TWI224632B - Method of producing copper foil - Google Patents
Method of producing copper foil Download PDFInfo
- Publication number
- TWI224632B TWI224632B TW089112723A TW89112723A TWI224632B TW I224632 B TWI224632 B TW I224632B TW 089112723 A TW089112723 A TW 089112723A TW 89112723 A TW89112723 A TW 89112723A TW I224632 B TWI224632 B TW I224632B
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- Taiwan
- Prior art keywords
- coating
- oxide
- patent application
- scope
- metal
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 51
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 239000011889 copper foil Substances 0.000 title claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 110
- 238000000576 coating method Methods 0.000 claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 59
- 239000002184 metal Substances 0.000 claims abstract description 59
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 239000010949 copper Substances 0.000 claims abstract description 16
- 230000000694 effects Effects 0.000 claims abstract description 7
- 239000003792 electrolyte Substances 0.000 claims description 36
- 239000010410 layer Substances 0.000 claims description 34
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 28
- 239000010936 titanium Substances 0.000 claims description 26
- 229910052719 titanium Inorganic materials 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 23
- 239000011247 coating layer Substances 0.000 claims description 22
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 18
- 229910000510 noble metal Inorganic materials 0.000 claims description 18
- 150000004706 metal oxides Chemical class 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 15
- 239000000243 solution Substances 0.000 claims description 13
- 239000007921 spray Substances 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000010970 precious metal Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- -1 platinum group metal oxide Chemical class 0.000 claims description 7
- 108010010803 Gelatin Proteins 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229920000159 gelatin Polymers 0.000 claims description 6
- 239000008273 gelatin Substances 0.000 claims description 6
- 235000019322 gelatine Nutrition 0.000 claims description 6
- 235000011852 gelatine desserts Nutrition 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- 239000008151 electrolyte solution Substances 0.000 claims description 3
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052596 spinel Inorganic materials 0.000 claims description 3
- 239000011029 spinel Substances 0.000 claims description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 2
- 241001465754 Metazoa Species 0.000 claims description 2
- 239000002253 acid Chemical class 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 229910000410 antimony oxide Inorganic materials 0.000 claims description 2
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 2
- 239000003292 glue Substances 0.000 claims description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910000859 α-Fe Inorganic materials 0.000 claims description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims 1
- 229910003087 TiOx Inorganic materials 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- 229910000428 cobalt oxide Inorganic materials 0.000 claims 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims 1
- 239000002019 doping agent Substances 0.000 claims 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 1
- QLTVHIDRNYIVBR-UHFFFAOYSA-N lutetium(3+);borate Chemical compound [Lu+3].[O-]B([O-])[O-] QLTVHIDRNYIVBR-UHFFFAOYSA-N 0.000 claims 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 claims 1
- 229910000480 nickel oxide Inorganic materials 0.000 claims 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims 1
- 238000002161 passivation Methods 0.000 claims 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims 1
- 238000007788 roughening Methods 0.000 claims 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims 1
- 230000002411 adverse Effects 0.000 abstract description 3
- 238000004070 electrodeposition Methods 0.000 abstract description 2
- 239000000523 sample Substances 0.000 description 24
- 239000002585 base Substances 0.000 description 23
- 239000000758 substrate Substances 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- 238000001723 curing Methods 0.000 description 12
- 238000011049 filling Methods 0.000 description 9
- 229910052741 iridium Inorganic materials 0.000 description 9
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 238000012056 up-stream process Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000004876 x-ray fluorescence Methods 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 229910000457 iridium oxide Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000001680 brushing effect Effects 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000002079 cooperative effect Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
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- 210000002816 gill Anatomy 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
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- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
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- 239000010959 steel Substances 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- DZKDPOPGYFUOGI-UHFFFAOYSA-N tungsten(iv) oxide Chemical compound O=[W]=O DZKDPOPGYFUOGI-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- JXLWTLZBAJWNSG-UHFFFAOYSA-N CCCC[Ti] Chemical compound CCCC[Ti] JXLWTLZBAJWNSG-UHFFFAOYSA-N 0.000 description 1
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- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
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- 238000011416 infrared curing Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- IANUMTRPEYONHL-UHFFFAOYSA-N oxygen(2-) ruthenium(3+) titanium(4+) Chemical compound [O-2].[Ti+4].[Ru+3] IANUMTRPEYONHL-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
- C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
- C23F13/06—Constructional parts, or assemblies of cathodic-protection apparatus
- C23F13/08—Electrodes specially adapted for inhibiting corrosion by cathodic protection; Manufacture thereof; Conducting electric current thereto
- C23F13/12—Electrodes characterised by the material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14129999P | 1999-06-28 | 1999-06-28 | |
| US09/599,339 US6527939B1 (en) | 1999-06-28 | 2000-06-22 | Method of producing copper foil with an anode having multiple coating layers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI224632B true TWI224632B (en) | 2004-12-01 |
Family
ID=26838971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089112723A TWI224632B (en) | 1999-06-28 | 2000-06-28 | Method of producing copper foil |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6527939B1 (enExample) |
| JP (1) | JP2003503598A (enExample) |
| TW (1) | TWI224632B (enExample) |
| WO (1) | WO2001000905A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7247229B2 (en) * | 1999-06-28 | 2007-07-24 | Eltech Systems Corporation | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
| JP3458781B2 (ja) * | 1999-07-06 | 2003-10-20 | ダイソー株式会社 | 金属箔の製造方法 |
| US7258778B2 (en) * | 2003-03-24 | 2007-08-21 | Eltech Systems Corporation | Electrocatalytic coating with lower platinum group metals and electrode made therefrom |
| EP1620582B1 (en) * | 2003-05-07 | 2016-12-21 | De Nora Tech, Inc. | Smooth surface morphology anode coatings |
| ITMI20031542A1 (it) * | 2003-07-28 | 2005-01-29 | De Nora Elettrodi Spa | Anodo per processi elettrochimici |
| FR2909390B1 (fr) * | 2006-11-30 | 2009-12-11 | Electro Rech | Anode pour dispositif d'electrodeposition de revetements metalliques anticorrosion ou cosmetique quelconque sur une piece metallique |
| US8124556B2 (en) * | 2008-05-24 | 2012-02-28 | Freeport-Mcmoran Corporation | Electrochemically active composition, methods of making, and uses thereof |
| IT1391767B1 (it) * | 2008-11-12 | 2012-01-27 | Industrie De Nora Spa | Elettrodo per cella elettrolitica |
| US8038855B2 (en) * | 2009-04-29 | 2011-10-18 | Freeport-Mcmoran Corporation | Anode structure for copper electrowinning |
| TWI490371B (zh) * | 2009-07-28 | 2015-07-01 | Industrie De Nora Spa | 電解應用上的電極及其製法以及在電極表面上陽極釋氧之電解法和電冶法 |
| CN102443818B (zh) | 2010-10-08 | 2016-01-13 | 水之星公司 | 多层混合金属氧化物电极及其制造方法 |
| ITMI20110089A1 (it) * | 2011-01-26 | 2012-07-27 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
| JP2014517871A (ja) * | 2011-04-20 | 2014-07-24 | トプサー・フューエル・セル・アクチエゼルスカベット | ステンレス鋼のプレート又はシートの表面調整及び該表面上への層の適用、該方法によって製造されたインターコネクトプレート、及び燃料電池スタックにおける該インターコネクトプレートの使用 |
| WO2013018773A1 (ja) * | 2011-07-29 | 2013-02-07 | 古河電気工業株式会社 | 電解銅合金箔、その製造方法、それの製造に用いる電解液、それを用いた二次電池用負極集電体、二次電池及びその電極 |
| CA2859939A1 (en) * | 2011-12-26 | 2013-07-04 | Industrie De Nora S.P.A. | High-load durable anode for oxygen generation and manufacturing method for the same |
| JP5686457B2 (ja) * | 2011-12-26 | 2015-03-18 | ペルメレック電極株式会社 | 酸素発生用陽極の製造方法 |
| CA2859936C (en) * | 2011-12-26 | 2020-11-17 | Industrie De Nora S.P.A. | Anode for oxygen generation and manufacturing method for the same |
| CN102515315A (zh) * | 2011-12-30 | 2012-06-27 | 南京大学 | 一种阳极电极材料、其制备方法及在电化学氧化处理含酚废水中的应用和工作方法 |
| CN109534457B (zh) * | 2014-07-10 | 2021-12-14 | 加州理工学院 | 电解电极 |
| CN106521564A (zh) * | 2016-10-27 | 2017-03-22 | 建滔（连州）铜箔有限公司 | 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺 |
| CN108017120A (zh) * | 2017-12-05 | 2018-05-11 | 淮南师范学院 | 一种采用新型阳极电催化氧化处理苯酚有机废水的方法 |
| IT201800006544A1 (it) * | 2018-06-21 | 2019-12-21 | Anodo per evoluzione elettrolitica di cloro | |
| US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| IT201800007835A1 (it) | 2018-08-03 | 2020-02-03 | Industrie De Nora Spa | Elettrodo per la galvanotecnica o l’elettrodeposizione di un metallo |
| WO2020264112A1 (en) | 2019-06-25 | 2020-12-30 | California Institute Of Technology | Reactive electrochemical membrane for wastewater treatment |
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| NL122179C (enExample) | 1959-02-06 | 1966-12-15 | ||
| GB964913A (en) | 1961-07-06 | 1964-07-29 | Henri Bernard Beer | A method of chemically plating base layers with precious metals |
| GB1195871A (en) | 1967-02-10 | 1970-06-24 | Chemnor Ag | Improvements in or relating to the Manufacture of Electrodes. |
| US3933616A (en) | 1967-02-10 | 1976-01-20 | Chemnor Corporation | Coating of protected electrocatalytic material on an electrode |
| US3778307A (en) | 1967-02-10 | 1973-12-11 | Chemnor Corp | Electrode and coating therefor |
| US3840443A (en) | 1967-02-10 | 1974-10-08 | Chemnor Corp | Method of making an electrode having a coating comprising a platinum metal oxide |
| US3751296A (en) | 1967-02-10 | 1973-08-07 | Chemnor Ag | Electrode and coating therefor |
| US3775284A (en) | 1970-03-23 | 1973-11-27 | J Bennett | Non-passivating barrier layer electrodes |
| US3711385A (en) | 1970-09-25 | 1973-01-16 | Chemnor Corp | Electrode having platinum metal oxide coating thereon,and method of use thereof |
| DE2100652A1 (de) | 1971-01-08 | 1972-07-20 | Metallgesellschaft Ag | Elektrode für die Chloralkalielektrolyse und Verfahren zu ihrer Herstellung |
| IT959730B (it) | 1972-05-18 | 1973-11-10 | Oronzio De Nura Impianti Elett | Anodo per sviluppo di ossigeno |
| US3926751A (en) | 1972-05-18 | 1975-12-16 | Electronor Corp | Method of electrowinning metals |
| US4086157A (en) | 1974-01-31 | 1978-04-25 | C. Conradty | Electrode for electrochemical processes |
| US3882002A (en) | 1974-08-02 | 1975-05-06 | Hooker Chemicals Plastics Corp | Anode for electrolytic processes |
| NL178429C (nl) | 1974-10-29 | 1986-03-17 | Diamond Shamrock Techn | Werkwijze voor het vervaardigen van een elektrode, die geschikt is voor gebruik bij elektrolytische processen. |
| US4005003A (en) | 1975-04-15 | 1977-01-25 | Olin Corporation | Multi-component metal electrode |
| US3950240A (en) | 1975-05-05 | 1976-04-13 | Hooker Chemicals & Plastics Corporation | Anode for electrolytic processes |
| CA1088026A (en) | 1977-11-09 | 1980-10-21 | Raouf O. Loutfy | Stable electrode for electrochemical applications |
| JPS55500123A (enExample) | 1978-03-28 | 1980-03-06 | ||
| CA1225066A (en) | 1980-08-18 | 1987-08-04 | Jean M. Hinden | Electrode with surface film of oxide of valve metal incorporating platinum group metal or oxide |
| US4437948A (en) | 1981-10-16 | 1984-03-20 | Bell Telephone Laboratories, Incorporated | Copper plating procedure |
| EP0097154A1 (en) | 1981-12-28 | 1984-01-04 | Diamond Shamrock Corporation | Electrocatalytic electrode |
| JPS58171589A (ja) | 1982-03-31 | 1983-10-08 | Ishifuku Kinzoku Kogyo Kk | 電解用電極及びその製造方法 |
| US4469564A (en) | 1982-08-11 | 1984-09-04 | At&T Bell Laboratories | Copper electroplating process |
| JPS62161975A (ja) * | 1986-10-01 | 1987-07-17 | ペルメレック電極株式会社 | 電解槽に使用する電極およびその製造方法 |
| JPH01312096A (ja) * | 1988-06-13 | 1989-12-15 | Kamioka Kogyo Kk | 電解用電極及びその製造方法 |
| US5262040A (en) * | 1989-06-30 | 1993-11-16 | Eltech Systems Corporation | Method of using a metal substrate of improved surface morphology |
| US5167788A (en) | 1989-06-30 | 1992-12-01 | Eltech Systems Corporation | Metal substrate of improved surface morphology |
| US5324407A (en) | 1989-06-30 | 1994-06-28 | Eltech Systems Corporation | Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell |
| US5207889A (en) | 1991-01-16 | 1993-05-04 | Circuit Foil Usa, Inc. | Method of producing treated copper foil, products thereof and electrolyte useful in such method |
| NL9101753A (nl) | 1991-10-21 | 1993-05-17 | Magneto Chemie Bv | Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging. |
| JP2963266B2 (ja) | 1992-01-28 | 1999-10-18 | ペルメレック電極株式会社 | 不溶性電極構造体 |
| JP3124847B2 (ja) | 1992-11-06 | 2001-01-15 | ペルメレック電極株式会社 | 金属箔の電解による製造方法 |
| JP3124848B2 (ja) * | 1992-11-11 | 2001-01-15 | ペルメレック電極株式会社 | 金属箔の電解による製造方法 |
| JP3278492B2 (ja) * | 1993-05-20 | 2002-04-30 | ペルメレック電極株式会社 | 電解用電極 |
| JP3224329B2 (ja) * | 1994-08-22 | 2001-10-29 | ペルメレック電極株式会社 | 不溶性金属陽極 |
| US5783050A (en) | 1995-05-04 | 1998-07-21 | Eltech Systems Corporation | Electrode for electrochemical cell |
| JP3422885B2 (ja) * | 1995-11-01 | 2003-06-30 | ペルメレック電極株式会社 | 電極基体 |
| JP3507278B2 (ja) * | 1997-06-03 | 2004-03-15 | ペルメレック電極株式会社 | 電気めっき方法 |
| US5908540A (en) | 1997-08-07 | 1999-06-01 | International Business Machines Corporation | Copper anode assembly for stabilizing organic additives in electroplating of copper |
-
2000
- 2000-06-22 US US09/599,339 patent/US6527939B1/en not_active Expired - Fee Related
- 2000-06-23 JP JP2001506304A patent/JP2003503598A/ja active Pending
- 2000-06-23 WO PCT/US2000/017403 patent/WO2001000905A1/en not_active Ceased
- 2000-06-28 TW TW089112723A patent/TWI224632B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003503598A (ja) | 2003-01-28 |
| US6527939B1 (en) | 2003-03-04 |
| WO2001000905A1 (en) | 2001-01-04 |
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| MK4A | Expiration of patent term of an invention patent |