曲成大致L字形形狀之半導 域 在及半導體層之兩端部形成有源極領域與汲極領 狀征^源極領域與汲極領域之中間部,形成有由呈直 狀延伸於前述大致^字 ’ 電極所覆蓋之通道領域。^叙邊上之間極 • 2睛專利範圍第i項之有機電場發光 述電源線係於行方向延伸, 八甲 份鱼體層係由沿著前述電源線延伸之第—部 3.如申曲成大致直角之第二部分所構成 ^專W心2項之有機電場發光面板,並中, U閉極電極在與前述第—部份相同的方向延伸。、; 請!:範圍第2項或第3項之有機電場發光面板 ;;w述弟—部份之前端部與前述電源線連接,前由 弟一部分與前述有機電場發光元件連接。 5] 口申請專利範圍第4項之有機電場發光面板,盆中, :=第有向:,述Γ動電晶體側突出之突出部,該. ”別述弟一部份透過接觸(c〇mact)而相連接。 3]6235 15
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